WO2002018668A1 - Titanium dioxide cobalt magnetic film and its manufacturing method - Google Patents
Titanium dioxide cobalt magnetic film and its manufacturing method Download PDFInfo
- Publication number
- WO2002018668A1 WO2002018668A1 PCT/JP2001/007089 JP0107089W WO0218668A1 WO 2002018668 A1 WO2002018668 A1 WO 2002018668A1 JP 0107089 W JP0107089 W JP 0107089W WO 0218668 A1 WO0218668 A1 WO 0218668A1
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- WIPO (PCT)
- Prior art keywords
- titanium dioxide
- magnetic film
- predetermined
- cobalt magnetic
- cobalt
- Prior art date
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- ILPIWPKVSGQOOJ-UHFFFAOYSA-N cobalt(2+) oxygen(2-) titanium(4+) Chemical compound [O--].[O--].[Ti+4].[Co++] ILPIWPKVSGQOOJ-UHFFFAOYSA-N 0.000 title claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 164
- 239000013078 crystal Substances 0.000 claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 239000004065 semiconductor Substances 0.000 claims abstract description 21
- 239000010936 titanium Substances 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 18
- 230000005415 magnetization Effects 0.000 claims abstract description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 9
- 239000001301 oxygen Substances 0.000 claims abstract description 9
- 230000003287 optical effect Effects 0.000 claims abstract description 8
- 230000001678 irradiating effect Effects 0.000 claims abstract description 3
- 238000001704 evaporation Methods 0.000 claims abstract 2
- 239000004408 titanium dioxide Substances 0.000 claims description 53
- 229910017052 cobalt Inorganic materials 0.000 claims description 38
- 239000010941 cobalt Substances 0.000 claims description 38
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 38
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 3
- 241000761389 Copa Species 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 230000006870 function Effects 0.000 abstract description 20
- 238000000151 deposition Methods 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract description 3
- 239000003054 catalyst Substances 0.000 abstract description 2
- 239000011941 photocatalyst Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 65
- 238000005259 measurement Methods 0.000 description 16
- 238000010586 diagram Methods 0.000 description 11
- 230000005381 magnetic domain Effects 0.000 description 8
- 241000238366 Cephalopoda Species 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 230000005389 magnetism Effects 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000000407 epitaxy Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 241000238631 Hexapoda Species 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002003 electron diffraction Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 102000035195 Peptidases Human genes 0.000 description 1
- 108091005804 Peptidases Proteins 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- IUJHOHSBALVOLS-UHFFFAOYSA-N [Co]=O.[O-2].[Ti+4].[O-2] Chemical class [Co]=O.[O-2].[Ti+4].[O-2] IUJHOHSBALVOLS-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 239000012194 insect media Substances 0.000 description 1
- 230000010211 insect pollination Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 235000019833 protease Nutrition 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/20—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation
- H01F41/205—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation by laser ablation, e.g. pulsed laser deposition [PLD]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/002—Mixed oxides other than spinels, e.g. perovskite
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/74—Iron group metals
- B01J23/75—Cobalt
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
- G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/007—Thin magnetic films, e.g. of one-domain structure ultrathin or granular films
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
- H01F10/193—Magnetic semiconductor compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
- H01F10/28—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers characterised by the composition of the substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2523/00—Constitutive chemical elements of heterogeneous catalysts
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12986—Adjacent functionally defined components
Definitions
- Titanium dioxide Korean dioxide, konorenotoroto magnetite and its manufacturing method
- the present invention relates to a titanium dioxide 'cobalt magnetic film and a method for producing the same, and a material useful for an optical angle butterfly, an electric' semiconductor material having an optical and magnetic function, a transparent magnet, etc. using the magnetic film, and a method for producing the same. It is about.
- Technical landscape a titanium dioxide 'cobalt magnetic film and a method for producing the same, and a material useful for an optical angle butterfly, an electric' semiconductor material having an optical and magnetic function, a transparent magnet, etc. using the magnetic film, and a method for producing the same. It is about.
- Titanium dioxide (T i 0 2 ) is a material that has been put to practical use for decomposing water and decomposing and removing harmful substances due to its light-and-butterfly function. From the viewpoint of energy and environmental issues, There is a demand for further improvement of the horned butterfly activity of titanium dioxide.
- Si and GaAs are the mainstream powers, and these conventional semiconductor materials have an electrical function based on carrier control, or light such as laser diodes and photodiodes.
- carrier control or light
- light such as laser diodes and photodiodes.
- it is a material that can realize functions
- magnetic functions such as magnetic memory.
- Titanium dioxide is a semiconductor crystal with a bandgap energy in the ultraviolet region that has optical and electrical functions, but if it can be provided with a magnetic function while maintaining the electrical function, ⁇ It is possible to obtain a semiconductor material that can realize both electric and magnetic functions.
- magnets are black materials that do not transmit visible light. If a transparent magnet can be realized, it is clear that it is useful not only for paper shears and other applications but also for a wide range of industrial fields.
- FIG. 14 there is an example shown in FIG. 14 in a conventional technique for adding magnetism to a transparent insulator.
- hardened A 1 2 0 on a transparent non-magnetic insulating powder with visible light is a 3 etc. mixed with particles of magnetic metal consisting of C 0 like baked.
- the non-magnetic insulator becomes amorphous due to the inclusion of the magnetic metal particles, and the crystallinity is lost. Transparent nature Properties and insulation properties are lost.
- Magnetic semiconductors include those in which Mn is mixed in GaAs and those in the CdMnTe system, and those that have a magnetic function and an optical function such as Faraday rotation. Due to the small force, these conventional magnetic semiconductors are not transparent.
- the present invention has a magnetic function added without losing the crystallinity of titanium dioxide.
- An object of the present invention is to provide a copa / noreth magnetic film and a method for producing the same. '' Disclosure of the Invention
- the titanium dioxide 'cobalt magnetic film of the present invention has the following formula: Ti i- x CO x O 2
- titanium dioxide-cobalt magnetic film represented by 0 ⁇ x ⁇ 0.3, in which Co is substituted at the Ti lattice position, and which is epitaxially grown on a single crystal group.
- the crystal structure of the magnetic film is preferably an anatase structure or, preferably, a rutile structure.
- the titanium oxide / cono-magnetic film having the above-mentioned structure has a bandgap energy of 3.13 eV to 3.13 eV depending on the Co concentration (X) substituted at the Ti lattice position. It is characterized in that it changes in the range of 33 eV.
- the above-described titanium dioxide / cobalt magnetic film can maintain its magnetization even at a temperature of room temperature or higher, and is transparent and transparent.
- the single crystal substrate is preferably crystalline structure when ANATA Ichize structure, L a A 1 0 3 ( 0 0 1) is a substrate. - the single crystal substrate is preferably crystalline structure in the case of Zorechiru structure is A 1 2 0 3 substrate.
- the single crystal substrate is a rutile crystal when the crystal structure is a rutile structure.
- titanium dioxide since titanium dioxide has a magnetic function without losing crystallinity as a semiconductor crystal, it can be used as an insect medium, a semiconductor material having both optical, electric and magnetic functions, and a transparent magnet.
- Method for producing a titanium dioxide-cobalt magnetic film of the present invention in a vacuum tank of oxygen pressure atmosphere, the target Bok consisting T i 0 2 and C o mixed at a predetermined mixing ratio, predetermined Le -
- the first light the irradiated with predetermined irradiation conditions, evaporated T i 0 2 and C o, and Toku ⁇ to a single crystal substrate heated to a predetermined substrate temperature.
- the oxygen pressure is 10 — 5 to: L 0 to 16 Torr
- the substrate temperature is 500 to 700 ° C.
- the laser beam is a KrF excimer laser beam (248 nm).
- the irradiation conditions can be set such that the pulse power of the laser beam is 1 to 2 joules Z cm 2 , and the irradiation speed of this laser pulse is 1 to: L 0 Hz.
- Irradiation may be performed alternately at a Loose number ratio to form a titanium dioxide / cobalt magnetic film having a predetermined C0 concentration.
- the titanium dioxide / cobalt magnetic film of the present invention having a desired C0 concentration can be obtained.
- titanium dioxide / cobalt magnetic film of the present invention is used as an unfavorable substance, its angular activity is high.
- the titanium dioxide cobalt magnetic film of the present invention When used as a semiconductor material, a semiconductor device having an electrical function by carrier control, a light receiving / emitting function, and a magnetic function by magnetic control can be manufactured. .
- FIG. 1 is a schematic view showing the difficulty in manufacturing the titanium dioxide / covanolate magnetic film of the present invention.
- FIG. 2 is a diagram schematically showing an anatase crystal structure and a rutile crystal structure of titanium dioxide.
- FIG. 3 is a diagram showing the results of X-ray diffraction measurement of a titanium dioxide / cobalt magnetic film having an anatase crystal structure produced by the production method of the present invention.
- FIG. 4 is a view showing an X-ray diffraction measurement result of a titanium dioxide / cobalt magnetic film having a rutile crystal structure manufactured by the manufacturing method of the present invention.
- FIG. 5 is a view showing a measurement result by TEM (transmission electron beam diffraction) of a titanium dioxide-cobalt magnetic film having an anatase crystal structure manufactured according to the present invention as viewed from a cross-sectional direction.
- TEM transmission electron beam diffraction
- FIG. 6 is a graph showing the results of measuring the lattice constant in the c-axis direction of a titanium dioxide-cobalt magnetic film having an anatase crystal structure manufactured by varying the Co concentration according to the present invention.
- FIG. 7 is a graph showing the measurement results of the transmittance of a titanium dioxide ′ cobalt magnetic film having an anatase crystal structure with a Co concentration of 8% according to the present invention.
- FIG. 8 is a diagram showing a magnetic domain structure of a titanium dioxide-cobalt magnetic film having an anatase crystal structure, which was taken using a scanning SQUID microscope.
- FIG. 9 is a diagram showing a magnetic domain structure of a titanium dioxide-cobalt magnetic film having a rutile crystal structure, which was taken by using a scanning SQUID microscope.
- FIG. 10 is a diagram showing the magnetic domain structure of titanium dioxide / conot magnetic films having an anatase crystal structure with various C 0 concentrations, taken by using a scanning SQUID microscope.
- FIG. 11 is a diagram showing the magnetization hysteresis characteristics of the titanium dioxide-cobalt magnetic film having the anatase crystal structure of the present invention.
- FIG. 12 is a diagram showing the temperature dependence of the magnetizing characteristics of the titanium dioxide / cobalt magnetic film having the anatase crystal structure of the present invention.
- FIG. 13 shows the titanium dioxide-co-crystal of the present invention having an anatase crystal structure having different C 0 concentrations.
- FIG. 3 is a diagram illustrating light absorption characteristics of a Baltic magnetic film.
- FIG. 14 is a diagram illustrating a conventional technique for adding magnetism to a transparent insulator.
- FIG. 1 is a schematic view of an apparatus for producing a titanium dioxide / cobalt magnetic film according to the present invention.
- the manufacturing apparatus 10 is configured as a laser ablation deposition apparatus.
- a vacuum chamber 17 a substrate 11 and an evening getter disposed opposite to the substrate 11 are arranged.
- Power is arranged.
- a mask 15 is movably supported on the surface of the substrate 11 facing the target 12 so as to partially cover the substrate 11.
- 16 is a nozzle for introducing oxygen.
- the substrate 11 is a transparent substrate having a relatively small lattice mismatch when a titanium dioxide / cobalt magnetic film having an anatase crystal structure is grown by epitaxy. 3 It is made of a (001) substrate, and its surface is made to be a (001) plane. Furthermore, the substrate 1 1, when Epitakisharu growing titanium dioxide-cobalt magnetic film of rutile crystal structure, A l 2 0 3, or T i 0 2 may be a single crystal substrate that have a rutile crystal structure .
- the target 1 2 the upper word using two targets of the motor one Getting Bok comprising only T i 0 2 of target Bok and rutile crystal structure of his own composition, a predetermined number of the ratio of these evening one target It may be manufactured by alternately irradiating laser light pulses.
- each evening get is held on a multi-target holder 118 that can support the target, and each evening get is held by the rotating shaft 19 of the multi-target holder 18 as described above.
- the laser device 13 is selectively brought to the laser irradiation position.
- Laser used in the laser apparatus 13 is K r F excimer laser that shines out of the laser beam, for example 248 nm, and adjust the light energy density of pulses of the laser beam to any one of 1 ⁇ 2 JZcm 2, the One laser pulse is emitted at 1 to 10 pulses / sec, that is, at a speed of 1 to: L0Hz.
- the above-mentioned heating device 14 is a substrate heating device using a Nd: YAG laser, and can heat the substrate 11 to a high temperature even in an oxidizing atmosphere.
- the substrate heating device may be an ordinary lamp heater.
- FIG. 2 is shows the crystal structure of titanium dioxide (T i 0 2) schematically, FIG. 2 (a), T i coordination position in the anatase one peptidase and rutile crystalline structures (the black circles)
- FIG. 2 (b) schematically shows an arrangement of an octahedral ligand composed of Ti and 0 in an anatase crystal structure and a rutile crystal structure.
- FIG. 2 (c) shows a bond model of Ti and 0 in the anatase crystal structure and the rutile crystal structure.
- FIG. 3 shows the results of X-ray diffraction measurement of a titanium dioxide / cobalt magnetic film having an anatase crystal structure produced by the production method of the present invention.
- FIG. 3 (a) shows a diffraction pattern by XRD (XRAY DiffR act Me t er).
- Figure 3 (b) shows the RHEED (reflection electron diffraction) results during film formation.
- Titanium dioxide-cobalt magnetic film used for the measurement L a A to 10 3 (001) substrate, and the target was 10 mo 1% de one up to Co to Ti 0 2 of the rutile crystal structure, T rutile crystal structure i 0 2 the data one Getting Bok and composed only, the record of a predetermined number of ratios - at C 0 concentration 5.8% of titanium dioxide • cobalt magnetic film have been conducted under the deposition to irradiate the laser light pulse is alternately is there.
- the Co concentration was determined by EPMA (Electron Pre-Micro Analysis).
- the substrate temperature and oxygen partial pressure were 650 each.
- C is a 10- 5 To rr.
- FIG. 4 shows the results of X-ray diffraction measurement of a rutile crystalline titanium dioxide / cobalt magnetic film produced by the production method of the present invention.
- Titanium dioxide-cobalt magnetic film of rutile crystal structure used in this measurement, except using T i 0 2 substrate in E peak evening Kisharu single crystal substrate A 0 3 substrate or rutile crystalline structure, the above ANATA one
- the conditions are the same as those for the production of a titanium dioxide / cobalt magnetic film with a zeolite crystal structure.
- the titanium dioxide / cobalt magnetic film produced by the production method of the present invention has a rutile crystal structure and is (101) -axis oriented on the substrate. Although not shown, it was confirmed from the RH EED measurement results that epitaxy was grown for each monolayer.
- FIG. 5 is a diffraction image showing a result of TEM (transmission electron diffraction) measurement in a cross-sectional direction of the titanium dioxide-cobalt magnetic film having the anatase crystal structure.
- TEM transmission electron diffraction
- FIG. 6 is a graph showing the results of measuring the lattice constant in the c-axis direction of the titanium dioxide-cobalt magnetic film having an anatase crystal structure prepared by changing the C 0 concentration variously. As is evident from FIG. 6, the lattice constant increases almost in proportion to the C0 concentration. From this result, it can be seen that C 0 is substituted at the grid point position of Ti.
- the titanium dioxide-cobalt magnetic film of the present invention maintains the crystal structure as a semiconductor even if it contains C0 atoms having magnetic properties.
- FIG. 7 is a graph showing the measurement results of the transmittance of a titanium dioxide-cono-cort magnetic film having the above-described anasease crystal structure with a Co concentration of 8%. From this figure, it can be seen that the titanium dioxide of the present invention • The cobalt magnetic film must be transparent as much as possible. In addition, a titanium dioxide-cobalt magnetic film having a rutile crystal structure (not shown) was confirmed to be transparent in a viable state, and then subjected to a test.
- FIG. 8 is an image diagram showing a measurement result of a magnetic domain structure of a titanium dioxide-cobalt magnetic film having an anatase crystal structure, which was taken using a scanning SQUID microscope.
- the concentration scale on the horizontal axis indicates the strength of the magnetic field expressed in microtesla, and and — indicate the direction of magnetization. This measurement was performed using a scanning SQU ID microscope. The measurement temperatures were 3K, 30K and 60K, respectively, and the measurement image was 200 ⁇ 200 m.
- FIG. 9 is an image diagram showing a measurement of a magnetic domain structure of a titanium dioxide cobalt oxide magnetic film having a rutile crystal structure, taken with a scanning SQUID microscope.
- the concentration scale on the vertical axis indicates the strength of the magnetic sill expressed in microtesla, the measurement temperature is 3K, and the measurement temperature is 200 / imx 200 ⁇ m.
- the rutile crystal structure titanium dioxide 'cobalt magnetic film used for this measurement was prepared by continuously changing the Co concentration from left to right in the figure.
- the C0 concentration at the left end is 14.6%
- the C0 concentration at the right end is 15.4%.
- FIG. 10 shows the results obtained by measuring the magnetic domain structure of a titanium dioxide-cobalt magnetic film having an anatase crystal structure with various Co concentrations using the same means as in FIG.
- the concentration scale on the abscissa indicates the strength of magnetism expressed in microtesla, and + and-indicate the direction of magnetization. As is clear from FIG. 10, the magnetization increases as the Co concentration increases.
- Fig. 11 is a graph showing the magnetization characteristics of the titanium dioxide-cobalt magnetic film having the above anatase crystal structure
- Fig. 11 (a) is a graph showing the magnetic hysteresis characteristics.
- the magnetic moment is expressed in B units, the horizontal axis represents the magnetic field strength applied parallel to the surface of the magnetic film, and the measurement temperature is 300K.
- FIG. 11 (b) shows the remanent magnetic moment, that is, the demagnetizing characteristics depending on the temperature of the remanent magnetic field.
- FIG. 12 is a graph showing the temperature dependence of the magnetization characteristics of the titanium dioxide-cobalt magnetic film having the anatase crystal structure.
- the applied magnetic field strength was 200 Gauss
- the constant temperature range is 0 to 40 OK.
- the titanium dioxide / cobalt magnetic film of the present invention has a magnetic domain structure, and its magnetization increases as the Co concentration increases. Further, in a temperature range of 0 to 400 K, remanence can be generated. That is, it can be magnetized, and the magnetism does not disappear even at a high temperature of 400 K.
- FIG. 13 is a graph showing the light absorption characteristics of the titanium dioxide / cobalt magnetic films of the present invention having an anatase crystal structure having different C 0 concentrations. Each absorption curve shows that it is a good semiconductor crystal, and the band gap energy determined from B and the edge is 3.13 to 3.33 eV.
- the titanium dioxide-cobalt magnetic film of the present invention is a semiconductor crystal whose band gap energy varies depending on the C0 concentration.
- the titanium dioxide / cobalt magnetic film of the present invention is a semiconductor crystal in which Co atoms are substituted at Ti lattice positions, has a magnetic domain structure, and forms a residual magnetic layer. This residual magnetism does not disappear even at 400 K. In addition, it is transparent and can change the band gap energy depending on the Co concentration. Further, according to the method for producing a titanium dioxide / cobalt magnetic film of the present invention, the titanium dioxide / cobalt magnetic film of the present invention can be produced.
- T i 0 2 Insect pollination reaction by T i 0 2 is, T i 0 2 bands formic Yap energy more E Nerugi redox reaction by holes and free electrons produced by absorbing a photon having one force, these e Ichiru and free
- the rate at which electrons recombine at the same time as their generation is quite high, and the insect rate is not very high.
- the titanium dioxide-cobalt magnetic film of the present invention is used as a photocatalyst, the recombination ratio of holes and electrons can be reduced by magnetization due to Co. Therefore, the insect rate is high.
- the titanium dioxide / cobalt magnetic film of the present invention it is possible to provide a catalyst having a high catalytic ability, a semiconductor material having an optical 'electric' magnetic function, and a transparent magnet.
- the above-mentioned titanium dioxide / cobalt magnetic film can be produced reliably.
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Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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EP01956947A EP1314793A4 (en) | 2000-08-30 | 2001-08-17 | TITANIUM DIOXIDE COBALT MAGNETIC FILM AND METHOD FOR THE PRODUCTION THEREOF |
US10/110,233 US6919138B2 (en) | 2000-08-30 | 2001-08-17 | Titanium dioxide cobalt magnetic film and its manufacturing method |
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JP2000-261050 | 2000-08-30 | ||
JP2000261050 | 2000-08-30 | ||
JP2001091276A JP3569763B2 (ja) | 2000-08-30 | 2001-03-27 | 二酸化チタン・コバルト磁性膜及びその製造方法 |
JP2001-91276 | 2001-03-27 |
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WO2002018668A1 true WO2002018668A1 (en) | 2002-03-07 |
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PCT/JP2001/007089 WO2002018668A1 (en) | 2000-08-30 | 2001-08-17 | Titanium dioxide cobalt magnetic film and its manufacturing method |
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US (2) | US6919138B2 (ja) |
EP (1) | EP1314793A4 (ja) |
JP (1) | JP3569763B2 (ja) |
KR (1) | KR100560553B1 (ja) |
CN (1) | CN1289707C (ja) |
WO (1) | WO2002018668A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101850251A (zh) * | 2010-06-10 | 2010-10-06 | 大连大学 | 可磁分离二氧化钛可见光催化剂的制备方法 |
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US7521039B2 (en) * | 2002-11-08 | 2009-04-21 | Millennium Inorganic Chemicals, Inc. | Photocatalytic rutile titanium dioxide |
JP4612340B2 (ja) * | 2003-05-21 | 2011-01-12 | 独立行政法人科学技術振興機構 | ビスマスを構成元素に含む多元系酸化物単結晶の製造方法 |
JP3944584B2 (ja) * | 2004-01-23 | 2007-07-11 | 国立大学法人東北大学 | コバルトドープ二酸化チタン膜の作製方法、コバルトドープ二酸化チタン膜、及び多層膜構造 |
JP4102880B2 (ja) * | 2004-02-23 | 2008-06-18 | 国立大学法人東北大学 | 多層膜構造体、及び素子構造 |
US20080210934A1 (en) * | 2005-03-25 | 2008-09-04 | Tokyo Institute Of Technology | Semiconductor Device Using Titanium Dioxide as Active Layer and Method for Producing Semiconductor Device |
SG127749A1 (en) * | 2005-05-11 | 2006-12-29 | Agency Science Tech & Res | Method and solution for forming anatase titanium dioxide, and titanium dioxide particles, colloidal dispersion and film |
CN100350520C (zh) * | 2005-06-03 | 2007-11-21 | 山东大学 | 非晶态高掺杂COxTi1-xO2铁磁性半导体薄膜的制备方法 |
US7763149B2 (en) * | 2005-08-19 | 2010-07-27 | North Carolina State University | Solar photocatalysis using transition-metal oxides combining d0 and d6 electron configurations |
JP4604197B2 (ja) * | 2005-12-01 | 2010-12-22 | 国立大学法人横浜国立大学 | 磁性粉末微粒子の製造方法 |
JP4831629B2 (ja) * | 2005-12-13 | 2011-12-07 | 独立行政法人物質・材料研究機構 | 磁性人工超格子とその製造方法 |
CN1929049B (zh) * | 2006-08-14 | 2011-08-03 | 南京大学 | 利用激光诱导效应改变CrO2薄膜磁性的方法 |
JP2008262109A (ja) * | 2007-04-13 | 2008-10-30 | Fujitsu Ltd | 光送受信装置 |
JP5626649B2 (ja) * | 2008-06-10 | 2014-11-19 | 独立行政法人物質・材料研究機構 | 電磁波吸収材料 |
JP5214745B2 (ja) * | 2009-02-05 | 2013-06-19 | Jx日鉱日石金属株式会社 | 酸化チタンを主成分とする薄膜及び酸化チタンを主成分とする焼結体スパッタリングターゲット |
EP2412844A4 (en) | 2009-03-27 | 2016-12-21 | Jx Nippon Mining & Metals Corp | SPUTTERING TARGET OF A SINTERED TI-NB OXID BODY, TI-NB OXID THIN LAYER AND METHOD FOR PRODUCING THE THIN LAYER |
JP5603304B2 (ja) * | 2011-08-04 | 2014-10-08 | 日本電信電話株式会社 | 光触媒の製造方法 |
CN102654671B (zh) * | 2011-11-14 | 2014-09-10 | 京东方科技集团股份有限公司 | 液晶显示器及其制作方法 |
JP5891990B2 (ja) * | 2012-07-30 | 2016-03-23 | コニカミノルタ株式会社 | 光学式検体検出装置 |
US9604859B2 (en) | 2012-08-17 | 2017-03-28 | Council Of Scientific & Industrial Research | Process for decomposition of organic synthetic-dyes using semiconductor-oxides nanotubes via dark-catalysis |
US20150378179A1 (en) * | 2013-02-05 | 2015-12-31 | Seong Kyu Lim | Glasses having detachable auxiliary lenses |
JP6145332B2 (ja) * | 2013-06-20 | 2017-06-07 | 昭和電工株式会社 | 磁気記録媒体、磁気記憶装置 |
TW202300959A (zh) * | 2021-03-11 | 2023-01-01 | 美商應用材料股份有限公司 | 藉由物理氣相沉積所沉積的氧化鈦光學裝置薄膜 |
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US6027766A (en) * | 1997-03-14 | 2000-02-22 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
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2001
- 2001-03-27 JP JP2001091276A patent/JP3569763B2/ja not_active Expired - Fee Related
- 2001-08-17 US US10/110,233 patent/US6919138B2/en not_active Expired - Fee Related
- 2001-08-17 WO PCT/JP2001/007089 patent/WO2002018668A1/ja active IP Right Grant
- 2001-08-17 KR KR1020027005204A patent/KR100560553B1/ko not_active IP Right Cessation
- 2001-08-17 EP EP01956947A patent/EP1314793A4/en not_active Withdrawn
- 2001-08-17 CN CNB01802601XA patent/CN1289707C/zh not_active Expired - Fee Related
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2005
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US5145713A (en) * | 1990-12-21 | 1992-09-08 | Bell Communications Research, Inc. | Stoichiometric growth of compounds with volatile components |
US6037289A (en) * | 1995-09-15 | 2000-03-14 | Rhodia Chimie | Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions |
JPH1192176A (ja) * | 1997-07-22 | 1999-04-06 | Bridgestone Corp | 光触媒膜及びその作製方法 |
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CN101850251A (zh) * | 2010-06-10 | 2010-10-06 | 大连大学 | 可磁分离二氧化钛可见光催化剂的制备方法 |
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KR20020068041A (ko) | 2002-08-24 |
JP2002145622A (ja) | 2002-05-22 |
EP1314793A4 (en) | 2007-10-03 |
CN1388838A (zh) | 2003-01-01 |
JP3569763B2 (ja) | 2004-09-29 |
CN1289707C (zh) | 2006-12-13 |
EP1314793A1 (en) | 2003-05-28 |
KR100560553B1 (ko) | 2006-03-15 |
US20030091500A1 (en) | 2003-05-15 |
US20050233163A1 (en) | 2005-10-20 |
US6919138B2 (en) | 2005-07-19 |
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