Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
  • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
  • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
  • C23C28/3215—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer at least one MCrAlX layer
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
  • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
  • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
  • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
  • C23C28/36—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including layers graded in composition or physical properties
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
  • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
  • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
  • Y02T50/00—Aeronautics or air transport
  • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Definitions

• the invention relates to a component with a thermal barrier coating which can be used at high temperatures.
• a known example of such a component is a part of a gas turbine.
• thermal insulation layers which generally consist of zirconium oxide (YSZ) partially stabilized with Y 2 0 3 .
• an aluminide layer can also be used as the adhesion promoter layer. This can be created by aluminum diffusion into the substrate surface.
• thermal barrier coating systems surface temperatures of the turbine components of up to 1200 ° C can be achieved for long operating times. A further increase to over 1300 ° C is aimed at, but cannot be achieved with the usual thermal barrier coating systems. For this reason, new solutions are being sought worldwide that could replace the partially stabilized zirconium oxide.
• the object of the invention is to create a Thermal insulation layer that is suitable for use at temperatures above 1200 ° C.
• the component according to the claim has a thermal barrier coating on its surface.
• the thermal barrier coating comprises a lower and an upper area.
• the lower area is between the actual component and the upper area.
• the lower area consists entirely or predominantly of stabilized Zr0 2 or a glass-metal composite material.
• the upper area consists entirely or predominantly of a material which has a stable phase at temperatures from 0 ° C to at least 1200 ° C. A stable phase in the sense of the invention is present if no phase change takes place in the specified temperature interval, which occurs with a sudden change in the thermal
• the lower area has in particular a larger coefficient of thermal expansion than the upper area. It has been shown that stable thermal insulation layers can then be produced in practice.
• the thermal barrier coating is on an adhesion promoter. Lersch maybe.
• the lower region is formed, for example, by a layer, which is called the contact layer in the following. It consists of YSZ or glass-ceramic composite materials
• thermal expansion coefficient of the thermal insulation layer should be at least 10 * 10 ⁇ 6 K -1 at least in the lower area in order to achieve the occurrence of low mechanical stresses.
• the contact layer is in particular at least 50 ⁇ m, preferably at least 100 ⁇ m thick, in order to achieve the aforementioned desired effect.
• the upper area with the low thermal conductivity is located above the lower area.
• the thickness of this area should be chosen so thick that the lower area is sufficiently temperature-sensitive is protected.
• the upper region can also be in the form of a layer, which is called the cover layer below.
• all materials that meet the criteria of phase stability and low thermal conductivity can be used as the material for the top layer or the upper area.
• examples include fully stabilized cubic zirconium oxide, oxides with a perovskite structure or pyrochlore structure such as La 2 Zr 2 0 7 or Nd 2 Hf 2 0 7 or doped variants of these materials.
• the materials mentioned by way of example have the desired low thermal conductivity and the desired stable phase at the desired operating temperature of over 1200 ° C.
• the layers can be applied by various methods, such as LPPS (low pressure plasma spraying), APS (air plasma spraying) and EB-PVD (electron beam physical vapor deposition). In principle, however, other methods are also possible.
• LPPS low pressure plasma spraying
• APS air plasma spraying
• EB-PVD electron beam physical vapor deposition
• thermocyclability This means the resistance to extreme cyclical changes in temperature.
• Early failure in thermal cycling often occurs in layer systems due to the different thermal expansion coefficients of the different materials.
• thermal stresses arise which can damage and cause the structure to fail.
• the thermal expansion With approx. 14 * 10 " ⁇ K " 1, the coefficient of application reaches a high value for ceramic systems with the substrate materials used and the adhesion promoter.
• the common thermal insulation material YSZ has a thermal expansion coefficient of 10.4 * 10 -6 K "1.
• the substrate material is the material to which the thermal insulation layer including the bonding agent layer is applied if necessary.
• the YSZ used in accordance with the prior art is subject to a phase change at temperatures above 1200 ° C., which can damage the layer. According to the invention, this problem has been solved by providing the upper region. The material is therefore on
• the invention is therefore based on the idea of combining different ceramic materials in one layer system.
• the material in contact with the adhesion promoter layer has a coefficient of thermal expansion and a damage tolerance, which ensures the thermocyclability, while the material on the
• a thermal insulation layer consists of a contact layer and a cover layer.
• the contact layer is located between the adhesion promoter layer and the cover layer.
• a thermal barrier coating has a concentration gradient. The ratio of two materials changes continuously within the thermal insulation layer.
• Thermal insulation layer made of YSZ and La 2 Zr 2 0 7 .
• YSZ powder and MCrAlY powder suitable for plasma spraying are available industrially.
• the La 2 Zr 2 0 7 powder is produced by spray drying an aqueous La (N0 3 ) 3 and Zr (N0 3 ) 2 solution with subsequent calcining at 1400 ° C.
• the adhesive layer is applied to the substrate material, which consists of a nickel-based alloy, by means of LPPS.
• a 0.05-0.2 mm thick YSZ layer is first applied as a contact layer on the adhesion promoter layer by means of EB-PVD.
• a pyrochlore layer is then applied as a covering layer with a thickness of at least 0.1 mm by means of EB-PVD.
• Graded thermal insulation layer made of glass-metal composite and cubic zirconium oxide
• Cubic zirconia powder and an adhesive layer powder are available industrially.
• the powder of the glass-metal composite is produced by mixing and grinding the finest glass powder with the adhesive layer powder.
• the adhesive layer is applied using LPPS.
• the glass-metal powder and the Zr0 2 powder are fed to the plasma cannon via various conveyor units, with mainly glass-metal powder being supplied at the beginning.
• its proportion is continuously reduced, while the conveying the tightness of cubic zirconium oxide is increased to the same extent.
• the graded thermal insulation layer is produced with a total thickness of approx. 0.3 mm.
• YSZ powder and MCrAlY powder (adhesive layer powder) suitable for plasma spraying are available industrially.
• the starting powders are ground in a ball mill under ethanol and then added to
• a YSZ layer is first sprayed. The thickness is approximately 0.05 to 0.1 mm. Then a graded layer as described in 2) consisting of YSZ and Ta-YSZ with a thickness of at least 0.1 mm is applied. Finally there is a top layer of pure Ta-YSZ with a thickness of 0.05 - 0.1 mm. All three layers are applied using APS.

Landscapes

• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Inorganic Chemistry (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Materials Engineering (AREA)
• Mechanical Engineering (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• Physics & Mathematics (AREA)
• Plasma & Fusion (AREA)
• Ceramic Engineering (AREA)
• Coating By Spraying Or Casting (AREA)
• Turbine Rotor Nozzle Sealing (AREA)
• Other Surface Treatments For Metallic Materials (AREA)
• Laminated Bodies (AREA)
• Filling Or Discharging Of Gas Storage Vessels (AREA)
• Building Environments (AREA)

Priority Applications (4)

Applications Claiming Priority (2)

Publications (1)

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Family Applications (1)

Country Status (7)

Cited By (5)

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Citations (13)

Family Cites Families (5)

• 2000
  • 2000-02-25 DE DE10008861A patent/DE10008861A1/de not_active Withdrawn
• 2001
  • 2001-02-06 DE DE50106451T patent/DE50106451D1/de not_active Expired - Lifetime
  • 2001-02-06 EP EP20040106398 patent/EP1514953A3/de not_active Withdrawn
  • 2001-02-06 ES ES01903700T patent/ES2243437T3/es not_active Expired - Lifetime
  • 2001-02-06 US US10/204,588 patent/US20030148148A1/en not_active Abandoned
  • 2001-02-06 WO PCT/EP2001/001235 patent/WO2001063006A1/de not_active Ceased
  • 2001-02-06 EP EP01903700A patent/EP1257686B1/de not_active Expired - Lifetime
  • 2001-02-06 JP JP2001561811A patent/JP2003524075A/ja active Pending
  • 2001-02-06 AT AT01903700T patent/ATE297476T1/de not_active IP Right Cessation

Patent Citations (13)

Non-Patent Citations (2)

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