WO2001053357A1 - Resine d'acetal de polyvinyle pour matiere photosensible developpable thermiquement et matiere correspondante - Google Patents
Resine d'acetal de polyvinyle pour matiere photosensible developpable thermiquement et matiere correspondante Download PDFInfo
- Publication number
- WO2001053357A1 WO2001053357A1 PCT/JP2001/000337 JP0100337W WO0153357A1 WO 2001053357 A1 WO2001053357 A1 WO 2001053357A1 JP 0100337 W JP0100337 W JP 0100337W WO 0153357 A1 WO0153357 A1 WO 0153357A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- heat
- photosensitive material
- developable photosensitive
- acetal resin
- polyvinyl acetal
- Prior art date
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- 239000000463 material Substances 0.000 title claims abstract description 157
- 239000011354 acetal resin Substances 0.000 title claims abstract description 86
- 229920006324 polyoxymethylene Polymers 0.000 title claims abstract description 86
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 title claims abstract description 81
- 229920002554 vinyl polymer Polymers 0.000 title claims abstract description 78
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- 238000006116 polymerization reaction Methods 0.000 claims abstract description 45
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 41
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims abstract description 30
- 238000006359 acetalization reaction Methods 0.000 claims abstract description 13
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 13
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- 125000004036 acetal group Chemical group 0.000 claims abstract description 5
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims abstract 5
- 239000011347 resin Substances 0.000 claims description 62
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- LSPHULWDVZXLIL-QUBYGPBYSA-N camphoric acid Chemical compound CC1(C)[C@H](C(O)=O)CC[C@]1(C)C(O)=O LSPHULWDVZXLIL-QUBYGPBYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229920001727 cellulose butyrate Polymers 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000002894 chemical waste Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- RXPRRQLKFXBCSJ-UHFFFAOYSA-N dl-Vincamin Natural products C1=CC=C2C(CCN3CCC4)=C5C3C4(CC)CC(O)(C(=O)OC)N5C2=C1 RXPRRQLKFXBCSJ-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- ZEUUVJSRINKECZ-UHFFFAOYSA-N ethanedithioic acid Chemical compound CC(S)=S ZEUUVJSRINKECZ-UHFFFAOYSA-N 0.000 description 1
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 1
- AEOCXXJPGCBFJA-UHFFFAOYSA-N ethionamide Chemical compound CCC1=CC(C(N)=S)=CC=N1 AEOCXXJPGCBFJA-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229940093915 gynecological organic acid Drugs 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- PIJPYDMVFNTHIP-UHFFFAOYSA-L lead sulfate Chemical compound [PbH4+2].[O-]S([O-])(=O)=O PIJPYDMVFNTHIP-UHFFFAOYSA-L 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- OVWYEQOVUDKZNU-UHFFFAOYSA-N m-tolualdehyde Chemical compound CC1=CC=CC(C=O)=C1 OVWYEQOVUDKZNU-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- SQYNKIJPMDEDEG-UHFFFAOYSA-N paraldehyde Chemical compound CC1OC(C)OC(C)O1 SQYNKIJPMDEDEG-UHFFFAOYSA-N 0.000 description 1
- 229960003868 paraldehyde Drugs 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229940100595 phenylacetaldehyde Drugs 0.000 description 1
- 238000001782 photodegradation Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- RXPRRQLKFXBCSJ-GIVPXCGWSA-N vincamine Chemical compound C1=CC=C2C(CCN3CCC4)=C5[C@@H]3[C@]4(CC)C[C@](O)(C(=O)OC)N5C2=C1 RXPRRQLKFXBCSJ-GIVPXCGWSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
- G03C1/498—Photothermographic systems, e.g. dry silver
- G03C1/49836—Additives
- G03C1/49863—Inert additives, e.g. surfactants, binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/28—Condensation with aldehydes or ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
- C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
- C09D129/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
Definitions
- the present invention relates to a polyvinyl acetal resin for a heat developable photosensitive material and a heat developable photosensitive material.
- the heat-developable photosensitive material is mainly obtained by coating a composition obtained by dispersing a silver salt of a fatty acid, an organic reducing agent, and, in some cases, a small amount of photosensitive silver halide in a polymer binder, on a support. It becomes.
- heat-developable photosensitive materials have been developed to carry out the development process from a wet process to a heat-development process, and some of them have been put to practical use.
- Japanese Patent Publication No. 43-49224 discloses that an organic silver salt having silver ions in a molecule, which are associated as a group, is catalytically contacted with the silver ion.
- a heat developable photosensitive sheet material comprising a silver halide and a mild reducing agent is disclosed.
- a photosensitive material comprising these organic silver salt, silver halide and a mild reducing agent is placed in a transparent film which itself serves as a support or in a fiber product having almost no binder to form a heat-developable photosensitive sheet material.
- a film-forming binder such as, for example, polybutylbutyrazole, polymethyl methacrylate, cellulose cellulose drunk, polyvinyl acetate, cellulose acetate propionate, cellulose cellulose butyrate.
- the heat-developable photosensitive sheet material is formed by coating on a heat-resistant support such as paper, a plastic film, a metal foil, and a glass plate.
- a heat-resistant support such as paper, a plastic film, a metal foil, and a glass plate.
- polybulacetal resin is used as the most suitable one.
- JP-A-49-52626 discloses a thermosensitive photograph containing a photosensitive silver halide, a reducing agent and a silver salt oxidizing agent. It is described that in a composition, a stable image can be formed without using an independent stabilizer or a stabilizer precursor by using a thione compound represented by a general formula as a silver salt oxidizing agent. I have. However, the use of the above-mentioned thione compound as a silver salt oxidizing agent cannot solve the above-mentioned problems of the conventional polyvinyl butyral.
- the heat-developable silver salt film is inferior in image characteristics, particularly the image density, and the sharpness of the gradation portion, to be inferior to the conventional wet X-ray film using gelatin.
- image characteristics particularly the image density, and the sharpness of the gradation portion
- the present invention provides excellent image characteristics without causing the pot life of a coating solution, coloring of a heat-developable photosensitive material, fogging, poor gradation, insufficient sensitivity, and poor raw storage stability of a film.
- Acetal resin for heat-developable photosensitive material having heat and heat-developable light-sensitive material The purpose is to provide the material.
- the present invention relates to a polyvier acetal resin synthesized by an acetalization reaction between a polyvier alcohol and an aldehyde, wherein the degree of polymerization is from 200 to 300, and the acetal group is acetalized.
- the ratio of residual acetyl groups is 0 to 25 mol%
- the ratio of residual hydroxyl groups is 17 to 35 mol%
- the water content is 2.5 weight. /.
- the following is a polyvinyl acetal resin for a photothermographic material which does not contain an antioxidant and has a residual aldehyde content of 10 ppm or less.
- the apparent ratio of the residual acetyl group is 0 to 25 mol%, and the apparent ratio of the residual hydroxyl group is 17 to 3 5% by mole, water content of 2.5% by weight or less, residual aldehyde content of 10 ppm or less, and a polybutylacetal resin for a heat-developable photosensitive material containing no antioxidant. This is one of the present invention.
- the polyvinyl acetal resin for a heat-developable photosensitive material of the present invention preferably has a glass transition temperature of 55 to 110 ° C.
- a heat developable photosensitive material using the polyvinyl acetal resin for a heat developable photosensitive material of the present invention is also one of the present invention.
- the present inventors have conducted intensive studies on the causes of coloring of a heat developable photosensitive material using a polyvinyl acetal resin, and the occurrence of fog, poor gradation and insufficient sensitivity in an image after coating.
- the inventors of the present invention have identified the structure and the fact that a trace amount of impurities contaminating during the production is the cause, and have completed the present invention.
- the polybutyl acetal resin for a photothermographic material according to the first aspect of the present invention is synthesized by an acetalization reaction between polyvinyl alcohol and an aldehyde.
- the acetalization reaction is not particularly limited. For example, it is carried out in a solution such as an aqueous solution, an alcohol solution, a mixed solution of water and Z alcohol, or a dimethyl sulfoxide (DMSO) solution using an acid catalyst.
- a solution such as an aqueous solution, an alcohol solution, a mixed solution of water and Z alcohol, or a dimethyl sulfoxide (DMSO) solution using an acid catalyst.
- DMSO dimethyl sulfoxide
- the above-mentioned polyvinyl alcohol also includes polyvinyl acetate before saponification.
- aldehyde is not particularly restricted but includes, for example, holm-aldehyde (including paraformaldehyde), acetate aldehyde (including paraacetaldehyde), propionanolaldehyde, butylaldehyde, and amidealdehyde.
- holm-aldehyde including paraformaldehyde
- acetate aldehyde including paraacetaldehyde
- propionanolaldehyde butylaldehyde
- amidealdehyde amidealdehyde
- the acid catalyst is not particularly limited, and examples thereof include organic acids such as acetic acid and p-toluenesulfonic acid; and inorganic acids such as nitric acid, sulfuric acid, and hydrochloric acid.
- the terminating agent for the acetalization reaction is not particularly limited, and examples thereof include alkali neutralization of sodium hydroxide, potassium hydroxide, ammonia, sodium acetate, sodium carbonate, sodium hydrogen carbonate, potassium carbonate, and the like. Agents; alkylene oxides such as ethylene oxide; glycidyl ethers such as ethylene glycol diglycidyl ether.
- the polymerization degree of the polyvinyl acetal resin for a heat-developable photosensitive material of the first present invention is from 200 to 300. If it is less than 200, the resulting photothermographic material will not have sufficient coating strength and cracks or the like may occur when the coating is bent.
- the dispersibility of the silver salt added to the developable photosensitive material may decrease, and the coatability of the heat developable photosensitive material obtained by mixing these heat developable photosensitive material components may decrease. It is limited to the above range in order to provide various properties of the material in a well-balanced manner.
- the second invention is a polyvinyl acetal resin for a heat-developable photosensitive material in which a low-molecular-weight polyvinyl acetal resin and a high-molecular-weight polyvinyl acetal resin are mixed, and has a polymerization degree of at least 300.
- This is a polybutylacetal resin for photothermographic materials containing two different types of polybutylacetal resins.
- the polyvinyl acetal resin for a photothermographic material according to the second aspect of the present invention may contain at least two types of polybutyl acetal resins having different degrees of polymerization by at least 300. It may contain a polyvinyl acetal resin:
- the polyvinyl acetal resin for a heat-developable photosensitive material of the second invention may be a mixture of two or more kinds of polyvinyl acetal resins having different degrees of polymerization by at least 300, May be acetalized from a mixed polyvinyl alcohol in which two or more types of polyvinyl alcohols differing by at least 300 are mixed. '' If the difference in the degree of polymerization between two or more types of polybutylacetal resin or polybutyl alcohol to be mixed is less than 300, the silver salt of a fatty acid or the photosensitive silver halide to be added to the photothermographic material is used.
- the degree of polymerization, the ratio of the remaining acetyl group, and the ratio of the remaining hydroxyl group of the polyvinyl acetal resin for a photothermographic material of the second invention are apparent values, that is, Means the value when it is considered to be composed of, for example, when it is composed of two kinds of polybutylacetal resins A and B, it is represented by the following formula.
- the polymerization degree of the polyvinyl acetal resin for a photothermographic material according to the second aspect of the present invention is from 200 to 100,000. If it is less than 200, the obtained coating film strength will be low, and cracks or the like may occur when the coating film is bent. If it is more than 100, silver salt of fatty acid, photosensitive silver halide May cause poor dispersibility, and may cause capri in image characteristics and may deteriorate gradation.
- examples of the aldehyde, acid catalyst and terminator used in the acetalization reaction are the same as those used in the first aspect of the present invention.
- a hindered phenol-based or bisphenol-based resin System phosphoric acid system and other antioxidants are added to the reaction system and Z or the production system, but the antioxidant is not used in the present invention, and the polyvinyl acetal resin for a heat developable photosensitive material of the present invention is used. Does not contain antioxidants-Antioxidants rather reduce the pot life of the coating solution of the photothermographic material, resulting in fogging of the coated image and sharpness of the gradation area May be impaired.
- the polyvinyl acetal resin for a heat-developable photosensitive material of the present invention has a specific degree of acetalization.
- the degree of acetalization is calculated by a method of counting as two acetalized hydroxyl groups since the acetal group of the polyvinyl acetal resin is formed by acetalization of two hydroxyl groups.
- the proportion of residual acetyl groups in the polyvinyl acetal resin for a heat-developable photosensitive material of the present invention is 0 to 25 mol. / 0 . If it exceeds 25 mol%, the resulting heat-developable photosensitive material films are likely to be blocked with each other, and the image is not clear, so that the content is limited to the above range. Preferably it is 0 to 15 mol%.
- the ratio of residual hydroxyl groups in the polyvinyl acetal resin for a photothermographic material of the present invention is 17 to 35 mol%. 3 5 mol. If the ratio exceeds / 0 , the dispersibility of the silver salt added to the heat-developable light-sensitive material is reduced. The sensitivity of the photothermographic material is reduced, and the resulting photothermographic material becomes easy to adsorb moisture, and the pot life of the photothermographic material (coating solution) is reduced. On the other hand, when the amount is less than 17 mol%, the dispersibility of the silver salt is reduced, and the sensitivity of the obtained heat-developable photosensitive material is reduced.
- the water content of the polyvinyl acetal resin for a heat-developable photosensitive material of the present invention is preferably from 19 to 30 mol%, but is not more than 2.5% by weight. If the content exceeds 2.5% by weight, the pot life of the heat-developable photosensitive material (coating solution) is reduced, and further, the photothermographic material contains an isocyanate group added to strengthen the resulting heat-developable photosensitive material coating.
- the desired cross-linking causes insufficient or inadequate strengthening of the coating film.
- the amount of the cross-linking agent added to remove residual moisture If the number is increased, the handling becomes extremely poor, such as fogging, etc., so it is limited to the above range. Preferably it is 2.0% by weight or less.
- the residual aldehyde content of the polyvinyl acetal resin for a photothermographic material of the present invention is 10 ppm or less. If the concentration exceeds 10 ppm, the pot life of the heat-developable photosensitive material (coating solution) decreases, the aldehyde is reduced by a reducing agent contained in the coating solution, and the preservability of the coating solution decreases. Further, the image characteristics are degraded due to the occurrence of fog, so that it is limited to the above range. It is considered that these phenomena are caused by the reduction of the residual aldehyde contaminating the heat developable photosensitive material (coating solution) with a reducing agent.
- the residual aldehyde content is preferably 5 ppm or less.
- the means for removing the residual aldehyde contaminating the polyvinyl acetal resin is not particularly limited, and examples thereof include a method of washing with water, a mixed solution of water and an alcohol.
- the glass transition temperature of the polyvinyl acetal resin for a heat developable photosensitive material of the present invention is preferably 55 to 110 ° C. If the temperature exceeds 110 ° C, the resulting coating film will be too hard, causing folds and cracks during handling, fogging on the image of the photothermographic material film, insufficient gradation, and insufficient sensitivity. May be below 55 ° C In this case, the coating film becomes soft and may be thermally deformed by heat during thermal development, or the coating film surface may be scratched during handling, which may cause capri and the like. More preferably 55 to: I 00 ° C.
- the heat-developable light-sensitive material comprises a polyvinyl acetal resin for a heat-developable light-sensitive material of the present invention, an organic silver salt, a reducing agent, and if necessary, a small amount of a light-sensitive silver halide or a silver halide-forming component; And other additives.
- the blending amount of the polyvinyl acetal resin for a heat developable photosensitive material of the present invention in the above heat developable photosensitive material is preferably in a weight ratio to an organic silver salt (polyvinyl acetal resin: organic silver salt). Is 1:10 to 10: 1, more preferably 1: 5 to 5: 1.
- the organic silver salt is a colorless or white silver salt which is relatively stable to light, and reacts with a reducing agent when heated to 80 ° C or more in the presence of exposed silver halide to react with metallic silver. It becomes something.
- Examples of the above-mentioned organic silver salts include 3-mercapto-14-phenyl-1,2,4-triazole, 2-mercapto-5-aminothiazole, 1-phenyl-5-mercaptotetrathiazole, 2 —Silver salts of mercaptans such as mercaptobenzothiazole, mercaptoxodiazole, and mercaptotriazine; silver salts of thione compounds such as thioamide, thiopyridine, S-2-aminophenylthiosulfate; and aliphatic carboxylic acids Acids, hydrapric acid, lauric acid, myristic acid, palmitic acid, stearic acid, behenic acid, maleic acid, fumaric
- Silver salts of tetrazaindene silver-containing metal amino alcohols, organic acid silver chelate compounds, and the like.
- organic silver salts silver salts of aliphatic carboxylic acids are preferred, and silver behenate is more preferably used.
- the particle size of the organic silver salt is preferably from 0.01 to 10 ⁇ m, more preferably from 0.1 to 5 im.
- the organic silver salt may be contacted with a photosensitive silver halide in a catalytic manner.
- the means for contacting the photosensitive silver halide is not particularly limited.
- a solution or dispersion of a previously prepared organic silver salt, or a film containing an organic silver salt may be formed on a film containing the organic silver salt.
- the photosensitive silver halide forming component is not particularly limited as long as it acts on an organic silver salt to form a silver halide, but preferably contains iodide ions.
- the silver halide include silver bromide, silver iodide, silver chloride, silver chlorobromide, silver iodobromide, and silver chloroiodide.
- the amount of the photosensitive silver halide to be added is preferably 0.0005 to 0.2 part by weight, more preferably 0.01 to 0.1 part by weight, based on 100 parts by weight of the organic silver salt. 0.2 parts by weight.
- the reducing agent is not particularly limited and may be appropriately selected depending on the kind of the organic silver salt used.
- phenols and the like can be mentioned, and a photodecomposable reducing agent is preferably used, and a thermally decomposable reducing agent is also preferable. More preferred are hindered phenols.
- the amount of the reducing agent to be added is preferably 0.01 to 3.0 parts by weight, more preferably 0.01 to 1.0 parts by weight, based on 100 parts by weight of the organic silver salt. .
- each of the above reactions is controlled by using a photodegradable reducing agent in combination with a photodegradation accelerator, or using a coating that inhibits the reaction between the organic silver salt and the reducing agent. can do.
- the method for producing the heat-developable photosensitive material of the present invention is not particularly limited. After mixing and dispersing the polyvinyl acetal resin for bright photothermographic materials, an organic silver salt, a reducing agent and a solvent in a ball mill, silver halide or a silver halide forming component, and other additives as necessary. In addition, there is a method of further dispersing to prepare a dispersion.
- solvent those capable of dissolving the polyvinyl acetal resin for a heat-developable photosensitive material of the present invention and having a low water content are preferably used.
- these solvents include ketones such as getyl ketone, methyl ethyl ketone, and methyl isobutyl ketone; and esters such as methyl acetate, ethyl acetate, and propyl acetate.
- the coating film of the heat-developable photosensitive material is prepared by blending the polyvinyl acetal resin for a heat-developable light-sensitive material of the present invention, an organic silver salt and a reducing agent at a time, as described above, and further forming a layer of the heat-developable image on a support.
- the organic silver salt and the reducing agent may be separately added to the polyvinyl acetal resin for a photothermographic material of the present invention, a two-layer coating film may be formed. Then, both may be laminated. Further, a coating film may be formed on only one surface of the support, or a coating film may be formed on both surfaces of the support.
- the support is not particularly limited, and examples thereof include polyolefins such as polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyethylene, and polypropylene; cellulose esters such as polybutylacetal, cellulose diacetate, and cellulose triacetate; ⁇ Plastic films made of loin, vinyl chloride resin, chlorinated polypropylene, and the like, and metal plates made of glass, paper, aluminum, and the like.
- polyolefins such as polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyethylene, and polypropylene
- cellulose esters such as polybutylacetal, cellulose diacetate, and cellulose triacetate
- ⁇ Plastic films made of loin, vinyl chloride resin, chlorinated polypropylene, and the like, and metal plates made of glass, paper, aluminum, and the like.
- the amount of silver dispersed in the coating film of the heat developable photosensitive material is preferably 0.1 to 5.0 g Zm 2 . 0. If it is less than lg / m 2, the image density is lowered, image density by increasing the concentration beyond a certain amount is saturated, is not observed more improved, whereas, 5. 0 g Zm 2 No improvement in image density is observed when used in excess of. More preferably 0. 3 ⁇ 3. 0 g Zm 2 .
- Such a heat developable photosensitive material is also one of the present invention.
- a color tone agent is added as an additive.
- a black toning agent is added, and in order to form a color image, a color coupler, a leuco dye, etc. are added. May be added with a photosensitizer.
- the solid content (resin) is washed with distilled water, the washed resin is re-dispersed in distilled water, and sodium hydroxide is added to the obtained dispersion to adjust the pH of the solution to 7%. Was adjusted.
- the temperature of the solution was raised to 50 ° C., maintained at this state for 10 hours, and then cooled to room temperature.
- the resin heated and washed again was washed with distilled water in an amount 100 times the solid content. Further, the resin washed with water was redispersed in distilled water, kept at 50 ° C for 5 hours, washed with 100 times the volume of distilled water, dehydrated, dried, and dried to obtain a polybutyla resin. Cetal resin was prepared. The glass transition temperature of the obtained polybiacetal resin was 60 ° C.
- the amount of the remaining acetyl group was measured using 13 C—NMR.
- the amount of residual hydroxyl groups was measured using 13 C-NMR.
- the polybutylacetal resin was heat-extracted in a heating furnace, and the amount of the aldehyde was measured for the obtained extract by gas chromatography.
- the obtained coating solution was placed under an indoor fluorescent lamp at room temperature for 3 days, and the presence or absence of coloring of the coating solution was observed. No change was observed in the whiteness of the coating solution before and after fluorescent lamp exposure. With respect to the storage stability of the coating solution, the change in the color of the solution was visually observed, and those in which the color of the solution did not change were rated as ⁇ , those with a slight coloration as ⁇ , and those with a large coloration as X.
- the coating solution was applied on a support made of a polyester film so that the thickness after drying was 10 m, and dried.
- a heat developable photosensitive material film was prepared. ⁇ Heat developability of heat developable photosensitive material film>
- a high-pressure mercury lamp of 250 watts was exposed through a gradation pattern film at a distance of 20 cm for 0.3 mm second, and then exposed. Heating was performed for 5 seconds using a hot plate at 120 ° C. for development to obtain a pattern image having a good shear color. At this time, those with no fog and good sharpness were rated as ⁇ , those with some fog and poor sharpness were rated as X, and those with many fogs and poor sharpness were rated as X.
- the heat-developable photosensitive material film obtained as described above was placed on a stainless steel plate at 100 ° C having lmm height and width of 1 mm and having irregularities formed at intervals of 1 mm so that the coating was on the stainless steel plate side. Then, the heat developable photosensitive material film was pressed against the stainless steel plate side at a pressure of 100 g Z cm 2 for 5 seconds. Subsequently, the heat-developable photosensitive material film is cooled at room temperature, and the coating surface of the heat-developable photosensitive material film is visually observed. Was evaluated.
- a polyvinyl butyral resin was prepared in the same manner as in Example 1 except that polyvinyl alcohol of / 0 was used.
- a developable photosensitive material film was prepared.
- the glass transition temperature of the above-mentioned butylbutyral resin was 56 ° C.
- the prepared polybutyral resin and the obtained photothermographic material film were tested in the same manner as in Example 1. As a result, as in Example 1, the preservability of the coating solution, the heat developability, the preservability of the developed image, and the heat stability were all good. Table 1 shows the test results. -
- a heat-developable photosensitive material film was produced in the same manner as in Example 1 except that a polybutylbutyral resin having a residual aldehyde content of 3 ppm and a water content of 1.5% by weight was used.
- the polybutyral resin had a glass transition temperature of 62 ° C.
- the prepared polyvinyl butyral resin and the obtained heat-developable photosensitive material film were tested in the same manner as in Example 1. As a result, similarly to Example 1, the coating solution was excellent in storage stability, heat developability, storage stability of the developed image, and heat stability. Table 1 shows the test results.
- the solid (resin) is washed with distilled water, the resin after the water washing is redispersed in distilled water, and sodium hydrogen carbonate is added to the obtained dispersion to adjust the pH of the solution to 8. It was adjusted. The temperature of the solution was raised to 60 ° C., maintained in this state for 5 hours, and then cooled to room temperature.
- the resin heated and washed again was washed with distilled water in an amount 100 times the solid content. Further, the resin washed with water is redispersed in distilled water, kept at 50 ° C. for 5 hours, washed with 100 times the volume of distilled water, dehydrated, and dried to obtain a polyvinyl acetal resin. It was prepared. In addition, the glass transition temperature of the above polybiacetal resin was 80 ° C.
- a heat developable light-sensitive material film was produced in the same manner as in Example 1.
- the obtained polyvinyl acetal resin and the obtained heat developable photosensitive material film were tested in the same manner as in Example 1. As a result, as in Example 1, the preservability of the coating solution, the heat developability, the preservability of the developed image and the heat stability were all good. Table 1 shows the test results.
- Degree of polymerization 240, residual acetyl group content: 11 mol. /. , Residual hydroxyl group of 2 1 mol%, ⁇ Se Tasetaru degree 35 mol%, butyral degree 3 3 mole 0/0, the residual aldehyde content 3 ppm, water content 1. 5 wt. / 0, except for using poly Bulle ⁇ Setter Le resin glass transition temperature 7 0 ° C was in the same manner as in Example 1 to prepare a heat-developable photosensitive material film.
- Example 1 The polyvinyl acetal resin used and the obtained heat developable photosensitive material film were tested in the same manner as in Example 1. As a result, as in Example 1, the preservability of the coating solution, the heat developability, the preservability of the developed image and the heat stability were all good. Table 1 shows the test results.
- Degree of polymerization 240, residual acetyl group content: 1 mol. /. , The residual hydroxyl group content 3 2 mol%, ⁇ Seto Asetaru degree 3 5 mole 0/0, butyral degree 3 2 moles. / 0 , Residual aldehyde content 3 ppm, water content 1.5% by weight, heat-developable photosensitive material in the same manner as in Example 1 except that a polyvinyl acetal resin having a glass transition temperature of 76 ° C was used. A film was prepared.
- Example 7 The polyvinyl acetal resin used and the obtained heat developable photosensitive material film were tested in the same manner as in Example 1. As a result, as in Example 1, the preservability of the coating solution, the heat developability, the preservability of the developed image and the heat stability were all good. Table 1 shows the test results. (Example 7) Degree of polymerization: 240, residual acetyl group content: 1 mol%, residual hydroxyl group content: 25 mol. /. , Aseto Aseta Ichiru degree 7 3 mol 0/0, butyral Ichiru degree 1 mol. / 0 , residual aldehyde content 3 p'pm, moisture content 1.5 weight. / 0, except for using Poribiniruaseta Ichiru resin having a glass transition temperature 1 0 3 ° C were in the same manner as in Example 1 to prepare a heat-developable photosensitive material film.
- Example 1 A test was conducted in the same manner as in Example 1 for the polybutyl acetal resin used and the resulting heat developable photosensitive material film. As a result, as in Example 1, the preservability of the coating solution, the heat developability, and the preservability of the developed image were all good. Table 1 shows the test results.
- Degree of polymerization 240, residual acetyl group content: 12 mol. /.
- the amount of residual hydroxyl groups is 22 mol. /. , ⁇ Se Tasetaru degree 6 3 mole 0/0, butyral Ichiru degree 1 mol. / 0, the residual aldehyde content 3 ppm, water content 1.5 wt%, except for using a glass transition temperature 9 3 ° C of poly Biniruasetaru resin, heat-developable photosensitive material film in the same manner as in Example 1 Was prepared.
- Example 1 The polyvinyl acetal resin used and the obtained heat developable photosensitive material film were tested in the same manner as in Example 1. As a result, as in Example 1, the preservability of the coating solution, the heat developability, the preservability of the developed image and the heat stability were all good. Table 1 shows the test results.
- Example 1 A test was conducted in the same manner as in Example 1 for the used polybutyl acetal resin and the obtained heat developable photosensitive material film. As a result, as in Example 1, the storage stability of the coating solution, the heat developability, the storage stability of the developed image, and the heating stability were all good. For test results, etc. The results are shown in Table 1. (Comparative Example 1)
- a heat-developable photosensitive material film was produced in the same manner as in Example 1 except that the water content was 5% by weight, and the same polybutyl acetate resin as in Example 1 was used.
- the polybutylacetal resin used and the resulting heat-developable photosensitive material film were tested in the same manner as in Example 1.-
- the coating solution had poor dispersibility of the organic silver salt, and the heat-developable photosensitive material film was In the image after exposure, the pattern boundary surface was unclear.
- C The test results, etc. are shown in Table 2
- Example 2 The same procedure as in Example 1 was carried out except that 500 ppm of 2,2′-methylenebis (4-ethynole 6-t—butynolephenole) was added to the same polyvinyl acetal resin as an antioxidant.
- a heat-developable photosensitive material film was prepared in the same manner as in Example 1.
- the polyvinyl acetal resin used and the obtained heat developable photosensitive material film were tested in the same manner as in Example 1.
- the coating solution was remarkably colored, and the heat-developable photosensitive material film was frequently fogged after exposure. Table 2 shows the test results.
- Example 4 The same procedure as in Example 1 was carried out on the used polyvinyl acetate resin and the obtained heat developable photosensitive material film. No coloring of the coating solution was observed, but when the heat-developable photosensitive material film was layered and stored, blocking occurred at 35 ° C, and the image of the heat-developable photosensitive material film after exposure was the pattern boundary surface. Was unclear. Table 2 shows the test results. (Comparative Example 4)
- a heat-developable photosensitive material film was produced in the same manner as in Example 1 except that the water content was 5% by weight, and the same polyvinyl acetate resin as in Example 4 was used.
- the polyvinyl acetal resin used and the resulting heat-developable photosensitive material film were tested in the same manner as in Example 1.
- the coating solution had poor dispersibility of the organic silver salt, and the image of the heat-developable light-sensitive material film after exposure was unclear at the pattern boundary. Table 2 shows the test results.
- Example 4 Except that the same polyvinyl acetal resin as in Example 4 was added with 500 ppm of 2,2′-methylenebis (4-ethyl-6-t-butynolephenanol) as an antioxidant, A heat developable photosensitive material film was produced in the same manner as in Example 1. The polyvinyl acetal resin used and the obtained heat developable photosensitive material film were tested in the same manner as in Example 1. The coloring of the coating solution was remarkable, and the heat-developable photosensitive material film was frequently fogged after exposure. Table 2 shows the test results.
- the amount of residual hydroxyl groups is 38 mol. /. And a degree of acetalization of 31 mol. /. And the degree of butyralization is 29.5 mol. Except that / is 0, using the same polyvinyl Asetaru resin as in Example 4, were created made of heat-developable photosensitive material film in the same manner as in Example 1.
- the polyvinyl acetate resin used and the resulting heat developable photosensitive material film were tested in the same manner as in Example 1. No coloring of the coating solution was observed, but when the heat-sensitive photosensitive material film was stacked and stored, blocking occurred at 35 ° C, and the exposed image of the heat-developable photosensitive material film was The interface was unclear. Table 2 shows the test results.
- Example 2 The test was conducted in the same manner as in Example 1 for the used polybutylacetal resin and the obtained heat developable photosensitive material film.
- the coating solution was slightly colored, and the resulting developable photosensitive material film slightly fogged after exposure. In addition, with respect to the heating stability, fine cracks occurred on the coating film surface.
- the polyvinyl hexyl acetal resin used and the resulting heat developable photosensitive material film were tested in the same manner as in Example 1.
- the coating solution was slightly colored, and the obtained developable photosensitive material film slightly fogged after exposure.
- the heating stability was deformed by the heating.
- a heat developable photosensitive material film was produced in the same manner as in Example 1, except that the residual aldehyde amount was 200 ppm, and the same polyvinyl acetal resin as in Example 1 was used.
- the polyvinyl acetal resin used and the obtained heat developable photosensitive material film were tested in the same manner as in Example 1.
- the coating solution was slightly colored, and occurrence of fogging was observed in the photothermographic material film after exposure. Table 2 shows the test results.
- Example 4 The same polyvinyl chloride as in Example 4 except that the residual aldehyde amount was 200 ppm.
- a heat-developable photosensitive material film was produced in the same manner as in Example 1 using lacetal resin.
- Example 2 The test was conducted in the same manner as in Example 1 for the used polybutylacetal resin and the obtained heat developable photosensitive material film.
- the coating solution was slightly colored, and occurrence of fogging was observed in the photothermographic material film after exposure. Table 2 shows the test results.
- Degree of polymerization 300, degree of saponification: 98 mol. /.
- the temperature was kept at 20 ° C., and the weight was 35 wt. 29 g of 0 / hydrochloric acid was added, and 64 g of butyl aldehyde was further added.
- the resin was precipitated, the mixture was kept for 30 minutes, and then the above hydrochloric acid of 108 g was added and the temperature was raised to 30 ° C. It was warmed and kept for 10 hours.
- the resultant was washed with distilled water, and sodium hydroxide was added to the washed polyvinyl butyral resin dispersion to adjust the pH of the solution to 7.
- the solution was kept at 50 ° C for 10 hours and then cooled.
- the solution was washed with 100 times the amount of distilled water with respect to the solid content, and further, the solution was kept at 50 ° C for 5 hours, washed with 100 times the amount of distilled water, and dehydrated. After drying, a polybutylacetal resin was obtained.
- the degree of polymerization was 650 and the degree of saponification was 98 mol. /.
- the polyvinyl acetal resin used here was prepared by blending a polyvinyl acetal resin having a degree of polymerization of 300 and 65 with a weight ratio of 1: 1 and an apparent degree of polymerization of 44, apparent amount of hydroxyl groups of 21 mol. %, Apparent amount of acetyl group 1.7 mol. / 0 was used. (Examples 11 to: I6, Comparative Examples 11 to; 14)
- Example 17 Except that the polymerization degree, saponification degree, type of aldehyde, acetylation degree, hydroxyl amount and blend ratio of the polybutyl acetal resin were changed as shown in Table 3, heat was applied in the same manner as in Example 1 '0. A coating solution for a developable photosensitive material film was prepared. (Example 17)
- Example 10 50 g of polybutyl alcohol with a degree of polymerization of 300, saponification degree of 98 monole% and 50 g of polybutyl alcohol with a degree of polymerization of 65,0 and saponification degree of 98 mol% in 700 g of distilled water
- a polybutyl acetal resin was obtained in the same manner as in Example 10. Then, using the obtained polyvinyl acetal resin, the same procedure as in Example 10 was carried out to obtain a photothermographic material. A coating solution for a film was prepared.
- Thermal development was performed in the same manner as in Example 17 'except that the degree of polymerization, saponification degree, type of aldehyde, degree of acetalization, amount of hydroxyl group, and blend ratio of the polyvinyl alcohol resin were changed as shown in Table 4.
- a coating solution for a photosensitive material film was prepared.
- the residual acetyl group, residual hydroxyl, residual aldehyde, and water contents of the polyvinyl acetal resins obtained in Examples 10 to 23 and Comparative Examples 11 to 16 were measured in the same manner as in Example 1. The results are shown in Table 3 for Examples 10 to 16 and Comparative Examples 11 to 14, and in Table 4 for Examples 17 to 23 and Comparative Examples 15 and 16. .
- the apparent degree of polymerization, the apparent amount of hydroxyl groups, and the apparent amount of acetyl groups of the polyvinyl acetal resin were determined by the following equations.
- the developed image was exposed to white light for 24 hours to confirm the preservability of the developed image.
- a sample in which no disturbance in the image pattern contrast was observed was evaluated as “ ⁇ ”
- a sample in which the image pattern contrast was slightly disturbed was evaluated as “X”
- a sample in which the image pattern contrast was significantly disturbed was evaluated as “X”.
- the heat-developable photosensitive material film obtained as described above was placed on a stainless steel plate at 100 ° C having lmm height and width of 1 mm and having irregularities formed at intervals of 1 mm so that the coating was on the stainless steel plate side. Then, the heat developable photosensitive material film was pressed against the stainless steel plate side at a pressure of 150 g Zcm 2 for 5 seconds. Subsequently, the heat-developable photosensitive material film is cooled at room temperature, and the coating surface of the heat-developable photosensitive material film is visually observed.
- PVA saponification degree Residual case Apparent water millet resin Degree of polymerization Degree of heavy water Seed of water content ⁇ Temperature, 3 ⁇ 4: Dispersing agent, ripening of acetylene solution
- Comparative Example 11 was poor in dispersibility of the organic silver salt in the coating solution due to high water content in the polyvinyl acetate resin, resulting in poor heat developability and image preservability. .
- Comparative Example 12 the preservability of the coating solution was poor and the heat developability was poor because the antioxidant was incorporated in the polyvinyl acetal resin.
- Comparative Example 13 was poor in dispersibility due to a large amount of residual hydroxyl groups, and poor in image preservability due to moisture absorption and the like.
- Comparative Examples 14 to 16 had good storage stability of the coating solution, but poor heat developability and heat stability.
- the present invention has the above-mentioned constitution, it has excellent preservability, and has extremely excellent image characteristics.Furthermore, the coating film does not fold or crack during handling, A heat-developable photosensitive material that does not undergo thermal deformation can be provided.
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Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/181,475 US6730464B2 (en) | 2000-01-19 | 2001-01-19 | Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material |
DE60113974T DE60113974T3 (de) | 2000-01-19 | 2001-01-19 | Wärmeentwickelbares, lichtempfindliches Material, umfassend ein Polyvinylacetalharz |
EP01901455A EP1270608B2 (en) | 2000-01-19 | 2001-01-19 | Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material |
US10/790,124 US7176257B2 (en) | 2000-01-19 | 2004-03-02 | Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000010535 | 2000-01-19 | ||
JP2000-010535 | 2000-01-19 | ||
JP2000113881 | 2000-04-14 | ||
JP2000-113881 | 2000-04-14 | ||
JP2000-337893 | 2000-11-06 | ||
JP2000337893 | 2000-11-06 |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
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US10181475 A-371-Of-International | 2001-01-19 | ||
US10/181,475 A-371-Of-International US6730464B2 (en) | 2000-01-19 | 2001-01-19 | Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material |
US10/790,124 Continuation US7176257B2 (en) | 2000-01-19 | 2004-03-02 | Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material |
Publications (1)
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WO2001053357A1 true WO2001053357A1 (fr) | 2001-07-26 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2001/000337 WO2001053357A1 (fr) | 2000-01-19 | 2001-01-19 | Resine d'acetal de polyvinyle pour matiere photosensible developpable thermiquement et matiere correspondante |
Country Status (4)
Country | Link |
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US (2) | US6730464B2 (ja) |
EP (1) | EP1270608B2 (ja) |
DE (1) | DE60113974T3 (ja) |
WO (1) | WO2001053357A1 (ja) |
Families Citing this family (11)
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EP1384732B1 (en) * | 2001-03-28 | 2016-11-09 | Sekisui Chemical Co., Ltd. | Polyvinyl acetal resin for coating and ink, and coating and ink compositions |
US20030235795A1 (en) * | 2001-08-22 | 2003-12-25 | Fuji Photo Film Co., Ltd. | Photothermographic material |
US20040260020A1 (en) * | 2001-09-21 | 2004-12-23 | Yoshitaka Miyake | Modified polyvinyl acetal resin |
US7348296B2 (en) | 2003-06-06 | 2008-03-25 | Agfa Healthcare | Binders for use in the thermosensitive elements of substantially light-insensitive thermographic recording materials |
DE102004038531A1 (de) * | 2003-08-19 | 2005-03-17 | Kuraray Specialities Europe Gmbh | Polyvinylacetal-haltiges Granulat, Verfahren zu seiner Herstellung sowie seine Verwendung |
JP2005077592A (ja) | 2003-08-29 | 2005-03-24 | Konica Minolta Medical & Graphic Inc | 有機銀塩分散物及びその製造方法、並びに熱現像感光材料及びその製造方法 |
US7022467B1 (en) * | 2004-11-30 | 2006-04-04 | Eastman Kodak Company | Thermally developable materials having improved backside conductive layers |
US8211974B2 (en) | 2005-10-07 | 2012-07-03 | Johns Manville | Curable fiberglass binder comprising a polyacetal or polyketal |
CN101652393B (zh) * | 2007-03-30 | 2012-09-05 | 可乐丽股份有限公司 | 聚乙烯醇缩丁醛树脂颗粒及其制备方法 |
KR101491707B1 (ko) * | 2011-06-28 | 2015-02-09 | 가부시키가이샤 구라레 | 태양 전지용 밀봉재 및 접합유리용 중간막 |
EP3123243B1 (en) * | 2014-03-24 | 2017-11-15 | Sekisui Chemical Co., Ltd. | Polyvinylacetal resin for heat-developable photosensitive material and heat-developable photosensitive material |
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JPH05140211A (ja) * | 1991-11-15 | 1993-06-08 | Sekisui Chem Co Ltd | ポリビニルアセタール樹脂の製造方法 |
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JPS434924Y1 (ja) | 1964-02-05 | 1968-03-02 | ||
US3785830A (en) | 1972-06-14 | 1974-01-15 | Eastman Kodak Co | Photothermographic element,composition and process |
JPS565535A (en) * | 1979-06-27 | 1981-01-21 | Fuji Photo Film Co Ltd | Heat developing photosensitive material |
JPS57185034A (en) | 1981-01-20 | 1982-11-15 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition |
GB8417772D0 (en) | 1984-07-12 | 1984-08-15 | Thorn Emi Domestic Appliances | Carbonating apparatus |
US4772538A (en) | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
US4822720A (en) | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
US4707437A (en) | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4895788A (en) | 1985-08-02 | 1990-01-23 | Hoechst Celanese Corporation | Water developable lithographic composition |
US4652604A (en) | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4780392A (en) | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US5120772A (en) | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
EP0211406A3 (de) | 1985-08-02 | 1988-08-17 | Hoechst Celanese Corporation | Photopolymerisierbares Gemisch mit Polyvinylacetal als Bindemittel und daraus hergestelltes Aufzeichnungsmaterial |
US4927737A (en) | 1985-08-02 | 1990-05-22 | Hoechst Celanese Corporation | Radiation polymerizable composition and element containing a photopolymerizable acrylic monomer |
DE4323897A1 (de) * | 1993-07-16 | 1995-01-19 | Hoechst Ag | Plastifizierte Polymerformkörper aus modifizierten Polyvinylbutyralen |
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2001
- 2001-01-19 DE DE60113974T patent/DE60113974T3/de not_active Expired - Lifetime
- 2001-01-19 WO PCT/JP2001/000337 patent/WO2001053357A1/ja active IP Right Grant
- 2001-01-19 US US10/181,475 patent/US6730464B2/en not_active Expired - Lifetime
- 2001-01-19 EP EP01901455A patent/EP1270608B2/en not_active Expired - Lifetime
-
2004
- 2004-03-02 US US10/790,124 patent/US7176257B2/en not_active Expired - Lifetime
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JPH05140211A (ja) * | 1991-11-15 | 1993-06-08 | Sekisui Chem Co Ltd | ポリビニルアセタール樹脂の製造方法 |
JPH05155915A (ja) * | 1991-12-11 | 1993-06-22 | Sekisui Chem Co Ltd | ポリビニルアセタール樹脂の製造方法 |
JPH10338713A (ja) * | 1997-06-09 | 1998-12-22 | Sekisui Chem Co Ltd | ポリビニルアセタール系樹脂の製造方法及び該製造方法で得られたポリビニルアセタール系樹脂 |
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Also Published As
Publication number | Publication date |
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EP1270608A1 (en) | 2003-01-02 |
US7176257B2 (en) | 2007-02-13 |
US20040166449A1 (en) | 2004-08-26 |
DE60113974T2 (de) | 2006-06-29 |
US6730464B2 (en) | 2004-05-04 |
EP1270608A4 (en) | 2005-02-09 |
DE60113974D1 (de) | 2006-02-23 |
DE60113974T3 (de) | 2011-03-17 |
EP1270608B2 (en) | 2010-10-20 |
US20030109636A1 (en) | 2003-06-12 |
EP1270608B1 (en) | 2005-10-12 |
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