WO2001011408A1 - Dispositif permettant de focaliser de la lumiere sur un objet - Google Patents

Dispositif permettant de focaliser de la lumiere sur un objet Download PDF

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Publication number
WO2001011408A1
WO2001011408A1 PCT/EP2000/007672 EP0007672W WO0111408A1 WO 2001011408 A1 WO2001011408 A1 WO 2001011408A1 EP 0007672 W EP0007672 W EP 0007672W WO 0111408 A1 WO0111408 A1 WO 0111408A1
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WO
WIPO (PCT)
Prior art keywords
light
resonator
laser
ring mode
optical
Prior art date
Application number
PCT/EP2000/007672
Other languages
German (de)
English (en)
Inventor
Gerhard Leuchs
Susanne Quabis
Ralf Dorn
Oliver GLÖCKL
Manfred Eberler
Marc D. Levenson
Original Assignee
Gerhard Leuchs
Susanne Quabis
Ralf Dorn
Gloeckl Oliver
Manfred Eberler
Levenson Marc D
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gerhard Leuchs, Susanne Quabis, Ralf Dorn, Gloeckl Oliver, Manfred Eberler, Levenson Marc D filed Critical Gerhard Leuchs
Priority to EP00954603A priority Critical patent/EP1163548A1/fr
Publication of WO2001011408A1 publication Critical patent/WO2001011408A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10532—Heads
    • G11B11/10541—Heads for reproducing
    • G11B11/10543—Heads for reproducing using optical beam of radiation
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
    • G11B7/1381—Non-lens elements for altering the properties of the beam, e.g. knife edges, slits, filters or stops
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
    • G11B7/1398—Means for shaping the cross-section of the beam, e.g. into circular or elliptical cross-section

Definitions

  • the invention relates to a device for focusing light onto an object, with at least one light source preferably formed by a laser, with at least one optical focusing element and a device for determining the relative position of the focusing element and the object.
  • optical refers to all types of electromagnetic radiation including visible light, infrared and ultraviolet radiation.
  • the recording density is essentially limited by the size of the focal spot focused on the medium.
  • the focal spot focused on the medium As is well known, applies to the
  • the wavelength ⁇ can be reduced by using new laser light sources.
  • CD read / write devices are operated at a wavelength of 780nm, with DVDs a wavelength of 635nm is used.
  • Another starting point is aimed at increasing the numerical aperture NA. This can be done in several ways:
  • the angular spectrum of the emerging light also contains waves with an imaginary wave vector. These are in the far field non-propagating (evanescent) parts negligible, since their amplitude decreases exponentially with increasing distance from the aperture.
  • evanescent non-propagating
  • the geometry of the highly refractive medium is chosen in the form of a hemisphere and the flat side faces the medium to be illuminated, this so-called solid immersion lens (SIL) can be introduced into the beam path of a focusing lens without causing further aberrations (see also US -Patent 5,125,750).
  • SIL solid immersion lens
  • the focal spot size that is effectively effective on a storage medium to be read out can be reduced. If, for example, the reflectivity of the medium is dependent on its temperature (phase transition between solid and liquid phase), the part of the medium that has already been read out and is therefore highly heated is in the molten (ie weakly reflecting) state.
  • the object of the present invention is to provide an apparatus by means of which light can be focused on objects described in more detail below, the focal spot size being reduced in comparison to conventional illumination systems with diffraction limits.
  • the light transmitted by the focusing element is in the form of a radially polarized ring mode.
  • the basic idea is not primarily to shorten the wavelength of the focused light or to increase the numerical aperture of the illuminating optical system with the help of immersion or near-field techniques, but by modifying the field distribution to be focused with regard to its polarization and intensity distribution.
  • a radially polarized ring mode is used which, after focusing, has a focal spot size that is half as large compared to a linearly polarized beam with a homogeneous intensity distribution.
  • there are various embodiments which are described in detail below.
  • the object consists of a carrier material, preferably made of silicon, to which a light-sensitive layer is applied.
  • a sample to be examined is illuminated and scanned point by point.
  • the illuminated object consists of an optical or magneto-optical storage medium.
  • material is evaporated or deposited at the location of the focal spot.
  • the present invention can be used wherever light is to be focused on the smallest possible area.
  • Fig. 1 Intensity distribution of a radially polarized ring mode as a function of
  • a radially polarized ring mode can be generated in modes.
  • the arrows indicate that
  • Fig. 3 A collimated radially polarized ring mode is created with the help of a lens
  • Fig. 5 Dependence of the focal spot area on the NA of the focusing element for homogeneous, linearly polarized field distribution and radially polarized ring mode, each with and without a ring diaphragm.
  • Fig. 6 Schematic structure of an optical data storage system in which one
  • Light source which provides a radially polarized ring mode.
  • Fig. 7 Schematic structure of a lithography system using a light source that provides a radially polarized ring mode.
  • Fig. 8 Schematic structure of a system suitable for repairing lithographic masks, in which a light source is used that uses a radially polarized one
  • Fig. 9 Schematic structure of a confocal microscope using a light source that provides a radially polarized ring mode.
  • FIG. 10 Schematic structure for generating a radially polarized ring mode.
  • Fig. 11 Part b) shows the schematic structure of a
  • Polarization converter which is made of four half-wave plates. The main axes are indicated by lines. Parts a) and c) show the polarization state of the light before (a) and after
  • Fig. 12 Schematic structure of an optical system for illuminating a
  • FIG. 13 Schematic structure of an optical system for the evanscent
  • FIG. 14 Schematic structure of a resonator, in which light at the base of a
  • Partially reflected prism and partially coupled to an object and associated lighting device Partially reflected prism and partially coupled to an object and associated lighting device.
  • Fig. 15 Schematic structure of a laser system in which the beam path runs in such a way that the light is partially reflected on the base surface of a prism and partially coupled out onto an object.
  • Fig. 16 Schematic structure of a resonator in which light is guided in a glass fiber and partially coupled out to an object at one point of the fiber and the associated lighting device.
  • Fig. 17 Schematic structure of a resonator, which is designed in the form of a two-dimensional waveguide structure with associated lighting device.
  • a radially polarized ring mode is understood to mean an electromagnetic field distribution with the following characteristics:
  • the field strength on the axis of symmetry assumes a value that does not differ significantly from zero and has one or more intensity maxima at fixed distances R 0 , R 1 t ... from the axis of symmetry (see Fig. 1).
  • the electric field is locally linearly polarized in each case in a direction lying radially to the axis of symmetry.
  • phase has the same value for all points that are at the same distance from the axis of symmetry.
  • a field distribution can be generated, for example, by superimposing two orthogonally polarized TEM 0m and TEM m0 modes (m odd).
  • a particularly suitable mode results from the superposition of a TEM 10 mode polarized in the x direction and a TEM 01 mode polarized in the y direction (see FIG. 2).
  • Ring mode polarized in the x direction polarized in the y direction
  • a light beam provided by a coherent, polarized (preferably consisting of a laser) light source 35 is first widened with the aid of a telescope consisting of the lenses 36 and 37. If the light source is disturbed by back-reflected light (as is typically the case with a diode laser), an optical isolator 38 can be introduced into the beam path after the light source. Higher transverse modes are selected out by a mode filter (pinhole) 39 attached between the lenses 36 and 37, so that the light after the telescope is in the form of a linearly polarized TEM 00 mode.
  • mode filter pinhole
  • the central element of the structure is the polarization converter 40, which is attached behind the telescope. It consists of at least three half-wave plates which are cut in the form of circular segments and which are joined to one another in such a way that a circular plate is formed again.
  • the polarization converter can be held in a transparent container with the Index matching oil is filled, whose refractive index is equal to the refractive index of the material from which the half-wave plates are made.
  • the main axes of the half-wave plates are oriented such that the direction of polarization of the incident, linearly polarized beam within each segment is rotated in a direction that points radially away from the center of the incident light beam.
  • Fig. 11b shows a polarization converter consisting of four half-wave plates 40i, 40ii, 40iii and 40iv.
  • Fig. 11a and Fig. 11c the polarization of the beam is shown in front of 11a behind 11c the polarization converter.
  • the field distribution thus created after the polarization converter consists of a mode mixture and contains, among other things, the desired TEM 0 r and TEM 10 mode in orthogonal polarization.
  • a Fabry-Perot resonator 41 is used as a spatial mode filter.
  • the telescope and the radii of curvature of the mirrors that make up the Fabry-Perot resonator are matched to one another in such a way that there is a maximum overlap between the modes to be selected and the associated eigenmodes of the resonator.
  • the mirror spacing can be varied periodically with the aid of a piezoelectric adjusting element.
  • the light transmitted by the resonator is then also periodically modulated in intensity. Part of this light can be used to constantly adjust the mirror distance by means of a lock-in control so that the TEM 10 and TEM 01 modes are in resonance.
  • the focal spot also shows complete radial symmetry.
  • this symmetry is broken in the focal spot of a linearly polarized field distribution, since one direction is distinguished by the linear polarization.
  • the focal spot has the shape of a twisted ellipse (dog bones).
  • focal spot here means the energy density distribution of the electric field in the focal plane.
  • the area of this focal spot (area occupied by the energy density distribution at half the maximum value) is only slightly smaller with very strong focusing (i.e. high numerical aperture of the focusing element) than in the case of a linearly polarized field distribution with an approximately constant intensity profile.
  • the focal area can be further reduced if (as shown in Fig. 4) an annular diaphragm 2 is brought into the beam path. This suppresses the low-frequency components of the angular spectrum of the focused field distribution.
  • Fig. 5 shows the dependence of the focal spot area on the numerical aperture NA of the focusing element 1, in each case for linearly polarized, homogeneous field distribution and radially polarized ring mode.
  • NA numerical aperture
  • the fields each meet directly with the focusing element, with the other two curves an aperture is inserted which only allows an annular portion between 90% and 100% of the radius of the entrance aperture of the focusing element to pass.
  • the focus is strong (NA> 0.85) and a ring diaphragm is used, the radially polarized ring mode can be used to achieve focal spot areas that are significantly smaller than the focal spots that can be generated when illuminated with linearly polarized light.
  • a solid immersion lens which consists of a material with a high refractive index, can additionally be attached between the actual focusing element and the object. Since the wavelength in the material is reduced by a factor of n, the area of the focal spot is reduced by a factor of n 2 .
  • the hemispherically shaped immersion lens must be attached so that the curved surface faces the focusing element and the flat surface coincides with the focal plane of the system without an immersion lens. However, the illuminated object must then be at a distance from the flat surface of the immersion lens that is smaller than the illumination wavelength.
  • Fig. 6 shows the schematic structure of an optical data storage system in which a light source 3 is used which provides a radially polarized ring mode.
  • the ring mode is then filtered by means of a ring diaphragm 2 and focused on a data carrier 4 with the aid of an optical focusing element 1.
  • On Servo system 5 makes it possible to move one or more components of the focusing element and thereby to focus the focal spot exactly to a certain depth in the data carrier material or on the surface of the data carrier.
  • the light source emits with high intensity for writing information. This burns holes in the surface of the data storage layer or changes other physical properties of the layer. In order to be able to write zero or one bits, the intensity of the light source is modulated either directly or by an external modulator 6.
  • the light source is set to a weaker intensity, which is not sufficient to change the information stored on the data storage layer.
  • the light reflected from the data memory is directed via a beam splitter 7 to a detector 8 which is connected to a decoding unit.
  • the data carrier is moved relative to the focal spot with the aid of adjusting elements and, in the simplest case, is designed in the form of a rotating disk.
  • the amount of information that can be stored on the data carrier is determined by the size of the focal spot. Due to the radially polarized ring mode and when using a ring diaphragm 2, this spot size can be halved and the storage density can thereby be doubled.
  • Fig. 7 shows the schematic structure of a lithography system for point-by-point writing of structures, in which a light source 3 is used which provides a radially polarized ring mode.
  • the ring mode is filtered by means of a ring diaphragm 2 and focused by a focusing element 1 onto a wafer 11 provided with a light-sensitive layer 10.
  • the focusing element 1 can be displaced by means of a servo system 5 such that the focal spot lies in the plane of the light-sensitive layer 10.
  • the wafer is moved parallel to the focal plane by an actuating element 12 and exposed at certain points at the corresponding points.
  • the light source can be varied either directly or with the aid of a modulator 6.
  • the system outlined in Fig. 8 is used to repair masks, which are mainly used in lithography.
  • the mask 13 to be repaired which usually consists of a glass plate to which a chromium structure is applied, is made using a microscope objective 14, tube lens 15 and eyepiece 16 Existing microscope examined for defects.
  • the light source 17, the lenses 18 and 19 and the beam splitter 20 form the lighting system.
  • illumination with transmitted light arrangement or dark field illumination is also possible.
  • a radially polarized ring mode which is made available by the light source 3, is coupled into the beam path of the microscope via a second beam splitter 21. After filtering with the aid of a ring diaphragm 2, the microscope objective 14 focuses it on the mask 13.
  • the light source 3 When the mask is inspected, the light source 3 operates at low intensity.
  • the mask is shifted by means of an xyz shift element 22 until a defective spot comes to lie under the focal spot of the ring mode.
  • the shutter 23 is then closed and the intensity of the light source 3 is increased to a suitable value.
  • the ring mode evaporates excess material (e.g. chrome) at the location of the focal spot.
  • a missing structure can also be deposited on the mask.
  • the displacement unit and mask are located in a container 24 which is filled with a suitable process gas containing chromium.
  • the mask In order to protect the optical elements from deposits of the process gas, the mask is illuminated by a window 25. Due to the high intensity in the focal spot, the process gas is decomposed and chromium separates (chemical vapor deposition).
  • the focal spot area of the focused ring mode which is greatly reduced compared to conventional methods, allows a more precise and targeted repair.
  • Fig. 9 shows schematically the structure of a confocal miroscope, in which a light source 3 is used to illuminate the object, which provides a radially polarized ring mode. After filtering through a ring diaphragm 2, the ring mode is focused by means of a microscope objective 26. Object 27 rests an xyz displacement element 28 and can thus be positioned so that the focus comes to lie at any desired point within the object. The scattered light which arises in the area of the focus is directed onto a detector 31 by means of the microscope objective 26, the beam splitter 34, the tube lens 29 and the lens 30.
  • a special feature of the confocal microscope is the pinhole 32, which is attached between the tube lens 29 and the lens 30 and prevents light from an area outside the focus from reaching the detector. This is indicated in Fig. 9 by the rays drawn in dashed lines.
  • the control unit 33 For a measurement, one volume element of the object after the other is moved into focus by the control unit 33 and the backscattered intensity measured by the detector 31 is evaluated.
  • illumination in a transmitted light arrangement is also possible.
  • Fig. 12 shows the schematic structure of an optical system with the aid of which a radially polarized ring mode provided by the light source 3 can be focused on an object 42.
  • the object (as described in more detail elsewhere) can be an optical data storage medium, a photomask, a wafer coated with photosensitive material or a sample to be examined with a microscope.
  • the ring mode is focused using an optical focusing element 1.
  • a solid immersion lens (so-called solid immersion lens) 43 is attached symmetrically to the optical axis 44 in such a way that its flat underside faces the object and, moreover, lies in the plane in which the focal spot of the lens is located even in the absence of the immersion lens Focusing element 1 is focused light.
  • n denotes the refractive index of the material from which the immersion lens is made.
  • the illuminated object must be at a distance from the flat side of the immersion lens that is smaller than the illumination wavelength.
  • the immersion lens is provided with a highly reflective coating 46 on its curved surface (see Fig 13), so that the intensity on the object is less dependent on the distance between the object and the immersion lens
  • the evanescent field farnesoid total reflection
  • the loss channel thus created also reduces the number of photons stored in the resonator and thus the amplitude of the evanescent waves, so that the intensity on the object drops again.
  • the resonator thus acts like a control loop, which ensures that the intensity on the object is significantly less sensitive to the distance between the object and the immersion lens than in the case of the uncoated immersion lens.
  • Fig. 14 shows the schematic structure of a resonator, which consists of mirrors 51 and 52 and a prism 53.
  • the geometry of the resonator and the refractive index n of the material from which the prism 53 is made are selected so that the light guided in the resonator experiences total reflection at the interface between the base of the prism and the environment (typically air).
  • evanescent (non-propagating) waves then arise, the amplitude of which decreases exponentially with increasing distance from the base surface of the prism.
  • An object 54 which is approximated to the interface with the aid of a positioning element 55 must therefore be at a distance of the order of the wavelength or below the interface if it is to be illuminated with detectable intensity.
  • the illuminated area on the object is essentially determined by the beam diameter of the mode propagating in the resonator at the point of total reflection.
  • the radius of curvature and the position of the mirrors is selected so that the beam waist of this resonator mode is at the point of total reflection.
  • the presence of the medium 53 with the refractive index n additionally reduces the focal spot area (cross-sectional area of the beam waist) by the factor n 2 (immersion effect).
  • the pump light provided by a light source 56 which preferably comprises a laser, is coupled into the resonator with the aid of a focusing device 57.
  • the focusing element has to be adjusted in such a way that the overlap between the mode of the pump light and the excited natural mode of the resonator becomes as large as possible. If the resonator fulfills the resonance condition, either by detuning the wavelength of the pump light or by varying the resonator length by means of an adjusting element 57, which is attached to one of the both mirrors is attached can happen, a strong field is built up in the resonator.
  • the light circulating in the resonator experiences total total reflection there and the number of photons stored in the resonator (or the field strength) is only limited by the limited reflectivity of the mirrors and adjustment errors etc.
  • the amplitude of the evanescent waves then also becomes maximum. If one approaches an object 54 to the medium embodied here as a prism, part of the light reflected at the prism base is coupled out onto the object (frustrated total reflection). The closer the object comes to the interface, the more the amplitude of the evanescent waves increases at the location of the object and the more light is coupled out onto the object.
  • the loss channel created in this way also reduces the number of photons stored in the resonator and thus the amplitude of the evanescent waves, so that the intensity on the object drops again.
  • the resonator thus acts like a control loop, which ensures that the intensity on the object depends much less sensitively on the distance between the object and the medium (prism) than in the case of illumination of the interface (prism base) with total reflection without an additional resonator.
  • the light source can also be integrated into the resonator.
  • the combination of laser-active medium 59 and optical pump source 60 then forms a laser system together with the mirrors 51 and 52 and the interface of the medium 53 illuminated under total reflection, which function as a resonator.
  • the medium at whose interface the total reflection takes place can also be designed as an optical optical fiber 61, as shown in FIG. 16.
  • the light propagating in the medium is then not only totally reflected at one point, but is guided in the medium with periodic total reflection.
  • the resonator can either be formed by a highly reflective coating on the fiber ends or by mirrors (62 and 63) attached to the beginning and end of the fiber.
  • the fiber cladding 65 which has a refractive index which is slightly lower than that of the fiber core, must be removed to such an extent that the object 54 is removed from the interface to a distance which is less than the light wavelength between the fiber core and the fiber cladding, on which the evanescent waves arise, can be approximated.
  • the fiber itself can also be doped with a laser-active material and optically pumped, so that a fiber laser is created.
  • the resonator or the medium in which the total reflection takes place is in the form of a two-dimensional waveguide structure 75.
  • This consists of a hemisphere or spherical cap, the outer shell of which has a higher refractive index n 'than the inner region, which is made of a material with the refractive index n.
  • Such a structure can be produced, for example, from a glass sphere, in which the sodium ions are partially exchanged for silver ions in a suitable melt on the surface of the sphere and which is then sawn into two hemispheres or spherical sections.
  • Light that is coupled into the shell with the refractive index n ' on the flat side of the hemisphere propagates therein under total reflection to pole 76 and further to a point opposite the coupling-in point.
  • the flat side is provided with a highly reflective coating 77 so that the outer shell becomes a resonator.
  • the lighting device 78 With the aid of the lighting device 78, light is coupled in at all points of the shell on the flat side of the hemisphere or spherical cap. The further this light propagates to the pole, the steeper the angle between the direction of propagation and the optical axis 79. At the pole, all rays meet at an angle of 90 ° to the optical axis.
  • the shell structure For efficient coupling into the shell structure, there is a suitable diffractive element 81 between the lighting device, which provides a radially polarized ring mode, and the resonator, which ensures that the majority of the light emitted by the light source is directed onto the shell structure.
  • the outer shell of the hemisphere can also consist of a laser-active material in this embodiment. The resulting laser resonator must then also be optically pumped from the outside.

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  • Optics & Photonics (AREA)
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Abstract

La présente invention concerne un dispositif permettant de focaliser de la lumière sur un objet. Ce dispositif comprend au moins une source lumineuse, formée de préférence par un laser, au moins un élément de focalisation optique, ainsi qu'un dispositif permettant de fixer la position relative dudit élément de focalisation et de l'objet. La lumière envoyée à travers l'élément de focalisation se présente sous forme d'un mode annulaire radialement polarisé.
PCT/EP2000/007672 1999-08-09 2000-08-08 Dispositif permettant de focaliser de la lumiere sur un objet WO2001011408A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP00954603A EP1163548A1 (fr) 1999-08-09 2000-08-08 Dispositif permettant de focaliser de la lumiere sur un objet

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ATA1364/99 1999-08-09
AT136499A ATA136499A (de) 1999-08-09 1999-08-09 Einrichtung zum beleuchten eines objektes mit fokussiertem licht

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WO2001011408A1 true WO2001011408A1 (fr) 2001-02-15

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Cited By (3)

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Publication number Priority date Publication date Assignee Title
WO2008039156A1 (fr) * 2006-09-25 2008-04-03 Agency For Science, Technology And Research Système et procédé de mise au point optique
US7379543B2 (en) 2001-03-09 2008-05-27 Ayman, Llc. Universal point of contact identifier system and method
US9254222B2 (en) 2004-03-23 2016-02-09 Carl Zeiss Meditec Ag Material machining device and method

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