WO2000065302A1 - Interferometric apparatus and method that compensate refractive index fluctuations - Google Patents

Interferometric apparatus and method that compensate refractive index fluctuations Download PDF

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Publication number
WO2000065302A1
WO2000065302A1 PCT/US2000/005859 US0005859W WO0065302A1 WO 2000065302 A1 WO2000065302 A1 WO 2000065302A1 US 0005859 W US0005859 W US 0005859W WO 0065302 A1 WO0065302 A1 WO 0065302A1
Authority
WO
WIPO (PCT)
Prior art keywords
interferometric
refractive index
measurement path
wafer
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2000/005859
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English (en)
French (fr)
Inventor
Peter J. De Groot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Priority to EP00913773A priority Critical patent/EP1194731A4/en
Priority to JP2000613997A priority patent/JP4510937B2/ja
Publication of WO2000065302A1 publication Critical patent/WO2000065302A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object

Definitions

  • Figs. 3a and 3b are flowcharts of steps of methods for practicing the invention; Fig. 3 a representing the steps for making measurements and Fig. 3b the steps for initializing for the inverse dispersive power, Y , to update values of T used in the measurement steps;
  • System 10 comprises interferometric apparatus 12 and a computer 14 that interfaces with the interferometric apparatus 12 in a well-known manner via link 16 to exchange housekeeping and control signals.
  • computer 14 Resident in computer 14 is application software for implementing various algorithms that are subsequently described and system software by which a user can operate system 10 through the use of a graphical user interface (GUI) and/or other input devices such as a keyboard or mouse.
  • GUI graphical user interface
  • a laser source can be a gas laser, e.g. a HeNe, stabilized in any of a variety of conventional techniques known to those skilled in the art, see for example, T. Baer et al., "Frequency Stabilization of a 0.633 ⁇ m He-Ne-longitudinal Zeeman Laser," Applied Optics, 19, 3173-3177 (1980); Burgwald et al., U.S. Pat. No. 3,889,207, issued June 10, 1975; and Sandstrom et al., U.S. Pat. No. 3,662,279, issued May 9, 1972.
  • the laser can be a diode laser frequency stabilized by one of a variety of conventional techniques known to those skilled in the art, see, for example, T. Okoshi and K. Kikuchi, "Frequency Stabilization of Semiconductor
  • Step 254 is a wafer process which is called a pre-process wherein, by using the so prepared mask and wafer, circuits are formed on the wafer through lithography.
  • Step 255 is an assembling step, which is called a post-process wherein the wafer

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
PCT/US2000/005859 1999-04-28 2000-03-07 Interferometric apparatus and method that compensate refractive index fluctuations Ceased WO2000065302A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP00913773A EP1194731A4 (en) 1999-04-28 2000-03-07 INTERFEROMETRICAL APPARATUS AND METHOD WITH FLUZZING COMPENSATION OF THE BREAKING INDEX
JP2000613997A JP4510937B2 (ja) 1999-04-28 2000-03-07 屈折率変動を補償する干渉装置および方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/301,301 US6417927B2 (en) 1999-04-28 1999-04-28 Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
US09/301,301 1999-04-28

Publications (1)

Publication Number Publication Date
WO2000065302A1 true WO2000065302A1 (en) 2000-11-02

Family

ID=23162792

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/005859 Ceased WO2000065302A1 (en) 1999-04-28 2000-03-07 Interferometric apparatus and method that compensate refractive index fluctuations

Country Status (5)

Country Link
US (1) US6417927B2 (https=)
EP (1) EP1194731A4 (https=)
JP (1) JP4510937B2 (https=)
TW (1) TW424135B (https=)
WO (1) WO2000065302A1 (https=)

Cited By (7)

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JP2006505778A (ja) * 2002-11-04 2006-02-16 ザイゴ　コーポレーション 干渉計経路内の屈折度の摂動の補正
WO2008051232A3 (en) * 2006-10-25 2009-05-07 Zygo Corp Compensation of effects of atmospheric perturbations in optical metrology
US7812965B2 (en) 2006-12-11 2010-10-12 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
US7812964B2 (en) 2006-11-15 2010-10-12 Zygo Corporation Distance measuring interferometer and encoder metrology systems for use in lithography tools
US7826063B2 (en) 2005-04-29 2010-11-02 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
US7894075B2 (en) 2006-12-11 2011-02-22 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
CN115077424A (zh) * 2022-07-15 2022-09-20 南昌昂坤半导体设备有限公司 一种实时晶圆片表面曲率检测装置及方法

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US6842256B2 (en) * 2001-11-15 2005-01-11 Zygo Corporation Compensating for effects of variations in gas refractivity in interferometers
AU2002360461A1 (en) * 2001-12-03 2003-06-17 Zygo Corporation Compensating for effects of non-isotropics gas mixtures in interferometers
TWI259898B (en) * 2002-01-24 2006-08-11 Zygo Corp Method and apparatus for compensation of time-varying optical properties of gas in interferometry
TWI304157B (en) * 2002-11-27 2008-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7075619B2 (en) * 2002-12-12 2006-07-11 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
WO2004113826A2 (en) * 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
US7327465B2 (en) * 2003-06-19 2008-02-05 Zygo Corporation Compensation for effects of beam misalignments in interferometer metrology systems
US7180603B2 (en) * 2003-06-26 2007-02-20 Zygo Corporation Reduction of thermal non-cyclic error effects in interferometers
DE10334350B3 (de) * 2003-07-25 2005-02-03 Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Arbeit, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt Verfahren zur Bestimung der Brechzahl bei interferometrischen Längenmessungen und Interferometeranordnung hierfür
WO2005067579A2 (en) * 2004-01-06 2005-07-28 Zygo Corporation Multi-axis interferometers and methods and systems using multi-axis interferometers
US7310152B2 (en) * 2004-03-03 2007-12-18 Zygo Corporation Interferometer assemblies having reduced cyclic errors and system using the interferometer assemblies
US7375823B2 (en) * 2004-04-22 2008-05-20 Zygo Corporation Interferometry systems and methods of using interferometry systems
US7280224B2 (en) * 2004-04-22 2007-10-09 Zygo Corporation Interferometry systems and methods of using interferometry systems
WO2006014406A2 (en) 2004-06-30 2006-02-09 Zygo Corporation Interferometric optical assemblies and systems including interferometric optical assemblies
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
US7433049B2 (en) * 2005-03-18 2008-10-07 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US20060242669A1 (en) * 2005-04-20 2006-10-26 Jupiter Systems Display node for use in an audiovisual signal routing and distribution system
US7271917B2 (en) * 2005-05-03 2007-09-18 Asml Netherlands B.V. Lithographic apparatus, position quantity detection system and method
DE102007055665A1 (de) * 2007-11-21 2009-05-28 Dr. Johannes Heidenhain Gmbh Interferometeranordnung und Verfahren zu deren Betrieb
JP5361230B2 (ja) * 2008-03-26 2013-12-04 株式会社ミツトヨ ２波長レーザ干渉計評価校正方法、評価校正装置および評価校正システム
JP5245740B2 (ja) * 2008-11-13 2013-07-24 株式会社ニコン 露光装置及び露光方法
US8120781B2 (en) 2008-11-26 2012-02-21 Zygo Corporation Interferometric systems and methods featuring spectral analysis of unevenly sampled data
US8107084B2 (en) * 2009-01-30 2012-01-31 Zygo Corporation Interference microscope with scan motion detection using fringe motion in monitor patterns
JP5489658B2 (ja) * 2009-11-05 2014-05-14 キヤノン株式会社 計測装置
JP5602538B2 (ja) * 2010-03-03 2014-10-08 キヤノン株式会社 光波干渉計測装置
JP5602537B2 (ja) * 2010-08-19 2014-10-08 キヤノン株式会社 光波干渉計測装置
JP5704897B2 (ja) * 2010-11-11 2015-04-22 キヤノン株式会社 干渉計測方法および干渉計測装置
CN102033053B (zh) * 2010-11-12 2012-06-20 浙江理工大学 基于激光合成波长干涉的空气折射率测量方法及装置
US10356072B2 (en) * 2015-06-04 2019-07-16 Ricoh Company, Ltd. Data process system, data process apparatus, and data protection method
JP6686201B2 (ja) * 2019-03-22 2020-04-22 株式会社東京精密 距離測定装置、および距離測定方法
JP7494066B2 (ja) * 2020-09-14 2024-06-03 キヤノン株式会社 露光装置、及び物品の製造方法
JP7731699B2 (ja) * 2021-06-09 2025-09-01 キヤノン株式会社 ステージ装置、露光装置、及び物品の製造方法

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006505778A (ja) * 2002-11-04 2006-02-16 ザイゴ　コーポレーション 干渉計経路内の屈折度の摂動の補正
US7826063B2 (en) 2005-04-29 2010-11-02 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
WO2008051232A3 (en) * 2006-10-25 2009-05-07 Zygo Corp Compensation of effects of atmospheric perturbations in optical metrology
US7812964B2 (en) 2006-11-15 2010-10-12 Zygo Corporation Distance measuring interferometer and encoder metrology systems for use in lithography tools
US7812965B2 (en) 2006-12-11 2010-10-12 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
US7894075B2 (en) 2006-12-11 2011-02-22 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
CN115077424A (zh) * 2022-07-15 2022-09-20 南昌昂坤半导体设备有限公司 一种实时晶圆片表面曲率检测装置及方法
CN115077424B (zh) * 2022-07-15 2022-11-04 南昌昂坤半导体设备有限公司 一种实时晶圆片表面曲率检测装置及方法

Also Published As

Publication number Publication date
JP4510937B2 (ja) 2010-07-28
EP1194731A1 (en) 2002-04-10
EP1194731A4 (en) 2006-09-27
JP2002543372A (ja) 2002-12-17
US6417927B2 (en) 2002-07-09
TW424135B (en) 2001-03-01
US20020001086A1 (en) 2002-01-03

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