WO2000018189A1 - Thin film heating element - Google Patents
Thin film heating element Download PDFInfo
- Publication number
- WO2000018189A1 WO2000018189A1 PCT/AU1999/000791 AU9900791W WO0018189A1 WO 2000018189 A1 WO2000018189 A1 WO 2000018189A1 AU 9900791 W AU9900791 W AU 9900791W WO 0018189 A1 WO0018189 A1 WO 0018189A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- heating element
- thin film
- solution
- rare earth
- element according
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 40
- 239000010409 thin film Substances 0.000 title claims abstract description 24
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 229910052684 Cerium Inorganic materials 0.000 claims abstract description 13
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 13
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims abstract description 13
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 7
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000000197 pyrolysis Methods 0.000 claims abstract description 7
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 7
- 239000011701 zinc Substances 0.000 claims abstract description 7
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 5
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical compound CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 claims abstract description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 19
- 150000004706 metal oxides Chemical class 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 14
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 239000011737 fluorine Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 4
- 125000002524 organometallic group Chemical group 0.000 claims description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical group [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 4
- 238000000137 annealing Methods 0.000 claims description 2
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical group Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 235000005074 zinc chloride Nutrition 0.000 claims description 2
- 239000011592 zinc chloride Substances 0.000 claims description 2
- 150000001805 chlorine compounds Chemical class 0.000 claims 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 2
- NPAIMXWXWPJRES-UHFFFAOYSA-N butyltin(3+) Chemical compound CCCC[Sn+3] NPAIMXWXWPJRES-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 description 25
- 239000002019 doping agent Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002241 glass-ceramic Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002910 rare earth metals Chemical class 0.000 description 3
- 238000005118 spray pyrolysis Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 230000003019 stabilising effect Effects 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- -1 silicon nitrides Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
Definitions
- This invention relates to heating elements of the kind including an electrically conductive metal oxide film on an electrically insulating substrate.
- Such devices are known, and may for example consist of a thin film of tin oxide deposited on a glass substrate by means of pyrolitic deposition.
- Such thin film heating elements are to be used in electrical appliances such as cooktops, it is desirable that they be capable of operating at high temperatures, up to 650°C. In applications such as electric kettles where the heating element is small, the element must be capable of handling high power densities, of the order of 10- 20 Watts cm "2 .
- Prior art devices have not proved satisfactory in these conditions. It has been found by the present applicants that tin oxide layers tend to become unstable with increasing temperature, due to the tendency for the oxide to change state. It has also been found that where fluorine is employed as an electron donor or conductivity carrier the properties of the film change irreversibly with increasing temperature, apparently due to the fluorine tending to leave the film at temperatures above 400°C.
- US Patent No. 4,889,974 of Auding, et al. describes thin film elements intended for temperatures beyond 600°C, using oxide films doped at high levels with pairs of compensating foreign atoms.
- the metal oxide films are doped with, maximally, 10 mol % of each of the foreign atoms compensating each other in pairs, the quantity of said acceptor-forming elements and said donor- forming elements differing maximally by 10%.
- the Auding patent describes the use of indium, boron, aluminium or zinc as the acceptor- forming dopant, and antimony or fluorine as the donor-forming dopant.
- a metal oxide layer of satisfactory stability in high power density applications may be obtained by doping with at least one and preferably two rare earth elements.
- the rare earth dopants are preferably cerium and lanthanum. Preferably these two rare earths are present in substantially equal concentrations.
- the presence of the rare earth dopants in the thin film layer has been found by the present applicants to have the effect of stabilising the oxidation state of the metal.
- the invention resides in a thin film electrical heating element including a layer of an electrically conducting metal oxide on an electrically insulating substrate, said metal oxide layer being doped with at least one rare earth element.
- the metal oxide is deposited on the substrate by pyrolysis of an organometallic base solution containing the at least one rare earth element.
- the metal oxide layer is tin oxide and contains two rare earth elements such as cerium and lanthanum.
- This aspect of the invention provides a thin film heating element which is capable of withstanding power densities of up to 10-20 Watts cm “" and/or temperatures in excess of 600°C.
- the invention resides in a method for the manufacture of a thin film heating element including the step of depositing a layer of metal oxide onto an electrically insulating substrate by pyrolysis of an organometallic base solution containing at least one rare earth element.
- the base solution contains both cerium and lanthanum in concentrations up to 5 mol %.
- Fig. 1 is graph showing the power dissipation versus time relationship for a thin film heating element made according to the invention.
- Fig. 2 shows the relationship between temperature and power at steady state for five elements having power ratings between 500 and 1330 watts.
- concentrations in the pyrolysis solution of 0.01 mol % preferred concentrations of each of the cerium and lanthanum are between approximately 1.25 mol % and approximately 3.75 mol %.
- concentrations in the pyrolysis solution of 0.01 mol % preferred concentrations of each of the cerium and lanthanum are between approximately 1.25 mol % and approximately 3.75 mol %.
- concentration of these rare earths will be chosen as that which contributes to film stability at the power densities for which the film is intended. Best results for films intended for operation at 20 Watts cm " " have been obtained using equal concentrations of approximately 2.5 mol %.
- the film is preferably doped with substantially equal quantities of donor and acceptor elements, the preferred dopants being antimony and zinc.
- concentrations of both antimony and zinc will be influenced by the resistivity which is required. We have found base solution concentrations for these materials in the region of 2.8 mol % to be suitable for heating element applications.
- a useful characteristic of such films in their application as heating elements arises from the positive temperature coefficient resistance of the film. This enables elements to be produced which are self-regulating, in that they will initially operate at a higher wattage and, with increasing temperature, stabilise at the lower design wattage.
- Suitable substrates include glass ceramics, silicon nitrides and other ceramic substrates as well as metallic substrates coated with high-temperature stable, electrically-insulating materials.
- the preferred substrate temperatures for applying the base solution with dopants range from 500 to 750°C.
- post annealing at approximately 600°C for at least one hour is carried out to assist in stabilising the film.
- Films according to this invention were manufactured from a solution using the spray pyrolysis process.
- monobutyl tin trichloride was used as a base solution, with 2.8 mol % antimony chloride, 2.8 mol % zinc chloride, 2.5 mol % cerium and 2.5 mol % lanthanum.
- These films were fabricated with effective resistances of 26 ohm, 30 ohm and 45 ohm to enable heaters of 2.2 kW, 1.8 kW and 1.2 kW respectively to be used, powered by a 240V mains supply voltage.
- the films were selectively deposited using high temperature masking inks which were removed by brushing after deposition of the film.
- the films deposited had a high degree of transparency.
- the resistive properties of the heating elements remained unchanged after 3500 cycles (40 minutes on and 20 minutes off) at 650°C.
- Fig. 1 shows the typical behaviour of the elements, where power dissipation is plotted against time of operation.
- the dissipation of the element commences at a high level and decreases as the resistance of the element increases with temperature, until a steady state condition is achieved at the design power consumption.
- power dissipation will temporarily increase, assisting in achieving rapid heating.
- Fig. 2 shows the relationship between temperature and power at steady state for five elements having power ratings between 500 and 1330 watts.
- Sheet resistances varying from around 60 ohms to above 400 ohms have been fabricated by varying the number of spray passes.
- the thin film thickness could be varied between 2000 Angstrom Units to around 14000 Angstrom Units by varying the number of spray passes.
- the films were deposited on various substrates including glass ceramics, alumina, silica glass and silicon nitride.
- films made in accordance with the invention may be used in low temperature applications, such as comfort heating, refrigerating defrost, and general heating.
- Heating elements of tubular shape manufactured using the above technology can be used in heat exchangers for flow applications, air-conditioning re-heaters, hair dryers, washing and drying appliances, and can also be used as radiating surfaces.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Resistance Heating (AREA)
- Surface Heating Bodies (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000571716A JP2002525829A (ja) | 1998-09-18 | 1999-09-17 | 薄膜加熱素子 |
CA002344486A CA2344486A1 (en) | 1998-09-18 | 1999-09-17 | Thin film heating element |
NZ510655A NZ510655A (en) | 1998-09-18 | 1999-09-17 | Thin film heating element having a metal oxide layer doped with one rare earth element and being deposited on to a substrate from an organometallic base solution |
EP99947118A EP1120014A4 (en) | 1998-09-18 | 1999-09-17 | THIN FILM HEATER. |
KR1020017003505A KR20010079859A (ko) | 1998-09-18 | 1999-09-17 | 박막형 가열소자 |
BR9913812-3A BR9913812A (pt) | 1998-09-18 | 1999-09-17 | Elemento aquecedor de filme fino |
AU60712/99A AU751515B2 (en) | 1998-09-18 | 1999-09-17 | Thin film heating element |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AUPP5995A AUPP599598A0 (en) | 1998-09-18 | 1998-09-18 | Self-regulating nanoscale heating element |
AUPP5995 | 1998-09-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000018189A1 true WO2000018189A1 (en) | 2000-03-30 |
Family
ID=3810212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/AU1999/000791 WO2000018189A1 (en) | 1998-09-18 | 1999-09-17 | Thin film heating element |
Country Status (10)
Country | Link |
---|---|
EP (1) | EP1120014A4 (zh) |
JP (1) | JP2002525829A (zh) |
KR (1) | KR20010079859A (zh) |
CN (1) | CN1146301C (zh) |
AU (1) | AUPP599598A0 (zh) |
BR (1) | BR9913812A (zh) |
CA (1) | CA2344486A1 (zh) |
ID (1) | ID29148A (zh) |
NZ (1) | NZ510655A (zh) |
WO (1) | WO2000018189A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10110789C1 (de) * | 2001-03-06 | 2002-07-04 | Schott Glas | Kochgerät mit einer nicht planaren, mehrdimensional geformten Kochfläche aus Glas- oder Glaskeramik |
DE10110792B4 (de) * | 2001-03-06 | 2004-09-23 | Schott Glas | Keramisches Kochsystem mit Glaskeramikplatte,Isolationsschicht und Heizelementen |
WO2008101405A1 (en) * | 2007-02-13 | 2008-08-28 | Advanced Materials Enterprises Co., Ltd | Heating apparatus and method for making the same |
US7926209B2 (en) | 2007-02-13 | 2011-04-19 | Advanced Materials Enterprises Company Limited | Electric iron |
US9493906B2 (en) | 2003-11-20 | 2016-11-15 | Koninklijke Philips N.V. | Thin-film heating element |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100466865C (zh) * | 2005-03-21 | 2009-03-04 | 冷同桂 | 一种复合金属电热膜溶胶及其制备方法 |
WO2009105945A1 (en) * | 2008-02-28 | 2009-09-03 | Advanced Materials Enterprises Co., Ltd. | Electric iron |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU886328A1 (ru) * | 1980-03-28 | 1981-11-30 | Институт Электроники Ан Белсср | Токопровод щий материал дл пленочных электронагревателей |
US4849252A (en) * | 1983-07-08 | 1989-07-18 | Schott-Glasswerke | Dipping process for the production of transparent, electrically conductive, augmented indium oxide layers |
US4889974A (en) * | 1987-02-21 | 1989-12-26 | U.S. Philips Corporation | Thin-film heating element |
CN1082803A (zh) * | 1992-07-09 | 1994-02-23 | 连铁军 | 一种耐高温透明电热膜及其生产方法 |
US5616266A (en) * | 1994-07-29 | 1997-04-01 | Thermal Dynamics U.S.A. Ltd. Co. | Resistance heating element with large area, thin film and method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07105282B2 (ja) * | 1988-05-13 | 1995-11-13 | 富士ゼロックス株式会社 | 抵抗体及び抵抗体の製造方法 |
-
1998
- 1998-09-18 AU AUPP5995A patent/AUPP599598A0/en not_active Abandoned
-
1999
- 1999-09-17 WO PCT/AU1999/000791 patent/WO2000018189A1/en not_active Application Discontinuation
- 1999-09-17 KR KR1020017003505A patent/KR20010079859A/ko not_active Application Discontinuation
- 1999-09-17 CN CNB998107727A patent/CN1146301C/zh not_active Expired - Fee Related
- 1999-09-17 CA CA002344486A patent/CA2344486A1/en not_active Abandoned
- 1999-09-17 BR BR9913812-3A patent/BR9913812A/pt not_active IP Right Cessation
- 1999-09-17 NZ NZ510655A patent/NZ510655A/en unknown
- 1999-09-17 ID IDW20010871A patent/ID29148A/id unknown
- 1999-09-17 JP JP2000571716A patent/JP2002525829A/ja active Pending
- 1999-09-17 EP EP99947118A patent/EP1120014A4/en not_active Withdrawn
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU886328A1 (ru) * | 1980-03-28 | 1981-11-30 | Институт Электроники Ан Белсср | Токопровод щий материал дл пленочных электронагревателей |
US4849252A (en) * | 1983-07-08 | 1989-07-18 | Schott-Glasswerke | Dipping process for the production of transparent, electrically conductive, augmented indium oxide layers |
US4889974A (en) * | 1987-02-21 | 1989-12-26 | U.S. Philips Corporation | Thin-film heating element |
CN1082803A (zh) * | 1992-07-09 | 1994-02-23 | 连铁军 | 一种耐高温透明电热膜及其生产方法 |
US5616266A (en) * | 1994-07-29 | 1997-04-01 | Thermal Dynamics U.S.A. Ltd. Co. | Resistance heating element with large area, thin film and method |
Non-Patent Citations (2)
Title |
---|
DATABASE WPI Derwent World Patents Index; Class L03, AN 1982-85260E/40 * |
DATABASE WPI Derwent World Patents Index; Class L03, AN 1995-170973/23 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10110789C1 (de) * | 2001-03-06 | 2002-07-04 | Schott Glas | Kochgerät mit einer nicht planaren, mehrdimensional geformten Kochfläche aus Glas- oder Glaskeramik |
DE10110792B4 (de) * | 2001-03-06 | 2004-09-23 | Schott Glas | Keramisches Kochsystem mit Glaskeramikplatte,Isolationsschicht und Heizelementen |
US9493906B2 (en) | 2003-11-20 | 2016-11-15 | Koninklijke Philips N.V. | Thin-film heating element |
WO2008101405A1 (en) * | 2007-02-13 | 2008-08-28 | Advanced Materials Enterprises Co., Ltd | Heating apparatus and method for making the same |
EP2111728A1 (en) * | 2007-02-13 | 2009-10-28 | Advanced Materials Enterprises Co., Ltd | Heating apparatus and method for making the same |
EP2111728A4 (en) * | 2007-02-13 | 2010-10-27 | Advanced Materials Entpr Co Lt | HEATING DEVICE AND METHOD FOR THE PRODUCTION THEREOF |
US7926209B2 (en) | 2007-02-13 | 2011-04-19 | Advanced Materials Enterprises Company Limited | Electric iron |
US8193475B2 (en) | 2007-02-13 | 2012-06-05 | Advanced Materials Enterprises Company Limited | Heating apparatus and method for making the same |
Also Published As
Publication number | Publication date |
---|---|
CN1146301C (zh) | 2004-04-14 |
EP1120014A1 (en) | 2001-08-01 |
JP2002525829A (ja) | 2002-08-13 |
KR20010079859A (ko) | 2001-08-22 |
BR9913812A (pt) | 2001-08-14 |
EP1120014A4 (en) | 2004-06-16 |
CA2344486A1 (en) | 2000-03-30 |
CN1317223A (zh) | 2001-10-10 |
ID29148A (id) | 2001-08-02 |
AUPP599598A0 (en) | 1998-10-08 |
NZ510655A (en) | 2003-05-30 |
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