WO2000003957A3 - Zweibereichs-reflexionsminderungsschicht für den sichtbaren spektralbereich - Google Patents

Zweibereichs-reflexionsminderungsschicht für den sichtbaren spektralbereich Download PDF

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Publication number
WO2000003957A3
WO2000003957A3 PCT/DE1999/002186 DE9902186W WO0003957A3 WO 2000003957 A3 WO2000003957 A3 WO 2000003957A3 DE 9902186 W DE9902186 W DE 9902186W WO 0003957 A3 WO0003957 A3 WO 0003957A3
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WO
WIPO (PCT)
Prior art keywords
range
double
visible spectral
reflection reduction
spectral range
Prior art date
Application number
PCT/DE1999/002186
Other languages
English (en)
French (fr)
Other versions
WO2000003957A2 (de
WO2000003957A9 (de
Inventor
Claus Gunkel
Monika Rueger
Original Assignee
Leica Microsystems
Claus Gunkel
Monika Rueger
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leica Microsystems, Claus Gunkel, Monika Rueger filed Critical Leica Microsystems
Publication of WO2000003957A2 publication Critical patent/WO2000003957A2/de
Publication of WO2000003957A3 publication Critical patent/WO2000003957A3/de
Publication of WO2000003957A9 publication Critical patent/WO2000003957A9/de

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

Eine Zweibereichs-Reflexionsminderungsschicht für den sichtbaren Spektralbereich ist aus neun Schichten aufgebaut. Die Reflexionsminderungsschicht ist zusätzlich für eine Wellenlänge von Lambda = (248 ± 15) nm wirksam. Die neun Schichten setzen sich zusammen aus einem Substrat: Quarzglas (SiO2); .373 M; .390 K; 2.086 M; .320 K; 1.124 M; 1.467 K; .689 M; .320 K; 1,044 M; und Luft: 1.00. M steht für Magnesiumfluorid (MgF2) und K steht für Aluminiumoxid (Al2O3). Schichtdicken sind in Lambda/Viertel-Einheiten ausgebildet und die Bezugswellenlänge beträgt 300 nm bei einem Einfallswinkel von (0 ± 15) Grad.
PCT/DE1999/002186 1998-07-14 1999-07-14 Zweibereichs-reflexionsminderungsschicht für den sichtbaren spektralbereich WO2000003957A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19831392.6 1998-07-14
DE19831392A DE19831392A1 (de) 1998-07-14 1998-07-14 Zweibereichs-Reflexionsminderung für den sichtbaren Spektralbereich und einer Wellenlänge von: (248 +/- 15)NM

Publications (3)

Publication Number Publication Date
WO2000003957A2 WO2000003957A2 (de) 2000-01-27
WO2000003957A3 true WO2000003957A3 (de) 2000-04-20
WO2000003957A9 WO2000003957A9 (de) 2000-07-20

Family

ID=7873916

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE1999/002186 WO2000003957A2 (de) 1998-07-14 1999-07-14 Zweibereichs-reflexionsminderungsschicht für den sichtbaren spektralbereich

Country Status (2)

Country Link
DE (1) DE19831392A1 (de)
WO (1) WO2000003957A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10064143A1 (de) 2000-12-15 2002-06-20 Zeiss Carl Reflexionsminderungsbeschichtung für Ultraviolettlicht bei großen Einfallswinkeln
DE10101017A1 (de) 2001-01-05 2002-07-11 Zeiss Carl Reflexionsminderungsbeschichtung für Ultraviolettlicht
DE10119909B4 (de) 2001-04-23 2005-04-21 Leica Microsystems Semiconductor Gmbh Inspektionsmikroskop für den sichtbaren und ultravioletten Spektralbereich und Reflexionsminderungsschicht für den sichtbaren und ultravioletten Spektralbereich

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2802285A1 (de) * 1977-01-20 1978-08-03 Nippon Kogaku Kk Antireflexfilm
JPH01138501A (ja) * 1987-11-26 1989-05-31 Minolta Camera Co Ltd 反射防止膜
US5532871A (en) * 1992-11-25 1996-07-02 Canon Kabushiki Kaisha Two-wavelength antireflection film
US5557466A (en) * 1993-09-07 1996-09-17 Canon Kabushiki Kaisha Two-wavelength antireflection film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2802285A1 (de) * 1977-01-20 1978-08-03 Nippon Kogaku Kk Antireflexfilm
JPH01138501A (ja) * 1987-11-26 1989-05-31 Minolta Camera Co Ltd 反射防止膜
US5532871A (en) * 1992-11-25 1996-07-02 Canon Kabushiki Kaisha Two-wavelength antireflection film
US5557466A (en) * 1993-09-07 1996-09-17 Canon Kabushiki Kaisha Two-wavelength antireflection film

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 198928, Derwent World Patents Index; Class L01, AN 1989-201489, XP002128972 *

Also Published As

Publication number Publication date
DE19831392A1 (de) 2000-02-03
WO2000003957A2 (de) 2000-01-27
WO2000003957A9 (de) 2000-07-20

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