Classifications

• • G—PHYSICS
  • G05—CONTROLLING; REGULATING
  • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
  • G05B19/00—Program-control systems
  • G05B19/02—Program-control systems electric
  • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
  • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
• • G—PHYSICS
  • G05—CONTROLLING; REGULATING
  • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
  • G05B19/00—Program-control systems
  • G05B19/02—Program-control systems electric
  • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
  • G05B19/41885—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by modeling, simulation of the manufacturing system
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
  • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
  • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
  • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Definitions

• the present invention relates generally to the manufacture of discrete parts using model predictive control, more specifically, to a system and method for controlling the manufacture of semiconductor wafers using model predictive control.
• Semiconductor fabrication includes the fabrication of discrete parts, such as runs or batches of wafers, each of which includes one or more wafers fabricated using similar processing.
• One challenge in semiconductor fabrication is controlling equipment inputs from run to run.
• the challenge in run-to-run control stems from a lack of real-time information about process states and output states while processing a given wafer or group of wafers and variable input states of incoming wafers.
• Chemical-mechanical polishing is a common and rapidly growing process used in the fabrication of semiconductor wafers for planarizing silicon dioxide as well as other types of layers on semiconductor wafers.
• Chemical mechanical polishing typically utilizes an abrasive slurry disbursed in an alkaline or acidic solution to planarize the surface of the wafer through a combination of mechanical and chemical action.
• a typical chemical mechanical polishing tool includes a rotatable circular platen or table on which a polishing pad is mounted and a polishing device is positioned above the pad.
• the polishing device includes one or more rotating carrier heads to which wafers can be secured typically through the use of vacuum pressure. In use, the platen is rotated and an abrasive slurry is disbursed onto the polishing pad.
• a downforce is applied to each rotating carrier head to press its wafer against the polishing pad.
• the surface of the wafer is mechanically and chemically polished.
• the usual adjustment parameter or tool input is polishing time (though in some operations, carrier downforce is input as well).
• Other parameters, such as table speed and carrier downforces are fixed for the process.
• tool outputs such as post-polish thicknesses of polished layers
• variations in post-polish thicknesses can, for example, significantly degrade subsequent processing steps, such as lithography.
• y k is the output at batch k
• B is the process gain
• - ⁇ is the input at batch k calculated from information up through batch k—1
• C k j -i is the estimate for the intercept
• e is unknown process noise entering the system.
• the system gain and the initial value of the intercept is modeled a priori from designed experiments.
• the intercept is typically updated recursively by an observer of the form:
• ⁇ is the exponential weighting factor, or tuning parameter, of the observer.
• the weighting factor ⁇ takes a value between 0 and 1 and is chosen based on the desired properties of the observer.
• the input for batch k (u k
• PCC predictor-corrector controllers
• the present invention provides a system and method for controlling the manufacture of semiconductor wafers using model predictive control.
• a tool output of the manufacturing tool is determined based on a first wafer run.
• a tool input for a subsequent wafer run is determined by minimizing an optimization equation being dependent upon a model which relates tool output to tool process state and tool process state to tool input and previous tool process state.
• the tool input is then provided to the manufacturing tool for processing a second wafer run. In this manner, processing by the tool or tool age is taken into account in determining the tool input for a subsequent run. This can reduce variations in tool output from run- to-run and improve the characteristics of the ultimately formed semiconductor devices.
• the tool may, for example, be a chemical mechanical polishing tool with the tool input being polishing time and the tool output being a post-polish wafer layer thickness associated with CMP tool for a run.
• Figure 1 illustrates a conventional polishing tool having multiple polishing arms
• Figure 2 illustrates an exemplary control system for a polishing tool in accordance with one embodiment of the invention.
• Figure 3 is a flow chart illustrating an exemplary process for controlling a polishing tool in accordance with one embodiment of the invention
• the present invention generally provides a system and method for run-to-run control of the manufacture of semiconductor wafers using model predictive control.
• the invention is particularly suited for controlling post-polish thicknesses of wafer layers, such as dielectric layers, by chemical mechanical polishing (CMP) tools. While the invention is not so limited, a more thorough understanding of the invention will be achieved by reading the detailed description which follows.
• FIG. 1 illustrates, by way of example, a polishing tool which may be used with the present invention.
• the exemplary polishing tool 100 generally includes a polishing pad 110 mounted on a platen 112 and a multi-head carrier 120 positioned above the polishing pad 110.
• the multi-head carrier 120 typically includes a plurality of rotatable polishing arms 122, each of which includes a head 124. Wafers can be secured to the carrier heads 124 by known techniques such as vacuum pressure.
• a source of polishing fluid (not shown) is also provided to supply polishing fluid to the pad 110 for polishing. It should be appreciated that the polishing tool 100 is illustrated by way of example only. Other polishing tools having one or more polishing arms may be used with the present invention.
• FIG. 2 illustrates an exemplary control system for controlling a polishing tool, such as the one described above, in accordance with one embodiment of the invention.
• the exemplary control system 200 includes two metrology tools 210 and 212 for measuring pre-polish thicknesses and post-polish thicknesses of wafer layers (e.g., dielectric layers), respectively. It should be appreciated that while two metrology tools are illustrated, a single metrology tool may be used to perform both pre- and post-polish thickness measurements.
• the two metrology tools 210 and 212 are coupled to a polish tool 220.
• a suitable metrology tool for many applications is the Optiprobe metrology tool by Thermawave.
• the system further includes a controller 230 coupled to the polishing tool 220 for controlling the inputs, such as polishing time to the polishing tool 220.
• the controller 230 generally receives pre- and post-polish thickness measurements from the metrology tools 210 and 212 for a wafer run and uses the thickness measurements to control a polishing time input to the polish tool 220 for a subsequent wafer run.
• the polishing time input may, for example, be a deviation from a nominal polishing time.
• the controller may, for example, be a model predictive controller implemented using, for example, MatLab Optimization Toolbox® routines.
• the controller 230 may be interfaced with the polish tool 220 using, for example, an Advance Process Control Framework interface.
• a first wafer group (e.g., one or more wafers depending on the number of polishing arms) is provided to the metrology tool 210 for measuring a pre-polish thickness of each wafer layer to be polished.
• Each pre-polish thickness is then stored, typically in a database accessible by the controller 230.
• the wafer group is then loaded onto the carrier head(s) of the tool's polishing arm(s) and the wafer group is polished using a predetermined polishing time to remove at least part of the wafer layer of each wafer, as indicated at block 304.
• the polishing time may be either calculated by the controller 230 at block 310 (as will be discussed below) or, for an initial run, predefined by an operator.
• the polishing is typically performed at a predetermined table speed with predetermined downforces on each arm.
• the controller 230 may, however, be used to determine the downforces on each arm if desired.
• Techniques for controlling the downforces on the polishing arms of a multi-arm polishing tool are described in the co-pending and commonly assigned U.S. patent application, entitled “SYSTEM AND METHOD FOR CONTROLLING A MULTI-ARM POLISHING TOOL,” having an Attorney Docket No. 11729.219US01, the contents of which are herein incorporated by reference.
• the post-polish thickness of the polished layer of each wafer are determined by metrology tool 212, as indicated at block 306.
• the post-polish thickness for each wafer is typically stored in the database accessible by the controller 230.
• the controller 230 determines whether the wafer run has finished. If not, control moves to block 302 and another wafer group is polished using the same polishing time input. If the run has finished, control moves to block 310 where a new polishing time input (which will be applied to a subsequent wafer run) is determined by the controller 230.
• the controller 230 determines the new polishing time input for the polishing tool 220 by solving an optimization equation based on a model which includes a predetermined relationship between predicted removal amount and current removal amount.
• the new polishing time input is determined by solving an optimization equation based on a process model.
• An exemplary process model for a polish tool is: where Z k+ i is a predicted amount of material removed at run k+1 , Z is a the amount of material removed at run k+1, U k represents the polishing time input (e.g., a polish time or deviation from a nominal polishing time), Wk represents process noise, a accounts for any tendency for the process to change over time or drift, and b relates the polishing time input to the amount of material removed.
• the use of the term z advantageously takes process dynamics, such as tool drift resulting from pad degradation, into account and allows the polishing time input to be determined based on such process dynamics.
• the fixed coefficient a may be view as a memory effect coefficient which takes into account the effects of one polish process on future polish processes.
• a and b can vary depending on the type of polishing tool, the table speed, the arm downforces, the slurry and the topography of the wafer being polished.
• the coefficients a and b and noise W are determined experimentally for a given polishing tool using test wafers. Suitable experimental techniques include well-known design of experiment (DOE) or pseudo-random binary sequence system identification techniques.
• DOE design of experiment
• b range from 40 to 250 Angstroms/second.
• the noise Wk is typically a random variable normally distributed, e.g., at about 5-10% of target output thickness.
• the exemplary process model may further include a feed forward model which accounts for upstream variations in a process, such as pre-polish layer thicknesses between runs.
• a feed forward model which accounts for upstream variations in a process, such as pre-polish layer thicknesses between runs.
• the deposition and polishing steps are not tightly coupled and a polishing tool typically receives wafers from several different deposition tools.
• the pre-polish thickness of wafers typically (and often, substantially) varies from run-to-run.
• the incoming thickness level f k is an average of the incoming thickness of the wafer(s) processed at run k.
• the factor ⁇ accounts for drift in the upstream process (e.g., drift in a deposition tool). For many applications ⁇ may equal 1 (one), signifying that the best estimate of the next incoming thickness f k+ i is the last incoming thickness f k .
• ⁇ may equal 1 (one), signifying that the best estimate of the next incoming thickness f k+ i is the last incoming thickness f k .
• the exemplary process model may further include an unknown state disturbance model which accounts for unknown state disturbances, such as slurry changes, pad changes, etc., between runs.
• the value d may also be filtered if desired.
• the factor ⁇ may be used to account for drift in the unknown disturbance. For many applications ⁇ may equal 1 (one), signifying that the best estimate of the next incoming unknown disturbance d k+ i is the last unknown disturbance d k .
• the use of such an unknown disturbance model can further enhance controller performance.
• An exemplary process model of the system which uses both a feed forward model and an unknown disturbance models is:
• the output model may modified to account for time delay in the feedback of the metrology tools by virtue of the time needed to measure layer thicknesses.
• One suitable output model includes a time delay of 2 units (i.e., 2 runs) and is as follows.
• An exemplary optimization equation for controller may be:
• N is suitably selected based on the number of runs which the controller is desired to look ahead when computing a solution at run k. In certain embodiments, the controller may be simplified by using a sequence of future moves N of one (1).
• the optimization equation reduces to: min, - y ⁇ ) + u k TRu + ⁇ u k ⁇ SAu k [14] subject to Equations [10] and [11] above.
• the weights Q, R (if appropriate) and S may be suitably selected based on the desired weighting of the respective functions (i.e., the output errors, the inputs, and the rate of change of the inputs). This allows control of the polish tool to be tuned for a desired performance. For example, performance such as minimizing output deviations from target or minimizing changes in polishing time can be tuned by varying weights Q and S.
• the optimization equation (e.g., equation 13 or 14 above) of the controller 230 may be solved for the input, polishing time U k , which minimizes the optimization equation over a predetermined sequence of inputs N.
• the optimization equation may further be solved for the polishing time which minimizes the optimization equation (e.g., equation 13 or 14 above) over N future runs taking into account constraints on the polishing tool.
• the constraints are typically dictated by processing considerations and may include, for example, requiring polishing time input to be less than a certain value (e.g., U k ⁇ time max ) or that change in polishing time inputs between runs must lie between an upper bound and a lower bound (e.g., BL ⁇ Uk+!-U ⁇ Bu).
• the controller 230 determines a post- polish thickness level y k , and a pre-polish thickness level f k for the tool for the current run (run k).
• the pre-polish and post-polish thicknesses f k and y k of the tool may be the averaged pre- and post-polish thickness for the wafer(s) polished during run k.
• d k for the tool is also determined.
• the value d for the tool at run k may be the difference between an expected post-polishing thickness for run k and the measured post-polish thickness level at run k.
• the controller 230 uses the measured pre- and post-polish thickness levels f k and y k (and, in desired cases, the unknown disturbance, d k ), the controller 230 then solves an optimization equation (e.g., equation 13 or 14 above) for a new polishing time U (to be applied during the next run, run k+1) which minimizes the optimization equation subject to any constraints over the predetermined future inputs N.
• an optimization equation e.g., equation 13 or 14 above
• run-to-run variations in post polish thickness can be reduced as compared to conventional control techniques (such as EWMA or PCC techniques).
• the above control system reduces such run-to-run variations by, for example, taking into account drift of the process in determining future process output and inputs. In particular a fixed amount of drift (a in equation [7]) is incorporated into the controller for more accurately controlling the polishing tool. Further reductions in run-to-run variations may be provided by incorporating measured feed forward disturbance (e.g., thickness disturbance) and unknown disturbance models into the process model and controller's optimization equation.
• polishing tools such as CMP tools
• the present invention is not limited to the control of polishing tools, but extends to cover any manufacturing tool used in run-to-run manufacturing.
• Other systems or tools, to which the present invention is applicable include, for example, deposition tools, such as chemical-vapor deposition (CVD) tools and sputter deposition tools.
• CVD deposition tools the tool output may be deposition layer thickness, while the process state may be chamber cleanliness.
• sputter deposition tools the tool output may be deposition layer thickness, while the process state may be target age or cleanliness.
• the present invention is applicable to run-to-run control of a number of different manufacturing tools. Accordingly, the present invention should not be considered limited to the particular examples described above, but rather should be understood to cover all aspects of the invention as fairly set out in the attached claims. Various modifications, equivalent processes, as well as numerous structures to which the present invention may be applicable will be readily apparent to those of skill in the art upon review of the present specification. The claims are intended to cover such modifications and devices.

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• Engineering & Computer Science (AREA)
• Manufacturing & Machinery (AREA)
• General Engineering & Computer Science (AREA)
• Quality & Reliability (AREA)
• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Automation & Control Theory (AREA)
• Mechanical Treatment Of Semiconductor (AREA)
• Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
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• 1998
  • 1998-06-26 US US09/105,979 patent/US6230069B1/en not_active Expired - Lifetime
  • 1998-12-18 DE DE69811742T patent/DE69811742T2/de not_active Expired - Lifetime
  • 1998-12-18 KR KR1020007014811A patent/KR100572039B1/ko not_active Expired - Lifetime
  • 1998-12-18 EP EP98964806A patent/EP1090335B1/en not_active Expired - Lifetime
  • 1998-12-18 WO PCT/US1998/027074 patent/WO2000000874A1/en not_active Ceased
  • 1998-12-18 JP JP2000557182A patent/JP4297614B2/ja not_active Expired - Lifetime
• 2007
  • 2007-03-29 JP JP2007088643A patent/JP4880512B2/ja not_active Expired - Lifetime

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