WO1997042545A1 - Silberhalogenid-aufzeichnungsmaterial zur erzeugung von negativbildern ultrasteilen kontrasts mit vermindertem schleier - Google Patents
Silberhalogenid-aufzeichnungsmaterial zur erzeugung von negativbildern ultrasteilen kontrasts mit vermindertem schleier Download PDFInfo
- Publication number
- WO1997042545A1 WO1997042545A1 PCT/EP1997/002334 EP9702334W WO9742545A1 WO 1997042545 A1 WO1997042545 A1 WO 1997042545A1 EP 9702334 W EP9702334 W EP 9702334W WO 9742545 A1 WO9742545 A1 WO 9742545A1
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- WO
- WIPO (PCT)
- Prior art keywords
- group
- silver halide
- silver
- material according
- groups
- Prior art date
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- 239000000463 material Substances 0.000 title claims abstract description 42
- -1 hydrazine compound Chemical class 0.000 claims abstract description 81
- 229910052709 silver Inorganic materials 0.000 claims abstract description 49
- 239000004332 silver Substances 0.000 claims abstract description 49
- 239000000839 emulsion Substances 0.000 claims abstract description 33
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 17
- 150000003951 lactams Chemical class 0.000 claims abstract description 13
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 19
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 125000001424 substituent group Chemical group 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 7
- 125000000623 heterocyclic group Chemical group 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 claims description 4
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 claims description 4
- 125000000304 alkynyl group Chemical group 0.000 claims description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 3
- 229920006395 saturated elastomer Polymers 0.000 claims description 3
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 3
- 125000003107 substituted aryl group Chemical group 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 230000003213 activating effect Effects 0.000 claims description 2
- 150000001450 anions Chemical class 0.000 claims description 2
- 150000001721 carbon Chemical group 0.000 claims description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 125000004437 phosphorous atom Chemical group 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 125000004417 unsaturated alkyl group Chemical group 0.000 claims description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 17
- 150000002429 hydrazines Chemical class 0.000 description 11
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 9
- 238000011161 development Methods 0.000 description 8
- 230000018109 developmental process Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 7
- 238000011160 research Methods 0.000 description 7
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 108010010803 Gelatin Proteins 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 229920000159 gelatin Polymers 0.000 description 6
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- 235000011852 gelatine desserts Nutrition 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
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- 238000000576 coating method Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 125000001302 tertiary amino group Chemical group 0.000 description 5
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 125000002887 hydroxy group Chemical class [H]O* 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 229960005070 ascorbic acid Drugs 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 150000004714 phosphonium salts Chemical class 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 230000005070 ripening Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- QBNQNDKOKMBUJW-UHFFFAOYSA-N 4,6-dichloro-2H-triazin-5-one Chemical group ClC1=C(C(=NN=N1)Cl)O QBNQNDKOKMBUJW-UHFFFAOYSA-N 0.000 description 2
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical class [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 150000001565 benzotriazoles Chemical class 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000002872 contrast media Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
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- 125000003386 piperidinyl group Chemical group 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
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- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- LGBPWIAXPVUTMY-JLAZNSOCSA-N (2r)-3,4-dihydroxy-2-[(1s)-1-hydroxyethyl]-2h-furan-5-one Chemical compound C[C@H](O)[C@H]1OC(=O)C(O)=C1O LGBPWIAXPVUTMY-JLAZNSOCSA-N 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical class SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- ADENXWJNNZAELO-UHFFFAOYSA-N 1-methyl-3,4-dihydro-2h-triazolo[4,5-b]pyridin-7-one Chemical compound N1C=CC(=O)C2=C1NNN2C ADENXWJNNZAELO-UHFFFAOYSA-N 0.000 description 1
- CLIDMUTWHLMPMN-UHFFFAOYSA-O 1h-imidazol-3-ium-3-carboxamide Chemical class NC(=O)[NH+]1C=CN=C1 CLIDMUTWHLMPMN-UHFFFAOYSA-O 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- MYBPIZQISTXGHB-UHFFFAOYSA-N 2-n,2-n,3-n,3-n-tetramethyl-1h-imidazol-3-ium-2,3-dicarboxamide;chloride Chemical compound [Cl-].CN(C)C(=O)C=1NC=C[N+]=1C(=O)N(C)C MYBPIZQISTXGHB-UHFFFAOYSA-N 0.000 description 1
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 1
- OEBMOZBCDOBXAN-UHFFFAOYSA-N 2h-benzotriazole-5-carbonitrile Chemical compound C1=C(C#N)C=CC2=NNN=C21 OEBMOZBCDOBXAN-UHFFFAOYSA-N 0.000 description 1
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical class C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 description 1
- AOJJSUZBOXZQNB-VTZDEGQISA-N 4'-epidoxorubicin Chemical compound O([C@H]1C[C@@](O)(CC=2C(O)=C3C(=O)C=4C=CC=C(C=4C(=O)C3=C(O)C=21)OC)C(=O)CO)[C@H]1C[C@H](N)[C@@H](O)[C@H](C)O1 AOJJSUZBOXZQNB-VTZDEGQISA-N 0.000 description 1
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- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- AOCDQWRMYHJTMY-UHFFFAOYSA-N 5-nitro-2h-benzotriazole Chemical compound C1=C([N+](=O)[O-])C=CC2=NNN=C21 AOCDQWRMYHJTMY-UHFFFAOYSA-N 0.000 description 1
- CIWBSHSKHKDKBQ-MVHIGOERSA-N D-ascorbic acid Chemical compound OC[C@@H](O)[C@@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-MVHIGOERSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
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- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
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- 235000000069 L-ascorbic acid Nutrition 0.000 description 1
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- 229940100389 Sulfonylurea Drugs 0.000 description 1
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- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical class 0.000 description 1
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- MXJIHEXYGRXHGP-UHFFFAOYSA-N benzotriazol-1-ylmethanol Chemical compound C1=CC=C2N(CO)N=NC2=C1 MXJIHEXYGRXHGP-UHFFFAOYSA-N 0.000 description 1
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- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
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- VLLXDIQVPMMHCN-UHFFFAOYSA-N n-(2h-benzotriazol-5-yl)benzamide Chemical compound C1=CC2=NNN=C2C=C1NC(=O)C1=CC=CC=C1 VLLXDIQVPMMHCN-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 150000004010 onium ions Chemical group 0.000 description 1
- SFJGCXYXEFWEBK-UHFFFAOYSA-N oxazepine Chemical compound O1C=CC=CC=N1 SFJGCXYXEFWEBK-UHFFFAOYSA-N 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- RUDNWZFWWJFUSF-UHFFFAOYSA-M potassium;(4-methylphenyl)-oxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].CC1=CC=C(S([O-])(=O)=S)C=C1 RUDNWZFWWJFUSF-UHFFFAOYSA-M 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- UGZVCHWAXABBHR-UHFFFAOYSA-O pyridin-1-ium-1-carboxamide Chemical class NC(=O)[N+]1=CC=CC=C1 UGZVCHWAXABBHR-UHFFFAOYSA-O 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 150000004040 pyrrolidinones Chemical class 0.000 description 1
- ZVJHJDDKYZXRJI-UHFFFAOYSA-N pyrroline Natural products C1CC=NC1 ZVJHJDDKYZXRJI-UHFFFAOYSA-N 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical class [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AYFACLKQYVTXNS-UHFFFAOYSA-M sodium;tetradecane-1-sulfonate Chemical compound [Na+].CCCCCCCCCCCCCCS([O-])(=O)=O AYFACLKQYVTXNS-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 125000000020 sulfo group Chemical class O=S(=O)([*])O[H] 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- YROXIXLRRCOBKF-UHFFFAOYSA-N sulfonylurea Chemical class OC(=N)N=S(=O)=O YROXIXLRRCOBKF-UHFFFAOYSA-N 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical group 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/067—Additives for high contrast images, other than hydrazine compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
- G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/061—Hydrazine compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/035—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein characterised by the crystal form or composition, e.g. mixed grain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/035—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein characterised by the crystal form or composition, e.g. mixed grain
- G03C2001/03511—Bromide content
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/16—X-ray, infrared, or ultraviolet ray processes
- G03C5/164—Infrared processes
Definitions
- Silver halide recording material for producing negative images of ultra-low contrast with reduced
- the invention relates to a silver halide photographic material for producing black and white
- Halftone images can be converted into halftone dot images.
- silver halide materials which one in
- EP-00 32 456-B1 claims a process in which a recording material is processed in the presence of a hydrazine compound with a hydroquinone-3-pyrazolidinone developer which contains a contrast-increasing amount of an .amino compound.
- a hydrazine compound with a hydroquinone-3-pyrazolidinone developer which contains a contrast-increasing amount of an .amino compound.
- such developers have a number of
- German patent application DE-A-43 10 327 describes a method for producing negative images with ultra-partial contrast, in which the development of the
- Silver halide recording material in the presence of Connections are made whose molecules have at least one quaternary nitrogen atom and at least one tertiary
- Silver halide material described that can be developed in a developer with a pH ⁇ 11 to ultra-partial contrast.
- the light-sensitive coating of this material contains a hydrazine compound of a certain formula and an amino or a quaternary onium compound and is adjusted to a pH of at least 5.9.
- Oxyethylenenneiten contained in their molecule as
- EP 04 22 677 describes the use of tertiary
- EP 05 39 998 claims silver halide materials which, in addition to hydrazine compounds, also contain thioether compounds with a tertiary amino group.
- Hydrazine compounds have a contrast-increasing effect are described in EP-A-06 63 611.
- Emulsion and less intensive chemical ripening result in insufficient sensitivity. Moreover, Emulsion and less intensive chemical ripening result in insufficient sensitivity. Moreover, Emulsion and less intensive chemical ripening result in insufficient sensitivity. Moreover, Emulsion and less intensive chemical ripening result in insufficient sensitivity. Moreover, Emulsion and less intensive chemical ripening result in insufficient sensitivity. Moreover, Emulsion and less intensive chemical ripening result in insufficient sensitivity. Moreover,
- soot high-contrast materials for high-speed processing, whose layers contain little gelatin, have a special type of veil, which is called soot or
- Coal dust curtain is called. It differs from the appearance known as peppercorn veil in that the blackened areas are smaller and more numerous.
- Polyvinyl lactams especially polyvinyl pyrrolidinones, have long been used as binders for photosensitive products
- Silver halide layers are known and as such are listed, for example, in Research Disclosure 365044, September 1994, Chapter II C, and 308119, December 1989, Chapter IX B.
- DE-B-11 20 272 specifies 8 to 50 percent by weight of the dry emulsion, which may contain 30 to 70 percent by weight of silver halide, as typical amounts for use as binders. This corresponds to 21.5 to 313 g per mol
- photographic silver halide material comprising at least one light-sensitive silver halide emulsion layer on a layer support, in which in the silver halide emulsion layer or in a reactive with this
- Phosphonium compound are present, excellent fog and sensitivity values with excellent sharpness and good shelf life, if the
- N-vinyl lactam groups exist.
- the average molecular weight of the polyvinyl lactam is preferably between 6000 and 100000; the range between 15,000 and 50,000 is particularly preferred.
- the hydrazine compound contained in the recording material according to the invention can be incorporated either in one or more layers of the recording material in a manner known per se. These can be layers containing the photosensitive silver halide as well as layers that are reactive with the former, i. H. which are arranged in such a way that substances can diffuse from one layer to the other if a concentration gradient is maintained by reactions.
- Incorporation can include both solutions and dispersions of the hydrazine compound in the coating solutions.
- Suitable hydrazine compounds are described, for example, in Research Disclosure 235 010 (November 1983),
- EP-01 38 200-A2 EP-02 03 521-A2
- EP-02 17 310-A2 EP-01 38 200-A2
- EP-02 03 521-A2 EP-02 17 310-A2
- EP-03 26 443-A2 EP-03 56 898-A2
- EP-04 73 342-A1 EP-03 26 443-A2
- EP-03 56 898-A2 EP-04 73 342-A1
- EP-05 01 546-A1 EP-04 81 565-A, EP-05 98 315-A1
- B is a ballast group
- G is an activating group
- L is one of the groups -CO- and -CO-CO-.
- Phenyl means a phenylene ring to which B and the hydrazine group are attached, preferably in the para position, and which may be further substituted.
- Preferred ballast groups are those that are not
- alkyl groups e.g. methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, n-hexyl, n-octyl, t-octyl, n-decyl, n-dodecyl and similar groups
- alkoxy groups which contain one of the abovementioned alkyl groups as alkyl
- acylamino groups such as acetylamino, propanoylamino, butanoylamino, octanoylamino, benzoylammo, alkyl and
- the groups mentioned can in turn be substituted with conventional photographic ballast groups, such as those of incorporated diffusion-resistant couplers and others
- ballast groups typically contain at least 8
- the preferred hydrazine compounds include those whose ballast group still contains an adsorption-promoting group. Such groups promote the adsorption of the molecule on the surface of the silver halide crystals and are known per se. They typically contain at least one sulfur or nitrogen atom that can form a silver complex or otherwise have an affinity for the silver halide surface.
- Preferred examples are thiourea, thiuronium,
- G can also be further substituted, e.g. B. with alkyl,
- Aralkyl alkenyl, alkynyl, alkoxy, aryl, substituted amino, ureido, urethane, aryloxy, sulfamoyl, carbamoyl, alkyl- or arylthio, alkyl- or arylsulfonyl, alkyl- or arylsulfinyl, hydroxy, halogen, cyan, sulfo, aryloxycarbonyl, acyl,
- G can also be chosen so that the L-G part of the molecule is separated off with ring formation, as is the case e.g. in
- EP-B-02 53 665 is described.
- suitable hydrazine compounds are:
- the amount of the hydrazine compound is preferably between 10 -6 and 10 -2 mol per mol of silver halide.
- Suitable contrast-enhancing amino compounds are
- Amino compounds of the general formula (A) are particularly suitable wherein each of the substituents R 1 , R 2 and R 3
- Alkyl group an alkenyl group, a substituted one
- Alkenyl group, an alkynyl group, an aryl group or a substituted aryl group, but not all three are hydrogen at the same time.
- the substituents can also be linked together to form one or two rings and in turn can be substituted with diffusion-inhibiting (ballast) groups and / or groups which require adsorption with respect to silver halide surfaces.
- nitrogen atom Contain nitrogen atom, a polyoxyalkylene chain, a thioether or thioketone group, a nitrile group, a sulfonylurea or urethane group or a guanidine group.
- n-propyl isopropyl, n-butyl, isobutyl, n-hexyl.
- alkyl can have 1 to 6 carbon atoms.
- substituents are methoxy, ethoxy, propoxy, butoxy, ethylamino, dimethylamino, butylthio.
- the divalent connecting groups X and B are preferably straight-chain, branched or cyclic alkylene groups with 1 to 20 carbon atoms, phenylene or aralkylene groups with 7 to 20 carbon atoms, or divalent chains from 1 to 20 methylene groups, in which, in addition to these, oxygen, sulfur, and amino groups , Alkene or alkyne groups or also polyoxyalkylene groups, in particular polyoxyethylene or
- the connecting group X can also be trivalent and thus connect the tertiary amino group with two nitrile groups.
- Hydrogen atom is present. Examples include:
- alkyl be substituted, for example with hydroxyl, amino, alkylamino and alkoxy groups, the alkyl being herein
- a ring can be, for example, a piperidine, pyrrolidine or hexahydroazepine ring.
- the two radicals R 2 can also together with B or with parts of B and with the two
- Suitable amino compounds are:
- R 1 , R 2 and R 3 each represent an alkyl, cycloalkyl, aryl,
- the light-sensitive silver halides of the recording materials used according to the invention consist of
- Silver bromide and silver bromoiodide are preferred. They can be monodisperse or polydisperse, a uniform one
- monodisperse emulsions i.e. H. those where the
- the grain volume of the silver halide grains in the emulsions depends on the required sensitivity and can be, for example, the cubic grains from 0.1 to 0.7 ⁇ m
- a preferred range is
- Precious metal salts especially salts of rhodium or iridium, can be present in the usual amounts for controlling the photographic properties in the emulsion preparation.
- the emulsions are preferably chemically sensitized.
- Suitable methods are sulfur, reduction and noble metal sensitization, which can also be used in combination.
- gold or iridium compounds can be used.
- Sensitization is preferably carried out in the presence of salts of organic thiosulfonic acids, such as p-toluene thiosulfonic acid.
- the emulsions can also be conventional antifoggants
- the emulsion can be an iodide, preferably a, before or after chemical ripening
- Alkali iodide in an amount of about 0.5 to 5 millimoles per mole of silver are added.
- the emulsions can also contain known polymer dispersions which, for example, improve the dimensional stability of the photographic material. These are generally latices of hydrophobic polymers in an aqueous matrix. Examples of suitable polymer dispersions are in Research Disclosure 176 043, Chapter IX B
- This hardener can be added to the emulsion or via an auxiliary layer
- Suitable hardeners are, for example, aldehydes, such as
- a preferred curing agent is hydroxydichlorotriazine.
- the photographic material can contain other additives which are known and customary for the production of certain properties. Such means are, for example, in Research Disclosure 365 044 (September 1994) in Chapter VI
- the gelatin content of the emulsions is in general
- Range between 40 and 100 g per mol of silver.
- suitable light source are exposed imagewise. This can be done both over the entire surface by means of a copy template, for example with an incandescent lamp or a discharge lamp, if appropriate by means of a color filter, or also by scanning with a
- intensity-modulated light beam for example from a gas, solid or semiconductor laser.
- Processing of the exposed material to form the image preferably comprises treatment with an aqueous developing bath, with an aqueous fixing bath, washing and drying.
- Processing is preferred as a rapid process with a development time of at most 30 s and corresponding
- developer solutions with a high content of are preferably used
- developer substance for example more than 25 g per liter.
- the developer solutions preferably contain one
- Chlorohydrochmon and an antioxidant, preferably an alkali sulfite in a concentration of less than 0.3 mol per liter.
- Solutions with pH values from 9 to at most 11, particularly preferably from 10 to 10.5, are preferably used. Such developer solutions are also very durable in use. Developer solutions with a can also be used
- Ascorbic acid type developer for example,
- L-ascorbic acid D-ascorbic acid, L-erythroascorbic acid, 6-deoxy-L-ascorbic acid, imino-L-erythroascorcic acid or sugar derivatives of these acids. are also suitable
- the developer solutions preferably contain known solutions
- 5-chloroenztriazole 5-bromobenzotriazole, 5-methylbenztriazole, 5-nitrobenztriazole, 5-benzoylaminobenztriazole,
- the recording materials according to the invention are distinguished by low Schieier values and excellent
- the gradation of the foot can be fully exploited and the optimal grid size can be achieved because the
- the invention can be used to produce black and white
- a cubic silver bromoiodide emulsion with grains with an edge length of 0.18 ⁇ m is produced by pAg-controlled double jet precipitation.
- the iodide content is 2 mol% based on
- This emulsion is flocked, washed and washed with
- Potassium iodide 300 mg 7-hydroxy-1-methyltriazaindoline, 200 mg 5-nitroindazole, 0.15 millimole 1-pyridiniumacetyl-2- (4-benzyloxyphenyl) hydrazine bromide (compound H-9) and 600 mg 4,4'-trimethylene bis-piperidinopropionitrile (Compound A-4), a red sensitizer (KF 641, manufacturer
- Coating aids and in each case parts of the emulsion thus obtained polyvinylpyrrolidinone MW 30,000 (PVP) in
- Scanner films made.
- the silver coating was 3.5 g per m 2 .
- the protective layers also contained hydroquinone,
- Polyethylene oxide 20000 500 mg / m 2 colloidal silica and a polyolefin oxidate according to DE 43 11 888.
- the layers were coated with 1 millimole of hydroxydichlorotriazine, sodium salt, and
- Veil Dmin, maximum density Dmax and sensitivity S determined in relative arithmetic units both 3 days and 3 months after production. The samples were stored at 22 ° C and 55% relative humidity.
- halftone dots By exposing halftone dots with a commercially available scanning exposure device (Linotronic 300 from Hell) and developing as above, halftone elements were produced to assess the sharpness of the contours of the pixels. These were assessed visually using an 80x magnifying glass.
- a commercially available scanning exposure device Liotronic 300 from Hell
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP97923000A EP0953164B1 (de) | 1996-05-07 | 1997-05-07 | Silberhalogenid-aufzeichnungsmaterial zur erzeugung von negativbildern ultrasteilen kontrasts mit vermindertem schleier |
DE59704335T DE59704335D1 (de) | 1996-05-07 | 1997-05-07 | Silberhalogenid-aufzeichnungsmaterial zur erzeugung von negativbildern ultrasteilen kontrasts mit vermindertem schleier |
US09/171,953 US6033825A (en) | 1996-05-07 | 1997-05-07 | Silver-halide recording material to produce negatives with reduced fog and ultrahardgradation |
JP53954397A JP2001505317A (ja) | 1996-05-07 | 1997-05-07 | カブリが減少した超硬調を有するネガを作製するためのハロゲン化銀記録材料 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19618194A DE19618194A1 (de) | 1996-05-07 | 1996-05-07 | Silberhalogenid-Aufzeichnungsmaterial zur Erzeugung von Negativbildern ultrasteilen Kontrasts mit vermindertem Schleier |
DE19618194.1 | 1996-05-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1997042545A1 true WO1997042545A1 (de) | 1997-11-13 |
Family
ID=7793516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1997/002334 WO1997042545A1 (de) | 1996-05-07 | 1997-05-07 | Silberhalogenid-aufzeichnungsmaterial zur erzeugung von negativbildern ultrasteilen kontrasts mit vermindertem schleier |
Country Status (5)
Country | Link |
---|---|
US (1) | US6033825A (de) |
EP (1) | EP0953164B1 (de) |
JP (1) | JP2001505317A (de) |
DE (2) | DE19618194A1 (de) |
WO (1) | WO1997042545A1 (de) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1120272B (de) * | 1958-08-27 | 1961-12-21 | Du Pont | Photographische Silberhalogenidemulsion und Verfahren zu ihrer Herstellung |
EP0306246A2 (de) * | 1987-08-31 | 1989-03-08 | Konica Corporation | Photographisches Silberhalogenidmaterial |
US4929535A (en) * | 1985-01-22 | 1990-05-29 | Fuji Photo Film Co., Ltd. | High contrast negative image-forming process |
US4975354A (en) * | 1988-10-11 | 1990-12-04 | Eastman Kodak Company | Photographic element comprising an ethyleneoxy-substituted amino compound and process adapted to provide high constrast development |
US5420004A (en) * | 1992-08-10 | 1995-05-30 | Fuji Photo Film Co., Ltd. | Direct positive silver halide emulsion and color diffusion transfer light-sensitive material therewith |
-
1996
- 1996-05-07 DE DE19618194A patent/DE19618194A1/de not_active Withdrawn
-
1997
- 1997-05-07 EP EP97923000A patent/EP0953164B1/de not_active Expired - Lifetime
- 1997-05-07 DE DE59704335T patent/DE59704335D1/de not_active Expired - Fee Related
- 1997-05-07 WO PCT/EP1997/002334 patent/WO1997042545A1/de active IP Right Grant
- 1997-05-07 US US09/171,953 patent/US6033825A/en not_active Expired - Fee Related
- 1997-05-07 JP JP53954397A patent/JP2001505317A/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1120272B (de) * | 1958-08-27 | 1961-12-21 | Du Pont | Photographische Silberhalogenidemulsion und Verfahren zu ihrer Herstellung |
US4929535A (en) * | 1985-01-22 | 1990-05-29 | Fuji Photo Film Co., Ltd. | High contrast negative image-forming process |
EP0306246A2 (de) * | 1987-08-31 | 1989-03-08 | Konica Corporation | Photographisches Silberhalogenidmaterial |
US4975354A (en) * | 1988-10-11 | 1990-12-04 | Eastman Kodak Company | Photographic element comprising an ethyleneoxy-substituted amino compound and process adapted to provide high constrast development |
US5420004A (en) * | 1992-08-10 | 1995-05-30 | Fuji Photo Film Co., Ltd. | Direct positive silver halide emulsion and color diffusion transfer light-sensitive material therewith |
Also Published As
Publication number | Publication date |
---|---|
US6033825A (en) | 2000-03-07 |
JP2001505317A (ja) | 2001-04-17 |
EP0953164B1 (de) | 2001-08-16 |
EP0953164A1 (de) | 1999-11-03 |
DE19618194A1 (de) | 1997-11-13 |
DE59704335D1 (de) | 2001-09-20 |
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