WO1993017593A1 - Article decoratif en silicium - Google Patents

Article decoratif en silicium Download PDF

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Publication number
WO1993017593A1
WO1993017593A1 PCT/JP1992/000273 JP9200273W WO9317593A1 WO 1993017593 A1 WO1993017593 A1 WO 1993017593A1 JP 9200273 W JP9200273 W JP 9200273W WO 9317593 A1 WO9317593 A1 WO 9317593A1
Authority
WO
WIPO (PCT)
Prior art keywords
silicon
oxide film
present
color
decorative
Prior art date
Application number
PCT/JP1992/000273
Other languages
English (en)
Japanese (ja)
Inventor
Hideo Kumagai
Kenzo Fujinuki
Itaru Imai
Original Assignee
Komatsu Electronic Metals Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Electronic Metals Co., Ltd. filed Critical Komatsu Electronic Metals Co., Ltd.
Priority to PCT/JP1992/000273 priority Critical patent/WO1993017593A1/fr
Publication of WO1993017593A1 publication Critical patent/WO1993017593A1/fr

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Classifications

    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CPERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C17/00Gems or the like

Definitions

  • the present invention relates to a decorative article having an oxide film formed on a silicon surface having a flat surface.
  • the present invention provides a material having excellent decorativeness by coloring the silicon surface without using a coloring agent. Therefore, a single-layer oxide film is formed on the surface of the silicon having a flat surface. It is characterized by the fact that it has been formed.If a part of this oxide film is removed, or if polycrystalline silicon is used, precious stones with beautiful value such as radiance and color are obtained. Provided.
  • FIG. 1 is a perspective view showing one embodiment of a silicon decorative article of the present invention.
  • FIGS. 2 (a) and 2 (b) show different embodiments of the silicone decorative article of the present invention.
  • FIGS. 3 (a) and 3 (f) are perspective views showing examples of processing silicon decorative articles of the present invention.
  • 4 (a) to 4 (c) are cross-sectional views for different steps of different embodiments of the silicon decorative article of the present invention.
  • FIGS. 5 (a) to 5 (c) are cross-sectional views of the silicon decorative article according to the present invention, which are different from each other in each step.
  • 6 (a) to 6 (c) are diagrams showing an application example of the silicon decorative article of the present invention.
  • FIGS. 7 (a) and 7 (b) are schematic diagrams showing the principle of color development of an embodiment of the silicon decorative article of the present invention.
  • the uniform oxide film formed on the silicon plane changes its effective film thickness as shown in Fig. 7 depending on the viewing direction. Therefore, the color due to the difference in the film thickness described in the above-mentioned literature changes in various directions depending on the viewing direction, and even if it is a flat surface, it has a beautiful and highly decorative appearance. It is likely to be. In particular, it is thought that the cut surfaces are very beautiful because the color tone from each surface is different and changes gradually according to the viewing direction.
  • FIG. 3 shows one processing example of the silicon decorative article of the present invention.
  • Fig. 3 (a) is a plate-shaped one. Other decorations can be attached to one side with an adhesive or the like.
  • a hole having an appropriate depth is provided in the plate surface of FIG. 3 (a), so that screws can be fixed to a pedestal or the like.
  • the ones shown in Fig. 3 (c) to Fig. 3) have a through hole, and because of the large number of them, It can also be applied to brochures and the like.
  • a silicon single crystal ingot for semiconductor manufacturing and a plurality of silicon plates having a thickness of 3 mm are cut.
  • the length is 50 mm and the width is 5 mm.
  • FIG. 2 (b) shows a block-shaped silicon that has been diced, an oxide film has been formed on each surface, and only the oxide film on any surface has been removed. This is an example that was made by removing it.
  • the main difference between the present embodiment and the first embodiment of the present invention is that the surface of the silicon plate before the oxide film is formed is mirror-finished.
  • the other conditions are the same as those in the first embodiment, and the sample ⁇ 7-! ⁇ ⁇ 1 2 was manufactured. .
  • Embodiments 1 and 2 of the present invention the main difference from Embodiments 1 and 2 of the present invention is that a polycrystal is used for the silicon material, Under the same conditions, sample ⁇ 13-No. 18 was made. The color of each sample is as shown in Table 3.
  • Embodiment 2 Another embodiment of the present invention will be described. This embodiment is the same as Embodiment 2 except that the main difference between Embodiments 1 and 2 of the present invention is that polycrystalline silicon is used as the silicon material. Under the conditions, samples ⁇ ⁇ 9 to 4 ⁇ 24 were manufactured. The color of each sample is as shown in Table 4
  • the thickness of the silicon oxide film according to each of the above embodiments is uniform, since the surface is a plate surface, the effective film thickness differs depending on the viewing angle, and the color of the reflected light differs. come. This is because when the light is reflected back in the oxide film, as viewed obliquely, the state becomes the same as the thickness of the oxide film increases.
  • the substrate is formed in a polyhedral shape, even if the oxide film has a uniform thickness, the surface / film thickness of each surface is different, so that the oxide film shines in various colors. Of course, if you look at each surface at right angles, it will look like the original color.
  • FIGS. 4 (a) to 4 (c) show a step-by-step process of manufacturing a silicon decorative article in this embodiment.
  • Reference numeral 10 indicates a photo register.
  • the oxide film in the window opening was kept in a state where an arbitrary thickness was left.
  • the oxide film was completely etched. If removed, silicon's own surface Since it can be exposed, it can be made into a silicon ornament that has a mixed metallic luster.
  • FIGS. 5 (a) to 5 (c) also show the manufacturing steps in order, similarly to FIGS. 4 (a) to 4 (c).
  • the partial removal of the oxide film can be achieved by using an appropriate etching agent such as HF on the surface, without using the method of applying a resist and opening a window.
  • an appropriate etching agent such as HF
  • a polycrystalline silicon plate may be used to exhibit a mosaic pattern, for example, a wall material or a nameplate may be raised when the nameplate is changed. You.
  • the silicon decorative article of the present invention has a beautiful appearance due to the thin oxide film on its surface, and in particular, those having a mirror-finished surface are slightly natural in the South Sea. It has an appearance similar to or better than the available black pearls. If these ornaments are offered in various shapes at low cost, the desire of the world for beauty can be fulfilled again. For men, silicone ornaments with colored rafts, durability, novelty, and applicability, such as neck pins and fues, are available. provide.
  • the thickness of the oxide film can be freely controlled by appropriately selecting the oxidation conditions, so that a silicon decorative article having a desired brightness can be manufactured with good reproducibility.
  • the silicon oxide film is the same as that of so-called quartz, it has high hardness, excellent chemical resistance and heat resistance, and can be made of natural pearl or any other material. More durable than such imitations.
  • the pearl absorbs sweat and deteriorates, but the silicone decorative article according to the present invention is stable.
  • the specific gravity is about 2.9 for pearls and about 2.3 for silicones, so they do not feel heavy when worn.
  • the silicon oxide film is inactive, it has no adverse effect on the human body, such as a metal alloy, which has recently become a problem.
  • the present invention utilizes the light interference effect of the silicon oxide film, the same effect can be expected by the nitride film. Since the nitride film has a higher hardness and is more stable than the oxide film, it can be used especially as a protective film.
  • the present invention is characterized in that an oxide film is uniformly grown on the surface of a silicon having a flat surface, or that the oxide film is partially etched.
  • the use of mirror-polished silicon makes it more brilliant than black pearls, more beautiful in color, etc., and can be processed freely in a flat shape. Obtainable.

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  • Silicon Compounds (AREA)

Abstract

Matière brute à qualité décorative élevée, réalisée en formant des colorations sur une surface de silicium sans utiliser de colorants. Une couche unique d'un film d'oxyde est réalisée sur une surface de silicium plane. Après enlèvement d'une partie de ce film d'oxyde ou après application de silicium polycristallin, on obtient une pierre précieuse présentant un brillant et des colorations très esthétiques.
PCT/JP1992/000273 1992-03-06 1992-03-06 Article decoratif en silicium WO1993017593A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP1992/000273 WO1993017593A1 (fr) 1992-03-06 1992-03-06 Article decoratif en silicium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1992/000273 WO1993017593A1 (fr) 1992-03-06 1992-03-06 Article decoratif en silicium

Publications (1)

Publication Number Publication Date
WO1993017593A1 true WO1993017593A1 (fr) 1993-09-16

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1992/000273 WO1993017593A1 (fr) 1992-03-06 1992-03-06 Article decoratif en silicium

Country Status (1)

Country Link
WO (1) WO1993017593A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0771892A4 (fr) * 1994-08-01 1997-11-19 Komatsu Denshi Kinzoku Kk Procede de production de silicone decorative
WO1999016328A1 (fr) * 1997-09-30 1999-04-08 Winter Cvd Technik Gmbh Pierre precieuse
WO1999055188A1 (fr) * 1998-04-23 1999-11-04 Winter Cvd Technik Gmbh Pierres ornementales
US11927916B2 (en) 2019-03-14 2024-03-12 Seiko Epson Corporation Watch component, watch movement and watch
US12001169B2 (en) 2019-07-16 2024-06-04 Seiko Epson Corporation Watch component, watch movement and watch

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837594Y1 (fr) * 1970-06-23 1973-11-08
US4490440A (en) * 1983-08-16 1984-12-25 Reber William L High technology jewelry and fabrication of same
JPS6013599A (ja) * 1983-06-23 1985-01-24 メタレン・エス・ア− 装飾物品およびその製造方法
JPH0339102A (ja) * 1989-07-03 1991-02-20 Bock & Schupp Gmbh & Co Kg 板状金属装飾品または同様なバツジ、メダルまたは文字盤

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837594Y1 (fr) * 1970-06-23 1973-11-08
JPS6013599A (ja) * 1983-06-23 1985-01-24 メタレン・エス・ア− 装飾物品およびその製造方法
US4490440A (en) * 1983-08-16 1984-12-25 Reber William L High technology jewelry and fabrication of same
JPH0339102A (ja) * 1989-07-03 1991-02-20 Bock & Schupp Gmbh & Co Kg 板状金属装飾品または同様なバツジ、メダルまたは文字盤

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0771892A4 (fr) * 1994-08-01 1997-11-19 Komatsu Denshi Kinzoku Kk Procede de production de silicone decorative
WO1999016328A1 (fr) * 1997-09-30 1999-04-08 Winter Cvd Technik Gmbh Pierre precieuse
WO1999055188A1 (fr) * 1998-04-23 1999-11-04 Winter Cvd Technik Gmbh Pierres ornementales
US11927916B2 (en) 2019-03-14 2024-03-12 Seiko Epson Corporation Watch component, watch movement and watch
US12001169B2 (en) 2019-07-16 2024-06-04 Seiko Epson Corporation Watch component, watch movement and watch

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