WO1993017593A1 - Decorative silicon article - Google Patents

Decorative silicon article Download PDF

Info

Publication number
WO1993017593A1
WO1993017593A1 PCT/JP1992/000273 JP9200273W WO9317593A1 WO 1993017593 A1 WO1993017593 A1 WO 1993017593A1 JP 9200273 W JP9200273 W JP 9200273W WO 9317593 A1 WO9317593 A1 WO 9317593A1
Authority
WO
WIPO (PCT)
Prior art keywords
silicon
oxide film
present
color
decorative
Prior art date
Application number
PCT/JP1992/000273
Other languages
French (fr)
Japanese (ja)
Inventor
Hideo Kumagai
Kenzo Fujinuki
Itaru Imai
Original Assignee
Komatsu Electronic Metals Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Electronic Metals Co., Ltd. filed Critical Komatsu Electronic Metals Co., Ltd.
Priority to PCT/JP1992/000273 priority Critical patent/WO1993017593A1/en
Publication of WO1993017593A1 publication Critical patent/WO1993017593A1/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C17/00—Gems or the like

Definitions

  • the present invention relates to a decorative article having an oxide film formed on a silicon surface having a flat surface.
  • the present invention provides a material having excellent decorativeness by coloring the silicon surface without using a coloring agent. Therefore, a single-layer oxide film is formed on the surface of the silicon having a flat surface. It is characterized by the fact that it has been formed.If a part of this oxide film is removed, or if polycrystalline silicon is used, precious stones with beautiful value such as radiance and color are obtained. Provided.
  • FIG. 1 is a perspective view showing one embodiment of a silicon decorative article of the present invention.
  • FIGS. 2 (a) and 2 (b) show different embodiments of the silicone decorative article of the present invention.
  • FIGS. 3 (a) and 3 (f) are perspective views showing examples of processing silicon decorative articles of the present invention.
  • 4 (a) to 4 (c) are cross-sectional views for different steps of different embodiments of the silicon decorative article of the present invention.
  • FIGS. 5 (a) to 5 (c) are cross-sectional views of the silicon decorative article according to the present invention, which are different from each other in each step.
  • 6 (a) to 6 (c) are diagrams showing an application example of the silicon decorative article of the present invention.
  • FIGS. 7 (a) and 7 (b) are schematic diagrams showing the principle of color development of an embodiment of the silicon decorative article of the present invention.
  • the uniform oxide film formed on the silicon plane changes its effective film thickness as shown in Fig. 7 depending on the viewing direction. Therefore, the color due to the difference in the film thickness described in the above-mentioned literature changes in various directions depending on the viewing direction, and even if it is a flat surface, it has a beautiful and highly decorative appearance. It is likely to be. In particular, it is thought that the cut surfaces are very beautiful because the color tone from each surface is different and changes gradually according to the viewing direction.
  • FIG. 3 shows one processing example of the silicon decorative article of the present invention.
  • Fig. 3 (a) is a plate-shaped one. Other decorations can be attached to one side with an adhesive or the like.
  • a hole having an appropriate depth is provided in the plate surface of FIG. 3 (a), so that screws can be fixed to a pedestal or the like.
  • the ones shown in Fig. 3 (c) to Fig. 3) have a through hole, and because of the large number of them, It can also be applied to brochures and the like.
  • a silicon single crystal ingot for semiconductor manufacturing and a plurality of silicon plates having a thickness of 3 mm are cut.
  • the length is 50 mm and the width is 5 mm.
  • FIG. 2 (b) shows a block-shaped silicon that has been diced, an oxide film has been formed on each surface, and only the oxide film on any surface has been removed. This is an example that was made by removing it.
  • the main difference between the present embodiment and the first embodiment of the present invention is that the surface of the silicon plate before the oxide film is formed is mirror-finished.
  • the other conditions are the same as those in the first embodiment, and the sample ⁇ 7-! ⁇ ⁇ 1 2 was manufactured. .
  • Embodiments 1 and 2 of the present invention the main difference from Embodiments 1 and 2 of the present invention is that a polycrystal is used for the silicon material, Under the same conditions, sample ⁇ 13-No. 18 was made. The color of each sample is as shown in Table 3.
  • Embodiment 2 Another embodiment of the present invention will be described. This embodiment is the same as Embodiment 2 except that the main difference between Embodiments 1 and 2 of the present invention is that polycrystalline silicon is used as the silicon material. Under the conditions, samples ⁇ ⁇ 9 to 4 ⁇ 24 were manufactured. The color of each sample is as shown in Table 4
  • the thickness of the silicon oxide film according to each of the above embodiments is uniform, since the surface is a plate surface, the effective film thickness differs depending on the viewing angle, and the color of the reflected light differs. come. This is because when the light is reflected back in the oxide film, as viewed obliquely, the state becomes the same as the thickness of the oxide film increases.
  • the substrate is formed in a polyhedral shape, even if the oxide film has a uniform thickness, the surface / film thickness of each surface is different, so that the oxide film shines in various colors. Of course, if you look at each surface at right angles, it will look like the original color.
  • FIGS. 4 (a) to 4 (c) show a step-by-step process of manufacturing a silicon decorative article in this embodiment.
  • Reference numeral 10 indicates a photo register.
  • the oxide film in the window opening was kept in a state where an arbitrary thickness was left.
  • the oxide film was completely etched. If removed, silicon's own surface Since it can be exposed, it can be made into a silicon ornament that has a mixed metallic luster.
  • FIGS. 5 (a) to 5 (c) also show the manufacturing steps in order, similarly to FIGS. 4 (a) to 4 (c).
  • the partial removal of the oxide film can be achieved by using an appropriate etching agent such as HF on the surface, without using the method of applying a resist and opening a window.
  • an appropriate etching agent such as HF
  • a polycrystalline silicon plate may be used to exhibit a mosaic pattern, for example, a wall material or a nameplate may be raised when the nameplate is changed. You.
  • the silicon decorative article of the present invention has a beautiful appearance due to the thin oxide film on its surface, and in particular, those having a mirror-finished surface are slightly natural in the South Sea. It has an appearance similar to or better than the available black pearls. If these ornaments are offered in various shapes at low cost, the desire of the world for beauty can be fulfilled again. For men, silicone ornaments with colored rafts, durability, novelty, and applicability, such as neck pins and fues, are available. provide.
  • the thickness of the oxide film can be freely controlled by appropriately selecting the oxidation conditions, so that a silicon decorative article having a desired brightness can be manufactured with good reproducibility.
  • the silicon oxide film is the same as that of so-called quartz, it has high hardness, excellent chemical resistance and heat resistance, and can be made of natural pearl or any other material. More durable than such imitations.
  • the pearl absorbs sweat and deteriorates, but the silicone decorative article according to the present invention is stable.
  • the specific gravity is about 2.9 for pearls and about 2.3 for silicones, so they do not feel heavy when worn.
  • the silicon oxide film is inactive, it has no adverse effect on the human body, such as a metal alloy, which has recently become a problem.
  • the present invention utilizes the light interference effect of the silicon oxide film, the same effect can be expected by the nitride film. Since the nitride film has a higher hardness and is more stable than the oxide film, it can be used especially as a protective film.
  • the present invention is characterized in that an oxide film is uniformly grown on the surface of a silicon having a flat surface, or that the oxide film is partially etched.
  • the use of mirror-polished silicon makes it more brilliant than black pearls, more beautiful in color, etc., and can be processed freely in a flat shape. Obtainable.

Landscapes

  • Silicon Compounds (AREA)

Abstract

A raw material having a high decorativeness by forming colors on a silicon surface without using colorants, characterized in that a single layer of an oxide film is formed on the silicon surface having a flat surface. When a part of this oxide film is removed or when polycrystalline silicon is used, a precious stone having a high beautiful value such as brightness and colors can be provided.

Description

明 細  Details
シ リ コ ン装飾 an  Silicon decoration an
技術分野  Technical field
本発明は、 平面を有する シ リ コ ン表面に酸化膜を形成 さ せた装飾品に関する。  The present invention relates to a decorative article having an oxide film formed on a silicon surface having a flat surface.
背景技術  Background art
従来か ら、 金属類、 宝石の代用品 と して、 た とえば、 卑金属類の表面に着色 した り 、 メ ツ キ層を設けた り 、 あ る いは合成樹脂に着色 した り した も のがあ る。 ま た、 最 近では と く に、 先端技術分野で製造される材料、 た とえ ば鏡面シ リ コ ン板を装飾用 と して、 ネ ク タ イ ピ ンの装飾 部分に使っ た り した も のがあ 。  Conventionally, as a substitute for metals and jewels, for example, coloring the surface of base metals, providing a plating layer, or coloring a synthetic resin has been used. There is. In recent years, in particular, materials manufactured in advanced technology fields, such as mirror-surface silicon plates, have been used as decorations and used for decorating parts of neck pins. The thing is.
しか し、 金属やシ リ コ ンの場合は、 材料の生地そ の も のを利用する と き は問題はないが、 着色 した も のがあ る と、 着色剤が剝離 しゃす く 、 耐久性に問題があ つ た。 さ ら に、 新 しい貴石 と して色彩、 色の深み、 耐久-性、 輝き 等の装飾性に優れる も のを得る こ と は、 難 し力、 つ た。  However, in the case of metal or silicon, there is no problem when using the material itself, but if there is any colored material, the colorant will release easily and durability will increase. There was a problem. Moreover, it was difficult to obtain new precious stones with excellent decorative properties such as color, depth of color, durability and shine.
発明の開示  Disclosure of the invention
本発明は、 着色剤を用いずに、 シ リ コ ン表面を発色さ せ、 装飾性に優れる素材を提供する も ので、 平面を有す る シ リ コ ンの表面に単一層の酸化膜を形成さ せた こ と を 特徴 と し、 ま た こ の酸化膜の一部を除去した り 、 多結晶 シ リ コ ン を用 い る と、 輝き、 色彩等の美麗な価値のあ る 貴石が提供さ れる。  The present invention provides a material having excellent decorativeness by coloring the silicon surface without using a coloring agent. Therefore, a single-layer oxide film is formed on the surface of the silicon having a flat surface. It is characterized by the fact that it has been formed.If a part of this oxide film is removed, or if polycrystalline silicon is used, precious stones with beautiful value such as radiance and color are obtained. Provided.
図面の簡単な説明 第 1 図は本発明の シ リ コ ン装飾品の一実施例を示す斜 視図。 BRIEF DESCRIPTION OF THE FIGURES FIG. 1 is a perspective view showing one embodiment of a silicon decorative article of the present invention.
第 2 図（a) (b)は本発明の シ リ コ ン装飾品の異な る実施 例を示す図  FIGS. 2 (a) and 2 (b) show different embodiments of the silicone decorative article of the present invention.
第 3 図（a) (f)は本発明の シ リ コ ン装飾品の加工例を示 す斜視図。  FIGS. 3 (a) and 3 (f) are perspective views showing examples of processing silicon decorative articles of the present invention.
第 4 図（a)〜（c)は本発明の シ リ コ ン装飾品の異なる実施 例の工程毎の断面図。  4 (a) to 4 (c) are cross-sectional views for different steps of different embodiments of the silicon decorative article of the present invention.
第 5 図（a)〜（c)は本発明の シ リ コ ン装飾品の さ ら に異な る実施例の工程毎の断面図。  FIGS. 5 (a) to 5 (c) are cross-sectional views of the silicon decorative article according to the present invention, which are different from each other in each step.
第 6 図（a)〜（c)は本発明の シ リ コ ン装飾品の応用例を示 す図。  6 (a) to 6 (c) are diagrams showing an application example of the silicon decorative article of the present invention.
第 7 図（a)、 （b)は本発明の シ リ コ ン装飾品の一実施例の 発色原理を示す模式図。  FIGS. 7 (a) and 7 (b) are schematic diagrams showing the principle of color development of an embodiment of the silicon decorative article of the present invention.
発明を実施する ための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
従来よ り 、 シ リ コ ン表面に酸化膜が存在する こ と に よ って、 その呈する色が、 膜厚で変わる こ とは、 知 られ ている （ 「 シ リ コ ン集積素子技術の基礎」 R . M ノく一 力 一， R . P . ド ノ フ ァ ン， P 6 7 表 2 . 8 ) こ の文献に掲げられた ものは、 半導体ウェハの酸化膜に よ る デバイ スの電気的な保護膜で、 厚みの 目視検查用 に 研究された も のであ る。 本発明者ら は長年の研究によ り 球面お よび曲面を有する シ リ コ ン装飾品を開発 し、 特願 平 2 — 24 1 229号にその技術を述べている。 しか し、 本発 明者ら は、 平面を有する も のであ っ て も、 こ れを装飾品 と して用 レ、 る と、 高貴な風あ いの も のが得 られ る こ と を 見出 した。 Conventionally, it is known that the presence of an oxide film on the silicon surface changes its color depending on the film thickness (see “Basics of Silicon Integrated Device Technology”). R. M. No. Power, R. P. Donofan, P. 67 Table 2.8) What is listed in this document is that the electrical conductivity of the device due to the oxide film on the semiconductor wafer is high. A protective film that has been studied for visual inspection of thickness. The present inventors have developed silicon ornaments having a spherical surface and a curved surface through many years of research, and have described the technology in Japanese Patent Application No. 2-24229. However, the present inventors, even though they have a flat surface, use this as a decorative item. As a result, I found that noble windy things could be obtained.
シ リ コ ン平面上に形成 さ れた均一な酸化膜は、 見 る方 向 に よ り 第 7 図 の よ う に、 実効膜厚が変化す る 。 し た がっ て、 前記文献に記載さ れた膜厚の差に よ る色彩が、 見る方向で様々 に変化 し、 平面であ っ て も美麗で装飾性 の高い外観を呈す る よ う に な る と思われ る 。 と く に、 カ ツ ト 面を形成 した も のは、 各面か ら の色調がそれぞれ 異な っ て、 かつ見る方向に よ っ て逐次変化 してい く ため 極めて美麗な る も の と思われる。  The uniform oxide film formed on the silicon plane changes its effective film thickness as shown in Fig. 7 depending on the viewing direction. Therefore, the color due to the difference in the film thickness described in the above-mentioned literature changes in various directions depending on the viewing direction, and even if it is a flat surface, it has a beautiful and highly decorative appearance. It is likely to be. In particular, it is thought that the cut surfaces are very beautiful because the color tone from each surface is different and changes gradually according to the viewing direction.
第 3 図は、 本発明の シ リ コ ン装飾品の一加工例を示 し た も のであ る。 第 3 図（a)は、 板状の も のであ る。 一方の 面に接着剤等に よ り 、 他の装飾物を取 り 付け る こ とがで き る。 第 3 図（b)は、 第 3 図（a)の板面に適当な深 さ の穴を 設けた も ので、 台座な どに ビス止めが可能 と な る。 第 3 図（c)乃至第 3 図ば）に示 した も のは、 通 し穴を有 してお り た とえ ば、 多数個を連ね る こ と に よ り 、 ネ ッ ク レ スゃブ ロ ーチ等に も 応用でき る。  FIG. 3 shows one processing example of the silicon decorative article of the present invention. Fig. 3 (a) is a plate-shaped one. Other decorations can be attached to one side with an adhesive or the like. In FIG. 3 (b), a hole having an appropriate depth is provided in the plate surface of FIG. 3 (a), so that screws can be fixed to a pedestal or the like. The ones shown in Fig. 3 (c) to Fig. 3) have a through hole, and because of the large number of them, It can also be applied to brochures and the like.
実施例 1  Example 1
実施例について図面を参照 して説明する と、 半導体製 造に用 い られ る シ リ コ ン単結晶イ ン ゴ ッ ト カ、 ら、 ま ず 3 匪厚みの シ リ コ ン板を複数枚切 り 出 し、 長 さ 5 0 mm . 幅 5 mm■に ΙΙΠ丄 しァこ 。  The embodiment will be described with reference to the drawings. First, a silicon single crystal ingot for semiconductor manufacturing, and a plurality of silicon plates having a thickness of 3 mm are cut. The length is 50 mm and the width is 5 mm.
次に、 こ れ らの シ リ コ ン板を、 石英ボー ト に乗せ、 石 英チ ュ ーブ内 に入れ、 表面に、 以下の条件で酸化腠付け を行ない、 下記の定めた時間 ごとに 1 0 枚ずつを抜き取 り なが ら、 サ ンプルを作っ た。 こ のサ ンプルを第 1 図に 示す。 符号 1 は シ リ コ ン酸化膜、 符号 2 はシ リ コ ンであ る o Next, these silicon plates are placed on a quartz boat, placed in a quartz tube, and oxidized on the surface under the following conditions. Was performed, and samples were made while extracting 10 sheets at the time specified below. This sample is shown in Fig. 1. Symbol 1 is silicon oxide film, symbol 2 is silicon o
酸化 ¾ 1 0 8 5 °C  Oxidation ¾ 1 0 8 5 ° C
酸素 5 0 Z分（Wet)  Oxygen 50 Z min (Wet)
用ガス N2 2 0 Z分 Gas for N 2 20 Z min
酸化時間 Να 1 8 分 3 0 秒  Oxidation time Να 1 8 minutes 30 seconds
Να 2 9 分  Να 2 9 minutes
No. 3 9 分 3 0 秒  No. 3 9 minutes 30 seconds
Να 4 1 6 分 1 5 秒  Να 4 16 minutes 15 seconds
Να 5 2 4 分  Να 5 2 4 minutes
Να 6 3 5 分  Να 6 3 5 minutes
は、 最低の も ので 0.2 # ( Να 1 ) 、 最高の物で 0.47Α Is 0.2 # (Να 1) for the lowest and 0.47 で for the highest
( Να 6 ) であ る。 各サ ンプルの色合いは、 第 1 表の よ う での る (Να 6). The color of each sample is as shown in Table 1.
表 1  table 1
サ ンプル 色 外観  Sample color Appearance
Να 1  Να 1
Να 2 黒真珠色状  Να2 black pearl color
Να 3 赤金 つや消 し  Να 3 red gold frosted
Να 4 青金  Να 4 blue gold
Να 5 Α綠  Να 5 Α 綠
Να 6 青紫  Να 6 blue purple
なお、 本実施例では、 第 1 図の よ う に単に板状の も の であ るが、 第 2 図（a)に示 した端面をカ ツ ト した も ので も 同様に作製でき る。 なお、 第 2 図（b)は、 ブロ ッ ク 状の シ リ コ ン に ダィ ャカ ツ ト を施 し、 各面に酸化膜を形成 した のち、 さ ら に任意の面の酸化膜だけ除去 して作製 した一 例であ る。 In this embodiment, as shown in FIG. However, the same method can be applied to the case where the end face shown in FIG. 2 (a) is cut. Fig. 2 (b) shows a block-shaped silicon that has been diced, an oxide film has been formed on each surface, and only the oxide film on any surface has been removed. This is an example that was made by removing it.
実施例 2  Example 2
次に、 本発明の異な る実施例につき説明する。 本実施 例において、 前記本発明の実施例 1 と主に異な る 点は、 酸化膜付けを行な う 前の シ リ コ ン板の表面を鏡面仕上げ している こ とであ る。 他は、 前記実施例 1 と同一の条件 で、 サ ン プル Να 7 〜！ ία 1 2 を製作 した。.  Next, different embodiments of the present invention will be described. The main difference between the present embodiment and the first embodiment of the present invention is that the surface of the silicon plate before the oxide film is formed is mirror-finished. The other conditions are the same as those in the first embodiment, and the sample Να 7-! ί α 1 2 was manufactured. .
各サ ンプルの色合いは、 第 2 表の よ う であ る。  The color of each sample is as shown in Table 2.
表 2  Table 2
サ ンプル Ntx 色 外観  Sample Ntx Color Appearance
Να 7  Να 7
Να 8 黒真珠色状  Να 8 black pearl color
Να 9 赤金 つや有 Να 1 0  Να 9 Red gold Shiny 有 α 1 0
Να 1 1 黄綠 Να 1 1 yellow 綠
α 1 2 青紫  α 1 2 Blue purple
実施例 3  Example 3
本発明の 、 さ ら に異な る実施例を説明する。 本実施例 において、 前記本発明の実施例 1 , 2 と主に異な る 点は 素材 とな る シ リ コ ン に、 多結晶を用いてい る こ とであ る 他は、 全て実施例 1 と同一条件で、 サ ンプル Να 1 3 〜 No. 1 8 を製作 した。 各サンプルの色合いは、 第 3 表のよ う であ る。 Another embodiment of the present invention will be described. In this embodiment, the main difference from Embodiments 1 and 2 of the present invention is that a polycrystal is used for the silicon material, Under the same conditions, sample Να 13-No. 18 was made. The color of each sample is as shown in Table 3.
表 3  Table 3
サンプル Να 色 外観  Sample Να Color Appearance
Να 1 3  Να 1 3
Να 1 4 黒真珠色状  Να 1 4 black pearl color
Να 1 5 赤金 つや消 し  Να 1 5 red gold frosted
Να 1 6 モザィ ク模様 Να 1 7 黄綠  Να 1 6 mosaic pattern Να 1 7 yellow 綠
Να 1 8 青紫  Να 1 8 bluish purple
実施例 4  Example 4
本発明の さ ら に異な る実施例を説明する。 本実施例 において、 前記本発明の実施例 1 , 2 と主に異なる点は 素材とな る シ リ コ ン に、 多結晶を用いている こ とであ る 他は、 全て実施例 2 と同一条件で、 サ ンプル Να ΐ 9 〜Να 2 4 を製作 した。 各サ ンプルの色合いは、 第 4·表のよ う であ る  Another embodiment of the present invention will be described. This embodiment is the same as Embodiment 2 except that the main difference between Embodiments 1 and 2 of the present invention is that polycrystalline silicon is used as the silicon material. Under the conditions, samples Να ΐ9 to 4α24 were manufactured. The color of each sample is as shown in Table 4
表 4  Table 4
サ ン プル Not 色 外観  Sample Not color Appearance
Να 1 9  Να 1 9
Να 2 0 黒真珠色状  Να 20 black pearl color
Να 2 1 赤金 つや有 Να 2 1 Red gold Shiny
Να 2 2 青金 モザィ ク模様Να2 2 blue gold mosaic pattern
Να 2 3 Λ緑 Να2 3 Λgreen
Να 2 4 前記各実施例に よ る シ リ コ ンの酸化膜厚みは、 均一で あ るが、 板面であ る ため、 見る角度で実効膜厚が異な り 反射 して く る光の色が違っ て く る。 こ れは酸化膜中を光 が反射 して戻つ て く る と き、 斜めに見る ほ ど、 酸化膜の 厚みが増 したの と同 じ状態にな る ためであ る。 基材を多 面体に形成する と、 均一厚みの酸化膜で も、 それぞれの 面で実 ¾ /膜厚が異な る こ とか ら、 いろんな色に輝 く 。 も ち ろん 、 どの面 も直角 に面を見た場合は、 本来の色合い に見える。 Να 2 4 Although the thickness of the silicon oxide film according to each of the above embodiments is uniform, since the surface is a plate surface, the effective film thickness differs depending on the viewing angle, and the color of the reflected light differs. come. This is because when the light is reflected back in the oxide film, as viewed obliquely, the state becomes the same as the thickness of the oxide film increases. When the substrate is formed in a polyhedral shape, even if the oxide film has a uniform thickness, the surface / film thickness of each surface is different, so that the oxide film shines in various colors. Of course, if you look at each surface at right angles, it will look like the original color.
なお 、 酸化膜付けは、 8 0 0 °C〜 1 300 °Cの温度範囲が実 用的であ る。  Note that the temperature range of 800 ° C. to 1300 ° C. is practical for attaching an oxide film.
実施例 5  Example 5
実施例 1 に用いた も の と同様に酸化膜付け加工 した シ リ っ ン板に、 通常半導体素子製造の際採用 さ れる 「 レ ジ ス ト塗布 - 窓開 け」 方法に よ り 、 酸化膜を部分的に一定 深 さ だけエ ッ チ ン グ して規定量の酸化膜を残 した。 レ ジ ス ト を除去 して、 酸化膜厚の異な る部分が混在する シ リ コ ン装飾品を得た。 こ の様子を第 4 図（c)に示す。 膜厚が 部分的に異な る こ とか ら、 同一面において も様々 な色相 を呈する装飾品 と な つ た。 なお、 第 4 図（a)乃至 (c)は本実 施例での シ リ コ ン装飾品を製造する一工程を順を追 っ て 示 した も のであ る。 符号 1 0は フ ォ ト レ ジス ト を示す。  An oxide film is applied to a silicon plate having an oxide film applied thereto in the same manner as that used in Example 1 by the “resist coating-window opening” method usually employed in the manufacture of semiconductor devices. Was partially etched to a constant depth to leave a specified amount of oxide film. The resist was removed to obtain a silicon ornament in which portions with different oxide film thicknesses were mixed. This is shown in Fig. 4 (c). Since the film thickness was partially different, it was a decorative product that exhibited various hues even on the same surface. FIGS. 4 (a) to 4 (c) show a step-by-step process of manufacturing a silicon decorative article in this embodiment. Reference numeral 10 indicates a photo register.
なお、 本実施例では、 窓開 け部分の酸化膜を任意の厚 みを残 した状態に と どめたが、 第 5 図（c)に示すよ う に、 エ ッ チ ン グで完全に取 り 除けば、 シ リ コ ン 自身の表面を 露出 させる こ とが出来るか ら、 金属光沢が混在した よ う な シ リ コ ン装飾品 とする こ とが出来る。 第 5 図（a)乃至（c) も第 4 図（a)乃至（c)同様、 製造ェ程を順を追っ て示 してい る。 In the present embodiment, the oxide film in the window opening was kept in a state where an arbitrary thickness was left. However, as shown in FIG. 5 (c), the oxide film was completely etched. If removed, silicon's own surface Since it can be exposed, it can be made into a silicon ornament that has a mixed metallic luster. FIGS. 5 (a) to 5 (c) also show the manufacturing steps in order, similarly to FIGS. 4 (a) to 4 (c).
また酸化膜の部分的除去は、 「 レ ジス ト塗布一窓開け J 方法によ らな く て も、 面上に適当に HF等のエ ツ チ ン グ剤 In addition, the partial removal of the oxide film can be achieved by using an appropriate etching agent such as HF on the surface, without using the method of applying a resist and opening a window.
¾：滴 ！ "_、 噴霧した り 研磨パ ッ ト等で、 研磨 した り する こ とでも可能であ る ¾: Drops! " _ , It is also possible to polish by spraying or polishing pad etc.
さ ら に、 窓開けは マス ク を用いる こ と によ り 、 文字、 数字、 §己 、 絵記号 ブロ ッ クパタ ー ン、 幾何図形 6 等 ができ る ので、 フ ァ ッ シ ョ ン性、 カ ラ フ ル性の趣向を凝 ら したシ リ コ ン装飾品を得る こ と も 出来る。 その一例を 第 6 図 (a)〜 (c)に示す。  In addition, by using a mask to open the window, letters, numbers, characters, pictorial symbol block patterns, geometric figures 6, etc. can be created. It is also possible to obtain silicon ornaments that have elaborate raffinity. An example is shown in Fig. 6 (a) to (c).
また 、 本発明の応用例 と して 、 多結晶 シ リ コ ン 板を 使用 してモザイ ク模様を呈する、 た とえば、 壁材や表札 変わつ た と こ ろでは位牌等掲げる こ とができ る。  Further, as an application example of the present invention, a polycrystalline silicon plate may be used to exhibit a mosaic pattern, for example, a wall material or a nameplate may be raised when the nameplate is changed. You.
本発明の シ リ コ ン装飾品は、 その表面の薄い酸化膜の ため、 feめて美麗な外観を呈 し、 特に、 表面が鏡面処理 された平面を有する も のは、 南洋にわずか天然に採れる 黒真珠と同様も し く はそれ以上の外観を呈する。 こ う し た装飾品が、 いろんな形状で安価で提供さ れれぱ、 世の 女性の美への願望、も、 また叶え られる こ と にな る。 ま た 男性用 には、 ネ ク タ イ ピ ンや力 フ スな どに、 色彩のあ る 力 ラ フ ル性、 耐久性、 新規性、 応用性を秘めた、 シ リ コ ン装飾品を提供する。 酸化膜厚は、 そ の酸化条件を適宜選べば自 由 に制御で き る ため、 所望の輝き を持つ シ リ コ ン装飾品を再現性良 く 製造でき る。 た とえばカ ツ ト面を有する も のであ っ て も、 シ リ コ ン に関 しては加工上の問題はなレ、か ら、 タ イ ピ ンな どの同一形状品の均質な も のを得る こ とができ、 装飾品 と して充分価値のあ る も の とな る。 真珠等の よ う に天然の も のでは、 自 由な形状に加工する こ と は困難で あ るが、 本発明の シ リ コ ン装飾品では、 大き さ、 形状が 自 由 に選べる上、 加工 も 自 由であ るか ら、 様々 な分野の 装飾に応用でき る。 The silicon decorative article of the present invention has a beautiful appearance due to the thin oxide film on its surface, and in particular, those having a mirror-finished surface are slightly natural in the South Sea. It has an appearance similar to or better than the available black pearls. If these ornaments are offered in various shapes at low cost, the desire of the world for beauty can be fulfilled again. For men, silicone ornaments with colored rafts, durability, novelty, and applicability, such as neck pins and fues, are available. provide. The thickness of the oxide film can be freely controlled by appropriately selecting the oxidation conditions, so that a silicon decorative article having a desired brightness can be manufactured with good reproducibility. For example, even if it has a cutting surface, there is no problem in processing silicon, and therefore, a uniform product such as a die pin or the like And can be of sufficient value as a decorative item. Although it is difficult to form a natural shape such as pearls into a free shape, the size and shape of the silicone ornament of the present invention can be freely selected. Since the processing is free, it can be applied to decoration in various fields.
さ らに、 シ リ コ ン の酸化膜は、 いわゆる石英 と同一の も のであ るか ら、 硬度が高 く 、 耐薬品性、 耐熱性 も優れ てお り 、 天然の真珠や、 その他 どの よ う なイ ミ テ一 シ ョ ン よ り 耐久性があ る。 長期間に及ぶ使用では、 真珠は汗 を吸って変質劣化するが、 本発明に よ る シ リ コ ン装飾品 は安定であ る 。 ま た、 比重をみ る と、 真珠の場合、 約 2. 9 、 シ リ コ ン は約 2. 3 であ るか ら、 身に付けて も重 く 感 じ る こ と はない。 さ ら に、 シ リ コ ン酸化膜は、 不活性 であ る ため、 最近頓に問題にな っ て き てい る金属ア レ ル ギ一の よ う な、 人体への悪影響 も全 く ない。 ま た本発明 はシ リ コ ン の酸化膜に よ る光の干渉作用を利用 している も のであ るが、 窒化膜に よ っ て も同等の作用効果を期待 でき る。 窒化膜は酸化膜よ り さ ら に硬度が高 く 安定であ る ので、 特に保護膜をかねての利用が可能であ る。  Furthermore, since the silicon oxide film is the same as that of so-called quartz, it has high hardness, excellent chemical resistance and heat resistance, and can be made of natural pearl or any other material. More durable than such imitations. In the case of long-term use, the pearl absorbs sweat and deteriorates, but the silicone decorative article according to the present invention is stable. In addition, the specific gravity is about 2.9 for pearls and about 2.3 for silicones, so they do not feel heavy when worn. Furthermore, since the silicon oxide film is inactive, it has no adverse effect on the human body, such as a metal alloy, which has recently become a problem. Although the present invention utilizes the light interference effect of the silicon oxide film, the same effect can be expected by the nitride film. Since the nitride film has a higher hardness and is more stable than the oxide film, it can be used especially as a protective film.
産業上の利用可能性 本発明は、 平面を有 した シ リ コ ンの表面に酸化膜を均 —に成長させ、 あ る いは、 酸化膜を部分的にエ ッ チ ン グ したこ とを特徴 と している。 特に鏡面研磨したシ リ コ ン を用いる と、 黒真珠以上の輝き、 色彩等の美 し さがあ り 平面形状も 自在に加工出来る ので、 幅広い応用性があ り 新規性のあ る装飾品を得る こ とができ る。 Industrial applicability The present invention is characterized in that an oxide film is uniformly grown on the surface of a silicon having a flat surface, or that the oxide film is partially etched. In particular, the use of mirror-polished silicon makes it more brilliant than black pearls, more beautiful in color, etc., and can be processed freely in a flat shape. Obtainable.

Claims

請 求 の 範 囲 The scope of the claims
1 . 平面を有する シ リ コ ン の表面に、 酸化処理に よ り 単一層の酸化膜を形成させて成る シ リ コ ン装飾品。  1. Silicon ornaments formed by forming a single-layer oxide film by oxidation on the surface of a flat silicon.
2 . シ リ コ ン の表面が鏡面であ る こ とを特徴 とする請 求の範囲第 1 項記載の シ リ コ ン装飾品。  2. The silicone ornament according to claim 1, wherein the surface of the silicon is a mirror surface.
3 . 酸化膜の一部ま たは全部が膜厚方向任意の一定深 さ も し く は全深さ 除去さ れた こ とを特徴 とする請求の範 囲第 1 項ま たは第 2 項記載の シ リ コ ン装飾品。  3. Claims 1 or 2 characterized in that part or all of the oxide film is removed at an arbitrary constant depth or the entire depth in the film thickness direction. Silicon ornaments described.
4 . 多面体の表面に酸化膜処理に よ り単一層の酸化膜 を形成させて成る こ とを特徴 とする シ リ コ ン装飾品。  4. Silicon ornaments characterized by forming a single-layer oxide film on the surface of a polyhedron by an oxide film treatment.
5 . シ リ コ ン の表面が鏡面であ る こ と を特徴 とす る請 求の範囲第 4 項記載の シ リ コ ン装飾品。  5. The silicon ornament according to claim 4, wherein the surface of the silicon is a mirror surface.
6 . 酸化膜の一部ま たは全部が膜厚方向任意の一定深 さ も し く は全深さ 除去さ れた こ とを特徴とする請求の範 囲第 4 項ま たは第 5 項記載の シ リ コ ン装飾品。  6. Claims 4 or 5 characterized in that part or all of the oxide film has been removed at an arbitrary constant depth or the entire depth in the film thickness direction. Silicon ornaments described.
PCT/JP1992/000273 1992-03-06 1992-03-06 Decorative silicon article WO1993017593A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP1992/000273 WO1993017593A1 (en) 1992-03-06 1992-03-06 Decorative silicon article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1992/000273 WO1993017593A1 (en) 1992-03-06 1992-03-06 Decorative silicon article

Publications (1)

Publication Number Publication Date
WO1993017593A1 true WO1993017593A1 (en) 1993-09-16

Family

ID=14042205

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1992/000273 WO1993017593A1 (en) 1992-03-06 1992-03-06 Decorative silicon article

Country Status (1)

Country Link
WO (1) WO1993017593A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0771892A4 (en) * 1994-08-01 1997-11-19 Komatsu Denshi Kinzoku Kk Process for producing decorative silicone
WO1999016328A1 (en) * 1997-09-30 1999-04-08 Winter Cvd Technik Gmbh Decorative stone
WO1999055188A1 (en) * 1998-04-23 1999-11-04 Winter Cvd Technik Gmbh Ornamental stones
US11927916B2 (en) 2019-03-14 2024-03-12 Seiko Epson Corporation Watch component, watch movement and watch
US12001169B2 (en) 2019-07-16 2024-06-04 Seiko Epson Corporation Watch component, watch movement and watch

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837594Y1 (en) * 1970-06-23 1973-11-08
US4490440A (en) * 1983-08-16 1984-12-25 Reber William L High technology jewelry and fabrication of same
JPS6013599A (en) * 1983-06-23 1985-01-24 メタレン・エス・ア− Ornamental article and manufacture thereof
JPH0339102A (en) * 1989-07-03 1991-02-20 Bock & Schupp Gmbh & Co Kg Plate-shaped metallic ornament or like badge, medal or dial plate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837594Y1 (en) * 1970-06-23 1973-11-08
JPS6013599A (en) * 1983-06-23 1985-01-24 メタレン・エス・ア− Ornamental article and manufacture thereof
US4490440A (en) * 1983-08-16 1984-12-25 Reber William L High technology jewelry and fabrication of same
JPH0339102A (en) * 1989-07-03 1991-02-20 Bock & Schupp Gmbh & Co Kg Plate-shaped metallic ornament or like badge, medal or dial plate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0771892A4 (en) * 1994-08-01 1997-11-19 Komatsu Denshi Kinzoku Kk Process for producing decorative silicone
WO1999016328A1 (en) * 1997-09-30 1999-04-08 Winter Cvd Technik Gmbh Decorative stone
WO1999055188A1 (en) * 1998-04-23 1999-11-04 Winter Cvd Technik Gmbh Ornamental stones
US11927916B2 (en) 2019-03-14 2024-03-12 Seiko Epson Corporation Watch component, watch movement and watch
US12001169B2 (en) 2019-07-16 2024-06-04 Seiko Epson Corporation Watch component, watch movement and watch

Similar Documents

Publication Publication Date Title
US4490440A (en) High technology jewelry and fabrication of same
CN101208023B (en) Precious metal jewellery and method for manufacturing the same
WO1993017593A1 (en) Decorative silicon article
JP2009078494A (en) Method for manufacturing ornamental article, and ornamental article
TWM247056U (en) Jewel
WO1996004412A1 (en) Process for producing decorative silicone
JP2000218999A (en) Member having decorative layer
WO1992004840A1 (en) Ornament made of silicon
RU2189769C2 (en) Stone for jewelry articles
US5087528A (en) Fashion article
JPS62180071A (en) Noble metal product having transparent hard film on surface
KR960041402A (en) Manufacturing method for decorative coloring of metal products
JP2017118954A (en) Manufacturing method of jewel and jewel
US7611599B2 (en) Method for production of decorative article and decorative article produced therefrom
KR101985738B1 (en) A method for manufacturing ornaments with patterns protruding outward on the inside of a decorative part
US6536112B1 (en) Process for making jewelry incorporating a microchip
CN2454153Y (en) Gold-carving inlaid picture
JP3134274U (en) Ornaments
CN2896973Y (en) Ring made from ceramic and metal
JP2004113617A (en) Ornament, and its production method
KR100796957B1 (en) The ring and processing method ring
JP2016112071A (en) Ornament and production method of ornament
JPH0339102A (en) Plate-shaped metallic ornament or like badge, medal or dial plate
JP2003183887A (en) Highly corrosion-resistant antique-like plating
CN1806711A (en) Ceramic precious metal finger ring and method for making the same

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): CA JP KR US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): BE CH DE FR GB IT LU NL

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: CA