WO1991017488A3 - Procede de fabrication d'un circuit integre - Google Patents

Procede de fabrication d'un circuit integre Download PDF

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Publication number
WO1991017488A3
WO1991017488A3 PCT/GB1991/000718 GB9100718W WO9117488A3 WO 1991017488 A3 WO1991017488 A3 WO 1991017488A3 GB 9100718 W GB9100718 W GB 9100718W WO 9117488 A3 WO9117488 A3 WO 9117488A3
Authority
WO
WIPO (PCT)
Prior art keywords
manufacturing
integrated circuit
reference beam
mask
recording medium
Prior art date
Application number
PCT/GB1991/000718
Other languages
English (en)
Other versions
WO1991017488A2 (fr
Inventor
William Bell Hugle
Original Assignee
Gibson Stewart Harry
William Bell Hugle
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gibson Stewart Harry, William Bell Hugle filed Critical Gibson Stewart Harry
Publication of WO1991017488A2 publication Critical patent/WO1991017488A2/fr
Publication of WO1991017488A3 publication Critical patent/WO1991017488A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/8252—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Holo Graphy (AREA)

Abstract

Un procédé utilisé pour la fabrication d'un circuit intégré à partir d'un élément en gallium ou d'un autre matériau semi-conducteur III-V consiste à former une image holographique sur un support d'enregistrement (21) par interférence entre un faisceau objet (OB) de lumière cohérente passant à travers un cache (2) et un faisceau de référence (RB1) de lumière cohérente totalement réfléchi vers l'intérieur sur une surface sur laquelle est placé le support d'enregistrement, puis à remplacer le cache par un élément en matériau semi-conducteur revêtu d'un enduit photosensible et à projeter un second faisceau de référence (RB2) dans la direction opposée à celle du premier faisceau de référence (RB1).
PCT/GB1991/000718 1990-05-03 1991-05-03 Procede de fabrication d'un circuit integre WO1991017488A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB909010009A GB9010009D0 (en) 1990-05-03 1990-05-03 Method of manufacturing a transistor
GB9010009.0 1990-05-03

Publications (2)

Publication Number Publication Date
WO1991017488A2 WO1991017488A2 (fr) 1991-11-14
WO1991017488A3 true WO1991017488A3 (fr) 1991-12-12

Family

ID=10675442

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB1991/000718 WO1991017488A2 (fr) 1990-05-03 1991-05-03 Procede de fabrication d'un circuit integre

Country Status (2)

Country Link
GB (1) GB9010009D0 (fr)
WO (1) WO1991017488A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2267356B (en) * 1992-03-13 1995-12-06 Holtronic Technologies Ltd Manufacture of high accuracy T1R holograms for full-field lithography processes

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3635540A (en) * 1968-09-19 1972-01-18 Agfa Gevaert Ag Holography with surface waves
EP0251681A2 (fr) * 1986-06-30 1988-01-07 Holtronic Technologies Limited Fabrication de circuits intégrés utilisant des techniques holographiques
JPS6381877A (ja) * 1986-09-25 1988-04-12 Mitsubishi Electric Corp 半導体負性抵抗素子
WO1990011601A2 (fr) * 1989-03-22 1990-10-04 Gibson Stewart Harry Methode de fabrication de disques optiques
WO1990013062A2 (fr) * 1989-04-19 1990-11-01 Gibson, Stewart, Harry Realisation de visualisations sur ecran plat

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3635540A (en) * 1968-09-19 1972-01-18 Agfa Gevaert Ag Holography with surface waves
EP0251681A2 (fr) * 1986-06-30 1988-01-07 Holtronic Technologies Limited Fabrication de circuits intégrés utilisant des techniques holographiques
JPS6381877A (ja) * 1986-09-25 1988-04-12 Mitsubishi Electric Corp 半導体負性抵抗素子
WO1990011601A2 (fr) * 1989-03-22 1990-10-04 Gibson Stewart Harry Methode de fabrication de disques optiques
WO1990013062A2 (fr) * 1989-04-19 1990-11-01 Gibson, Stewart, Harry Realisation de visualisations sur ecran plat

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
Electronics, vol. 43, no. 6, 16 March 1970, "Masking by hologram", pages 64-65, see page 65, left-hand column, lines 14-20 *
Optik, vol. 30, no. 1, 1969, H. Nassenstein: "Interference, diffraction and holography with surface waves ("subwaves").II.", pages 44-55, see figure 4b; page 54, lines 7-10; page 46, lines 3-8 *
Patents Abstracts of Japan, vol. 12, 29 August 1988, no. 318 (72-E-650)[3165], & JP, A, 63081877 (MITSUBISHI) 12 April 1988 *
Phyics Letters, vol. 28A, no. 3, 18 November 1968, H. Nassenstein: "Holographie und Interferenzversuche mit inhomogenen Oberfl{chenwellen", pages 249-251, see page 250, left-hand column, lines 2-8,14-25; page 250, right-hand column, lines 32-36 *

Also Published As

Publication number Publication date
GB9010009D0 (en) 1990-06-27
WO1991017488A2 (fr) 1991-11-14

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