WO1990013062A3 - Realisation de visualisations sur ecran plat - Google Patents

Realisation de visualisations sur ecran plat Download PDF

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Publication number
WO1990013062A3
WO1990013062A3 PCT/GB1990/000589 GB9000589W WO9013062A3 WO 1990013062 A3 WO1990013062 A3 WO 1990013062A3 GB 9000589 W GB9000589 W GB 9000589W WO 9013062 A3 WO9013062 A3 WO 9013062A3
Authority
WO
WIPO (PCT)
Prior art keywords
flat panel
reference beam
forming
manufacture
panel displays
Prior art date
Application number
PCT/GB1990/000589
Other languages
English (en)
Other versions
WO1990013062A2 (fr
Inventor
William Bell Hugle
Original Assignee
Gibson Stewart Harry
William Bell Hugle
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gibson Stewart Harry, William Bell Hugle filed Critical Gibson Stewart Harry
Priority to EP90906308A priority Critical patent/EP0469026B1/fr
Priority to US07/776,308 priority patent/US5626991A/en
Priority to DE69031119T priority patent/DE69031119T2/de
Publication of WO1990013062A2 publication Critical patent/WO1990013062A2/fr
Publication of WO1990013062A3 publication Critical patent/WO1990013062A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H1/0408—Total internal reflection [TIR] holograms, e.g. edge lit or substrate mode holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H2001/0094—Adaptation of holography to specific applications for patterning or machining using the holobject as input light distribution
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/18—Prism

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

Une méthode de réaliser, par exemple, des éléments pixels sur un écran plat utilisable dans un téléviseur ou dans un ordinateur, comprend la réalisation d'une image holographique volumétrique sur un milieu d'enregistrement (21) par interférence entre un faisceau-objet (OB) de lumière cohérente après son passage à travers un masque (22) et un faisceau de référence (RB1) de lumière cohérente qui est totalement réfléchie, à l'intérieur sur une surface sur laquelle est disposée ledit milieu d'enregistrement (21). Ensuite, on remplace le masque (22) par l'écran plat (26) et on réalise, sur un agent photorésistant ou sur un autre revêtement photosensible, une image de l'enregistrement holographique à l'aide d'un deuxième faisceau de référence (RB2) projeté dans le sens opposé au premier faisceau de référence.
PCT/GB1990/000589 1989-04-19 1990-04-18 Realisation de visualisations sur ecran plat WO1990013062A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP90906308A EP0469026B1 (fr) 1989-04-19 1990-04-18 Realisation de visualisations sur ecran plat
US07/776,308 US5626991A (en) 1989-04-19 1990-04-18 Manufacture of flat panel displays
DE69031119T DE69031119T2 (de) 1989-04-19 1990-04-18 Herstellung von planbildschirmen

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8908871.0 1989-04-19
GB898908871A GB8908871D0 (en) 1989-04-19 1989-04-19 Manufacture of flat panel displays

Publications (2)

Publication Number Publication Date
WO1990013062A2 WO1990013062A2 (fr) 1990-11-01
WO1990013062A3 true WO1990013062A3 (fr) 1990-11-29

Family

ID=10655307

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB1990/000589 WO1990013062A2 (fr) 1989-04-19 1990-04-18 Realisation de visualisations sur ecran plat

Country Status (7)

Country Link
US (1) US5626991A (fr)
EP (1) EP0469026B1 (fr)
JP (1) JP3208450B2 (fr)
KR (1) KR100196560B1 (fr)
DE (1) DE69031119T2 (fr)
GB (1) GB8908871D0 (fr)
WO (1) WO1990013062A2 (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9010009D0 (en) * 1990-05-03 1990-06-27 Hugle William B Method of manufacturing a transistor
US6329104B1 (en) * 1992-03-16 2001-12-11 Holtronic Technologies, Ltd. Position alignment system for holographic lithography process
US5640257A (en) * 1992-10-14 1997-06-17 Holtronic Technologies Ltd. Apparatus and method for the manufacture of high uniformity total internal reflection holograms
GB2271648B (en) * 1992-10-14 1996-04-03 Holtronic Technologies Ltd Apparatus and method for the manufacture of high uniformity total internal reflection holograms
GB2311144B (en) * 1996-03-12 2000-05-24 Holtronic Technologies Ltd Method and apparatus for holographically recording an essentially periodic pattern
DE19700162B4 (de) * 1997-01-07 2006-09-07 Eads Deutschland Gmbh Verfahren zur Herstellung eines holografischen Bildschirms für die Laseraufprojektion
DE19730565A1 (de) 1997-07-17 1999-02-11 Daimler Benz Ag Verwendung eines holographischen Bildschirmes als Darstellungsfläche für Informationssysteme
FR2771520B1 (fr) * 1997-11-24 1999-12-24 Commissariat Energie Atomique Procede de formation de motifs dans une couche de resine photosensible, hologramme pour sa mise en oeuvre et systeme d'enregistrement de l'hologramme, application aux sources et ecrans a micropointes
US6392750B1 (en) * 1999-08-31 2002-05-21 Candescent Technologies Corporation Use of scattered and/or transmitted light in determining characteristics, including dimensional information, of object such as part of flat-panel display
US6359669B1 (en) 1999-09-17 2002-03-19 Rockwell Collins, Inc. Flat panel displays having an edge texture
TWI294252B (en) * 2004-09-28 2008-03-01 Toshiba Matsushita Display Tec Display
KR100727781B1 (ko) * 2006-09-01 2007-06-14 주식회사 대우일렉트로닉스 광정보 처리장치와 처리방법
KR101506949B1 (ko) * 2007-04-16 2015-03-30 노쓰 캐롤라이나 스테이트 유니버시티 기판들 상의 액정 편광 격자들의 제조 방법들 및 관련된 소자들
CN104122672B (zh) * 2014-07-24 2016-02-10 四川大学 一种基于微球形透镜阵列的3d显示器

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3712813A (en) * 1969-12-19 1973-01-23 Siemens Ag Production of semiconductor modules by a photo-resist technique with holographic projection of etching patterns
US3796476A (en) * 1971-08-12 1974-03-12 Ibm Method of making totally internally reflected holograms
GB2184855A (en) * 1985-12-30 1987-07-01 Howard John Davies Photofabrication using laser light to expose photoresist

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1267858A (en) * 1968-09-19 1972-03-22 Agfa Gevaert Ag Holographic process
US3677634A (en) * 1968-12-23 1972-07-18 Ibm Contactless mask pattern exposure process and apparatus system having virtual extended depth of focus
GB1216631A (en) * 1969-01-23 1970-12-23 Standard Telephones Cables Ltd Improvements in or relating to holographic storage of information
US3647289A (en) * 1969-03-28 1972-03-07 Holotron Corp Apparatus and method for hologram copying with reference beam intensity control
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
US4332473A (en) * 1979-01-31 1982-06-01 Tokyo Shibaura Denki Kabushiki Kaisha Apparatus for detecting a mutual positional relationship of two sample members
US4458977A (en) * 1981-06-01 1984-07-10 Hughes Aircraft Company Systems for forming improved reflection holograms with a single beam
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings
US4878086A (en) * 1985-04-01 1989-10-31 Canon Kabushiki Kaisha Flat panel display device and manufacturing of the same
NL8600697A (nl) * 1986-01-09 1987-08-03 Philips Nv Beeldweergeefinrichting en een methode voor de vervaardiging ervan.
FR2593953B1 (fr) * 1986-01-24 1988-04-29 Commissariat Energie Atomique Procede de fabrication d'un dispositif de visualisation par cathodoluminescence excitee par emission de champ
GB8615908D0 (en) * 1986-06-30 1986-08-06 Hugle W B Integrated circuits
GB8629223D0 (en) * 1986-12-06 1987-01-14 Emi Plc Thorn Replication of carriers
GB8802333D0 (en) * 1988-02-03 1988-03-02 Holtronic Technologies Ltd Improvements in manufacture of integrated circuits using holographic techniques

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3712813A (en) * 1969-12-19 1973-01-23 Siemens Ag Production of semiconductor modules by a photo-resist technique with holographic projection of etching patterns
US3796476A (en) * 1971-08-12 1974-03-12 Ibm Method of making totally internally reflected holograms
GB2184855A (en) * 1985-12-30 1987-07-01 Howard John Davies Photofabrication using laser light to expose photoresist

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
Electronics, Volume 43, No. 6, 16 March 1970, "Masking by Hologram", pages 64,65 *
Journal of Optical Society of America, Volume 59, No. 12, December 1969, O. BRYNGDAHL: "Holography with Evanescent Waves", pages 1645-1650 *
Optik, Volume 30, No. 1, 1969, H. NASSENSTEIN: "Interference, Diffraction and Holography with Surfrace Waves ("Subwaves"), II.", pages 44-45 *
PATENT ABSTRACTS OF JAPAN, Volume 9, No. 305 (E-363)(2028), 3 December 1985; & JP-A-60143632 (Yokogawa Hiyuuretsuto Patsukaado K.K.) 29 July 1985 *
Physics Letters, Volume 28A, No. 3, 18 November 1968, H. NASSENSTEIN: "Holographie und Interferenzversuche mit Inhomogenen Oberflachenwellen", pages 249-251 *

Also Published As

Publication number Publication date
DE69031119D1 (de) 1997-09-04
DE69031119T2 (de) 1998-02-05
JPH05505032A (ja) 1993-07-29
KR920701865A (ko) 1992-08-12
US5626991A (en) 1997-05-06
EP0469026A1 (fr) 1992-02-05
JP3208450B2 (ja) 2001-09-10
GB8908871D0 (en) 1989-06-07
EP0469026B1 (fr) 1997-07-23
WO1990013062A2 (fr) 1990-11-01
KR100196560B1 (ko) 1999-06-15

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