WO1988002562A1 - Appareil laser a gaz et procede de production - Google Patents

Appareil laser a gaz et procede de production Download PDF

Info

Publication number
WO1988002562A1
WO1988002562A1 PCT/JP1987/000727 JP8700727W WO8802562A1 WO 1988002562 A1 WO1988002562 A1 WO 1988002562A1 JP 8700727 W JP8700727 W JP 8700727W WO 8802562 A1 WO8802562 A1 WO 8802562A1
Authority
WO
WIPO (PCT)
Prior art keywords
discharge
gas laser
laser device
layer
type gas
Prior art date
Application number
PCT/JP1987/000727
Other languages
English (en)
Japanese (ja)
Inventor
Hakaru Mizoguchi
Ryoichi Nodomi
Original Assignee
Kabushiki Kaisha Komatsu Seisakusho
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP23242086A external-priority patent/JPS6386583A/ja
Priority claimed from JP23802986A external-priority patent/JPS6393179A/ja
Priority claimed from JP25934586A external-priority patent/JPS63114183A/ja
Priority claimed from JP6541787A external-priority patent/JPS63229873A/ja
Application filed by Kabushiki Kaisha Komatsu Seisakusho filed Critical Kabushiki Kaisha Komatsu Seisakusho
Publication of WO1988002562A1 publication Critical patent/WO1988002562A1/fr

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388Compositions, materials or coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/0305Selection of materials for the tube or the coatings thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385Shape
    • H01S3/0387Helical shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation

Definitions

  • the present invention relates to an AC discharge excitation type gas laser device and a method for manufacturing the same, and particularly to a discharge tube thereof. Background technology
  • Gas lasers are attracting attention for use in various fields because of their excellent straightness and coherence.
  • the gas laser unit B consists of a discharge tube filled with gas, a discharge electrode required to excite the discharge tube to create population inversion, and an optical resonator used to cause laser oscillation. It is composed of various shapes, each of which has various forms.
  • an AC discharge excitation axial flow type gas laser device is, for example, a discharge tube 1 composed of a tubular dielectric as shown in FIGS. 2 (a) and (b), and the electric discharge tube.
  • Stripe-shaped discharge electrodes 2a, 2b arranged on the outer wall of the tube so as to face each other in the longitudinal direction, and are provided opposite to both ends of the discharge tube 1. It consists of a total reflection mirror 3 and a partial transmission mirror 4 for forming an optical resonator, and a gas supply system 5 for supplying laser gas to the discharge tube.
  • the gas supply system 5 includes a gas supply pipe 6, a heat exchanger 7, a blower 8 and a gas
  • the discharge tube 9 is provided so that the laser gas is circulated and supplied to the region 10 around the discharge of the discharge tube 1.
  • the mechanism of laser oscillation is as follows.
  • the laser gas compressed by the propellor 8 is cooled iP by the ripening exchanger 7 and enters the discharge tube at a high speed via the gas supply 6 c
  • the dielectric materials that make such arresters have properties such as insulation, heat resistance, aging resistance, discharge resistance, airtightness, and low dielectric loss in addition to dielectric properties.
  • the conventional method is to use a glass material such as quartz glass or B-resistant glass (one-dimensional plex). Ceramic materials such as pressurized sintered compacts> and titania (Ti02) were used.
  • the output voltage of the power supply ⁇ had to be increased due to the large drop.
  • titanium is a hard-to-sinter material and cannot be reduced in thickness, but has a high dielectric constant (ss80>). It has the advantages of being able to lower the voltage, etc.
  • ss 6 to 1 °
  • sintering is relatively easy, and thinner ones are relatively easy to produce, and the reduction resistance is low. Is sufficient.
  • such a ceramic material is originally formed by pressing or extruding a powdery raw material: after forming:
  • the crystal grains P having a grain size of about 1 to 100 m are connected by a glass material called matrix M. It is.
  • this matrix there are usually spherical pores h. This is because the gas is confined in a spherical cavity, and a high voltage is applied to a discharge tube made of a material having such a structure.
  • the AC electric field is applied, the following problem occurs.
  • the discharge electrodes 2a and 2b are formed in accordance with the outer shape of the discharge tube tube (referred to as the ft lower discharge tube) 1 and this is formed.
  • This is a method in which the discharge tube 1 is integrated at a predetermined position by using a mechanical support structure that is mechanically supported by a frame f via a spacer s.
  • Another method is to roughen the outer periphery of a late tube with a sand plate or the like, and form a discharge electrode by metal spraying using a plasma jet (see Japanese Patent Application Laid-Open No. No. 1 4 2 7 8 3).
  • the bonding strength of the metal base for joining metal by metal spraying is based on the so-called “anchor effect", which allows the metal to enter the undulations of the ceramic surface. Therefore, in order to achieve practical bonding strength, it is indispensable to use a discharge tube made of roughened ceramic.
  • the electric field at the metal protrusion is reduced. Locally increased, dielectric breakdown such as triaging progressed, and further electric field concentration occurred along the cracks, leading to accelerated deterioration of the electric tube.
  • there was a major problem in terms of reliability which was a major obstacle in practical use.
  • the present invention has been made in view of the above circumstances, and has as its object to provide a gas laser shield that has a long life, high output efficiency, and stable characteristics.
  • Another object of the present invention is to provide a gas laser device H which is easy to manufacture. Disclosure of the invention
  • this pit light is a arrester material! i) and (2) improvement from the two aspects of formation of a lightning pole on a detonator.
  • a radio-electric material that does not contain pores is used as a discharge tube material.
  • the electric field concentration does not occur at the pores and a partial discharge does not occur, and the stable characteristics can be maintained without deterioration even when used for a long time. .
  • a group electrode formed on the outer surface of the discharge tube is joined to a metallization il formed by a refractory metal method. ing.
  • the degree of adhesion of the discharge electrode is extremely high, and sufficient bonding strength is maintained until the interface between the electrode metal part and the dielectric part forming the discharge tube is kept flat. Therefore, it is possible to prevent a discharge between the metal electrode and the discharge tube, to provide a laser device with high electric-to-optical conversion efficiency, high reputation and high durability.
  • the refractory metal method refers to a conductive paste formed by mixing an organic binder with i powder of a refractory metal such as molyaden (0), tungsten (W), or the like.
  • a metal layer is formed on the ceramic surface by applying it to the surface of the ceramic and performing ripening treatment in a humidified gas.
  • the secondary electrode formed on the outer surface of the discharge tube is bonded via a bonding layer made of an oxidizing sorter or a gold quake solder.
  • FIG. 1 (a) is a cross-sectional explanatory view of an AC discharge excitation type gas laser device E according to a first embodiment of the present invention
  • FIG. Fig. 2 (a) and (b) are general explanatory diagrams of a normal AC emission m-excited gas laser device.
  • FIG. 3 is a diagram showing a process of forming a discharge electrode according to a second embodiment of the present invention.
  • FIG. 4 is a diagram showing a modification of the first embodiment.
  • FIG. 5 is a diagram showing a third embodiment of the present invention.
  • FIGS. 6 and 7 show the AC discharge® propellant gas laser device of Example 2 and the thermal expansion of A i 203 and 'Fe-i-G', respectively.
  • FIG. 8 is a diagram showing the relationship between the coefficient and humidity,
  • FIG. 8 is a diagram showing an AC-excited electro-excitation type gas laser device E according to the third embodiment of the present invention, and
  • Fig. 10 is a diagram showing an AC discharge excitation type gas laser device using a spiral discharge electrode.
  • Fig. 1 (a) is a diagram showing a conventional electrode support structure.
  • Fig. 1 (a) is a diagram showing a conventional electrode support structure.
  • Fig. 1 (a) is a diagram showing a conventional electrode support structure.
  • Fig. 1 (a) is a diagram showing a conventional electrode support
  • FIG. 11 ( b) is an enlarged view of a main part of the structure
  • FIG. 12 is an enlarged explanatory view of an interface between an electrode and a discharge tube formed by using the conventional metal spraying method.
  • the AC discharge excitation axial flow type gas laser device according to the first embodiment of the present invention is referred to as “Luka Rock” as a discharge tube as shown in FIG. 12
  • ⁇ 20 fflm, outer diameter 222 mm, length 300 made of a transparent aluminum that does not contain pores made of stainless steel ( ⁇ ), and a pair of discharge frost electrodes 2 a , 2b were obtained from a metallized composition mainly composed of a molten manganese (Mo-n) formed by the refractory metal method] 120 and a nickel metal coating that covers the upper layer.
  • the electrode material 23 made of copper, the surface of which is covered with nickel plating, is joined to the underlying layer 22 made of This is characterized by the fact that Izuya is exactly the same as the conventional AC discharge-excited axial-flow gas laser device a shown in Fig. 2 (a).
  • This translucent alumina has an alumina density of 99, 9% or more, and fills in the space between the crystal grains P constituting the polycrystal as shown in FIG. Matrix
  • M has almost no pores and has a transmittance of 95% or more to visible light, and is conventionally used as an arc tube for a sodium lamp.
  • FIG. 3 is a process explanatory diagram of a discharge electrode forming process. ⁇ Coating>
  • the discharge tube base made of translucent aluminum that has been cleaned (dried) (process B1), and the fine powder of molybdenum (M 0) and manganese (M n)
  • the conductive paste formed by adding the (Si02) component and the binder is printed and applied to the electrode type by the screen printing method.
  • Slurry (paste coating process B 2 ⁇ (firing)
  • a metallization layer 20 having I0-M ⁇ as a main component is formed by ripening and firing (metallizing (firing) step B3>).
  • M n in the paste becomes manganese oxide (M ⁇ 0) and the glass phase (S i 0 2) in the paste
  • the low-viscosity glass phase is formed, and the low-viscosity glass phase is formed by the translucent aluminum (discharge tube) 1 and the conductive pattern.
  • a gap arriving at the interface with the metallization layer 20 ⁇ is invaded by the capillary action due to capillary action, and the discharge tube 1 and the metallization layer 20). --The layer 2Q is bonded with good adhesion.
  • reacts with A203 to form MnO * Ai203 and becomes an intermediate layer.
  • the surface of M 0 ⁇ ⁇ is slightly oxidized in humidified hydrogen gas, the glass phase is in a well-wetted state, and the oxides of M 0 and iVln are melted into the glass Glue completely.
  • a coating layer 2 ⁇ made of a nickel metal layer is formed on the surface of the metallized layer 2 Q by an electroless nickel metal plating method (step B 4). This is to enhance the adhesion to the electrode.
  • the electrode 23 having the same shape as that of the coating layer 21 and being washed * dried (step i) and then nickel-plated (step C 2) after the surface is coated with the coating layer 2 ⁇ Discharge electrodes 2a and 2b are completed by brazing on top (Step B5). Even at this time, the nickel mesh enters the hollow portion remaining in the metallized shoes, and .M 0 —: VI ⁇ alternately expands, further improving the bondability.
  • the dielectric constant is ⁇ since the discharge tube is made of translucent aluminum which does not contain pores.
  • the laser medium can be excited at a low voltage because it can be made thinner, causing distortion, and furthermore, deterioration or destruction due to discharge. In addition, it is possible to maintain stable characteristics for a long time.
  • the discharge tube was made of "Luca Rocks j", but in addition to the above, "Hyceram made by Nippon Insulators Co., Ltd. consisting of translucent aluminum is used. Or “Show Cell” manufactured by Showa Denko KK.
  • the present invention is not limited to translucent alumina, and a similar effect can be obtained if a high dielectric material that does not contain pores, such as translucent peria (BeO), is used. .
  • a non-porous non-dielectric material is used for the discharge tube, and a metal layer formed by a refractory metal method is used as a base layer of the electrode.
  • a metal layer formed by a refractory metal method is used as a base layer of the electrode.
  • Example ⁇ the metallization layer and the coating layer
  • the discharge electrodes 2a and 2b are formed.
  • the ⁇ In this structure ⁇ is for preventing 2 4 oxidation, brazing
  • Eliminates the problem of misalignment at the time of Manufacturing work is good because it can be formed in a tank.
  • a metal layer having a desired thickness may be formed on the metallized layer by a metal spraying method to form a discharge electrode.
  • the axial-flow-type gas laser device which is the second embodiment of the present invention, is a translucent alumina.
  • the discharge tube 1 ′ made of (A i 2 0 3) is connected to the surface of the discharge tube 1 ′ through a jointed foot 31 made of B 2 0 3 -P b 0-Z ⁇ 0 -based solder and Fe-Ni- G "A pair of snorals made of an alloy is characterized by the fact that the secondary electrodes 2a and 2b are joined in a snoral shape. a ⁇ and
  • the so-called oxidized solder is a crystalline low-melting-point solder ⁇ 203 —Pb 0 — ⁇ ⁇ 0 system Solder was used, but this is effective for dielectrics with low maturation coefficient, such as Si02 and mullite.
  • the component ratio depends on the electrode, the material of the electric tube, the operating temperature conditions, etc. Ri can be appropriately selected s
  • aluminum is used as the discharge tube material, and Ni-peodium is used as the electrode material. It is advisable to use a 3-Mg0-Sio2 series solder.
  • the joining temperature must be sufficiently higher than the discharge tube operating temperature and lower than the softening deformation temperature of the material to be joined.
  • the thermal expansion coefficient of the oxide solder is 0 to 5 x 10 higher than that of the material to be joined.
  • the value should be as small as 7 / 'G.
  • Solder should be well wetted by the material to be attached and chemically bonded to ceramics and metal.
  • ⁇ ⁇ Must have electrical properties (insulation * dielectric constant ⁇ dielectric loss) sufficient for applying an AC electric field.
  • the metal electrode has a high degree of adhesion, and it can be realized without the need for irregularities at the dielectric interface and structures such as cracks, so that the efficiency is high.
  • a highly reliable laser device can be provided. ' (Example 3)
  • the gas laser device according to the third embodiment of the present invention has a structure in which ⁇ and T i are shared on the surface of a discharge tube 1 ′ made of a translucent alumina (A 203). Is characterized in that a pair of discharge electrodes 2a and 2b made of a titanium alloy are joined in a spiral shape via a joining layer 41 made of a crystal. This is exactly the same as the conventional AC discharge-excited axial-flow gas laser device shown in Fig. (A) and (b).
  • the interface between the electrode metal portion that can be joined by one ripening operation and the dielectric portion forming the discharge tube is maintained in a flat state and has sufficient joining strength up to fc.
  • the discharge between the metal electrode and the discharge tube can be prevented, and the light-to-light conversion efficiency can be improved.
  • the reliability of the discharge tube material can be improved.
  • the bonding layer is not limited to the embodiment. -C a ; ⁇ ⁇ -Gu--AQ; R ⁇ -C u, T i ⁇ 2 ⁇ i, ⁇ It is sufficient if the layer is an active metal layer or an alloy layer such as “Fi 2 —F e. Industrial availability
  • the discharge tube according to the present invention is useful for an AC discharge-excited K-axis flow type gas laser device, has high output efficiency, and has a long life and high reliability.

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

Appareil laser à gaz présentant un rendement et une fiabilité améliorés, produit en reliant des électrodes de décharge (2a, 2b) d'un laser à gaz excité par une décharge de courant alternatif avec une couche métallisée (20) formée sur la surface externe d'un tube de décharge (1) par le procédé utilisant un métal à point de fusion élevé, permettant aux électrodes de décharge d'adhérer étroitement sur le tube de décharge et empêchant toute survenance d'une décharge dans l'interface.
PCT/JP1987/000727 1986-09-30 1987-09-30 Appareil laser a gaz et procede de production WO1988002562A1 (fr)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP23242086A JPS6386583A (ja) 1986-09-30 1986-09-30 交流放電励起型ガスレ−ザ装置
JP61/232420 1986-09-30
JP23802986A JPS6393179A (ja) 1986-10-08 1986-10-08 レ−ザ発振器用放電管
JP61/238029 1986-10-08
JP61/259345 1986-10-30
JP25934586A JPS63114183A (ja) 1986-10-30 1986-10-30 レ−ザ発振器用放電管
JP6541787A JPS63229873A (ja) 1987-03-19 1987-03-19 レ−ザ発振器用放電管
JP62/65417 1987-03-19

Publications (1)

Publication Number Publication Date
WO1988002562A1 true WO1988002562A1 (fr) 1988-04-07

Family

ID=27464579

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1987/000727 WO1988002562A1 (fr) 1986-09-30 1987-09-30 Appareil laser a gaz et procede de production

Country Status (1)

Country Link
WO (1) WO1988002562A1 (fr)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3427567A (en) * 1967-05-19 1969-02-11 Hughes Aircraft Co Gaseous laser discharge tube
US3763442A (en) * 1972-07-07 1973-10-02 American Laser Corp Ion laser plasma tube cooling device and method
JPS5688387A (en) * 1979-12-13 1981-07-17 Dexter Katherine Waveguide laser structure
JPS6143489A (ja) * 1984-08-03 1986-03-03 トウルンプフ・ゲーエムベーハー・ウント・コー Co↓2レーザ
JPS6179271A (ja) * 1984-09-27 1986-04-22 Toshiba Corp ガス循環形co2レ−ザ−用電極
JPS61142783A (ja) * 1984-12-17 1986-06-30 Mitsubishi Electric Corp レ−ザ発振器用電極管
JPS61170086A (ja) * 1985-01-23 1986-07-31 Mitsubishi Electric Corp 無声放電式ガスレ−ザ装置
JPS62174987A (ja) * 1986-01-29 1987-07-31 Fanuc Ltd 高周波励起気体レ−ザ−用電極

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3427567A (en) * 1967-05-19 1969-02-11 Hughes Aircraft Co Gaseous laser discharge tube
US3763442A (en) * 1972-07-07 1973-10-02 American Laser Corp Ion laser plasma tube cooling device and method
JPS5688387A (en) * 1979-12-13 1981-07-17 Dexter Katherine Waveguide laser structure
JPS6143489A (ja) * 1984-08-03 1986-03-03 トウルンプフ・ゲーエムベーハー・ウント・コー Co↓2レーザ
JPS6179271A (ja) * 1984-09-27 1986-04-22 Toshiba Corp ガス循環形co2レ−ザ−用電極
JPS61142783A (ja) * 1984-12-17 1986-06-30 Mitsubishi Electric Corp レ−ザ発振器用電極管
JPS61170086A (ja) * 1985-01-23 1986-07-31 Mitsubishi Electric Corp 無声放電式ガスレ−ザ装置
JPS62174987A (ja) * 1986-01-29 1987-07-31 Fanuc Ltd 高周波励起気体レ−ザ−用電極

Similar Documents

Publication Publication Date Title
JP3450751B2 (ja) 接合体、高圧放電灯およびその製造方法
JPH07105212B2 (ja) 耐酸化性を改善されたモリブデン、その方法、並びにそれを使用した封止部、ランプ及び反射体・ランプアセンブリ
JPH1167157A (ja) セラミックエンベロープ装置、セラミックエンベロープ装置を有するランプ及びセラミックエンベロープ装置を製造するための方法
US3339267A (en) Metallizing non-metals
JP2002033079A (ja) 電灯の製造方法
JP3151166B2 (ja) 高圧放電灯およびその製造方法
JPH0418714B2 (fr)
WO1988002562A1 (fr) Appareil laser a gaz et procede de production
JP2003201186A (ja) 接合体、高圧放電灯用組み立て体および高圧放電灯
JP3490461B2 (ja) フラット形投射器
JP5021812B2 (ja) 高圧放電ランプ
JP5026510B2 (ja) ランプ用箔接続体、ランプ用箔接続体の製造方法、箔接続体を備えるインタフェース及び、箔接続体を備えるランプ
TW574175B (en) Material compound, and the manufacture thereof
JP3438666B2 (ja) セラミック放電灯及び高圧放電灯
JP4526734B2 (ja) ヒータエレメント、加熱装置及び基板加熱装置
US8310157B2 (en) Lamp having metal conductor bonded to ceramic leg member
JP2628313B2 (ja) ガスレーザ装置
JPS6393179A (ja) レ−ザ発振器用放電管
JP4046022B2 (ja) メタルハライドランプ、メタルハライドランプの製造方法、および導電性サーメット
JP2009518794A (ja) メタルハライドランプ
JP2003206184A (ja) 接合体、高圧放電灯およびその製造方法
JPH05275774A (ja) イオンレーザ管
JPS63114183A (ja) レ−ザ発振器用放電管
JP2006060256A (ja) セラミックス製電極部材
JPH05315055A (ja) セラミックヒータ

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH DE FR GB IT LU NL SE