WO1982003470A1 - Fluid circuit for treatment device - Google Patents

Fluid circuit for treatment device Download PDF

Info

Publication number
WO1982003470A1
WO1982003470A1 PCT/JP1982/000099 JP8200099W WO8203470A1 WO 1982003470 A1 WO1982003470 A1 WO 1982003470A1 JP 8200099 W JP8200099 W JP 8200099W WO 8203470 A1 WO8203470 A1 WO 8203470A1
Authority
WO
WIPO (PCT)
Prior art keywords
processing
liquid
tank
circulation
storage tank
Prior art date
Application number
PCT/JP1982/000099
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
Photo Ind Konishiroku
Original Assignee
Aoki Kazushige
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aoki Kazushige filed Critical Aoki Kazushige
Publication of WO1982003470A1 publication Critical patent/WO1982003470A1/ja

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03DAPPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
    • G03D13/006Temperature control of the developer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03DAPPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • G03D3/02Details of liquid circulation
    • G03D3/06Liquid supply; Liquid circulation outside tanks

Definitions

  • the present invention relates to a fluid circuit in a photosensitive material processing apparatus and other processing apparatuses.
  • the temperature is adjusted while transferring and circulating the processing liquid to the processing tank.
  • fluid circuits that perform only circulation for temperature control except when processing photosensitive materials are often used.
  • an electromagnetic valve is provided in the circulation system, and the temperature is circulated by switching the solenoid valve except during processing.
  • switching to the processing liquid transfer circulation to the processing top is possible.
  • Etc. cannot be used as a cartridge tank (liquid storage tank)
  • the structure of the present invention that achieves this object is based on the processing in the storage tank.
  • the liquid is sent to the heat exchanger by the first -circulation bomb and its temperature is adjusted.
  • Processing liquid transfer circulation that supplies and returns the remaining liquid in this processing tank to the storage tank
  • the feature is that the minute and the minute are constituted by the same pipeline.
  • FIG. 1 shows an embodiment of a fluid circuit of a processing apparatus according to the present invention.
  • FIG. 2 shows the temperature control circulation during non-treatment.
  • Fig. 3 illustrates the operation and transfer of processing solution during processing.
  • FIG. 1 A first figure.
  • FIG. 1 shows an embodiment of a fluid circuit of a processing apparatus according to the present invention.
  • FIG. 2 is an operation explanatory view showing temperature control circulation during non-processing
  • FIG. 3 is an operation explanatory view showing processing liquid transfer circulation during processing.
  • reference numeral 1 denotes a treatment tank, below which a cartridge type storage tank 2 is disposed, and a lower part of the treatment tank 1 is provided by a drainage pipe 3.
  • Numeral 0 4 communicating with the liquid storage tank 2 is a first circulation bong.
  • the processing liquid 6 is sent to the heat exchanger 7 by the outgoing pipe 5, and the liquid is stored by the return pipe 8 by the return pipe 8. O 9 to be returned to tank 2
  • the second circulation pump is the same as the first circulation pump 4]).
  • the discharge capacity is large (for example, more than double).
  • 10 is a filter
  • 11 is a blowout nozzle
  • the blowout nozzle 11 the filter 10
  • the liquid tank 2 is connected by a forward pipe 12.
  • the temperature control circulation circuit that regulates the temperature of the processing liquid 6 in the storage tank 2 is composed of a first circulation pump 4, an outgoing line 5, and a heat exchanger.
  • a processing liquid transfer circuit that supplies the processing liquid to the processing tank and returns the remaining liquid to the storage tank 2.
  • ⁇ GVPI Consists of a second circulation bomb 9, a filter 10, a blowing nozzle 11, an outgoing pipe 12, and a drain pipe 3 (corresponding to the outgoing pipe). Is done.
  • the treatment liquid 6 in the liquid storage tank 2 is sent to the heat exchanger 7 by the first circulation bomb 4 and heated there. After the temperature is adjusted, it is guided to the return line 8 and returns to the liquid storage tank 2 again. In this case, the second circulation bomb 9 should be working.
  • the material to be treated is fed into the treatment tank 1, this is detected by a sensor shown in FIG. 2 and the second circulation pump 9 is operated.
  • the discharge capacity of the second circulation bomb 9 is equal to the discharge capacity of the first circulation bomb '4! 3)
  • the processing liquid 6 sent out from the heat exchanger 7 and the processing liquid in the storage tank 2 were removed.
  • Processing liquid 6 injected from 1 is sometimes stored at the bottom of processing tank 1]? Guided by drainage pipe 3 and returned to storage tank 2 again o
  • the filter 9 are arranged on the upstream side of the heat exchanger 7 and the filter 10 1 respectively, but the reverse is also possible. Also, the filter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Pipeline Systems (AREA)
PCT/JP1982/000099 1981-04-04 1982-04-02 Fluid circuit for treatment device WO1982003470A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4907981U JPH0128510Y2 (enrdf_load_stackoverflow) 1981-04-04 1981-04-04
JP81/49079810404 1981-04-04

Publications (1)

Publication Number Publication Date
WO1982003470A1 true WO1982003470A1 (en) 1982-10-14

Family

ID=12821079

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1982/000099 WO1982003470A1 (en) 1981-04-04 1982-04-02 Fluid circuit for treatment device

Country Status (3)

Country Link
EP (1) EP0075027A4 (enrdf_load_stackoverflow)
JP (1) JPH0128510Y2 (enrdf_load_stackoverflow)
WO (1) WO1982003470A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5541698A (en) * 1993-11-29 1996-07-30 Agfa-Gevaert N. V. Apparatus for processing photographic material and a method of regenerating a process liquid therein

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0612454B2 (ja) * 1985-09-10 1994-02-16 富士写真フイルム株式会社 感光材料現像装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5086345A (enrdf_load_stackoverflow) * 1973-11-28 1975-07-11
JPS5232255B2 (enrdf_load_stackoverflow) * 1971-12-09 1977-08-20
JPS5410941Y2 (enrdf_load_stackoverflow) * 1973-09-14 1979-05-18
JPS5428086B2 (enrdf_load_stackoverflow) * 1973-12-07 1979-09-13

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR801534A (fr) * 1935-08-20 1936-08-06 Appareil pour le développement des films
US2177706A (en) * 1938-05-31 1939-10-31 Warner Bros Apparatus for processing motion picture film
GB855229A (en) * 1956-03-13 1960-11-30 John Varney & Company Ltd Method of and apparatus for controlling the temperature of a liquid in a tank or other container
US3623416A (en) * 1968-06-24 1971-11-30 Claes Johan Anderberg Processing system for photographic material
US4128424A (en) * 1973-12-07 1978-12-05 Agfa-Gevaert Ag Method for treating photographic processing fluids prior to sewering thereof
DE2733030C3 (de) * 1977-07-21 1981-05-27 Agfa-Gevaert Ag, 5090 Leverkusen Durchlauf-Entwicklungsmaschine

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5232255B2 (enrdf_load_stackoverflow) * 1971-12-09 1977-08-20
JPS5410941Y2 (enrdf_load_stackoverflow) * 1973-09-14 1979-05-18
JPS5086345A (enrdf_load_stackoverflow) * 1973-11-28 1975-07-11
JPS5428086B2 (enrdf_load_stackoverflow) * 1973-12-07 1979-09-13

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP0075027A4 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5541698A (en) * 1993-11-29 1996-07-30 Agfa-Gevaert N. V. Apparatus for processing photographic material and a method of regenerating a process liquid therein

Also Published As

Publication number Publication date
JPS57162644U (enrdf_load_stackoverflow) 1982-10-13
EP0075027A4 (en) 1983-08-09
JPH0128510Y2 (enrdf_load_stackoverflow) 1989-08-30
EP0075027A1 (en) 1983-03-30

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