WO1982003470A1 - Fluid circuit for treatment device - Google Patents
Fluid circuit for treatment device Download PDFInfo
- Publication number
- WO1982003470A1 WO1982003470A1 PCT/JP1982/000099 JP8200099W WO8203470A1 WO 1982003470 A1 WO1982003470 A1 WO 1982003470A1 JP 8200099 W JP8200099 W JP 8200099W WO 8203470 A1 WO8203470 A1 WO 8203470A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- processing
- liquid
- tank
- circulation
- storage tank
- Prior art date
Links
- 239000012530 fluid Substances 0.000 title claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 40
- 239000000463 material Substances 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 1
- 238000010615 ring circuit Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
- G03D13/006—Temperature control of the developer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
- G03D3/02—Details of liquid circulation
- G03D3/06—Liquid supply; Liquid circulation outside tanks
Definitions
- the present invention relates to a fluid circuit in a photosensitive material processing apparatus and other processing apparatuses.
- the temperature is adjusted while transferring and circulating the processing liquid to the processing tank.
- fluid circuits that perform only circulation for temperature control except when processing photosensitive materials are often used.
- an electromagnetic valve is provided in the circulation system, and the temperature is circulated by switching the solenoid valve except during processing.
- switching to the processing liquid transfer circulation to the processing top is possible.
- Etc. cannot be used as a cartridge tank (liquid storage tank)
- the structure of the present invention that achieves this object is based on the processing in the storage tank.
- the liquid is sent to the heat exchanger by the first -circulation bomb and its temperature is adjusted.
- Processing liquid transfer circulation that supplies and returns the remaining liquid in this processing tank to the storage tank
- the feature is that the minute and the minute are constituted by the same pipeline.
- FIG. 1 shows an embodiment of a fluid circuit of a processing apparatus according to the present invention.
- FIG. 2 shows the temperature control circulation during non-treatment.
- Fig. 3 illustrates the operation and transfer of processing solution during processing.
- FIG. 1 A first figure.
- FIG. 1 shows an embodiment of a fluid circuit of a processing apparatus according to the present invention.
- FIG. 2 is an operation explanatory view showing temperature control circulation during non-processing
- FIG. 3 is an operation explanatory view showing processing liquid transfer circulation during processing.
- reference numeral 1 denotes a treatment tank, below which a cartridge type storage tank 2 is disposed, and a lower part of the treatment tank 1 is provided by a drainage pipe 3.
- Numeral 0 4 communicating with the liquid storage tank 2 is a first circulation bong.
- the processing liquid 6 is sent to the heat exchanger 7 by the outgoing pipe 5, and the liquid is stored by the return pipe 8 by the return pipe 8. O 9 to be returned to tank 2
- the second circulation pump is the same as the first circulation pump 4]).
- the discharge capacity is large (for example, more than double).
- 10 is a filter
- 11 is a blowout nozzle
- the blowout nozzle 11 the filter 10
- the liquid tank 2 is connected by a forward pipe 12.
- the temperature control circulation circuit that regulates the temperature of the processing liquid 6 in the storage tank 2 is composed of a first circulation pump 4, an outgoing line 5, and a heat exchanger.
- a processing liquid transfer circuit that supplies the processing liquid to the processing tank and returns the remaining liquid to the storage tank 2.
- ⁇ GVPI Consists of a second circulation bomb 9, a filter 10, a blowing nozzle 11, an outgoing pipe 12, and a drain pipe 3 (corresponding to the outgoing pipe). Is done.
- the treatment liquid 6 in the liquid storage tank 2 is sent to the heat exchanger 7 by the first circulation bomb 4 and heated there. After the temperature is adjusted, it is guided to the return line 8 and returns to the liquid storage tank 2 again. In this case, the second circulation bomb 9 should be working.
- the material to be treated is fed into the treatment tank 1, this is detected by a sensor shown in FIG. 2 and the second circulation pump 9 is operated.
- the discharge capacity of the second circulation bomb 9 is equal to the discharge capacity of the first circulation bomb '4! 3)
- the processing liquid 6 sent out from the heat exchanger 7 and the processing liquid in the storage tank 2 were removed.
- Processing liquid 6 injected from 1 is sometimes stored at the bottom of processing tank 1]? Guided by drainage pipe 3 and returned to storage tank 2 again o
- the filter 9 are arranged on the upstream side of the heat exchanger 7 and the filter 10 1 respectively, but the reverse is also possible. Also, the filter
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
- Pipeline Systems (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4907981U JPH0128510Y2 (enrdf_load_stackoverflow) | 1981-04-04 | 1981-04-04 | |
JP81/49079810404 | 1981-04-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1982003470A1 true WO1982003470A1 (en) | 1982-10-14 |
Family
ID=12821079
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1982/000099 WO1982003470A1 (en) | 1981-04-04 | 1982-04-02 | Fluid circuit for treatment device |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0075027A4 (enrdf_load_stackoverflow) |
JP (1) | JPH0128510Y2 (enrdf_load_stackoverflow) |
WO (1) | WO1982003470A1 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5541698A (en) * | 1993-11-29 | 1996-07-30 | Agfa-Gevaert N. V. | Apparatus for processing photographic material and a method of regenerating a process liquid therein |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0612454B2 (ja) * | 1985-09-10 | 1994-02-16 | 富士写真フイルム株式会社 | 感光材料現像装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5086345A (enrdf_load_stackoverflow) * | 1973-11-28 | 1975-07-11 | ||
JPS5232255B2 (enrdf_load_stackoverflow) * | 1971-12-09 | 1977-08-20 | ||
JPS5410941Y2 (enrdf_load_stackoverflow) * | 1973-09-14 | 1979-05-18 | ||
JPS5428086B2 (enrdf_load_stackoverflow) * | 1973-12-07 | 1979-09-13 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR801534A (fr) * | 1935-08-20 | 1936-08-06 | Appareil pour le développement des films | |
US2177706A (en) * | 1938-05-31 | 1939-10-31 | Warner Bros | Apparatus for processing motion picture film |
GB855229A (en) * | 1956-03-13 | 1960-11-30 | John Varney & Company Ltd | Method of and apparatus for controlling the temperature of a liquid in a tank or other container |
US3623416A (en) * | 1968-06-24 | 1971-11-30 | Claes Johan Anderberg | Processing system for photographic material |
US4128424A (en) * | 1973-12-07 | 1978-12-05 | Agfa-Gevaert Ag | Method for treating photographic processing fluids prior to sewering thereof |
DE2733030C3 (de) * | 1977-07-21 | 1981-05-27 | Agfa-Gevaert Ag, 5090 Leverkusen | Durchlauf-Entwicklungsmaschine |
-
1981
- 1981-04-04 JP JP4907981U patent/JPH0128510Y2/ja not_active Expired
-
1982
- 1982-04-02 WO PCT/JP1982/000099 patent/WO1982003470A1/ja not_active Application Discontinuation
- 1982-04-02 EP EP19820901005 patent/EP0075027A4/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5232255B2 (enrdf_load_stackoverflow) * | 1971-12-09 | 1977-08-20 | ||
JPS5410941Y2 (enrdf_load_stackoverflow) * | 1973-09-14 | 1979-05-18 | ||
JPS5086345A (enrdf_load_stackoverflow) * | 1973-11-28 | 1975-07-11 | ||
JPS5428086B2 (enrdf_load_stackoverflow) * | 1973-12-07 | 1979-09-13 |
Non-Patent Citations (1)
Title |
---|
See also references of EP0075027A4 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5541698A (en) * | 1993-11-29 | 1996-07-30 | Agfa-Gevaert N. V. | Apparatus for processing photographic material and a method of regenerating a process liquid therein |
Also Published As
Publication number | Publication date |
---|---|
JPS57162644U (enrdf_load_stackoverflow) | 1982-10-13 |
EP0075027A4 (en) | 1983-08-09 |
JPH0128510Y2 (enrdf_load_stackoverflow) | 1989-08-30 |
EP0075027A1 (en) | 1983-03-30 |
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