USD404016S - Heat retaining tube for use in a semiconductor wafer heat processing apparatus - Google Patents

Heat retaining tube for use in a semiconductor wafer heat processing apparatus Download PDF

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Publication number
USD404016S
USD404016S US29/074,282 US7428297F USD404016S US D404016 S USD404016 S US D404016S US 7428297 F US7428297 F US 7428297F US D404016 S USD404016 S US D404016S
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US
United States
Prior art keywords
processing apparatus
semiconductor wafer
retaining tube
heat
heat processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/074,282
Inventor
Katsutoshi Ishii
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Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ISHII, KATSUTOSHI
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Publication of USD404016S publication Critical patent/USD404016S/en
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Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 a perspective view of a heat retaining tube for use in a semiconductor wafer heat processing apparatus;
FIG. 2 a top plan view thereof;
FIG. 3 a front elevational view thereof;
FIG. 4 a cross sectional view taken along line IV--IV in FIG. 3;
FIG. 5 a cross sectional view taken along line V--V in FIG. 3;
FIG. 6 a rear elevational view thereof;
FIG. 7 a left side view thereof, the right side view being a mirror image of the left view; and,
FIG. 8 a bottom plan view thereof.

Claims (1)

  1. I claim the ornamental design for heat retaining tube for use in a semiconductor wafer heat processing apparatus, as shown and described.
US29/074,282 1997-01-31 1997-07-24 Heat retaining tube for use in a semiconductor wafer heat processing apparatus Expired - Lifetime USD404016S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9-2658 1997-01-10
JP265897 1997-01-31

Publications (1)

Publication Number Publication Date
USD404016S true USD404016S (en) 1999-01-12

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US29/074,282 Expired - Lifetime USD404016S (en) 1997-01-31 1997-07-24 Heat retaining tube for use in a semiconductor wafer heat processing apparatus

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100282695A1 (en) * 2008-11-05 2010-11-11 Mark Sandifer High strength camfer on quartzware
USD793975S1 (en) * 2015-09-29 2017-08-08 Hitachi Kokusai Electric Inc. Heater for semiconductor thermal process
USD793974S1 (en) * 2015-09-29 2017-08-08 Hitachi Kokusai Electric Inc. Heater for semiconductor thermal process
USD795209S1 (en) * 2015-09-29 2017-08-22 Hitachi Kokusai Electric Inc. Heater for semiconductor thermal process
USD798250S1 (en) * 2015-12-01 2017-09-26 Nuflare Technology, Inc. Heater

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100282695A1 (en) * 2008-11-05 2010-11-11 Mark Sandifer High strength camfer on quartzware
USD793975S1 (en) * 2015-09-29 2017-08-08 Hitachi Kokusai Electric Inc. Heater for semiconductor thermal process
USD793974S1 (en) * 2015-09-29 2017-08-08 Hitachi Kokusai Electric Inc. Heater for semiconductor thermal process
USD795209S1 (en) * 2015-09-29 2017-08-22 Hitachi Kokusai Electric Inc. Heater for semiconductor thermal process
USD798250S1 (en) * 2015-12-01 2017-09-26 Nuflare Technology, Inc. Heater

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