US9302327B2 - Diamond coated tool - Google Patents

Diamond coated tool Download PDF

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Publication number
US9302327B2
US9302327B2 US13/139,799 US201013139799A US9302327B2 US 9302327 B2 US9302327 B2 US 9302327B2 US 201013139799 A US201013139799 A US 201013139799A US 9302327 B2 US9302327 B2 US 9302327B2
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Prior art keywords
base material
diamond
diamond layer
coated tool
cavities
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US20110250394A1 (en
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Katsuhito Yoshida
Shigeru Yoshida
Yuichiro Seki
Kiichi Meguro
Shinji Matsukawa
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Sumitomo Electric Hardmetal Corp
Sumitomo Electric Industries Ltd
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Sumitomo Electric Hardmetal Corp
Sumitomo Electric Industries Ltd
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Assigned to SUMITOMO ELECTRIC INDUSTRIES, LTD., SUMITOMO ELECTRIC HARDMETAL CORP. reassignment SUMITOMO ELECTRIC INDUSTRIES, LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MATSUKAWA, SHINJI, SEKI, YUICHIRO, YOSHIDA, SHIGERU, MEGURO, KIICHI, YOSHIDA, KATSUHITO
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Priority to US15/487,799 priority patent/US10046397B2/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • B23B27/148—Composition of the cutting inserts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • B23B27/141—Specially shaped plate-like cutting inserts, i.e. length greater or equal to width, width greater than or equal to thickness
    • B23B27/145—Specially shaped plate-like cutting inserts, i.e. length greater or equal to width, width greater than or equal to thickness characterised by having a special shape
    • B23B27/146—Means to improve the adhesion between the substrate and the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2226/00—Materials of tools or workpieces not comprising a metal
    • B23B2226/31—Diamond
    • B23B2226/315—Diamond polycrystalline [PCD]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23B2228/04—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner applied by chemical vapour deposition [CVD]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24372—Particulate matter

Definitions

  • the present invention relates to a diamond coated tool, and particularly to a diamond coated tool in which a base material has a surface coated with a diamond layer.
  • a diamond coated tool in which a base material has a surface coated with a diamond layer has a rigid surface, and is therefore capable of processing difficult-to-cut materials, such as fiber reinforced plastics (FRP) and the like, which have been considered to be difficult to process with a tool.
  • FRP fiber reinforced plastics
  • a diamond coated tool In applying a diamond coated tool to the difficult-to-cut materials described above, one of the determinants of the tool's life is adhesion between a base material and a diamond layer. That is, a diamond coated tool has a problem of being prone to exfoliation randomly occurring in cutting at an interface between a base material and a diamond layer, which results in a degraded grade of a cut material processed with a cutting tool after exfoliation and an unstable cutting tool life.
  • Patent Document 1 proposes a diamond coated tool in which a base material having a surface on which fine asperities are formed is used and a diamond layer is formed on the base material.
  • Patent Document 1 by forming a diamond layer on a base material having a surface with asperities, an anchor effect occurs between the base material and the diamond layer.
  • This anchor effect can increase adhesion between the base material and the diamond layer.
  • Such a diamond coated tool is resistant to exfoliation in the early stage of cutting between the base material and the diamond layer.
  • Patent Document 2 Japanese Patent Laying-Open No. 2002-079406 also discloses a technology to form asperities on a surface of a base material, as in Patent Document 1. The technology, however, does not show any remarkable improvement in prolongation of the life of a diamond coated tool.
  • exfoliation between a base material and a diamond layer is believed to be caused by a difference between a coefficient of thermal expansion of the base material and a coefficient of thermal expansion of the diamond layer. That is, it is presumed that when a diamond coated tool reaches high temperatures due to heat in cutting, compressive or tensile residual stress is exerted on a diamond layer in the vicinity of an interface with the base material, thereby causing exfoliation to occur between the base material and the diamond layer.
  • Patent Document 3 Japanese Patent Laying-Open No. 11-058106 takes an approach of relaxing residual stress occurring in a diamond layer when a diamond coated tool reaches high temperatures to achieve increased adhesion between a base material and the diamond layer. Specifically, adhesion between a base material and a diamond layer is increased by controlling the coefficient of thermal expansion and a material of a base material, the thickness of a diamond layer, and the like.
  • Adhesion between a base material and a diamond layer tends to be increased by the technology disclosed in Patent Document 3.
  • the technique of Patent Document 3 however, extremely limits the material of a base material, the thickness of a diamond layer, and the like. This often leads to a design which ignores manufacturing cost, and the technology has hardly reached practical use.
  • the present invention has been made in view of the circumstances as described above, and an object of the invention is to provide a diamond coated tool which is resistant to exfoliation at an interface between a base material and a diamond layer, not only in the early stage of cutting but also when cutting is continued for a long time.
  • the diamond coated tool of the present invention is a diamond coated tool including a base material and a diamond layer coating a surface of the base material, and characterized in that the surface of the base material has an arithmetic average roughness Ra of not less than 0.1 ⁇ m and not more than 10 ⁇ m and an average length of roughness profile elements RSm of not less than 1 ⁇ m and not more than 100 ⁇ m, and that the diamond layer has a plurality of cavities extending from a portion bordering on the base material in a crystal growth direction.
  • arithmetic average roughness Ra is not less than 0.4 ⁇ m and not more than 4 ⁇ m
  • average length of roughness profile elements RSm is not less than 2 ⁇ m and not more than 20 ⁇ m.
  • the number of cavities relative to the length of the base material is not less than 1 ⁇ 10 3 /cm and not more than 1 ⁇ 10 6 /cm.
  • the cavities have a width of not less than 5 nm and not more than 200 nm relative to the crystal growth direction and a length of not less than 10 nm and not more than 1 ⁇ m in the crystal growth direction.
  • the diamond layer is made of polycrystalline diamond.
  • the diamond layer is formed by chemical vapor deposition process.
  • the diamond coated tool of the present invention as above can be suitably used to cut difficult-to-cut materials.
  • the diamond coated tool of the present invention achieves increased resistance to exfoliation between a base material and a diamond layer and an improved tool life, even when cutting is performed continuously with the tool.
  • FIG. 1 is a schematic cross-sectional view of the diamond coated tool of the present invention in the vicinity of an interface between a base material and a diamond layer.
  • FIG. 2 shows a graphed cross-section of a base material used for the diamond coated tool of the present invention with an indication of arithmetic average roughness Ra.
  • FIG. 3 shows a graphed cross-section of a base material used for the diamond coated tool of the present invention with an indication of the length of contour curve element Xs.
  • FIG. 4 is a photographed image taken in a transmission electron microscopic observation of a cross-section of the diamond coated tool of the present invention.
  • FIG. 1 is a schematic cross-sectional view of the diamond coated tool of the present invention in the vicinity of an interface between a base material and a diamond layer.
  • a diamond coated tool 10 of the present invention includes a base material 1 and a diamond layer 3 formed on base material 1 , as shown in FIG. 1 .
  • Diamond coated tool 10 of the present invention with such a configuration can be extremely useful as a drill, an end mill, a blade-edge-replaceable cutting tip for milling or lathe turning, a metal saw, a gear cutting tool, a reamer, a tap, or a tip for pin milling of a crankshaft, a cutting piece for cutting of glass-substrate, an optical fiber cutter, for example.
  • the diamond coated tool of the present invention can be used for various applications, and in particular, it can be suitably used for processing difficult-to-cut materials which are considered to be difficult to process with conventional cutting tool. That is, the diamond coated tool of the present invention can be extremely effectively used for processing difficult-to-cut materials, since it has a surface to which enhanced hardness is imparted as compared with that of conventional cutting tools.
  • any conventionally known base material which is known as a base material for such cutting can be used without any particular limitation.
  • base materials can include: cemented carbide (for example, WC based cemented carbide, including those containing Co in addition to WC and possibly further having an additive of carbonitride or the like, such as Ti, Ta or Nb), cermet (those consisting primarily of TiC, TiN, TiCN or the like), high-speed steel, tool steel, ceramic (for example, titanium carbide, silicon carbide, silicon nitride, aluminum nitride, aluminum oxide, and a mixture thereof), cubic boron nitride sintered body, diamond sintered body, and the like.
  • cemented carbide When cemented carbide is used as a base material, even if the structure of such cemented carbide includes a free carbon and an abnormal phase called ⁇ -phase, the effects of the present invention are exhibited.
  • base material 1 used in the present invention may as well have a modified surface.
  • a ⁇ -free layer may be formed at a surface thereof, and in the case of cermet, a surface-hardened layer may be formed. Even with such a modified surface, the effects of the present invention are exhibited.
  • the present invention is characterized in that base material 1 having a surface shaped with asperities is used.
  • Such an asperity shape has a mean value of amplitudes of asperities in the direction of height and a mean value of lateral amplitudes of asperities, which are each defined at a predetermined value.
  • a mean value of amplitudes of asperities in the direction of height is defined as an arithmetic average roughness Ra, which is required to be not less than 0.1 ⁇ m and not more than 10 ⁇ m.
  • a mean value of lateral amplitudes of asperities is defined as an average length of roughness profile elements RSm, which is required to be not less than 1 ⁇ m and not more than 100 ⁇ m.
  • average length of roughness profile elements RSm means an average of a length from one reference point to another adjacent reference point. It is noted that Ra and RSm will be described later in detail in conjunction with FIGS. 2 and 3 .
  • Allowing Ra and RSm of a surface roughness of a base material to fall within a predetermined numerical range in this manner facilitates anchoring of an early development core of a diamond into the base material in the formation of a diamond layer described later, and therefore, increased adhesion between the base material and the diamond layer can be achieved.
  • a base material having a specific asperity state as described above with a diamond layer by a chemical vapor deposition (CVD) process
  • CVD chemical vapor deposition
  • cavities 2 on residual stress can remarkably enhance adhesion between base material 1 and diamond layer 3 .
  • Their synergistic effect provides the present invention with resistance to exfoliation at an interface between base material 1 and diamond layer 3 even if cutting is performed continuously. It is noted that details of cavities 2 will be described later.
  • the above-described Ra is not less than 0.4 ⁇ m and not more than 4 ⁇ m, and RSm is not less than 2 ⁇ m and not more than 20 ⁇ m. More preferably, Ra is not less than 1.3 ⁇ m and not more than 2.6 ⁇ m, and RSm is not less than 3 ⁇ m and not more than 6 ⁇ m.
  • Examples of methods for forming asperity state as described above include a chemical etching treatment, a sandblasting treatment, an electrochemical etching treatment, a combination of these treatments, and the like.
  • An example of a chemical etching treatment includes immersing a base material in a mixed acid of sulfuric acid and acetic acid to dissolve a part of a surface of the base material.
  • a mixed acid used for a chemical etching treatment has a sulfuric acid concentration of not less than 10% by mass and not more than 98% by mass and an acetic acid concentration of not less than 10% by mass and not more than 70% by mass.
  • the time duration of immersion of a base material in a mixed acid is not less than 30 seconds and not more than 60 minutes.
  • An example of a sandblasting treatment includes blasting particles of alumina and silicon carbide.
  • particles used for a sandblasting treatment have a mean particle size (diameter of a particle) of not less than 5 ⁇ m and not more than 80 ⁇ m.
  • blast injection pressure of the particles against a base material is not less than 0.1 MPa and not more than 0.4 MPa.
  • An example of an electrochemical etching treatment includes electrolyzing Co contained in components of a base material, in electrochemical manner.
  • arithmetic average roughness Ra in the present invention is a parameter indicating the length of asperities in the direction of height that are formed on a surface of a base material.
  • the larger value of Ra indicates the rougher irregularity of asperities.
  • FIG. 2 shows a graphed exemplary cross-section of a base material used for the present invention.
  • Ra 1 L ⁇ ⁇ 0 L ⁇ ⁇ Z ⁇ ( x ) ⁇ ⁇ ⁇ d x ( 2 )
  • the height given by averaging the above-described sum of the area of diagonally shaded portions enclosed by the dashed line and the area of diagonally shaded portions enclosed by the solid line of the roughness profile, by reference length L, corresponds to arithmetic average roughness Ra.
  • Average length of roughness profile elements RSm in the present invention is a parameter indicating a widthwise length of an asperity state formed on a surface of a base material (pitch).
  • the larger value of RSm indicates the lower pitch of asperities.
  • average length of roughness profile elements RSm employs a method specified in JIS B0601:2001. Based on FIG. 3 , a method of determining average length of roughness profile elements RSm by calculation is now described.
  • FIG. 3 shows a graphed cross-section of a base material used for the present invention. In FIG.
  • a surface of a base material may be measured prior to the formation of a diamond layer on the base material, or a surface of a base material may be directly or indirectly measured after the formation of a diamond layer. It is, however, preferable to measure the surface roughness of a base material prior to the formation of a diamond layer on the base material in view of the fact that the surface roughness of the base material can be measured without causing any damage to the diamond layer.
  • a device capable of parametric analysis in conformity with ISO standards or JIS standards can be utilized.
  • a contact stylus measuring device and an optical (laser, interference, or the like) measuring device are commercially available, and in particular, a laser microscope is suitable for measuring the surface roughness of the base material of the present invention, because of a high spatial resolution and easy numerical analysis.
  • Ra and RSm in the present specification are values obtained by a measurement using a laser microscope having a laser wavelength of 408 nm, a horizontal spatial resolution of 120 nm, and a vertical resolution of 10 nm.
  • a method of measuring the surface roughness of a base material after formation of a diamond layer on the base material in addition to a method by which a diamond layer is removed in any manner followed by a measurement in the manner as illustrated above, one may use a method by which a base material is cut together with a diamond layer, then, from a direction perpendicular to the section, asperities on a surface are observed, and the observed asperities are quantified.
  • a diamond layer formed on a base material is a film made of polycrystalline diamond.
  • polycrystalline diamond refers to diamond microparticles of on the order of 10 nm to several ⁇ m which are firmly coupled together. More preferably, such a diamond layer is formed by a deposition process which increases crystallinity. Further, from the standpoint of forming a plurality of cavities extending from a base material in a crystal growth direction concurrently with the formation of a diamond layer, it is necessary to use a CVD process.
  • crystal growth direction refers to a vector direction in which, given a particular point on a surface of a base material as a base point, the shortest distance from the base point to a surface of a diamond layer is obtained.
  • any conventionally known CVD processes can be used without any particular limitation.
  • Examples of such CVD processes can include a microwave plasma CVD process, a hot-filament CVD process, a plasma jet CVD process, and the like.
  • the diamond layer of the present invention is formed such that the whole surface of a base material is coated, the base material may have a portion not coated with the diamond layer, and the diamond layer may have different composition at any portion above the base material. Further, in the present specification, only the case in which a diamond layer is formed on a base material is described, however, a single or more than one layer which is different from the diamond layer may be formed between the base material and the diamond layer.
  • the above-described diamond layer may include a foreign atom, such as boron, nitrogen, silicon, for example, and may include an incidental impurity other than these elements.
  • the diamond coated tool of the present invention is characterized in that when a diamond layer is formed on a base material, a plurality of cavities extending from the base material in a crystal growth direction are formed in the diamond layer. Since the diamond layer has a plurality of cavities, these cavities relax residual stress produced in the diamond layer due to a difference between coefficients of thermal expansion of the base material and the diamond layer. This can effectively prevent exfoliation between the base material and the diamond layer.
  • the above-described cavities can be confirmed with a scanning electron microscope (SEM).
  • SEM scanning electron microscope
  • the diamond coated tool, including the diamond layer is cut together with the base material, and a commercially-available device for preparing a cross-sectional sample is used for the section to prepare a sample for SEM observation.
  • the presence or absence of a cavity and the shape thereof can be ascertained by observing the sample in the vicinity of an interface between the base material and the diamond layer by means of a SEM in an enlarged view.
  • TEM transmission electron microscope
  • the number of cavities relative to the length of the base material in the section is not less than 1 ⁇ 10 3 /cm and not more than 1 ⁇ 10 6 /cm.
  • length of a base material here refers to the length of an interface between the base material and the diamond layer which appears at a section taken through the diamond coated tool.
  • the cavities are sized to have a width of not less than 5 nm and not more than 200 nm relative to the crystal growth direction and a length of not less than 10 nm and not more than 1 ⁇ m in the crystal growth direction. If the above-described cavities have a width of less than 5 nm or a height of less than 10 nm, then the size of cavities are not sufficient to obtain sufficient relaxing effect on residual stress produced in the diamond layer. Further, if the cavities have a width of more than 200 nm or a length of more than 1 ⁇ m, the cavities are so large that the diamond layer is prone to a crack starting from the cavity.
  • the term the “width relative to the crystal growth direction” refers to a length in a direction orthogonal to the crystal growth direction.
  • the size (width and length) of cavities in the diamond layer can be ascertained by observing a given section taken through the diamond coated tool with the aforementioned SEM or TEM.
  • the number and size of the cavities formed in the diamond layer are profoundly affected by the asperity state on a surface of the base material (i.e., numerical values of Ra and RSm). This is, however, not the only finding and it has also been found that gas pressure and gas composition in the formation of the diamond layer, as well as the surface temperature of the base material and the like also have effect. Therefore, the desired number of cavities in the desired size can be formed by regulating the asperity state on a surface of the base material and controlling various conditions in the formation of the diamond layer.
  • the gas pressure within the hot-filament CVD device be not less than 1.3 ⁇ 10 2 Pa and not more than 2.6 ⁇ 10 4 Pa. This allows for formation of the desired number of cavities in the desired size.
  • composition of gas to be introduced for example, it is preferable to use a mixed gas or the like having a CH 4 gas concentration relative to H 2 gas of not less than 0.3% by volume and not more than 20% by volume.
  • the surface temperature of the base material in the formation of the diamond layer is not less than 600° C. and not more than 1100° C.
  • the diamond layer is hereinafter formed by a hot-filament CVD process
  • the diamond layer may be formed by a conventionally known CVD process, for example, a microwave plasma CVD process, a plasma jet CVD process, and the like.
  • a base material made of HS K10 cemented carbide (WC-5% Co) and having a tool shape of SNMN120412 was used as the base material of the diamond coated tools.
  • the surface of the above-described base material was then etched by immersing the surface of the base material in a mixed acid of 98% by mass sulfuric acid and 60% by mass acetic acid for 20 minutes. Then, a sandblasting treatment was performed by which media having a variety of particle sizes (particles having a mean particle size of between 5 ⁇ m and 50 ⁇ m) was blasted against the base material at a blast injection pressure of 0.3 MPa.
  • the base materials after the sandblasting treatment and to be used for examples and comparative examples were measured with respect to parameters Ra and RSm of their surface roughness using an optical laser microscope (product name: LEXT OLS3500 (manufactured by Olympus Corporation)). The result is shown in Table 1 below.
  • a treatment for seeding nanosized diamond powder on the surface of the base material was performed.
  • the base material which had received seeding treatment as above was then set in a publicly known hot-filament CVD device.
  • 1% CH 4 /H 2 gas was introduced into the hot-filament CVD device, its inner pressure was set at 4.0 ⁇ 10 3 Pa, and by means of a temperature adjustment device including a cooling mechanism which was installed in the hot-filament CVD device, the temperature of the above-described surface of the base material was set at 900° C. and the temperature of the filament was set at 2050° C.
  • a diamond layer was then formed on the base material by a 10-hour growth under the diamond growth conditions described above. In this way, the diamond coated tools of examples and comparative examples (except for Example 14 and Comparative Example 5) were fabricated.
  • a Raman spectroscopic examination of the diamond layers of the diamond coated tools fabricated in this way revealed that their structures were all polycrystalline diamond.
  • FIG. 4 is a photographed image taken in a transmission electron microscopic observation of a section taken at a given plane of the diamond coated tool fabricated in Example 1.
  • diamond layer 3 which has a plurality of cavities 2 extending from the base material in a crystal growth direction is formed by forming, under specified manufacturing conditions, diamond layer 3 on base material 1 having the parameters of the surface roughness (Ra and RSm) falling within a predetermined numerical value range.
  • the cavity size was a width of 20 nm relative to the crystal growth direction and a length of 500 nm in the crystal growth direction.
  • Example 14 and in Comparative Example 5 the diamond layers were deposited under conditions different from those of the above-described examples. Specifically, in Example 14, gas pressure and gas composition were altered from manufacturing conditions of the above-described examples to regulate the size and number of cavities formed in the diamond layer as shown in Table 1. In Comparative Example 5, the diamond layer was formed while regulating gas pressure and gas composition so as not to form cavities in the diamond layer.
  • the diamond coated tool of each example fabricated in this way is a diamond coated tool including a base material and a diamond layer coating a surface of the base material, the surface of the base material having arithmetic average roughness Ra of not less than 0.1 ⁇ m and not more than 10 ⁇ m and average length of roughness profile elements RSm of not less than 1 ⁇ m and not more than 100 ⁇ m, and the diamond layer having a plurality of cavities extending from the base material in a crystal growth direction.
  • the diamond coated tools of Examples 1-14 and Comparative Examples 1-9 fabricated in the above were respectively evaluated as to adhesion by being subjected to wet intermittent cutting.
  • Cutting conditions were as shown in Table 2 below.
  • a round bar of an Al-16% Si raw material which was provided with six grooves was used as the material subjected to cutting.
  • Cutting was performed under conditions of a cutting rate of 400 m/min, a cutting depth of 0.5 nm, and a feed rate of 0.12 mm/rev.
  • cutting was stopped at regular time intervals to observe the state of a blade edge, and the duration of time before the diamond layer exfoliates was employed as an evaluation index.
  • Example 1 100
  • Example 2 85
  • Example 3 71
  • Example 4 69
  • Example 5 61
  • Example 8 68
  • Example 9 63
  • Example 10 70
  • Example 11 72
  • Example 12 71
  • Example 13 69

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  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Drilling Tools (AREA)
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JP5839289B2 (ja) 2011-05-10 2016-01-06 住友電工ハードメタル株式会社 表面被覆切削工具
JP2013049881A (ja) * 2011-08-30 2013-03-14 Mitsubishi Materials Corp 炭素膜被覆部材及びその製造方法
JP5982606B2 (ja) * 2011-12-05 2016-08-31 学校法人慶應義塾 ダイヤモンド被膜被着部材およびその製造方法
EP2772330A4 (en) * 2012-01-10 2015-07-08 Sumitomo Elec Hardmetal Corp DIAMOND COATED TOOL
US11839923B2 (en) * 2017-06-21 2023-12-12 Kyocera Corporation Coated tool, cutting tool, and method for manufacturing machined product
JP6996066B2 (ja) 2017-09-07 2022-02-04 住友電工ハードメタル株式会社 回転切削工具
JP6733947B2 (ja) 2018-07-02 2020-08-05 住友電工ハードメタル株式会社 ダイヤモンド被覆工具
CN109397549B (zh) * 2018-09-26 2020-08-28 广东工业大学 金刚石涂层氮化硅陶瓷整体刀具及其制备方法与刀具在石墨中的应用
US20240091863A1 (en) * 2019-10-18 2024-03-21 Sumitomo Electric Hardmetal Corp. Diamond coated tool
JP2020073447A (ja) * 2020-01-21 2020-05-14 信越化学工業株式会社 ダイヤモンド基板及びダイヤモンド自立基板
US20230294178A1 (en) * 2020-07-09 2023-09-21 Sumitomo Electric Hardmetal Corp. Diamond-coated tool
CN115805666A (zh) * 2022-12-16 2023-03-17 汨罗市福缘新材料有限公司 一种适用于石墨制品的修坯铣刀

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EP2465970A1 (en) 2012-06-20
US20110250394A1 (en) 2011-10-13
US9731355B2 (en) 2017-08-15
JP2011038150A (ja) 2011-02-24
CN102257176A (zh) 2011-11-23
CA2747216C (en) 2017-03-21
EP2465970A4 (en) 2013-10-30
EP2465970B1 (en) 2016-07-20
MX2011007265A (es) 2011-08-08
US20160175941A1 (en) 2016-06-23
BRPI1005679A8 (pt) 2018-02-06
WO2011018917A9 (ja) 2011-05-12
WO2011018917A1 (ja) 2011-02-17
JP4690479B2 (ja) 2011-06-01
CA2747216A1 (en) 2011-02-17
CN102257176B (zh) 2015-04-01

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