US5478917A - Solutions of polyimide-forming substances and their use as coating compositions - Google Patents

Solutions of polyimide-forming substances and their use as coating compositions Download PDF

Info

Publication number
US5478917A
US5478917A US08/320,396 US32039694A US5478917A US 5478917 A US5478917 A US 5478917A US 32039694 A US32039694 A US 32039694A US 5478917 A US5478917 A US 5478917A
Authority
US
United States
Prior art keywords
acid
solutions
bis
diaminodiphenyl
polyimide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
US08/320,396
Other languages
English (en)
Inventor
Rainer Blum
Gerhard Hoffmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Farben und Fasern AG
Original Assignee
BASF Lacke und Farben AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF Lacke und Farben AG filed Critical BASF Lacke und Farben AG
Assigned to BASF LACKE + FARBEN AKTIENGESELLSCHAFT reassignment BASF LACKE + FARBEN AKTIENGESELLSCHAFT ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BLUM, RAINER, HOFFMANN, GERHARD
Application granted granted Critical
Publication of US5478917A publication Critical patent/US5478917A/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003Preparatory processes
    • C08G73/1007Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31721Of polyimide

Definitions

  • the present invention relates to solutions of polyimide-forming substances, containing
  • the present invention furthermore relates to the use of such solutions for the production of coatings and of articles coated with polyimides, and coated articles.
  • Aromatic polyimides are as a rule insoluble in conventional organic solvents. In general, solutions of the more readily soluble polyamidocarboxylic acids were therefore used as polyimide-forming intermediates for polyimide-forming coatings. The polyimides then form from these intermediates on drying, for which temperatures of up to 400° C. are used.
  • polyamidocarboxylic acids have a short shelf life since they tend to undergo self-hydrolysis and premature imide formation. Most polyamidocarboxylic acid coating materials therefore have to be stored in a freezer.
  • U.S. Pat. No. 3,700,649 discloses polyimides which are obtained from aromatic diamines and symmetric diesters of benzophenonetetracarboxylic acid.
  • U.S. Pat. No. 3,347,808 discloses solutions of polyamines and alkyl esters of tetracarboxylic acids.
  • U.S. Pat. No. 4,874,835 relates to mixtures of special diamines with oxydiphthalates.
  • polyimides are polyimides, but polyheterocycles such as polyisoindoloquinazolinediones or polyarylenebenzimidazoles are also included.
  • polyimide is used below as a synonym for all polyheterocycles.
  • Preferred polyamine components A) are aromatic and/or partly aromatic polyamines, diamines being preferred.
  • Suitable diamines are:
  • alkylisopropyltoluylenediamines such as diisopropyltoluylenediamine
  • polyamines are tetraamines, such as 3,3',4,4'-tetraaminobiphenyl, 3,3',4,4'-tetraaminodiphenylmethane, 3,3',4,4'-tetraaminodiphenyl ether, 3,3',4,4'-tetraaminodiphenyl sulfone or 3,3',4,4'-tetraaminodiphenyl sulfide.
  • tetraamines give polyarylenebenzindazoles as the final structure.
  • a further important group of diamines comprises aromatic polynuclear compounds which are bonded via benzanilide groups, eg. 3,3'-diaminobenzanilide, 3,4'-diaminobenzanilide, 4,3'-diaminobenzanilide, 4,4'-diaminobenzanilide or 4,3'-diaminobenzanilide, and the N-alkyl substitution products of these anilides, as well as the ⁇ , ⁇ -diaminopolyanilides according to EP-A 271736.
  • benzanilide groups eg. 3,3'-diaminobenzanilide, 3,4'-diaminobenzanilide, 4,3'-diaminobenzanilide, 4,4'-diaminobenzanilide or 4,3'-diaminobenzanilide, and the N-alkyl substitution products of these anilides, as well as the ⁇ , ⁇ -dia
  • the object is to obtain polyimides having the best possible combinations of properties. These are obtained by means of a wholly aromatic structure.
  • the novel polyimides are therefore preferably prepared using purely aromatic diamines.
  • dimmines which are not purely aromatic generally have an adverse effect on the heat stability of the end products
  • cycloaliphatic, heterocyclic and aliphatic amine compounds having an amine functionality greater than 1, preferably 2 or higher, may however be used or be present for obtaining specific properties, such as surface smoothness, flexibility, etc.
  • diamino(dimethyl)dicyclohexylmethane diamino(dimethyldiisopropyl)dicyclohexylmethane, diamino(tetraisopropyl)dicyclohexylmethane, diamino(diisopropyl)dicyclohexylmethane, diaminoalkylenes or diaminopolyoxyalkylenes.
  • dimmines is intended to include compounds which contain the structural element N--N, ie. derivatives of hydrazine.
  • Aromatic dimmines which are further substituted by reactive groups in the nucleus are also important.
  • Such reactive substituents are, for example, carboxyl, hydroxyl, amine and amide groups.
  • polyheterocycles having a nonimide structure are then also formed.
  • polyisoindoloquinazolinediones are obtained as the final structure.
  • Polybenzoxazoles are obtained using dihydroxydiamines, and polyarylenebenzimidazoles using tetraamines. The present invention also relates to such polymers.
  • salts and partial salts of the amines may also be used or may be present, for example the carbonates, acetates, trifluoroacetates, trichloroacetates, formates, oxalates, maleates, methanesulfonates, benzenesulfonates, chlorides, etc. It has been found that the use of such salts suppresses the strong discoloration, particularly of the aromatic diamines, and gives smoother films in the case of some combinations.
  • Suitable components B) are amides or mixtures of esters and amides of tetracarboxylic acids.
  • tetracarboxylic acid derivatives may be described by the general formula I: ##STR1##
  • X may be --O--, --NH-- or --NR 1 --.
  • Z is a tetravalent, aromatic or partly aromatic radical which may furthermore be modified by a heterocyclic structure, or may furthermore be an aliphatic or cycloaliphatic radical which may also comprise partially or completely halogenated structural elements.
  • R 1 is alkyl having 1 to 20 carbon atoms, such as methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, pentyl, hexyl or heptyl or an isomer thereof, octyl, 2-ethylhexyl or another higher homolog, or cycloalkyl, preferably cyclohexyl or methylcyclohexyl, alkoxyphenyl, preferably phenoxybutyl, phenoxypropyl or phenoxyethyl, aryl such as phenyl, benzyl, cumyl or cresyl, or hydrogen.
  • R 1 is particularly preferably ethyl, propyl, isopropyl, n-butyl or one of the stated alkoxyphenyl radicals.
  • Diamides or diesters are preferred, ie. R 1 may simultaneously be hydrogen and the other stated radicals.
  • the diamides or diesters may be symmetric or asymmetric.
  • Y is --O--, --NH-- or --NR--, where --R-- has the same meanings as R 2 .
  • R 2 is a divalent alkyl or alkoxyalkyl radical of 2 to 6 carbon atoms.
  • tetracarboxylic acids are suitable parent tetracarboxylic acids from which the radical Z is derived.
  • Aromatic or partly aromatic tetracarboxylic acids such as
  • Butane-1,2,3,4-tetracarboxylic acid, cyclobutanetetracarboxylic acid, cyclopentane-1,2,3,4-tetracarboxylic acid, pyrrolidine-2,3,4,5-tetracarboxylic acid, thiophene-2,3,4,5-tetracarboxylic acid, pyrazine-2,3,5,6-tetracarboxylic acid, tetrahydrofurantetracarboxylic acid, 9-bromo-10-mercaptoanthracenetetracarboxylic acid, 9,10-dimercaptoanthracenedicarboxylic acid, 2,6-endovinylenecyclohexane-1,2,4,5-tetracarboxylic acid and hexafluoroisopropylidene-2,2-bis(phthalic anhydride) are also suitable.
  • Suitable isomers and substitution products of the stated polycarboxylic acids are halogen-substituted products, in particular fluorine-substituted or perfluoro products and/or alkyl-substituted products and polycarboxylic acids containing silicon.
  • the dimerization and oligomerization products of trimellitic anhydride with alcohols, amines and isocyanates having a functionality of >2 and especially the 4,4-esterification, 4,4-etherification and 4,4-amidation dimers of trimellitic acid are also suitable.
  • the salts or partial salts of tetracarboxylic acid compounds may also be used or may be present, provided that they still have free carboxyl groups, for example ammonium salts and salts with readily volatile amines, such as mono-, di- and trimethylamine, mono-, di- and triethylamine and other amines.
  • the phosphonium and sulfonium salts of acidic tetracarboxylic acid compounds may also be used or may be present. The use of such salts generally leads to desired, lower viscosities in conjunction with a higher solids content.
  • tetracarboxylic acids stated are known or can be prepared by known processes.
  • the tetracarboxamides and tetracarboxylic esters can be prepared in a known manner by reacting the corresponding tetracarboxylic dianhydrides with primary and/or secondary monoamines and monoalcohols (compounds I) or with primary and/or secondary diamines or diols (compounds of the formula II).
  • Diamides and diesters are preferably prepared by using corresponding molar amounts of amine/alcohol.
  • the mono, tri or tetra derivatives or mixtures thereof with the diamides or diesters can also be prepared by using correspondingly larger or smaller amounts of amine/alcohol, and can be used.
  • the manner in which the reaction can be appropriately controlled is known to a person skilled in the art.
  • the amides or esters can be prepared separately or alongside one another. It is also possible concomitantly to use relatively small amounts of water or not to remove all the resulting water of reaction, so that free tetracarboxylic acids can be obtained, also in proportions.
  • amides or ester/amide mixtures are used as components B).
  • the amount of amide may be from 20 to 80, preferably from 40 to 60, mol %.
  • novel intermediates are as a rule synthesized in suitable organic solvents; preferred substances are polar substances, such as:
  • dialkylacetamides such as
  • alkylalkylenediureas such as
  • alkyleneureas such as
  • N-alkylpyrrolidones such as
  • NMP N-methylpyrrolidone
  • polar substances may be partially or completely replaced by further solvents, such as alcohols, esters, ketones, ethers and cycloaliphatic ketones, alcohols, esters, amines, especially tertiary amines, such as triethylamine, water, glycols, glycol esters, glycol ethers and hydrocarbons.
  • solvents such as alcohols, esters, ketones, ethers and cycloaliphatic ketones, alcohols, esters, amines, especially tertiary amines, such as triethylamine, water, glycols, glycol esters, glycol ethers and hydrocarbons.
  • solvents such as alcohols, esters, ketones, ethers and cycloaliphatic ketones, alcohols, esters, amines, especially tertiary amines, such as triethylamine, water, glycols, glycol esters, glycol ethers and hydrocarbons.
  • the choice of solvent depends on the so
  • novel solutions contain the polyamine A) and the tetracarboxylic acid derivatives B) preferably in a molar ratio of from 1.5:1 to 1:1.5, particularly preferably 1:1.
  • the solids content of the solutions is preferably from 35 to 60% by weight.
  • the viscosity is preferably from 500 to 10,000 mPa.s. For specific applications, however, the desired parameters may be adjusted as required by corresponding dilution.
  • tetracarboxylic acid derivatives, polyamine and solvent may be combined in any order.
  • stirring is carried out, if required, at room temperature or at elevated temperatures, for example from 30° to 120° C., in particular 40°-80° C.
  • novel solutions may contain conventional additives, such as catalysts for imide formation, dyes, pigments, fillers, leveling agents and viscosity regulators.
  • the coating is preferably cured at final temperatures of from 150° to 450° C., particularly preferably from 300° to 400° C. It has proven particularly advantageous to carry out the curing process in a plurality of stages by gradually increasing the temperature to the final temperature.
  • novel solutions are used in the coating of silicon wafers for producing electronic circuits, ceramic and metal for producing composite circuits, in particular for the production of multi-chip modules, for coating wire, for coating optical waveguides of glass or quartz, for coating metal films for the production of flexible printed circuit boards, for coating, impregnating and adhesively bonding ordered and random, sheet-like and formed fiber materials, for encapsulating electronic and electric circuits and windings and for the production of powders, fibers, free films or moldings.
  • the tetracarboxylic acid component was first reacted with the amine component and, if required, the alcohol component, after which the diamine component A) was added.
  • Comparative Example 1 corresponds to Example 1 of U.S. Pat. No. 3,347,808
  • Coating materials from which these polyimides can be obtained are therefore offered by most polyimide producers. They are all relatively dilute solutions of polyamidocarboxylic acids.
  • the examples which follow show that it is possible according to the present invention, by using (partial) esters and (partial) amides, also to prepare such polyimides from highly concentrated solutions having a long shelf life.
  • Examples VB3, VB4, B2 and B3 show the considerable advance of the novel starting materials with regard to the ratio of viscosity to solids content, the film formation capacity also being excellent.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Paints Or Removers (AREA)
US08/320,396 1993-10-18 1994-10-11 Solutions of polyimide-forming substances and their use as coating compositions Expired - Fee Related US5478917A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4335322.3 1993-10-18
DE4335322A DE4335322A1 (de) 1993-10-18 1993-10-18 Lösungen polyimidbildender Substanzen und deren Verwendung als Beschichtungszusammensetzungen

Publications (1)

Publication Number Publication Date
US5478917A true US5478917A (en) 1995-12-26

Family

ID=6500317

Family Applications (1)

Application Number Title Priority Date Filing Date
US08/320,396 Expired - Fee Related US5478917A (en) 1993-10-18 1994-10-11 Solutions of polyimide-forming substances and their use as coating compositions

Country Status (6)

Country Link
US (1) US5478917A (ja)
EP (1) EP0648795A1 (ja)
JP (1) JPH07179606A (ja)
KR (1) KR950011498A (ja)
CN (1) CN1106843A (ja)
DE (1) DE4335322A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999062989A1 (en) * 1998-05-29 1999-12-09 The Government Of The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration (Nasa) Films, preimpregnated tapes and composites made from polyimide 'salt-like' solutions
US20030144461A1 (en) * 2001-12-21 2003-07-31 Kaneka Corporation Manufacturing method of polyamic acid, and polyamic acid solution
US20030153719A1 (en) * 2001-12-26 2003-08-14 Takashi Kato Novel polymer compound, precursor for the same and thin film-forming method using the same polymer precursor

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1301690B1 (it) * 1998-06-11 2000-07-07 Sinco Ricerche Spa Miscele di resine poliestere aventi elevate proprieta' di barriera aigas.
TWI283783B (en) * 1999-12-09 2007-07-11 Jsr Corp Liquid crystal alignment film and liquid crystal display device
JP2007246628A (ja) * 2006-03-14 2007-09-27 Jsr Corp 被膜形成用樹脂組成物
AU2012305578B2 (en) * 2011-09-09 2016-08-04 Japan Matex Co., Ltd. Composite material
CN109337428A (zh) * 2018-10-17 2019-02-15 陕西航空电气有限责任公司 一种耐高温聚酰亚胺绝缘浸渍漆及其制备方法和应用

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3347808A (en) * 1966-07-05 1967-10-17 Monsanto Co Coating compositions
US3502712A (en) * 1966-12-20 1970-03-24 Monsanto Res Corp Bis(dialkylaminoalkyl) 4,4'-carbonylphthalate
US3700649A (en) * 1971-07-06 1972-10-24 Int Harvester Co Polyimides of benzophenone tetracarboxylic acid esters and aromatic diamines having a basicity constant of less than 10-" and method of preparation
EP0271736A1 (en) * 1986-11-20 1988-06-22 Nippon Steel Chemical Co., Ltd. Resins of low thermal expansivity
US4874835A (en) * 1987-09-14 1989-10-17 General Electric Company Polyetherimides and precursors therefor from oxydiphtalic anhydride diester and a mixture of diamines
US4960824A (en) * 1988-09-26 1990-10-02 General Electric Company Storage stable polyimide precursor solutions and method of preparation
US5264545A (en) * 1991-10-24 1993-11-23 Basf Lacke+Farben Aktiengesellschaft Solutions of polyimide-forming starting materials
US5332799A (en) * 1991-10-24 1994-07-26 Basf Lacke+Farben Aktiengesellschaft Solutions of polyimide-forming starting materials

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5004627A (en) * 1989-10-10 1991-04-02 Ethyl Corporation Polyimides for mold release

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3347808A (en) * 1966-07-05 1967-10-17 Monsanto Co Coating compositions
US3502712A (en) * 1966-12-20 1970-03-24 Monsanto Res Corp Bis(dialkylaminoalkyl) 4,4'-carbonylphthalate
US3700649A (en) * 1971-07-06 1972-10-24 Int Harvester Co Polyimides of benzophenone tetracarboxylic acid esters and aromatic diamines having a basicity constant of less than 10-" and method of preparation
EP0271736A1 (en) * 1986-11-20 1988-06-22 Nippon Steel Chemical Co., Ltd. Resins of low thermal expansivity
US4874835A (en) * 1987-09-14 1989-10-17 General Electric Company Polyetherimides and precursors therefor from oxydiphtalic anhydride diester and a mixture of diamines
US4960824A (en) * 1988-09-26 1990-10-02 General Electric Company Storage stable polyimide precursor solutions and method of preparation
US5264545A (en) * 1991-10-24 1993-11-23 Basf Lacke+Farben Aktiengesellschaft Solutions of polyimide-forming starting materials
US5332799A (en) * 1991-10-24 1994-07-26 Basf Lacke+Farben Aktiengesellschaft Solutions of polyimide-forming starting materials

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999062989A1 (en) * 1998-05-29 1999-12-09 The Government Of The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration (Nasa) Films, preimpregnated tapes and composites made from polyimide 'salt-like' solutions
US6222007B1 (en) 1998-05-29 2001-04-24 The United States Of America As Represented By The National Aeronautics And Space Administration Films, preimpregnated tapes and composites made from polyimide “Salt-like” Solutions
US20030144461A1 (en) * 2001-12-21 2003-07-31 Kaneka Corporation Manufacturing method of polyamic acid, and polyamic acid solution
US6852826B2 (en) * 2001-12-21 2005-02-08 Kanera Corporation Manufacturing method of polyamic acid, and polyamic acid solution
US20030153719A1 (en) * 2001-12-26 2003-08-14 Takashi Kato Novel polymer compound, precursor for the same and thin film-forming method using the same polymer precursor
US6949618B2 (en) * 2001-12-26 2005-09-27 Chisso Corporation Polymer compound, precursor for the same and thin film-forming method using the same polymer precursor

Also Published As

Publication number Publication date
KR950011498A (ko) 1995-05-15
EP0648795A1 (de) 1995-04-19
CN1106843A (zh) 1995-08-16
DE4335322A1 (de) 1995-04-20
JPH07179606A (ja) 1995-07-18

Similar Documents

Publication Publication Date Title
JP5808386B2 (ja) ポリイミド、それから形成されるコーティング組成物、およびそれらの使用
US5502143A (en) Process for preparing polyimide resins
US5859171A (en) Polyimide copolymer, polyimide copolymer resin molded products and their preparation
AU623684B2 (en) Process for lowering the dielectric constant of polyimides using diamic acid additives
US20040010062A1 (en) Polyimide copolymer and methods for preparing the same
JPS5879018A (ja) 高溶解性を示すポリイミド組成物の製造方法
US5484879A (en) Polyimides containing fluorine
US4876329A (en) Polyimide polymers and copolymers using 3,5-diaminobenzotrifluoride
US5478917A (en) Solutions of polyimide-forming substances and their use as coating compositions
US6133407A (en) Polyimide precursor solution, coating film obtained therefrom, and process for producing polyimide coating film
US5428102A (en) Low dielectric polyimides
EP0191966A2 (en) Method of making bisimide coating compositions
US5264545A (en) Solutions of polyimide-forming starting materials
KR19980079256A (ko) 폴리이미드 전구체 용액, 이의 제조방법, 이러한 용액으로부터 수득한 피막 또는 필름 및 필름의 제조방법
US5493003A (en) Solutions of polyimide-forming substances and their use as coating materials
JPH05295115A (ja) 低熱膨張性ポリイミド樹脂およびその製造方法
US5332799A (en) Solutions of polyimide-forming starting materials
JP2519228B2 (ja) 無色透明ポリイミド成形体およびその製法
US5489644A (en) Solutions of polyimide-forming coating materials
US6074757A (en) Mixtures of solutions of polyamidocarboxylic acids and solutions of polyimide-forming starting materials
KR100234843B1 (ko) 폴리이미드-형성 출발 물질의 용액
JP3168806B2 (ja) ポリイミド共重合体及びその製造方法
US5003037A (en) Polyamide, polyimide, and polyamide-imide polymers and copolymers using 3, 5-diamino-t-butylbenzene
JPH0211616B2 (ja)
US4946934A (en) Polyamide from 3,5-diamino-t-butylbenzene

Legal Events

Date Code Title Description
AS Assignment

Owner name: BASF LACKE + FARBEN AKTIENGESELLSCHAFT, GERMANY

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BLUM, RAINER;HOFFMANN, GERHARD;REEL/FRAME:007182/0213

Effective date: 19941006

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

FPAY Fee payment

Year of fee payment: 4

REMI Maintenance fee reminder mailed
LAPS Lapse for failure to pay maintenance fees
STCH Information on status: patent discontinuation

Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362

FP Lapsed due to failure to pay maintenance fee

Effective date: 20031226