US4519690A - Process for developing or peeling alkali-type photosensitive film and apparatus used therein - Google Patents

Process for developing or peeling alkali-type photosensitive film and apparatus used therein Download PDF

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Publication number
US4519690A
US4519690A US06/510,911 US51091183A US4519690A US 4519690 A US4519690 A US 4519690A US 51091183 A US51091183 A US 51091183A US 4519690 A US4519690 A US 4519690A
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Prior art keywords
developing
solution
tank
peeling
reagent
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Expired - Fee Related
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US06/510,911
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English (en)
Inventor
Yoshiaki Tomisawa
Toshio Takeuchi
Keijiro Honda
Susumu Takahashi
Seiji Kinoda
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Resonac Corp
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Hitachi Chemical Co Ltd
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Assigned to HITACHI CHEMICAL COMPANY, LTD., A CORP.OF JAPAN reassignment HITACHI CHEMICAL COMPANY, LTD., A CORP.OF JAPAN ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: HONDA, KEIJIRO, KINODA, SEIJI, TAKAHASHI, SUSUMU, TAKEUCHI, TOSHIO, TOMISAWA, YOSHIAKI
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing

Definitions

  • This invention relates to a process for developing or peeling an alkali-type photosensitive film and an apparatus used therein.
  • alkali-type photosensitive film has been conducted batch-wise or continuously by dipping an alkali-type photosensitive film in a several percent alkaline solution or spraying a several percent alkaline solution over the alkali-type photosensitive film.
  • unexposed portions of the alkali-type photosensitive film become a suspension in suspended state in the developing solution.
  • the exposed portions become a suspension in suspended state in the peeling solution or sometimes there are present film flakes in the peeling solution.
  • Defects of prior art processes are that it is difficult to remove completely the suspension in suspended state by filtration even if the film flakes may be removed by filtration, and much man-power is necessary for renewal of filtering area, so that the developing or peeling solution is changed after used for treating the photosensitive film of 0.5 to 0.7 m 2 /liter and the waste developing or peeling solution is neutralized in an alkali waste treating apparatus or is filled in drum cans for disposal. Considering water pollution, much disposal cost is necessary.
  • This invention provides a process for developing or imagewisely peeling an alkali-type photosensitive film which comprises
  • This invention also provides an apparatus for developing or imagewisely peeling an alkali-type photosensitive film comprising
  • a developing or peeling device for developing or peeling an alkali-type photosensitive film with a developing or peeling solution
  • a solution tank for receiving the developing or peeling solution containing a released photosensitive film suspension transported from the developing or peeling device
  • one or more reagent tanks for storing separately one or more reagents for regenerating the developing or peeling solution
  • a blower for supplying a gas to the developing or peeling solution
  • one or more floating tanks wherein the released photosensitive film suspension suspended in the developing or peeling solution sent from the solution tank is flocculated with the reagents from the reagent tanks and the gas from the blower and the flocculated deposit in floating state is removed from the floating tanks for taking a part or a whole of the resulting treated developing or peeling solution out of the system and passing it to a waste water treating apparatus.
  • FIG. 1 is a schematic cross-sectional view of a conventional continuous spray type developing apparatus for alkali-type photosensitive film
  • FIG. 2 is a schematic cross-sectional view of an alkali treatment portion in the continuous spray type developing apparatus
  • FIG. 3 is a schematic cross-sectional view of one example of an alkali-type photosensitive film developing apparatus jointed with a removing device for floated flocculated suspension according to this invention.
  • the device for developing or peeling an alkali-type photosensitive film usable in this invention there are a batch-type device for dipping treatment of substrates obtained by bonding a photosensitive film and exposing to light, or substrates further treated by etching or plating, and a continuous device wherein these substrates are supplied by a roller conveyor continuously and treated by the spraying method, and the like.
  • FIG. 1 is a schematic cross-sectional view of a conventional continuous spray type developing apparatus for alkali-type photosensitive film and FIG. 2 is a schematic cross-sectional view of the alkali treatment portion in the continuous spray type developing apparatus.
  • a substrate is supplied to the apparatus by manual operation or automatic operation to the arrowed direction "b" and sent to an outlet with a constant speed successively by a substrate transporting roll 1.
  • the substrate is treated by an alkali aqueous solution from sprayers 2 to dissolve and release the unexposed portions from the alkali-type photosensitive film.
  • the substrate is then washed with water from water sprayers 3, treated with a neutralizing treatment solution from sprayers 4, followed by rinsing with water from water sprayers 5.
  • numeral 8 denotes an alkali aqueous solution tank
  • numeral 9 a water tank
  • numeral 10 a neutralizing solution tank
  • numeral 11 a developing apparatus frame
  • numeral 12 an exhaust trunking.
  • FIG. 2 is a schematic cross-sectional view of the alkali treatment portion of the continuous spray type developing apparatus wherein numeral 1 is the substrate transporting roll, numeral 2 alkali aqueous solution sprayers, numeral 8 an alkali aqueous solution tank, and numeral 11 a developing apparatus frame, these being the same as in FIG. 1.
  • FIG. 2 is a cross-sectional view taking a cross-section perpendicular to the arrowed direction "b" in FIG. 1 in the alkali aqueous solution tank 8.
  • the alkali aqueous solution in the alkali aqueous solution tank 8 is sent to the alkali aqueous solution sprayers 2 by a pump 39 through a filter 13.
  • numeral 30 denotes a pressure gauge, and numeral 31 a valve.
  • FIG. 3 is one example of the apparatus according to this invention.
  • the alkali developing or peeling solution containing a suspension of released photosensitive film suspended therein is taken from the alkali aqueous solution tank 8 and sent to a solution tank 22 by a pump 14.
  • the level of the solution tank 22 is detected by a level sensor 21 and controlled by a level controller 32 connected to a flow control valve 33.
  • the solution separated by inner dividers 34 and 35 is circulated and stirred by pumps 15 and 16, respectively.
  • the solution tank 22 is further equipped with a reagent tank 27 (PH reagent, a pH controlling agent), a reagent tank 45 (AB reagent, an adsorbent), a reagent tank 46 (FA reagent, a foaming agent) and reagent pouring pumps 19, 43 and 44 for providing these reagents into the solution tank 22.
  • a reagent tank 27 PH reagent, a pH controlling agent
  • a reagent tank 45 AB reagent, an adsorbent
  • a reagent tank 46 FA reagent, a foaming agent
  • the PH reagent (a pH controlling agent such as an inorganic or organic acid) is effective for forming floc from the spent alkali solution.
  • the AB reagent (an adsorbent such as bentonite) is effective for decolorizing the treating solution and for preventing scum from sticking.
  • the FA reagent (a foaming agent) gives floating power to scum.
  • a part of the solution to be treated is taken out of the solution tank 22 by a pump 17 and sent to a floating tank 23.
  • the solution to be treated is moved to the arrowed direction "a" through the dividers 34 and 35.
  • the dividers 34 and 35 are not always necessary.
  • a gas is supplied by a blower 29 to the suction side of a pump 17 and a reagent (ZA reagent or ZK reagent) is supplied from a reagent tank 28 by a pump 20 also to the suction side of the pump 17. It is preferable to supply the reagent to the suction side of the pump 17.
  • the gas and the reagent are mixed with the solution to be treated with stirring by the pump 17 and introduced into the floating tank 23.
  • the solution to be treated is moved to the arrowed direction "d" over a divider 36 and the suspension of released photosensitive film is floated in floc state, which is removed out of the tank by a skimmer 25.
  • the ZA and ZK reagents are individually flocculating agents such as a cationic polyamine resin and form floc good in dehydrating properties, particularly when both ZA and ZK reagents are used together.
  • an inert gas such as air, nitrogen, etc. It is preferable to bubble air in an amount of 10 l/min or less so as to form a large number of small bubbles. If the amount is too large e.g., more than 10 l/min, the bubbles become larger and will break at the liquid surface undesirably.
  • the solution is then passed to a floating tank 24 by a pump 18.
  • the solution from the floating tank 23, the gas from the blower 29 and the reagent from the reagent pump 20 are mixed with stirring by the pump 18.
  • the resulting mixed solution is moved to the arrowed direction "e" over a divider 37 and the remaining suspension floated in floc state is removed by a skimmer 25 out of the tank.
  • the dividers 36 and 37 are not always necessary.
  • the number of floating tank depends on separation efficiency of floated floc and may be one or two or more.
  • the bottom of the floating tank 24 and a treated solution tank 26 for storing the treated solution by a connecting pipe 39 so as to form communicating vessels.
  • the treated solution is moved over a divider 38 and returned to the alkali aqueous solution tank 8 by the level difference between the treated solution tank and the alkali aqueous solution tank.
  • a part or a whole of the solution from the treated solution tank 26 is taken out of the system by a pipe 42 connected to a waste water treating apparatus (not shown in the drawing). It is preferable to recycle a part of the solution from the treated solution tank 26 to the solution tank 22 by a pump 47.
  • the divider 38 is not always necessary.
  • the level balance can be controlled even if the balance in supplying amounts between the pumps 17 and 18 is lost.
  • the connecting pipes 40 and 41 may be omitted if another level controlling method is employed.
  • the taking out amount of the treated solution can be controlled by making the divider 38 a dam structure.
  • the treated solution tank 26 is provided so as to sample the treated solution and to observe transparency, coloring, bubbling, etc., with the naked eye, but it is not always necessary.
  • a part or whole of the treated solution taken out of the treated solution tank 26 is passed to the waste water treating apparatus through the pipe 42, but a part of the treated solution can be sent back to the alkali aqueous solution tank 8.
  • an alkali-type photosensitive film (PHT 860 AFT, a trade name, mfd. by Hitachi Chemical Co., Ltd.) was developed until the treating area became 0.5 m 2 /liter and the developing solution in suspension state was taken out continuously for regeneration using the apparatus as shown in FIG. 3. Volumes of individual tanks were 80 liters and two floating tanks were used with a treated solution tank.
  • Operation conditions were as follows: the taking out amount of the solution to be treated was 0.05 m 3 /hr, the pouring amount of the reagent (PH reagent, H 2 SO 4 ) from the tank 27 to 50 ml of the solution to be treated was 0.1% by volume, the pouring amount of the reagent (AB reagent, bentonite) from the tank 45 to 50 ml of the solution to be treated was 0.5% by volume, the pouring amount of the reagent (FA reagent, Neopelex F-25, ##STR1## , manufactured by Kao Soap Co., Ltd.) from the tank 46 to 50 ml of the solution to be treated was 0.1% by volume, the pouring amount of the reagent (ZA reagent, a flocculating agent, mfd. by Kyoritsu Yuki Kogyo Kenkyusho) from the tank 28 to 50 ml of the solution to be treated was 1% by volume, the blowing amount of air was 10 l/min or less.
  • the separation efficiency of the suspension was more than 85%.
  • an alkali-type photosensitive film (PHT 860 AFT, a trade name, mfd. by Hitachi Chemical Co., Ltd.) was treated until the treating area became 0.5 m 2 /liter and the peeling solution in suspension state was taken out continuously for regeneration using the apparatus as shown in FIG. 3. Volumes of individual tanks, the number of floating tanks and the like were the same as in Example 1.
  • Operation conditions were as follows: the taking out amount of the solution to be treated was 0.05 m 3 /hr, the pouring amount of the reagent (PH reagent, H 2 SO 4 ) from the tank 27 to 50 ml of the solution to be treated was 4% by volume, the pouring amount of the reagent (AB reagent, bentonite) from the tank 45 to 50 ml of the solution to be treated was 7% by volume, the pouring amount of the reagent (FA reagent, Neopelex F-25) from the tank 46 to 50 ml of the solution to be treated was 0.1% by volume, the pouring amount of the reagent (ZK reagent, a flocculating agent, mfd. by Kyoritsu Yuki Kogyo Kenkyusho) from the tank 28 to 50 ml of the solution to be treated was 5% by volume, the blowing amount of air was 10 l/min or less.
  • the separation efficiency of the suspension was more than 95%.

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  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Physical Water Treatments (AREA)
  • Separation Of Suspended Particles By Flocculating Agents (AREA)
US06/510,911 1982-08-06 1983-07-05 Process for developing or peeling alkali-type photosensitive film and apparatus used therein Expired - Fee Related US4519690A (en)

Applications Claiming Priority (2)

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JP57137822A JPS5928154A (ja) 1982-08-06 1982-08-06 アルカリ型感光性フイルムの現像又ははく離方法および現像又ははく離装置
JP57-137822 1982-08-06

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JP (1) JPS5928154A (enrdf_load_stackoverflow)
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5309191A (en) * 1992-03-02 1994-05-03 Eastman Kodak Company Recirculation, replenishment, refresh, recharge and backflush for a photographic processing apparatus
US6058954A (en) * 1995-05-04 2000-05-09 Eastman Kodak Company Supply and collection of solutions
US6247856B1 (en) 1998-01-22 2001-06-19 Toyo Boseki Kabushiki Kaisha Developing system of photosensitive resin plates and apparatus used therein
WO2011003880A3 (de) * 2009-07-06 2011-07-07 Gebr. Schmid Gmbh & Co. Verfahren und vorrichtung zur behandlung von substraten
US10375901B2 (en) 2014-12-09 2019-08-13 Mtd Products Inc Blower/vacuum
CN113093481A (zh) * 2021-03-15 2021-07-09 广州华普环保科技有限公司 一种显影添加剂及其制备方法和应用

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US4670371A (en) * 1985-05-29 1987-06-02 Sanyo-Kokusaku Pulp Co., Ltd. Multicolor image forming method using multiply diazo resin layers
US4760014A (en) * 1986-08-01 1988-07-26 Great Lakes Chemical Corporation Method for treating mixtures containing photopolymeric resin and compositions therefor
DE3734097A1 (de) * 1987-10-09 1989-04-27 Du Pont Deutschland Verfahren und vorrichtung zum behandeln eines photographischen aufzeichnungsmaterials
JP3138553B2 (ja) * 1992-10-30 2001-02-26 日本ペイント株式会社 フレキソ製版工程における現像液循環方法及びその方法を実施するための装置
US5759743A (en) * 1992-10-30 1998-06-02 Nippon Paint Co., Ltd. Developer-circulating method in flexographic printing plate-making process and apparatus for carrying out developer-circulating method
US6756181B2 (en) 1993-06-25 2004-06-29 Polyfibron Technologies, Inc. Laser imaged printing plates

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US3978506A (en) * 1973-12-07 1976-08-31 Agfa-Gevaert, A.G. Apparatus and method for neutralizing waste photographic fluids
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US4081816A (en) * 1973-12-07 1978-03-28 Agfa-Gevaert, A.G. Apparatus for processing photographic film and treating contaminated processing liquids
US4163023A (en) * 1975-12-02 1979-07-31 Fuji Photo Film Co., Ltd. Treatment of photographic processing solutions
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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5309191A (en) * 1992-03-02 1994-05-03 Eastman Kodak Company Recirculation, replenishment, refresh, recharge and backflush for a photographic processing apparatus
US6058954A (en) * 1995-05-04 2000-05-09 Eastman Kodak Company Supply and collection of solutions
US6247856B1 (en) 1998-01-22 2001-06-19 Toyo Boseki Kabushiki Kaisha Developing system of photosensitive resin plates and apparatus used therein
WO2011003880A3 (de) * 2009-07-06 2011-07-07 Gebr. Schmid Gmbh & Co. Verfahren und vorrichtung zur behandlung von substraten
US20120097188A1 (en) * 2009-07-06 2012-04-26 Gebr. Schmid Gmbh Method and Apparatus for Treating Substrates
CN102576199A (zh) * 2009-07-06 2012-07-11 吉布尔·施密德有限责任公司 用于处理基质的方法和装置
KR20120102033A (ko) * 2009-07-06 2012-09-17 게부르. 쉬미트 게엠베하 기판 처리 방법 및 기판 처리 장치
CN102576199B (zh) * 2009-07-06 2015-05-06 吉布尔·施密德有限责任公司 用于处理基质的方法和装置
TWI493730B (zh) * 2009-07-06 2015-07-21 Schmid Gmbh & Co Geb 處理基板之方法及裝置
US10375901B2 (en) 2014-12-09 2019-08-13 Mtd Products Inc Blower/vacuum
CN113093481A (zh) * 2021-03-15 2021-07-09 广州华普环保科技有限公司 一种显影添加剂及其制备方法和应用

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Publication number Publication date
US4559295A (en) 1985-12-17
DE3328264C2 (enrdf_load_stackoverflow) 1987-12-23
JPS5928154A (ja) 1984-02-14
DE3328264A1 (de) 1984-02-09

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