US3915117A - Vacuum coating apparatus - Google Patents

Vacuum coating apparatus Download PDF

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Publication number
US3915117A
US3915117A US524865A US52486574A US3915117A US 3915117 A US3915117 A US 3915117A US 524865 A US524865 A US 524865A US 52486574 A US52486574 A US 52486574A US 3915117 A US3915117 A US 3915117A
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United States
Prior art keywords
chamber
housing
coating
ring
sealing
Prior art date
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Expired - Lifetime
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US524865A
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English (en)
Inventor
Roman Schertler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
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Balzers Patent und Beteiligungs AG
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Definitions

  • a vacuum coating apparatus for coating various products comprises a housing which includes a fixedpart 30 F A P D and a rotatable cover part which together define a z i pplc a-"m "on y ata closed gas sealable housing chamber which may be Nov. 2 973 Switzerland 16602/73 evacuated
  • a plurality of product pp are Carried 1 on the movable part of the housing at spaced locations [22] l18/ (l:923%:6%501; and they are movable to present them at various Open E 1 d 1 8 48 6 1 ating stations.
  • One of the operating stations preferably 0 earc 5 A 6 includes a gas sealable coating chamber which is communicable with the gas sealed housing chamber and it is provided with separate means for evacuating the [56] References Clted coating chamber.
  • Movable sealing means are located UNITED STATES PATENTS at at least one of the stations for sealing the coating 1,073,235 9/1913 Hillebrand, Jr. 226/5 A chamber and isolating it from the housing chamber. 1,118,869 1 l /1914 Kugel 266/5 A
  • a loading chamber is advantageously located A at a Separate Station and is separately communicable with the housing chamber or it may be isolated from co 3,473,954 10/1969 Manson u l8/48 X the housing chamber and separately evacuated.
  • This invention relates in general to the construction of a vacuum coating apparatus for coating various products and in particular to a new and usefulyacuum coating apparatus which has a plurality of different working stations for inserting and removing as well as for processing products and which includes a rotatable transport device for the products carried on supports which are locatable in the main chamber which is capable of being separately evacuated from one or more separate stationary chambers.
  • the present invention deals particularly with vacuum coating apparatus wherein various articles or products must be inserted into an evacuation chamber and subsequently coated after they are first heated for the purpose of cleaning the surfaces to be coated and thereafter coated in an evacuated chamber for example by evaporation or cathode sputtering and are subsequently cooled down and removed from the chamber;
  • movable housing means defines a main chamber and the movable portion carries aplurality of separate supports for articles to be processed whichmay be moved into alignment with one or more separate sealable chambers for example for coating or removing the objects which may be separately evacuatedand which may be connected to the main chamber of the housing or isolated therefrom.
  • a further object of the invention is to provide a coating apparatus which is simple in design, rugged in construction and economical .to manufacture.
  • FIG. 1 is a transverse sectional view of a vacuum coating apparatus constructed in accordance with'the invention.
  • . IG. 2 is a section taken along the line 22 of FIG.
  • the present invention provides a vacuum coating apparatus which is reliable in service and can be constructed at lower expenses than the known devices and make it possible to carry out different treatments of the products in vacuum chambers which are hermetically separable from each other.
  • a vacuum coating device which has a plurality of different working stations or operating stations which permit the air-tight insertion and removal and also the processing of the products.
  • the device comprises a movable preferably rotatable transport device for the products which are located in a main chamber which is capable of being evacuated.
  • At least one of the operating stations includes a separate chamber for coating for example which is designed to be aligned with a support structure carried by the movable part of the housing defining the main chamber.
  • the arrangement is such that the coating chamber may be isolated from the main chamber and separately evacuated during the treatment.
  • a rotatable article or product support or transport table 3 is affixed to a shaft 4 which is rotatable in and hermetically sealed with the bottom ,housing'part l.
  • the transport table 3 is provided with a plurality of .working stations and in the embodiment shown it includes four separate working stations 5, 6, 7 and 8.
  • Each working station has support means for supporting a workpiece 9 or product to be coated.
  • the support means comprises an inwardly directed shoulder 10 which carries the workpieces or the supports therefor 9 with the products to be coated which ,as shown in the embodiment of the drawings'comprises as indicated by the double arrow 52.
  • one of the working stations comprises a first chamber 15 and another comprises a second chamber 16 which may be separately evacuated and which may be hermetically closed relative to the main chamber 50.
  • At least one chamber such as the chamber 15 serves for the insertion and removal of supports 9.
  • This working chamber is formed as soon as one of the support structures 5, 6, 7 or 8 which are in the form of rings is aligned with a fixed part 17 which is connected into the top cover wall 2 of the housing and it communicates with the main chamber 50.
  • the ring part 7 aligns with the stationary part 17.
  • the stationary part 17 includes a cover portion 18 and the chamber 15 is connectable to a connection or conduit'20 which is connected to an evacuation pump or an aeration pump (not shown).
  • a sealing plate 19 which is carried on the housing bottom portion 1 is displaced axially in the direction of arrow 54 to close against the bottom of the support 9 so that when the cover 18 is in place the chamber 15 may be separately isolated from the main chamber 50 and evacuated through the connection 20. It is possible while the main chamber 50 is still evacuated to open the working chamber 15 and place the products to be coated for example a support 9 carrying lenses to be coated in the supporting structure 7.
  • the supporting structure 9 as well as the supporting structure 7 may be designed in accordance with the type of products which are normally handled. For example a plate having openings in which the lenses are positioned or having an underside for securing the lenses thereon. Support 9 can also be replaced by a single object for example a mirror body to be coated.
  • the supporting ring 7 carrying the products to be treated can be displaced into the next working station.
  • a working station may be equipped for example with means for deposition by evaporation such as chamber 16 as shown in H6. 1.
  • the working chamber 16 is provided with a separate evacuation connection 21 and it is equipped with one or more evaporation sources 22 of known construction. As soon as a support ring 5, 6, 7 or 8 is moved into alignment with the evaporation station, the space in which the deposition by evaporation takes place is evacuated and the deposition can be carried out.
  • the evaporation chamber 16 can also be hermetically closed relative to the main chamber 50. This is accomplished by movement of a plate 23 into pressure engagement with the supporting ring which is positioned in the evaporation station shown in FIG. 1.
  • An air-tight vacuum chamber 16 is formed by supporting ring 5 and the part 25 of the chamber 16 and a removable bottom 26. Suitable seals are provided between these parts to insure the air tightness. After the coating operation is finished the plate 23 can be removed from the ring 5 and the ring thus becomes ready for further displacement.
  • hermetically closable working chambers can be formed for any other working stations which are desired or necessary. Such stations may be equipped for further depositing by evaporation or cathode sputtering or for heating or cooling of the substrates to be coated or of the deposited layers on the substrate in order to bombard the surfaces to be coated with ions or electrons and the like.
  • one of the working stations may be designed as an air lock chamber and it is useful to provide that the same chamber will be used for insertion and removal as shown in respect to the chamber 15.
  • the number of the required working stations or the working chambers and their distribution and the operational steps which are carried out at each station depends not only on the kind of operation to be performed at each step but also on the periods of time necessary for this purpose.
  • approximately the same period of time is provided for each of the working stations since the longest of these periods determines the station time which in a continuous operation must be observed for consecutively advancing the treated products from one station to the next.
  • the main chamber is evacuated either through a separate evacuation connection or through one of the working chambers which has its own evacuation connection and provided such evacuation is possible with respect to the operations which are being performed
  • the inventive arrangement has the particular advantage of being very flexible. in accordance with this requirement most various working chambers can be flanged to the main chamber if corresponding separation flanges are provided. It is useful if possible to arrange the whole equipment of one working chamber on a single flange plate such as the plate 26 as shown in FIG. 1 so that it is sufficient to replace only this plate.
  • the supporting structures in an annular form as shown in the present example.
  • Such structures may comprise rectangular cross section if desired.
  • the transport table 3 itself may be mounted for resilient upward and downward axial displacement.
  • the bushing of the shaft 4 would be designed for rotary as well as axial displacement movement.
  • the resilient-support of the support structures on the working table offers the best possible advantages both in respect to communication with the upper and lower side of the housing main chamber 50.
  • a vacuum coating apparatus for coating various products comprising housing means having an interior gas sealable housing chamber which may be evacuated, means defining a plurality of operating stations adjacent said housing, at least one movable member in said housing movable to each of said operating stations, a plurality of product supports carried on said movable member at spaced locations, at least one operating station including a gas sealable coating chamber which is communicable with said gas sealed housing chamber and which has connection means for evacuating said coating chamber, movable sealing means at said at least one operating station for sealing said coating chamber and isolating it from said housing chamber, said product support means comprising ring members, said gas,
  • sealing coating chamber comprising a cylindrical housing alignable with each ring member, and said movable sealing means comprising a plate member engageable on the opposite side of said ring member from said gas sealable coating chamber and being engageable with the end of said ring member to seal it.
  • a vacuum coating apparatus according to claim 1, wherein said product supports are resiliently supported on said movable member.
  • a vacuum coating apparatus including an additional gas sealable chamber at one of said operating stations having an additional connection means for evaporating said additional gas sealable chamber, said gas sealable chamber comprising a cylindrical member having a removable cover at the exterior .of said housing for loading and unloading products therethrough.
  • a vacuum coating apparatus comprising a housing having a bottom plate portion, a top cover portion covering said bottom plate portion and defining a main sealable chamber therein, a rotatable table in said housing main chamber, means connected to said table to rotate said table sealed with said housing member, a plurality of ring supports spaced circumferentially around said table and having means for supporting a product to be coated therein, and each being aligned with an annular top ring surface adjacent said cover and an annular bottom ring surface adjacent said bottom plate of said housing, at least one coating chamber connected to said bottom plate of said housing and opening into said main chamber, said coating chamber having a coating chamber evacuation connection for evacuating said coating chamber, resilient means resil iently supporting said table and the associated ring supports for axial displaceable movement toward and away from said coating chamber, and a cover plate mounted on said cover and being displaceable toward said ring to engage and seal said ring and displace it into sealing engagement with said coating chamber.
  • An apparatus including at least one second chamber connected to said cover and having an annular edge alignable over the annular end of said ring support structures, a separate additional evaporation connection connected to said additional chamber for evacuating said additional chamber and a second sealing plate displaceably carried on said bottom plate of said housing and movable toward said sealing ring which is aligned with said additional sealing chamber to displace said ring toward said chamber and to seal the end thereofin respect to said main chamber.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
US524865A 1973-11-22 1974-11-18 Vacuum coating apparatus Expired - Lifetime US3915117A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1660273A CH573985A5 (enrdf_load_stackoverflow) 1973-11-22 1973-11-22

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US3915117A true US3915117A (en) 1975-10-28

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US524865A Expired - Lifetime US3915117A (en) 1973-11-22 1974-11-18 Vacuum coating apparatus

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US (1) US3915117A (enrdf_load_stackoverflow)
CH (1) CH573985A5 (enrdf_load_stackoverflow)
DE (1) DE2454544C4 (enrdf_load_stackoverflow)
FR (1) FR2252419B1 (enrdf_load_stackoverflow)
GB (1) GB1466790A (enrdf_load_stackoverflow)
NL (1) NL165224C (enrdf_load_stackoverflow)

Cited By (43)

* Cited by examiner, † Cited by third party
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US4190019A (en) * 1976-09-18 1980-02-26 Hunt Claude J L Vacuum metallizing interior of hollow article with masking shield
US4191128A (en) * 1977-11-19 1980-03-04 Hunt Claude J L Vacuum metallizing of hollow articles
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
DE3507337A1 (de) * 1984-03-02 1985-09-05 Canon K.K., Tokio/Tokyo Vorrichtung zur durchfuehrung von prozessen im vakuum
US4666734A (en) * 1982-05-13 1987-05-19 Canon Kabushiki Kaisha Apparatus and process for mass production of film by vacuum deposition
US4756815A (en) * 1979-12-21 1988-07-12 Varian Associates, Inc. Wafer coating system
US4797054A (en) * 1985-06-17 1989-01-10 Fujitsu Limited Apparatus for loading and unloading a vacuum processing chamber
US4820106A (en) * 1987-05-16 1989-04-11 Leybold-Heraeus Gmbh Apparatus for passing workpieces into and out of a coating chamber through locks
US4951603A (en) * 1988-09-12 1990-08-28 Daidousanso Co., Ltd. Apparatus for producing semiconductors
EP0389820A1 (de) * 1989-03-30 1990-10-03 Leybold Aktiengesellschaft Vorrichtung zum Ein- und Ausschleusen eines Werkstücks in eine Vakuumkammer
US5002010A (en) * 1989-10-18 1991-03-26 Varian Associates, Inc. Vacuum vessel
US5024747A (en) * 1979-12-21 1991-06-18 Varian Associates, Inc. Wafer coating system
US5112469A (en) * 1989-03-30 1992-05-12 Leybold Aktiengesellschaft Apparatus for the inward and outward transfer of a workpiece in a vacuum chamber
US5183547A (en) * 1989-09-13 1993-02-02 Sony Corporation Sputtering apparatus and system for sputtering employing same
US5190590A (en) * 1990-04-10 1993-03-02 Matsushita Electric Industrial Co., Ltd. Vacuum coating apparatus
US5245736A (en) * 1991-05-31 1993-09-21 Balzers Aktiengesellschaft Vacuum process apparatus
US5259942A (en) * 1989-03-30 1993-11-09 Leybold Aktiengesellschaft Device for transferring a workpiece into and out from a vacuum chamber
EP0244951B1 (en) * 1986-04-04 1994-02-02 Materials Research Corporation Method and apparatus for handling and processing wafer like materials
EP0449227B1 (en) * 1990-03-30 1995-03-15 Sony Corporation Sputtering apparatus
US5503675A (en) * 1993-02-02 1996-04-02 Leybold Aktiengesellschaft Apparatus for applying a mask to and/or removing it from a substrate
US5538560A (en) * 1993-12-07 1996-07-23 Leybold Aktiengesellschaft Vacuum coating apparatus
US5773088A (en) * 1995-12-05 1998-06-30 Materials Research Group, Inc. Treatment system including vacuum isolated sources and method
US5849087A (en) * 1996-07-04 1998-12-15 Leybold Systems Gmbh Vacuum treatment system for applying thin layers to substrates such as headlights reflectors
US6096231A (en) * 1992-10-06 2000-08-01 Balzers Aktiengesellschaft Chamber, at least for the transport of workpieces, a chamber combination, a vacuum treatment facility as well as a transport method
US6113749A (en) * 1995-04-13 2000-09-05 Odme International B.V. Sputtering method in multi-chambered device
US6193804B1 (en) * 1999-10-02 2001-02-27 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and method for sealing a vacuum chamber
US6203677B1 (en) 1997-09-29 2001-03-20 Leybold Systems Gmbh Sputtering device for coating an essentially flat disk-shaped substrate
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
US20030029833A1 (en) * 2000-03-20 2003-02-13 Johnson Wayne L High speed photoresist stripping chamber
US6554980B1 (en) 1996-10-17 2003-04-29 Leybold Optics Gmbh Vacuum treatment apparatus for deposition of thin layers on three-dimensional substrates
US6620252B2 (en) * 2001-10-29 2003-09-16 Thomson Licensing S.A. Metallization module for cathode-ray tube (CRT) applications
US6793735B2 (en) * 1999-08-03 2004-09-21 International Business Machines Corporation Integrated cobalt silicide process for semiconductor devices
US6818108B2 (en) * 1992-10-06 2004-11-16 Unaxis Balzers Aktiengesellschaft Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece
US20080179006A1 (en) * 2007-01-31 2008-07-31 Tokyo Electron Limited Substrate processing apparatus
EP2321844A1 (de) * 2008-09-01 2011-05-18 Singulus Technologies AG Beschichtungsanlage
US20120003064A1 (en) * 2009-03-18 2012-01-05 Oc Oerlikon Balzers Ag Vacuum treatment apparatus
US20120027952A1 (en) * 2009-04-24 2012-02-02 Michael Reising Transport device having a deflectable sealing frame
US20120304924A1 (en) * 2009-12-22 2012-12-06 Juergen Fernholz System for treating surfaces of objects
US20130273329A1 (en) * 2012-03-19 2013-10-17 Patrick Goegebeur Multi-step process for fully coloured construction elements
CN104011258A (zh) * 2011-09-30 2014-08-27 曼兹股份公司 用于将多个基质运输到基质处理装置的区域中的运输装置
US10689753B1 (en) * 2009-04-21 2020-06-23 Goodrich Corporation System having a cooling element for densifying a substrate
CN112206947A (zh) * 2020-10-16 2021-01-12 泰安市力华液压设备有限公司 一种柱塞液压油缸喷漆加工工序用挂具及其使用方法

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US4226208A (en) * 1977-08-04 1980-10-07 Canon Kabushiki Kaisha Vapor deposition apparatus
US4313815A (en) * 1978-04-07 1982-02-02 Varian Associates, Inc. Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor
DE2940064A1 (de) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer
DE3448599B4 (de) * 1983-11-28 2004-04-08 Hitachi, Ltd. Verfahren zur Durchführung einer Behandlung unter Vakuum
US4534314A (en) * 1984-05-10 1985-08-13 Varian Associates, Inc. Load lock pumping mechanism
US4676884A (en) * 1986-07-23 1987-06-30 The Boc Group, Inc. Wafer processing machine with evacuated wafer transporting and storage system
DE3735284A1 (de) * 1987-10-17 1989-04-27 Leybold Ag Vorrichtung nach dem karussell-prinzip zum beschichten von substraten
IT1232241B (it) * 1989-09-11 1992-01-28 Cetev Cent Tecnolog Vuoto Dispositivo per il caricamento veloce di substrati in impianti da vuoto
EP0448782B1 (de) * 1990-03-26 1993-06-16 Leybold Aktiengesellschaft Vorrichtung zum Ein- und Ausschleusen eines Werkstücks in eine Vakuumkammer
DE4235674C2 (de) * 1992-10-22 2000-12-28 Balzers Ag Liechtenstein Kammer für den Transport von Werkstücken in Vakuumatmosphäre, Kammerkombination und Verfahren zum Transportieren eines Werkstückes
DE4235676C2 (de) * 1992-10-22 1997-08-28 Balzers Hochvakuum Vakuumkammer zum Transport scheibenförmiger Werkstücke in einer Vakuumanlage
DE4235677C2 (de) * 1992-10-22 1996-10-31 Balzers Hochvakuum Vakuumkammer, Vakuumbehandlungsanlage mit einer solchen Kammer sowie Transportverfahren
DE19624609B4 (de) * 1996-06-20 2009-04-16 Leybold Optics Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren
DE19807031A1 (de) * 1998-02-19 1999-08-26 Leybold Systems Gmbh Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
DE59810465D1 (de) 1998-02-19 2004-01-29 Applied Films Gmbh & Co Kg Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
CN110218976A (zh) * 2019-07-17 2019-09-10 南通职业大学 一种零部件自动镀膜装置

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US3749383A (en) * 1971-04-29 1973-07-31 Rca Corp Apparatus for processing semiconductor devices

Cited By (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4190019A (en) * 1976-09-18 1980-02-26 Hunt Claude J L Vacuum metallizing interior of hollow article with masking shield
US4191128A (en) * 1977-11-19 1980-03-04 Hunt Claude J L Vacuum metallizing of hollow articles
US5024747A (en) * 1979-12-21 1991-06-18 Varian Associates, Inc. Wafer coating system
US4756815A (en) * 1979-12-21 1988-07-12 Varian Associates, Inc. Wafer coating system
US5281320A (en) * 1979-12-21 1994-01-25 Varian Associates Inc. Wafer coating system
US4666734A (en) * 1982-05-13 1987-05-19 Canon Kabushiki Kaisha Apparatus and process for mass production of film by vacuum deposition
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
DE3507337A1 (de) * 1984-03-02 1985-09-05 Canon K.K., Tokio/Tokyo Vorrichtung zur durchfuehrung von prozessen im vakuum
US4637342A (en) * 1984-03-02 1987-01-20 Canon Kabushiki Kaisha Vacuum processing apparatus
US4797054A (en) * 1985-06-17 1989-01-10 Fujitsu Limited Apparatus for loading and unloading a vacuum processing chamber
EP0244951B1 (en) * 1986-04-04 1994-02-02 Materials Research Corporation Method and apparatus for handling and processing wafer like materials
US4820106A (en) * 1987-05-16 1989-04-11 Leybold-Heraeus Gmbh Apparatus for passing workpieces into and out of a coating chamber through locks
EP0291690A3 (en) * 1987-05-16 1990-09-05 Leybold Aktiengesellschaft Device for leading work pieces to and from a coating booth
US4951603A (en) * 1988-09-12 1990-08-28 Daidousanso Co., Ltd. Apparatus for producing semiconductors
EP0389820A1 (de) * 1989-03-30 1990-10-03 Leybold Aktiengesellschaft Vorrichtung zum Ein- und Ausschleusen eines Werkstücks in eine Vakuumkammer
US5112469A (en) * 1989-03-30 1992-05-12 Leybold Aktiengesellschaft Apparatus for the inward and outward transfer of a workpiece in a vacuum chamber
US5259942A (en) * 1989-03-30 1993-11-09 Leybold Aktiengesellschaft Device for transferring a workpiece into and out from a vacuum chamber
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FR2252419A1 (enrdf_load_stackoverflow) 1975-06-20
FR2252419B1 (enrdf_load_stackoverflow) 1980-06-06
NL165224C (nl) 1981-03-16
GB1466790A (en) 1977-03-09
DE2454544C3 (de) 1979-03-29
NL7400848A (nl) 1975-05-26
DE2454544B2 (de) 1978-07-13
NL165224B (nl) 1980-10-15
DE2454544C4 (de) 1992-07-16
DE2454544A1 (de) 1975-07-31
CH573985A5 (enrdf_load_stackoverflow) 1976-03-31

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