US3912603A - Electrolytic bath for the removal of metals - Google Patents
Electrolytic bath for the removal of metals Download PDFInfo
- Publication number
- US3912603A US3912603A US533719A US53371974A US3912603A US 3912603 A US3912603 A US 3912603A US 533719 A US533719 A US 533719A US 53371974 A US53371974 A US 53371974A US 3912603 A US3912603 A US 3912603A
- Authority
- US
- United States
- Prior art keywords
- bath
- acid
- salts
- iodine compound
- iodine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 title description 9
- 239000002184 metal Substances 0.000 title description 9
- 150000002739 metals Chemical class 0.000 title description 6
- 150000002497 iodine compounds Chemical class 0.000 claims abstract description 25
- 150000003839 salts Chemical class 0.000 claims abstract description 18
- 150000007524 organic acids Chemical class 0.000 claims abstract description 11
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 10
- 150000002366 halogen compounds Chemical class 0.000 claims abstract description 9
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 8
- 235000005985 organic acids Nutrition 0.000 claims abstract description 7
- 239000010949 copper Substances 0.000 claims abstract description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000007864 aqueous solution Substances 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 239000011651 chromium Substances 0.000 claims abstract description 4
- 229910052802 copper Inorganic materials 0.000 claims abstract description 4
- 150000007529 inorganic bases Chemical class 0.000 claims abstract description 4
- 150000007530 organic bases Chemical class 0.000 claims abstract description 4
- 229910052718 tin Inorganic materials 0.000 claims abstract description 4
- 239000011135 tin Substances 0.000 claims abstract description 4
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 4
- 239000011701 zinc Substances 0.000 claims abstract description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 18
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 18
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 15
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 12
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 12
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 12
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 6
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 6
- 235000011054 acetic acid Nutrition 0.000 claims description 6
- 235000019253 formic acid Nutrition 0.000 claims description 6
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052740 iodine Inorganic materials 0.000 claims description 6
- 239000011630 iodine Substances 0.000 claims description 6
- 239000004310 lactic acid Substances 0.000 claims description 6
- 235000014655 lactic acid Nutrition 0.000 claims description 6
- 235000019260 propionic acid Nutrition 0.000 claims description 6
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- 150000001340 alkali metals Chemical class 0.000 claims description 5
- 235000006408 oxalic acid Nutrition 0.000 claims description 5
- 239000007790 solid phase Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- XZXYQEHISUMZAT-UHFFFAOYSA-N 2-[(2-hydroxy-5-methylphenyl)methyl]-4-methylphenol Chemical compound CC1=CC=C(O)C(CC=2C(=CC=C(C)C=2)O)=C1 XZXYQEHISUMZAT-UHFFFAOYSA-N 0.000 claims description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 3
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 3
- 239000000908 ammonium hydroxide Substances 0.000 claims description 3
- 229940107816 ammonium iodide Drugs 0.000 claims description 3
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 10
- 229910000831 Steel Inorganic materials 0.000 abstract description 8
- 239000010959 steel Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 6
- 229910052759 nickel Inorganic materials 0.000 abstract description 5
- 229910052793 cadmium Inorganic materials 0.000 abstract description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 abstract description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 3
- 239000010953 base metal Substances 0.000 description 3
- MTXLZKBRQPGYOR-UHFFFAOYSA-N Cl.Br.I.I Chemical compound Cl.Br.I.I MTXLZKBRQPGYOR-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical class [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- ZXUYXFJRAQUVMW-UHFFFAOYSA-N I.Br.Cl Chemical compound I.Br.Cl ZXUYXFJRAQUVMW-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Chemical class [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 102220411551 c.74G>T Human genes 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- -1 copper-I-iodide Chemical class 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 229940083124 ganglion-blocking antiadrenergic secondary and tertiary amines Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- CUILPNURFADTPE-UHFFFAOYSA-N hypobromous acid Chemical class BrO CUILPNURFADTPE-UHFFFAOYSA-N 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
Definitions
- the present invention relates to an electrolytic bath for removing metallic coatings, such as nickel, chromium, zinc, tin, copper, cadmium or silver plate, from steel parts, the bath containing, in aqueous solution, nitric acid and/or its salts with inorganic and/or organic bases, organic acids and/or their salts, and a watersoluble halogen compound.
- metallic coatings such as nickel, chromium, zinc, tin, copper, cadmium or silver plate
- German published Specification Offenlegungsschrift l 963 415 describes an electrolytic demetallizing bath containing amines, nitrates, organic acids and water-soluble chlorine compounds.
- the above baths contain amines or aminoalcohols, especially those which have up to carbon atoms.
- the amines include primary, secondary and tertiary amines, such as trimethylamine, diethyland triethylamines, ethylene triamines, mono-, diand triethanol.
- the organic solvents used in the above baths are formic acid, acetic acid, propionic acid, oxalic acid, malonic acid, lactic acid and citric acid, or the alkali metal and/or ammonium salts thereof.
- the chlorine or bromine compounds are accelerators necessary to effect the removal of metal layers, particularly semi-polished nickel, within a reasonable period of time.
- they are activators of considerably increased corrosiveness for the base metal. Needless to say, it is practically impossible completely to inhibit corrosion of the base material, in an anodicelectrolytic operation.
- the object of the present invention can unexpectedly be achieved with the use of a bath, wherein the halogen compound is a soluble iodine compound, preferably an iodide.
- the baths of the present invention contain, as further known constituents, nitric acid and/or its salts with an alkali metal hydroxide or ammonium hydroxide or with an aliphatic amine or aminoalcohol or a blend of these salts, in proportions within the range 15 and 60 g/l, as well as organic acids, such as formic acid, acetic acid, propionic acid, oxalic acid, malonic acid, lactic acid or citric acid, or blends thereof, their salts or salt blends, in preferred proportions within the range 10 and 40 g/l.
- organic acids such as formic acid, acetic acid, propionic acid, oxalic acid, malonic acid, lactic acid or citric acid, or blends thereof, their salts or salt blends, in preferred proportions within the range 10 and 40 g/l.
- the difficultly soluble iodine compounds can be used in the form of solid phase material lying on the bottom of the bath, or to be placed in anode bags, for example, which'are suspended from a holder and continually contacted with the electrolyte.
- the electrolytic demetallization being critically determined by the addition of the halogen compound, it is absolutely necessary to avoid overfeeding of the bath with halogen.
- difficultly soluble iodine compounds e.g. copper-I-iodide, which produce a bath wherein the iodine content need not be controlled analytically. Overfeeding with iodine is practically excluded as the bath having the difficultly soluble iodine compounds therein is a self-controlling demetallization bath which is easy to handle.
- Baths containing soluble iodine compounds enable metal coatings to be removed from steel at least as rapidly as with the use of analogous baths containing chlorine or bromine compounds, and they combine this with considerably reduced corrosiveness for the steel itself.
- Baths containing readily and difficultly soluble chlorine and bromine compounds, respectively, and baths containing difficultly soluble iodine compounds are compared with each other hereinafter.
- the basic electrolyte was composed of: g/l of triethanolamine, 48 g/l of HNO of 63 strength, and
- EXAMPLE 2 The basic electrolyte and the electrolytic conditions were the same as those used in Example 1, save that the base material was stainless steel (material No. I4 571 (German Industrial Standard X CrNiMoTi 1810)).
- Electrolytic bath for removing metallic coatings, such as nickel, chromium, zinc, tin, copper, cadmium or silver plate, from steel parts the bath containing, in aqueous solution,
- a at least one substance selected from the group consisting of nitric acid and its salts with inorganic and organic bases;
- a water-soluble halogen compound being characterized in that the halogen compound is a soluble iodine compound.
- an organic acid being selected from the group consisting of formic acid, acetic acid, propionic acid, oxalic acid, malonic acid, lactic acid or citric acid.
- the bath as claimed in claim 13 having a pH-value between 6.5 and 7.5.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2363352A DE2363352C3 (de) | 1973-12-20 | 1973-12-20 | Bad zum elektrolytischen Ablösen von Metallen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3912603A true US3912603A (en) | 1975-10-14 |
Family
ID=5901294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US533719A Expired - Lifetime US3912603A (en) | 1973-12-20 | 1974-12-17 | Electrolytic bath for the removal of metals |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3912603A (OSRAM) |
| BE (1) | BE823676A (OSRAM) |
| CH (1) | CH603833A5 (OSRAM) |
| DE (1) | DE2363352C3 (OSRAM) |
| FR (1) | FR2255397B1 (OSRAM) |
| GB (1) | GB1444699A (OSRAM) |
| IT (1) | IT1026066B (OSRAM) |
| NL (1) | NL7416696A (OSRAM) |
| SE (1) | SE7415930L (OSRAM) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4090935A (en) * | 1977-07-12 | 1978-05-23 | The United States Of America As Represented By The Secretary Of The Interior | Process for recovering silver, copper and stainless steel from silver brazed stainless steel sections |
| US4233124A (en) * | 1979-10-29 | 1980-11-11 | Oxy Metal Industries Corporation | Electrolytic stripping bath and process |
| US4264420A (en) * | 1979-10-29 | 1981-04-28 | Oxy Metal Industries Corporation | Electrolytic stripping bath and process |
| US4264419A (en) * | 1979-10-09 | 1981-04-28 | Olin Corporation | Electrochemical detinning of copper base alloys |
| US4400248A (en) * | 1982-03-08 | 1983-08-23 | Occidental Chemical Corporation | Electrolytic stripping process |
| DE3318598A1 (de) * | 1982-05-27 | 1983-12-01 | Occidental Chemical Corp., 48089 Warren, Mich. | Bad und verfahren fuer die elektrolytische entfernung von ueberzuegen aus kupfer, kupferlegierung oder chrom von einem eisenhaltigen grundmetall |
| WO1986006763A1 (en) * | 1985-05-08 | 1986-11-20 | M&T Chemicals Inc. | Process for stripping nickel or nickel-iron alloy plating in a chromic acid solution |
| US4968397A (en) * | 1989-11-27 | 1990-11-06 | Asher Reginald K | Non-cyanide electrode cleaning process |
| US5071713A (en) * | 1988-03-17 | 1991-12-10 | N. V. Bekaert S.A. | Metal fibers obtained by bundled drawing |
| USRE34227E (en) * | 1989-11-27 | 1993-04-20 | Motorola, Inc. | Non-cyanide electrode cleaning process |
| US20110083972A1 (en) * | 2009-10-08 | 2011-04-14 | First Solar, Inc. | Electrochemical method and apparatus for removing coating from a substrate |
| WO2016147709A1 (ja) * | 2015-03-13 | 2016-09-22 | 奥野製薬工業株式会社 | 治具用電解剥離剤 |
| CN106367803A (zh) * | 2016-09-05 | 2017-02-01 | 上海瑞尔实业有限公司 | 一种塑料电镀挂具铜镍铬镀层剥离方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2104339C1 (ru) * | 1994-08-05 | 1998-02-10 | Научно-производственное предприятие "Завод им.В.Я.Климова" | Раствор из электрохимического удаления медного покрытия |
| DE102004053135A1 (de) * | 2004-10-29 | 2006-05-04 | Siemens Ag | Verfahren zum Abtragen einer Beschichtung von einem Bauteil |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2371529A (en) * | 1941-09-20 | 1945-03-13 | Dow Chemical Co | Removal of electrodeposited metals |
| US2581490A (en) * | 1947-03-11 | 1952-01-08 | Gen Motors Corp | Electrolytic process of stripping metallic coatings from a ferrous metal base |
| US3151049A (en) * | 1958-09-29 | 1964-09-29 | Union Carbide Corp | Electrolytic method of and bath for stripping coatings from bases |
| US3819494A (en) * | 1973-03-29 | 1974-06-25 | Fountain Plating Co Inc | Method of removing braze |
-
1973
- 1973-12-20 DE DE2363352A patent/DE2363352C3/de not_active Expired
-
1974
- 1974-12-11 CH CH1648374A patent/CH603833A5/xx not_active IP Right Cessation
- 1974-12-17 US US533719A patent/US3912603A/en not_active Expired - Lifetime
- 1974-12-18 IT IT54626/74A patent/IT1026066B/it active
- 1974-12-18 GB GB5461474A patent/GB1444699A/en not_active Expired
- 1974-12-18 SE SE7415930A patent/SE7415930L/xx unknown
- 1974-12-20 FR FR7442318A patent/FR2255397B1/fr not_active Expired
- 1974-12-20 NL NL7416696A patent/NL7416696A/xx not_active Application Discontinuation
- 1974-12-20 BE BE151780A patent/BE823676A/xx not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2371529A (en) * | 1941-09-20 | 1945-03-13 | Dow Chemical Co | Removal of electrodeposited metals |
| US2581490A (en) * | 1947-03-11 | 1952-01-08 | Gen Motors Corp | Electrolytic process of stripping metallic coatings from a ferrous metal base |
| US3151049A (en) * | 1958-09-29 | 1964-09-29 | Union Carbide Corp | Electrolytic method of and bath for stripping coatings from bases |
| US3819494A (en) * | 1973-03-29 | 1974-06-25 | Fountain Plating Co Inc | Method of removing braze |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4090935A (en) * | 1977-07-12 | 1978-05-23 | The United States Of America As Represented By The Secretary Of The Interior | Process for recovering silver, copper and stainless steel from silver brazed stainless steel sections |
| US4264419A (en) * | 1979-10-09 | 1981-04-28 | Olin Corporation | Electrochemical detinning of copper base alloys |
| US4233124A (en) * | 1979-10-29 | 1980-11-11 | Oxy Metal Industries Corporation | Electrolytic stripping bath and process |
| US4264420A (en) * | 1979-10-29 | 1981-04-28 | Oxy Metal Industries Corporation | Electrolytic stripping bath and process |
| US4400248A (en) * | 1982-03-08 | 1983-08-23 | Occidental Chemical Corporation | Electrolytic stripping process |
| DE3318598A1 (de) * | 1982-05-27 | 1983-12-01 | Occidental Chemical Corp., 48089 Warren, Mich. | Bad und verfahren fuer die elektrolytische entfernung von ueberzuegen aus kupfer, kupferlegierung oder chrom von einem eisenhaltigen grundmetall |
| WO1986006763A1 (en) * | 1985-05-08 | 1986-11-20 | M&T Chemicals Inc. | Process for stripping nickel or nickel-iron alloy plating in a chromic acid solution |
| US4664763A (en) * | 1985-05-08 | 1987-05-12 | M&T Chemicals Inc. | Process for stripping nickel or nickel-alloy plating in a chromic acid solution |
| US5071713A (en) * | 1988-03-17 | 1991-12-10 | N. V. Bekaert S.A. | Metal fibers obtained by bundled drawing |
| US4968397A (en) * | 1989-11-27 | 1990-11-06 | Asher Reginald K | Non-cyanide electrode cleaning process |
| USRE34227E (en) * | 1989-11-27 | 1993-04-20 | Motorola, Inc. | Non-cyanide electrode cleaning process |
| US20110083972A1 (en) * | 2009-10-08 | 2011-04-14 | First Solar, Inc. | Electrochemical method and apparatus for removing coating from a substrate |
| WO2011044340A1 (en) * | 2009-10-08 | 2011-04-14 | First Solar, Inc. | Electrochemical method and apparatus for removing coating from a substrate |
| WO2016147709A1 (ja) * | 2015-03-13 | 2016-09-22 | 奥野製薬工業株式会社 | 治具用電解剥離剤 |
| JPWO2016147709A1 (ja) * | 2015-03-13 | 2017-04-27 | 奥野製薬工業株式会社 | 治具用電解剥離剤 |
| US11649558B2 (en) | 2015-03-13 | 2023-05-16 | Okuno Chemical Industries Co., Ltd. | Electrolytic stripping agent for jig |
| CN106367803A (zh) * | 2016-09-05 | 2017-02-01 | 上海瑞尔实业有限公司 | 一种塑料电镀挂具铜镍铬镀层剥离方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2363352C3 (de) | 1980-12-11 |
| SE7415930L (OSRAM) | 1975-06-23 |
| FR2255397A1 (OSRAM) | 1975-07-18 |
| IT1026066B (it) | 1978-09-20 |
| DE2363352A1 (de) | 1975-10-02 |
| DE2363352B2 (de) | 1980-04-17 |
| GB1444699A (en) | 1976-08-04 |
| BE823676A (fr) | 1975-06-20 |
| NL7416696A (nl) | 1975-06-24 |
| FR2255397B1 (OSRAM) | 1980-11-07 |
| CH603833A5 (OSRAM) | 1978-08-31 |
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