US3904430A - Cleaning process using a non-azeotrope forming contaminated cleaning mixture - Google Patents

Cleaning process using a non-azeotrope forming contaminated cleaning mixture Download PDF

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US3904430A
US3904430A US391258A US39125873A US3904430A US 3904430 A US3904430 A US 3904430A US 391258 A US391258 A US 391258A US 39125873 A US39125873 A US 39125873A US 3904430 A US3904430 A US 3904430A
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liquid mixture
solvent
mixture
liquid
compartment
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US391258A
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James William Tipping
Bernard Patrick Whim
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Imperial Chemical Industries Ltd
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Imperial Chemical Industries Ltd
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    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5018—Halogenated solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/267—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen

Definitions

  • Contaminated articles especially printed circuits, on which may be mounted components containing polymeric insulations and markings and having rosin-based soldering fluxes attached thereto do require cleaning.
  • Such articles may be treated with halogenated hydrocarbon solvents .especially fluorochlorohydrocarbon solvents such as for instance 1,1,2-trichloro-l ,2,2 trifluoroethane in association with auxiliary solvents.
  • the articles may be treated with azeotropic mixtures of the solvents or with mixtures capable of forming an azeotrope. It is usual to employ azeotropic mixtures at the boil.
  • Azeotropic mixtures of the primary solvent with an auxiliary solvent are useful for some purposes but such mixtures may not contain sufficient of the auxiliary solvent to remove the fluxes effectively.
  • Azeotrope-forming mixtures comprising a mixture of the primary solvent with a high concentration of the auxiliary solvent well above that of the azeotrope or mixtures of solvents not containing such an azeotrope might be expected to solve the problem and these are utilised at a relatively cold temperature, that is, near to ambient temperature, e.g., C or less.
  • such treatment may be followed by then bringing the article into contact with a clean cold mixture of the primary solvent and the auxiliary solvent in a separate tank, or by then bringing the article into contact with a liquid produced from a body of the liquid mixture by evaporation and condensation of the vapour the article being within a vapour zone and allowing the liquid to drain off the article.
  • Cleaning plants for treating contaminated articles may comprise a liquor tank in which the articles are im mersed, the liquor tank being provided with an overflow to a sump tank.
  • This latter tank contains a relatively small amount of liquor which is held at the boil and the purpose of the sump is not to bring the articles into contact with the liquor but to collect dirty solvent. Vapour above the level of the liquor is condensed and returned to the liquor tank thereby ensuring the presence of clean solvent in the liquor tank while impure solvent overflows to the sump.
  • the articles are withdrawn from the liquor tank then through a vapour zone and finally out of the plant.
  • a method of cleaning a contaminated article in a system which comprises using a solvent mixture comprising a halogenated hydrocarbon solvent and an auxiliary solvent which does not form an azeotrope with said halogenated hydrocarbon solvent wherein the article is contacted with a first heated liquid mixture comprising the halogenated hydrocarbon solvent and a proportion of the auxiliary solvent which is at least 2.5 parts by weight per hundred parts by weight of the halogenated hydrocarbon solvent, and the article is subsequently rinsed with a second liquid mixture containing a lower proportion of the auxiliary solvent than is contained in the first liquid mixture.
  • a supply of the halogenated hydrocarbon solvent and/or the auxiliary solvent in quantities required to maintain the composition of the said first and second liquid mixtures substantially constant.
  • the second liquid mixture is allso heated.
  • At least part and preferably all of the condensate from the vapour of the first and second liquid mixtures be returned to a vessel (the rinsing compartment) containing the second liquid mixture, the latter overflowing to a vessel containing the first liquid mixture.
  • a method of cleaning a contaminated article which comprises immersing the article in said first heated liquid mixture, said mixture being contained in a sump compartment of a cleaning system, and subsequently passing the article into said second liquid mixture in a rinsing compartment of said system, the first and second liquid mixtures having a common vapour Zone.
  • the second liquid mixture is also heated. This second liquid mixture is in equilibrium with the vapour in the vapour zone above the sump and rinsing compartments and with the said mixture in the sump compartment.
  • a plurality of rinsing compartments may be employed if desired.
  • the appropriate proportion of the halogenated hydrocarbon solvent and the auxiliary solvent is introduced continuously or intermittently into the sump and/or rinsing compartments of the cleaning system.
  • At least part, and preferably all, of the liquid obtained by condensation of vapours from the common vapour zone is returned to the rinsing compartment.
  • liquid mixture overflows from the rinsing compartment and passes to the sump compartment.
  • the first headed liquid mixture contains at least five parts by weight of the auxiliary solvent per hundred parts by weight of the total mixture.
  • fluorochlorohydrocarbons especially those containing two or three carbon atoms, for example l,l,2,2-tetrachloro- 1,2-difluoroethane.
  • l,l ,Z-trichlorol ,2,2- trifluoroethane gives especially good results.
  • the nonazcotropic solvent mixtures used in the present process are those which do not have the capability of forming an azeotrope as for example they do not include mixtures of l,l,2-trichloro-l,2,2-trifluoroethane having a high concentration of isopropyl alcohol which on fractionation give an azeotrope of said trichlorotrifluoroethane and a small proportion of isopropyl alcohol.
  • the concentration of the auxiliary solvent is suitably not greater than 9071 by weight of the liquid mixture therein. It is preferred that said concentration of auxiliary solvent is not greater than 7071 and it is particularly preferred that this concentration is not greater than 40% by weight of the liquid mixture in the sump compartment.
  • the concentration of the auxiliary solvent in the rinsing tank is different from that of the liquid mixture in the sump compartment.
  • the liquid mixture in the rinsing compartment once stable conditions are established, has a concentration of the auxiliary solvent in the primary halogenated hydrocarbon solvent which generally corresponds to 0.5 to by weight of the said liquid mixture.
  • this second liquid mixture is in equilibrium with the first liquid mixture in the sump compartment and with the vapour in the common vapour zone, that is, the composition of said second liquid mixture is substantially constant while that in the sump compartment and the vapour in the common vapour zone remain substantially constant.
  • the concentration of the auxiliary solvent in the halogenated hydrocarbon solvent in the sump and rinsing compartments will also differ according to the particular auxiliary solvent used.
  • auxiliary solvent 1,1,2-trichlorol ,2,2-trifluoroethanc
  • results can be obtained, for example, when using a concentration of to by weight of n-butanol (auxiliary solvent) with reference to the total liquid mixture in the sump compartment and l to 1.5% by weight n-butanol in the rinse compartment, both liquids being at the boil.
  • the external source of halogenated hydrocarbon solvent and auxiliary solvent supplied to the system will vary according to the particular solvents employed.
  • the two solvents may be introduced separately into the sump and/or rinsing compartments or a preformed mixture of the solvents can be employed.
  • the amount of said solvents introduced into the system is preferably that required to maintain the level constant in the sump compartment.
  • the solvent mixtures in the sump and rinsing compartments are held at a temperature greater than ambient temperature (the latter in some climates being 20C). Usually the mixtures are held at a temperature of at least C and preferably at least C. More preferably the solvent mixtures are held at the boiling point which in the case of mixtures using 1,1,2-trichlorol ,2,2-trifluoroethane as the primary solvent are often in the range C to C or higher.
  • solvents or additives can be added to the solvent compositions used in the present process if it is desired to modify their cleaning or solvent power.
  • Suitable additives include cationic, anionic, and nonionic detergents. Water may also be added in some circumstances, particularly when the compositions include a detergent but this is not essential.
  • stabilisers may be desirable under corrosive conditions, for example those conditions in which the solvent mixtures come into contact with light metals for example zinc and aluminium.
  • the present process is useful in a wide range of applications for cleaning contaminated articles including removal of tenacious soldering fluxes from electrical equipment.
  • it is useful for removing fluxes from equipment carried on a plastic or resin substrate while not damaging the boards or components thereon.
  • a contaminated article is contacted with said first heated liquid mixture in a cleaning system having one compartment (sump compartment), the article is withdrawn to the vapour zone above said compartment and therein is rinsed with said second liquid mixture which is first obtained by condensation of vapours from said vapour zone.
  • the contaminated article after immersion in said first heated liquid mixture is withdrawn through and out of said vapour zone, allowed to cool above the vapour zone but within the cleaning vessel and is then returned to said vapour zone where it is rinsed by said second liquid mixture derived by direct condensation of vapours from said vapour zone on to said cooled article.
  • first and second liquid mixtures are in compartments separate from each other and not possessing a common vapour zone, condensed liquid from vapour above said first heated mixture being returned to the second heated mixture.
  • FIG. 1 represents a schematic view in vertical cross section and are not to scale.
  • a vessel 1 is divided into a sump compartment 2 and a rinse compartment 4 separated by wall 3.
  • Sump compartment 2 contains a body of the first mixture (which does not form an azeotrope) of sufficient depth for the contaminated articles to be immersed therein, and is provided with heater 5.
  • Rinse compartment 4 adjacent to the sump compartment 2 is provided with heater 6 and contains a volume of the second liquid mixture as hereinbefore described, of composition different from that in the sump compartment 2.
  • Vapour zone 7 communicates with both sump and rinsing compartments 2 and 4.
  • Cooling coil 8 is fitted in the vapour zone 7 to condense vapour, together with trough 9.
  • a cold line 11 is attached to the outside of the vessel, through which a cooling medium can be passed to provide extra cooling.
  • An inlet 12 may be provided for feeding a supply from an external source of a mixture of primary and auxiliary solvents as hereinbefore described; it is shown in the drawing as leading into the sump compartment 2, but it can be placed so as to feed into the system at any convenient point.
  • Means (not detailed) are also provided to transport the contaminated articles through the apparatus, the track of the articles being represented by the line beginning at the entry point 13 and leading through sump compartment 2, vapour zone 7 and rinsing compartment 4 and ending at exit point 14.
  • the solvent mixtures in both compartments 2 and 4 are heated and the vapours from the mix in the vapour zone 7, condense on the cooling coil 8 and flow back as liquid into rinsing compartment 4, from which excess liquid flows over wall 3 into the sump compartment 2.
  • This continuing flow of liquid and vapour maintains a clean rinsing liquid in compartment 4 and ensures that the dirt and contamination accumulate in compartment 2, from which it may be removed in any convenient manner, for example by periodically removing all or part of the dirty liquid.
  • the levels of liquid are maintained by adding fresh solvent mixture. as required, to make up for any amounts thus removed.
  • the present invention includes with its scope an apparatus which comprises a vessel having a sump com partment provided with a heating device and a volume of a first non-azeotrope forming liquid mixture as hereinbefore described of depth sufficient to immerse the contaminated articles, a rinsing compartment or compartments adjacent to the sump compartment provided with a heating device or devices and containing a volume of liquid as hereinbefore described and being different from that in the sump compartment, said rinsing compartment being adapted to permit overflow of liquid into the sump compartment, a vapour zone communicating with both sump and rinsing compartments, cooling means adapted to permit condensation of vapour above the sump and rinsing compartments and means adapted to return condensed liquor to the rinsing compartment or compartments.
  • EXAMPLE 1 The material to be cleaned consisted of printed circuit boards consisting of resin-bonded paper boards on which adhered a deposit of flux.
  • the flux coating had been produced by applying one brush stroke of flux to the board, followed by 2 minutes drying at 70C, dipsoldering for 5 seconds at 250C, followed by a 15- minute wait.
  • the flux was an activated rosin-based fluxes available commercially under the Trade Mark Zeva C4,
  • the method of cleaning was as previously described and involved dipping the contaminated articles in the sump compartment of a cleaning plant for a period of one minute followed by immersion in an adjoining rinsing compartment for ten seconds.
  • the solvent mixture in the sump consisted of l,l,2-trichloro-I ,2,2- trifluoroethane containing 14.8% by weight of nbutanol'.
  • the mixture in the rinsing tank consisted of 98.8% by weight of said trichlorotrifluoroethane and 1.2% by weight of nbutanol. Both liquids were maintained at the boil.
  • Example 2 In this Example the solvent mixtures for treating printed circuit boards were as follows:
  • the mixture'required to maintain the composition and level of liquids in the sump and rinsing compartment consisted of said trichlorotrifluoroethanc containing 9.8% 1,4-dioxane.
  • a method of cleaning a contaminated article which comprises contacting the article with a first contaminated liquid mixture which is heated to at least 30C.. removing contamination from the article and accumulating the removed contamination in the first liquid mixture.
  • said first liquid mixture containing a fluorinated hydrocarbon solvent and an organic auxiliary solvent which together form a non-azeotrope-forming mixture and wherein the concentration of the auxiliary solvent in the mixture is at least 2.5 parts by weight per hundred parts of the fluorinated hydrocarbon solvent, and subsequently rinsing the article with a second liquid non-azeotrope-forming mixture containing the fluorinated hydrocarbon solvent and a proportion of the auxiliary solvent which is lower than that contained in the first liquid mixture, but at least equal to 0.5% by weight of said second liquid mixture.
  • a method as claimed in claim 1 which comprises immersing the article in said first heated liquid mixture, said mixture being contained in a sump compartment and subsequently passing the article into said second liquid mixture in a rinsing compartment, the first and second liquid mixtures having a common vapour zone.
  • a method as claimed in claim 5 in which at least part of the condensate from the vapour of the first and second liquid mixtures is returned to the rinsing compartment containing the second liquid mixture.
  • auxiliary solvent is an alkoxy alcohol.
  • a method as claimed in claim 1 is which the auxiliary solvent is n-butanol.
  • auxiliary solvent is an alkoxy alcohol.
  • auxiliary solvent is n-butanol and the fluorinated hydrocarbon solvent is 1.1 ,Z-trichloro-l ,2,2-trifluoroethane and the concentration of n-butanol in 1,1 ,2-trichloro-l ,2,2- trifluoroethane employed in the first liquid mixture in the sump compartment is l5to 25% by weight with reference to the total liquid mixture.
  • thermoelectric 32.
  • the temperature of the first and second liquid mixtures is at least 30C and up to the boiling point of the mixtures.
  • liquid mixtures have 1,1,2-trichloro-l,2.2-trifiuoroethane as the fluorinated hydrocarbon solvent and the temperature of such mixtures is in the range C to C.
  • a method as claimed in claim 1 in which the contaminated article is contacted with said first liquid mixturc. withdrawn to a vapour zone above said first liquid mixture and rinsed with said second liquid mixture which is obtained by condensation of vapors from the vapor zone.
  • a method as claimed in claim 35 in which the article is immersed in said first liquid mixture, withdrawn through and out of said vapor zone, allowed to cool above the vapour zone but within a cleaning vessel containing the liquid mixtures and then returned to said vapour zone where it is rinsed by said second liquid mixture derived by condensation of vapours from said vapour zone on to said cooled article.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Manufacturing Of Printed Wiring (AREA)
US391258A 1972-09-07 1973-08-24 Cleaning process using a non-azeotrope forming contaminated cleaning mixture Expired - Lifetime US3904430A (en)

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Application Number Priority Date Filing Date Title
GB4148472A GB1440438A (en) 1972-09-07 1972-09-07 Cleaning process

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US (1) US3904430A (da)
JP (1) JPS4992861A (da)
BE (1) BE804181R (da)
CA (1) CA1011223A (da)
CH (1) CH579952A5 (da)
DE (1) DE2345037C2 (da)
DK (1) DK150990C (da)
FR (1) FR2198795B2 (da)
GB (1) GB1440438A (da)
IT (1) IT1053745B (da)
NL (1) NL7312267A (da)
SE (1) SE392921B (da)

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4056403A (en) * 1976-05-27 1977-11-01 Olin Corporation Solvent composition used to clean polyurethane foam generating equipment
US4070425A (en) * 1976-02-24 1978-01-24 E. I. Du Pont De Nemours And Company Polyamide gel removal
US4269630A (en) * 1979-10-01 1981-05-26 George M. Stephenson Two-step process and composition for cleaning polished surfaces
EP0090496A1 (en) * 1982-03-18 1983-10-05 Imperial Chemical Industries Plc Cleaning compositions
US4478364A (en) * 1980-11-07 1984-10-23 Re-Al, Inc. Method of mounting and cleaning electrical slide switch of flush through design
US4711256A (en) * 1985-04-19 1987-12-08 Robert Kaiser Method and apparatus for removal of small particles from a surface
US4787941A (en) * 1986-06-30 1988-11-29 Wang Laboratories, Inc. Cleaning method for keyboard assemblies
US4973420A (en) * 1989-05-04 1990-11-27 Hoechst Celanese Corporation Stripper composition for removal of protective coatings
WO1991011269A1 (en) * 1990-01-24 1991-08-08 Motorola, Inc. A method for electrical assembly cleaning
US5082503A (en) * 1990-10-22 1992-01-21 Baxter International Inc. Method for removing contaminants from the surfaces of articles
US5106425A (en) * 1990-10-22 1992-04-21 Baxter International, Inc. Method for maintaining a flammable solvent in a non-flammable environment
US5113883A (en) * 1990-10-22 1992-05-19 Baxter International Inc. Apparatus for cleaning objects with volatile solvents
US5273592A (en) * 1991-11-01 1993-12-28 Alliesignal Inc. Method of cleaning using partially fluorinated ethers having a tertiary structure
US5304253A (en) * 1990-09-12 1994-04-19 Baxter International Inc. Method for cleaning with a volatile solvent
US5401429A (en) * 1993-04-01 1995-03-28 Minnesota Mining And Manufacturing Company Azeotropic compositions containing perfluorinated cycloaminoether
US5443747A (en) * 1989-10-26 1995-08-22 Kabushiki Kaisha Toshiba Cleaning compositions
US5482563A (en) * 1993-04-06 1996-01-09 Motorola, Inc. Method for electrical assembly cleaning using a non-azeotropic solvent composition
US5494601A (en) * 1993-04-01 1996-02-27 Minnesota Mining And Manufacturing Company Azeotropic compositions
US5503681A (en) * 1990-03-16 1996-04-02 Kabushiki Kaisha Toshiba Method of cleaning an object
US5534078A (en) * 1994-01-27 1996-07-09 Breunsbach; Rex Method for cleaning electronic assemblies
US5593507A (en) * 1990-08-22 1997-01-14 Kabushiki Kaisha Toshiba Cleaning method and cleaning apparatus
US5679175A (en) * 1991-06-14 1997-10-21 Petroferm Inc. Cleaning process including use of solvating and rinsing agents
US6187729B1 (en) * 1993-12-14 2001-02-13 Petroferm Inc. Cleaning composition comprising solvating agent and rinsing agent
US6355113B1 (en) 1991-12-02 2002-03-12 3M Innovative Properties Company Multiple solvent cleaning system

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR980700133A (ko) * 1990-03-16 1998-03-30 나시무로 다이조 세정방법 및 세정장치(Cleaning Method and Cleaning Apparatus)
MX9206771A (es) * 1991-12-02 1993-06-01 Allied Signal Inc Mejoras en sistema de limpieza por solventes multiples

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US2162656A (en) * 1935-05-22 1939-06-13 Du Pont Degreasing process
US2220124A (en) * 1938-07-20 1940-11-05 Westvaco Chlorine Products Cor Degreasing
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US3553142A (en) * 1968-12-23 1971-01-05 Allied Chem Azeotrope and solvent compositions based on 1,1,2-trichloro-1,2,2-trifluoroethane and acetonitrile
US3723332A (en) * 1970-11-27 1973-03-27 Allied Chem Stabilized perchlorofluorocarbon compositions
US3733218A (en) * 1971-11-15 1973-05-15 Diamond Shamrock Corp Removal of solder flux with azeotropic solvent mixtures

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US2153577A (en) * 1935-03-07 1939-04-11 Du Pont Process of degreasing
US2104992A (en) * 1935-04-22 1938-01-11 Wacker Chemie Gmbh Machine for cleaning and degreasing articles
US2162656A (en) * 1935-05-22 1939-06-13 Du Pont Degreasing process
US2220124A (en) * 1938-07-20 1940-11-05 Westvaco Chlorine Products Cor Degreasing
US3085918A (en) * 1959-05-22 1963-04-16 Ici Ltd Cleaning process
US3340199A (en) * 1964-04-02 1967-09-05 Ici Ltd Azeotropic halogenated hydrocarbonalcohol solvent composition
US3553142A (en) * 1968-12-23 1971-01-05 Allied Chem Azeotrope and solvent compositions based on 1,1,2-trichloro-1,2,2-trifluoroethane and acetonitrile
US3723332A (en) * 1970-11-27 1973-03-27 Allied Chem Stabilized perchlorofluorocarbon compositions
US3733218A (en) * 1971-11-15 1973-05-15 Diamond Shamrock Corp Removal of solder flux with azeotropic solvent mixtures

Cited By (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4070425A (en) * 1976-02-24 1978-01-24 E. I. Du Pont De Nemours And Company Polyamide gel removal
US4056403A (en) * 1976-05-27 1977-11-01 Olin Corporation Solvent composition used to clean polyurethane foam generating equipment
US4269630A (en) * 1979-10-01 1981-05-26 George M. Stephenson Two-step process and composition for cleaning polished surfaces
US4478364A (en) * 1980-11-07 1984-10-23 Re-Al, Inc. Method of mounting and cleaning electrical slide switch of flush through design
EP0090496A1 (en) * 1982-03-18 1983-10-05 Imperial Chemical Industries Plc Cleaning compositions
US4599187A (en) * 1982-03-18 1986-07-08 Imperial Chemical Industries Plc Cleaning compositions based on trichlorotrifluoroethane and alcohols
US4711256A (en) * 1985-04-19 1987-12-08 Robert Kaiser Method and apparatus for removal of small particles from a surface
US4787941A (en) * 1986-06-30 1988-11-29 Wang Laboratories, Inc. Cleaning method for keyboard assemblies
US4973420A (en) * 1989-05-04 1990-11-27 Hoechst Celanese Corporation Stripper composition for removal of protective coatings
US6136766A (en) * 1989-10-26 2000-10-24 Toshiba Silicone Co., Ltd. Cleaning compositions
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Also Published As

Publication number Publication date
BE804181R (fr) 1974-02-28
FR2198795A2 (da) 1974-04-05
DK150990B (da) 1987-10-05
AU5980873A (en) 1975-03-06
SE392921B (sv) 1977-04-25
IT1053745B (it) 1981-10-10
FR2198795B2 (da) 1975-03-21
JPS4992861A (da) 1974-09-04
DE2345037C2 (de) 1986-03-13
DE2345037A1 (de) 1974-03-14
DK150990C (da) 1988-02-22
CA1011223A (en) 1977-05-31
NL7312267A (da) 1974-03-11
GB1440438A (en) 1976-06-23
CH579952A5 (da) 1976-09-30

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