US3893869A - Megasonic cleaning system - Google Patents
Megasonic cleaning system Download PDFInfo
- Publication number
- US3893869A US3893869A US475173A US47517374A US3893869A US 3893869 A US3893869 A US 3893869A US 475173 A US475173 A US 475173A US 47517374 A US47517374 A US 47517374A US 3893869 A US3893869 A US 3893869A
- Authority
- US
- United States
- Prior art keywords
- container
- compartment
- articles
- cleaning
- article
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (13)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US475173A US3893869A (en) | 1974-05-31 | 1974-05-31 | Megasonic cleaning system |
IT22799/75A IT1037683B (it) | 1974-05-31 | 1975-04-28 | Metodo e sistema per pultitura megasonica |
IN851/CAL/75A IN144099B (it) | 1974-05-31 | 1975-04-28 | |
CA226,467A CA1034467A (en) | 1974-05-31 | 1975-05-07 | Megasonic cleaning method and system |
GB20614/75A GB1499739A (en) | 1974-05-31 | 1975-05-15 | Ultrasonic cleaning method and apparatus |
FR7516330A FR2272755B1 (it) | 1974-05-31 | 1975-05-26 | |
JP50063389A JPS512264A (en) | 1974-05-31 | 1975-05-26 | Butsupinno hyomenosenjosuruhoho |
AU81531/75A AU495315B2 (en) | 1974-05-31 | 1975-05-26 | Megasonic cleaning method and system |
YU1357/75A YU40887B (en) | 1974-05-31 | 1975-05-27 | Claning device |
BE156754A BE829543A (fr) | 1974-05-31 | 1975-05-27 | Systeme et procede de nettoyage par ultra-sons a tres haute frequence |
DE2523631A DE2523631C3 (de) | 1974-05-31 | 1975-05-28 | Verfahren und Vorrichtung zur Ultraschallreinigung |
SE7506134A SE418698B (sv) | 1974-05-31 | 1975-05-29 | Sett att rengora en yta hos en flat artikel |
NL7506443A NL7506443A (nl) | 1974-05-31 | 1975-05-30 | Werkwijze voor het reinigen van een oppervlak van een artikel en inrichting voor het toepas- sen van deze werkwijze. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US475173A US3893869A (en) | 1974-05-31 | 1974-05-31 | Megasonic cleaning system |
Publications (2)
Publication Number | Publication Date |
---|---|
US3893869A true US3893869A (en) | 1975-07-08 |
US3893869B1 US3893869B1 (it) | 1988-09-27 |
Family
ID=23886506
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US475173A Expired - Lifetime US3893869A (en) | 1974-05-31 | 1974-05-31 | Megasonic cleaning system |
Country Status (12)
Country | Link |
---|---|
US (1) | US3893869A (it) |
JP (1) | JPS512264A (it) |
BE (1) | BE829543A (it) |
CA (1) | CA1034467A (it) |
DE (1) | DE2523631C3 (it) |
FR (1) | FR2272755B1 (it) |
GB (1) | GB1499739A (it) |
IN (1) | IN144099B (it) |
IT (1) | IT1037683B (it) |
NL (1) | NL7506443A (it) |
SE (1) | SE418698B (it) |
YU (1) | YU40887B (it) |
Cited By (68)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4092176A (en) * | 1975-12-11 | 1978-05-30 | Nippon Electric Co., Ltd. | Apparatus for washing semiconductor wafers |
US4099417A (en) * | 1977-05-25 | 1978-07-11 | Rca Corporation | Method and apparatus for detecting ultrasonic energy |
US4318749A (en) * | 1980-06-23 | 1982-03-09 | Rca Corporation | Wettable carrier in gas drying system for wafers |
US4326553A (en) * | 1980-08-28 | 1982-04-27 | Rca Corporation | Megasonic jet cleaner apparatus |
US4361163A (en) * | 1981-01-02 | 1982-11-30 | Seiichiro Aigo | Apparatus for washing semiconductor materials |
US4409999A (en) * | 1981-08-07 | 1983-10-18 | Pedziwiatr Edward A | Automatic ultrasonic cleaning apparatus |
EP0108897A1 (en) * | 1982-10-20 | 1984-05-23 | International Business Machines Corporation | Method for removing extraneous metal from ceramic substrates |
US4543130A (en) * | 1984-08-28 | 1985-09-24 | Rca Corporation | Megasonic cleaning apparatus and method |
US4602184A (en) * | 1984-10-29 | 1986-07-22 | Ford Motor Company | Apparatus for applying high frequency ultrasonic energy to cleaning and etching solutions |
US4653543A (en) * | 1985-11-12 | 1987-03-31 | Brown Robert L | Loom reed servicing apparatus and method |
WO1987006862A1 (en) * | 1986-05-16 | 1987-11-19 | Eastman Kodak Company | Ultrasonic cleaning method and apparatus |
US4714086A (en) * | 1984-04-19 | 1987-12-22 | Sharp Corporation | Apparatus for washing and drying substrates |
US4736760A (en) * | 1986-02-21 | 1988-04-12 | Robert A. Coberly | Apparatus for cleaning, rinsing and drying substrates |
US4736759A (en) * | 1986-02-21 | 1988-04-12 | Robert A. Coberly | Apparatus for cleaning rinsing and drying substrates |
US4756322A (en) * | 1985-03-08 | 1988-07-12 | Lami Philippe A | Means for restoring the initial cleanness conditions in a quartz tube used as a reaction chamber for the production of integrated circuits |
US4804007A (en) * | 1987-04-29 | 1989-02-14 | Verteq, Inc. | Cleaning apparatus |
FR2625451A1 (fr) * | 1988-01-05 | 1989-07-07 | Gaboriaud Paul | Procede et appareil generateur d'ultra-sons par eclateurs sequentiels |
US4869278A (en) * | 1987-04-29 | 1989-09-26 | Bran Mario E | Megasonic cleaning apparatus |
WO1989011730A1 (en) * | 1988-05-24 | 1989-11-30 | Eastman Kodak Company | Apparatus for treating wafers utilizing megasonic energy |
US4909266A (en) * | 1989-03-10 | 1990-03-20 | Frank Massa | Ultrasonic cleaning system |
US4924890A (en) * | 1986-05-16 | 1990-05-15 | Eastman Kodak Company | Method and apparatus for cleaning semiconductor wafers |
US4979994A (en) * | 1989-04-06 | 1990-12-25 | Branson Ultrasonics Corporation | Method and apparatus for cleaning by ultrasonic wave energy |
WO1991002601A1 (en) * | 1989-08-21 | 1991-03-07 | Fsi International, Inc. | High frequency sonic substrate processing module |
US4998549A (en) * | 1987-04-29 | 1991-03-12 | Verteq, Inc. | Megasonic cleaning apparatus |
US5037481A (en) * | 1987-04-29 | 1991-08-06 | Verteq, Inc. | Megasonic cleaning method |
US5038808A (en) * | 1990-03-15 | 1991-08-13 | S&K Products International, Inc. | High frequency ultrasonic system |
US5143103A (en) * | 1991-01-04 | 1992-09-01 | International Business Machines Corporation | Apparatus for cleaning and drying workpieces |
US5158616A (en) * | 1988-07-22 | 1992-10-27 | Tokyo Electron Limited | Apparatus for cleaning a substrate |
US5191908A (en) * | 1990-12-28 | 1993-03-09 | Dainippon Screen Mfg. Co., Ltd. | Dipping type surface treatment apparatus |
US5286657A (en) * | 1990-10-16 | 1994-02-15 | Verteq, Inc. | Single wafer megasonic semiconductor wafer processing system |
US5299584A (en) * | 1991-04-23 | 1994-04-05 | Tokyo Electron Limited | Cleaning device |
US5355048A (en) * | 1993-07-21 | 1994-10-11 | Fsi International, Inc. | Megasonic transducer for cleaning substrate surfaces |
US5391511A (en) * | 1992-02-19 | 1995-02-21 | Micron Technology, Inc. | Semiconductor processing method of producing an isolated polysilicon lined cavity and a method of forming a capacitor |
US5427622A (en) * | 1993-02-12 | 1995-06-27 | International Business Machines Corporation | Method for uniform cleaning of wafers using megasonic energy |
US5456759A (en) * | 1992-08-10 | 1995-10-10 | Hughes Aircraft Company | Method using megasonic energy in liquefied gases |
US5656097A (en) * | 1993-10-20 | 1997-08-12 | Verteq, Inc. | Semiconductor wafer cleaning system |
EP0856873A2 (en) * | 1997-02-04 | 1998-08-05 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and SOI wafer fabrication method |
US5834871A (en) * | 1996-08-05 | 1998-11-10 | Puskas; William L. | Apparatus and methods for cleaning and/or processing delicate parts |
US5919311A (en) * | 1996-11-15 | 1999-07-06 | Memc Electronic Materials, Inc. | Control of SiO2 etch rate using dilute chemical etchants in the presence of a megasonic field |
US5950645A (en) * | 1993-10-20 | 1999-09-14 | Verteq, Inc. | Semiconductor wafer cleaning system |
US5954885A (en) * | 1995-01-06 | 1999-09-21 | Ohmi; Tadahiro | Cleaning method |
US6016821A (en) * | 1996-09-24 | 2000-01-25 | Puskas; William L. | Systems and methods for ultrasonically processing delicate parts |
US6039059A (en) * | 1996-09-30 | 2000-03-21 | Verteq, Inc. | Wafer cleaning system |
US6058945A (en) * | 1996-05-28 | 2000-05-09 | Canon Kabushiki Kaisha | Cleaning methods of porous surface and semiconductor surface |
US6269511B1 (en) | 1998-08-27 | 2001-08-07 | Micron Technology, Inc. | Surface cleaning apparatus |
US6313565B1 (en) | 2000-02-15 | 2001-11-06 | William L. Puskas | Multiple frequency cleaning system |
US20020038662A1 (en) * | 1999-06-28 | 2002-04-04 | Intersil Corporation | Potted transducer array with matching network in a multiple pass configuration |
US6391067B2 (en) | 1997-02-04 | 2002-05-21 | Canon Kabushiki Kaisha | Wafer processing apparatus and method, wafer convey robot, semiconductor substrate fabrication method, and semiconductor fabrication apparatus |
US20030028287A1 (en) * | 1999-08-09 | 2003-02-06 | Puskas William L. | Apparatus, circuitry and methods for cleaning and/or processing with sound waves |
US6523557B2 (en) | 2000-12-13 | 2003-02-25 | Imtec Acculine, Inc. | Megasonic bath |
US6554003B1 (en) * | 1999-10-30 | 2003-04-29 | Applied Materials, Inc. | Method and apparatus for cleaning a thin disc |
US20030116176A1 (en) * | 2001-04-18 | 2003-06-26 | Rothman Laura B. | Supercritical fluid processes with megasonics |
US20040256952A1 (en) * | 1996-09-24 | 2004-12-23 | William Puskas | Multi-generator system for an ultrasonic processing tank |
US20050017599A1 (en) * | 1996-08-05 | 2005-01-27 | Puskas William L. | Apparatus, circuitry, signals and methods for cleaning and/or processing with sound |
US20050072625A1 (en) * | 2003-09-11 | 2005-04-07 | Christenson Kurt K. | Acoustic diffusers for acoustic field uniformity |
US20060086604A1 (en) * | 1996-09-24 | 2006-04-27 | Puskas William L | Organism inactivation method and system |
US20070205695A1 (en) * | 1996-08-05 | 2007-09-06 | Puskas William L | Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound |
US7336019B1 (en) | 2005-07-01 | 2008-02-26 | Puskas William L | Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound |
US20080047575A1 (en) * | 1996-09-24 | 2008-02-28 | Puskas William L | Apparatus, circuitry, signals and methods for cleaning and processing with sound |
US20090088909A1 (en) * | 2007-09-27 | 2009-04-02 | Elpida Memory, Inc. | Batch processing apparatus for processing work pieces |
US20100243462A1 (en) * | 2002-11-05 | 2010-09-30 | Uri Cohen | Methods for Activating Openings for Jets Electroplating |
US8066819B2 (en) | 1996-12-19 | 2011-11-29 | Best Label Co., Inc. | Method of removing organic materials from substrates |
US8293020B2 (en) * | 2010-06-03 | 2012-10-23 | Samsung Electronics Co., Ltd. | Method of megasonic cleaning of an object |
US20130160791A1 (en) * | 2011-12-26 | 2013-06-27 | Siltronic Ag | Ultrasonic cleaning method |
EP2703094A1 (en) | 2012-08-27 | 2014-03-05 | Imec | A system for delivering ultrasonic energy to a liquid and its use for cleaning of solid parts |
US9273409B2 (en) | 2001-03-30 | 2016-03-01 | Uri Cohen | Electroplated metallic conductors |
CN108526131A (zh) * | 2018-04-08 | 2018-09-14 | 天津英创汇智汽车技术有限公司 | 零件清洗设备 |
US11975358B1 (en) | 2021-06-24 | 2024-05-07 | Cleaning Technologies Group, Llc | Ultrasonic RF generator with automatically controllable output tuning |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2632303C3 (de) * | 1976-07-17 | 1982-09-16 | Gebrüder Junghans GmbH, 7230 Schramberg | Batteriebetriebene elektronische Uhr |
US4239387A (en) * | 1979-03-28 | 1980-12-16 | E. I. Du Pont De Nemours And Company | Compact transport apparatus especially for removal of material by ultrasonic assist |
DE3734267A1 (de) * | 1987-09-14 | 1989-03-23 | Gottlob Schwarzwaelder | Geraet zum halb- bzw. vollautomatischen reinigen von farb- und lackspritzpistolen od. dgl. sowie von farb- und lackverschmutzten gegenstaenden |
DE10030718A1 (de) * | 2000-06-23 | 2002-01-10 | Univ Ilmenau Tech | Verfahren und Vorrichtung zum Reinigen von Gegenständen mit Schallwellen |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2546385A (en) * | 1944-11-29 | 1951-03-27 | Logan Lab Inc | Apparatus for washing and sterilizing medicinal containers |
US3165049A (en) * | 1962-03-28 | 1965-01-12 | Dick Vester | Automatic photographic color processing machine |
US3229702A (en) * | 1963-12-26 | 1966-01-18 | Blackstone Corp | Cleaning apparatus |
US3354495A (en) * | 1964-02-06 | 1967-11-28 | Heinicke Instr Co | Pass-through cleaning apparatus |
US3527607A (en) * | 1968-05-20 | 1970-09-08 | Blackstone Corp | Ultrasonic impact cleaners and methods of cleaning |
US3542592A (en) * | 1968-05-02 | 1970-11-24 | Bell Tech Systems Inc | Method and apparatus for cleaning members with fluids |
US3640295A (en) * | 1970-04-21 | 1972-02-08 | Wendell C Peterson | Ultrasonic cleaner and surgical instrument case |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS423982Y1 (it) * | 1964-12-23 | 1967-03-07 |
-
1974
- 1974-05-31 US US475173A patent/US3893869A/en not_active Expired - Lifetime
-
1975
- 1975-04-28 IN IN851/CAL/75A patent/IN144099B/en unknown
- 1975-04-28 IT IT22799/75A patent/IT1037683B/it active
- 1975-05-07 CA CA226,467A patent/CA1034467A/en not_active Expired
- 1975-05-15 GB GB20614/75A patent/GB1499739A/en not_active Expired
- 1975-05-26 JP JP50063389A patent/JPS512264A/ja active Pending
- 1975-05-26 FR FR7516330A patent/FR2272755B1/fr not_active Expired
- 1975-05-27 YU YU1357/75A patent/YU40887B/xx unknown
- 1975-05-27 BE BE156754A patent/BE829543A/xx unknown
- 1975-05-28 DE DE2523631A patent/DE2523631C3/de not_active Expired
- 1975-05-29 SE SE7506134A patent/SE418698B/xx not_active IP Right Cessation
- 1975-05-30 NL NL7506443A patent/NL7506443A/xx not_active Application Discontinuation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2546385A (en) * | 1944-11-29 | 1951-03-27 | Logan Lab Inc | Apparatus for washing and sterilizing medicinal containers |
US3165049A (en) * | 1962-03-28 | 1965-01-12 | Dick Vester | Automatic photographic color processing machine |
US3229702A (en) * | 1963-12-26 | 1966-01-18 | Blackstone Corp | Cleaning apparatus |
US3354495A (en) * | 1964-02-06 | 1967-11-28 | Heinicke Instr Co | Pass-through cleaning apparatus |
US3542592A (en) * | 1968-05-02 | 1970-11-24 | Bell Tech Systems Inc | Method and apparatus for cleaning members with fluids |
US3527607A (en) * | 1968-05-20 | 1970-09-08 | Blackstone Corp | Ultrasonic impact cleaners and methods of cleaning |
US3640295A (en) * | 1970-04-21 | 1972-02-08 | Wendell C Peterson | Ultrasonic cleaner and surgical instrument case |
Cited By (112)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4092176A (en) * | 1975-12-11 | 1978-05-30 | Nippon Electric Co., Ltd. | Apparatus for washing semiconductor wafers |
US4099417A (en) * | 1977-05-25 | 1978-07-11 | Rca Corporation | Method and apparatus for detecting ultrasonic energy |
US4318749A (en) * | 1980-06-23 | 1982-03-09 | Rca Corporation | Wettable carrier in gas drying system for wafers |
US4326553A (en) * | 1980-08-28 | 1982-04-27 | Rca Corporation | Megasonic jet cleaner apparatus |
US4361163A (en) * | 1981-01-02 | 1982-11-30 | Seiichiro Aigo | Apparatus for washing semiconductor materials |
US6288476B1 (en) | 1981-02-10 | 2001-09-11 | William L. Puskas | Ultrasonic transducer with bias bolt compression bolt |
US4409999A (en) * | 1981-08-07 | 1983-10-18 | Pedziwiatr Edward A | Automatic ultrasonic cleaning apparatus |
EP0108897A1 (en) * | 1982-10-20 | 1984-05-23 | International Business Machines Corporation | Method for removing extraneous metal from ceramic substrates |
US4714086A (en) * | 1984-04-19 | 1987-12-22 | Sharp Corporation | Apparatus for washing and drying substrates |
US4543130A (en) * | 1984-08-28 | 1985-09-24 | Rca Corporation | Megasonic cleaning apparatus and method |
US4602184A (en) * | 1984-10-29 | 1986-07-22 | Ford Motor Company | Apparatus for applying high frequency ultrasonic energy to cleaning and etching solutions |
US4756322A (en) * | 1985-03-08 | 1988-07-12 | Lami Philippe A | Means for restoring the initial cleanness conditions in a quartz tube used as a reaction chamber for the production of integrated circuits |
US4653543A (en) * | 1985-11-12 | 1987-03-31 | Brown Robert L | Loom reed servicing apparatus and method |
US4736759A (en) * | 1986-02-21 | 1988-04-12 | Robert A. Coberly | Apparatus for cleaning rinsing and drying substrates |
US4736760A (en) * | 1986-02-21 | 1988-04-12 | Robert A. Coberly | Apparatus for cleaning, rinsing and drying substrates |
WO1987006862A1 (en) * | 1986-05-16 | 1987-11-19 | Eastman Kodak Company | Ultrasonic cleaning method and apparatus |
US4924890A (en) * | 1986-05-16 | 1990-05-15 | Eastman Kodak Company | Method and apparatus for cleaning semiconductor wafers |
US4998549A (en) * | 1987-04-29 | 1991-03-12 | Verteq, Inc. | Megasonic cleaning apparatus |
US4804007A (en) * | 1987-04-29 | 1989-02-14 | Verteq, Inc. | Cleaning apparatus |
US4869278A (en) * | 1987-04-29 | 1989-09-26 | Bran Mario E | Megasonic cleaning apparatus |
US5037481A (en) * | 1987-04-29 | 1991-08-06 | Verteq, Inc. | Megasonic cleaning method |
FR2625451A1 (fr) * | 1988-01-05 | 1989-07-07 | Gaboriaud Paul | Procede et appareil generateur d'ultra-sons par eclateurs sequentiels |
WO1989011730A1 (en) * | 1988-05-24 | 1989-11-30 | Eastman Kodak Company | Apparatus for treating wafers utilizing megasonic energy |
US5158616A (en) * | 1988-07-22 | 1992-10-27 | Tokyo Electron Limited | Apparatus for cleaning a substrate |
US4909266A (en) * | 1989-03-10 | 1990-03-20 | Frank Massa | Ultrasonic cleaning system |
US4979994A (en) * | 1989-04-06 | 1990-12-25 | Branson Ultrasonics Corporation | Method and apparatus for cleaning by ultrasonic wave energy |
WO1991002601A1 (en) * | 1989-08-21 | 1991-03-07 | Fsi International, Inc. | High frequency sonic substrate processing module |
US5017236A (en) * | 1989-08-21 | 1991-05-21 | Fsi International, Inc. | High frequency sonic substrate processing module |
US5038808A (en) * | 1990-03-15 | 1991-08-13 | S&K Products International, Inc. | High frequency ultrasonic system |
US5286657A (en) * | 1990-10-16 | 1994-02-15 | Verteq, Inc. | Single wafer megasonic semiconductor wafer processing system |
US5191908A (en) * | 1990-12-28 | 1993-03-09 | Dainippon Screen Mfg. Co., Ltd. | Dipping type surface treatment apparatus |
US5143103A (en) * | 1991-01-04 | 1992-09-01 | International Business Machines Corporation | Apparatus for cleaning and drying workpieces |
US5299584A (en) * | 1991-04-23 | 1994-04-05 | Tokyo Electron Limited | Cleaning device |
US5391511A (en) * | 1992-02-19 | 1995-02-21 | Micron Technology, Inc. | Semiconductor processing method of producing an isolated polysilicon lined cavity and a method of forming a capacitor |
US5456759A (en) * | 1992-08-10 | 1995-10-10 | Hughes Aircraft Company | Method using megasonic energy in liquefied gases |
US5427622A (en) * | 1993-02-12 | 1995-06-27 | International Business Machines Corporation | Method for uniform cleaning of wafers using megasonic energy |
US5533540A (en) * | 1993-02-12 | 1996-07-09 | Inernational Business Machines Corporation | Apparatus for uniform cleaning of wafers using megasonic energy |
US5579792A (en) * | 1993-02-12 | 1996-12-03 | International Business Machines Corporation | Apparatus for uniform cleaning of wafers using megasonic energy |
US5355048A (en) * | 1993-07-21 | 1994-10-11 | Fsi International, Inc. | Megasonic transducer for cleaning substrate surfaces |
US5996595A (en) * | 1993-10-20 | 1999-12-07 | Verteq, Inc. | Semiconductor wafer cleaning system |
US6378534B1 (en) | 1993-10-20 | 2002-04-30 | Verteq, Inc. | Semiconductor wafer cleaning system |
US5908509A (en) * | 1993-10-20 | 1999-06-01 | Verteq, Inc. | Semiconductor wafer cleaning system |
US5656097A (en) * | 1993-10-20 | 1997-08-12 | Verteq, Inc. | Semiconductor wafer cleaning system |
US5950645A (en) * | 1993-10-20 | 1999-09-14 | Verteq, Inc. | Semiconductor wafer cleaning system |
US6158445A (en) * | 1993-10-20 | 2000-12-12 | Olesen; Michael B. | Semiconductor wafer cleaning method |
US5954885A (en) * | 1995-01-06 | 1999-09-21 | Ohmi; Tadahiro | Cleaning method |
US6058945A (en) * | 1996-05-28 | 2000-05-09 | Canon Kabushiki Kaisha | Cleaning methods of porous surface and semiconductor surface |
US6946773B2 (en) | 1996-08-05 | 2005-09-20 | Puskas William L | Apparatus and methods for cleaning and/or processing delicate parts |
US7211928B2 (en) | 1996-08-05 | 2007-05-01 | Puskas William L | Apparatus, circuitry, signals and methods for cleaning and/or processing with sound |
US6002195A (en) * | 1996-08-05 | 1999-12-14 | Puskas; William L. | Apparatus and methods for cleaning and/or processing delicate parts |
US5834871A (en) * | 1996-08-05 | 1998-11-10 | Puskas; William L. | Apparatus and methods for cleaning and/or processing delicate parts |
US8075695B2 (en) | 1996-08-05 | 2011-12-13 | Puskas William L | Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound |
US6914364B2 (en) | 1996-08-05 | 2005-07-05 | William L. Puskas | Apparatus and methods for cleaning and/or processing delicate parts |
US6181051B1 (en) | 1996-08-05 | 2001-01-30 | William L. Puskas | Apparatus and methods for cleaning and/or processing delicate parts |
US20050017599A1 (en) * | 1996-08-05 | 2005-01-27 | Puskas William L. | Apparatus, circuitry, signals and methods for cleaning and/or processing with sound |
US20040182414A1 (en) * | 1996-08-05 | 2004-09-23 | Puskas William L. | Apparatus and methods for cleaning and/or processing delicate parts |
US6538360B2 (en) | 1996-08-05 | 2003-03-25 | William L. Puskas | Multiple frequency cleaning system |
US20020171331A1 (en) * | 1996-08-05 | 2002-11-21 | Puskas William L. | Apparatus and methods for cleaning and/or processing delicate parts |
US20070205695A1 (en) * | 1996-08-05 | 2007-09-06 | Puskas William L | Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound |
US6433460B1 (en) | 1996-08-05 | 2002-08-13 | William L. Puskas | Apparatus and methods for cleaning and/or processing delicate parts |
US20060086604A1 (en) * | 1996-09-24 | 2006-04-27 | Puskas William L | Organism inactivation method and system |
US20040256952A1 (en) * | 1996-09-24 | 2004-12-23 | William Puskas | Multi-generator system for an ultrasonic processing tank |
US20080047575A1 (en) * | 1996-09-24 | 2008-02-28 | Puskas William L | Apparatus, circuitry, signals and methods for cleaning and processing with sound |
US6016821A (en) * | 1996-09-24 | 2000-01-25 | Puskas; William L. | Systems and methods for ultrasonically processing delicate parts |
US7211927B2 (en) | 1996-09-24 | 2007-05-01 | William Puskas | Multi-generator system for an ultrasonic processing tank |
US7004016B1 (en) | 1996-09-24 | 2006-02-28 | Puskas William L | Probe system for ultrasonic processing tank |
US6172444B1 (en) | 1996-09-24 | 2001-01-09 | William L. Puskas | Power system for impressing AC voltage across a capacitive element |
US6242847B1 (en) | 1996-09-24 | 2001-06-05 | William L. Puskas | Ultrasonic transducer with epoxy compression elements |
US20060175935A1 (en) * | 1996-09-30 | 2006-08-10 | Bran Mario E | Transducer assembly for megasonic processing of an article |
US7268469B2 (en) | 1996-09-30 | 2007-09-11 | Akrion Technologies, Inc. | Transducer assembly for megasonic processing of an article and apparatus utilizing the same |
US8771427B2 (en) | 1996-09-30 | 2014-07-08 | Akrion Systems, Llc | Method of manufacturing integrated circuit devices |
US8257505B2 (en) | 1996-09-30 | 2012-09-04 | Akrion Systems, Llc | Method for megasonic processing of an article |
US6039059A (en) * | 1996-09-30 | 2000-03-21 | Verteq, Inc. | Wafer cleaning system |
US6681782B2 (en) | 1996-09-30 | 2004-01-27 | Verteq, Inc. | Wafer cleaning |
US6684891B2 (en) | 1996-09-30 | 2004-02-03 | Verteq, Inc. | Wafer cleaning |
US7518288B2 (en) | 1996-09-30 | 2009-04-14 | Akrion Technologies, Inc. | System for megasonic processing of an article |
US20040206371A1 (en) * | 1996-09-30 | 2004-10-21 | Bran Mario E. | Wafer cleaning |
US20060180186A1 (en) * | 1996-09-30 | 2006-08-17 | Bran Mario E | Transducer assembly for megasonic processing of an article |
US6295999B1 (en) | 1996-09-30 | 2001-10-02 | Verteq, Inc. | Wafer cleaning method |
US7211932B2 (en) | 1996-09-30 | 2007-05-01 | Akrion Technologies, Inc. | Apparatus for megasonic processing of an article |
US7117876B2 (en) | 1996-09-30 | 2006-10-10 | Akrion Technologies, Inc. | Method of cleaning a side of a thin flat substrate by applying sonic energy to the opposite side of the substrate |
US6463938B2 (en) | 1996-09-30 | 2002-10-15 | Verteq, Inc. | Wafer cleaning method |
US6140744A (en) * | 1996-09-30 | 2000-10-31 | Verteq, Inc. | Wafer cleaning system |
US5919311A (en) * | 1996-11-15 | 1999-07-06 | Memc Electronic Materials, Inc. | Control of SiO2 etch rate using dilute chemical etchants in the presence of a megasonic field |
US8066819B2 (en) | 1996-12-19 | 2011-11-29 | Best Label Co., Inc. | Method of removing organic materials from substrates |
EP0856873A2 (en) * | 1997-02-04 | 1998-08-05 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and SOI wafer fabrication method |
US6337030B1 (en) | 1997-02-04 | 2002-01-08 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and SOI wafer fabrication method |
US6391067B2 (en) | 1997-02-04 | 2002-05-21 | Canon Kabushiki Kaisha | Wafer processing apparatus and method, wafer convey robot, semiconductor substrate fabrication method, and semiconductor fabrication apparatus |
EP0856873A3 (en) * | 1997-02-04 | 2001-08-29 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and SOI wafer fabrication method |
US6273100B1 (en) | 1998-08-27 | 2001-08-14 | Micron Technology, Inc. | Surface cleaning apparatus and method |
US6269511B1 (en) | 1998-08-27 | 2001-08-07 | Micron Technology, Inc. | Surface cleaning apparatus |
US20020038662A1 (en) * | 1999-06-28 | 2002-04-04 | Intersil Corporation | Potted transducer array with matching network in a multiple pass configuration |
US6822372B2 (en) | 1999-08-09 | 2004-11-23 | William L. Puskas | Apparatus, circuitry and methods for cleaning and/or processing with sound waves |
US20030028287A1 (en) * | 1999-08-09 | 2003-02-06 | Puskas William L. | Apparatus, circuitry and methods for cleaning and/or processing with sound waves |
US6554003B1 (en) * | 1999-10-30 | 2003-04-29 | Applied Materials, Inc. | Method and apparatus for cleaning a thin disc |
US6313565B1 (en) | 2000-02-15 | 2001-11-06 | William L. Puskas | Multiple frequency cleaning system |
US6523557B2 (en) | 2000-12-13 | 2003-02-25 | Imtec Acculine, Inc. | Megasonic bath |
US9530653B2 (en) | 2001-03-30 | 2016-12-27 | Uri Cohen | High speed electroplating metallic conductors |
US9273409B2 (en) | 2001-03-30 | 2016-03-01 | Uri Cohen | Electroplated metallic conductors |
US20030116176A1 (en) * | 2001-04-18 | 2003-06-26 | Rothman Laura B. | Supercritical fluid processes with megasonics |
US20100243462A1 (en) * | 2002-11-05 | 2010-09-30 | Uri Cohen | Methods for Activating Openings for Jets Electroplating |
US9911614B2 (en) | 2002-11-05 | 2018-03-06 | Uri Cohen | Methods for activating openings for jets electroplating |
US20050072625A1 (en) * | 2003-09-11 | 2005-04-07 | Christenson Kurt K. | Acoustic diffusers for acoustic field uniformity |
US7336019B1 (en) | 2005-07-01 | 2008-02-26 | Puskas William L | Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound |
US20090088909A1 (en) * | 2007-09-27 | 2009-04-02 | Elpida Memory, Inc. | Batch processing apparatus for processing work pieces |
US8293020B2 (en) * | 2010-06-03 | 2012-10-23 | Samsung Electronics Co., Ltd. | Method of megasonic cleaning of an object |
US9370805B2 (en) | 2010-06-03 | 2016-06-21 | Samsung Electronics Co., Ltd. | Method of megasonic cleaning of an object |
US20130160791A1 (en) * | 2011-12-26 | 2013-06-27 | Siltronic Ag | Ultrasonic cleaning method |
EP2703094A1 (en) | 2012-08-27 | 2014-03-05 | Imec | A system for delivering ultrasonic energy to a liquid and its use for cleaning of solid parts |
US9673373B2 (en) | 2012-08-27 | 2017-06-06 | Imec | System for delivering ultrasonic energy to a liquid and use for cleaning of solid parts |
CN108526131A (zh) * | 2018-04-08 | 2018-09-14 | 天津英创汇智汽车技术有限公司 | 零件清洗设备 |
US11975358B1 (en) | 2021-06-24 | 2024-05-07 | Cleaning Technologies Group, Llc | Ultrasonic RF generator with automatically controllable output tuning |
Also Published As
Publication number | Publication date |
---|---|
SE418698B (sv) | 1981-06-22 |
JPS512264A (en) | 1976-01-09 |
SE7506134L (sv) | 1975-12-01 |
CA1034467A (en) | 1978-07-11 |
DE2523631C3 (de) | 1980-12-04 |
AU8153175A (en) | 1976-12-02 |
NL7506443A (nl) | 1975-12-02 |
DE2523631A1 (de) | 1975-12-11 |
YU135775A (en) | 1982-05-31 |
DE2523631B2 (de) | 1980-04-03 |
IT1037683B (it) | 1979-11-20 |
BE829543A (fr) | 1975-09-15 |
US3893869B1 (it) | 1988-09-27 |
YU40887B (en) | 1986-08-31 |
GB1499739A (en) | 1978-02-01 |
FR2272755A1 (it) | 1975-12-26 |
FR2272755B1 (it) | 1983-01-14 |
IN144099B (it) | 1978-03-25 |
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