BE829543A - Systeme et procede de nettoyage par ultra-sons a tres haute frequence - Google Patents

Systeme et procede de nettoyage par ultra-sons a tres haute frequence

Info

Publication number
BE829543A
BE829543A BE156754A BE156754A BE829543A BE 829543 A BE829543 A BE 829543A BE 156754 A BE156754 A BE 156754A BE 156754 A BE156754 A BE 156754A BE 829543 A BE829543 A BE 829543A
Authority
BE
Belgium
Prior art keywords
high frequency
cleaning system
frequency ultra
sound cleaning
sound
Prior art date
Application number
BE156754A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE829543A publication Critical patent/BE829543A/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
BE156754A 1974-05-31 1975-05-27 Systeme et procede de nettoyage par ultra-sons a tres haute frequence BE829543A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US475173A US3893869A (en) 1974-05-31 1974-05-31 Megasonic cleaning system

Publications (1)

Publication Number Publication Date
BE829543A true BE829543A (fr) 1975-09-15

Family

ID=23886506

Family Applications (1)

Application Number Title Priority Date Filing Date
BE156754A BE829543A (fr) 1974-05-31 1975-05-27 Systeme et procede de nettoyage par ultra-sons a tres haute frequence

Country Status (12)

Country Link
US (1) US3893869A (fr)
JP (1) JPS512264A (fr)
BE (1) BE829543A (fr)
CA (1) CA1034467A (fr)
DE (1) DE2523631C3 (fr)
FR (1) FR2272755B1 (fr)
GB (1) GB1499739A (fr)
IN (1) IN144099B (fr)
IT (1) IT1037683B (fr)
NL (1) NL7506443A (fr)
SE (1) SE418698B (fr)
YU (1) YU40887B (fr)

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DE2632303C3 (de) * 1976-07-17 1982-09-16 Gebrüder Junghans GmbH, 7230 Schramberg Batteriebetriebene elektronische Uhr
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US4239387A (en) * 1979-03-28 1980-12-16 E. I. Du Pont De Nemours And Company Compact transport apparatus especially for removal of material by ultrasonic assist
US4318749A (en) * 1980-06-23 1982-03-09 Rca Corporation Wettable carrier in gas drying system for wafers
US4326553A (en) * 1980-08-28 1982-04-27 Rca Corporation Megasonic jet cleaner apparatus
US4361163A (en) * 1981-01-02 1982-11-30 Seiichiro Aigo Apparatus for washing semiconductor materials
US5834871A (en) * 1996-08-05 1998-11-10 Puskas; William L. Apparatus and methods for cleaning and/or processing delicate parts
US6016821A (en) 1996-09-24 2000-01-25 Puskas; William L. Systems and methods for ultrasonically processing delicate parts
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JPS60223130A (ja) * 1984-04-19 1985-11-07 Sharp Corp 基板の洗滌乾燥方法及びその装置
US4543130A (en) * 1984-08-28 1985-09-24 Rca Corporation Megasonic cleaning apparatus and method
US4602184A (en) * 1984-10-29 1986-07-22 Ford Motor Company Apparatus for applying high frequency ultrasonic energy to cleaning and etching solutions
FR2578455B1 (fr) * 1985-03-08 1987-05-07 Lami Philippe Ensemble destine a redonner les conditions initiales de proprete dans un tube de quartz utilise comme chambre de reaction pour la fabrication des circuits integres
US4653543A (en) * 1985-11-12 1987-03-31 Brown Robert L Loom reed servicing apparatus and method
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US4736759A (en) * 1986-02-21 1988-04-12 Robert A. Coberly Apparatus for cleaning rinsing and drying substrates
US4924890A (en) * 1986-05-16 1990-05-15 Eastman Kodak Company Method and apparatus for cleaning semiconductor wafers
WO1987006862A1 (fr) * 1986-05-16 1987-11-19 Eastman Kodak Company Procede et dispositif de nettoyage par ultrasons
US5037481B1 (en) * 1987-04-29 1993-05-11 Verteq, Inc. Megasonic cleaning method
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US4998549A (en) * 1987-04-29 1991-03-12 Verteq, Inc. Megasonic cleaning apparatus
US4804007A (en) * 1987-04-29 1989-02-14 Verteq, Inc. Cleaning apparatus
DE3734267A1 (de) * 1987-09-14 1989-03-23 Gottlob Schwarzwaelder Geraet zum halb- bzw. vollautomatischen reinigen von farb- und lackspritzpistolen od. dgl. sowie von farb- und lackverschmutzten gegenstaenden
FR2625451A1 (fr) * 1988-01-05 1989-07-07 Gaboriaud Paul Procede et appareil generateur d'ultra-sons par eclateurs sequentiels
US4854337A (en) * 1988-05-24 1989-08-08 Eastman Kodak Company Apparatus for treating wafers utilizing megasonic energy
US5158616A (en) * 1988-07-22 1992-10-27 Tokyo Electron Limited Apparatus for cleaning a substrate
US4909266A (en) * 1989-03-10 1990-03-20 Frank Massa Ultrasonic cleaning system
US4979994A (en) * 1989-04-06 1990-12-25 Branson Ultrasonics Corporation Method and apparatus for cleaning by ultrasonic wave energy
US5017236A (en) * 1989-08-21 1991-05-21 Fsi International, Inc. High frequency sonic substrate processing module
US5038808A (en) * 1990-03-15 1991-08-13 S&K Products International, Inc. High frequency ultrasonic system
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
JPH071796Y2 (ja) * 1990-12-28 1995-01-18 大日本スクリーン製造株式会社 浸漬型基板処理装置
US5143103A (en) * 1991-01-04 1992-09-01 International Business Machines Corporation Apparatus for cleaning and drying workpieces
JP3225441B2 (ja) * 1991-04-23 2001-11-05 東京エレクトロン株式会社 処理装置
US5391511A (en) * 1992-02-19 1995-02-21 Micron Technology, Inc. Semiconductor processing method of producing an isolated polysilicon lined cavity and a method of forming a capacitor
US5456759A (en) * 1992-08-10 1995-10-10 Hughes Aircraft Company Method using megasonic energy in liquefied gases
US5427622A (en) * 1993-02-12 1995-06-27 International Business Machines Corporation Method for uniform cleaning of wafers using megasonic energy
US5355048A (en) * 1993-07-21 1994-10-11 Fsi International, Inc. Megasonic transducer for cleaning substrate surfaces
US5656097A (en) * 1993-10-20 1997-08-12 Verteq, Inc. Semiconductor wafer cleaning system
US5950645A (en) * 1993-10-20 1999-09-14 Verteq, Inc. Semiconductor wafer cleaning system
JP3351924B2 (ja) * 1995-01-06 2002-12-03 忠弘 大見 洗浄方法
US6058945A (en) * 1996-05-28 2000-05-09 Canon Kabushiki Kaisha Cleaning methods of porous surface and semiconductor surface
US8075695B2 (en) * 1996-08-05 2011-12-13 Puskas William L Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound
US6822372B2 (en) * 1999-08-09 2004-11-23 William L. Puskas Apparatus, circuitry and methods for cleaning and/or processing with sound waves
US7336019B1 (en) 2005-07-01 2008-02-26 Puskas William L Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound
US6313565B1 (en) 2000-02-15 2001-11-06 William L. Puskas Multiple frequency cleaning system
US7211928B2 (en) * 1996-08-05 2007-05-01 Puskas William L Apparatus, circuitry, signals and methods for cleaning and/or processing with sound
US20060086604A1 (en) * 1996-09-24 2006-04-27 Puskas William L Organism inactivation method and system
US7211927B2 (en) * 1996-09-24 2007-05-01 William Puskas Multi-generator system for an ultrasonic processing tank
US20080047575A1 (en) * 1996-09-24 2008-02-28 Puskas William L Apparatus, circuitry, signals and methods for cleaning and processing with sound
US6039059A (en) * 1996-09-30 2000-03-21 Verteq, Inc. Wafer cleaning system
US5919311A (en) * 1996-11-15 1999-07-06 Memc Electronic Materials, Inc. Control of SiO2 etch rate using dilute chemical etchants in the presence of a megasonic field
US8066819B2 (en) 1996-12-19 2011-11-29 Best Label Co., Inc. Method of removing organic materials from substrates
JPH10223585A (ja) * 1997-02-04 1998-08-21 Canon Inc ウェハ処理装置及びその方法並びにｓｏｉウェハの製造方法
US6391067B2 (en) 1997-02-04 2002-05-21 Canon Kabushiki Kaisha Wafer processing apparatus and method, wafer convey robot, semiconductor substrate fabrication method, and semiconductor fabrication apparatus
US6273100B1 (en) 1998-08-27 2001-08-14 Micron Technology, Inc. Surface cleaning apparatus and method
US6314974B1 (en) * 1999-06-28 2001-11-13 Fairchild Semiconductor Corporation Potted transducer array with matching network in a multiple pass configuration
US6554003B1 (en) * 1999-10-30 2003-04-29 Applied Materials, Inc. Method and apparatus for cleaning a thin disc
DE10030718A1 (de) * 2000-06-23 2002-01-10 Univ Ilmenau Tech Verfahren und Vorrichtung zum Reinigen von Gegenständen mit Schallwellen
US6523557B2 (en) 2000-12-13 2003-02-25 Imtec Acculine, Inc. Megasonic bath
US6869515B2 (en) 2001-03-30 2005-03-22 Uri Cohen Enhanced electrochemical deposition (ECD) filling of high aspect ratio openings
US20030116176A1 (en) * 2001-04-18 2003-06-26 Rothman Laura B. Supercritical fluid processes with megasonics
US20040084318A1 (en) * 2002-11-05 2004-05-06 Uri Cohen Methods and apparatus for activating openings and for jets plating
WO2005025767A1 (fr) * 2003-09-11 2005-03-24 Fsi International, Inc. Diffuseurs acoustique pour uniformite de champ acoustique
JP2009081366A (ja) * 2007-09-27 2009-04-16 Elpida Memory Inc バッチ処理装置
KR101639635B1 (ko) * 2010-06-03 2016-07-25 삼성전자주식회사 메가소닉 세정 방법 및 세정 장치
JP5526118B2 (ja) * 2011-12-26 2014-06-18 ジルトロニック アクチエンゲゼルシャフト 超音波洗浄方法
EP2703094B1 (fr) 2012-08-27 2019-10-02 IMEC vzw Système permettant de délivrer de l'énergie ultrasonore à un liquide et son utilisation pour le nettoyage de pièces massives
CN108526131B (zh) * 2018-04-08 2020-05-22 天津英创汇智汽车技术有限公司 零件清洗设备
US11975358B1 (en) 2021-06-24 2024-05-07 Cleaning Technologies Group, Llc Ultrasonic RF generator with automatically controllable output tuning

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US2546385A (en) * 1944-11-29 1951-03-27 Logan Lab Inc Apparatus for washing and sterilizing medicinal containers
US3165049A (en) * 1962-03-28 1965-01-12 Dick Vester Automatic photographic color processing machine
US3229702A (en) * 1963-12-26 1966-01-18 Blackstone Corp Cleaning apparatus
US3354495A (en) * 1964-02-06 1967-11-28 Heinicke Instr Co Pass-through cleaning apparatus
JPS423982Y1 (fr) * 1964-12-23 1967-03-07
US3542592A (en) * 1968-05-02 1970-11-24 Bell Tech Systems Inc Method and apparatus for cleaning members with fluids
US3527607A (en) * 1968-05-20 1970-09-08 Blackstone Corp Ultrasonic impact cleaners and methods of cleaning
US3640295A (en) * 1970-04-21 1972-02-08 Wendell C Peterson Ultrasonic cleaner and surgical instrument case

Also Published As

Publication number Publication date
NL7506443A (nl) 1975-12-02
GB1499739A (en) 1978-02-01
US3893869B1 (fr) 1988-09-27
JPS512264A (en) 1976-01-09
FR2272755B1 (fr) 1983-01-14
AU8153175A (en) 1976-12-02
SE7506134L (sv) 1975-12-01
FR2272755A1 (fr) 1975-12-26
DE2523631B2 (de) 1980-04-03
IN144099B (fr) 1978-03-25
SE418698B (sv) 1981-06-22
DE2523631A1 (de) 1975-12-11
YU40887B (en) 1986-08-31
CA1034467A (fr) 1978-07-11
US3893869A (en) 1975-07-08
DE2523631C3 (de) 1980-12-04
IT1037683B (it) 1979-11-20
YU135775A (en) 1982-05-31

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