US3130072A - Silver-palladium immersion plating composition and process - Google Patents

Silver-palladium immersion plating composition and process Download PDF

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Publication number
US3130072A
US3130072A US139858A US13985861A US3130072A US 3130072 A US3130072 A US 3130072A US 139858 A US139858 A US 139858A US 13985861 A US13985861 A US 13985861A US 3130072 A US3130072 A US 3130072A
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United States
Prior art keywords
silver
palladous
salt
palladium
bath
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US139858A
Inventor
Duva Robert
Foulke Donald Gardner
Brenneman Richard
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Occidental Chemical Corp
Sel Rex Corp
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Sel Rex Corp
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Assigned to OXY METAL INDUSTRIES CORPORATION reassignment OXY METAL INDUSTRIES CORPORATION CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). 4-09-74 Assignors: OXY METAL FINISHING CORPORATION
Assigned to HOOKER CHEMICALS & PLASTICS CORP. reassignment HOOKER CHEMICALS & PLASTICS CORP. MERGER (SEE DOCUMENT FOR DETAILS). Assignors: OXY METAL INDUSTRIES CORPORATION
Assigned to OCCIDENTAL CHEMICAL CORPORATION reassignment OCCIDENTAL CHEMICAL CORPORATION CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). EFFECTIVE MARCH 30, 1982. Assignors: HOOKER CHEMICAS & PLASTICS CORP.
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • C23C18/44Coating with noble metals using reducing agents

Definitions

  • the electroless or chemical method for depositing metals permits the deposition of heavy coatings as opposed to simple replacement or immersion technique because the electrons necessary for reduction of the metal are supplied by a reducing agent which is in turn oxidized.
  • a reducing agent which is in turn oxidized.
  • hypophosphites are widely used as reducing agents in chemical plating processes.
  • Among the objects of the invention is to provide an electroless method of depositing silver.
  • This invention is based on the discovery that an entirely difierent system from any in common usage is effective to deposit silver from an aqueous solution thereof.
  • an entirely difierent system from any in common usage is effective to deposit silver from an aqueous solution thereof.
  • the bath of this invention therefore, comprises a potassium silver cyanide solution to which is added 0.1-30 g./l. of a soluble palladous salt (calculated as Pd).
  • a soluble palladous salt (calculated as Pd).
  • Suitable palladous salts include palladium P salt, (NH Pd(NO disodium palladium tetrachloride, Na PdCl palladous chloride and sulfate.
  • Soluble silver cyanide 8 0. H0 Alkali salt of weak acid- 25 up to 200 Weak Acid 12 up to 100 Soluble palladous salt. 2 0. 01-30 Ammonium hydroxide pH 10 pH 8-10 Temperature 80 0. 50100 G.
  • the weak acid salts as well as the acids, which, of course, exist in the bath as salts at the pH specified, are optional.
  • Effective salts include, the organic acids such as acetic, propionic, citric, tartaric, etc., as well as the inorganic phosphorous acids.
  • hydroxy polybasic acids salts such as citrates and the salts of polybasic amino acids such as ethylene di- Patented Apr. 21, 1964 amine tetraacetic acid are particularly desirable, apparently because of their complexing ability.
  • a bath was made up as follows:
  • a bath was made up similar to the bath in Example 1, except that disodium palladium tetrachloride was substituted for the diamino-dinitro palladium salt.
  • a bath was made up to contain G./l. KAg(CN) 2 8.0 Palladium P salt 2.0
  • a gold plated brass panel immersed in this bath received a deposit of 1.7 microns in 15 minutes at C.
  • composition for chemically depositing silver an aqueous solution having a pH of 8-10 and comprising 0.530 g./1. of a soluble silver cyanide and 0.01 to 30 g./l. of a soluble palladous salt.
  • composition for chemically depositing silver an aqueous solution containing G./l. Alkali silver cyanide (calc. as Ag) 0.5-30 Alkali salt of a weak acid Up to 300 Weak acid Up to Palladous salt (calc. as Pd) 0.01-30 Ammonia, sufiicient to provide a pH of 8 to 10.
  • an aqueous solution containing G./l. Potassium silver cyanide About 4 Trialkali citrate About 25 Citric acid About 12 Palladous salt About 2 Ammonia, sufiicient to provide a pH of about 10.
  • composition as claimed in claim 2 in which the palladous salt is (NH Pd(NO 5.
  • the composition as claimed in claim 2 in which the palladous salt is disodium palladium tetrachloride.
  • a process for depositing silver on a workpiece having a surface layer of metal comprising immersing the workpiece in an aqueous solution at a temperature of 50 to 100 C. containing 0.5-30 g./l. of a soluble silver cyanide in the presence of 0.01 to 30 g./l. of palladous ions until the desired amount of silver is deposited.

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)

Description

United States Patent 3,130,072 SILVER-PALLADIUM IMMERSION PLATING COMPOSITION AND PROCESS Robert Duva, Paramus, Donald Gardner Foulke, Watchung, Plainfield, and Richard Brenneman, Nutley, N.J., assignors to Sel-Rex Corporation, Nutley, N.J., a corporation of New Jersey No Drawing. Filed Sept. 22, 1961, Ser. No. 139,858 9 Claims. (Cl. 117-130) This invention is concerned with the deposition of silver and specifically with the deposition of silver without the use of applied electric current.
The electroless or chemical method for depositing metals permits the deposition of heavy coatings as opposed to simple replacement or immersion technique because the electrons necessary for reduction of the metal are supplied by a reducing agent which is in turn oxidized. For example, hypophosphites are widely used as reducing agents in chemical plating processes.
Among the objects of the invention is to provide an electroless method of depositing silver.
This invention is based on the discovery that an entirely difierent system from any in common usage is effective to deposit silver from an aqueous solution thereof. Thus, it has been discovered that when palladous ions are added to a bath containing a soluble silver cyanide at a suitable temperature, silver rapidly deposits on metals or suitably activated non-conductors.
The bath of this invention, therefore, comprises a potassium silver cyanide solution to which is added 0.1-30 g./l. of a soluble palladous salt (calculated as Pd). Suitable palladous salts include palladium P salt, (NH Pd(NO disodium palladium tetrachloride, Na PdCl palladous chloride and sulfate.
The mechanism of this reduction is not fully understood, but it is known that silver can be deposited to considerable thickness, i.e., much thicker than immersion deposits which are limited to A; to A of a micron. Furthermore, the rate of deposition depends upon the base metal being plated. Deposition of silver on gold is of the order of microns per 6.45 cm. /per hour, on copper 6 microns/6.45 cm. /hour at 80 C.
In practicing this invention, a bath of the compositions shown in Table I may be used.
TABLE I Constituent Optimum, Range,
g./l. g./l.
Soluble silver cyanide 8 0. H0 Alkali salt of weak acid- 25 up to 200 Weak Acid 12 up to 100 Soluble palladous salt. 2 0. 01-30 Ammonium hydroxide pH 10 pH 8-10 Temperature 80 0. 50100 G.
1 G. 1.:grams per liter.
The weak acid salts as well as the acids, which, of course, exist in the bath as salts at the pH specified, are optional. Effective salts include, the organic acids such as acetic, propionic, citric, tartaric, etc., as well as the inorganic phosphorous acids.
The hydroxy polybasic acids salts such as citrates and the salts of polybasic amino acids such as ethylene di- Patented Apr. 21, 1964 amine tetraacetic acid are particularly desirable, apparently because of their complexing ability.
Example No. 1
A bath was made up as follows:
G./l. )2 8 Palladium P salt 2 Ammonium citrate 15.0 Disodium EDTA 37.5
NH OH, to pH 10.0.
Example N0. 2
A bath was made up similar to the bath in Example 1, except that disodium palladium tetrachloride was substituted for the diamino-dinitro palladium salt.
The results were similar to those obtained in Example 1.
Example N0. 3
A bath was made up to contain G./l. KAg(CN) 2 8.0 Palladium P salt 2.0
NH CH, to pH 10.0.
A gold plated brass panel immersed in this bath received a deposit of 1.7 microns in 15 minutes at C.
When K HPO was added to this bath in the amount of 20 g./l., the rate of deposition on gold was 1% microns per 6.45 cm. per 15 minutes at 80 C.
We claim:
1. As a composition for chemically depositing silver an aqueous solution having a pH of 8-10 and comprising 0.530 g./1. of a soluble silver cyanide and 0.01 to 30 g./l. of a soluble palladous salt.
2. As a composition for chemically depositing silver, an aqueous solution containing G./l. Alkali silver cyanide (calc. as Ag) 0.5-30 Alkali salt of a weak acid Up to 300 Weak acid Up to Palladous salt (calc. as Pd) 0.01-30 Ammonia, sufiicient to provide a pH of 8 to 10.
3. As a composition for chemically depositing silver, an aqueous solution containing G./l. Potassium silver cyanide About 4 Trialkali citrate About 25 Citric acid About 12 Palladous salt About 2 Ammonia, sufiicient to provide a pH of about 10.
4. The composition as claimed in claim 2 in which the palladous salt is (NH Pd(NO 5. The composition as claimed in claim 2 in which the palladous salt is disodium palladium tetrachloride.
6. A process for depositing silver on a workpiece having a surface layer of metal comprising immersing the workpiece in an aqueous solution at a temperature of 50 to 100 C. containing 0.5-30 g./l. of a soluble silver cyanide in the presence of 0.01 to 30 g./l. of palladous ions until the desired amount of silver is deposited.
7. A process according to claim 6 wherein the palladous ions are obtained from (NH Pd(NO 8. A process according to claim 6 wherein the palladous ions are obtained from disodium palladium tetrachloride.
9. A process according to claim 6 wherein the palladous ions are obtained from palladous chloride.
References Cited in the file of this patent UNITED STATES PATENTS

Claims (1)

1. AS A COMPOSITION FOR CHEMICALLY DEPOSITING SILVER AN AQUEOUS SOLUTION HAVING A PH OF 8-10 AND COMPRISING 0.5-30 G./L. OF A SOLUBLE SILVER CYANIDE AND 0.01 TO 30 G./L. OF A SOLUBLE PALLADOUS SALT.
US139858A 1961-09-22 1961-09-22 Silver-palladium immersion plating composition and process Expired - Lifetime US3130072A (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3337350A (en) * 1963-01-11 1967-08-22 Mitsubishi Electric Corp Electroless silver plating
US3468676A (en) * 1963-09-09 1969-09-23 Photocircuits Corp Electroless gold plating
US3530050A (en) * 1964-06-12 1970-09-22 Johnson Matthey Co Ltd Electrodeposition of palladium
US20020150692A1 (en) * 1994-12-09 2002-10-17 Soutar Andrew Mcintosh Printed circuit board manufacture
USRE45175E1 (en) 1994-12-09 2014-10-07 Fry's Metals, Inc. Process for silver plating in printed circuit board manufacture
USRE45297E1 (en) 1996-03-22 2014-12-23 Ronald Redline Method for enhancing the solderability of a surface
USRE45842E1 (en) 1999-02-17 2016-01-12 Ronald Redline Method for enhancing the solderability of a surface
USRE45881E1 (en) 1996-03-22 2016-02-09 Ronald Redline Method for enhancing the solderability of a surface

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1208507A (en) * 1916-07-22 1916-12-12 Agnes Dalby Preparation for silvering or gilding metal articles.
US2430581A (en) * 1944-11-29 1947-11-11 Rca Corp Metallizing nonmetallic bodies
US2719821A (en) * 1951-07-19 1955-10-04 Charles R Campana Gold alloy plating bath
US2915406A (en) * 1958-03-03 1959-12-01 Int Nickel Co Palladium plating by chemical reduction
US2958610A (en) * 1957-10-07 1960-11-01 Reynolds Metals Co Pre-plating treatment of aluminous surfaces
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
US3053741A (en) * 1961-04-06 1962-09-11 Leesona Corp Deposition of metals

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1208507A (en) * 1916-07-22 1916-12-12 Agnes Dalby Preparation for silvering or gilding metal articles.
US2430581A (en) * 1944-11-29 1947-11-11 Rca Corp Metallizing nonmetallic bodies
US2719821A (en) * 1951-07-19 1955-10-04 Charles R Campana Gold alloy plating bath
US2958610A (en) * 1957-10-07 1960-11-01 Reynolds Metals Co Pre-plating treatment of aluminous surfaces
US2915406A (en) * 1958-03-03 1959-12-01 Int Nickel Co Palladium plating by chemical reduction
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
US3053741A (en) * 1961-04-06 1962-09-11 Leesona Corp Deposition of metals

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3337350A (en) * 1963-01-11 1967-08-22 Mitsubishi Electric Corp Electroless silver plating
US3468676A (en) * 1963-09-09 1969-09-23 Photocircuits Corp Electroless gold plating
US3530050A (en) * 1964-06-12 1970-09-22 Johnson Matthey Co Ltd Electrodeposition of palladium
US20020150692A1 (en) * 1994-12-09 2002-10-17 Soutar Andrew Mcintosh Printed circuit board manufacture
US20110192638A1 (en) * 1994-12-09 2011-08-11 Enthone Inc. Silver immersion plated printed circuit board
USRE45175E1 (en) 1994-12-09 2014-10-07 Fry's Metals, Inc. Process for silver plating in printed circuit board manufacture
USRE45279E1 (en) 1994-12-09 2014-12-09 Fry's Metals, Inc. Process for silver plating in printed circuit board manufacture
US9072203B2 (en) 1994-12-09 2015-06-30 Enthone Inc. Solderability enhancement by silver immersion printed circuit board manufacture
USRE45297E1 (en) 1996-03-22 2014-12-23 Ronald Redline Method for enhancing the solderability of a surface
USRE45881E1 (en) 1996-03-22 2016-02-09 Ronald Redline Method for enhancing the solderability of a surface
USRE45842E1 (en) 1999-02-17 2016-01-12 Ronald Redline Method for enhancing the solderability of a surface

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Owner name: OXY METAL INDUSTRIES CORPORATION

Free format text: CHANGE OF NAME;ASSIGNOR:OXY METAL FINISHING CORPORATION;REEL/FRAME:003967/0084

Effective date: 19741220

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Owner name: HOOKER CHEMICALS & PLASTICS CORP.

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