USRE45297E1 - Method for enhancing the solderability of a surface - Google Patents
Method for enhancing the solderability of a surface Download PDFInfo
- Publication number
- USRE45297E1 USRE45297E1 US13/371,848 US201213371848A USRE45297E US RE45297 E1 USRE45297 E1 US RE45297E1 US 201213371848 A US201213371848 A US 201213371848A US RE45297 E USRE45297 E US RE45297E
- Authority
- US
- United States
- Prior art keywords
- silver
- immersion
- resinous
- plating
- solderability
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime, expires
Links
- 0 [1*]N1C([2*])=NC([3*])=C1[4*] Chemical compound [1*]N1C([2*])=NC([3*])=C1[4*] 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/001—Interlayers, transition pieces for metallurgical bonding of workpieces
- B23K35/007—Interlayers, transition pieces for metallurgical bonding of workpieces at least one of the workpieces being of copper or another noble metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
Definitions
- This invention relates generally to a method of treating a surface which treatment enhances the solderability of the surface.
- the method is particularly useful in the fabrication and assembly of printed circuit boards.
- Soldering is generally used for making mechanical, electromechanical, or electronic connections to a variety of articles.
- the distinction between expected functions of the joints is important because each application has its own specific requirements for surface preparation. Of the three soldering applications, making electronic connections is the most demanding.
- connections of electronic components to the printed circuits are made by soldering of the leads of the components to the through-holes, surrounding pads, lands and other points of connection (collectively, “Areas of Connection”). Typically the connection occurs by wave soldering techniques.
- the printed circuit fabricator is required to arrange that the through-holes, pads, lands and other points of connection are receptive to the subsequent soldering processes.
- these surfaces must be readily wettable by the solder and permit an integral conductive connection with the leads or surfaces of the electronic components. Because of these needs, printed circuit fabricators have devised various methods of preserving and enhancing the solderability of surfaces.
- solder leveling a process that provides the surfaces with a pre-coating of solder. This is typically performed by a process called hot air solder leveling or through some type of plating process. In printed circuit fabrication, however, this method has several drawbacks. The use of hot air solder leveling may cause unacceptably high rate of defects due to shorts, particularly when dealing with small circuits. If plating is used, since it is not easy to selectively provide these areas with solder, all conductive areas of the board must be solder plated causing severe problems with the subsequent application of solder mask. In addition the foregoing processes are inefficient and relatively expensive.
- Another means of arranging good solderability of these surfaces is to plate them with a final finish coating of a precious metal such as gold, palladium or rhodium.
- a precious metal such as gold, palladium or rhodium.
- U.S. Pat. No. 5,235,139 (Bengston, et. al.), the teachings of which are incorporated herein by reference, proposes a method for achieving this previous metal final finish. Bengston et. al. propose plating the copper areas to be soldered with electroless nickel-boron, followed by a precious metal coating such as gold. See also U.S. Pat. No. 4,940,181 to Juskey, Jr.
- the method of preserving solderability proposed herein is the coating of copper surfaces to be soldered with an immersion silver plate prior to soldering. It has been found, however, that when the foregoing method is used the immersion silver coating has a tendency to develop outgrowths or filaments via an electromigration mechanism when the circuits are being used (ie. with voltage potentials present) in the presence of moisture.
- the tendency for electromigration to occur can be measured by a standard technique specified in Bellcore GR-78-CORE (13.2.5, 13.2.7) standard test procedures which are incorporated herein by reference in their entirety.
- the foregoing Bellcore procedure measures the average insulation resistance between circuit features.
- Bellcore and IPC standards require, that the average insulation resistance not decrease by more than one decade between the initial value (obtained after a conditioning period of 96 hours at 85° C./85% relative humidity with no bias) and the final value (obtained after an additional 500 hours at 85° C./85% relative humidity with a 10 V dc bias applied).
- One method which may be used to overcome the electromigration of immersion silver plating is to coat the immersion silver plate with another more noble metal such as gold.
- the disadvantages of this method are the expense of gold plating as well as the necessity for additional process steps.
- the current invention proposes the use of an immersion silver coating as an improved solderability preservative for various surfaces, particularly copper surfaces.
- Preferred compositions for depositing the immersion silver coating are also disclosed.
- the novel immersion silver plating process produces a silver plate which is more resistant to electromigration than conventional immersion silver deposits.
- the process proposed is a versatile, low cost method for effectively preserving the solderability of surfaces, particularly copper surfaces and areas of connection on printed circuit boards.
- the current invention proposes a process for preserving and enhancing the solderability of a metal surface, particularly copper surfaces.
- the proposed process comprises the following steps:
- the proposed process comprises the following steps:
- immersion silver deposits provide excellent solderability preservatives, which are particularly useful in the fabrication of printed circuit boards.
- solderability achievable with a simple immersion silver deposit in printed circuit applications has unexpectedly been found to exceed that achievable with prior art nickel-gold plating processes such as described in U.S. Pat. No. 5,235,139 and unexpectedly exceeds that achievable with other immersion deposits.
- the processes of the current invention yield surfaces which are very solderable under adverse conditions. In printed circuit applications the surfaces are wire bondable.
- immersion plating is a process which results from a replacement reaction whereby the surface being plated dissolves into solution and at the same time the metal being plated deposits from the plating solution onto the surface.
- the immersion plating initiates without prior activation of the surfaces.
- the metal to be plated is generally more noble than the surface metal.
- immersion plating is usually significantly easier to control and significantly more cost effective than electroless plating, which requires sophisticated auto catalytic plating solutions and processes for activation of the surfaces prior to plating.
- the soluble source of silver ions can be derived from a variety of silver compounds.
- the inventors have found silver nitrate to be most preferable.
- the concentration of silver in the plating solution can range from 0.1 to 25 grams per liter, but is most preferably present in a concentration of 0.5 to 2 grams per liter.
- the concentration of acid in the plating solution can range from 1 to 150 grams per liter but is preferably in the range of 5 to 50 grams per liter.
- the additives may be selected from the group consisting of fatty amines, fatty acids, fatty amides, quaternary salts, amphoteric salts, resinous amines, resinous amides, resinous acids and mixtures of the foregoing.
- suitable fatty amines are tallowamine and cocoamine.
- suitable fatty acids are stearic acid, oleic acid, palmitic acid and acids derived from the distillation of tall oil.
- suitable fatty amides are cocamide and tallowamide.
- suitable quaternary salts are (stearamidopropyl) dimethyl hydroxyethylammonium dihydrogen phosphate.
- suitable amphoteric salts are alkyliminodipropionic acid monosodium salts wherein the alkyl portion may be coco, tallow or similar organic alkyl chains.
- suitable resinous amines are amines derived from tall oil acids.
- suitable resinous amides are cocoamide, tallow amide and amides derived from tall oil acids.
- suitable resinous acids are acids derived from the distillation of tall oil such as abetic acid.
- ethoxylated and/or propoxylated versions of any of the foregoing materials such as ethoxylated or propoxylated fatty amines, ethoxylated or propoxylated fatty acids, ethoxylated or propoxylated quaternary salts, ethoxylated or propoxylated amphoteric salts, ethoxylated or propoxylated resinous amines, ethoxylated or propoxylated resinous amides, and ethoxylated or propoxylated resinous acids.
- Preferred additives include ethoxylated tallowamine, cyastat LS (quaternary ammonium methylsulfate of a fatty amidoalkyl amine) and ethoxylated cocoamine.
- concentration of the foregoing additives in the immersion silver plating bath or in the subsequent surface treatment composition may range from 0.1 to 15 grams per liter but is preferably from 1 to 5 grams per liter.
- imidazole or imidazole derivative of the following formula has a significant positive impact upon the plate produced by immersion plating solutions, particularly immersion silver plating solutions used in the processes of this invention:
- R 1 , R 2 , R 3 and R 4 are independently selected from the group consisting of substituted or unsubstituted alkyl groups, substituted or unsubstituted aryl groups, halogens, nitro groups and hydrogen.
- an imidazole as described above brightens the plated deposit and improves the integrity and physical properties of the resultant plated deposit.
- the imidazole also extends the useful life of the immersion plating solution. The inventors have found that histidine is a particularly preferred imidazole for the purposes of these processes.
- imidazoles provides significant advantages in immersion plating solutions in general, but is particularly useful and advantageous in immersion silver plating.
- the inventors have found that immersion silver deposits resulting from plating baths containing imidazoles are brighter, smoother and more cohesive than immersion silver deposits plated from baths which do not have imidazoles.
- the immersion plating baths with imidazoles have longer effective lives than comparable baths without imidazoles.
- the plating solution may, optionally, advantageously also contain an oxidant.
- an oxidant most preferably dinitro compounds, such as 3,5 dinitrohydroxybenzoic acid are preferred in this regard.
- concentration of such an oxidant in the solution can range from 0.1 to 25 grams per liter, but is preferably from 0.5 to 2 grams per liter.
- the immersion silver solution can be used in the processes of the current invention at temperatures ranging from room temperature to 200° F. but is preferably used at from 80 to 120° F.
- the time for immersion in the plating solution can range from 1 to 30 minutes but is preferably from 1 to 5 minutes.
- the immersion silver solution of the current invention is thus used to plate a thin layer of silver onto the surface to be soldered. It is believed that the resultant silver coating should be from 1 to 100 micro inches thick, preferably from 10 to 60 micro inches thick for effective enhancement and preservation of the solderability of the surface. Although this process is effective in soldering many surfaces, it is particularly useful in soldering copper surfaces, such as Areas of Connection on printed circuit boards.
- solder mask over bare copper (SMOBC) boards is most useful in the fabrication of printed circuit boards, particularly solder mask over bare copper (SMOBC) boards.
- SMOBC solder mask over bare copper
- the solder mask is applied to the surfaces of the board then exposed and developed to reveal the Areas of Connection. These Areas of Connection are then essentially the only exposed areas of copper on the board, with the remainder essentially being covered by solder mask. These exposed Areas of Connection are thus destined to be points of attachment, in most cases by soldering, when the electronic components are later placed on the board later in the fabrication cycle. Therefore, the solderability of these exposed points, generally copper, must be enhanced and preserved.
- these areas are then preferably cleaned, using an acid cleaner, and subsequently microetched to prepare the surface for acceptable immersion plating.
- the board is immersed in the immersion silver plating solution, such that a silver deposit of appropriate thickness is achieved.
- IPC-B 25 test circuit boards were processed with the following steps:
- IPC-B-25 test circuit boards were treated as noted in Example I except that in this case the immersion silver plating bath also contained 5.0 gr/l of tallow amine ethoxylated with 15 moles of ethylene oxide. The circuit boards were then tested according to the Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
- IPC-B-25 test circuit boards were treated as noted in Example I except that in this case the immersion silver plating bath also contained 1.1 g/l of Pamak 25-S which is available from Hercules, Incorporated of Wilmington, Del. and is a blend of fatty and resinous acids. The circuit boards were then tested according to Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
- IPC-B-25 test circuit boards were treated as noted in Example I except in this case after step (g) the circuit boards were further processed as follows:
- IPC-B-25 test circuit boards were treated as noted in Example IV except that in this case the Cyastat LS was placed with 5.0 gr/l Cocoamine ethoxylated with 2 moles of ethylene oxide. The circuit boards were then tested according to Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
-
- a). cleaning the metal surface;
- b). optionally, etching the metal surface;
- c). treating the metal surface with an immersion silver plating solution, said solution comprising:
- 1. a soluble source of silver ions;
- 2. an acid;
- 3. an additive selected from the group consisting of fatty amines, fatty amides, quaternary salts, amphoteric salts, resinous amines, resinous amides, fatty acids, resinous acids, and mixtures of the foregoing;
- 4. optionally, an imidazole, benzimidazole, or imidazole derivative; and
- 5. optionally, an oxidant.
-
- a). cleaning the metal surfaces;
- b). optionally, etching the metal surfaces;
- c). treating the metal surface with an immersion silver plating solution;
- d). treating the immersion silver plated surface with a solution which comprises an additive selected from the group consisting of fatty amines, fatty amides, quaternary salts, amphoteric salts, resinous amines, resinous amides, fatty acids, resinous acids and mixtures of the foregoing.
-
- a). Acid Cleaner, 5 minutes, 120° F.
- b). Water Rinse
- c). Sodium persulfate/sulfuric acid microetch, 1 minute, 95° F.
- d). Water rinse
- e). Water rinse
- f). Immersion silver plate using the following composition
hydroxy ethylenediamine tetraacetic acid | 10 | gr/l | ||
silver nitrate | 2.4 | gr/l | ||
igepal Co730 | 5.0 | gr/l | ||
imidazole | 10 | gr/l | ||
nitric acid | 32.0 | ml/l | ||
-
- g). water rinse.
-
- h). treatment with an aqueous solution containing:
- 5.0 gr./l Cyastat L5 (quaternary ammonium methylsulfate of a fatty amidoalkyl amine)
- 32 ml/l Nitric Acid (70%)
- balance—water
- i). water rinse.
- h). treatment with an aqueous solution containing:
TABLE 1 | ||
Example | Initial Value (ohms) | Final Value (ohms) |
1 | 2.0E+09 | <1.0E+06 |
2 | 2.6E+09 | 3.3E+09 |
3 | 4.1E+09 | 7.9E+09 |
4 | 3.0E+09 | 6.8E+08 |
5 | 1.9E+09 | 4.5E+09 |
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/371,848 USRE45297E1 (en) | 1996-03-22 | 2012-02-13 | Method for enhancing the solderability of a surface |
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/621,098 US5733599A (en) | 1996-03-22 | 1996-03-22 | Method for enhancing the solderability of a surface |
US08/982,980 US5935640A (en) | 1996-03-22 | 1997-12-02 | Method for enhancing the solderability of a surface |
US09/251,641 US6200451B1 (en) | 1996-03-22 | 1999-02-17 | Method for enhancing the solderability of a surface |
US09/698,370 US6444109B1 (en) | 1996-03-22 | 2000-10-26 | Method for enhancing the solderability of a surface |
US09/821,205 US6544397B2 (en) | 1996-03-22 | 2001-03-29 | Method for enhancing the solderability of a surface |
US10/341,859 US6905587B2 (en) | 1996-03-22 | 2003-01-14 | Method for enhancing the solderability of a surface |
US10/456,329 US7267259B2 (en) | 1999-02-17 | 2003-06-06 | Method for enhancing the solderability of a surface |
US13/371,848 USRE45297E1 (en) | 1996-03-22 | 2012-02-13 | Method for enhancing the solderability of a surface |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/456,329 Reissue US7267259B2 (en) | 1996-03-22 | 2003-06-06 | Method for enhancing the solderability of a surface |
Publications (1)
Publication Number | Publication Date |
---|---|
USRE45297E1 true USRE45297E1 (en) | 2014-12-23 |
Family
ID=47149033
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/341,859 Ceased US6905587B2 (en) | 1996-03-22 | 2003-01-14 | Method for enhancing the solderability of a surface |
US13/371,848 Expired - Lifetime USRE45297E1 (en) | 1996-03-22 | 2012-02-13 | Method for enhancing the solderability of a surface |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/341,859 Ceased US6905587B2 (en) | 1996-03-22 | 2003-01-14 | Method for enhancing the solderability of a surface |
Country Status (1)
Country | Link |
---|---|
US (2) | US6905587B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10184189B2 (en) | 2016-07-18 | 2019-01-22 | ECSI Fibrotools, Inc. | Apparatus and method of contact electroplating of isolated structures |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9425030D0 (en) | 1994-12-09 | 1995-02-08 | Alpha Metals Ltd | Silver plating |
GB9425031D0 (en) * | 1994-12-09 | 1995-02-08 | Alpha Metals Ltd | Printed circuit board manufacture |
US6905587B2 (en) | 1996-03-22 | 2005-06-14 | Ronald Redline | Method for enhancing the solderability of a surface |
US6544397B2 (en) | 1996-03-22 | 2003-04-08 | Ronald Redline | Method for enhancing the solderability of a surface |
USRE45842E1 (en) | 1999-02-17 | 2016-01-12 | Ronald Redline | Method for enhancing the solderability of a surface |
US8349393B2 (en) | 2004-07-29 | 2013-01-08 | Enthone Inc. | Silver plating in electronics manufacture |
KR20090088932A (en) * | 2006-12-06 | 2009-08-20 | 메디뮨 엘엘씨 | Methods of treating systemic lupus erythematosus |
US7883738B2 (en) * | 2007-04-18 | 2011-02-08 | Enthone Inc. | Metallic surface enhancement |
US10017863B2 (en) * | 2007-06-21 | 2018-07-10 | Joseph A. Abys | Corrosion protection of bronzes |
TWI453301B (en) * | 2007-11-08 | 2014-09-21 | Enthone | Self assembled molecules on immersion silver coatings |
US7972655B2 (en) * | 2007-11-21 | 2011-07-05 | Enthone Inc. | Anti-tarnish coatings |
US8869165B2 (en) * | 2008-03-20 | 2014-10-21 | International Business Machines Corporation | Integrating flow orchestration and scheduling of jobs and data activities for a batch of workflows over multiple domains subject to constraints |
US8341628B2 (en) * | 2009-12-23 | 2012-12-25 | International Business Machines Corporation | Controlling depth and latency of exit of a virtual processor's idle state in a power management environment |
Citations (93)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB592443A (en) | 1944-09-14 | 1947-09-18 | Westinghouse Electric Int Co | Improvements in or relating to electro-plating |
GB602591A (en) | 1945-02-12 | 1948-05-31 | Du Pont | Improvements in or relating to the electro-deposition of metals |
US2555375A (en) | 1948-11-13 | 1951-06-05 | Battelle Development Corp | Process of plating bright silver alloy |
US2757104A (en) | 1953-04-15 | 1956-07-31 | Metalholm Engineering Corp | Process of forming precision resistor |
US2777810A (en) | 1956-10-03 | 1957-01-15 | Elechem Corp | Bath for electroplating silver |
US2883288A (en) | 1955-08-17 | 1959-04-21 | Lewco Inc | Silver plating bath |
US3130072A (en) | 1961-09-22 | 1964-04-21 | Sel Rex Corp | Silver-palladium immersion plating composition and process |
US3162512A (en) | 1961-03-21 | 1964-12-22 | Engelhard Ind Inc | Immersion plating with noble metals and the product thereof |
US3202488A (en) | 1964-03-04 | 1965-08-24 | Chomerics Inc | Silver-plated copper powder |
US3230098A (en) | 1962-10-09 | 1966-01-18 | Engelhard Ind Inc | Immersion plating with noble metals |
US3285754A (en) | 1962-07-05 | 1966-11-15 | Johnson Matthey Co Ltd | Deposition of palladium |
US3294578A (en) | 1963-10-22 | 1966-12-27 | Gen Aniline & Film Corp | Deposition of a metallic coat on metal surfaces |
US3330672A (en) | 1964-06-29 | 1967-07-11 | Hunt Chem Corp Philip A | Silver antitarnish compositions |
GB1120583A (en) | 1965-05-19 | 1968-07-17 | British Aircraft Corp Ltd | Improvements relating to printed circuits |
US3460953A (en) | 1966-05-27 | 1969-08-12 | Pennsalt Chemicals Corp | Process for depositing brasslike coatings and composition therefor |
US3468804A (en) | 1964-03-13 | 1969-09-23 | Winfield Brooks Co Inc | Silver cleaning composition |
US3531315A (en) | 1967-07-17 | 1970-09-29 | Minnesota Mining & Mfg | Mechanical plating |
US3576662A (en) | 1965-07-16 | 1971-04-27 | Basf Ag | Metallizing plastics surfaces |
AU5019272A (en) | 1971-12-20 | 1974-06-20 | Ici Australia Limited | Composition and process |
JPS5127819A (en) | 1974-09-02 | 1976-03-09 | Mitsubishi Gas Chemical Co | Do oyobi dogokinyokagakushorieki |
US3978271A (en) | 1975-04-15 | 1976-08-31 | Ppg Industries, Inc. | Thin metallic nickel-silver films by chemical replacement |
US3993845A (en) | 1973-07-30 | 1976-11-23 | Ppg Industries, Inc. | Thin films containing metallic copper and silver by replacement without subsequent accelerated oxidation |
US4024031A (en) | 1975-10-28 | 1977-05-17 | Amp Incorporated | Silver plating |
US4067784A (en) | 1976-06-09 | 1978-01-10 | Oxy Metal Industries Corporation | Non-cyanide acidic silver electroplating bath and additive therefore |
US4088549A (en) | 1976-04-13 | 1978-05-09 | Oxy Metal Industries Corporation | Bright low karat silver gold electroplating |
US4091172A (en) | 1976-12-14 | 1978-05-23 | Ppg Industries, Inc. | Uniform gold films |
JPS53134759A (en) | 1977-04-28 | 1978-11-24 | Fujikura Kasei Kk | Production of copmosite metal powder |
US4187198A (en) | 1972-08-07 | 1980-02-05 | Kollmorgen Technologies Corp. | Novel precious metal sensitizing solutions |
US4189510A (en) | 1978-09-05 | 1980-02-19 | The Dow Chemical Company | Replacement plating procedure for silver on nickel |
US4246077A (en) | 1975-03-12 | 1981-01-20 | Technic, Inc. | Non-cyanide bright silver electroplating bath therefor, silver compounds and method of making silver compounds |
US4255214A (en) | 1977-11-21 | 1981-03-10 | Falconer Plate Glass Corporation | Methods of manufacturing and protecting mirrors |
US4265715A (en) | 1979-07-13 | 1981-05-05 | Oxy Metal Industries Corporation | Silver electrodeposition process |
SU829727A1 (en) | 1979-04-17 | 1981-05-15 | Предприятие П/Я Г-4598 | Silver-plating electrolyte |
US4304846A (en) * | 1979-02-09 | 1981-12-08 | Ciba-Geigy Ag | Method for processing silver dye-bleach materials |
US4368223A (en) | 1981-06-01 | 1983-01-11 | Asahi Glass Company, Ltd. | Process for preparing nickel layer |
US4389431A (en) | 1980-05-12 | 1983-06-21 | Minnesota Mining And Manufacturing Company | Process for mechanically depositing heavy metallic coatings |
US4440805A (en) | 1975-10-23 | 1984-04-03 | Nathan Feldstein | Stabilized dispersion for electroless plating catalysts using corrosion inhibitors as stabilizers |
US4478691A (en) | 1981-10-13 | 1984-10-23 | At&T Bell Laboratories | Silver plating procedure |
JPS60100679A (en) | 1983-11-04 | 1985-06-04 | C Uyemura & Co Ltd | Method for coating silver to metallic material |
US4568570A (en) | 1983-10-18 | 1986-02-04 | Bayer Aktiengesellschaft | Process for activating substrates for electroless metallization |
US4615950A (en) | 1985-03-15 | 1986-10-07 | M&T Chemicals Inc. | Printed circuit boards having improved adhesion between solder mask and metal |
US4628150A (en) | 1982-07-27 | 1986-12-09 | Luc Technologies Limited | Bonding and bonded products |
US4666735A (en) | 1983-04-15 | 1987-05-19 | Polyonics Corporation | Process for producing product having patterned metal layer |
US4750889A (en) | 1987-02-27 | 1988-06-14 | Minnesota Mining & Manufacturing Company | Through-board electrical component header having integral solder mask |
US4753821A (en) | 1984-09-19 | 1988-06-28 | Bayer Aktiengesellschaft | Process for the partial metallization of substrate surfaces |
US4755265A (en) | 1985-06-28 | 1988-07-05 | Union Oil Company Of California | Processes for the deposition or removal of metals |
GB2201163A (en) | 1987-02-17 | 1988-08-24 | Green Anthony J | Electroless silver plating compositions |
US4777078A (en) | 1986-03-12 | 1988-10-11 | Brother Kogyo Kabushiki Kaisha | Process for forming copper coating having excellent mechanical properties, and printed-wiring board with conductor pattern formed of such copper coating |
US4781980A (en) | 1986-03-28 | 1988-11-01 | Fukuda Metal Foil & Powder Co., Ltd. | Copper powder for use in conductive paste |
US4800132A (en) | 1986-10-22 | 1989-01-24 | Macdermid, Incorporated | Mechanical plating with oxidation-prone metals |
US4821148A (en) | 1985-06-14 | 1989-04-11 | Hitachi, Ltd. | Resin packaged semiconductor device having a protective layer made of a metal-organic matter compound |
US4846918A (en) | 1988-02-24 | 1989-07-11 | Psi Star | Copper etching process and product with controlled nitrous acid reaction |
US4873139A (en) | 1988-03-29 | 1989-10-10 | Minnesota Mining And Manufacturing Company | Corrosion resistant silver and copper surfaces |
US4908241A (en) | 1981-12-07 | 1990-03-13 | Max-Planck-Gesellschaft Zur Foederung Der Wissenschaften E.V. | Process for the currentless deposition of electropositive metal layers on the surfaces of less electropositive metals |
US4940181A (en) | 1989-04-06 | 1990-07-10 | Motorola, Inc. | Pad grid array for receiving a solder bumped chip carrier |
US4968397A (en) | 1989-11-27 | 1990-11-06 | Asher Reginald K | Non-cyanide electrode cleaning process |
US4978423A (en) | 1988-09-26 | 1990-12-18 | At&T Bell Laboratories | Selective solder formation on printed circuit boards |
US5037482A (en) | 1990-02-16 | 1991-08-06 | Macdermid, Incorporated | Composition and method for improving adhesion of coatings to copper surfaces |
US5061566A (en) | 1989-12-28 | 1991-10-29 | Chomerics, Inc. | Corrosion inhibiting emi/rfi shielding coating and method of its use |
JPH04110474A (en) | 1990-08-30 | 1992-04-10 | Meidensha Corp | Post-treatment of silver plating |
US5115051A (en) * | 1988-12-09 | 1992-05-19 | Shin-Etsu Chemical Co., Ltd. | Method of preventing polymer scale deposition in a polymerization vessel |
US5160579A (en) | 1991-06-05 | 1992-11-03 | Macdermid, Incorporated | Process for manufacturing printed circuit employing selective provision of solderable coating |
US5173130A (en) | 1989-11-13 | 1992-12-22 | Shikoku Chemicals Corporation | Process for surface treatment of copper and copper alloy |
US5178909A (en) | 1990-07-24 | 1993-01-12 | Mitsui Kinzoku Kogyo Kabushiki Kaisha | Production of silver-coated copper-based powders |
US5186984A (en) | 1990-06-28 | 1993-02-16 | Monsanto Company | Silver coatings |
US5196053A (en) | 1991-11-27 | 1993-03-23 | Mcgean-Rohco, Inc. | Complexing agent for displacement tin plating |
US5235139A (en) | 1990-09-12 | 1993-08-10 | Macdermid, Incorprated | Method for fabricating printed circuits |
US5256275A (en) | 1992-04-15 | 1993-10-26 | Learonal, Inc. | Electroplated gold-copper-silver alloys |
US5277790A (en) | 1992-07-10 | 1994-01-11 | Technic Incorporated | Non-cyanide electroplating solution for gold or alloys thereof |
US5322553A (en) | 1993-02-22 | 1994-06-21 | Applied Electroless Concepts | Electroless silver plating composition |
DE4316679C1 (en) | 1993-05-13 | 1994-07-28 | Atotech Deutschland Gmbh | Palladium surface-coating of copper, nickel and their alloys |
US5348590A (en) | 1992-08-31 | 1994-09-20 | Hitachi, Ltd. | Surface treating agent for copper or copper alloys |
WO1994026954A1 (en) | 1993-05-13 | 1994-11-24 | Atotech Deutschland Gmbh | Palladium layers deposition process |
US5393861A (en) * | 1989-10-18 | 1995-02-28 | Toray Thiokol Co., Ltd. | Polysulfide polyether and polymer composition comprising polysulfide and polyether |
US5468515A (en) | 1994-10-14 | 1995-11-21 | Macdermid, Incorporated | Composition and method for selective plating |
US5518760A (en) | 1994-10-14 | 1996-05-21 | Macdermid, Incorporated | Composition and method for selective plating |
WO1996017974A1 (en) * | 1994-12-09 | 1996-06-13 | Alpha Fry Limited | Silver plating |
WO1996017975A1 (en) * | 1994-12-09 | 1996-06-13 | Alpha Fry Limited | Printed circuit board manufacture |
US5567357A (en) | 1993-08-25 | 1996-10-22 | Tatsuta Electric Wire & Cable Co., Ltd. | Conductive paint having good adhesion to molding of metallic oxide |
US5576053A (en) | 1993-05-11 | 1996-11-19 | Murata Manufacturing Co., Ltd. | Method for forming an electrode on an electronic part |
EP0797380A1 (en) | 1996-03-22 | 1997-09-24 | Macdermid Incorporated | Method for enhancing the solderability of a surface |
US5725640A (en) | 1993-03-18 | 1998-03-10 | Atotech Usa, Inc. | Composition and process for treating a surface coated with a self-accelerating and replenishing non-formaldehyde immersion coating |
US5733598A (en) | 1992-10-05 | 1998-03-31 | Matsushita Electric Industrial Co., Ltd. | Flexible wiring board and its fabrication method |
US5824631A (en) * | 1994-06-03 | 1998-10-20 | Wagenknecht; John H. | Compositions for dissolution of soft metals |
US5876517A (en) | 1994-12-07 | 1999-03-02 | Atotech Deutschland Gmbh | Chromate-plating bath and process for finishing zinc zinc alloy or cadmium surfaces |
US6183545B1 (en) | 1998-07-14 | 2001-02-06 | Daiwa Fine Chemicals Co., Ltd. | Aqueous solutions for obtaining metals by reductive deposition |
US6200451B1 (en) | 1996-03-22 | 2001-03-13 | Macdermid, Incorporated | Method for enhancing the solderability of a surface |
US6235348B1 (en) * | 1998-05-13 | 2001-05-22 | Shin-Etsu Chemical Co., Ltd. | Rust prevention |
US6319543B1 (en) | 1999-03-31 | 2001-11-20 | Alpha Metals, Inc. | Process for silver plating in printed circuit board manufacture |
US6331201B1 (en) | 1997-04-28 | 2001-12-18 | Fry's Metals, Inc. | Bismuth coating protection for copper |
US6375822B1 (en) | 2000-10-03 | 2002-04-23 | Lev Taytsas | Method for enhancing the solderability of a surface |
US6544397B2 (en) | 1996-03-22 | 2003-04-08 | Ronald Redline | Method for enhancing the solderability of a surface |
US6905587B2 (en) | 1996-03-22 | 2005-06-14 | Ronald Redline | Method for enhancing the solderability of a surface |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3372205D1 (en) * | 1982-07-09 | 1987-07-30 | Emhart Ind | Feeder mechanism for supplying gobs of plastic material |
-
2003
- 2003-01-14 US US10/341,859 patent/US6905587B2/en not_active Ceased
-
2012
- 2012-02-13 US US13/371,848 patent/USRE45297E1/en not_active Expired - Lifetime
Patent Citations (102)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB592443A (en) | 1944-09-14 | 1947-09-18 | Westinghouse Electric Int Co | Improvements in or relating to electro-plating |
GB602591A (en) | 1945-02-12 | 1948-05-31 | Du Pont | Improvements in or relating to the electro-deposition of metals |
US2555375A (en) | 1948-11-13 | 1951-06-05 | Battelle Development Corp | Process of plating bright silver alloy |
US2757104A (en) | 1953-04-15 | 1956-07-31 | Metalholm Engineering Corp | Process of forming precision resistor |
US2883288A (en) | 1955-08-17 | 1959-04-21 | Lewco Inc | Silver plating bath |
US2777810A (en) | 1956-10-03 | 1957-01-15 | Elechem Corp | Bath for electroplating silver |
US3162512A (en) | 1961-03-21 | 1964-12-22 | Engelhard Ind Inc | Immersion plating with noble metals and the product thereof |
US3130072A (en) | 1961-09-22 | 1964-04-21 | Sel Rex Corp | Silver-palladium immersion plating composition and process |
US3285754A (en) | 1962-07-05 | 1966-11-15 | Johnson Matthey Co Ltd | Deposition of palladium |
US3230098A (en) | 1962-10-09 | 1966-01-18 | Engelhard Ind Inc | Immersion plating with noble metals |
US3294578A (en) | 1963-10-22 | 1966-12-27 | Gen Aniline & Film Corp | Deposition of a metallic coat on metal surfaces |
US3202488A (en) | 1964-03-04 | 1965-08-24 | Chomerics Inc | Silver-plated copper powder |
US3468804A (en) | 1964-03-13 | 1969-09-23 | Winfield Brooks Co Inc | Silver cleaning composition |
US3330672A (en) | 1964-06-29 | 1967-07-11 | Hunt Chem Corp Philip A | Silver antitarnish compositions |
GB1120583A (en) | 1965-05-19 | 1968-07-17 | British Aircraft Corp Ltd | Improvements relating to printed circuits |
US3576662A (en) | 1965-07-16 | 1971-04-27 | Basf Ag | Metallizing plastics surfaces |
US3460953A (en) | 1966-05-27 | 1969-08-12 | Pennsalt Chemicals Corp | Process for depositing brasslike coatings and composition therefor |
US3531315A (en) | 1967-07-17 | 1970-09-29 | Minnesota Mining & Mfg | Mechanical plating |
AU5019272A (en) | 1971-12-20 | 1974-06-20 | Ici Australia Limited | Composition and process |
US4187198A (en) | 1972-08-07 | 1980-02-05 | Kollmorgen Technologies Corp. | Novel precious metal sensitizing solutions |
US3993845A (en) | 1973-07-30 | 1976-11-23 | Ppg Industries, Inc. | Thin films containing metallic copper and silver by replacement without subsequent accelerated oxidation |
JPS5127819A (en) | 1974-09-02 | 1976-03-09 | Mitsubishi Gas Chemical Co | Do oyobi dogokinyokagakushorieki |
US4246077A (en) | 1975-03-12 | 1981-01-20 | Technic, Inc. | Non-cyanide bright silver electroplating bath therefor, silver compounds and method of making silver compounds |
US3978271A (en) | 1975-04-15 | 1976-08-31 | Ppg Industries, Inc. | Thin metallic nickel-silver films by chemical replacement |
US4440805A (en) | 1975-10-23 | 1984-04-03 | Nathan Feldstein | Stabilized dispersion for electroless plating catalysts using corrosion inhibitors as stabilizers |
US4024031A (en) | 1975-10-28 | 1977-05-17 | Amp Incorporated | Silver plating |
US4088549A (en) | 1976-04-13 | 1978-05-09 | Oxy Metal Industries Corporation | Bright low karat silver gold electroplating |
US4067784A (en) | 1976-06-09 | 1978-01-10 | Oxy Metal Industries Corporation | Non-cyanide acidic silver electroplating bath and additive therefore |
US4091172A (en) | 1976-12-14 | 1978-05-23 | Ppg Industries, Inc. | Uniform gold films |
JPS53134759A (en) | 1977-04-28 | 1978-11-24 | Fujikura Kasei Kk | Production of copmosite metal powder |
US4255214A (en) | 1977-11-21 | 1981-03-10 | Falconer Plate Glass Corporation | Methods of manufacturing and protecting mirrors |
US4189510A (en) | 1978-09-05 | 1980-02-19 | The Dow Chemical Company | Replacement plating procedure for silver on nickel |
US4304846A (en) * | 1979-02-09 | 1981-12-08 | Ciba-Geigy Ag | Method for processing silver dye-bleach materials |
SU829727A1 (en) | 1979-04-17 | 1981-05-15 | Предприятие П/Я Г-4598 | Silver-plating electrolyte |
US4265715A (en) | 1979-07-13 | 1981-05-05 | Oxy Metal Industries Corporation | Silver electrodeposition process |
US4389431A (en) | 1980-05-12 | 1983-06-21 | Minnesota Mining And Manufacturing Company | Process for mechanically depositing heavy metallic coatings |
US4368223A (en) | 1981-06-01 | 1983-01-11 | Asahi Glass Company, Ltd. | Process for preparing nickel layer |
US4478691A (en) | 1981-10-13 | 1984-10-23 | At&T Bell Laboratories | Silver plating procedure |
US4908241A (en) | 1981-12-07 | 1990-03-13 | Max-Planck-Gesellschaft Zur Foederung Der Wissenschaften E.V. | Process for the currentless deposition of electropositive metal layers on the surfaces of less electropositive metals |
US4628150A (en) | 1982-07-27 | 1986-12-09 | Luc Technologies Limited | Bonding and bonded products |
US4666735A (en) | 1983-04-15 | 1987-05-19 | Polyonics Corporation | Process for producing product having patterned metal layer |
US4568570A (en) | 1983-10-18 | 1986-02-04 | Bayer Aktiengesellschaft | Process for activating substrates for electroless metallization |
JPS60100679A (en) | 1983-11-04 | 1985-06-04 | C Uyemura & Co Ltd | Method for coating silver to metallic material |
US4753821A (en) | 1984-09-19 | 1988-06-28 | Bayer Aktiengesellschaft | Process for the partial metallization of substrate surfaces |
US4615950A (en) | 1985-03-15 | 1986-10-07 | M&T Chemicals Inc. | Printed circuit boards having improved adhesion between solder mask and metal |
US4821148A (en) | 1985-06-14 | 1989-04-11 | Hitachi, Ltd. | Resin packaged semiconductor device having a protective layer made of a metal-organic matter compound |
US4755265A (en) | 1985-06-28 | 1988-07-05 | Union Oil Company Of California | Processes for the deposition or removal of metals |
US4777078A (en) | 1986-03-12 | 1988-10-11 | Brother Kogyo Kabushiki Kaisha | Process for forming copper coating having excellent mechanical properties, and printed-wiring board with conductor pattern formed of such copper coating |
US4781980A (en) | 1986-03-28 | 1988-11-01 | Fukuda Metal Foil & Powder Co., Ltd. | Copper powder for use in conductive paste |
US4800132A (en) | 1986-10-22 | 1989-01-24 | Macdermid, Incorporated | Mechanical plating with oxidation-prone metals |
GB2201163A (en) | 1987-02-17 | 1988-08-24 | Green Anthony J | Electroless silver plating compositions |
US4750889A (en) | 1987-02-27 | 1988-06-14 | Minnesota Mining & Manufacturing Company | Through-board electrical component header having integral solder mask |
US4846918A (en) | 1988-02-24 | 1989-07-11 | Psi Star | Copper etching process and product with controlled nitrous acid reaction |
US4873139A (en) | 1988-03-29 | 1989-10-10 | Minnesota Mining And Manufacturing Company | Corrosion resistant silver and copper surfaces |
US4978423A (en) | 1988-09-26 | 1990-12-18 | At&T Bell Laboratories | Selective solder formation on printed circuit boards |
US5115051A (en) * | 1988-12-09 | 1992-05-19 | Shin-Etsu Chemical Co., Ltd. | Method of preventing polymer scale deposition in a polymerization vessel |
US4940181A (en) | 1989-04-06 | 1990-07-10 | Motorola, Inc. | Pad grid array for receiving a solder bumped chip carrier |
US5393861A (en) * | 1989-10-18 | 1995-02-28 | Toray Thiokol Co., Ltd. | Polysulfide polyether and polymer composition comprising polysulfide and polyether |
US5173130A (en) | 1989-11-13 | 1992-12-22 | Shikoku Chemicals Corporation | Process for surface treatment of copper and copper alloy |
US4968397A (en) | 1989-11-27 | 1990-11-06 | Asher Reginald K | Non-cyanide electrode cleaning process |
US5061566A (en) | 1989-12-28 | 1991-10-29 | Chomerics, Inc. | Corrosion inhibiting emi/rfi shielding coating and method of its use |
US5037482A (en) | 1990-02-16 | 1991-08-06 | Macdermid, Incorporated | Composition and method for improving adhesion of coatings to copper surfaces |
US5186984A (en) | 1990-06-28 | 1993-02-16 | Monsanto Company | Silver coatings |
US5178909A (en) | 1990-07-24 | 1993-01-12 | Mitsui Kinzoku Kogyo Kabushiki Kaisha | Production of silver-coated copper-based powders |
JPH04110474A (en) | 1990-08-30 | 1992-04-10 | Meidensha Corp | Post-treatment of silver plating |
US5235139A (en) | 1990-09-12 | 1993-08-10 | Macdermid, Incorprated | Method for fabricating printed circuits |
US5160579A (en) | 1991-06-05 | 1992-11-03 | Macdermid, Incorporated | Process for manufacturing printed circuit employing selective provision of solderable coating |
US5196053A (en) | 1991-11-27 | 1993-03-23 | Mcgean-Rohco, Inc. | Complexing agent for displacement tin plating |
JPH05263258A (en) | 1991-11-27 | 1993-10-12 | Mcgean Rohco Inc | Complexing agent for displacement tin plating |
US5256275A (en) | 1992-04-15 | 1993-10-26 | Learonal, Inc. | Electroplated gold-copper-silver alloys |
US5277790A (en) | 1992-07-10 | 1994-01-11 | Technic Incorporated | Non-cyanide electroplating solution for gold or alloys thereof |
US5348590A (en) | 1992-08-31 | 1994-09-20 | Hitachi, Ltd. | Surface treating agent for copper or copper alloys |
US5733598A (en) | 1992-10-05 | 1998-03-31 | Matsushita Electric Industrial Co., Ltd. | Flexible wiring board and its fabrication method |
US5322553A (en) | 1993-02-22 | 1994-06-21 | Applied Electroless Concepts | Electroless silver plating composition |
US5725640A (en) | 1993-03-18 | 1998-03-10 | Atotech Usa, Inc. | Composition and process for treating a surface coated with a self-accelerating and replenishing non-formaldehyde immersion coating |
US5576053A (en) | 1993-05-11 | 1996-11-19 | Murata Manufacturing Co., Ltd. | Method for forming an electrode on an electronic part |
DE4316679C1 (en) | 1993-05-13 | 1994-07-28 | Atotech Deutschland Gmbh | Palladium surface-coating of copper, nickel and their alloys |
WO1994026954A1 (en) | 1993-05-13 | 1994-11-24 | Atotech Deutschland Gmbh | Palladium layers deposition process |
US5567357A (en) | 1993-08-25 | 1996-10-22 | Tatsuta Electric Wire & Cable Co., Ltd. | Conductive paint having good adhesion to molding of metallic oxide |
US5824631A (en) * | 1994-06-03 | 1998-10-20 | Wagenknecht; John H. | Compositions for dissolution of soft metals |
US5518760A (en) | 1994-10-14 | 1996-05-21 | Macdermid, Incorporated | Composition and method for selective plating |
US5468515A (en) | 1994-10-14 | 1995-11-21 | Macdermid, Incorporated | Composition and method for selective plating |
US5876517A (en) | 1994-12-07 | 1999-03-02 | Atotech Deutschland Gmbh | Chromate-plating bath and process for finishing zinc zinc alloy or cadmium surfaces |
US6395329B2 (en) | 1994-12-09 | 2002-05-28 | Soutar Andrew Mcintosh | Printed circuit board manufacture |
JPH08255968A (en) | 1994-12-09 | 1996-10-01 | Alpha Metals Ltd | Manufacturing of printed-circuit board |
WO1996017974A1 (en) * | 1994-12-09 | 1996-06-13 | Alpha Fry Limited | Silver plating |
WO1996017975A1 (en) * | 1994-12-09 | 1996-06-13 | Alpha Fry Limited | Printed circuit board manufacture |
US6860925B2 (en) | 1994-12-09 | 2005-03-01 | Enthone Incorporated | Printed circuit board manufacture |
US20020150692A1 (en) | 1994-12-09 | 2002-10-17 | Soutar Andrew Mcintosh | Printed circuit board manufacture |
US5955141A (en) | 1994-12-09 | 1999-09-21 | Alpha Metals, Inc. | Process for silver plating in printed circuit board manufacture |
US5935640A (en) | 1996-03-22 | 1999-08-10 | Macdermid, Incorporated | Method for enhancing the solderability of a surface |
US6200451B1 (en) | 1996-03-22 | 2001-03-13 | Macdermid, Incorporated | Method for enhancing the solderability of a surface |
US6444109B1 (en) | 1996-03-22 | 2002-09-03 | Ronald Redline | Method for enhancing the solderability of a surface |
US5733599A (en) | 1996-03-22 | 1998-03-31 | Macdermid, Incorporated | Method for enhancing the solderability of a surface |
US6544397B2 (en) | 1996-03-22 | 2003-04-08 | Ronald Redline | Method for enhancing the solderability of a surface |
EP0797380A1 (en) | 1996-03-22 | 1997-09-24 | Macdermid Incorporated | Method for enhancing the solderability of a surface |
US6905587B2 (en) | 1996-03-22 | 2005-06-14 | Ronald Redline | Method for enhancing the solderability of a surface |
US6331201B1 (en) | 1997-04-28 | 2001-12-18 | Fry's Metals, Inc. | Bismuth coating protection for copper |
US6235348B1 (en) * | 1998-05-13 | 2001-05-22 | Shin-Etsu Chemical Co., Ltd. | Rust prevention |
US6183545B1 (en) | 1998-07-14 | 2001-02-06 | Daiwa Fine Chemicals Co., Ltd. | Aqueous solutions for obtaining metals by reductive deposition |
US6319543B1 (en) | 1999-03-31 | 2001-11-20 | Alpha Metals, Inc. | Process for silver plating in printed circuit board manufacture |
US6375822B1 (en) | 2000-10-03 | 2002-04-23 | Lev Taytsas | Method for enhancing the solderability of a surface |
Non-Patent Citations (6)
Title |
---|
F. A. Lowenheim, Modern Electroplating, John Wiley & Sons, Inc., New York, 1974, pp. 36-38, 358-365. * |
Li et al., Tarnish Protection for Silver Electrodeposits, Plating and Surface Finishing, pp. 58-61, Feb. 1988. |
Philpott, An Economic Process for the Deposition of Thin Tarnish Resistant Coatings, Platinum Metals Rev., vol. 6, pp. 144-146, 1962. |
Russev et al., Immersion Silvering of Copper, Metal Finishing, pp. 27-30, Jan. 1983. |
Singh et al., Silver tarnishing and its prevention-A review, Anti-Corrosion, pp. 4-8, Jul. 1983. |
Singh et al., Silver tarnishing and its prevention—A review, Anti-Corrosion, pp. 4-8, Jul. 1983. |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10184189B2 (en) | 2016-07-18 | 2019-01-22 | ECSI Fibrotools, Inc. | Apparatus and method of contact electroplating of isolated structures |
US10480092B2 (en) | 2016-07-18 | 2019-11-19 | ECSI Fibrotools Inc. | Apparatus and method of contact electroplating of isolated structures |
Also Published As
Publication number | Publication date |
---|---|
US6905587B2 (en) | 2005-06-14 |
US20030118742A1 (en) | 2003-06-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
USRE45297E1 (en) | Method for enhancing the solderability of a surface | |
USRE45881E1 (en) | Method for enhancing the solderability of a surface | |
US6444109B1 (en) | Method for enhancing the solderability of a surface | |
JP3220784B2 (en) | Method for enhancing surface solderability | |
USRE45279E1 (en) | Process for silver plating in printed circuit board manufacture | |
US6395329B2 (en) | Printed circuit board manufacture | |
US6773757B1 (en) | Coating for silver plated circuits | |
US6375822B1 (en) | Method for enhancing the solderability of a surface | |
EP2182097A1 (en) | Metal surface treatment aqueous solution and method for inhibiting whiskers on a metal surface | |
US7267259B2 (en) | Method for enhancing the solderability of a surface | |
EP1029944B1 (en) | Method for enhancing the solderability of a surface | |
USRE45842E1 (en) | Method for enhancing the solderability of a surface | |
US7631798B1 (en) | Method for enhancing the solderability of a surface | |
US6090493A (en) | Bismuth coating protection for copper |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS SECOND Free format text: SECOND LIEN PATENT SECURITY AGREEMENT;ASSIGNOR:MACDERMID, INCORPORATED;REEL/FRAME:030834/0014 Effective date: 20130607 Owner name: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS FIRST Free format text: FIRST LIEN PATENT SECURITY AGREEMENT;ASSIGNOR:MACDERMID, INCORPORATED;REEL/FRAME:030833/0660 Effective date: 20130607 |
|
AS | Assignment |
Owner name: BARCLAYS BANK PLC, AS SUCCESSOR COLLATERAL AGENT, Free format text: ASSIGNMENT AND ASSUMPTION OF SECURITY INTERESTS AT REEL/FRAME NOS. 30831/0549, 30833/0660, 30831/0606, 30833/0700, AND 30833/0727;ASSIGNOR:CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS FIRST LIEN COLLATERAL AGENT;REEL/FRAME:031536/0778 Effective date: 20131031 Owner name: MACDERMID, INCORPORATED, CONNECTICUT Free format text: RELEASE OF SECURITY INTEREST IN PATENT COLLATERAL AT REEL/FRAME NO. 30834/0014;ASSIGNOR:CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS SECOND LIEN COLLATERAL AGENT;REEL/FRAME:031551/0319 Effective date: 20131031 |
|
FPAY | Fee payment |
Year of fee payment: 8 |
|
AS | Assignment |
Owner name: MACDERMID, INCORPORATED, GEORGIA Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:BARCLAYS BANK PLC, AS COLLATERAL AGENT;REEL/FRAME:048227/0676 Effective date: 20190131 |
|
AS | Assignment |
Owner name: BARCLAYS BANK PLC, AS COLLATERAL AGENT, NEW YORK Free format text: SECURITY INTEREST;ASSIGNOR:MACDERMID, INCORPORATED;REEL/FRAME:048262/0321 Effective date: 20190131 |
|
MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 12TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1553); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Year of fee payment: 12 |
|
AS | Assignment |
Owner name: CITIBANK, N.A., NEW YORK Free format text: ASSIGNMENT OF SECURITY INTEREST IN PATENT COLLATERAL;ASSIGNOR:BARCLAYS BANK PLC;REEL/FRAME:061956/0643 Effective date: 20221115 |