US2956863A - Apparatus for the manufacture of single crystals - Google Patents

Apparatus for the manufacture of single crystals Download PDF

Info

Publication number
US2956863A
US2956863A US689197A US68919757A US2956863A US 2956863 A US2956863 A US 2956863A US 689197 A US689197 A US 689197A US 68919757 A US68919757 A US 68919757A US 2956863 A US2956863 A US 2956863A
Authority
US
United States
Prior art keywords
vessel
crystal
rod
melt
interior
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US689197A
Inventor
Goorissen Jan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
US Philips Corp
North American Philips Co Inc
Original Assignee
US Philips Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by US Philips Corp filed Critical US Philips Corp
Application granted granted Critical
Publication of US2956863A publication Critical patent/US2956863A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • C30B15/12Double crucible methods
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1016Apparatus with means for treating single-crystal [e.g., heat treating]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032Seed pulling
    • Y10T117/1068Seed pulling including heating or cooling details [e.g., shield configuration]

Definitions

  • This invention relates to an apparatus for the manufacture of single crystals from a substance, for instance a semiconductor such as germanium or silicon, by drawmg a single crystal upwards from a melt of this substance in the form of a rod.
  • this rod may be divided into smaller bodies; for instance in the case of semiconductors these smaller bodies are used in semi-conductive devices such as transistors or crystal diodes.
  • Single crystals obtained by this known crystal-pulling technique have a high content of lattice defects, so called dislocations.
  • these dislocations are undesirable, since they seriously interfere with the physical properties, for example the conductivity, of a single crystal and may also adversely affect the further processing of a single crystal, for example diflusion or alloying.
  • zone leveling to maintain the grown monocrystal rod as a whole at a temperature only slightly lower than the melting temperature of the rod and, upon termination of the growing process, to cool the whole rod slowly and evenly.
  • the present invention has for its object to provide a simpler method and a device for carrying out this method, which constitutes an improvement upon the pulling method and yields good results without involving the aforesaid inconveniences.
  • said rod is at least partially drawn upwards inside i.e. along the axis, of a reflecting screen which is located above the melt and shaped as a truncated cone shell, the base of which faces the melt. Th angle subtended by the generatrix of the cone and the axis of the rod is advantageously made smaller than 60", preferably 10 to 30.
  • the screen is preferably made from a material having a high reflection-coelficient, for example molybdenum, nickel or tungsten. It may sometimes be advantageous to use a screen made from a material having a low reflection coefiicient, which satisfies other requirements imposed by the circumstances and the inner wall of which is furnished with a reflective layer.
  • the etch-pit density of the crosssectional area of a pulled-up monocrystal rod which density is a measure of the dislocation density of the rod, can be reduced to as low a value as one-tenth of that of a monocrystal rod made by means of the conventional pulling-method.
  • a graphite crucible 1 constains a germanium melt 2 and is heated by induced high-frequency current by means of a high frequency coil 3.
  • the upper edge of the crucible 1 carries a quartz ring 4 on which is rested a reflecting molybdenum screen 5 in the form of a truncated cone shell, the imaginary base '6 of which faces the melt 2.
  • the monocrystal rod 7 is partially pulled up inside and more particularly in axial sense of the reflecting screen.
  • the screen is approximately 8 centimetres high and the angle a subtended by the generatrix of the cone and the axis of the rod is approximately 20.
  • the highfrequency coil 3 also partially surrounds the reflecting screen 5 so that this screen contributes, by radiation, to the reflected radiation. It has been found that this expedient means another appreciable improvement.
  • the reflecting screen is provided with a number of holes 8 which permit inspection of the growing process inside the crucible.
  • the crucible is separated from the enw'ronment by means of
  • Crystal-pulling apparatus comprising a refractory vessel with a substantially open top for holding a quan tity of molten semi-conductive material, a hollow, truncated, conical, conductive reflecting member having open ends and mounted on and over the vessel with its wide end adjacent the vessel and with its inner reflecting surface exposed to the vessel interior, a coil surrounding the vessel for heating the vessel interior by means of high-frequency currents, and means for drawing a growing crystal upwards from the melt in the vessel and.

Description

1960 J- GOORlSS EN 2,956,863
APPARATUS FOR THE MANUFACTURE OF SINGLE CRYSTALS Filed Oct. 9. 1957 INVENTOR JAN GOORISSEN AGENT United States Patent APPARATUS FOR THE MANUFACTURE OF SINGLE CRYSTALS Jan Goorissen, Eindhoven, Netherlands, assignor to North American Philips Company, Inc., New York, N .Y., a corporation of Delaware Filed Oct. 9, '1957, Ser. No. 689,197 Claims priority, application Netherlands Nov. 28, 1956 2 Claims. (Cl. 23-473) This invention relates to an apparatus for the manufacture of single crystals from a substance, for instance a semiconductor such as germanium or silicon, by drawmg a single crystal upwards from a melt of this substance in the form of a rod. In a further production stage this rod may be divided into smaller bodies; for instance in the case of semiconductors these smaller bodies are used in semi-conductive devices such as transistors or crystal diodes.
Single crystals obtained by this known crystal-pulling technique have a high content of lattice defects, so called dislocations. In general these dislocations are undesirable, since they seriously interfere with the physical properties, for example the conductivity, of a single crystal and may also adversely affect the further processing of a single crystal, for example diflusion or alloying.
It has been pointed out that dislocations are occasioned by thermal stresses in the freshly grown monocrystal rod when being at a high temperature, which stresses are due to radiation at the surface and concomitant un even cooling over the cross-sectional area of the rod. In order to counteract radiation from the surface as much as possible it has been proposed, in the method termed zone leveling, to maintain the grown monocrystal rod as a whole at a temperature only slightly lower than the melting temperature of the rod and, upon termination of the growing process, to cool the whole rod slowly and evenly.
In practice, the use of this known expedient in crystalpulling is not well possible inter alia since in the crystalpulling process the rod is subjected to tensile stress and does not rest, as in zone-levelling, in an elongated horizontal boat during the growing process. Such a method further suffers from a limitation in that it takes considerable time due to the low temperature gradient at the surface of solidification, which involves a slow growth. Moreover, such a method merely amounts to shifting the diflieulty to a later phase, that is to say the phase in which the Whole rod has to be cooled slowly and uniformly in order to prevent thermal stresses and dislocations originating therefrom.
The present invention has for its object to provide a simpler method and a device for carrying out this method, which constitutes an improvement upon the pulling method and yields good results without involving the aforesaid inconveniences.
It is based on the recognition that the heat radiated at the surface of a freshly grown rod can be largely compensated by reflecting the thermal radiation from the surface of the melt, which is otherwise largely radiated to the environment, to the surface of the rod, thus using it to advantage.
According to the invention, said rod is at least partially drawn upwards inside i.e. along the axis, of a reflecting screen which is located above the melt and shaped as a truncated cone shell, the base of which faces the melt. Th angle subtended by the generatrix of the cone and the axis of the rod is advantageously made smaller than 60", preferably 10 to 30. The screen is preferably made from a material having a high reflection-coelficient, for example molybdenum, nickel or tungsten. It may sometimes be advantageous to use a screen made from a material having a low reflection coefiicient, which satisfies other requirements imposed by the circumstances and the inner wall of which is furnished with a reflective layer.
It has been found that when using the method according to the invention the etch-pit density of the crosssectional area of a pulled-up monocrystal rod, which density is a measure of the dislocation density of the rod, can be reduced to as low a value as one-tenth of that of a monocrystal rod made by means of the conventional pulling-method.
In order that the invention may be readily carried into effect, an example will now be described in detail with reference to the accompanying drawing, which represents schematically in cross-sectional view that part of the crystal pulling apparatus according to the invention, which is relevant thereto.
A graphite crucible 1 constains a germanium melt 2 and is heated by induced high-frequency current by means of a high frequency coil 3. The upper edge of the crucible 1 carries a quartz ring 4 on which is rested a reflecting molybdenum screen 5 in the form of a truncated cone shell, the imaginary base '6 of which faces the melt 2. The monocrystal rod 7 is partially pulled up inside and more particularly in axial sense of the reflecting screen. The screen is approximately 8 centimetres high and the angle a subtended by the generatrix of the cone and the axis of the rod is approximately 20. The highfrequency coil 3 also partially surrounds the reflecting screen 5 so that this screen contributes, by radiation, to the reflected radiation. It has been found that this expedient means another appreciable improvement. The reflecting screen is provided with a number of holes 8 which permit inspection of the growing process inside the crucible. The crucible is separated from the enw'ronment by means of a quartz tube 9.
What is claimed is:
1. Crystal-pulling apparatus comprising a refractory vessel with a substantially open top for holding a quan tity of molten semi-conductive material, a hollow, truncated, conical, conductive reflecting member having open ends and mounted on and over the vessel with its wide end adjacent the vessel and with its inner reflecting surface exposed to the vessel interior, a coil surrounding the vessel for heating the vessel interior by means of high-frequency currents, and means for drawing a growing crystal upwards from the melt in the vessel and.
through the interior of the reflecting member along its axis, whereby thermal radiation from the melt surface is reflected onto the grown crystal thereby compensating radiation losses from the crystal and thus improving its quality.
2. Apparatus as set forth in claim 1 wherein the coil also surrounds a lower portion of the reflecting member and generates additional heat therein by high-frequency currents, and the angle subtended by the cone axis and its generatrix is between 10 and 30.
References Cited in the file of this patent UNITED STATES PATENTS 2,291,083 Jung July 28, 1942 2,686,212 Horn Aug. 10, 1954 2,753,280 Moore July 3, 1956 2,809,136 Mortimer Oct. 8, 1957 2,839,436 Cornelison June 17, 1958

Claims (1)

1. CRYSTAL-PULLING APPARATUS COMPRISING A REFRACTORY VESSEL WITH A SUBSTANTIALLY OPEN TOP FOR HOLDING A QUANTITY OF MOLTEN SEMI-CONDUCTIVE MATERIAL, A HOLLOW, TRUNCATED, CONICAL, CONDUCTIVE REFLECTING MEMBER HAVING OPEN ENDS AND MOUNTED ON AND OVER THE VESSEL WITH ITS WIDE END ADJACENT THE VESSEL AND WITH ITS INNER REFLECTING SURFACE EXPOSED TO THE VESSEL INTERIOR, A COIL SURROUNDING THE VESSEL FOR HEATING THE VESSEL INTERIOR BY MEANS OF HIGH-FREQUENCY CURRENTS, AND MEANS FOR DRAWING A GROWING CRYSTAL UPWARDS FROM THE MELT IN THE VESSEL AND THORUGH THE INTERIOR OF THE REFLECTING MEMBER ALONG ITS AXIS, WHEREBY THERMAL RADIATION FROM THE MELT SURFACE IS REFLECTED ONTO THE GROWN CRYSTAL THEREBY COMPENSATING RADIATION LOSSES FROM THE CRYSTAL AND THUS IMPROVING ITS QUALITY.
US689197A 1956-11-28 1957-10-09 Apparatus for the manufacture of single crystals Expired - Lifetime US2956863A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL212548 1956-11-28

Publications (1)

Publication Number Publication Date
US2956863A true US2956863A (en) 1960-10-18

Family

ID=19750816

Family Applications (1)

Application Number Title Priority Date Filing Date
US689197A Expired - Lifetime US2956863A (en) 1956-11-28 1957-10-09 Apparatus for the manufacture of single crystals

Country Status (6)

Country Link
US (1) US2956863A (en)
CH (1) CH377786A (en)
DE (1) DE1051806B (en)
FR (1) FR1196958A (en)
GB (1) GB827466A (en)
NL (2) NL212548A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3097068A (en) * 1959-05-29 1963-07-09 Union Carbide Corp Crystallization of pure silicon platelets
US3212858A (en) * 1963-01-28 1965-10-19 Westinghouse Electric Corp Apparatus for producing crystalline semiconductor material
US3251655A (en) * 1963-09-27 1966-05-17 Westinghouse Electric Corp Apparatus for producing crystalline semiconductor material
US3258314A (en) * 1963-04-12 1966-06-28 Westinghouse Electric Corp Method for interior zone melting of a crystalline rod
US3261671A (en) * 1963-11-29 1966-07-19 Philips Corp Device for treating semi-conductor materials by melting
US3291571A (en) * 1963-12-23 1966-12-13 Gen Motors Corp Crystal growth
US3342559A (en) * 1964-04-27 1967-09-19 Westinghouse Electric Corp Apparatus for producing dendrites
US4116642A (en) * 1976-12-15 1978-09-26 Western Electric Company, Inc. Method and apparatus for avoiding undesirable deposits in crystal growing operations
US4330361A (en) * 1980-02-14 1982-05-18 Wacker-Chemitronic Gesellschaft Fur Elektronic-Grundstoffe Mbh Process for the manufacture of high-purity monocrystals
US4478676A (en) * 1982-09-07 1984-10-23 Litton Systems, Inc. Method for decreasing radial temperature gradients of crystal growth melts utilizing radiant energy absorptive materials and crystal growth chambers comprising such materials
US4957713A (en) * 1986-11-26 1990-09-18 Kravetsky Dmitry Y Apparatus for growing shaped single crystals
US4971650A (en) * 1989-09-22 1990-11-20 Westinghouse Electric Corp. Method of inhibiting dislocation generation in silicon dendritic webs

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1077187B (en) * 1958-11-13 1960-03-10 Werk Fuer Bauelemente Der Nach Process for the production of single crystals from semiconducting materials
US3058915A (en) * 1960-01-18 1962-10-16 Westinghouse Electric Corp Crystal growing process
DE1191789B (en) * 1960-10-25 1965-04-29 Siemens Ag Method for drawing preferably single-crystal semiconductor rods
DE1238450B (en) * 1964-06-04 1967-04-13 Consortium Elektrochem Ind Process for the production of stress-free and crack-free rods from high-purity boron from the melt
DE2928089C3 (en) * 1979-07-12 1982-03-04 Heraeus Quarzschmelze Gmbh, 6450 Hanau Composite crucibles for semiconductor technology purposes and processes for production

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2291083A (en) * 1942-07-28 Furnace construction
US2686212A (en) * 1953-08-03 1954-08-10 Gen Electric Electric heating apparatus
US2753280A (en) * 1952-05-01 1956-07-03 Rca Corp Method and apparatus for growing crystalline material
US2809136A (en) * 1954-03-10 1957-10-08 Sylvania Electric Prod Apparatus and method of preparing crystals of silicon germanium group
US2839436A (en) * 1955-04-19 1958-06-17 Texas Instruments Inc Method and apparatus for growing semiconductor crystals

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2291083A (en) * 1942-07-28 Furnace construction
US2753280A (en) * 1952-05-01 1956-07-03 Rca Corp Method and apparatus for growing crystalline material
US2686212A (en) * 1953-08-03 1954-08-10 Gen Electric Electric heating apparatus
US2809136A (en) * 1954-03-10 1957-10-08 Sylvania Electric Prod Apparatus and method of preparing crystals of silicon germanium group
US2839436A (en) * 1955-04-19 1958-06-17 Texas Instruments Inc Method and apparatus for growing semiconductor crystals

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3097068A (en) * 1959-05-29 1963-07-09 Union Carbide Corp Crystallization of pure silicon platelets
US3212858A (en) * 1963-01-28 1965-10-19 Westinghouse Electric Corp Apparatus for producing crystalline semiconductor material
US3258314A (en) * 1963-04-12 1966-06-28 Westinghouse Electric Corp Method for interior zone melting of a crystalline rod
US3251655A (en) * 1963-09-27 1966-05-17 Westinghouse Electric Corp Apparatus for producing crystalline semiconductor material
US3261671A (en) * 1963-11-29 1966-07-19 Philips Corp Device for treating semi-conductor materials by melting
US3291571A (en) * 1963-12-23 1966-12-13 Gen Motors Corp Crystal growth
US3342559A (en) * 1964-04-27 1967-09-19 Westinghouse Electric Corp Apparatus for producing dendrites
US4116642A (en) * 1976-12-15 1978-09-26 Western Electric Company, Inc. Method and apparatus for avoiding undesirable deposits in crystal growing operations
US4330361A (en) * 1980-02-14 1982-05-18 Wacker-Chemitronic Gesellschaft Fur Elektronic-Grundstoffe Mbh Process for the manufacture of high-purity monocrystals
US4478676A (en) * 1982-09-07 1984-10-23 Litton Systems, Inc. Method for decreasing radial temperature gradients of crystal growth melts utilizing radiant energy absorptive materials and crystal growth chambers comprising such materials
US4957713A (en) * 1986-11-26 1990-09-18 Kravetsky Dmitry Y Apparatus for growing shaped single crystals
US4971650A (en) * 1989-09-22 1990-11-20 Westinghouse Electric Corp. Method of inhibiting dislocation generation in silicon dendritic webs
AU633610B2 (en) * 1989-09-22 1993-02-04 Ebara Solar, Inc. Method of inhibiting dislocation generation in silicon dendritic webs

Also Published As

Publication number Publication date
DE1051806B (en) 1959-03-05
FR1196958A (en) 1959-11-27
GB827466A (en) 1960-02-03
CH377786A (en) 1964-05-31
NL212548A (en)
NL103477C (en)

Similar Documents

Publication Publication Date Title
US2956863A (en) Apparatus for the manufacture of single crystals
US3002824A (en) Method and apparatus for the manufacture of crystalline semiconductors
JP3634867B2 (en) Single crystal manufacturing apparatus and manufacturing method
EP0140509A1 (en) An lec method and apparatus for growing single crystal
US3798007A (en) Method and apparatus for producing large diameter monocrystals
KR100966182B1 (en) Method and apparatus for growing semiconductor crystals with a rigid support with carbon doping and resistivity control and thermal gradient control
US3173765A (en) Method of making crystalline silicon semiconductor material
US3551115A (en) Apparatus for growing single crystals
KR20180101586A (en) Manufacturing method of silicon single crystal
US20030172870A1 (en) Apparatus for growing monocrystalline group II-VI and III-V compounds
JPS63315589A (en) Single crystal production apparatus
US4619811A (en) Apparatus for growing GaAs single crystal by using floating zone
US11932961B2 (en) Assembly sleeve of single crystal pulling apparatus, and single crystal pulling apparatus
JP2006327879A (en) Method for manufacturing compound semiconductor single crystal
JP2574618B2 (en) Crystal growth method and crucible for crystal growth
US5477808A (en) Process for reducing the oxygen incorporation into a single crystal of silicon
JP2690419B2 (en) Single crystal growing method and apparatus
US3649210A (en) Apparatus for crucible-free zone-melting of crystalline materials
JP3018738B2 (en) Single crystal manufacturing equipment
JPS6021900A (en) Apparatus for preparing compound semiconductor single crystal
JPH01145391A (en) Device for pulling up single crystal
JPS6090897A (en) Method and apparatus for manufacturing compound semiconductor single crystal
JPH07172971A (en) Apparatus for pulling up semiconductor single crystal
JP2700145B2 (en) Method for manufacturing compound semiconductor single crystal
JPS6021899A (en) Apparatus for preparing compound semiconductor single crystal