US20250106944A1 - Multiple zone heated enclosure for optimized sublimation of solid-phase precursors - Google Patents

Multiple zone heated enclosure for optimized sublimation of solid-phase precursors Download PDF

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Publication number
US20250106944A1
US20250106944A1 US18/293,543 US202218293543A US2025106944A1 US 20250106944 A1 US20250106944 A1 US 20250106944A1 US 202218293543 A US202218293543 A US 202218293543A US 2025106944 A1 US2025106944 A1 US 2025106944A1
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United States
Prior art keywords
heated
heated zone
container
housing
enclosure according
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Pending
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US18/293,543
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English (en)
Inventor
Thomas W. Piltz
Mason Seidel
Robert Eschbach
Wade Hampton Bailey, III
David B. Ebeling
Syedah Yusra Fatima
David M. Rider
Shawn S. Cable
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Versum Materials US LLC
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Versum Materials US LLC
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Publication date
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Priority to US18/293,543 priority Critical patent/US20250106944A1/en
Assigned to VERSUM MATERIALS US, LLC reassignment VERSUM MATERIALS US, LLC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BAILEY, WADE HAMPTON, EBELING, DAVID B., PILTZ, THOMAS W., RIDER, DAVID M., CABLE, Shawn S., FATIMA, SYEDAH YUSRA, SEIDEL, MASON, ESCHBACH, ROBERT
Publication of US20250106944A1 publication Critical patent/US20250106944A1/en
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00—Details of electric heating devices
    • H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227—Applications
    • H05B1/023—Industrial applications
    • H05B1/0233—Industrial applications for semiconductors manufacturing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0011—Heating features

Definitions

  • the present disclosure relates generally to chemical delivery systems and, more particularly, to a chemical delivery system that uses heated enclosures that have been optimized for the sublimation of solid-phase semiconductor process materials and subsequent delivery of the resultant vapor.
  • Chemical delivery systems such as those commonly used in the manufacture of semiconductors, often require heating process materials in order to meet pressure and flow requirements of the equipment located downstream. In some cases, the heating is necessary to support and maintain a phase change from either a liquid to a vapor (vaporization) or from a solid to a vapor (sublimation). If a process material reverts back to its previous phase, the process delivery line will not sustain the required delivery conditions, resulting in process variation, yield loss, or even interruption to the process itself. This is particularly important when working with process materials that undergo sublimation. The phase change from vapor back to solid can result in the deposited material clogging the process line. Clogged lines can be very difficult and time-consuming to clear.
  • the temperature and pressure conditions along the entire process material delivery line must be carefully monitored and controlled. For most chemical delivery systems, this often means elevating the temperature of the source container by using mechanisms such as a resistive electrical or inductive heater.
  • the process lines interconnecting the source container and the downstream process tools are then heated using a heat trace attached directly to the piping and piping components in the process line.
  • the heat trace an electrical resistive heating wire, typically is wrapped around each pipe and pipe component for the purposes of providing heat to them. Over the wire, one or more layers of insulative tape is or are typically wrapped to prevent the heat from dissipating to the ambient environment. If a repair needs to be made to a pipe and pipe component, the heat trace must be unwrapped and removed. Although a heat trace is effective and reliable if not disturbed, upon removing it, the wire is often broken and must be replaced. The heat trace and the insulation layer installed over the heat trace require much labor and time to: install during the original manufacture, uninstall for repairs, and reinstall after performing a repair.
  • Chemical vapor deposition is a process in which a deposition surface (i.e., a substrate such as a silicon wafer) is contacted with vapors of volatile chemical compounds, generally at elevated temperatures.
  • the compounds, or CVD precursors are reduced or dissociated at the deposition surface, resulting in an adherent coating of a preselected composition, in a deposition chamber.
  • a precursor for use in a CVD process can be stored in gaseous, liquid, or solid form in a source container.
  • the use of a solid precursor is especially challenging in terms of sublimating and subsequently transporting the precursor vapor to the substrate.
  • Other more general concerns when designing a CVD system include a desire to minimize downtime of the system and the limited space available near the process tool that applies the precursor.
  • One or more of the top 8 , the bottom 9 , the side walls, the back interior wall 18 , and the door is or are provided with insulation to better retain heat within the oven 1 .
  • all of these components, which form the body of the housing, are insulated.
  • the insulation provided in the top 8 , the bottom 9 , the side walls, the back interior wall 18 , and the door may be, for example, commercial, household oven insulation about 2 inches (5 cm) thick.
  • the thickness of the insulation in the door may be thicker (e.g., about 2.75 inches or 7 cm) than the thickness of the insulation elsewhere. A more extensive description of suitable insulation is provided below.
  • the oven 1 has dual, independent heated zones with independent temperature controls and dedicated overtemperature protection.
  • the oven 1 has an upper heated zone 10 and a lower heated zone 11 .
  • independent is meant that the upper heated zone 10 can be controlled to have a temperature separate and apart from the controlled temperature in the lower heated zone 11 (and vice versa).
  • Temperature control is a process in which the change of temperature of a space (and objects collectively within that space) is measured or otherwise detected and the passage of heat energy into or out of the space is adjusted to achieve a desired temperature.
  • a temperature controller takes an input from a temperature sensor and has an output that is connected to a control element such as a heater or fan. The temperature controller compares the actual temperature to the desired control temperature, or setpoint, and provides an output to the control element.
  • the heater 12 may comprise a single, unitary element and the heater 14 may comprise more than one element (two elements are depicted).
  • the number of elements that comprise the heater 12 and the heater 14 can be selected to accommodate the heating needs of the upper heated zone 10 and the lower heated zone 11 for different applications.
  • the heater 12 is attached to the oven 1 within the upper heated zone 10 .
  • Conventional attachment mechanisms are suitable.
  • An example attachment mechanism is a mounting bracket 13 that is affixed permanently to one or more of the side interior walls 17 and the back interior wall 18 .
  • the heater 14 is attached to the oven 1 within the lower heated zone 11 using one or more mounting brackets 15 .
  • Portions of the heater 14 may be covered by a heat shield 27 that is constructed of a durable and thermally conductive material capable of withstanding temperatures in excess of 200° C., such as stainless steel.
  • the positioning of the heat shield 27 serves to delocalize the thermal impact of the heater 14 on the source or process container (not shown). By leaving portions of heater 14 uncovered by heat shield 27 , the temperature of surface of the source or process container in front of the uncovered heater 14 can be selectively increased by 20° C. or more.
  • the source or process container (not shown) is placed within the oven 1 , typically within the lower heated zone 11 given the weight of the container and position of other components such as piping.
  • the door is opened to provide access to the container and the container is removed from the oven 1 .
  • the same or a different container can be re-inserted or inserted, as the case may be, into the oven 1 and the door subsequently closed.
  • the container sits on a weighing scale 30 located within a scale chamber 40 proximate or near the bottom 9 of the oven 1 .
  • the scale 30 supports and measures the weight or mass of the container and, therefore, allows determination of the amount of product remaining in the container.
  • the scale 30 has an insulated scale platform 31 on which the container directly sits.
  • the scale platform 31 is preferably an integral part of the scale 30 .
  • the scale platform 31 is insulated and sized to accommodate almost the entire footprint of the oven 1 , the scale platform 31 substantially insulates the scale chamber 40 from the heated zones 10 , 11 located above the scale chamber 40 . Thus, the scale 30 is thermally protected.
  • the scale chamber 40 forms an antechamber or sump in the bottom of the oven 1 .
  • the scale chamber 40 is ventilated to protect personnel as well as to cool the scale 30 . Ventilation can be achieved by any suitable mechanism or mechanisms.
  • the scale chamber 40 has a plurality of ventilation inlets 41 (which may be louvers) located in the front of the scale chamber 40 (under the door) and one or more ventilation ports 42 located in the side wall or walls of the oven 1 .
  • a ventilation duct located in the portion of the back interior wall 18 that partially forms the scale chamber 40 .
  • a “portion” is a part of any whole, either separated from or integrated with it.
  • one or more of the ventilation inlets 41 , the ventilation ports 42 , and the ventilation duct allow leak detection. (Leaks from components located within the oven 1 , such as the container and connections to the container, are deposited in the bottom of the oven 1 which thereby serves to contain the leakage.)
  • Ventilation and air circulation are important not only in the scale chamber 40 but in the heated zones 10 , 11 . Proper ventilation and air circulation help to abate, and protect personnel from, hazardous vapor-phase process materials. Therefore, the oven 1 includes components that facilitate ventilation and air circulation in the scale chamber 40 located in the bottom of the oven 1 , in the heated zone 12 located in the top of the oven 1 , and in the heated zone 11 located between the scale chamber 40 and the heated zone 12 . The components that facilitate ventilation and air circulation in the scale chamber 40 are discussed above.
  • the scale platform 31 may have multiple elevation rails 28 constructed of a durable material such as stainless steel affixed to its top surface via welding or removable hardware such as screws.
  • the elevation rails 28 serve to minimize the contact area between the process or source container (not shown) and the scale platform 31 .
  • This application has the positive effect of reducing the thermal loss from the process or source container into the scale platform 31 . It also allows circulated air to contact the underside or the process or source container. This increases the rate of thermal transfer into the container during heating operations and increases the rate of thermal transfer out of the container during cooling operations.
  • a circulation fan 50 is provided.
  • the circulation fan 50 draws air from an inlet and directs air toward one or more outlets 51 .
  • the circulation fan 50 circulates airflow around the oven 1 for maximized convective heat transfer.
  • the circulation fan 50 may be ducted through the heater mounting brackets 15 to direct air downward toward the floor on which the oven 1 sits.
  • Access to the circulation fan 50 from the interior of the oven 1 is facilitated by an access panel 52 . Such access permits maintenance of the circulating fan 50 and allows the circulating fan 50 to be removed from the oven 1 through the front of the oven 1 when the door is open.
  • a raised exhaust inlet 60 extends upward from the top 8 proximate (adjacent as illustrated) to a fresh air inlet 61 .
  • the exhaust inlet 60 surrounds both an aperture 64 , which provides access to the interior of the oven 1 (i.e., to the upper heated zone 10 ), and a pressure relief flap valve 70 .
  • the pressure relief flap valve 70 provides overpressure protection by preventing the buildup of pressure within the oven 1 in case of a leak while heating is active.
  • a single exhaust blast gate 62 is provided to selectively and simultaneously cover both the fresh air inlet 61 and the aperture 64 .
  • the exhaust blast gate 62 covers the fresh air inlet 61 and the aperture 64 when the exhaust blast gate 62 is closed and leaves uncovered the fresh air inlet 61 and the aperture 64 when the exhaust blast gate 62 is in its open position (as illustrated in FIGS. 1 and 2 ).
  • a notch 65 in the exhaust blast gate 62 allows access to the pressure relief flap valve 70 even when the exhaust blast gate 62 is closed.
  • An exhaust blast gate actuator 63 allows for selective opening and closing of the exhaust blast gate 62 .
  • the exhaust blast gate actuator 63 is a pneumatic linear actuator with dual feeds.
  • the components that provide ventilation and fresh air to the upper heated zone 12 through the top 8 of the oven 1 permit control of the exhaust and fresh air within the oven 1 . Such control allows for minimization of thermal losses while heating is active as well as reducing the time required to cool the oven 1 down to ambient temperature for access or maintenance.
  • the portion of the back interior wall 18 that partially forms the scale chamber 40 , the portion of the back interior wall 18 that partially forms the lower heater zone 11 , or the portion of the back interior wall 18 that partially forms the upper heater zone 12 may be formed, in its entirely or in part, as a false wall. In alternative embodiments, two or all three of the portions could have false walls. It would also be possible, of course, to locate a false wall in one or both of the side walls.
  • a false wall facilitates the flow of fresh air and ventilation. By locating the circulation fan 50 close to the false wall portion of the back interior wall 18 , for example, the false wall fresh air inlet will help with cooldown times.
  • a false wall is an effective way to screen off an area from view. Because the primary purpose of a false wall is to obscure an area from view, the false wall does not need to be load-bearing and is simpler to construct than ordinary partition walls.
  • Access ports may be provided in various locations in the oven 1 .
  • an access port 75 can be located in the back interior wall 18 and in the upper heated zone 10 .
  • Such access ports accommodate process piping, thermocouples, and other external structures as well as providing increased circulation among different areas of the oven interior.
  • the access ports, and other components such as a reversible oven door, allowing the oven 1 to be installed in multiple configurations within a larger delivery system.
  • the access ports is an interconnecting passthrough 80 .
  • the interconnecting passthrough 80 is formed by a first opening in one side wall and a second opening (preferably at the same height as the first opening) in the second side wall opposite the first side wall.
  • the interconnecting passthrough 80 is located at about the center of the width of each side wall for structural support.
  • such a system would be configured with multiple ovens 1 connected by a common valve manifold heated enclosure (not shown).
  • This configuration allows for the individual container heated enclosures to be independently brought online and offline. The replacement of depleted source containers is completed at ambient temperature while the other container heated enclosures are kept at operating temperature, thus providing a continuous supply of process material.
  • the common valve manifold heated enclosure stays at operating temperature throughout, because any drop in temperature could result in undesired phase changes of the process material. It is common practice to keep the temperature of a downstream heated zone slightly higher than that of the previous heated zone. This minimizes the possibility of undesired phase change in the process material.
  • any void remaining in the inter-chamber piping passthrough between the heated enclosures is filled with a compressible insulator such as silicon rubber.
  • the insulator not only directs the heat towards any interconnecting piping, it also serves as a thermal barrier when the upstream heated enclosure is at ambient temperature such as during a source container changeout.
  • one or more layers of a thermal insulative material cover a majority of the surface area of the components used in the oven 1 .
  • the one or more layers of insulation can be attached with mechanical fasteners.
  • the step of attaching the one or more layers of insulation may be free of adhesives. Insulation when used in this document means thermal insulation, which may also include heat reflective materials if desired.
  • the one or more layers of insulation may comprise insulation board and/or insulation attached to a plastic cover and/or an insulated jacket made of flexible insulating material; and/or (b) is or are custom-fabricated to form-fit over the components and/or is or are shaped to provide a heated air volume towards the center of the component on which the insulation is mounted.
  • the one or more layers of insulation in any embodiment may be removably attached to a component using fasteners selected from bolts, screws, clamps, cable ties, magnets, adhesives, zippers, snaps, clasps, bungee cords, hook-and-eye, hook-and-loop (such as Velcro®) strips, or the like.
  • Velcro is the brand name of the first commercially marketed fabric hook-and-loop fastener sold by Velcro USA, Inc. of Manchester, New Hampshire. The fastener was invented by George de Mestral. See U.S. Pat. No. 3,009,235.
  • Hook-and-loop fasteners consist of two components: typically, two lineal fabric strips or tapes (alternately round dots or squares) which are attached (e.g., sewn, adhered, etc.) to the opposing surfaces to be fastened.
  • the first component features tiny hooks (e.g., the hook tape); the second features even smaller and “hairier” loops (e.g., the loop tape).
  • the hooks catch in the loops—and the two pieces fasten or bind temporarily.
  • the Velcro strips make a distinctive “ripping” sound.
  • the insulation may comprise one of more pieces of insulation board or foam.
  • the insulation may be rigid sheets, such as rigid foam or board, that are cut to cover at least the majority of the heat-conductive component. The insulation would also be cut or formed to allow the passage therethrough of the component as is known to a person of ordinary skill in the art.
  • the insulation board or foam may be formed or cut to form-fit at least some of the components. Additional layers of insulation may be added on top of one or more layers of insulation, at least a portion of the bottommost layer of insulation covering and/or contacting at least a portion of the heat-conductive component.
  • the insulation fabric, board, or foam may be made of polystyrene foam, urethane foam, fiberglass, ceramic wool, cellulose, cork, silicone rubber, perlite, vermiculite, or others known to the art.
  • This invention provides for faster manufacturing and repairs of ovens 1 and the systems using them.
  • a few fasteners typically mechanical fasteners, such as nuts, bolts, screws and/or others, and one or more layers of thermal insulation, a faulty fan for example, or other faulty component, is easily accessed, repaired, and then the one or more layers of thermal insulation are reinstalled using the one or more fasteners and the oven 1 is ready for reuse after the necessary purge steps, if any.
  • the oven 1 also allows for the maximization of the uptime of all of the tools in a manufacturing facility supplied with the necessary gases and chemicals for manufacture from systems having the oven 1 as part of the system, and increased uptime of the systems having the oven 1 .
  • the oven 1 also minimizes the space required for supplying precursor materials, thereby allowing for increasing the numbers of other components (pipes, valves, manifolds, supply containers, and the like) in the same footprint.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Furnace Details (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Drying Of Solid Materials (AREA)
US18/293,543 2021-07-30 2022-07-26 Multiple zone heated enclosure for optimized sublimation of solid-phase precursors Pending US20250106944A1 (en)

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US202163227842P 2021-07-30 2021-07-30
PCT/US2022/074140 WO2023010001A1 (en) 2021-07-30 2022-07-26 Multiple zone heated enclosure for optimized sublimation of solid-phase precursors
US18/293,543 US20250106944A1 (en) 2021-07-30 2022-07-26 Multiple zone heated enclosure for optimized sublimation of solid-phase precursors

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EP (1) EP4359585B1 (enExample)
JP (1) JP2024529516A (enExample)
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CN (1) CN117940601A (enExample)
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