JP2024529516A - 固相前駆体の最適化された昇華用の多重領域加熱エンクロージャー - Google Patents

固相前駆体の最適化された昇華用の多重領域加熱エンクロージャー Download PDF

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Publication number
JP2024529516A
JP2024529516A JP2024505584A JP2024505584A JP2024529516A JP 2024529516 A JP2024529516 A JP 2024529516A JP 2024505584 A JP2024505584 A JP 2024505584A JP 2024505584 A JP2024505584 A JP 2024505584A JP 2024529516 A JP2024529516 A JP 2024529516A
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JP
Japan
Prior art keywords
enclosure
heating
heating zone
oven
scale
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2024505584A
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English (en)
Japanese (ja)
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JP2024529516A5 (enExample
Inventor
ダブリュ．ピルツ トーマス
シーデル メイスン
エシュバッチ ロバート
ハンプトン ベイリー ウェイド
ビー．イブリング デイビッド
ユスラ ファティマ サイダー
エム．ライダー デイビッド
エス．ケイブル ショーン
Original Assignee
バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー
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Publication of JP2024529516A publication Critical patent/JP2024529516A/ja
Publication of JP2024529516A5 publication Critical patent/JP2024529516A5/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00—Details of electric heating devices
    • H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227—Applications
    • H05B1/023—Industrial applications
    • H05B1/0233—Industrial applications for semiconductors manufacturing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0011—Heating features

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Furnace Details (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Drying Of Solid Materials (AREA)
JP2024505584A 2021-07-30 2022-07-26 固相前駆体の最適化された昇華用の多重領域加熱エンクロージャー Pending JP2024529516A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163227842P 2021-07-30 2021-07-30
US63/227,842 2021-07-30
PCT/US2022/074140 WO2023010001A1 (en) 2021-07-30 2022-07-26 Multiple zone heated enclosure for optimized sublimation of solid-phase precursors

Publications (2)

Publication Number Publication Date
JP2024529516A true JP2024529516A (ja) 2024-08-06
JP2024529516A5 JP2024529516A5 (enExample) 2025-05-23

Family

ID=85088119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024505584A Pending JP2024529516A (ja) 2021-07-30 2022-07-26 固相前駆体の最適化された昇華用の多重領域加熱エンクロージャー

Country Status (8)

Country Link
US (1) US20250106944A1 (enExample)
EP (1) EP4359585B1 (enExample)
JP (1) JP2024529516A (enExample)
KR (1) KR20240033157A (enExample)
CN (1) CN117940601A (enExample)
IL (1) IL310458A (enExample)
TW (1) TWI809995B (enExample)
WO (1) WO2023010001A1 (enExample)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3009235A (en) 1957-10-02 1961-11-21 Internat Velcro Company Separable fastening device
KR100199008B1 (ko) * 1996-12-06 1999-06-15 정선종 화학기상증착형 원자층 에피택시 장치 및 화학기상증착 장치의 액체소스 증기 공급장치
US6451692B1 (en) 2000-08-18 2002-09-17 Micron Technology, Inc. Preheating of chemical vapor deposition precursors
US8545629B2 (en) * 2001-12-24 2013-10-01 Crystal Is, Inc. Method and apparatus for producing large, single-crystals of aluminum nitride
US6953047B2 (en) 2002-01-14 2005-10-11 Air Products And Chemicals, Inc. Cabinet for chemical delivery with solvent purging
US8865271B2 (en) * 2003-06-06 2014-10-21 Neophotonics Corporation High rate deposition for the formation of high quality optical coatings
US6909839B2 (en) 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
KR101615913B1 (ko) * 2014-11-12 2016-05-13 에스엔유 프리시젼 주식회사 박막증착장치
KR20170126536A (ko) 2016-05-09 2017-11-20 삼성디스플레이 주식회사 증착 장치
JP6409021B2 (ja) 2016-05-20 2018-10-17 日本エア・リキード株式会社 昇華ガス供給システムおよび昇華ガス供給方法
US11421320B2 (en) 2017-12-07 2022-08-23 Entegris, Inc. Chemical delivery system and method of operating the chemical delivery system
US11021793B2 (en) 2018-05-31 2021-06-01 L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films
CN109269562A (zh) * 2018-10-11 2019-01-25 中核新能核工业工程有限责任公司 一种铀浓缩厂供料用加热蒸发装置
KR102221960B1 (ko) * 2019-03-25 2021-03-04 엘지전자 주식회사 증착 장치
KR102909679B1 (ko) * 2020-01-17 2026-01-08 삼성전자주식회사 조리기기

Also Published As

Publication number Publication date
EP4359585B1 (en) 2025-07-02
KR20240033157A (ko) 2024-03-12
US20250106944A1 (en) 2025-03-27
CN117940601A (zh) 2024-04-26
IL310458A (en) 2024-03-01
EP4359585A4 (en) 2024-06-19
EP4359585A1 (en) 2024-05-01
TWI809995B (zh) 2023-07-21
TW202305171A (zh) 2023-02-01
WO2023010001A1 (en) 2023-02-02

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