TWI809995B - 用於最佳化昇華固相前驅物的多區加熱的包圍體 - Google Patents
用於最佳化昇華固相前驅物的多區加熱的包圍體 Download PDFInfo
- Publication number
- TWI809995B TWI809995B TW111128280A TW111128280A TWI809995B TW I809995 B TWI809995 B TW I809995B TW 111128280 A TW111128280 A TW 111128280A TW 111128280 A TW111128280 A TW 111128280A TW I809995 B TWI809995 B TW I809995B
- Authority
- TW
- Taiwan
- Prior art keywords
- heating zone
- heated enclosure
- heated
- container
- scale
- Prior art date
Links
- 239000007790 solid phase Substances 0.000 title claims abstract description 12
- 238000000859 sublimation Methods 0.000 title claims abstract description 12
- 230000008022 sublimation Effects 0.000 title claims abstract description 12
- 239000002243 precursor Substances 0.000 title description 13
- 238000000034 method Methods 0.000 claims abstract description 76
- 230000008569 process Effects 0.000 claims abstract description 63
- 239000000463 material Substances 0.000 claims abstract description 30
- 239000004065 semiconductor Substances 0.000 claims abstract description 16
- 238000012546 transfer Methods 0.000 claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims description 80
- 239000000126 substance Substances 0.000 claims description 22
- 238000009423 ventilation Methods 0.000 claims description 19
- 239000011810 insulating material Substances 0.000 claims description 17
- 238000005192 partition Methods 0.000 claims description 12
- 239000012530 fluid Substances 0.000 claims description 8
- 230000007246 mechanism Effects 0.000 claims description 8
- 238000004891 communication Methods 0.000 claims description 3
- 238000013021 overheating Methods 0.000 claims description 3
- 230000001737 promoting effect Effects 0.000 claims description 3
- 239000012774 insulation material Substances 0.000 abstract description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000007789 gas Substances 0.000 description 9
- 238000009413 insulation Methods 0.000 description 9
- 239000012071 phase Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 6
- 239000000700 radioactive tracer Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 239000006260 foam Substances 0.000 description 5
- 230000008439 repair process Effects 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000005303 weighing Methods 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000007799 cork Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000011143 downstream manufacturing Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 239000006072 paste Substances 0.000 description 1
- 239000010451 perlite Substances 0.000 description 1
- 235000019362 perlite Nutrition 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920006327 polystyrene foam Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0227—Applications
- H05B1/023—Industrial applications
- H05B1/0233—Industrial applications for semiconductors manufacturing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/0011—Heating features
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Vapour Deposition (AREA)
- Devices For Use In Laboratory Experiments (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
- Furnace Details (AREA)
- Treatment Of Fiber Materials (AREA)
- Drying Of Solid Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163227842P | 2021-07-30 | 2021-07-30 | |
| US63/227,842 | 2021-07-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202305171A TW202305171A (zh) | 2023-02-01 |
| TWI809995B true TWI809995B (zh) | 2023-07-21 |
Family
ID=85088119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111128280A TWI809995B (zh) | 2021-07-30 | 2022-07-28 | 用於最佳化昇華固相前驅物的多區加熱的包圍體 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20250106944A1 (enExample) |
| EP (1) | EP4359585B1 (enExample) |
| JP (1) | JP2024529516A (enExample) |
| KR (1) | KR20240033157A (enExample) |
| CN (1) | CN117940601A (enExample) |
| IL (1) | IL310458A (enExample) |
| TW (1) | TWI809995B (enExample) |
| WO (1) | WO2023010001A1 (enExample) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109269562A (zh) * | 2018-10-11 | 2019-01-25 | 中核新能核工业工程有限责任公司 | 一种铀浓缩厂供料用加热蒸发装置 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3009235A (en) | 1957-10-02 | 1961-11-21 | Internat Velcro Company | Separable fastening device |
| KR100199008B1 (ko) * | 1996-12-06 | 1999-06-15 | 정선종 | 화학기상증착형 원자층 에피택시 장치 및 화학기상증착 장치의 액체소스 증기 공급장치 |
| US6451692B1 (en) | 2000-08-18 | 2002-09-17 | Micron Technology, Inc. | Preheating of chemical vapor deposition precursors |
| US8545629B2 (en) * | 2001-12-24 | 2013-10-01 | Crystal Is, Inc. | Method and apparatus for producing large, single-crystals of aluminum nitride |
| US6953047B2 (en) | 2002-01-14 | 2005-10-11 | Air Products And Chemicals, Inc. | Cabinet for chemical delivery with solvent purging |
| US8865271B2 (en) * | 2003-06-06 | 2014-10-21 | Neophotonics Corporation | High rate deposition for the formation of high quality optical coatings |
| US6909839B2 (en) | 2003-07-23 | 2005-06-21 | Advanced Technology Materials, Inc. | Delivery systems for efficient vaporization of precursor source material |
| KR101615913B1 (ko) * | 2014-11-12 | 2016-05-13 | 에스엔유 프리시젼 주식회사 | 박막증착장치 |
| KR20170126536A (ko) | 2016-05-09 | 2017-11-20 | 삼성디스플레이 주식회사 | 증착 장치 |
| JP6409021B2 (ja) | 2016-05-20 | 2018-10-17 | 日本エア・リキード株式会社 | 昇華ガス供給システムおよび昇華ガス供給方法 |
| US11421320B2 (en) | 2017-12-07 | 2022-08-23 | Entegris, Inc. | Chemical delivery system and method of operating the chemical delivery system |
| US11021793B2 (en) | 2018-05-31 | 2021-06-01 | L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude | Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films |
| KR102221960B1 (ko) * | 2019-03-25 | 2021-03-04 | 엘지전자 주식회사 | 증착 장치 |
| KR102909679B1 (ko) * | 2020-01-17 | 2026-01-08 | 삼성전자주식회사 | 조리기기 |
-
2022
- 2022-07-26 KR KR1020247006920A patent/KR20240033157A/ko active Pending
- 2022-07-26 IL IL310458A patent/IL310458A/en unknown
- 2022-07-26 US US18/293,543 patent/US20250106944A1/en active Pending
- 2022-07-26 EP EP22850471.8A patent/EP4359585B1/en active Active
- 2022-07-26 WO PCT/US2022/074140 patent/WO2023010001A1/en not_active Ceased
- 2022-07-26 CN CN202280061458.0A patent/CN117940601A/zh active Pending
- 2022-07-26 JP JP2024505584A patent/JP2024529516A/ja active Pending
- 2022-07-28 TW TW111128280A patent/TWI809995B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109269562A (zh) * | 2018-10-11 | 2019-01-25 | 中核新能核工业工程有限责任公司 | 一种铀浓缩厂供料用加热蒸发装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP4359585B1 (en) | 2025-07-02 |
| KR20240033157A (ko) | 2024-03-12 |
| US20250106944A1 (en) | 2025-03-27 |
| CN117940601A (zh) | 2024-04-26 |
| JP2024529516A (ja) | 2024-08-06 |
| IL310458A (en) | 2024-03-01 |
| EP4359585A4 (en) | 2024-06-19 |
| EP4359585A1 (en) | 2024-05-01 |
| TW202305171A (zh) | 2023-02-01 |
| WO2023010001A1 (en) | 2023-02-02 |
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