US20110187878A1 - Synchronization of projected illumination with rolling shutter of image sensor - Google Patents
Synchronization of projected illumination with rolling shutter of image sensor Download PDFInfo
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- US20110187878A1 US20110187878A1 US12/762,373 US76237310A US2011187878A1 US 20110187878 A1 US20110187878 A1 US 20110187878A1 US 76237310 A US76237310 A US 76237310A US 2011187878 A1 US2011187878 A1 US 2011187878A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/023—Mount members, e.g. sub-mount members
- H01S5/02315—Support members, e.g. bases or carriers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2006—Lamp housings characterised by the light source
- G03B21/2033—LED or laser light sources
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N13/00—Stereoscopic video systems; Multi-view video systems; Details thereof
- H04N13/20—Image signal generators
- H04N13/204—Image signal generators using stereoscopic image cameras
- H04N13/207—Image signal generators using stereoscopic image cameras using a single two-dimensional [2D] image sensor
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- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
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- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
- G02B19/0057—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode in the form of a laser diode array, e.g. laser diode bar
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0977—Reflective elements
- G02B27/0983—Reflective elements being curved
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B15/00—Special procedures for taking photographs; Apparatus therefor
- G03B15/02—Illuminating scene
- G03B15/06—Special arrangements of screening, diffusing, or reflecting devices, e.g. in studio
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0225—Out-coupling of light
- H01S5/02255—Out-coupling of light using beam deflecting elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
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- G—PHYSICS
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0972—Prisms
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
- H01S5/0071—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping for beam steering, e.g. using a mirror outside the cavity to change the beam direction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0225—Out-coupling of light
- H01S5/02253—Out-coupling of light using lenses
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0225—Out-coupling of light
- H01S5/02257—Out-coupling of light using windows, e.g. specially adapted for back-reflecting light to a detector inside the housing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/023—Mount members, e.g. sub-mount members
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
- H01S5/423—Arrays of surface emitting lasers having a vertical cavity
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
- H10H20/856—Reflecting means
Definitions
- the present invention relates generally to systems and methods for electronic imaging, and specifically to methods of illumination for enhancing the quality of captured images.
- CMOS image sensors use a rolling shutter, in which successive rows of sensor elements are triggered sequentially to capture light. This method of image acquisition thus records each individual frame not as a single snapshot at a point in time, but rather as a sequence of image stripes scanning across the frame.
- the result of the rolling shutter is that not all parts of the optical image are recorded at exactly the same time (although the frame is stored as a single electronic image).
- imaging apparatus including an illumination assembly, including a plurality of radiation sources and projection optics, which are configured to project radiation from the radiation sources onto different, respective regions of a scene.
- An imaging assembly includes an image sensor and objective optics configured to form an optical image of the scene on the image sensor, which includes an array of sensor elements arranged in multiple groups, which are triggered by a rolling shutter to capture the radiation from the scene in successive, respective exposure periods from different, respective areas of the scene so as to form an electronic image of the scene.
- a controller is coupled to actuate the radiation sources sequentially in a pulsed mode so that the illumination assembly illuminates the different, respective areas of the scene in synchronization with the rolling shutter.
- each group includes one or more rows of the sensor elements, and the regions define stripes that extend across the scene in a direction parallel to the rows.
- each stripe illuminates a respective region that contains the areas of the scene from which the sensor elements in a respective set of multiple rows capture the radiation, and the controller is configured to actuate the radiation sources so that the projected radiation sweeps across the scene in a direction perpendicular to the rows.
- the rolling shutter defines a frame time for capturing the entire electronic image
- the controller is configured to actuate each of the radiation sources for a respective actuation period that is less than half the frame time.
- the controller may actuate each of the radiation sources so that the illumination assembly illuminates each area of the scene only during a respective exposure period of a corresponding group of the sensor elements that captures the radiation from the area.
- the projection optics include a patterning element, which is configured so that the radiation is projected onto the scene in a predefined pattern, which is detectable in the electronic image formed by the imaging assembly.
- the controller is configured to analyze the pattern in the electronic image so as to generate a depth map of the scene.
- the radiation sources include a matrix of light-emitting elements, which are arranged on a substrate and are configured to emit the radiation in a direction perpendicular to the substrate.
- a method for imaging including arranging a plurality of radiation sources to project radiation onto different, respective regions of the scene.
- An image sensor which includes an array of sensor elements arranged in multiple groups, is configured to receive an optical image of the scene, in which the groups of the sensor elements receive the radiation from different, respective areas of the scene.
- the groups of the sensor elements are triggered with a rolling shutter to capture the radiation from the scene in successive, respective exposure periods so as to form an electronic image of the scene.
- the radiation sources are actuated sequentially in a pulsed mode so as to illuminate the different, respective areas of the scene in synchronization with the rolling shutter.
- configuring the image sensor includes arranging multiple image sensors, having respective rolling shutters, together with multiple, respective pluralities of the radiation sources to form respective electronic images of different, respective, overlapping parts of a scene, and actuating the radiation sources includes synchronizing the respective pluralities of the radiation sources over the multiple image sensors so as to control an overlap of the respective areas of the scene illuminated by the radiation sources at any given time.
- the method may include analyzing the pattern over the electronic images formed by the multiple image sensors in order to generate a depth map of the scene.
- imaging apparatus including multiple imaging units.
- the imaging units include respective pluralities of radiation sources and projection optics, which are configured to project radiation from the radiation sources onto different, respective regions of a scene, and respective imaging assemblies.
- the imaging assemblies include respective image sensors and objective optics configured to form respective optical images of different, respective, overlapping parts of the scene on the respective image sensors.
- Each image sensor includes an array of sensor elements arranged in multiple groups, which are triggered by a rolling shutter to capture the radiation from the scene in successive, respective exposure periods from different, respective areas of the scene so as to form respective electronic images of the scene.
- the radiation sources are actuated sequentially in a pulsed mode so that the illumination assembly illuminates the different, respective areas of the scene in synchronization with the rolling shutter, while synchronizing the respective pluralities of the radiation sources over the multiple image sensors so as to control an overlap of the respective areas of the scene illuminated by the radiation sources at any given time.
- the overlap is controlled so that the respective areas of the scene illuminated by the radiation sources at any given time are non-overlapping.
- FIG. 1 is a schematic side view of an imaging system, in accordance with an embodiment of the present invention.
- FIG. 2 is a schematic representation of a portion of an image frame captured using stripe illumination, in accordance with an embodiment of the present invention
- FIG. 3 is a timing diagram showing synchronization of stripe illumination with rolling shutter operation, in accordance with an embodiment of the present invention
- FIG. 4A is a schematic side view of a projection module, in accordance with an embodiment of the present invention.
- FIGS. 5A and 5B are schematic side and top views, respectively, of an optoelectronic subassembly, in accordance with another embodiment of the present invention.
- FIG. 6 is a schematic side view of an illumination assembly, in accordance with an alternative embodiment of the present invention.
- FIG. 7 is a schematic representation of a portion of an image frame illuminated by the illumination assembly of FIG. 6 ;
- FIG. 8 is a schematic side view of an imaging system, in accordance with another embodiment of the present invention.
- FIG. 9 is a schematic pictorial view of an imaging system, in accordance with yet another embodiment of the present invention.
- imaging systems include optical projectors for illuminating the scene of interest.
- a projector may be used to cast a pattern of coded or structured light onto an object for purposes of three-dimensional (3D) depth mapping.
- 3D three-dimensional
- U.S. Patent Application Publication 2008/0240502 whose disclosure is incorporated herein by reference, describes an illumination assembly in which a light source, such as a laser diode or LED, transilluminates a transparency with optical radiation so as to project a pattern onto the object.
- the rolling shutter is operated so as to cause different groups (typically successive rows) of sensor elements in the image sensor to capture radiation in different, successive exposure periods, which are much shorter than the total frame period (typically less than half, and possibly less than 10%).
- Each such group collects radiation from a different, respective area of the scene, which is focused onto the image sensor by objective optics.
- the illumination assembly is controlled so as to sweep the projected radiation over those areas of the scene in synchronization with the rolling shutter, so that each area of the scene is illuminated during the specific time that the corresponding group of sensor elements is active.
- the output power of the illumination assembly is concentrated, in each area of the scene, in the specific exposure periods during which the corresponding sensor elements are able to collect radiation from that area.
- Limitation of the exposure periods by the rolling shutter reduces the total amount of ambient radiation that is collected, without wasting any of the projected radiation. Therefore, the signal/background ratio of the system is enhanced substantially even without increasing the average power of the illumination.
- the principles of the present invention may similarly be applied to enhance the performance of other projection-based imaging systems.
- the rolling shutter in these embodiments is assumed to activate the sensor elements in the image sensor row by row, as in conventional CMOS image sensors that are known in the art; but the principles of the present invention may similarly be applied in conjunction with image sensors that use other sorts of sequential activation of groups of sensor elements, such as block-by-block activation.
- Imaging assembly 28 comprises objective optics 36 , which form an optical image of the scene containing object 26 on an image sensor 38 , such as a CMOS integrated circuit image sensor.
- the image sensor comprises an array of sensor elements 40 , arranged in multiple rows.
- the sensor elements generate respective signals in response to the radiation focused onto them by optics 36 , wherein the pixel value of each pixel in the electronic images output by image sensor 38 corresponds to the signal from a respective sensor element 40 .
- the sensor elements are activated and deactivated, row by row, by a rolling shutter, whose timing is set by controller 31 . This sort of rolling shutter operation is a standard feature of many CMOS image sensors.
- Illumination assembly 22 comprises a projection module 32 , which generates a beam of patterned light, and projection optics 34 , which project the beam onto field 24 .
- Module 32 typically comprises multiple radiation sources, along with optics for pattern generation.
- Controller 31 actuates the radiation sources sequentially, in a pulsed mode, in synchronization with the rolling shutter of image sensor 38 .
- the design of module 32 and the synchronization of its operation with the rolling shutter are described in detail hereinbelow.
- FIG. 2 is a schematic representation of a portion of an image frame 42 captured by system 20 , in accordance with an embodiment of the present invention.
- Frame 42 comprises a matrix of pixels 44 , each corresponding to the signal generated by a corresponding sensor element 40 in image sensor 38 .
- each row of pixels 44 corresponds to the area in the scene from which radiation is captured by the corresponding row of sensor elements.
- Illumination assembly 22 generates multiple stripes 46 , 48 , 50 , 52 , . . . of illumination.
- Each such stripe is generated by a respective radiation source or group of radiation sources.
- the region defined by each stripe covers the area of a number of the rows of pixels 44 .
- each stripe illuminates a certain area of the scene from which the image sensors in the corresponding rows capture radiation.
- stripes 46 , 48 , 50 , 52 are shown in FIG. 2 , for the sake of simplicity, as being precisely adjacent to one another and non-overlapping, in practical systems there is generally a certain amount of overlap between the stripes in order to ensure that all areas of the scene are illuminated.
- Traces 62 , 64 , . . . correspond to actuation of the respective radiation sources that generate stripes 46 , 48 , . . . .
- the radiation source that generates stripe 46 is actuated, and so on.
- the actuation period of the corresponding radiation source is set so as to fall entirely within the exposure periods of all the rows in the group.
- the illumination assembly illuminates each area of the scene only during the exposure periods of the sensor elements that capture the radiation from the area, and none of the illumination is wasted.
- the actuation period of each illumination stripe is approximately 1/(N*FR), while the exposure period of each row of sensor elements 40 is approximately 2/(N*FR), wherein FR is the frame rate, such as 30 frames/sec.
- timing relations may be used between the frame rate, actuation periods and exposure times. These alternative timing arrangements may be advantageous in situations in which the geometrical relationships between illumination stripes and sensor rows are not maintained as precisely as in FIG. 2 , and particularly when successive stripes partially overlap.
- the reflector may be integrally formed in substrate 72 , as shown in FIG. 4A , or it may alternatively comprise a separate element, which is positioned on the substrate and aligned with optoelectronic elements 70 .
- Reflector 74 may simply comprise a flat reflecting surface, or it may alternatively comprise one or more curved surfaces or multiple flat surfaces in order to spread or focus the radiation, as illustrated in FIG. 4B , as well as FIG. 5C .
- Each of optoelectronic elements 70 emits radiation that forms a respective stripe 80 , 82 , 84 , . . . , as shown in FIG. 4B .
- Reflector 74 may be slightly curved, as shown in the figure, so that the stripes spread over a wider area and overlap the adjacent stripes at their edges.
- controller 31 FIG. 1
- each region of the scene is illuminated during the exposure periods of the corresponding rows of sensor elements 40 .
- each stripe 80 , 82 , 84 , . . . passes through a different, respective region of the transparency, and thus creates a respective part of the overall illumination pattern corresponding to the pattern embedded in the transparency.
- Projection optics 34 projects this pattern onto the object.
- either lens 76 or one of elements 78 is typically configured to create an appropriate “carrier” angle for the beam emitted by each of the optoelectronic elements.
- the beams emitted by the different optoelectronic elements use different parts of lens 76 , which may therefore be designed so that the collimated beams exit at respective angles corresponding to the desired vertical fan-out.
- the illumination module may comprise some other type of optics, such as a blazed grating with as many different zones as there are optoelectronic elements.
- illumination module 32 Further details of the fabrication of illumination module 32 , as well as other, similar sorts of modules, are described in the above-mentioned U.S. Provisional Patent Application 61/300,465.
- FIGS. 5A and 5B are schematic side and top views, respectively, of an optoelectronic subassembly 90
- FIG. 5C is a schematic pictorial view of a prism 92 used in subassembly 90 , in accordance with another embodiment of the present invention.
- Subassembly 90 may be used in place of the corresponding components in module 32 .
- Optoelectronic subassembly 90 comprises a row of edge-emitting optoelectronic elements 70 , such as laser diodes, which may be fabricated on a suitable substrate as in the preceding embodiment.
- the radiation emitted by elements 70 is reflected internally from an interior surface 94 (typically with a suitable reflective coating) of prism 92 .
- the radiation from elements 70 enters prism 92 via a curved entry surface 96 .
- Controller 31 actuates elements 70 to emit radiation sequentially during each image frame in synchronization with the rolling shutter of image sensor 38
- elements 110 comprise surface-emitting devices, such as light-emitting diodes (LEDs) or vertical-cavity surface-emitting laser (VCSEL) diodes, which emit radiation directly into the Z-direction.
- An array of microlenses (or other suitable micro-optics, such as total internal reflection-based micro-structures) 112 is aligned with elements 110 , so that a respective microlens collects the radiation from each element and directs it into an optical module 104 .
- the optical module comprises, inter alia, a suitable patterning element 106 , as described above, and a projection lens 108 , which projects the resulting pattern onto the scene.
- FIG. 7 is a schematic representation of a portion of an image frame illuminated by assembly 100 , in accordance with an embodiment of the present invention.
- Each microlens 112 spreads the radiation from the corresponding optoelectronic element 110 over a region of the scene that corresponds to a group of pixels 44 .
- Elements 110 are arranged in multiple rows 114 , 116 , . . . .
- controller 31 actuates all the optoelectronic elements in each row in turn in synchronization with the rolling shutter of image sensor 38 , in accordance with the scheme shown in FIG. 3 , for example.
- the area of each pixel 44 is illuminated during the exposure period of the corresponding sensor element 40 .
- FIG. 8 is a schematic side view of an imaging system 120 , in accordance with another embodiment of the present invention.
- a synchronization controller 121 synchronizes the operation of multiple sensing units 122 , 124 , 126 , 128 .
- Each of these sensing units typically comprises an illumination assembly and an imaging assembly, which operate in concert as in system 20 .
- Each sensing unit 122 , 124 , 126 , 128 projects a respective patterned beam 132 , 134 , 136 , 138 onto a scene 130 and forms a respective image of the part of the scene that is illuminated by the respective pattern.
- the projected patterned beams typically overlap in overlap regions 140 .
- the overlap of the patterns could lead to inability of sensing units 122 , 124 , 126 , 128 to detect their own patterns reliably in regions 140 and thus to loss of 3D information in these regions.
- One way to overcome this problem could be to operate the sensing units at different wavelengths, so that each unit senses only its own pattern. This solution, however, can be cumbersome and require costly optoelectronics and optical filters.
- controller 121 controls the timing of the illumination assemblies and the rolling shutters of the imaging assemblies in sensing units 122 , 124 , 126 , 128 so as to control the overlap between the regions that are illuminated at any given time.
- the sensing units are controlled so that they illuminate and capture radiation from respective non-overlapping stripes 142 , 144 , 146 , 148 .
- the illumination stripe and the sensing area that is triggered to receive radiation by the rolling shutter are internally synchronized as described above. Furthermore, the timing of all the sensing units is coordinated to avoid interference.
- each sensing unit simultaneously activate their respective stripes 142 , followed by stripes 144 , and so on, so that no more than a single sensing unit is active within each overlap region 140 at any given time.
- Each sensing unit provides 3D mapping data with respect to its own part of scene 130 , and a processing unit (such as controller 121 or another computer) stitches the data together into a combined depth map.
- sensing units 122 , 124 , 126 , 128 may operate together without a centralized controller to regulate synchronization. For example, each sensing unit may adjust its own timing so as to maximize its depth readings. Thus, the entire system will converge to an optimal synchronization. Additionally or alternatively, the sensing units may communicate with one another using a token ring type protocol, without centralized control.
- FIG. 9 is a schematic pictorial view of an imaging system 150 , in accordance with yet another embodiment of the present invention. This embodiment is similar in its principles of operation to the embodiment of FIG. 8 : Multiple sensing units 152 , 154 , . . . , project respective patterned beams 156 , 158 , . . . , onto a scene, while controlling the timing of their respective illumination assemblies and rolling shutters so as to illuminate and capture radiation from respective sequences of stripes 160 . Beams 156 and 158 overlap in an overlap region 162 . Although for the sake of simplicity, only two sensing units are shown in FIG. 9 , any suitable number of sensing units may be arranged in this matter.
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| CN201110035990.9A CN102143342B (zh) | 2010-02-02 | 2011-02-01 | 投影照明与图像传感器的卷帘的同步 |
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| US13/765,706 US9736459B2 (en) | 2010-02-02 | 2013-02-13 | Generation of patterned radiation |
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| EP2363686A1 (en) | 2011-09-07 |
| US20180070073A1 (en) | 2018-03-08 |
| US9736459B2 (en) | 2017-08-15 |
| US10063835B2 (en) | 2018-08-28 |
| CN102143342B (zh) | 2015-03-25 |
| CN102193295A (zh) | 2011-09-21 |
| US10609357B2 (en) | 2020-03-31 |
| CN102193295B (zh) | 2014-12-10 |
| US20190068951A1 (en) | 2019-02-28 |
| CN104360571A (zh) | 2015-02-18 |
| CN104360571B (zh) | 2016-05-11 |
| CN102143342A (zh) | 2011-08-03 |
| US20130147921A1 (en) | 2013-06-13 |
| JP2011160420A (ja) | 2011-08-18 |
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