US10696768B2 - Crosslinkable fluoropolymers - Google Patents
Crosslinkable fluoropolymers Download PDFInfo
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- US10696768B2 US10696768B2 US15/121,266 US201515121266A US10696768B2 US 10696768 B2 US10696768 B2 US 10696768B2 US 201515121266 A US201515121266 A US 201515121266A US 10696768 B2 US10696768 B2 US 10696768B2
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- polymer
- hydrocarbon
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- 229920002313 fluoropolymer Polymers 0.000 title claims abstract description 108
- 239000004811 fluoropolymer Substances 0.000 title claims abstract description 108
- 238000000034 method Methods 0.000 claims abstract description 72
- 230000008569 process Effects 0.000 claims abstract description 65
- 238000004519 manufacturing process Methods 0.000 claims abstract description 21
- 229920000642 polymer Polymers 0.000 claims description 125
- 239000000203 mixture Substances 0.000 claims description 101
- 239000000178 monomer Substances 0.000 claims description 94
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 55
- -1 acrylic compound Chemical class 0.000 claims description 39
- 238000004132 cross linking Methods 0.000 claims description 36
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims description 32
- 150000001875 compounds Chemical class 0.000 claims description 27
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 25
- 125000004122 cyclic group Chemical group 0.000 claims description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 23
- 150000005690 diesters Chemical class 0.000 claims description 22
- 239000002904 solvent Substances 0.000 claims description 22
- 239000003999 initiator Substances 0.000 claims description 20
- 150000003839 salts Chemical class 0.000 claims description 20
- 239000003795 chemical substances by application Substances 0.000 claims description 16
- 239000003960 organic solvent Substances 0.000 claims description 16
- 125000000524 functional group Chemical group 0.000 claims description 15
- 238000011282 treatment Methods 0.000 claims description 14
- 230000005855 radiation Effects 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 12
- 101001098066 Naja melanoleuca Basic phospholipase A2 1 Proteins 0.000 claims description 11
- 230000003213 activating effect Effects 0.000 claims description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 10
- 125000005647 linker group Chemical group 0.000 claims description 10
- 125000005011 alkyl ether group Chemical group 0.000 claims description 9
- 125000005842 heteroatom Chemical group 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 8
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 7
- 125000001072 heteroaryl group Chemical group 0.000 claims description 7
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 7
- 239000005518 polymer electrolyte Substances 0.000 claims description 7
- 238000007669 thermal treatment Methods 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 6
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 5
- 239000000654 additive Substances 0.000 claims description 5
- 229930195733 hydrocarbon Natural products 0.000 claims description 5
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000005013 aryl ether group Chemical group 0.000 claims description 3
- 150000007522 mineralic acids Chemical class 0.000 claims description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 150000003606 tin compounds Chemical class 0.000 claims description 2
- 239000010408 film Substances 0.000 description 131
- 239000010410 layer Substances 0.000 description 41
- 239000000758 substrate Substances 0.000 description 30
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 28
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- 239000004065 semiconductor Substances 0.000 description 18
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 7
- 239000012298 atmosphere Substances 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 239000011244 liquid electrolyte Substances 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- BLTXWCKMNMYXEA-UHFFFAOYSA-N 1,1,2-trifluoro-2-(trifluoromethoxy)ethene Chemical compound FC(F)=C(F)OC(F)(F)F BLTXWCKMNMYXEA-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 4
- 229910004613 CdTe Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 230000005670 electromagnetic radiation Effects 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- MUXOBHXGJLMRAB-UHFFFAOYSA-N Dimethyl succinate Chemical compound COC(=O)CCC(=O)OC MUXOBHXGJLMRAB-UHFFFAOYSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 0 [4*]/C([5*])=C(/[6*])C(=O)O*C.[4*]/C([5*])=C(/[6*])OC Chemical compound [4*]/C([5*])=C(/[6*])C(=O)O*C.[4*]/C([5*])=C(/[6*])OC 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- XTDYIOOONNVFMA-UHFFFAOYSA-N dimethyl pentanedioate Chemical compound COC(=O)CCCC(=O)OC XTDYIOOONNVFMA-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007720 emulsion polymerization reaction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 125000001033 ether group Chemical group 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 125000003367 polycyclic group Polymers 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 229930195734 saturated hydrocarbon Natural products 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910018030 Cu2Te Inorganic materials 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- UDSFAEKRVUSQDD-UHFFFAOYSA-N Dimethyl adipate Chemical compound COC(=O)CCCCC(=O)OC UDSFAEKRVUSQDD-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910005143 FSO2 Inorganic materials 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 206010065042 Immune reconstitution inflammatory syndrome Diseases 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- KMLAKVKRWRDDJH-UHFFFAOYSA-L ditert-butyltin(2+);dodecanoate Chemical compound CC(C)(C)[Sn+2]C(C)(C)C.CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O KMLAKVKRWRDDJH-UHFFFAOYSA-L 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- FAQJJMHZNSSFSM-UHFFFAOYSA-N phenylglyoxylic acid Chemical class OC(=O)C(=O)C1=CC=CC=C1 FAQJJMHZNSSFSM-UHFFFAOYSA-N 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 2
- CHEANNSDVJOIBS-MHZLTWQESA-N (3s)-3-cyclopropyl-3-[3-[[3-(5,5-dimethylcyclopenten-1-yl)-4-(2-fluoro-5-methoxyphenyl)phenyl]methoxy]phenyl]propanoic acid Chemical compound COC1=CC=C(F)C(C=2C(=CC(COC=3C=C(C=CC=3)[C@@H](CC(O)=O)C3CC3)=CC=2)C=2C(CCC=2)(C)C)=C1 CHEANNSDVJOIBS-MHZLTWQESA-N 0.000 description 1
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- KHXKESCWFMPTFT-UHFFFAOYSA-N 1,1,1,2,2,3,3-heptafluoro-3-(1,2,2-trifluoroethenoxy)propane Chemical compound FC(F)=C(F)OC(F)(F)C(F)(F)C(F)(F)F KHXKESCWFMPTFT-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- 229940058015 1,3-butylene glycol Drugs 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- UTPFSIZAJUXRQS-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane;phenylmethoxymethylbenzene Chemical compound CCCCOCCOCCCC.C=1C=CC=CC=1COCC1=CC=CC=C1 UTPFSIZAJUXRQS-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- 125000006219 1-ethylpentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
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- 239000012299 nitrogen atmosphere Substances 0.000 description 1
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- 150000001451 organic peroxides Chemical class 0.000 description 1
- 238000013086 organic photovoltaic Methods 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- 229960003424 phenylacetic acid Drugs 0.000 description 1
- 239000003279 phenylacetic acid Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000010094 polymer processing Methods 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 150000003141 primary amines Chemical group 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003461 sulfonyl halides Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- WRTMQOHKMFDUKX-UHFFFAOYSA-N triiodide Chemical compound I[I-]I WRTMQOHKMFDUKX-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
- C08F214/22—Vinylidene fluoride
- C08F214/225—Vinylidene fluoride with non-fluorinated comonomers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
- C08F214/186—Monomers containing fluorine with non-fluorinated comonomers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
- C08F214/22—Vinylidene fluoride
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/28—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/0481—Encapsulation of modules characterised by the composition of the encapsulation material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
- C08J2327/08—Homopolymers or copolymers of vinylidene chloride
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Definitions
- the present invention pertains to a process for the manufacture of a crosslinkable fluoropolymer, to said crosslinkable fluoropolymer and the crosslinked fluoropolymer obtainable therefrom, to a film comprising said crosslinkable fluoropolymer or said crosslinked fluoropolymer and to uses of said crosslinked fluoropolymer film in various applications.
- the solar panel can be used as a component of a larger photovoltaic system to generate and supply electricity in commercial and residential applications.
- a solar panel is typically made up of a set of solar photovoltaic modules electrically connected and mounted on a supporting structure.
- a photovoltaic module is a packaged interconnected assembly of solar cells.
- the solar cell typically includes a substrate that can be for example made of metal or glass, a semiconductor active layer disposed on said substrate, and a transparent and/or conductive layer disposed on said semiconductor active layer.
- Industrial solar cells typically comprise a semiconductor active layer made from monocrystalline silicon, polycrystalline silicon, amorphous silicon, CuInSe 2 , CuInS 2 , GaAs, CdS/Cu 2 S, CdS/CdTe, CdS/InP, and CdTe/Cu 2 Te-based multijunction material systems.
- DSCs dye-sensitized solar cells
- fluoropolymer materials in compositions suitable for use in solar cells is already known in the art.
- films comprising a top coat layer made of an optically transparent fluoropolymer as protective films suitable for use in solar cell modules.
- a protective film is needed in a solar cell module to protect it from heat, humidity and from any possible environmental exposure or risk during transport.
- the protective film is typically optically transparent in order to allow the solar light to reach the solar cell module active layer.
- fluoropolymer films known in the art have the drawback that mechanical stress on the film surface generates a haze effect that leads to a loss of the film transparency so that the operation of the solar cell is compromised. Since a solar cell module is normally exposed to a natural environment for a long time, it is mandatory that the material forming the protective film thereof has excellent hardness, abrasion resistance and impact strength so that it can protect the solar cell from any possible event (rain, hail, wind, sand, etc).
- fluoropolymer protective films known in the art require either the use of adhesives or particular treatments in order to ensure their bonding to the solar cell.
- crosslinked fluoropolymers thereby provided advantageously exhibit both enhanced chemical resistance and enhanced mechanical properties.
- the present invention pertains to a process for the manufacture of a crosslinkable fluoropolymer [polymer (FC)], said process comprising reacting:
- the process for the manufacture of a crosslinkable fluoropolymer [polymer (FC)] advantageously comprises reacting the end group(s) of any of formulae (I) and (II) in the monomer(s) (H F ) of at least one polymer (F) with the functional group(s) in the end group(s) T of at least one compound (MA) of any of formulae (III) to (V).
- the present invention pertains to the crosslinkable fluoropolymer [polymer (FC)] obtainable by the process of the invention.
- the crosslinkable fluoropolymer [polymer (FC)] of the invention typically comprises recurring units derived from vinylidene fluoride (VDF) and at least one functional hydrogenated monomer [monomer (H′ F )] comprising a pendant side chain comprising an end group (E) of any of formulae (III-A) to (V-A): —O—C(O)—C(R 3 ) ⁇ CR 1 R 2 (III-A) —O—C(O)—NH—C(O)—C(R 3 ) ⁇ CR 1 R 2 (IV-A) —O—C(O)—Z—C(R 3 ) ⁇ CR 1 R 2 (V-A) wherein each of R 1 , R 2 and R 3 , equal to or different from each other, is independently a hydrogen atom or a C 1 -C 3 hydrocarbon group, and Z is a bonding group of any of formulae (j) and (jj): —NH—X—O—C(O)—
- composition (CC) comprising:
- the present invention pertains to a process for the manufacture of a crosslinkable fluoropolymer film [film (FC)], said process comprising:
- composition (L) comprising at least one crosslinkable fluoropolymer [polymer (FC)] or the crosslinkable composition [composition (CC)], and
- step (iii) applying the composition (L) provided in step (ii) onto at least one surface of the substrate provided in step (i) thereby providing a film
- step (iv) optionally, drying the film provided in step (iii).
- film is intended to denote a flat piece of material having a thickness smaller than either of its length or its width.
- the present invention thus also pertains to the crosslinkable fluoropolymer film [film (FC)] obtainable by the process of the invention.
- the crosslinkable fluoropolymer film typically comprises at least one crosslinkable fluoropolymer [polymer (FC)] or the crosslinkable composition [composition (CC)].
- the crosslinkable fluoropolymer film preferably comprises from 2% to 90% by weight, preferably from 2% to 70% by weight, more preferably from 2% to 50% by weight of at least one crosslinkable fluoropolymer [polymer (FC)] or the crosslinkable composition [composition (CC)].
- composition (L)] is intended to denote a composition comprising at least one organic solvent [solvent (S)] in the liquid state at 20° C. under atmospheric pressure.
- Non-limitative examples of suitable solvents (S) include, notably, those capable of dissolving the polymer (F).
- the process for the manufacture of a crosslinkable fluoropolymer film comprises:
- composition (ii-1) providing a liquid composition [composition (L)] comprising at least one crosslinkable fluoropolymer [polymer (FC)] or the crosslinkable composition [composition (CC)],
- step (iii-1) applying the composition (L) provided in step (ii-1) onto at least one surface of the substrate provided in step (i-1) thereby providing a film
- crosslinkable fluoropolymer film [film (FC)] obtainable by the process of this first embodiment of the invention is typically free from any organic solvent [solvent (S)].
- the process for the manufacture of a crosslinkable fluoropolymer film comprises:
- composition (ii-2) providing a liquid composition [composition (L)] comprising at least one crosslinkable fluoropolymer [polymer (FC)] or the crosslinkable composition [composition (CC)], and
- step (iii-2) applying the composition (L) provided in step (ii-2) onto at least one surface of the substrate provided in step (i-2) thereby providing a film.
- crosslinkable fluoropolymer film [film (FC)] obtainable by the process of this second embodiment of the invention typically further comprises at least one organic solvent [solvent (S)].
- the crosslinkable fluoropolymer film [film (FC)] obtainable by the process of this second embodiment of the invention preferably comprises:
- the choice of the substrate is not particularly limited, being understood that the film (FC) can be manufactured directly as a unitary assembly comprising said substrate or can be manufactured by applying the composition (L) onto a surface of said substrate, from which said film (FC) can be detached and individualized.
- the substrate may be a monolayer or a multilayer substrate wherein the outer layer is made from a material selected from the group consisting of glass, polymers and metals.
- the present invention pertains to a process for the manufacture of a crosslinked fluoropolymer film [film (FCC)], said process comprising crosslinking the crosslinkable fluoropolymer film [film (FC)].
- the present invention thus further pertains to the crosslinked fluoropolymer film [film (FCC)] obtainable by the process of the invention.
- the crosslinked fluoropolymer film typically comprises at least one crosslinked fluoropolymer [polymer (FCC)].
- the crosslinked fluoropolymer film [film (FCC)] is advantageously obtainable by crosslinking the pendant side chains of the polymer (FC).
- the crosslinked fluoropolymer typically comprises one or more fluoropolymer domains consisting of fluoropolymer chains obtainable by the polymer (FC) and one or more hydrocarbon domains consisting of hydrocarbon chains obtainable by crosslinking the pendant side chains of the polymer (FC).
- Determination of the crosslinking density of the crosslinked fluoropolymer film [film (FCC)] of the present invention can be performed by any suitable method.
- the crosslinked fluoropolymer film [film (FCC)] is typically swelled in a suitable solvent at a specific temperature and either the change in mass or the change in volume is measured. The more the crosslinking density of the crosslinked fluoropolymer film [film (FCC)], the more swelling of the crosslinked fluoropolymer film [film (FCC)] in said solvent.
- the process for the manufacture of a crosslinked fluoropolymer film comprises:
- composition (ii-1) providing a liquid composition [composition (L)] comprising at least one crosslinkable fluoropolymer [polymer (FC)] or the crosslinkable composition [composition (CC)],
- step (iii-1) applying the composition (L) provided in step (ii-1) onto at least one surface of the substrate provided in step (i-1) thereby providing a film
- the crosslinked fluoropolymer film [film (FCC)] obtainable by the process of this first embodiment of the invention is typically free from any organic solvent [solvent (S)].
- the process for the manufacture of a crosslinked fluoropolymer film comprises:
- composition (ii-2) providing a liquid composition [composition (L)] comprising at least one crosslinkable fluoropolymer [polymer (FC)] or the crosslinkable composition [composition (CC)],
- step (iii-2) applying the composition (L) provided in step (ii-2) onto at least one surface of the substrate provided in step (i-2) thereby providing a film
- the crosslinked fluoropolymer film [film (FCC)] obtainable by the process of this second embodiment of the invention typically further comprises at least one organic solvent [solvent (S)].
- the crosslinked fluoropolymer film [film (FCC)] of the invention is particularly suitable for use in a solar cell module.
- the substrate is a photovoltaic module.
- the present invention thus pertains to a process for the manufacture of a solar cell module, said process comprising:
- composition (ii′) providing a liquid composition [composition (L)] comprising at least one crosslinkable fluoropolymer [polymer (FC)] or the crosslinkable composition [composition (CC)],
- step (iv′) optionally, drying the film provided in step (iii′), and
- step (v′) crosslinking the film provided in either step (iii′) or in step (iv′).
- the solvent (S) is preferably selected from the group consisting of:
- the solvent (S) is more preferably selected from the group consisting of diesters of formula (DE-I) and ester-amides of formula (EA-I) as defined above.
- R A and R B are preferably selected from the group consisting of C 1 -C 20 alkyl, C 1 -C 20 aryl, C 1 -C 20 alkyaryl, C 1 -C 20 arylalkyl groups, and mixtures thereof.
- C 1 -C 20 alkyl is used according to its usual meaning and it encompasses notably linear, cyclic, branched saturated hydrocarbon chain having from 1 to 20 carbon atoms and preferably from 1 or 2 to 10 carbon atoms.
- C 1 -C 20 aryl is used according to its usual meaning and it encompasses notably aromatic mono- or poly-cyclic groups, preferably mono- or bi-cyclic groups, comprising from 6 to 12 carbon atoms, preferably phenyl or naphthyl groups.
- C 1 -C 20 arylalkyl is used according to its usual meaning and it encompasses linear, branched or cyclic saturated hydrocarbon groups comprising, as substituent, one or more than one aromatic mono- or poly-cyclic groups, such as, notably benzyl group.
- C 1 -C 20 alkylaryl is used according to its usual meaning and it encompasses aromatic mono- or poly-cyclic groups comprising, as substituent, one or more than one alkyl groups, e.g. one or more than one linear, cyclic, branched saturated hydrocarbon chain having from 1 to 14 carbon atoms and preferably from 1 or 2 to 10 carbon atoms.
- R A and R B are preferably selected from the group consisting of methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, terbutyl, sec-butyl, 2-ethyl-butyl, n-pentyl, isopentyl, sec-pentyl, cyclopentyl, n-hexyl, isohexyl, sec-hexyl, 2-ethylhexyl, sec-heptyl, 3-methyl-hexyl, 4-methyl-hexyl, 1-ethyl-pentyl, 2-ethyl-pentyl, 3-ethyl-pentyl, n-octyl, isooctyl, 3-methyl-heptyl, n-nonyl, n-decyl,
- R C and R D are preferably selected from the group consisting of C 1 -C 20 alkyl, C 1 -C 20 aryl, C 1 -C 20 alkyaryl, C 1 -C 20 arylalkyl groups, all said groups possibly comprising one or more than one substituents, possibly having one or more than one heteroatoms, and of cyclic moieties comprising both R C and R D and the nitrogen atom to which they are bound, said cyclic moieties possibly comprising one or more than one heteroatoms, e.g. an oxygen atom or an additional nitrogen atom.
- R C and R D are more preferably selected from the group consisting of methyl, ethyl, hydroxyethyl, n-propyl, isopropyl, n-butyl, isobutyl, terbutyl, n-pentyl, isopentyl, hexyl and cyclohexyl groups, most preferably from the group consisting of methyl, ethyl and hydroxyethyl groups.
- Z de in formula (DE-I) and Z ea in formula (EA-I) are branched C 3 -C 10 divalent alkylene groups.
- Z de in formula (DE-I) and Z ea in formula (EA-I) are preferably selected from the group consisting of:
- composition (L) comprises:
- R A and R B are preferably methyl groups, while R C and R D , equal to or different from each other, are preferably selected from the group consisting of methyl, ethyl and hydroxyethyl groups.
- composition (L) may comprise:
- Non-limitative examples of useful diester-based mixtures wherein Z de in formula (DE-I) and/or Z ea in formula (EA-I) is branched are commercially available under the trademark name RHODIASOLV® IRIS.
- RHODIASOLV® IRIS solvent is a mixture of diesters comprising essentially (more than 80% by weight) of dimethyl ethylsuccinate and dimethyl 2-methylglutarate.
- Z de in formula (DE-I) and Z ea in formula (EA-I) are C 3 -C 10 linear divalent alkylene groups.
- composition (L) comprises:
- R A and R B are preferably methyl groups, while R C and R D , equal to or different from each other, are preferably selected from the group consisting of methyl, ethyl and hydroxyethyl groups.
- composition (L) may comprise:
- An exemplary embodiment of the variant listed above under section (I) is a diester mixture consisting essentially of:
- Non-(imitative examples of useful diester-based mixtures wherein Z de in formula (DE-I) and/or Z ea in formula (EA-I) is linear are commercially available under the trademark name RHODIASOLV® RPDE.
- RHODIASOLV® RPDE solvent is a mixture of diesters comprising essentially (more than 70% by weight) of dimethylglutarate and dimethylsuccinate.
- Diesters of formula (DE-I) which can be used in the composition of the invention can be prepared notably according to the teachings of EP 1991519 A (RHODIA OPERATIONS) 19 Nov. 2008.
- Ester-amides of formula (EA-I) which can be used in the composition of the invention can be prepared notably according to the teachings of WO 2011/154661 (RHODIA OPERATIONS) 15 Dec. 2011 and US 2011/0166025 (RHODIA OPERATIONS) 7 Jul. 2011.
- composition (L) may further comprise dimethylsulfoxide (DMSO) and, optionally, one or more organic solvents (S) different from DMSO.
- DMSO dimethylsulfoxide
- S organic solvents
- composition (L) comprise DMSO
- the weight ratio between one or more diesters of formula (DE-I) and/or one or more ester-amides of formula (EA-I) and DMSO is typically of from 1:99 to 99:1, preferably of from 20:80 to 80:20, more preferably of from 70:30 to 30:70.
- composition (L) further comprise one or more organic solvents (S) different from DMSO
- amount of the organic solvent(s) (S) in said composition (L) is typically lower than 50% by weight, preferably lower than 25% by weight, with respect to the total weight of the composition (L).
- the composition (L) is applied onto at least one surface of the substrate provided in step (i) typically by using a processing technique selected from the group consisting of casting, spray coating, roll coating, doctor blading, slot die coating, gravure coating, ink jet printing, spin coating, screen printing, brush, squeegee, foam applicator, curtain coating and vacuum coating.
- a processing technique selected from the group consisting of casting, spray coating, roll coating, doctor blading, slot die coating, gravure coating, ink jet printing, spin coating, screen printing, brush, squeegee, foam applicator, curtain coating and vacuum coating.
- step (iv) of the process of the invention if any, the film provided in step (iii) is dried typically at a temperature comprised between 60° C. and 200° C., preferably at a temperature comprised between 100° C. and 180° C.
- the crosslinkable fluoropolymer film [film (FC)] is typically crosslinked either by UV treatment under UV radiation or by thermal treatment.
- the crosslinkable fluoropolymer film [film (FC)] is advantageously crosslinked by UV treatment under UV radiation.
- UV radiation is intended to denote electromagnetic radiation with a wavelength shorter than that of visible light but longer than soft X-rays. It can be subdivided into near UV (380-200 nm wavelength; abbreviation: NUV), far or vacuum UV (200-10 nm; abbreviation: FUV or VUV), and extreme UV (1-31 nm; abbreviation: EUV or XUV). NUV having a wavelength of from 200 nm to 380 nm is preferred in the process of the invention. Either monochromatic or polychromatic radiation can be used.
- UV radiation can be provided in the crosslinking process of the invention by any suitable UV radiation source.
- Preferred UV radiation source for the process of the invention is mercury lighting. It is known that a significant portion of the energy radiated from excited mercury vapours is in the ultra-violet part of the spectrum. In the case of the low pressure discharge, more than half of the total energy supplied is radiated in the short-wave UV region at 253.7 nm. High pressure lamps radiate about 10% of their energy in the long-wave UV region at 365.0 nm, but an appreciable amount is also radiated at shorter wavelengths.
- UV treatment is advantageously carried out at a temperature comprised between 0° C. and 150° C., preferably between 15° C. and 60° C.
- Thermal treatment is typically carried out at a temperature comprised between 60° C. and 150° C., preferably between 100° C. and 135° C.
- the crosslinkable fluoropolymer film [film (FC)] of the invention is advantageously optically transparent.
- optical transparent it is meant that the crosslinkable fluoropolymer film [film (FC)] allows incident electromagnetic radiation to pass there through without being scattered.
- the crosslinkable fluoropolymer film [film (FC)] is advantageously optically transparent to incident electromagnetic radiation having a wavelength of from about 100 nm to about 2500 nm, preferably of from about 400 nm to about 800 nm.
- the crosslinked fluoropolymer film typically has a thickness comprised between 15 ⁇ m and 250 ⁇ m, preferably between 20 ⁇ m and 200 ⁇ m, more preferably between 25 ⁇ m and 150 ⁇ m.
- the crosslinked fluoropolymer film [film (FCC)] of the invention is advantageously optically transparent.
- the crosslinked fluoropolymer film [film (FCC)] is advantageously optically transparent to incident electromagnetic radiation having a wavelength of from about 100 nm to about 2500 nm, preferably of from about 400 nm to about 800 nm.
- the present invention also pertains to use of at least one crosslinked fluoropolymer film [film (FCC)] as protective film in a solar cell module.
- film (FCC) crosslinked fluoropolymer film
- crosslinked fluoropolymer film [film (FCC)] of the invention advantageously ensures good transparency to light radiation, chemical and oxidative resistance, water impermeability, perfect adhesion to different substrates, and provides at the same time excellent mechanical properties to be suitably used as protective film in a solar cell module.
- the present invention thus further pertains to a solar cell module comprising at least one photovoltaic module and at least one protective film as defined above.
- the photovoltaic module typically comprises a semiconductor photoactive layer sandwiched between an electroconductive substrate and an optically transparent conductive layer.
- the term “electroconductive substrate” is intended to denote a base member for the photovoltaic module as well as a lower-side electrode.
- materials thereof include silicon, tantalum, molybdenum, tungsten, stainless steel, aluminium, copper, titanium, carbon sheet, lead-plated steel, and resin films, and ceramics and glass having an electroconductive layer formed thereon.
- a backside reflection layer may be formed from a metal layer, a metal oxide layer, or a lamination thereof.
- the metal layer can be formed from Ti, Cr, Mo, W, Al, Ag, Ni, Cu, and the like.
- the metal oxide layer can be formed from ZnO, TiO 2 , SnO 2 , In 2 O 3 —SnO 2 (ITO), and the like.
- the metal layer and the metal oxide layer may be formed by resistance heating vapor deposition, electron beam vapor deposition, sputtering, or like method.
- semiconductor photoactive layer is intended to denote a layer endowed with photoelectric conversion property and able to perform photovoltaic conversion.
- the specific materials used for forming such semiconductor photoactive layer include single crystal silicon semiconductor, non-single crystal silicon semiconductor (e.g.
- a-Si amorphous silicon
- a-Si amorphous silicon
- compound semiconductors and junctions such as CuInSe 2 , CuInS 2 , GaAs, CdS/Cu 2 S, CdS/CdTe, CdS/InP, and CdTe/Cu 2 Te
- organic semiconductors such as polymers and small-molecule compounds like polyphenylene vinylene, copper phthalocyanine (a blue or green organic pigment) and carbon fullerenes.
- the semiconductor photoactive layer formed of either of the above semiconductor has generally a laminated structure with a “pn junction”, “pin junction” or Schottky junction.
- the term “electroconductive layer” is intended to denote an upper-side electrode (i.e. the light receiving surface).
- materials suitable for use in the optically transparent electroconductive layer include In 2 O 3 , SnO 2 , In 2 O 3 —SnO 2 (ITO), ZnO, TiO 2 , Cd 2 SnO 4 , crystalline semiconductor layers doped with a high concentration of an impurity, like notably fluorine-doped tin oxide (SnO 2 :F, or “FTO”), doped zinc oxide (e.g.: ZnO:Al) and flexible organic conductors, like, e.g. carbon nanotube networks embedded in a transparent polymer matrix.
- ITO In 2 O 3 , SnO 2 , In 2 O 3 —SnO 2 (ITO), ZnO, TiO 2 , Cd 2 SnO 4 , crystalline semiconductor layers doped with a high concentration of an impurity, like notably fluorine-doped
- the layer may be formed by resistance-heating vapor deposition, sputtering, spraying, chemical vapour deposition (CVD), impurity diffusion, and like methods.
- CVD chemical vapour deposition
- impurity diffusion and like methods.
- typical polymer processing technologies are also available, including laminating, casting, extrusion and the like.
- a grid-type collecting electrode may be provided on the optically transparent electroconductive layer in order to efficiently collect the generated current.
- materials suitable for use in the collecting electrode include Ti, Cr, Mo, W, Al, Ag, Ni, Cu, Sn, and alloys thereof, and an electroconductive paste such as silver paste.
- the collecting electrode may be formed by sputtering, resistance heating, and CVD employing a mask pattern; metal film deposition and subsequent etching for patterning; direct grid electrode pattern formation by photo-assisted CVD; formation of a negative pattern mask of the grid electrode and subsequent metal plating; printing with electroconductive paste, bonding of metal wires, and like methods.
- the electroconductive paste generally includes a dispersion of powder of silver, gold, copper, nickel, carbon or the like in a polymeric binder.
- the polymeric binder includes polyester resins, epoxy resins, acrylic resins, alkyd resins, polyvinyl acetate resins, rubbers, urethane resins, and phenol resins. Otherwise, a wire made of a metal such as Cu may be provided on the transparent conductive layer.
- the solar cell module is generally equipped with output terminals for extracting photovoltaic current.
- the output terminals are typically in electric connection with the conductive substrate and the collecting electrode, respectively.
- a metal piece such as a copper tab can be used as output terminal at the conductive substrate side, connected to the conductive substrate by spot welding or soldering.
- a metal may be electrically connected to the collecting electrode by means of conductive paste or solder.
- the solar cell module typically further comprises a back layer.
- the term “back layer” is intended to denote a layer able to maintain electric insulation between the conductive substrate of the photovoltaic module and the exterior.
- the back layer is generally made of a flexible material which ensures sufficient electric insulation with the conductive substrate of the photovoltaic module.
- a plurality of solar cell modules as defined above may be provided, wherein photovoltaic modules can be connected in series or in parallel according to the desired voltage or current.
- composition (L) may further comprise at least one electrolytic salt.
- the crosslinkable fluoropolymer film [film (FC)] obtainable by the process of the invention may thus further comprise at least one electrolytic salt.
- composition (L) comprise at least one electrolytic salt
- the film (FC) is typically obtainable by the process according to the second embodiment of the invention.
- the film (FC) obtainable by the process of the second embodiment of the invention typically further comprises a composition (L) comprising at least one organic solvent [solvent (S)] and at least one electrolytic salt.
- the crosslinked fluoropolymer film [film (FCC)] obtainable by crosslinking the film (FC) may thus also further comprise at least one electrolytic salt.
- electrolytic salt is hereby intended to denote a metal salt comprising electrically conductive ions.
- metal salts may be employed as electrolytic salts.
- Metal salts which are stable and soluble in the composition (L) are generally used.
- Non-limitative examples of suitable electrolytic salts include, notably, MeI, Me(PF 6 ) n , Me(BF 4 ) n , Me(ClO 4 ) n , Me(bis(oxalato)borate) n (“Me(BOB) n ”), MeCF 3 SO 3 , Me[N(CF 3 SO 2 ) 2 ] n , Me[N(C 2 F 5 SO 2 ) 2 ] n , Me[N(CF 3 SO 2 )(R F SO 2 )]n with RF being C 2 F 5 , C 4 F 9 , CF 3 OCF 2 CF 2 , Me(AsF 6 ) n , Me[C(CF 3 SO 2 ) 3 ] n , Me 2 S n , wherein Me is a metal, preferably a transition metal, an alkaline metal or an alkaline-earth metal, more preferably Me being Li, Na, K, Cs, and n is the val
- the electrolytic salt is preferably selected from the followings: LiI, LiPF 6 , LiBF 4 , LiCIO 4 , lithium bis(oxalato)borate (“LiBOB”), LiCF 3 SO 3 , LiN(CF 3 SO 2 ) 2 , LiN(C 2 F 5 SO 2 ) 2 , Me[N(CF 3 SO 2 )(R F SO 2 )] n with R F being C 2 F 5 , C 4 F 9 , CF 3 OCF 2 CF 2 , LiAsF 6 , LiC(CF 3 SO 2 ) 3 , Li 2 S n and combinations thereof, and redox electrolytes such as iodide/triiodide, disulfide/thiolate and tris(2,2′-bipyridine)cobalt(II/III) redox couples.
- LiBOB lithium bis(oxalato)borate
- the present invention also pertains to use of at least one crosslinked fluoropolymer film [film (FCC)] further comprising at least one electrolytic salt as polymer electrolyte in an electrochemical device.
- film (FCC) crosslinked fluoropolymer film
- electrolytic salt as polymer electrolyte
- a crosslinked fluoropolymer film [film (FCC)] suitable for use as polymer electrolyte in an electrochemical device typically further comprises a composition (L) comprising at least one organic solvent [solvent (S)] and at least one electrolytic salt.
- a crosslinked fluoropolymer film [film (FCC)] particularly suitable for use as polymer electrolyte in an electrochemical device preferably comprises:
- the electrolytic salt is typically present in the composition (L) comprising at least one solvent (S) in a concentration of from 0.01 M to 5 M.
- crosslinked fluoropolymer film [film (FCC)] of the invention advantageously incorporates and retains a liquid electrolyte in an effective manner during both manufacturing of the electrochemical device and operation of the same.
- Non-limitative examples of suitable electrochemical devices include dye-sensitized solar cells, optical shutters, secondary batteries and capacitors.
- the invention thus further pertains to a dye-sensitized solar cell comprising the polymer electrolyte as defined above.
- the dye-sensitized solar cell is typically a solar cell module as defined above wherein the photovoltaic module typically comprises a front electrode made from an optically transparent conductive layer, a semiconductor photoactive layer further comprising a dye layer, the polymer electrolyte separator of the invention and a back electrode.
- the photovoltaic module typically comprises a front electrode made from an optically transparent conductive layer, a semiconductor photoactive layer further comprising a dye layer, the polymer electrolyte separator of the invention and a back electrode.
- Non-limitative examples of suitable dyes include, notably, ruthenium and osmium-based dyes such as ruthenium tris (2,2′-bipyridyl-4,4′-dicarboxylate), ruthenium cis-diaqua bipyridyl complexes such as ruthenium cis diaqua bis (2,2′-bipyridyl-4,4′-dicarboxylate), porphyrins such as zinc tetra (4-carboxyphenyl) porphyrin, cyanides such as iron-hexacyanide complexes and phthalocyanines.
- ruthenium and osmium-based dyes such as ruthenium tris (2,2′-bipyridyl-4,4′-dicarboxylate), ruthenium cis-diaqua bipyridyl complexes such as ruthenium cis diaqua bis (2,2′-bipyri
- the photovoltaic module of the dye-sensitized solar cell is generally manufactured by assembling a front electrode made from an optically transparent conductive layer and a semiconductor photoactive layer, said semiconductor photoactive layer being coated with a dye layer, and filling the gap between the dye layer and a back electrode with the polymer electrolyte of the invention.
- the polymer (F) is typically obtainable by polymerization of vinylidene fluoride (VDF) and at least one functional hydrogenated monomer [monomer (H F )] comprising an end group of any of formulae (I) and (II): —C(O)—O—R x (I) —O—R x (II) wherein R x is a hydrogen atom or a C 1 -C 5 hydrocarbon group comprising at least one hydroxyl group.
- VDF vinylidene fluoride
- H F functional hydrogenated monomer
- the polymer (F) can be manufactured either by aqueous suspension polymerization or by aqueous emulsion polymerization.
- the polymer (F) is preferably manufactured by aqueous emulsion polymerization of vinylidene fluoride (VDF), at least one monomer (H F ) as defined above and, optionally, one or more other fluorinated monomers [monomers (F)] and/or hydrogenated monomers [monomers (H)], in the presence of at least one radical initiator, in a polymerization medium comprising:
- Polymerization pressure ranges typically between 10 bar and 45 bar, preferably between 15 bar and 40 bar, more preferably between 20 bar and 35 bar.
- Polymerization temperature is generally selected in the range comprised between 80° C. and 140° C., preferably between 95° C. and 130° C.
- Emulsion polymerization process as detailed above have been described in the art (see e.g. U.S. Pat. No. 4,990,283 (AUSIMONT SPA (IT)) 5 Feb. 1991, U.S. Pat. No. 5,498,680 (AUSIMONT SPA) 12 Mar. 1996 and U.S. Pat. No. 6,103,843 (AUSIMONT SPA) 15 Aug. 2000).
- the polymer (F) is advantageously a linear polymer [polymer (F L )] comprising linear sequences of recurring units derived from vinylidene fluoride (VDF) and at least one monomer (H F ).
- the polymer (F) is thus typically distinguishable from graft polymers.
- the polymer (F) is advantageously a random polymer [polymer (F R )] comprising linear sequences of randomly distributed recurring units derived from vinylidene fluoride (VDF) and at least one monomer (H F ).
- the polymer (F R ) advantageously maximizes the effect of the monomer (H F ) on the crosslinking ability of the polymer (FC) thereby provided, even at low levels of monomer (H F ) in the polymer (F R ), without impairing the other outstanding properties of the polymer (F) such as thermal stability and mechanical properties.
- randomly distributed recurring units is intended to denote the percent ratio between the average number of monomer (H F ) sequences (%), said sequences being comprised between two recurring units derived from VDF, and the total average number of recurring units derived from at least one monomer (H F ) (%).
- the average number of monomer (H F ) sequences equals the average total number of recurring units derived from at least one monomer (H F ), so that the fraction of randomly distributed recurring units derived from at least one monomer (H F) is 100%: this value corresponds to a perfectly random distribution of recurring units derived from at least one monomer (H F ).
- the polymer (F) is thus typically distinguishable from block polymers.
- the polymer (F) typically comprises at least 70% by moles, preferably at least 80% by moles, more preferably at least 90% by moles, with respect to the total moles of recurring units of said polymer (F), of recurring units derived from vinylidene fluoride (VDF).
- VDF vinylidene fluoride
- the polymer (F) preferably comprises from 0.01% to 10% by moles, with respect to the total moles of recurring units of said polymer (F), of recurring units derived from at least one monomer (H F ).
- the polymer (F) may further comprise recurring units derived from at least one fluorinated monomer [monomer (F)] different from vinylidene fluoride (VDF).
- fluorinated monomer [monomer (F)] it is hereby intended to denote an ethylenically unsaturated monomer comprising at least one fluorine atom.
- Non-limitative examples of suitable monomers (F) notably include the followings:
- Most preferred monomers (F) are chlorotrifluoroethylene (CTFE), perfluoromethylvinylether (PMVE), tetrafluoroethylene (TFE) and hexafluoropropylene (HFP).
- CTFE chlorotrifluoroethylene
- PMVE perfluoromethylvinylether
- TFE tetrafluoroethylene
- HFP hexafluoropropylene
- the polymer (F) of the invention comprises typically from 2% to 20% by moles, preferably from 3% to 18% by moles, more preferably from 4% to 15% by moles, with respect to the total moles of recurring units of said polymer (F), of recurring units derived from said monomer (F).
- the polymer (F) may further comprise recurring units derived from at least one hydrogenated monomer [monomer (H)] different from the monomer (H F ).
- hydrophilic monomer [monomer (H)] it is hereby intended to denote an ethylenically unsaturated monomer comprising at least one hydrogen atom and free from fluorine atoms.
- fluorinated monomer [monomer (F)]
- polymer (F) may comprise recurring units derived from one or more than one fluorinated monomers.
- fluorinated monomers is understood, for the purposes of the present invention, both in the plural and the singular, that is to say that they denote both one or more than one fluorinated monomers as defined above.
- the term “at least one hydrogenated monomer [monomer (H)]” is understood to mean that the polymer (F) may comprise recurring units derived from one or more than one hydrogenated monomers.
- hydrogenated monomers is understood, for the purposes of the present invention, both in the plural and the singular, that is to say that they denote both one or more than one hydrogenated monomers as defined above.
- the polymer (F) may be semi-crystalline or amorphous.
- micro-crystalline is hereby intended to denote a polymer having a heat of fusion of from 10 to 90 J/g, preferably of from 30 to 60 J/g, more preferably of from 35 to 55 J/g as measured according to ASTM D3418-08.
- amorphous is hereby to denote a polymer having a heat of fusion of less than 5 J/g, preferably of less than 3 J/g, more preferably of less than 2 J/g as measured according to ASTM D-3418-08.
- melt flow index (MFI) of the polymer (F) of the invention will be selected by the skilled in the art in relation to the processing technology selected for obtaining final parts (e.g. films or sheets).
- the polymer (F) will have a MFI as measured according to ASTM D1238 (230° C., 5 Kg) advantageously comprised between 1 and 50 g/10 min, preferably between 2 and 30 g/10 min.
- the skilled in the art will select the appropriate concentration of recurring units derived from the monomer (H F ) in view of the crosslinking density required in the target field of use of the polymer (FC). It is nevertheless understood that appropriate crosslinking densities are advantageously obtained when the amount of recurring units derived from monomer (H F ) is preferably of at least 0.05% by moles, more preferably of at least 0.1% by moles, even more preferably of at least 0.5% by moles, still more preferably of at least 1% by moles, with respect to the total moles of recurring units of polymer (F).
- the amount of recurring units derived from monomer (H F ) would be preferably of at most 8% by moles, more preferably of at most 7% by moles, even more preferably of at most 5% by moles, still more preferably of at most 3% by moles, with respect to the total moles of recurring units of polymer (F).
- the monomer (H F ) is advantageously a monomer (H).
- the monomer (H F ) is typically selected from the group consisting of (meth)acrylic monomers of formula (I-A) and vinyl ether monomers of formula (II-A):
- each of R 4 , R 5 and R 6 is independently a hydrogen atom or a C 1 -C 3 hydrocarbon group
- R X is a hydrogen atom or a C 1 -C 5 hydrocarbon group comprising at least one hydroxyl group
- R′ x is a C 1 -C 5 hydrocarbon group comprising at least one hydroxyl group.
- the monomer (H F ) preferably complies with formula (I-A) as defined above.
- the monomer (H F ) more preferably complies with formula (I-B):
- R′ 4 and R′ 5 are hydrogen atoms
- R′ 6 is a hydrogen atom or a C 1 -C 3 hydrocarbon group
- R′′ X is a hydrogen atom or a C 1 -C 5 hydrocarbon group comprising at least one hydroxyl group.
- Non limitative examples of monomers (H F ) of formula (I-A) include, notably, acrylic acid, methacrylic acid, hydroxyethyl(meth)acrylate, hydroxypropyl(meth)acrylate, hydroxyethylhexyl(meth)acrylate.
- the monomer (H F ) is even more preferably selected from the followings:
- the (meth)acrylic compound [compound (MA)] is preferably of any of formulae (III′) to (V′): R′ 1 R′ 2 C ⁇ C(R′ 3 )—C(O)—O-T′ (III′) R′ 1 R′ 2 C ⁇ C(R′ 3 )—C(O)—NH—C(O)—O-T′ (IV′) R′ 1 R′ 2 C ⁇ C(R′ 3 )—Z′—C(O)—O-T′ (V′) wherein R′ 1 and R′ 2 are hydrogen atoms, R′ 3 is a hydrogen atom or a C 1 -C 3 hydrocarbon group, T′ is a C 1 -C 10 linear or branched hydrocarbon end group comprising at least one functional group comprising at least one heteroatom selected from the group consisting of oxygen, nitrogen and sulphur, and Z′ is a bonding group of any of formulae (j) and (jj): —NH—X—O—C(O)— (
- the functional group in the end group T of the (meth)acrylic compound [compound (MA)] of any of formulae (III) to (V) is typically selected from the group consisting of hydroxyl groups, cyclic alkyl ether groups, isocyanate groups, carboxylic acid groups, amine groups, aryl ether groups and alkoxy silane groups.
- the compound (MA) is more preferably selected from the group consisting of 2-hydroxy ethyl (meth)acrylate, 2-hydroxy propyl (meth)acrylate, 2-hydroxy butyl (meth)acrylate, 1-hydroxy butyl (meth)acrylate, glycidyl (meth)acrylate, 2-isocyanatoethyl (meth)acrylate, 2-hydroxy-3-phenyloxy propyl (meth)acrylate, 2-(2-ethoxyethoxy)ethyl (meth)acrylate, 2-phenoxy ethyl (meth)acrylate, phenoxy tetraethyleneglycol (meth)acrylate, (3-methacryloxypropyl)trimethoxy silane, (3-methacryloxypropyl)dimethyl methoxy silane, and (3-acryloxypropyl)-trimethoxy silane.
- the process for the manufacture of the crosslinkable fluoropolymer [polymer (FC)] is preferably carried out in a liquid medium comprising at least one organic solvent [solvent (S)].
- the process for the manufacture of the crosslinkable fluoropolymer is preferably carried out in the presence of at least one activating agent.
- activating agent is intended to denote a compound able to activate the reaction of at least one end group of any of formulae (I) and (II) of the polymer (F) and at least one compound (MA).
- the process comprises reacting at least one polymer (F), wherein the monomer (H F ) comprises an end group of formula (I), wherein R x is a hydrogen atom, and at least one compound (MA) of any of formulae (III) to (V), wherein T is a C 1 -C 10 hydrocarbon end group comprising at least one functional group selected from the group consisting of hydroxyl groups, cyclic alkyl ether groups, preferably ethylene oxide groups, and amine groups, preferably primary amine groups.
- the process is typically carried out in the presence of at least one activating agent selected from the group consisting of N,N′-dicyclohexylcarbodiimide, thionyl chloride, oxalyl dichloride and inorganic acids.
- the process is typically carried out in the presence of at least one activating agent selected from the group consisting of alkyl ammonium halides.
- the process is typically carried out in the presence of at least one activating agent selected from the group consisting of thionyl chloride and oxalyl dichloride.
- the process comprises reacting at least one polymer (F), wherein the monomer (H F ) comprises an end group of any of formulae (I) and (II), wherein R x is a C 1 -C 5 hydrocarbon group comprising at least one hydroxyl group, and at least one compound (MA) of any of formulae (III) to (V), wherein T is a C 1 -C 10 hydrocarbon end group comprising at least one functional group selected from the group consisting of hydroxyl groups, cyclic alkyl ether groups, preferably ethylene oxide groups, isocyanate groups and carboxylic acid groups.
- the process is typically carried out in the presence of at least one activating agent selected from the group consisting of organic sulfonyl halides.
- the process is typically carried out in the presence of at least one activating agent selected from the group consisting of alkyl amines, preferably tertiary alkyl amines.
- the process is typically carried out in the presence of at least one activating agent selected from the group consisting of organic tin compounds.
- the process is typically carried out in the presence of at least one activating agent selected from the group consisting of inorganic acids.
- the crosslinkable fluoropolymer [polymer (FC)] of the invention preferably comprises recurring units derived from vinylidene fluoride (VDF) and at least one functional hydrogenated monomer [monomer (H′ F )] comprising a pendant side chain of any of formulae (VI) to (X): —C(O)—O—Y-E (VI) —C(O)—NH—Y-E (VII) —[C(O)] n —O—R—O—Y-E (VIII) —[C(O)] n —O—R—O—C(O)—NH—Y-E (IX) —[C(O)] n —O—R—O—C(O)—O—Y-E (X) wherein Y is a C 1 -C 10 hydrocarbon bonding group, optionally comprising at least one functional group, R is a C 1 -C 5 hydrocarbon group, optionally comprising at least one hydroxyl group
- Non-limitative examples of suitable functional groups in the bonding group Y of the pendant side chain of any of formulae (VI) to (X) include, notably, hydroxyl groups, cyclic alkyl ether groups, isocyanate groups, carboxylic acid groups, amine groups, aryl ether groups and alkoxy silane groups.
- the crosslinkable fluoropolymer [polymer (FC)] of the invention more preferably comprises recurring units derived from vinylidene fluoride (VDF) and at least one functional hydrogenated monomer [monomer (H′ F )] comprising a pendant side chain of any of formulae (VI′) to (X′): —C(O)—O—Y′-E′ (VI′) —C(O)—NH—Y′-E′ (VII′) —[C(O)] n′ —O—R′—O—Y′-E′ (VIII′) —[C(O)] n′ —O—R′—O—C(O)—NH—Y′-E′ (IX′) —[C(O)] n′ —O—R′—O—C(O)—O—Y′-E′ (X′) wherein Y′ is a C 1 -C 10 linear or branched hydrocarbon bonding group, optionally comprising at
- crosslinkable fluoropolymer [polymer (FC)] of the invention even more preferably comprises:
- the polymer (FC) typically comprises at least 70% by moles, preferably at least 80% by moles, more preferably at least 90% by moles, with respect to the total moles of recurring units of said polymer (FC), of recurring units derived from vinylidene fluoride (VDF).
- VDF vinylidene fluoride
- the polymer (FC) comprises recurring units derived from at least one monomer (H′ F ) in an amount preferably of at least 0.05% by moles, more preferably of at least 0.1% by moles, even more preferably of at least 0.5% by moles, still more preferably of at least 1% by moles, with respect to the total moles of recurring units of said polymer (FC).
- the polymer (FC) comprises recurring units derived from at least one monomer (H′ F ) in an amount preferably of at most 8% by moles, more preferably of at most 7% by moles, even more preferably of at most 5% by moles, still more preferably of at most 3% by moles, with respect to the total moles of recurring units of said polymer (FC).
- the polymer (FC) may further comprise recurring units derived from at least one fluorinated monomer [monomer (F)] different from vinylidene fluoride (VDF).
- the polymer (FC) of the invention comprises typically from 2% to 20% by moles, preferably from 3% to 18% by moles, more preferably from 4% to 15% by moles, with respect to the total moles of recurring units of said polymer (FC), of recurring units derived from said monomer (F).
- the polymer (FC) may further comprise recurring units derived from at least one hydrogenated monomer [monomer (H)] different from the monomer (H′ F ).
- the polymer (FC) obtainable by the process of the invention is typically recovered and then dried.
- Drying can be performed under modified atmosphere, e.g. under an inert gas, typically exempt notably from moisture (water vapour content of less than 0.001% v/v), or can be performed under vacuum.
- modified atmosphere e.g. under an inert gas, typically exempt notably from moisture (water vapour content of less than 0.001% v/v), or can be performed under vacuum.
- Drying can be performed at room temperature (about 25° C.) or at a temperature exceeding 25° C., this latter condition being generally preferred.
- the low molecular weight side products generated by reaction of at least one polymer (F) and at least one compound (MA), which can be notably water or alcohols as a function of the nature of the compound (MA), are at least partially removed from the polymer (FC), possibly further promoting, by combined action of heat and side products removal, additional reaction of said at least one polymer (F) and said at least one compound (MA).
- drying temperature having regards, inter alia, of not causing the polymer (FC) to crosslink.
- composition (CC) comprising:
- the crosslinking co-agent is typically a poly(meth)acrylic compound [compound (PMA)] comprising at least two end groups of formula (XI): —O—C(O)—C(R 7 ) ⁇ CR 8 R 9 (XI) wherein each of R 7 , R 8 and R 9 , equal to or different from each other, is independently a hydrogen atom or a C 1 -C 3 hydrocarbon groups.
- the compound (PMA) preferably comprises at most six end groups of formula (XI) as defined above.
- the compound (PMA) is more preferably selected from the group consisting of ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,3-butylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, ethoxylated bisphenol A di(meth)acrylate, cyclohexane dimethanol di(meth)acrylate, tris[2-(acryloyloxy)ethyl]isocyanurate, trimethylol propane triacrylate, ethylene oxide added trimethylol propane triacrylate, pentaerythritol triacrylate, tris(acrylooxyethyl)isocyanurate, dipentaerythritol hexaacrylate and cap
- the crosslinking initiator may be a photoinitiator [initiator (PI)] or a thermal initiator [initiator (TI)].
- PI photoinitiator
- TI thermal initiator
- the dose of the UV radiation will be adjusted by the skilled in the art as a function of the type and concentration of the photoinitiator [initiator (PI)]; generally, good results have been obtained with radiation doses of at least 2 J/cm 2 , preferably of at least 5 J/cm 2 .
- the crosslinkable fluoropolymer film may be submitted to a UV radiation under a substantially oxygen-free atmosphere.
- UV treatment is carried out under nitrogen atmosphere.
- the photoinitiator is typically selected from the group consisting of alpha-hydroxyketones, phenylglyoxylates, benzyldimethyl-ketals, alpha-aminoketones and bis acyl-phosphines.
- phenylglyoxylates mention can be made of methylbenzoylformate, oxy-phenyl-acetic acid 2-[2-oxo-2-phenyl-acetoxy-ethoxy]-ethyl ester, and oxy-phenyl-acetic 2-[2-hydroxy-ethoxy]-ethyl ester.
- alpha-aminoketones mention can be made of
- initiators those which are liquid at room temperature are preferred.
- a class of initiators (PI) which gave particularly good results has been that of alpha-hydroxyketones, in particular 2-hydroxy-2-methylpropylphenone.
- the amount of initiator (PI) in the composition (CC) is not particularly limited. It will be generally used in an amount comprised between 0.01% and 10% by weight, with respect to the total weight of the composition (CC). According to an embodiment of the invention, the composition (CC) comprises at least one initiator (PI) in an amount comprised between 3% and 7% by weight, with respect to the total weight of the composition (CC).
- the thermal initiator [initiator (TI)] is typically selected from the group consisting of organic peroxides.
- composition (CC) might possibly comprise further additives and ingredients, provided that they do not interfere with light transmission.
- H F Total average monomer content in polymers (F) was determined by acid-base titration.
- the polymer (F-1) (25 g) having EW of 9280 g/eq (2.7 meq. —CH 2 CH 2 OH; 10.8 acrylate chains/100000 g/mole) was dissolved in 350 ml of methyl ethyl ketone at 85° C. and placed in a previously flame-dried 3-necked round-bottomed flask equipped with a reflux condenser, a dripping funnel, a thermometer and a mechanical stirrer. The solution was heated to 75° C. and then 2-isocyanatoethyl methacrylate (420 mg, 2.7 mmol free —NCO) and a catalytic amount (0.1 mol % vs.
- Active sites 10.4 acrylate sites/100000 g/mol of polymer (FC-1).
- the polymer (F-2) (2.0 g) having EW of 9259 g/eq (0.216 meq —COOH; 8 acrylate chains/100000 g/mole) was dissolved in 20 ml of ethyl acetate in a 250 ml 4-necked glass reaction flask equipped with a magnetic stirrer, a condenser, a thermometer and a dripping funnel.
- the reactor was placed in an inert atmosphere (N 2 ) with vigorous stirring and heated to 55° C. until the polymer (F-2) was completely dissolved.
- the reactor was then cooled to 20° C.
- Active sites 6.5 acrylate sites/100000 g/mol
- the polymer (F-1) (0.5 g) was dissolved in 20 ml of ethyl acetate at 20° C. The mixture was placed in a Petri dish to which 50 ml of a 10% v/v solution of methylene-4-4′biscyclohexylisocyanate (0.02 mmol, 0.04 meq —NCO) and 10 ml of a 2% solution of di-tert-butyl tin bislaurate as catalyst were added. The mixture so obtained was heated in an oven at 55° C. for 3 hours at atmospheric pressure.
- Specimens of any of the polymers obtained according to Examples 1 and 2 were dissolved in a mixture containing triethyl phosphate, propylene glycol monomethyl ether acetate and cyclopentanone so as to provide, after 3 hours of stirring at a temperature of 40° C., solutions having a concentration of 10% by weight.
- the solutions so obtained were loaded into a Laurell WS-650 LITE SERIES spin coater and spin-coated at a speed of 2000 rpm onto silicon wafer substrates in order to obtain very thin polymeric layers on silicon wafer as substrate.
- the polymer layers so obtained were dried at 85° C. for 20 minutes. For each example, two polymeric films on silicon wafer were prepared.
- the samples thereby obtained were all homogeneous.
- the thickness of the samples has been measured using a Filmetrics F20 unit.
- the polymer films so obtained were submitted to crosslinking either by UV treatment or by thermal treatment.
- Thermal treatment consisted in maintaining samples of films so obtained in a ventilated oven at a temperature of about 125° C. for 20 minutes.
- samples of films obtained according to procedure (A) but using a composition comprising any of the polymers obtained according to Examples 1 and 2 and at least one additive selected from the group consisting of crosslinking initiators were passed through a semi-automatic crosslinker device based on a UV lamp and equipped with a moving belt carrying the samples for 30 seconds equivalent to 3 steps of 10 seconds each.
- the crosslinking initiator was selected from the group consisting of photoinitiators (PI).
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PCT/EP2015/053873 WO2015128339A1 (en) | 2014-02-28 | 2015-02-25 | Crosslinkable fluoropolymers |
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US10566352B2 (en) * | 2017-12-07 | 2020-02-18 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Array substrate and manufacturing method thereof |
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- 2015-02-25 WO PCT/EP2015/053873 patent/WO2015128339A1/en active Application Filing
- 2015-02-25 PL PL15707094T patent/PL3110859T3/pl unknown
- 2015-02-25 JP JP2016553883A patent/JP6783661B2/ja active Active
- 2015-02-25 US US15/121,266 patent/US10696768B2/en active Active
- 2015-02-25 EP EP15707094.7A patent/EP3110859B1/en active Active
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Publication number | Publication date |
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US20160362512A1 (en) | 2016-12-15 |
PL3110859T3 (pl) | 2020-12-14 |
JP6783661B2 (ja) | 2020-11-11 |
JP2017506691A (ja) | 2017-03-09 |
HUE050973T2 (hu) | 2021-01-28 |
WO2015128339A1 (en) | 2015-09-03 |
EP3110859B1 (en) | 2020-07-01 |
EP3110859A1 (en) | 2017-01-04 |
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