TWM473610U - Transistor structure - Google Patents

Transistor structure Download PDF

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Publication number
TWM473610U
TWM473610U TW102215609U TW102215609U TWM473610U TW M473610 U TWM473610 U TW M473610U TW 102215609 U TW102215609 U TW 102215609U TW 102215609 U TW102215609 U TW 102215609U TW M473610 U TWM473610 U TW M473610U
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Taiwan
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pad
transistor
die
lead
capacitor
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TW102215609U
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Chinese (zh)
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Kuo-Fan Lin
Chi-Shang Lin
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Fsp Technology Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/4813Connecting within a semiconductor or solid-state body, i.e. fly wire, bridge wire
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]

Abstract

A transistor structure includes a chip package and two pins, wherein the chip package includes a transistor die and a molding compound encapsulating the transistor die. One of the pins is electrically connected to a first bonding pad and a second bonding pad of the transistor die, and another of the pins is electrically connected to a third bonding pad of the transistor die. The transistor structure may be employed in a snubber circuit to connect an active component or a load in parallel to absorb spikes or noise generated by the active component while the active component is switching at a high frequency. Therefore, the packaging of the transistor structure could simplify the process, reduce size, increase the withstanding voltage, and improve the efficiency and reduce the spike voltage of the power supply of the snubber circuit.

Description

電晶體結構Crystal structure

本創作是有關於一種電晶體結構,尤其是有關於一種具有二導腳的電晶體結構。The present invention relates to a crystal structure, and more particularly to a transistor structure having a two-lead leg.

近年來由於電子電路的技術不斷地發展,各種電力/電子元件之保護電路被廣泛地實施於諸多應用中。傳統的保護電路當中,例如一RCD阻尼器電路,請參閱第十九圖所示,係將電阻R6與電容C12並接後,串接二極體D11而形成一RCD阻尼器電路400。然而,該RCD阻尼器電路之能量損耗很高、效率差且突波電壓值高,故採用傳統的RCD阻尼器電路易造成半導體元件的損壞。因此,需要一種新穎的電子元件可取代二極體D11以提升阻尼器電路的電路保護之效能。In recent years, as the technology of electronic circuits has been continuously developed, various protection circuits for electric/electronic components have been widely implemented in many applications. In the conventional protection circuit, for example, an RCD damper circuit, as shown in FIG. 19, after the resistor R6 is connected to the capacitor C12, the diode D11 is connected in series to form an RCD damper circuit 400. However, the RCD damper circuit has high energy loss, low efficiency, and high surge voltage value, so the conventional RCD damper circuit is liable to cause damage to the semiconductor component. Therefore, there is a need for a novel electronic component that can replace the diode D11 to enhance the circuit protection performance of the damper circuit.

本創作之一目的在提供一種電晶體結構,係可使用於阻尼器電路,讓阻尼器電路可有效保護元件及提高效率。One of the aims of the present invention is to provide a transistor structure that can be used in a damper circuit to allow the damper circuit to effectively protect components and improve efficiency.

本創作之一目的在提供一種電晶體結構,係可簡化製程、縮小體積以及增加耐壓距離。One of the purposes of this creation is to provide a transistor structure that simplifies the process, reduces the volume, and increases the withstand voltage.

為達上述目的,本創作之電晶體結構係包含一晶片封裝體以及二導腳,其中該晶片封裝體係包含一電晶體晶粒及一包覆該電晶體晶粒之封裝膠體;而該等導腳之一第一導腳係電性連接該電晶體晶粒之第一焊墊與第二焊墊,該等導腳之一第二導腳係電性連接該電晶體晶粒之第三焊墊。In order to achieve the above object, the transistor structure of the present invention comprises a chip package and a second lead, wherein the chip package system comprises an oxide crystal grain and an encapsulant covering the crystal grain; and the conductive guide One of the first leg of the foot is electrically connected to the first pad and the second pad of the transistor die, and the second leg of the pin is electrically connected to the third pad of the transistor die pad.

如上所述之電晶體結構,其中該電晶體結構之第一導腳或第二導腳係連接一電容器之一端,而形成一阻尼器(snubber)電路以並接一主動元件或一負載。The transistor structure as described above, wherein the first lead or the second lead of the transistor structure is connected to one end of a capacitor to form a snubber circuit to be connected to an active component or a load.

如上所述之電晶體結構,其中該晶片封裝體更包含一電容晶粒,其中該電容晶粒之第一焊墊係電性連接該電晶體晶粒之第一焊墊或第三焊墊,而該電容晶粒之第二焊墊係電性連接該第一導腳或第二導腳,且該封裝膠體係包覆該電容晶粒。The transistor structure as described above, wherein the chip package further comprises a capacitor die, wherein the first pad of the capacitor die is electrically connected to the first pad or the third pad of the transistor die, The second pad of the capacitor die is electrically connected to the first lead or the second lead, and the encapsulant system covers the capacitor die.

如上所述之電晶體結構,其中該晶片封裝體更包含一齊納二極體(Zener Diode)晶粒,其中該齊納二極體晶粒之第一焊墊係電性連接該電容晶粒之第一焊墊與該電晶體晶粒之第一焊墊或第三焊墊,而該齊納二極體晶粒之第二焊墊係電性連接該電容晶粒之第二焊墊或該電晶體晶粒之第一焊墊或第三焊墊,且該封裝膠體係包覆該齊納二極體晶粒。The transistor structure as described above, wherein the chip package further comprises a Zener Diode die, wherein the first pad of the Zener diode die is electrically connected to the capacitor die a first pad or a first pad or a third pad of the transistor die, and a second pad of the Zener diode die is electrically connected to the second pad of the capacitor die or the a first pad or a third pad of the transistor die, and the encapsulant system encapsulates the Zener diode die.

如上所述之電晶體結構,其中該晶片封裝體更包含一電阻晶粒,其中該電阻晶粒之第一焊墊係電性連接該電晶體晶粒之第一焊墊或第三焊墊,而該電阻晶粒之第二焊墊係電性連接該電容晶粒之第一焊墊,且該封裝膠體係包覆該電阻晶粒The transistor structure as described above, wherein the chip package further comprises a resistor die, wherein the first pad of the resistor die is electrically connected to the first pad or the third pad of the transistor die, The second pad of the resistor die is electrically connected to the first pad of the capacitor die, and the package system covers the resistor die

如上所述之電晶體結構,其中該電容器之一端更連接一齊納二極體之一端,該電容器之另一端係連接該齊納二極體之另一端,而形成一阻尼電路以並接一主動元件或一負載。The transistor structure as described above, wherein one end of the capacitor is further connected to one end of a Zener diode, and the other end of the capacitor is connected to the other end of the Zener diode to form a damping circuit to be connected in an active manner. Component or a load.

如上所述之電晶體結構,其中該電晶體結構之第一導腳或第二導腳係連接一電阻器之一端,該電阻器之另一端係連接一電容器之一端,而形成一阻尼電路以並接一主動元件或一負載。The transistor structure as described above, wherein the first lead or the second lead of the transistor structure is connected to one end of a resistor, and the other end of the resistor is connected to one end of a capacitor to form a damping circuit. Connect an active component or a load.

如上所述之電晶體結構,其中該主動元件係為一金屬氧化物半導體場效電晶體(MOSFET)、一二極體(diode)、一雙極性接面電晶體(BJT)、一絕緣閘雙極性電晶體(IGBT)、一靜電感應電晶體(SIT)、一閘流體或其組成之電路,而該負載係為一電感、一電阻、一電容或其組成之電路。The transistor structure as described above, wherein the active device is a metal oxide semiconductor field effect transistor (MOSFET), a diode, a bipolar junction transistor (BJT), and an insulating gate double A polar transistor (IGBT), an electrostatic induction transistor (SIT), a thyristor or a circuit thereof, and the load is an inductor, a resistor, a capacitor or a circuit thereof.

如上所述之電晶體結構,其中該電晶體晶粒係為一雙極性接面電晶體晶粒。The transistor structure as described above, wherein the transistor crystal grain is a bipolar junction transistor crystal grain.

如上所述之電晶體結構,其中該電晶體晶粒之第一焊墊係 為一射極焊墊,該第二焊墊係為一基極焊墊,而該第三焊墊係為一集極焊墊。a transistor structure as described above, wherein the first pad of the transistor die For an emitter pad, the second pad is a base pad, and the third pad is a collector pad.

如上所述之電晶體結構,其中該晶片封裝體更包含一晶片座,且該電晶體晶粒係透過一黏著層配置在該晶片座上。The transistor structure as described above, wherein the chip package further comprises a wafer holder, and the transistor crystal grain is disposed on the wafer holder through an adhesive layer.

藉此,使本創作之電晶體結構利用一導腳電性連接該電晶體晶粒之第一焊墊與第二焊墊,另一導腳係電性連接該電晶體晶粒之第三焊墊,可將該電晶體結構使用於阻尼器電路,或是將阻尼器電路直接封裝在二導腳電晶體結構中以並接一主動元件或一負載,而可吸收主動元件在高頻切換時產生之突波或雜訊,使該電晶體結構在封裝上可達到簡化製程、縮小體積以及增加耐壓距離之功效,且可讓使用阻尼器電路之電源供應器達到提高效率及降低突波電壓之功效。Thereby, the transistor structure of the present invention is electrically connected to the first pad and the second pad of the transistor die by using a lead pin, and the other lead is electrically connected to the third pad of the transistor die. Pad, the transistor structure can be used in the damper circuit, or the damper circuit can be directly packaged in the two-lead transistor structure to connect an active component or a load, and the absorbing active component can be switched at high frequency. The surge or noise generated makes the transistor structure on the package to simplify the process, reduce the volume and increase the withstand voltage, and can improve the efficiency and reduce the surge voltage by using the power supply of the damper circuit. The effect.

應瞭解的是,上述一般描述及以下具體實施方式僅為例示性及闡釋性的,其並不能限制本創作所欲主張之範圍。It is to be understood that the foregoing general description and the following claims

1‧‧‧晶片封裝體1‧‧‧ chip package

11‧‧‧電晶體晶粒11‧‧‧Optocrystalline grains

111、131、141‧‧‧第一焊墊111, 131, 141‧‧‧ first pad

112、132、142‧‧‧第二焊墊112, 132, 142‧‧‧second solder pads

113‧‧‧第三焊墊113‧‧‧ Third pad

114‧‧‧第四焊墊114‧‧‧fourth pad

12‧‧‧封裝膠體12‧‧‧Package colloid

13‧‧‧電容晶粒13‧‧‧Capacitor crystal

14‧‧‧齊納二極體晶粒14‧‧‧Zina diode grain

151~153‧‧‧導線151~153‧‧‧ wire

16‧‧‧黏著層16‧‧‧Adhesive layer

17‧‧‧晶片座17‧‧‧ Wafer holder

18‧‧‧焊料18‧‧‧ solder

181‧‧‧第一焊料181‧‧‧First solder

182‧‧‧第二焊料182‧‧‧second solder

183‧‧‧第三焊料183‧‧‧ Third solder

184‧‧‧第四焊料184‧‧‧fourth solder

2、3‧‧‧導腳2, 3‧‧ ‧ lead

Q‧‧‧電晶體結構Q‧‧‧Optocrystal structure

C‧‧‧電容C‧‧‧ capacitor

D‧‧‧齊納二極體D‧‧‧Zina diode

第一A圖係為本創作第一實施例之電晶體結構示意圖。The first A diagram is a schematic diagram of the structure of the transistor of the first embodiment of the creation.

第一B圖係為本創作第二實施例之電晶體結構示意圖。The first B diagram is a schematic diagram of the structure of the transistor of the second embodiment of the creation.

第一C圖係為本創作第三實施例之電晶體結構示意圖。The first C diagram is a schematic diagram of the structure of the transistor of the third embodiment of the creation.

第二A圖係為本創作之電晶體晶粒為雙極性接面電晶體晶粒之示意圖。The second A picture is a schematic diagram of the transistor crystal grain of the present invention being a bipolar junction transistor crystal grain.

第二B圖係為本創作之電晶體晶粒為雙極性接面電晶體晶粒之示意圖。The second B diagram is a schematic diagram of the transistor crystal grains of the present invention being bipolar junction transistor crystal grains.

第二C圖係為本創作之雙極性接面電晶體晶粒與電容晶粒連接之示意圖。The second C picture is a schematic diagram of the bipolar junction transistor die and the capacitor die connection.

第二D圖係為本創作之雙極性接面電晶體晶粒與電容晶粒、齊納二極體連接之示意圖。The second D picture is a schematic diagram of the bipolar junction transistor crystal grain and the capacitor die and the Zener diode connected.

第三圖至第七圖係為本創作利用打線接合方式電性連接導腳與焊墊之各實施例電晶體封裝之剖面示意圖。The third to seventh figures are schematic cross-sectional views of the transistor packages of the embodiments in which the lead wires and the pads are electrically connected by wire bonding.

第八圖至第九圖係為本創作利用覆晶接合方式電性連接導腳與焊墊之各實施例電晶體封裝之剖面示意圖。The eighth to ninth drawings are schematic cross-sectional views of the transistor packages of the embodiments in which the lead pins and the pads are electrically connected by a flip chip bonding method.

第十A圖至第十一D圖係為本創作之各實施例電晶體封裝之立體外觀圖。10A to 11D are perspective views of the transistor package of the respective embodiments of the present invention.

第十二圖係為本創作之電晶體結構所適用之阻尼器電路。The twelfth figure is the damper circuit to which the present transistor structure is applied.

第十三圖係為本創作電晶體封裝方法之第一實施例之流程圖。The thirteenth figure is a flow chart of the first embodiment of the present invention.

第十四圖係為本創作電晶體封裝方法之第二實施例之流程圖。The fourteenth embodiment is a flow chart of the second embodiment of the present invention.

第十五圖係為本創作電晶體封裝方法之第三實施例之流程圖。The fifteenth figure is a flow chart of the third embodiment of the present invention.

第十六圖係為本創作電晶體封裝方法之第四實施例之流程圖。The sixteenth embodiment is a flow chart of the fourth embodiment of the present invention.

第十七圖係為本創作電晶體封裝方法之第五實施例之流程圖。The seventeenth embodiment is a flow chart of the fifth embodiment of the present invention.

第十八圖係為本創作電晶體封裝方法之第六實施例之流程圖。The eighteenth figure is a flow chart of the sixth embodiment of the present invention.

第十九圖係為習知RCD阻尼器電路的示意圖。The nineteenth diagram is a schematic diagram of a conventional RCD damper circuit.

本創作之其他特徵及具體實施例可於以下配合附圖之詳細說明中,進一步得到瞭解。Other features and embodiments of the present invention can be further understood from the following detailed description in conjunction with the drawings.

請參閱第一A圖所示,係為本創作第一實施例之電晶體結構示意圖,本創作之電晶體結構係包含一晶片封裝體1以及二導腳2、3,其中該晶片封裝體1係包含一電晶體晶粒11及一包覆電晶體晶粒11之封裝膠體12;而導腳2係電性連接該電晶體晶粒11之第一焊墊111與第二焊墊112,導腳3係電性連接該電晶體晶粒11之第三焊墊113。Referring to FIG. 1A, it is a schematic diagram of a transistor structure according to a first embodiment of the present invention. The transistor structure of the present invention comprises a chip package 1 and two lead pins 2, 3, wherein the chip package 1 The method includes a transistor die 11 and a package colloid 12 covering the transistor die 11; and a lead 2 electrically connected to the first pad 111 and the second pad 112 of the transistor die 11 The leg 3 is electrically connected to the third pad 113 of the transistor die 11.

而本實施例之電晶體結構之電晶體晶粒11係為一雙極性接面電晶體(Bipolar Junction Transistor,BJT)晶粒,該雙極性接面電晶體晶粒係可為一NPN型雙極性接面電晶體晶粒或一PNP型雙極性接面電晶體晶粒,請同時參閱第一圖、第二A圖及第二B圖所示,該電晶體晶粒11之第一焊墊111係為一射極(Emitter)焊墊,該第二焊墊112係為一基極(Base)焊墊,而該第三焊墊113係為一集極(Collector)焊墊,其中射極焊墊與基極焊墊係電性連接該導腳2,而集極焊墊係電性連接該導腳3。The transistor crystal 11 of the transistor structure of the embodiment is a Bipolar Junction Transistor (BJT) crystal, and the bipolar junction crystal grain system can be an NPN bipolar. The junction transistor crystal grain or a PNP type bipolar junction transistor crystal grain, please refer to the first figure, the second A picture and the second B picture, the first pad 111 of the transistor crystal grain 11 It is an emitter (Emitter) pad, the second pad 112 is a base pad, and the third pad 113 is a collector pad, wherein the emitter pad is soldered. The pad and the base pad are electrically connected to the lead 2, and the collector pad is electrically connected to the lead 3.

因此,本實施例之雙極性接面電晶體晶粒之基極與射極係導通,且基於該雙極性接面電晶體晶粒之基極與集極間的至少一接 面特性,使該電晶體結構具有導通快、恢復時間(Storage Time)慢、變換緩和以及基極-集極接面電容Cbc 小之特性,而可利用該電晶體結構作為一快速二極體,以用於一阻尼器(snubber)電路。Therefore, the base of the bipolar junction transistor crystal grain of the embodiment is electrically connected to the emitter system, and based on at least one junction characteristic between the base and the collector of the bipolar junction transistor crystal grain, The transistor structure has the characteristics of fast conduction, slow recovery time, moderate relaxation, and small base-collector junction capacitance C bc , and the transistor structure can be utilized as a fast diode for one Damper circuit.

其中該阻尼器電路可為以下結構:(1)CB阻尼器電路,利用本實施例之電晶體結構之導腳2或導腳3連接一電容器之一端,而形成一阻尼器電路以並接一主動元件或一負載(未圖示);(2)ZCB阻尼器電路,利用本實施例之電晶體結構Q之導腳2或導腳3連接一電容器C之一端以及一齊納二極體D之一端,且該電容器C之另一端連接該齊納二極體D之另一端,而形成一阻尼器電路(如第十二圖所示)以與一主動元件或一負載並接;(2)RCB阻尼器電路,利用本實施例之電晶體結構之導腳2或導腳3連接一電阻器之一端,且該電阻器之另一端連接一電容器之一端,而形成一阻尼器電路以並接一主動元件或一負載(未圖示)。The damper circuit can be configured as follows: (1) a CB damper circuit, which is connected to one end of a capacitor by using a lead 2 or a lead 3 of the transistor structure of the embodiment to form a damper circuit to be connected one after another. An active component or a load (not shown); (2) a ZCB damper circuit, which is connected to one end of a capacitor C and a Zener diode D by using a lead 2 or a lead 3 of the transistor structure Q of the present embodiment. One end, and the other end of the capacitor C is connected to the other end of the Zener diode D to form a damper circuit (as shown in FIG. 12) to be connected with an active component or a load; (2) The RCB damper circuit is connected to one end of a resistor by using the lead 2 or the lead 3 of the transistor structure of the embodiment, and the other end of the resistor is connected to one end of a capacitor to form a damper circuit for parallel connection. An active component or a load (not shown).

其中該主動元件係為一金屬氧化物半導體場效電晶體(Metal Oxide Semiconductor Field Effect Transistor,MOSFET)、一二極體(diode)、一雙極性接面電晶體(BJT)、一絕緣閘雙極性電晶體(IGBT)、一靜電感應電晶體(SIT)、一閘流體或其組成之電路,而該負載係為一電感、一電阻、一電容或其組成之電路,例如,阻尼器電路與一交換電源供應器之變壓器的一次側並接後與一金屬氧化物半導體場效電晶體串接,或是阻尼器電路與交換電源供應器之變壓器的二次側、一金屬氧化物半導體場效電晶體並接,或是阻尼器電路與一金屬氧化物半導體場效電晶體並接後與交換電源供應器之變壓器的二次側串接,而可吸收主動元件在高頻切換時所產生之突波(spike)或雜訊,藉此,可降低主動元件產生之突波電壓以及提高效率。The active component is a Metal Oxide Semiconductor Field Effect Transistor (MOSFET), a diode, a bipolar junction transistor (BJT), and an insulated gate bipolar. a transistor (IGBT), an electrostatic induction transistor (SIT), a thyristor or a circuit thereof, and the load is an inductor, a resistor, a capacitor or a circuit thereof, for example, a damper circuit and an exchange The primary side of the transformer of the power supply is connected in parallel with a metal oxide semiconductor field effect transistor, or the secondary side of the transformer of the damper circuit and the switching power supply, and a metal oxide semiconductor field effect transistor Parallel connection, or the damper circuit is connected with a metal oxide semiconductor field effect transistor and connected to the secondary side of the transformer of the switching power supply, and can absorb the surge generated by the active component during high frequency switching. (spike) or noise, thereby reducing the surge voltage generated by the active device and improving efficiency.

請參閱表1及表2所示,表1係為傳統RCD阻尼器電路的實驗測試結果,而表2係為本實施例之電晶體結構用於上述之RCB阻尼器電路的實驗測試結果,且該RCD阻尼器電路及該RCB阻尼器電路皆與一變壓器的一次側並接後與一金屬氧化物半導體場效電晶體 串接,由表1及表2列出之測試結果,該實驗可證實本實施例之RCB阻尼器電路(其測試結果為表2)之效率遠超過傳統RCD阻尼器電路(其測試結果為表1)之效率。尤其是,阻尼器電路電性連接一輕負載的狀況下,其中本創作之輕負載係為指定負載之百分比(Percent of Rated Load)小(等)於20%,亦即負載占全負載的20%以下,例如:指定負載之百分比為1%~20%;而同樣在指定負載之百分比為1%時,表二(RCB阻尼器電路)相較於表一(RCD阻尼器電路)可增加10.75%(57.84%→68.59%)之效率,又,同樣在指定負載之百分比為20%時,表二相較於表一亦可增加1.23%(88.22%→89.45%)之效率。Referring to Table 1 and Table 2, Table 1 is the experimental test result of the conventional RCD damper circuit, and Table 2 is the experimental test result of the transistor structure of the present embodiment used for the above-mentioned RCB damper circuit, and The RCD damper circuit and the RCB damper circuit are both connected to the primary side of a transformer and a metal oxide semiconductor field effect transistor Serial connection, the test results listed in Table 1 and Table 2, this experiment can confirm that the RCB damper circuit of this embodiment (the test result is Table 2) is much more efficient than the conventional RCD damper circuit (the test result is a table) 1) Efficiency. In particular, the damper circuit is electrically connected to a light load, wherein the light load of the present invention is a percentage of the specified load (Percent of Rated Load) is small (equal) to 20%, that is, the load accounts for 20% of the full load. Below %, for example, the percentage of the specified load is 1% to 20%; and when the percentage of the specified load is 1%, Table 2 (RCB damper circuit) can be increased by 10.75 compared to Table 1 (RCD damper circuit). The efficiency of % (57.84% → 68.59%), and also the percentage of the specified load is 20%, Table 2 can also increase the efficiency of 1.23% (88.22% → 89.45%) compared with Table 1.

藉此,本實施例之RCB阻尼器電路相較於傳統之RCD阻尼器電路,而可在輕負載時達到提高效率之功效,其中本實施例之阻尼器電路300A除在輕負載時效率有明顯的增加外,由表1及表2之Average_Efficiency可得知在重負載時(25%~100%)之平均效率係小幅增加0.3%。因此,使用本創作電晶體結構做為阻尼器電路之電源供應器相較於使用RCD阻尼器電路之電源供應器,具有較高的轉換效率,尤其在輕載的情況下更為明顯。Thereby, the RCB damper circuit of the embodiment can achieve the effect of improving efficiency under light load compared with the conventional RCD damper circuit, wherein the damper circuit 300A of the embodiment has obvious efficiency except for light load. In addition, the Average_Efficiency of Tables 1 and 2 shows that the average efficiency during heavy load (25%~100%) is slightly increased by 0.3%. Therefore, the power supply using the present transistor structure as the damper circuit has higher conversion efficiency than the power supply using the RCD damper circuit, especially in the case of light load.

請參閱第一B圖所示,係為本創作第二實施例之電晶體結構示意圖,本創作之電晶體結構係包含一晶片封裝體1以及二導腳2、3, 其中該晶片封裝體1係包含一電晶體晶粒11、一電容晶粒13以及一包覆該電晶體晶粒11與該電容晶粒13之封裝膠體12,該電晶體晶粒11之第三焊墊113係電性連接該電容晶粒13之第一焊墊131,而導腳2係電性連接該電晶體晶粒11之第一焊墊111與第二焊墊112,另一導腳3係電性連接該電容晶粒13之第二焊墊132;其中,本實施例之電晶體結構係可將該電晶體晶粒11之第一焊墊111(或第二焊墊112)電性連接該電容晶粒13之第一焊墊131,而導腳2電性連接該電容晶粒13之第二焊墊132,另一導腳3電性連接該電晶體晶粒11之第三焊墊113(未圖示),但不以此為限;請同時參閱第二C圖,本實施例之電晶體晶粒11係為一雙極性接面電晶體(Bipolar Junction Transistor,BJT)晶粒,該雙極性接面電晶體晶粒係可為一NPN型雙極性接面電晶體晶粒或一PNP型雙極性接面電晶體晶粒。Referring to FIG. 2B, it is a schematic diagram of a transistor structure according to a second embodiment of the present invention. The transistor structure of the present invention comprises a chip package 1 and two lead pins 2 and 3. The chip package 1 includes a transistor die 11 , a capacitor die 13 , and a package colloid 12 covering the transistor die 11 and the capacitor die 13 . The transistor die 11 is the third. The pad 113 is electrically connected to the first pad 131 of the capacitor die 13 , and the pin 2 is electrically connected to the first pad 111 and the second pad 112 of the transistor die 11 , and the other pin 3 is electrically connected to the second pad 132 of the capacitor die 13; wherein, the transistor structure of the embodiment can electrically charge the first pad 111 (or the second pad 112) of the transistor die 11 The first pad 131 of the capacitor die 13 is connected, and the pin 2 is electrically connected to the second pad 132 of the capacitor die 13. The other leg 3 is electrically connected to the third die of the transistor die 11. Pad 113 (not shown), but not limited thereto; please refer to FIG. 2C at the same time, the transistor crystal 11 of the embodiment is a Bipolar Junction Transistor (BJT) crystal. The bipolar junction transistor crystal grain may be an NPN type bipolar junction transistor crystal grain or a PNP type bipolar junction transistor crystal grain.

因此,本實施例之雙極性接面電晶體晶粒之基極與射極係導通,且基於該雙極性接面電晶體晶粒之基極與集極間的至少一接面特性,使該電晶體結構具有導通快、恢復時間慢、變換緩和以及基極-集極接面電容Cbc 小之特性,而可利用該電晶體晶粒作為一快速二極體,並透過與電容晶粒的電性連接,使電晶體結構形成一CB阻尼器電路,因此,該電晶體結構在封裝及應用電路的使用上可達到簡化製程、縮小體積以及增加耐壓距離之功效;其中該CB阻尼器電路可並接一主動元件或一負載(未圖示),該主動元件係為一金屬氧化物半導體場效電晶體(MOSFET)、一二極體(diode)、一雙極性接面電晶體(BJT)、一絕緣閘雙極性電晶體(IGBT)、一靜電感應電晶體(SIT)、一閘流體或其組成之電路,而該負載係為一電感、一電阻、一電容或其組成之電路,例如該CB阻尼器電路與一交換電源供應器之變壓器的一次側並接後與一金氧半場效電晶體串接,而可吸收主動元件在高頻切換時所產生之突波(spike)或雜訊,藉此,可降低主動元件產生之突波電壓以及提高效率。Therefore, the base of the bipolar junction transistor crystal grain of the embodiment is electrically connected to the emitter system, and based on at least one junction characteristic between the base and the collector of the bipolar junction transistor crystal grain, The transistor structure has the characteristics of fast conduction, slow recovery time, moderate relaxation, and small base-collector junction capacitance C bc , and the transistor crystal grain can be utilized as a fast diode and transmitted through the capacitor die. The electrical connection makes the transistor structure form a CB damper circuit. Therefore, the transistor structure can achieve the effects of simplifying the process, reducing the volume, and increasing the withstand voltage in the use of the package and the application circuit; wherein the CB damper circuit An active component or a load (not shown) may be connected in parallel. The active component is a metal oxide semiconductor field effect transistor (MOSFET), a diode, and a bipolar junction transistor (BJT). An insulating gate bipolar transistor (IGBT), an electrostatic induction transistor (SIT), a gate fluid or a circuit thereof, and the load is an inductor, a resistor, a capacitor or a circuit thereof, for example The CB damper circuit is in contact with The primary side of the transformer of the power supply is connected in parallel with a gold-oxygen half-field effect transistor, and can absorb the spike or noise generated by the active component during high-frequency switching, thereby reducing the initiative. The surge voltage generated by the component and improved efficiency.

其中,本實施例之電晶體結構之晶片封裝體1係可包含一電阻晶粒,並將該電阻晶粒串接於該電晶體晶粒11與該電容晶粒13之間, 亦即該電阻晶粒之第一焊墊係電性連接該電晶體晶粒11之第一焊墊111或第三焊墊113,而該電阻晶粒之第二焊墊係電性連接該電容晶粒13之第一焊墊131(未圖示),且該封裝膠體12係包覆該電阻晶粒,使電晶體結構形成一RCB阻尼器電路,因此,該電晶體結構在封裝及應用電路的使用上可達到簡化製程、縮小體積以及增加耐壓距離之功效。The chip package 1 of the transistor structure of the present embodiment may include a resistor die, and the resistor die is connected in series between the transistor die 11 and the capacitor die 13 . That is, the first pad of the resistor die is electrically connected to the first pad 111 or the third pad 113 of the transistor die 11, and the second pad of the resistor die is electrically connected to the capacitor. a first pad 131 (not shown) of the die 13 , and the encapsulant 12 encapsulates the resistor die to form an RCB damper circuit, so that the transistor structure is encapsulated and applied It can be used to simplify the process, reduce the volume and increase the pressure distance.

請參閱第一C圖所示,係為本創作第三實施例之電晶體結構示意圖,本創作之電晶體結構係包含一晶片封裝體1以及二導腳2、3,其中該晶片封裝體1係包含一電晶體晶粒11、一電容晶粒13、一齊納二極體晶粒14以及一包覆該電晶體晶粒11、該電容晶粒13與該齊納二極體晶粒14之封裝膠體12,該電晶體晶粒11之第三焊墊113係電性連接該電容晶粒13之第一焊墊131及該齊納二極體晶粒14之第一焊墊141;而導腳2係電性連接該電晶體晶粒11之第一焊墊111與第二焊墊112,另一導腳3係電性連接該電容晶粒13之第二焊墊132及該齊納二極體晶粒14之第二焊墊142;其中,本實施例之電晶體結構係可將該電晶體晶粒11之第一焊墊111與第二焊墊112電性連接該電容晶粒13之第一焊墊131與該齊納二極體晶粒14之第一焊墊141,而導腳2電性連接該電容晶粒13之第二焊墊132與該齊納二極體晶粒14之第二焊墊142,另一導腳3電性連接該電晶體晶粒11之第三焊墊113。Please refer to the first C figure, which is a schematic diagram of a transistor structure according to a third embodiment of the present invention. The transistor structure of the present invention comprises a chip package 1 and two lead pins 2, 3, wherein the chip package 1 The method includes a transistor crystal grain 11 , a capacitor die 13 , a Zener diode die 14 , and a cladding of the transistor die 11 , the capacitor die 13 and the Zener diode die 14 . The third bonding pad 113 of the transistor die 11 is electrically connected to the first pad 131 of the capacitor die 13 and the first pad 141 of the Zener diode die 14; The foot 2 is electrically connected to the first pad 111 and the second pad 112 of the transistor die 11 , and the other pin 3 is electrically connected to the second pad 132 of the capacitor die 13 and the Zener II The second pad 142 of the electrode body 14; wherein the transistor structure of the embodiment can electrically connect the first pad 111 of the transistor die 11 and the second pad 112 to the capacitor die 13 The first pad 131 and the first pad 141 of the Zener diode die 14 , and the pin 2 is electrically connected to the second pad 132 of the capacitor die 13 and the Zener diode die 14 Two pads 142, other guide pin 3 electrically connected to the third electrical bonding pad 113 of 11 crystal grains.

亦即上述之齊納二極體晶粒14係與該電容晶粒13並接後,再與該電晶體晶粒11串接,但不以此為限,本實施例之齊納二極體晶粒14之第二焊墊142係可電性連接該電晶體晶粒11之第一焊墊111或第三焊墊113,亦即齊納二極體晶粒14係可與該電晶體晶粒11並接後,再與該電容晶粒13串接;請同時參閱第二D圖,本實施例之電晶體晶粒11係為一雙極性接面電晶體(Bipolar Junction Transistor,BJT)晶粒,該雙極性接面電晶體晶粒係可為一NPN型雙極性接面電晶體晶粒或一PNP型雙極性接面電晶體晶粒。That is, the Zener diode die 14 is connected to the capacitor die 13 in parallel with the capacitor die 13 , but not limited thereto. The Zener diode of the embodiment is not limited thereto. The second pad 142 of the die 14 is electrically connected to the first pad 111 or the third pad 113 of the transistor die 11, that is, the Zener diode die 14 can be connected to the transistor crystal. After the particles 11 are connected, the capacitor die 13 is connected in series; please refer to the second D diagram, the transistor crystal 11 of the embodiment is a Bipolar Junction Transistor (BJT) crystal. The bipolar junction transistor crystal grain may be an NPN type bipolar junction transistor crystal grain or a PNP type bipolar junction transistor crystal grain.

因此,本實施例之雙極性接面電晶體晶粒之基極與射極係導通,且基於該雙極性接面電晶體晶粒之基極與集極間的至少一接 面特性,使該電晶體結構具有導通快、恢復時間慢、變換緩和以及基極-集極接面電容Cbc 小之特性,而可利用該電晶體晶粒作為一快速二極體,並透過與電容晶粒、齊納二極體晶粒的電性連接,使電晶體結構形成一ZCB阻尼器電路(如第十二圖所示),因此,該電晶體結構在封裝及應用電路的使用上可達到簡化製程、縮小體積以及增加耐壓距離之功效;其中該ZCB阻尼器電路可並接一主動元件或一負載(未圖示),該主動元件係為一金屬氧化物半導體場效電晶體(MOSFET)、一二極體(diode)、一雙極性接面電晶體(BJT)、一絕緣閘雙極性電晶體(IGBT)、一靜電感應電晶體(SIT)、一閘流體或其組成之電路,而該負載係為一電感、一電阻、一電容或其組成之電路,例如該ZCB阻尼器電路與一交換電源供應器之變壓器的一次側並接後與一金屬氧化物半導體場效電晶體串接,而可吸收主動元件在高頻切換時所產生之突波(spike)或雜訊,藉此,可降低突波電壓以及提高效率。Therefore, the base of the bipolar junction transistor crystal grain of the embodiment is electrically connected to the emitter system, and based on at least one junction characteristic between the base and the collector of the bipolar junction transistor crystal grain, The transistor structure has the characteristics of fast conduction, slow recovery time, moderate relaxation, and small base-collector junction capacitance C bc , and the transistor crystal can be used as a fast diode and transmitted through the capacitor die, The electrical connection of the Zener diode dies allows the transistor structure to form a ZCB damper circuit (as shown in Figure 12). Therefore, the transistor structure can achieve a simplified process in the use of package and application circuits. The effect of reducing the volume and increasing the withstand voltage distance; wherein the ZCB damper circuit can be connected to an active component or a load (not shown), the active component is a metal oxide semiconductor field effect transistor (MOSFET), a diode, a bipolar junction transistor (BJT), an insulated gate bipolar transistor (IGBT), an electrostatic induction transistor (SIT), a thyristor or a circuit thereof, and the load Is an inductor, a resistor, a capacitor or a component thereof The circuit, for example, the ZCB damper circuit is connected in parallel with the primary side of the transformer of the switching power supply, and is connected in series with a metal oxide semiconductor field effect transistor, and the absorbing active element is generated when the high frequency is switched. Spiral or noise, which reduces the surge voltage and improves efficiency.

此外,請同時參閱第三圖至第七圖所示,係為第一實施例之電晶體結構利用打線接合(wire bonding)的方式電性連接導腳與焊墊之各實施例電晶體封裝之剖面示意圖,該電晶體結構係包含一晶片封裝體1以及二導腳2、3,其中該晶片封裝體1係包含一電晶體晶粒11、一封裝膠體12、黏著層16、晶片座17以及多條導線151、152、153,其係透過多條導線151、152、153連接該電晶體晶粒11之第一焊墊111、第二焊墊112、第三焊墊113與導腳2、3,以使電晶體晶粒11電性連接該等導腳2、3;其中該等導腳2、3係可分別設置至少一接點(未圖示)用以電性連接該等導線151、152、153,而該電晶體晶粒11係透過黏著層16配置在晶片座17上,該封裝膠體12包覆該電晶體晶粒11、黏著層16、晶片座17、該等導線151、152、153以及該等導腳2、3之一部分,而使該等導腳2、3之部分區域埋入(embedded)於封裝膠體12內,且各引腳2、3之一末端係暴露於封裝膠體12外,其中該導線151、152、153係可為一金線或其他導電材料,而該黏著層16係可為一銀膠或其他導電膠體,該封裝膠體12的材料係可為環氧樹脂或其他 高分子材料。In addition, as shown in the third to seventh embodiments, the transistor structure of the first embodiment is electrically connected by a wire bonding method to each of the embodiments of the transistor and the pad. The transistor structure includes a chip package 1 and two lead pins 2 and 3, wherein the chip package 1 includes an oxide crystal chip 11, an encapsulant 12, an adhesive layer 16, a wafer holder 17, and The plurality of wires 151, 152, and 153 are connected to the first pad 111, the second pad 112, the third pad 113, and the lead pin 2 of the transistor die 11 through a plurality of wires 151, 152, and 153. 3, so that the transistor die 11 is electrically connected to the leads 2, 3; wherein the pins 2, 3 can be respectively provided with at least one contact (not shown) for electrically connecting the wires 151 152, 153, and the transistor die 11 is disposed on the wafer holder 17 through the adhesive layer 16, the encapsulant 12 coating the transistor die 11, the adhesive layer 16, the wafer holder 17, the wires 151, 152, 153 and one of the lead pins 2, 3, and partially enclose the portions of the lead pins 2, 3 in the encapsulant 12, and one end of each of the pins 2, 3 is exposed to the outside of the encapsulant 12, wherein the wire 151, 152, 153 can be a gold wire or other conductive material, and the adhesive layer 16 can be a silver Glue or other conductive colloid, the material of the encapsulant 12 may be epoxy or other Polymer Materials.

請參閱第三圖所示,本實施例之導線151兩端係電性連接導腳2與第二焊墊112,該導線152兩端係電性連接導腳2與第一焊墊111,藉此使第一焊墊111與第二焊墊112兩端點短路,而該導線153兩端係電性連接導腳3與第三焊墊113,此外,該導腳2、3係自封裝膠體12之兩側邊水平延伸設置,而使該導腳2、3平行於該晶片座17,其電晶體結構之封裝外觀型式係可如第十A圖至第十D圖所示之外觀型式,其中該封裝膠體12之形狀係可為圓柱形、半圓形或平板形,而該導腳153係可為長引線、短引線、無引線或其他接點型式。Referring to the third figure, the two ends of the wire 151 of the embodiment are electrically connected to the lead pin 2 and the second pad 112. The two ends of the wire 152 are electrically connected to the lead pin 2 and the first pad 111. Therefore, the first pad 111 and the second pad 112 are short-circuited at both ends, and the lead 153 is electrically connected between the lead 3 and the third pad 113. Further, the lead 2 and 3 are self-packaging colloids. The two sides of the 12 are horizontally extended, and the lead pins 2, 3 are parallel to the wafer holder 17, and the package appearance form of the crystal structure can be the appearance type as shown in the tenth to tenth Dth drawings. The shape of the encapsulant 12 can be cylindrical, semi-circular or flat, and the lead 153 can be a long lead, a short lead, a leadless or other contact type.

請參閱第四圖所示,本實施例之導線151兩端係電性連接導腳2與第二焊墊112,該導線152兩端係電性連接導腳2與第一焊墊111,藉此使第一焊墊111與第二焊墊112兩端點短路,而該導線153兩端係電性連接導腳3與第三焊墊113,此外,該導腳2、3係自封裝膠體12之兩側邊向下延伸設置,而使該導腳2、3垂直於該晶片座17,其電晶體結構之封裝外觀型式係可如第十一A圖至第十一D圖所示之外觀型式,其中該封裝膠體12之形狀係可為圓柱形、半圓形或平板形,而該導腳15係可為長引線、短引線、無引線或其他接點型式。Referring to the fourth figure, the two ends of the wire 151 of the embodiment are electrically connected to the lead pin 2 and the second pad 112. The two ends of the wire 152 are electrically connected to the lead pin 2 and the first pad 111. Therefore, the first pad 111 and the second pad 112 are short-circuited at both ends, and the lead 153 is electrically connected between the lead 3 and the third pad 113. Further, the lead 2 and 3 are self-packaging colloids. The two sides of the 12 are extended downwards, so that the lead pins 2, 3 are perpendicular to the wafer holder 17, and the package appearance of the crystal structure can be as shown in FIG. 11A to FIG. The appearance of the encapsulant 12 can be cylindrical, semi-circular or flat, and the lead 15 can be a long lead, a short lead, a leadless or other contact type.

請參閱第五圖所示,本實施例之導線151兩端係電性連接第一焊墊111與第二焊墊112,藉此使第一焊墊111與第二焊墊112兩端點短路,該導線152兩端係電性連接導腳2與第一焊墊111,而該導線153兩端係電性連接導腳3與第三焊墊113,此外,該導腳2、3係自封裝膠體12之兩側邊水平延伸設置,而使該導腳2、3平行於該晶片座17。Referring to FIG. 5, the first pad 111 and the second pad 112 are electrically connected to both ends of the wire 151 of the embodiment, thereby short-circuiting the two ends of the first pad 111 and the second pad 112. The lead 152 is electrically connected to the lead 2 and the first pad 111, and the lead 153 is electrically connected between the lead 3 and the third pad 113. Further, the lead 2 and 3 are self-contained. The two sides of the encapsulant 12 are horizontally extended such that the leads 2, 3 are parallel to the wafer holder 17.

請參閱第六圖所示,本實施例之導線151兩端係電性連接第一焊墊111與第二焊墊112,藉此使第一焊墊111與第二焊墊112兩端點短路,該導線152兩端係電性連接導腳2與導線151,而該導線153兩端係電性連接導腳3與第三焊墊113。Referring to FIG. 6 , the first pad 111 and the second pad 112 are electrically connected to both ends of the wire 151 of the embodiment, thereby short-circuiting the two ends of the first pad 111 and the second pad 112 . The lead wires 152 are electrically connected to the lead pins 2 and the wires 151, and the lead wires 153 are electrically connected to the lead pins 3 and the third pads 113.

請參閱第七圖所示,本實施例係透過一第四焊墊114電 性連接第一焊墊111與第二焊墊112,藉此使第一焊墊111與第二焊墊112兩端點短路,該導線152兩端係電性連接導腳2與第四焊墊114,而該導線153兩端係電性連接導腳3與第三焊墊113。Please refer to the seventh figure, this embodiment is electrically transmitted through a fourth pad 114. The first pad 111 and the second pad 112 are connected to each other, thereby short-circuiting the two ends of the first pad 111 and the second pad 112. The two ends of the wire 152 are electrically connected to the lead 2 and the fourth pad. 114, and the two ends of the wire 153 are electrically connected to the lead pin 3 and the third pad 113.

請同時參閱第八圖及第九圖所示,係為第一實施例之電晶體結構利用覆晶接合(flip chip bonding)的方式電性連接導腳與焊墊之各實施例電晶體封裝之剖面示意圖,該電晶體結構係包含一晶片封裝體1以及二導腳2、3,其中該晶片封裝體1係包含一電晶體晶粒11、一封裝膠體12以及焊料18,其在第一焊墊111及第二焊墊112之表面上形成焊料18,接著將電晶體晶粒翻覆(flip)後,透過焊料18連接該電晶體晶粒11之第一焊墊111、第二焊墊112、第三焊墊113與導腳2、3,以使電晶體晶粒11電性連接該等導腳2、3;其中該等導腳2、3係可分別設置至少一接點(未圖示)用以電性連接該焊料18,而該封裝膠體12包覆該電晶體晶粒11、焊料18以及該等導腳2、3之一部分,而使該等導腳2、3之部分區域埋入(embedded)於封裝膠體12內,且各引腳2、3之一末端係暴露於封裝膠體12外,其中該焊料18的材料係可為錫或其他金屬材料。Please refer to the eighth embodiment and the ninth embodiment at the same time. The transistor structure of the first embodiment is electrically connected to each of the embodiments of the transistor and the pad by a flip chip bonding. The transistor structure includes a chip package 1 and two lead pins 2, 3, wherein the chip package 1 includes an oxide crystal die 11, an encapsulant 12, and a solder 18, which are in the first solder. Solder 18 is formed on the surface of the pad 111 and the second pad 112. Then, after the transistor crystal grains are flipped, the first pad 111 and the second pad 112 of the transistor die 11 are connected through the solder 18. The third pad 113 and the lead pins 2 and 3 are electrically connected to the lead wires 2 and 3; wherein the lead pins 2 and 3 are respectively provided with at least one contact point (not shown). ) for electrically connecting the solder 18, and the encapsulant 12 covers the transistor die 11, the solder 18, and a portion of the pins 2, 3, and burying portions of the legs 2, 3 Embedded in the encapsulant 12, and one end of each of the leads 2, 3 is exposed to the outside of the encapsulant 12, wherein the material of the solder 18 System may be tin or other metallic materials.

請參閱第八圖所示,本實施例之焊料18係包含第一焊料181、第二焊料182以及第三焊料183,該第一焊料181係電性連接導腳2與第三焊墊113,而該第二焊料182、第三焊料183係電性連接導腳3與第一焊墊111、第二焊墊112,藉此使第一焊墊111與第二焊墊112兩端點短路。Referring to FIG. 8 , the solder 18 of the present embodiment includes a first solder 181 , a second solder 182 , and a third solder 183 . The first solder 181 electrically connects the lead pin 2 and the third pad 113 . The second solder 182 and the third solder 183 electrically connect the lead pins 3 to the first pads 111 and the second pads 112 , thereby short-circuiting the first pads 111 and the second pads 112 .

請參閱第九圖所示,本實施例之焊料18係包含第一焊料181以及第四焊料184,該第一焊料181係電性連接導腳2與第三焊墊113,而該第四焊料184係電性連接導腳3與第一焊墊111、第二焊墊112,藉此使第一焊墊111與第二焊墊112兩端點短路。Referring to FIG. 9 , the solder 18 of the embodiment includes a first solder 181 and a fourth solder 184 . The first solder 181 electrically connects the lead 2 and the third pad 113 , and the fourth solder The 184 series electrically connects the lead pins 3 with the first pads 111 and the second pads 112, thereby short-circuiting the first pads 111 and the second pads 112.

請同時參閱第三圖及第十三圖所示,本創作電晶體封裝方法之第一實施例係包含下列步驟:首先,提供具有第一焊墊111、第二焊墊112及第三焊墊113之一電晶體晶粒11(S100);接著,於該第 一焊墊111及第二焊墊112之表面上分別形成一導線151、152電性連接一第一導腳2(S102);然後,於該第三焊墊113之表面上形成一導線153電性連接一第二導腳3(S104);最後,提供一封裝膠體12包覆該電晶體晶粒11、該等導線151~153以及該等導腳2、3之一部分(S106)。Please refer to the third embodiment and the thirteenth embodiment. The first embodiment of the present invention relates to the first embodiment of the present invention. The first embodiment includes the following steps: first, providing a first pad 111, a second pad 112, and a third pad. 113 one of the crystal grains 11 (S100); then, in the first A lead 151, 152 is electrically connected to a first lead 2 (S102) on the surface of the pad 111 and the second pad 112. Then, a wire 153 is formed on the surface of the third pad 113. A second lead 3 is connected (S104). Finally, an encapsulant 12 is provided to cover the transistor die 11, the wires 151-153 and one of the leads 2, 3 (S106).

請同時參閱第五圖及第十四圖所示,本創作電晶體封裝方法之第二實施例係包含下列步驟:首先,提供具有第一焊墊111、第二焊墊112及第三焊墊113之一電晶體晶粒11(S200);接著,於該第一焊墊111之表面上形成一導線151電性連接第二焊墊112(S202);然後,於該第一焊墊111或第二焊墊112之表面上形成一導線152電性連接一第一導腳2(S204);接著,於該第三焊墊113之表面上形成一導線153電性連接一第二導腳3(S206);最後,提供一封裝膠體12包覆該電晶體晶粒11、該等導線13~15及該等導腳2、3之一部分(S208)。Please refer to FIG. 5 and FIG. 14 simultaneously. The second embodiment of the present invention relates to a method for packaging a transistor comprising the following steps: first, providing a first pad 111, a second pad 112, and a third pad And forming a wire 151 on the surface of the first pad 111 to electrically connect the second pad 112 (S202); then, on the first pad 111 or A wire 152 is electrically connected to the first lead 2 on the surface of the second pad 112 (S204). Then, a wire 153 is electrically connected to the second lead 3 on the surface of the third pad 113. (S206) Finally, an encapsulant 12 is provided to coat the transistor crystal grains 11, the wires 13 to 15 and a portion of the pins 2, 3 (S208).

請同時參閱第六圖及第十五圖所示,本創作電晶體封裝方法之第三實施例係包含下列步驟:首先,提供具有第一焊墊111、第二焊墊112及第三焊墊113之一電晶體晶粒11(S300);接著,於該第一焊墊111之表面上形成一導線151電性連接第二焊墊112(S302);然後,於一第一導腳2之表面上形成一導線152電性連接該導線13(S304);接著,於該第三焊墊113之表面上形成一導線153電性連接一第二導腳3(S306);最後,提供一封裝膠體12包覆該電晶體晶粒11、該等導線151~153及該等導腳2、3之一部分(S308)。Please refer to the sixth figure and the fifteenth figure at the same time, the third embodiment of the present invention relates to the following steps: First, providing a first pad 111, a second pad 112 and a third pad And forming a wire 151 on the surface of the first pad 111 to electrically connect the second pad 112 (S302); then, in a first lead 2 A wire 152 is formed on the surface to electrically connect the wire 13 (S304); then, a wire 153 is electrically connected to a second lead 3 on the surface of the third pad 113 (S306); finally, a package is provided. The colloid 12 covers the transistor crystal grains 11, the wires 151 to 153, and a portion of the pins 2, 3 (S308).

請同時參閱第七圖及第十六圖所示,本創作電晶體封裝方法之第四實施例係包含下列步驟:首先,提供具有第一焊墊111、第二焊墊112及第三焊墊113之一電晶體晶粒11(S400);接著,於該第一焊墊111及第二焊墊112之表面上形成一第四焊墊114電性連接該第一焊墊111與第二焊墊112(S402);然後,於該第四焊墊114之表面上形成一導線14電性連接一第一導腳2(S404);接著,於該第三焊墊113之表面上形成一導線15電性連接一第二導腳3(S406);最後,提供一封裝膠體12包覆該電晶體晶粒11、該第四焊墊114、該等導線14、 15及該等導腳2、3之一部分(S408)。Please refer to the seventh embodiment and the sixteenth embodiment at the same time. The fourth embodiment of the present invention relates to the fourth embodiment of the present invention. The first embodiment includes the following steps: first, providing a first pad 111, a second pad 112, and a third pad. And forming a fourth pad 114 electrically connected to the first pad 111 and the second pad on the surface of the first pad 111 and the second pad 112; Pad 112 (S402); then, a wire 14 is electrically connected to a first lead 2 on the surface of the fourth pad 114 (S404); then, a wire is formed on the surface of the third pad 113. 15 electrically connecting a second lead 3 (S406); finally, providing an encapsulant 12 covering the transistor die 11, the fourth pad 114, the wires 14, 15 and one of the legs 2, 3 (S408).

請同時參閱第八圖及第十七圖所示,本創作電晶體封裝方法之第五實施例係包含下列步驟:首先,提供具有第一焊墊111、第二焊墊112及第三焊墊113之一電晶體晶粒11(S500);接著,於該第一焊墊111及第二焊墊112之表面上分別形成一第一焊料182及第二焊料183電性連接一第一導腳2(S502);然後,於該第三焊墊113之表面上形成一第三焊料181電性連接一第二導腳3(S504);最後,提供一封裝膠體12包覆該電晶體晶粒11、該等焊料18及該等導腳2、3之一部分(S506)Please refer to the eighth embodiment and the seventeenth embodiment. The fifth embodiment of the present invention relates to the fifth embodiment of the present invention. The first embodiment includes the following steps: first, providing a first pad 111, a second pad 112, and a third pad. a first transistor 182 and a second solder 183 are electrically connected to a first lead on the surface of the first pad 111 and the second pad 112, respectively. 2 (S502); then, a third solder 181 is electrically connected to a second lead 3 on the surface of the third pad 113 (S504); finally, an encapsulant 12 is provided to coat the transistor crystal grain. 11. The solder 18 and one of the leads 2, 3 (S506)

請同時參閱第九圖及第十八圖所示,本創作電晶體封裝方法之第六實施例係包含下列步驟:首先,提供具有第一焊墊111、第二焊墊112及第三焊墊113之一電晶體晶粒11(S600);接著,於該第一焊墊111及第二焊墊112之表面上形成一第四焊料184電性連接一第一導腳2(S602);然後,於該第三焊墊113之表面上形成一第一焊料181電性連接一第二導腳3(S604);最後,提供一封裝膠體12包覆該電晶體晶粒11、該等焊料181、184及該等導腳2、3之一部分(S606)。Please refer to the ninth diagram and the eighteenth embodiment at the same time, the sixth embodiment of the present invention, the method for packaging the transistor includes the following steps: first, providing a first pad 111, a second pad 112, and a third pad a first transistor 184 is electrically connected to a first lead 2 (S602); and then a fourth solder 184 is electrically connected to the surface of the first pad 111 and the second pad 112 (S602); A first solder 181 is electrically connected to a second lead 3 on the surface of the third pad 113 (S604). Finally, an encapsulant 12 is provided to cover the transistor die 11, the solder 181. , 184 and one of the guide legs 2, 3 (S606).

其中,電晶體封裝方法之各實施例所述之電晶體晶粒係為一雙極性接面電晶體(BJT)晶粒。The transistor crystal grain described in each embodiment of the transistor packaging method is a bipolar junction transistor (BJT) die.

綜上所述,依上文所揭示之內容,本創作確實可達到新型之預期目的,其利用一導腳電性連接該電晶體晶粒之第一焊墊與第二焊墊,另一導腳係電性連接該電晶體晶粒之第三焊墊,可將該電晶體結構使用於阻尼器電路,或是將阻尼器電路直接封裝在二導腳電晶體結構中以並接一主動元件或一負載,而可吸收主動元件在高頻切換時產生之突波或雜訊,使該電晶體結構在封裝上可達到簡化製程、縮小體積以及增加耐壓距離之功效,且可讓使用該電晶體結構之阻尼器電路可有效保護元件,使用阻尼器電路之電源供應器相較於使用傳統阻尼器電路之電源供應器具有較高的轉換效率,確實具有實用價值無疑,而具備產業利用性、新穎性及進步性要件,爰依法提出新型專利申請。In summary, according to the above disclosure, the present invention can achieve the new intended purpose, which uses a lead to electrically connect the first pad and the second pad of the transistor die, and the other guide The foot is electrically connected to the third pad of the transistor die, and the transistor structure can be used in the damper circuit, or the damper circuit can be directly encapsulated in the two-lead transistor structure to connect an active component Or a load, which can absorb the glitch or noise generated by the active component during high-frequency switching, so that the transistor structure can achieve the functions of simplifying the process, reducing the volume, and increasing the withstand voltage on the package, and can be used. The damper circuit of the crystal structure can effectively protect the components, and the power supply using the damper circuit has higher conversion efficiency than the power supply using the conventional damper circuit, and has practical value, and has industrial applicability. , novelty and progressive elements, 提出 file a new type of patent application.

以上所述者,僅為本創作之較佳實施例,舉凡依本創作申請專利範圍所作之均等設計變化,均應為本案之技術範圍所涵蓋。The above is only the preferred embodiment of the present invention, and all the equivalent design changes made according to the scope of the patent application of this creation should be covered by the technical scope of the present invention.

1‧‧‧晶片封裝體1‧‧‧ chip package

11‧‧‧電晶體晶粒11‧‧‧Optocrystalline grains

111‧‧‧第一焊墊111‧‧‧First pad

112‧‧‧第二焊墊112‧‧‧Second pad

113‧‧‧第三焊墊113‧‧‧ Third pad

12‧‧‧封裝膠體12‧‧‧Package colloid

2、3‧‧‧導腳2, 3‧‧ ‧ lead

Claims (11)

一種電晶體結構,係包含:一晶片封裝體,係包含一電晶體晶粒及一包覆該電晶體晶粒之封裝膠體;以及二導腳,其中一第一導腳係電性連接該電晶體晶粒之第一焊墊與第二焊墊,而一第二導腳係電性連接該電晶體晶粒之第三焊墊。A transistor structure comprising: a chip package comprising an oxide crystal grain and a package colloid covering the transistor crystal grain; and a second lead leg, wherein a first lead leg is electrically connected to the electric The first pad and the second pad of the crystal grain are electrically connected to the third pad of the transistor die. 如申請專利範圍第1項所述之電晶體結構,其中該晶片封裝體更包含:一電容晶粒,其中該電容晶粒之第一焊墊係電性連接該電晶體晶粒之第一焊墊或第三焊墊,而該電容晶粒之第二焊墊係電性連接該第一導腳或第二導腳,且該封裝膠體係包覆該電容晶粒。The transistor structure of claim 1, wherein the chip package further comprises: a capacitor die, wherein the first pad of the capacitor die is electrically connected to the first die of the transistor die a pad or a third pad, wherein the second pad of the capacitor die is electrically connected to the first lead or the second lead, and the encapsulant system covers the capacitor die. 如申請專利範圍第2項所述之電晶體結構,其中該晶片封裝體更包含:一齊納二極體(Zener Diode)晶粒,其中該齊納二極體晶粒之第一焊墊係電性連接該電容晶粒之第一焊墊與該電晶體晶粒之第一焊墊或第三焊墊,而該齊納二極體晶粒之第二焊墊係電性連接該電容晶粒之第二焊墊或該電晶體晶粒之第一焊墊或第三焊墊,且該封裝膠體係包覆該齊納二極體晶粒。The transistor structure of claim 2, wherein the chip package further comprises: a Zener Diode die, wherein the first pad of the Zener diode die is electrically The first pad of the capacitor die is connected to the first pad or the third pad of the transistor die, and the second pad of the Zener diode die is electrically connected to the capacitor die a second pad or a first pad or a third pad of the transistor die, and the encapsulant system encapsulates the Zener diode die. 如申請專利範圍第2項所述之電晶體結構,其中該晶片封裝體更包含:一電阻晶粒,其中該電阻晶粒之第一焊墊係電性連接該電晶體晶粒之第一焊墊或第三焊墊,而該電阻晶粒之第二焊墊係電性連接該電容晶粒之第一焊墊,且該封裝膠體係包覆該電阻晶粒。The transistor structure of claim 2, wherein the chip package further comprises: a resistor die, wherein the first pad of the resistor die is electrically connected to the first pad of the transistor die a pad or a third pad, wherein the second pad of the resistor die is electrically connected to the first pad of the capacitor die, and the encapsulant system covers the resistor die. 如申請專利範圍第1項所述之電晶體結構,其中該電晶體結構之第一導腳或第二導腳係連接一電容器之一端,而形成一阻尼器(snubber)電路以並接一主動元件或一負載。The transistor structure of claim 1, wherein the first lead or the second lead of the transistor structure is connected to one end of a capacitor to form a snubber circuit to be connected in an active manner. Component or a load. 如申請專利範圍第5項所述之電晶體結構,其中該電容器之一端更連接一齊納二極體之一端,該電容器之另一端係連接該齊納二極體之另一端,而形成一阻尼器電路以並接一主動元件或一負載。The transistor structure of claim 5, wherein one end of the capacitor is further connected to one end of a Zener diode, and the other end of the capacitor is connected to the other end of the Zener diode to form a damping. The circuit is connected in parallel with an active component or a load. 如申請專利範圍第1項所述之電晶體結構,其中該電晶體結構之第一導腳或第二導腳係連接一電阻器之一端,該電阻器之另一端係連接一電容器之一端,而形成一阻尼器電路以並接一主動元件或一負載。The transistor structure of claim 1, wherein the first lead or the second lead of the transistor structure is connected to one end of a resistor, and the other end of the resistor is connected to one end of a capacitor. A damper circuit is formed to connect an active component or a load. 如申請專利範圍第5項、第6項或第7項所述之電晶體結構,其中該主動元件係為一金屬氧化物半導體場效電晶體(MOSFET)、一二極體(diode)、一雙極性接面電晶體(BJT)、一絕緣閘雙極性電晶體(IGBT)、一靜電感應電晶體(SIT)、一閘流體或其組成之電路,而該負載係為一電感、一電阻、一電容或其組成之電路。The transistor structure of claim 5, 6, or 7, wherein the active device is a metal oxide semiconductor field effect transistor (MOSFET), a diode, or a diode a bipolar junction transistor (BJT), an insulated gate bipolar transistor (IGBT), an electrostatic induction transistor (SIT), a gate fluid or a circuit thereof, and the load is an inductor, a resistor, and a A capacitor or a circuit of its composition. 如申請專利範圍第1項所述之電晶體結構,其中該電晶體晶粒係為一雙極性接面電晶體(BJT)晶粒。The transistor structure of claim 1, wherein the transistor grain is a bipolar junction transistor (BJT) die. 如申請專利範圍第9項所述之電晶體結構,其中該電晶體晶粒之第一焊墊係為一射極(Emitter)焊墊,該第二焊墊係為一基極(Base)焊墊,而該第三焊墊係為一集極(Collector)焊墊。The transistor structure of claim 9, wherein the first pad of the transistor die is an emitter pad, and the second pad is a base pad. The pad, and the third pad is a collector pad. 如申請專利範圍第1項所述之電晶體結構,其中該晶片封裝體更包含一晶片座,且該電晶體晶粒係透過一黏著層配置在該晶片座上。The transistor structure of claim 1, wherein the chip package further comprises a wafer holder, and the transistor crystal grain is disposed on the wafer holder through an adhesive layer.
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