TWI864123B - 圖像顯示裝置之製造方法及圖像顯示裝置 - Google Patents
圖像顯示裝置之製造方法及圖像顯示裝置 Download PDFInfo
- Publication number
- TWI864123B TWI864123B TW109134239A TW109134239A TWI864123B TW I864123 B TWI864123 B TW I864123B TW 109134239 A TW109134239 A TW 109134239A TW 109134239 A TW109134239 A TW 109134239A TW I864123 B TWI864123 B TW I864123B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- aforementioned
- insulating film
- layer
- image display
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 81
- 238000000034 method Methods 0.000 title claims abstract description 47
- 239000004065 semiconductor Substances 0.000 claims abstract description 220
- 239000000758 substrate Substances 0.000 claims abstract description 116
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 101
- 229910021389 graphene Inorganic materials 0.000 claims abstract description 101
- 238000005530 etching Methods 0.000 claims abstract description 11
- 238000006243 chemical reaction Methods 0.000 claims description 46
- 239000011521 glass Substances 0.000 claims description 13
- 229910002601 GaN Inorganic materials 0.000 claims description 12
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 11
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 230000000149 penetrating effect Effects 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 3
- 230000008569 process Effects 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 491
- 239000010408 film Substances 0.000 description 234
- 239000011229 interlayer Substances 0.000 description 128
- 229920005989 resin Polymers 0.000 description 29
- 239000011347 resin Substances 0.000 description 29
- 239000000463 material Substances 0.000 description 18
- 239000003990 capacitor Substances 0.000 description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000004020 conductor Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 8
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 8
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 7
- 102100023591 Polyphosphoinositide phosphatase Human genes 0.000 description 7
- 239000003086 colorant Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000009413 insulation Methods 0.000 description 6
- 238000001020 plasma etching Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- -1 boron ions Chemical class 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 230000006798 recombination Effects 0.000 description 4
- 238000005215 recombination Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 235000005811 Viola adunca Nutrition 0.000 description 2
- 240000009038 Viola odorata Species 0.000 description 2
- 235000013487 Viola odorata Nutrition 0.000 description 2
- 235000002254 Viola papilionacea Nutrition 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007737 ion beam deposition Methods 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000002096 quantum dot Substances 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- HIVGXUNKSAJJDN-UHFFFAOYSA-N [Si].[P] Chemical compound [Si].[P] HIVGXUNKSAJJDN-UHFFFAOYSA-N 0.000 description 1
- MXSJNBRAMXILSE-UHFFFAOYSA-N [Si].[P].[B] Chemical compound [Si].[P].[B] MXSJNBRAMXILSE-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/30—Active-matrix LED displays
- H10H29/39—Connection of the pixel electrodes to the driving transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
- H10H29/14—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
- H10H29/142—Two-dimensional arrangements, e.g. asymmetric LED layout
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/851—Wavelength conversion means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
- H10H20/856—Reflecting means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/30—Active-matrix LED displays
- H10H29/41—Insulating layers formed between the driving transistors and the LEDs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/032—Manufacture or treatment of electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/034—Manufacture or treatment of coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0361—Manufacture or treatment of packages of wavelength conversion means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/80—Constructional details
- H10H29/832—Electrodes
- H10H29/8322—Electrodes characterised by their materials
- H10H29/8323—Transparent materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/80—Constructional details
- H10H29/85—Packages
- H10H29/8517—Colour filters
Landscapes
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-181637 | 2019-10-01 | ||
| JP2019181637 | 2019-10-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202121677A TW202121677A (zh) | 2021-06-01 |
| TWI864123B true TWI864123B (zh) | 2024-12-01 |
Family
ID=75336931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109134239A TWI864123B (zh) | 2019-10-01 | 2020-09-30 | 圖像顯示裝置之製造方法及圖像顯示裝置 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US12356781B2 (https=) |
| EP (1) | EP4040512B1 (https=) |
| JP (1) | JP7617356B2 (https=) |
| CN (1) | CN114342091B (https=) |
| TW (1) | TWI864123B (https=) |
| WO (1) | WO2021065917A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220067555A (ko) * | 2020-11-16 | 2022-05-25 | 삼성디스플레이 주식회사 | 표시 장치 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102544054A (zh) * | 2010-12-14 | 2012-07-04 | 三星移动显示器株式会社 | 有机发光显示装置及其制造方法 |
| US20160268360A1 (en) * | 2013-07-26 | 2016-09-15 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| US20160336374A1 (en) * | 2015-05-15 | 2016-11-17 | Boe Technology Group Co., Ltd. | Display substrate, its manufacturing method and display device |
| US20190131573A1 (en) * | 2017-10-30 | 2019-05-02 | Samsung Display Co., Ltd. | Organic light emitting display device and method of manufacturing organic light emitting display device |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002141492A (ja) | 2000-10-31 | 2002-05-17 | Canon Inc | 発光ダイオードディスプレイパネル及びその製造方法 |
| JP4845531B2 (ja) * | 2006-02-28 | 2011-12-28 | 三菱電機株式会社 | 画像表示装置 |
| US8409366B2 (en) | 2009-06-23 | 2013-04-02 | Oki Data Corporation | Separation method of nitride semiconductor layer, semiconductor device, manufacturing method thereof, semiconductor wafer, and manufacturing method thereof |
| JP5070247B2 (ja) | 2009-06-23 | 2012-11-07 | 株式会社沖データ | 半導体装置の製造方法、及び半導体装置 |
| US8647919B2 (en) * | 2010-09-13 | 2014-02-11 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting display device and method for manufacturing the same |
| JP2015015321A (ja) | 2013-07-03 | 2015-01-22 | 高槻電器工業株式会社 | 半導体発光素子及びその製造方法 |
| CN103762247B (zh) * | 2014-01-10 | 2016-07-06 | 北京京东方光电科技有限公司 | 薄膜晶体管、阵列基板及其制作方法及有机发光显示面板 |
| JP2016031927A (ja) | 2014-07-25 | 2016-03-07 | 株式会社半導体エネルギー研究所 | 積層構造物、入出力装置、情報処理装置、積層構造物の作製方法 |
| WO2016034984A1 (en) | 2014-09-05 | 2016-03-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, driver ic, display device, and electronic device |
| KR102456654B1 (ko) | 2014-11-26 | 2022-10-18 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 및 전자 기기 |
| US10741590B2 (en) * | 2016-04-12 | 2020-08-11 | Semiconductor Energy Laboratory Co., Ltd. | Peeling method and manufacturing method of flexible device |
| TW201824220A (zh) * | 2016-09-30 | 2018-07-01 | 半導體能源硏究所股份有限公司 | 顯示面板、顯示裝置、輸入輸出裝置、資料處理裝置 |
| KR102633079B1 (ko) | 2016-10-28 | 2024-02-01 | 엘지디스플레이 주식회사 | 발광 다이오드 디스플레이 장치 |
| KR102651097B1 (ko) * | 2016-10-28 | 2024-03-22 | 엘지디스플레이 주식회사 | 발광 다이오드 디스플레이 장치 |
| JP2018072751A (ja) * | 2016-11-04 | 2018-05-10 | 株式会社半導体エネルギー研究所 | 表示パネル、表示装置、入出力装置、情報処理装置 |
| KR102772357B1 (ko) | 2016-12-20 | 2025-02-21 | 엘지디스플레이 주식회사 | 발광 다이오드 칩 및 이를 포함하는 발광 다이오드 디스플레이 장치 |
| JP6904769B2 (ja) | 2017-04-20 | 2021-07-21 | 株式会社半導体エネルギー研究所 | 表示装置 |
| KR102454083B1 (ko) | 2017-08-30 | 2022-10-12 | 엘지디스플레이 주식회사 | 마이크로-led 표시장치 및 그 제조방법 |
| CN107369748A (zh) | 2017-09-04 | 2017-11-21 | 湘能华磊光电股份有限公司 | 一种基于石墨烯的led外延生长方法 |
| CN111108613B (zh) | 2017-09-13 | 2024-01-16 | 夏普株式会社 | Led单元、图像显示元件及其制造方法 |
| KR102527303B1 (ko) * | 2017-10-31 | 2023-04-27 | 엘지디스플레이 주식회사 | 발광 표시 장치 |
| US10193042B1 (en) * | 2017-12-27 | 2019-01-29 | Innolux Corporation | Display device |
| WO2019168187A1 (ja) * | 2018-03-02 | 2019-09-06 | 株式会社 東芝 | 発光ダイオードシート、表示装置、発光装置、表示装置の製造方法及び発光装置の製造方法 |
| CN108987425B (zh) * | 2018-07-19 | 2020-09-18 | 豪威半导体(上海)有限责任公司 | 微led显示器及其制造方法 |
| KR102030323B1 (ko) * | 2018-11-23 | 2019-10-10 | 엘지디스플레이 주식회사 | 표시 장치 및 표시 장치의 제조 방법 |
| CN110034150B (zh) * | 2019-03-25 | 2020-11-27 | 厦门天马微电子有限公司 | 显示面板及其制作方法、显示装置 |
-
2020
- 2020-09-29 JP JP2021551313A patent/JP7617356B2/ja active Active
- 2020-09-29 WO PCT/JP2020/036933 patent/WO2021065917A1/ja not_active Ceased
- 2020-09-29 EP EP20872417.9A patent/EP4040512B1/en active Active
- 2020-09-29 CN CN202080061417.2A patent/CN114342091B/zh active Active
- 2020-09-30 TW TW109134239A patent/TWI864123B/zh active
-
2022
- 2022-03-30 US US17/709,063 patent/US12356781B2/en active Active
-
2025
- 2025-06-11 US US19/234,855 patent/US20250311499A1/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102544054A (zh) * | 2010-12-14 | 2012-07-04 | 三星移动显示器株式会社 | 有机发光显示装置及其制造方法 |
| US20160268360A1 (en) * | 2013-07-26 | 2016-09-15 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| US20160336374A1 (en) * | 2015-05-15 | 2016-11-17 | Boe Technology Group Co., Ltd. | Display substrate, its manufacturing method and display device |
| US20190131573A1 (en) * | 2017-10-30 | 2019-05-02 | Samsung Display Co., Ltd. | Organic light emitting display device and method of manufacturing organic light emitting display device |
Also Published As
| Publication number | Publication date |
|---|---|
| US20250311499A1 (en) | 2025-10-02 |
| TW202121677A (zh) | 2021-06-01 |
| EP4040512A1 (en) | 2022-08-10 |
| CN114342091B (zh) | 2025-05-30 |
| JP7617356B2 (ja) | 2025-01-20 |
| EP4040512A4 (en) | 2023-11-08 |
| CN114342091A (zh) | 2022-04-12 |
| EP4040512B1 (en) | 2025-10-08 |
| WO2021065917A1 (ja) | 2021-04-08 |
| US12356781B2 (en) | 2025-07-08 |
| US20220223648A1 (en) | 2022-07-14 |
| JPWO2021065917A1 (https=) | 2021-04-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI862725B (zh) | 圖像顯示裝置之製造方法及圖像顯示裝置 | |
| US20250248173A1 (en) | Image display device manufacturing method and image display device | |
| TWI843898B (zh) | 圖像顯示裝置之製造方法及圖像顯示裝置 | |
| US12477886B2 (en) | Method for manufacturing image display device and image display device | |
| US20250311499A1 (en) | Image display device manufacturing method and image display device | |
| TWI900696B (zh) | 圖像顯示裝置之製造方法及圖像顯示裝置 | |
| TWI900576B (zh) | 圖像顯示裝置之製造方法及圖像顯示裝置 | |
| JP7624587B2 (ja) | 画像表示装置の製造方法および画像表示装置 | |
| WO2022196446A1 (ja) | 画像表示装置の製造方法および画像表示装置 | |
| WO2022209824A1 (ja) | 画像表示装置の製造方法および画像表示装置 | |
| TWI903058B (zh) | 圖像顯示裝置之製造方法及圖像顯示裝置 | |
| JP7796318B2 (ja) | 画像表示装置の製造方法および画像表示装置 |