TWI861374B - 著色組成物、膜、濾光器、固體攝像元件及圖像顯示裝置 - Google Patents

著色組成物、膜、濾光器、固體攝像元件及圖像顯示裝置 Download PDF

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Publication number
TWI861374B
TWI861374B TW110110266A TW110110266A TWI861374B TW I861374 B TWI861374 B TW I861374B TW 110110266 A TW110110266 A TW 110110266A TW 110110266 A TW110110266 A TW 110110266A TW I861374 B TWI861374 B TW I861374B
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Taiwan
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group
compound
pigment
coloring composition
formula
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TW110110266A
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English (en)
Chinese (zh)
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TW202140656A (zh
Inventor
金子祐士
鶴田拓也
瀧下大貴
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日商富士軟片股份有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
    • C07F1/08—Copper compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
TW110110266A 2020-04-23 2021-03-22 著色組成物、膜、濾光器、固體攝像元件及圖像顯示裝置 TWI861374B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-076406 2020-04-23
JP2020076406 2020-04-23

Publications (2)

Publication Number Publication Date
TW202140656A TW202140656A (zh) 2021-11-01
TWI861374B true TWI861374B (zh) 2024-11-11

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TW110110266A TWI861374B (zh) 2020-04-23 2021-03-22 著色組成物、膜、濾光器、固體攝像元件及圖像顯示裝置

Country Status (6)

Country Link
US (1) US12535732B2 (https=)
JP (1) JP7399268B2 (https=)
KR (1) KR102720835B1 (https=)
CN (1) CN115427517B (https=)
TW (1) TWI861374B (https=)
WO (1) WO2021215133A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202231790A (zh) * 2021-02-03 2022-08-16 日商富士軟片股份有限公司 著色組成物、膜、濾光器、固體攝像元件、圖像顯示裝置及化合物
TW202231789A (zh) * 2021-02-03 2022-08-16 日商富士軟片股份有限公司 著色組成物、膜、濾光器、固體攝像元件、圖像顯示裝置及化合物
EP4485074A4 (en) * 2022-02-24 2025-08-13 Fujifilm Corp RESIN COMPOSITION, CURED ARTICLE, LAMINATE, METHOD FOR PRODUCING CURED ARTICLE, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
WO2023228791A1 (ja) * 2022-05-25 2023-11-30 富士フイルム株式会社 着色組成物、膜、光学フィルタ、固体撮像素子および画像表示装置
JPWO2024018910A1 (https=) * 2022-07-19 2024-01-25
KR102815450B1 (ko) * 2022-09-15 2025-05-29 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터
JP2024129724A (ja) * 2023-03-13 2024-09-27 住友化学株式会社 着色硬化性樹脂組成物、カラーフィルタ、及び固体撮像素子

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63202669A (ja) * 1987-02-12 1988-08-22 チバーガイギ　アクチエンゲゼルシヤフト 金属錯塩顔料を基剤とした新規組成物ならびに新規化合物
TW202003707A (zh) * 2018-05-21 2020-01-16 日商東洋油墨Ｓｃ控股股份有限公司 偶氮顏料、彩色濾光片用著色劑、彩色濾光片用著色組成物、彩色濾光片、液晶顯示裝置、固體攝像元件、以及有機el顯示裝置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008123294A1 (ja) * 2007-03-29 2008-10-16 Nippon Steel Chemical Co., Ltd. カラーフィルター用組成物及びカラーフィルター
JP2009035671A (ja) 2007-08-03 2009-02-19 Toray Ind Inc 顔料分散液、着色剤組成物、およびカラーフィルター
JP5747289B2 (ja) * 2011-03-30 2015-07-15 東洋インキＳｃホールディングス株式会社 アゾ顔料の製造方法
JP5917335B2 (ja) * 2012-08-23 2016-05-11 株式会社半導体エネルギー研究所 表示装置の作製方法
KR102083832B1 (ko) * 2014-03-31 2020-03-03 엘지디스플레이 주식회사 차량의 계기판용 액정표시소자 및 이를 구비한 계기판
KR102007149B1 (ko) * 2016-11-24 2019-08-05 주식회사 삼양사 흑색 아조-금속 착물, 이를 포함하는 감광성 수지 조성물 및 이를 이용하여 제조된 경화막
JP7156143B2 (ja) * 2018-05-21 2022-10-19 東洋インキＳｃホールディングス株式会社 アゾ顔料、カラーフィルタ用着色剤、着色組成物およびカラーフィルタ
JP7404666B2 (ja) 2019-06-11 2023-12-26 富士電機株式会社 集積回路、電源回路

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63202669A (ja) * 1987-02-12 1988-08-22 チバーガイギ　アクチエンゲゼルシヤフト 金属錯塩顔料を基剤とした新規組成物ならびに新規化合物
TW202003707A (zh) * 2018-05-21 2020-01-16 日商東洋油墨Ｓｃ控股股份有限公司 偶氮顏料、彩色濾光片用著色劑、彩色濾光片用著色組成物、彩色濾光片、液晶顯示裝置、固體攝像元件、以及有機el顯示裝置

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Publication number Publication date
JPWO2021215133A1 (https=) 2021-10-28
KR20220154199A (ko) 2022-11-21
KR102720835B1 (ko) 2024-10-23
US20230131561A1 (en) 2023-04-27
WO2021215133A1 (ja) 2021-10-28
CN115427517A (zh) 2022-12-02
TW202140656A (zh) 2021-11-01
US12535732B2 (en) 2026-01-27
JP7399268B2 (ja) 2023-12-15
CN115427517B (zh) 2024-12-31

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