TWI825339B - 曝光裝置，及物品的製造方法 - Google Patents

曝光裝置，及物品的製造方法 Download PDF

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Publication number
TWI825339B
TWI825339B TW109126462A TW109126462A TWI825339B TW I825339 B TWI825339 B TW I825339B TW 109126462 A TW109126462 A TW 109126462A TW 109126462 A TW109126462 A TW 109126462A TW I825339 B TWI825339 B TW I825339B
Authority
TW
Taiwan
Prior art keywords
concave mirror
substrate
optical system
mask
projection optical
Prior art date
Application number
TW109126462A
Other languages
English (en)
Chinese (zh)
Other versions
TW202111382A (zh
Inventor
河野道生
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW202111382A publication Critical patent/TW202111382A/zh
Application granted granted Critical
Publication of TWI825339B publication Critical patent/TWI825339B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/082—Catadioptric systems using three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW109126462A 2019-09-04 2020-08-05 曝光裝置，及物品的製造方法 TWI825339B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-161464 2019-09-04
JP2019161464A JP7357488B2 (ja) 2019-09-04 2019-09-04 露光装置、および物品製造方法

Publications (2)

Publication Number Publication Date
TW202111382A TW202111382A (zh) 2021-03-16
TWI825339B true TWI825339B (zh) 2023-12-11

Family

ID=74735493

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109126462A TWI825339B (zh) 2019-09-04 2020-08-05 曝光裝置，及物品的製造方法

Country Status (4)

Country Link
JP (1) JP7357488B2 (enrdf_load_stackoverflow)
KR (1) KR102747768B1 (enrdf_load_stackoverflow)
CN (1) CN112445082B (enrdf_load_stackoverflow)
TW (1) TWI825339B (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113296342B (zh) * 2021-05-21 2024-03-12 光感(上海)科技有限公司 一种光学投影系统
JP7614962B2 (ja) * 2021-07-08 2025-01-16 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414822B (zh) * 2008-07-09 2013-11-11 Canon Kk Projection optics, exposure apparatus and component manufacturing method
TWI437267B (zh) * 2009-10-06 2014-05-11 Canon Kk A projection optical system, an exposure apparatus, and a device manufacturing method
US20170090172A1 (en) * 2015-09-28 2017-03-30 Kenneth Carlisle Johnson Actinic, Spot-Scanning Microscope for EUV Mask Inspection and Metrology
US20170168399A1 (en) * 2014-09-15 2017-06-15 Carl Zeiss Smt Gmbh Projection lens, projection exposure apparatus and projection exposure method for euv microlithography

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6081578A (en) 1997-11-07 2000-06-27 U.S. Philips Corporation Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2008089832A (ja) 2006-09-29 2008-04-17 Canon Inc 露光装置
JP5196869B2 (ja) 2007-05-15 2013-05-15 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
KR101010605B1 (ko) 2007-10-15 2011-01-24 재단법인 포항산업과학연구원 Ｕ형 벤딩 파이프의 자동 열처리장치
JP2010135479A (ja) * 2008-12-03 2010-06-17 Canon Inc 走査型投影露光装置
JP6410406B2 (ja) 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法
JP2016161923A (ja) 2015-03-05 2016-09-05 キヤノン株式会社 露光装置及び物品の製造方法
JP6661371B2 (ja) * 2015-12-25 2020-03-11 キヤノン株式会社 評価方法、露光方法、および物品の製造方法
JP6748482B2 (ja) * 2016-05-25 2020-09-02 キヤノン株式会社 露光装置、および、物品の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414822B (zh) * 2008-07-09 2013-11-11 Canon Kk Projection optics, exposure apparatus and component manufacturing method
TWI437267B (zh) * 2009-10-06 2014-05-11 Canon Kk A projection optical system, an exposure apparatus, and a device manufacturing method
US20170168399A1 (en) * 2014-09-15 2017-06-15 Carl Zeiss Smt Gmbh Projection lens, projection exposure apparatus and projection exposure method for euv microlithography
US20170090172A1 (en) * 2015-09-28 2017-03-30 Kenneth Carlisle Johnson Actinic, Spot-Scanning Microscope for EUV Mask Inspection and Metrology

Also Published As

Publication number Publication date
CN112445082B (zh) 2024-03-19
JP7357488B2 (ja) 2023-10-06
CN112445082A (zh) 2021-03-05
JP2021039282A (ja) 2021-03-11
TW202111382A (zh) 2021-03-16
KR102747768B1 (ko) 2024-12-31
KR20210028574A (ko) 2021-03-12

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