TWI820263B - 基板液處理裝置及基板液處理方法 - Google Patents
基板液處理裝置及基板液處理方法 Download PDFInfo
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- TWI820263B TWI820263B TW108143924A TW108143924A TWI820263B TW I820263 B TWI820263 B TW I820263B TW 108143924 A TW108143924 A TW 108143924A TW 108143924 A TW108143924 A TW 108143924A TW I820263 B TWI820263 B TW I820263B
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- H—ELECTRICITY
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
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Abstract
[課題]本揭示提供將惰性氣體供給至基板之周圍且穩定地進行基板之液處理上有利的技術。
[解決手段]基板液處理裝置具備:基板保持部,用於保持基板;處理液供給部,對保持於基板保持部的基板之上表面供給處理液;蓋體,覆蓋基板保持部所保持的基板之上表面;及對基板保持部所保持的基板與蓋體之間之空間供給惰性氣體的氣體供給部,且為具有噴出惰性氣體的氣體供給口的氣體供給部;氣體供給口之開口方向係朝向基板保持部所保持的基板之上表面以外。
Description
本揭示關於基板液處理裝置及基板液處理方法。
在進行基板(晶圓)之液處理的裝置及方法中,藉由蓋體覆蓋供給有處理液的基板之上表面。
例如專利文獻1揭示的裝置中,在基板藉由蓋體覆蓋之狀態下,藉由設置於蓋體之天井部的加熱部加熱基板上之鍍敷液,而促進基板之液處理。又,專利文獻1之裝置中,對蓋體之內側供給惰性氣體而將基板之周圍設為低氧氛圍,藉此可以抑制基板上之鍍敷液之氧化。
如此般藉由蓋體覆蓋基板且在低氧氛圍下進行基板之液處理之情況下,藉由供給至基板之周圍的惰性氣體使基板上之處理液之狀態不被干擾,藉此可以穩定地進行液處理。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開2018-3097號公報
[發明所欲解決之課題]
本揭示提供將惰性氣體供給至基板之周圍且穩定地進行基板之液處理的有利的技術。
[用以解決課題的手段]
本揭示之一態樣的基板液處理裝置,係具備:基板保持部,用於保持基板;處理液供給部,對基板保持部所保持的基板之上表面供給處理液;蓋體,覆蓋基板保持部所保持的基板之上表面;及氣體供給部,係對基板保持部所保持的基板與蓋體之間之空間供給惰性氣體的氣體供給部,且具有噴出惰性氣體的氣體供給口;氣體供給口之開口方向係朝向基板保持部所保持的基板之上表面以外。
[發明效果]
依據本揭示,有利於將惰性氣體供給至基板之周圍且穩定地進行基板之液處理。
以下,參照圖面示出基板液處理裝置及基板液處理方法之例。以下說明的基板液處理裝置及基板液處理方法中,使用鍍敷液作為處理液。但是,基板之液處理使用的處理液可以是鍍敷液以外之液。
圖1係表示作為基板液處理裝置之一例的鍍敷處理裝置之構成之概略圖。於此,鍍敷處理裝置,係對基板W供給鍍敷液L1(處理液)進行基板W之鍍敷處理(液處理)的裝置。
如圖1所示,鍍敷處理裝置1具備鍍敷處理單元2、及對鍍敷處理單元2之動作進行控制的控制部3。
鍍敷處理單元2對基板W(晶圓)進行各種處理。關於鍍敷處理單元2進行的各種處理如後述。
控制部3,例如為電腦,具有動作控制部與記憶部。動作控制部,例如由CPU(Central Processing Unit)構成,藉由讀出並執行記憶部所記憶的程式,而對鍍敷處理單元2之動作進行控制。記憶部,例如由RAM(Random Access Memory)、ROM(Read Only Memory)、硬碟等之記憶元件構成,記憶有對鍍敷處理單元2中執行的各種處理進行控制的程式。又,程式,可以是記錄於電腦可讀取的記錄媒體31者,或是從該記錄媒體31安裝於記憶部者。電腦可讀取的記錄媒體31,例如可以舉出硬碟(HD)、軟碟(FD)、光碟(CD)、磁光碟(MO)、記憶卡等。於記錄媒體31例如記錄有藉由控制鍍敷處理裝置1之動作的電腦之執行時,電腦對鍍敷處理裝置1進行控制而使執行後述之鍍敷處理方法的程式。
鍍敷處理單元2具有搬出入站21,和與搬出入站21鄰接設置的處理站22。
搬出入站21包含載置部211、和與載置部211鄰接設置的搬送部212。
於載置部211載置有將複數片基板W以水平狀態進行收納的複數個搬送容器(以下稱為「載具C」)。
搬送部212包含搬送機構213與交接部214。搬送機構213包含保持基板W的保持機構,構成為可以進行水平方向及鉛直方向之移動以及以鉛直軸為中心的旋動。
處理站22包含鍍敷處理部5。本實施之形態中,處理站22具有的鍍敷處理部5的個數為2個以上,但是亦可以是1個。鍍敷處理部5配列於朝規定方向延伸的搬送路221之兩側(與後述之搬送機構222之移動方向正交的方向中的兩側)。
於搬送路221設置有搬送機構222。搬送機構222包含保持基板W的保持機構,構成為可以朝水平方向及鉛直方向之移動以及以鉛直軸為中心的旋動。
於鍍敷處理單元2中,搬出入站21之搬送機構213在載具C與交接部214之間進行基板W之搬送。具體言之,搬送機構213從載置於載置部211的載具C取出基板W,將取出的基板W載置於交接部214。又,搬送機構213藉由處理站22之搬送機構222取出載置於交接部214的基板W,使收納於載置部211之載具C。
於鍍敷處理單元2中,處理站22之搬送機構222在交接部214與鍍敷處理部5之間、鍍敷處理部5與交接部214之間進行基板W之搬送。具體言之,搬送機構222取出載置於交接部214的基板W,將取出的基板W搬入鍍敷處理部5。又,搬送機構222從鍍敷處理部5取出基板W,將取出的基板W載置於交接部214。
接著,參照圖2對鍍敷處理部5之構成進行說明。圖2係表示鍍敷處理部5之構成之概略剖面圖。
鍍敷處理部5進行包含無電解鍍敷處理的液處理。鍍敷處理部5具備:腔室51;將配置於腔室51內的基板W以水平方式保持的基板保持部52;及對基板保持部52所保持的基板W之上表面(處理面)SW
供給鍍敷液L1(處理液)的鍍敷液供給部53(處理液供給部)。本實施之形態中,基板保持部52具有對基板W之下面(背面)進行真空吸附的吸盤構件521。該基板保持部52為所謂的真空吸盤型,但基板保持部52不限定於此,例如藉由卡盤機構等把持基板W之外緣部的機械卡盤型亦可。
基板保持部52透過旋轉軸522連結於旋轉馬達523(旋轉驅動部)。旋轉馬達523被驅動時,基板保持部52與基板W同時旋轉。旋轉馬達523被固定於腔室51的基座524支撐。
鍍敷液供給部53具有對保持於基板保持部52的基板W吐出(供給)鍍敷液L1的鍍敷液噴嘴531(處理液噴嘴),及對鍍敷液噴嘴531供給鍍敷液L1的鍍敷液供給源532。鍍敷液供給源532將加熱或調溫至規定之溫度的鍍敷液L1供給至鍍敷液噴嘴531。鍍敷液噴嘴531吐出時之鍍敷液L1之溫度,例如為55℃以上75℃以下,更佳為60℃以上70℃以下。鍍敷液噴嘴531構成為被保持於噴嘴手臂56可以移動。
鍍敷液L1為自催化型(還原型)無電解鍍敷用之鍍敷液。鍍敷液L1例如含有鈷(Co)離子、鎳(Ni)離子、鎢(W)離子、銅(Cu)離子、鈀(Pd)離子、金(Au)離子等之金屬離子,及次磷酸、二甲胺硼烷等之還原劑。鍍敷液L1含有添加劑等亦可。作為藉由使用鍍敷液L1的鍍敷處理形成的鍍敷膜(金屬膜),例如可以舉出CoWB、CoB、CoWP、CoWBP、NiWB、NiB、NiWP、NiWBP等。
本實施形態的鍍敷處理部5還具備:作為其他處理液供給部的對保持於基板保持部52的基板W之上表面SW
供給洗淨液L2的洗淨液供給部54,及對該基板W之上表面SW
供給沖洗液L3的沖洗液供給部55。
洗淨液供給部54具有對保持於基板保持部52的基板W吐出洗淨液L2的洗淨液噴嘴541,及對洗淨液噴嘴541供給洗淨液L2的洗淨液供給源542。洗淨液L2例如可以使用蟻酸、蘋果酸、琥珀酸、檸檬酸、丙二酸等之有機酸、稀釋成為不腐蝕基板W之被鍍敷面之程度的濃度之氟化氫酸(DHF)(氟化氫之水溶液)等。洗淨液噴嘴541係被噴嘴手臂56保持,與鍍敷液噴嘴531可以同時移動。
沖洗液供給部55具有對保持於基板保持部52的基板W吐出沖洗液L3的沖洗液噴嘴551,及對沖洗液噴嘴551供給沖洗液L3的沖洗液供給源552。其中沖洗液噴嘴551係被噴嘴手臂56保持,與鍍敷液噴嘴531及洗淨液噴嘴541可以同時移動。作為沖洗液L3例如可以使用純水等。
在保持前述鍍敷液噴嘴531、洗淨液噴嘴541、及沖洗液噴嘴551的噴嘴手臂56連結有未圖示的噴嘴移動機構。該噴嘴移動機構使噴嘴手臂56朝水平方向及上下方向移動。更具體而言,藉由噴嘴移動機構,噴嘴手臂56成為可以在對基板W吐出處理液(鍍敷液L1、洗淨液L2或沖洗液L3)的吐出位置,與從吐出位置退避的退避位置之間移動。吐出位置只要可以對基板W之上表面Sw
之中之任意之位置供給處理液即可,並無特別限定。例如將可以對基板W之中心供給處理液的位置設為吐出位置為適合者。依據對基板W供給鍍敷液L1的情況、供給洗淨液L2的情況、及供給沖洗液L3的情況使噴嘴手臂56之吐出位置不同亦可。退避位置為,腔室51內之中,從上方觀察的情況下與基板W不重疊的位置,且與吐出位置分離的位置。噴嘴手臂56之位置位於退避位置之情況下,移動的蓋體6與噴嘴手臂56之干涉可以被迴避。
在基板保持部52之周圍設置有杯571。該杯571形成為從上方觀察的情況下為環狀,在基板W之旋轉時承受從基板W飛散的處理液,被導引至後述之排水管581。於杯571之外周側設置有氛圍遮斷蓋572,抑制基板W之周圍之氛圍擴散至腔室51內。該氛圍遮斷蓋572以朝上下方向延伸的方式形成為圓筒狀,上端具有開口。後述之蓋體6可以從上方插入氛圍遮斷蓋572內。
在杯571之下方設置有排水管581。該排水管581形成為從上方觀察的情況下為環狀,接受並排出由杯571承受而下降的處理液或從基板W之周圍直接下降的處理液。於排水管581之內周側設置有內側蓋582。
基板保持部52所保持的基板W之上表面SW
係被蓋體6覆蓋。該蓋體6具有朝水平方向延伸的天井部61,及從天井部61朝下方延伸的側壁部62。在蓋體6之位置位於後述之下方位置(亦即處理位置)之情況下,天井部61配置於保持於基板保持部52的基板W之上方,以比較小的間隔與基板W對置。
天井部61包含第1天井板611,及設置於第1天井板611上的第2天井板612。第1天井板611與第2天井板612之間存在有加熱器63(加熱部),作為隔著加熱器63而設置的第1面狀體及第2面狀體而設置第1天井板611及第2天井板612。第1天井板611及第2天井板612對加熱器63進行密封,構成為加熱器63不接觸鍍敷液L1等之處理液。更具體而言,在第1天井板611與第2天井板612之間在加熱器63之外周側設置有密封環613,藉由該密封環613密封加熱器63。第1天井板611及第2天井板612,以具有對鍍敷液L1等之處理液的耐腐蝕性為適合者,例如可以藉由鋁合金形成。為了進一步提高耐腐蝕性,第1天井板611、第2天井板612及側壁部62可以藉由鐵氟龍(註冊商標)被覆。
蓋體6經由蓋體手臂71連結於蓋體移動機構7。蓋體移動機構7使蓋體6朝水平方向及上下方向移動。更具體而言,蓋體移動機構7具有使蓋體6朝水平方向移動的旋動馬達72,及使蓋體6朝上下方向移動的氣缸73(間隔調節部)。其中旋動馬達72安裝於以相對於氣缸73設置成為可於上下方向移動的支撐板74上。作為氣缸73之代替,可以使用包含馬達與滾珠螺桿的致動器(未圖示)。
蓋體移動機構7之旋動馬達72使蓋體6在保持於基板保持部52的基板W之上方所配置的上方位置,與從上方位置退避的退避位置之間移動。上方位置為,以比較大的間隔與保持於基板保持部52的基板W對置的位置,且從上方觀察的情況下與基板W重疊的位置。退避位置為,腔室51內之中從上方觀察的情況下與基板W不重疊的位置。蓋體6之位置位於退避位置之情況下,可以迴避移動的噴嘴手臂56與蓋體6之干涉。旋動馬達72之旋轉軸線,係朝上下方向延伸,蓋體6成為可以在上方位置與退避位置之間沿著水平方向旋動移動。
蓋體移動機構7之氣缸73使蓋體6沿著上下方向移動而對上表面Sw
上盛裝有鍍敷液L1的基板W與天井部61之第1天井板611的間隔進行調節。更具體而言,氣缸73使蓋體6之位置位於下方位置(圖2中實線所示位置)與上方位置(圖2中二點虛線所示位置)。
蓋體6配置於下方位置之情況下,第1天井板611接近基板W。該情況下,為了防止鍍敷液L1之汚損或鍍敷液L1內之氣泡產生,以使第1天井板611不接觸基板W上之鍍敷液L1的方式設定於下方位置較適合。
上方位置成為,使蓋體6朝水平方向旋動移動時,可以迴避蓋體6與杯571或氛圍遮斷蓋572等之周圍構造物之干涉的高度位置。
本實施形態中構成為,加熱器(加熱部)63被驅動而發熱,蓋體6之位置位於前述下方位置之情況下,基板W上之鍍敷液L1藉由加熱器63進行加熱。
蓋體6之側壁部62,係從天井部61之第1天井板611之周緣部朝下方延伸,在對基板W上之鍍敷液L1進行加熱時(亦即蓋體6之位置位於下方位置之情況下)被配置於基板W之外周側。蓋體6之位置位於下方位置之情況下,側壁部62之下端之位置位於比基板W低的位置亦可。
設置於天井部61的加熱器63,在蓋體6之位置位於下方位置之情況下發熱,對基板W上之處理液(適合上為鍍敷液L1)進行加熱。
蓋體6之天井部61及側壁部62係藉由蓋體披覆部64覆蓋。該蓋體披覆部64透過支撐部65載置於蓋體6之第2天井板612上。亦即,於第2天井板612上設置有從第2天井板612之上面朝上方突出的複數個支撐部65,於該支撐部65載置有蓋體披覆部64。蓋體披覆部64成為與蓋體6可以朝水平方向及上下方向移動。又,為了抑制蓋體6內之熱向周圍散出,蓋體披覆部64具有比天井部61及側壁部62更高的隔熱性為較佳。例如蓋體披覆部64藉由樹脂材料形成為適合者,該樹脂材料具有耐熱性則更進一步適合。
於腔室51之上部設置有對蓋體6之周圍供給清淨的空氣(氣體)的風扇過濾單元59(氣體供給部)。風扇過濾單元59對腔室51內(尤其是氛圍遮斷蓋572內)供給空氣,供給的空氣朝向後述之排氣管81流動。於蓋體6之周圍形成使該空氣成為向下流動的下降氣流,從鍍敷液L1等之處理液氣化的氣體,係藉由該下降氣流朝向排氣管81流動。這樣的話,可以防止從處理液氣化的氣體上升而擴散至腔室51內。
前述風扇過濾單元59所供給的氣體係藉由排氣機構8排出。該排氣機構8具有:設置於杯571之下方的2個排氣管81;及設置於排水管581之下方的排氣管82。其中2個排氣管81貫穿排水管581之底部而分別與排氣管82連通。排氣管82從上方觀察的情況下實質上形成為半圓環狀。本實施形態中,於排水管581之下方設置1個排氣管82,於該排氣管82連通有2個排氣管81。
[氣體供給部]
圖2中省略圖示,鍍敷處理部5還具備具有噴出惰性氣體的1個或複數個氣體供給口的氣體供給部(參照後述之圖3~圖6之符號「11」)。氣體供給部對基板保持部52所保持的基板W與蓋體6間之空間供給惰性氣體,將基板W之周圍設為低氧氛圍。
氣體供給口代表性為位於蓋體6之內側。特別是,本實施形態之氣體供給口之開口方向係朝向基板保持部52所保持的基板W之上表面Sw
以外。藉此,來自氣體供給口之剛噴出後之惰性氣體朝向上表面SW
以外進行,可以迴避直接對上表面SW
噴吹惰性氣體。因此可以防止上表面SW
上之鍍敷液L1之溫度降低或狀態之紊亂,而且可以對基板W與蓋體6間之空間供給惰性氣體。如此般具備前述氣體供給部的鍍敷處理部5,在對基板W之周圍供給惰性氣體而且穩定地進行基板W之液處理上非常有利。
又,氣體供給口之開口方向係由到達氣體供給口的氣體流路之中心線在氣體供給口中朝向的方向決定。因此,經由氣體流路從氣體供給口噴出的惰性氣體之幾乎全部朝向開口方向或者包含開口方向成分的方向進行。
從防止基板W上之處理液(例如鍍敷液L1等)之氧化的觀點而言,以不增大包含於處理液的氧量(亦即溶存氧量)為較佳。另一方面,基板W上之處理液之溶存氧量,係對應於與上表面SW
面對的空間中存在的氣體中之氧之比率或分壓而變動,因此為了減低處理液之溶存氧量較好是降低該空間中的氧比率。依據本實施形態之鍍敷處理部5,對基板W與蓋體6間之空間供給惰性氣體,將該空間設為陽壓狀態,使存在於該空間的氧被排出該空間外。如此般藉由降低基板W與蓋體6間之空間中的氧比率,可以促進處理液之脫氧,減低處理液之溶存氧量。
此處所謂的惰性氣體可以是包含低反應性的氣體全部者,或僅包含單一種類之元素者亦可,化合物之氣體亦可。代表性者可以將氮、稀有氣體(氦等)或其他不含有氧的穩定的氣體使用作為惰性氣體。特別是氦基於以下之點而比氮等更好作為惰性氣體使用。
氦比氮或氧更輕,因此容易滯留於蓋體6之內側空間(亦即藉由天井部61及側壁部62劃分的空間)。特別是,如前述般氣體經由排氣管81及排氣管82(參照圖2)誘導至下方而排出之情況下,氦比氮或氧更難排出。因此和氮比較,氦可以抑制消費量,且可以有效使用作為降低基板W與蓋體6間之空間中的氧比率。又,氦具有氮之約5倍之熱傳導率,容易升溫。如前述般,經由加熱器63加熱的基板W上之處理液之溫度,受到基板W與蓋體6間之空間存在的惰性氣體之影響而降低則較不好。因此,將藉由來自加熱器63之熱容易升溫的氦作為惰性氣體供給至基板W與蓋體6間之空間,可以有效防止基板W上之處理液之溫度降低。又,氦比起氧及氮具有更低的溶解度。通常,異物混入處理液較為不好,因此,可能的話考量為幾乎無不良影響的惰性氣體也以不溶解於處理液者為較佳。因此對基板W與蓋體6間之空間供給作為惰性氣體的氦的情況下,可以減低惰性氣體(亦即氦)之溶解於基板W上之處理液。又,和氮比較,氦之安全性更高,容易處理。
前述氣體供給部可以藉由各種構成實現,可以藉由各種態樣從氣體供給口噴出惰性氣體。以下,對氣體供給部之構成例及惰性氣體之噴出態樣例進行說明。
[氣體供給部之第1典型例]
圖3係表示第1典型例的氣體供給部11之概略構成之剖面圖。圖3中,和前述圖1及圖2所示要素為同一或類似之要素被附加同一符號,省略其詳細的說明。又,為了容易理解,因此圖3所示要素之形狀或尺寸比,未必一定和圖1及圖2所示要素之形狀或尺寸比對應。又,圖3中省略一部分要素(例如蓋體披覆部64等)之圖示。
氣體供給部11具備:具有氣體供給口13的氣體供給噴嘴12;及對氣體供給噴嘴12供給惰性氣體的氣體供給源(省略圖示)。控制部3(參照圖1)對氣體供給源及/或從氣體供給源到達氣體供給噴嘴12的流路上設置的流量調整元件(例如開關閥等)進行控制,調整惰性氣體對氣體供給噴嘴12之供給及來自氣體供給口13之惰性氣體之噴出。
本例之氣體供給部11之氣體供給噴嘴12係安裝於蓋體6之側壁部62之內側(亦即基板保持部52側),氣體供給口13之開口方向朝向天井部61。因此氣體供給口13朝向天井部61噴出惰性氣體。
圖3所示例中設置有複數個氣體供給噴嘴12,在以基板W之旋轉軸線Ax作為基準的對稱位置(亦即線對稱之位置)配置有2個氣體供給噴嘴12。又,氣體供給噴嘴12僅設置2個亦可,設置3個以上亦可,僅設置1個亦可。設置有複數個氣體供給噴嘴12之情況下,在以旋轉軸線Ax作為中心的旋轉對稱位置配置複數個氣體供給噴嘴12亦可。
圖示之加熱器63係和旋轉軸線Ax起之水平方向距離對應而分割為複數個。具體言之設置有,在以旋轉軸線Ax作為中心的中央範圍所設置的中央加熱器63a,在最遠離旋轉軸線Ax的位置所設置之最外側加熱器63c,及在中央加熱器63a與最外側加熱器63c之間所設置的中間加熱器63b。如此般藉由在複數個區域分別分配固有之加熱器63a、63b、63c,可以按照區域單位對鍍敷液L1之加熱進行調整。例如基板W之外周附近之溫度存在容易降低之傾向,因此將最外側加熱器63c設為比其他加熱器更高溫,藉此,可以防止基板W之外周附近中的上表面SW
上之鍍敷液L1之局部性的溫度降低。
如前述般,基於蓋體6與基板W之間之空間存在的惰性氣體導致基板W上之鍍敷液L1之溫度降低而較不好。另一方面,從本例之氣體供給口13朝向天井部61之中與最外側加熱器63c對應之區域噴出惰性氣體。因此最外側加熱器63c比其他加熱器設為更高溫之情況下,從氣體供給口13噴出的惰性氣體可以有效地升溫,可以防止惰性氣體引起的基板W上之鍍敷液L1之溫度降低。
又,在天井部61與側壁部62之間之角部設置氣流導引部24亦可。圖示之氣流導引部24係設置於天井部61與側壁部62之間之角部之整體,且具有藉由從蓋體6與基板W之間之空間露出的平滑的曲面構成的導引面24a。導引面24a較好是與天井部61之內側面及/或側壁部62之內側面無段差地連接,較好是和天井部61之內側面及側壁部62之內側面都構成順暢的面。藉由設置氣流導引部24,可以防止在天井部61與側壁部62之間之角部產生渦流,且可以防止氣體滯留於該角部。
又,氣體供給口13之開口方向以朝向氣流導引部24之導引面24a為較佳。該情況下,氣體供給口13朝向氣流導引部24之導引面24a噴出惰性氣體,藉由導引面24a使惰性氣體之氣流方向變為水平方向,可以使惰性氣體以沿著天井部61之內側面的方式流向水平方向。如此般可以抑制惰性氣體對基板W上之鍍敷液L1之噴吹,且在基板W之上方流通惰性氣體。特別是,藉由設置複數個氣體供給噴嘴12(亦即複數個氣體供給口13)而且以沿著天井部61之內側面的方式流入惰性氣體,可以在基板W上之鍍敷液L1之液面之附近作出流向水平方向的惰性氣體之層流。亦即,可以在天井部61側作出從基板W之外周側朝向內側的惰性氣體之層流之同時,可以在基板W側作出從基板W之內側朝向外周側的惰性氣體之層流。該情況下,從鍍敷液L1放出的包含氧的氣體,可以藉由從基板W之內側朝向外周側的惰性氣體之層流冲掉,可以有效地排出蓋體6外側。
又,為了作出沿著天井部61之內側面朝水平方向順暢地流入的氣流,天井部61之內側面以不具有凹凸的平面為較佳。同樣地,為了作出沿著側壁部62之內側面朝上下方向順暢地流入的氣流,側壁部62之內側面以不具有凹凸的平面為較佳。
[氣體供給部之第2典型例]
圖4係表示第2典型例的氣體供給部11之概略構成之剖面圖。圖4中,和圖1~圖3所示要素為同一或類似之要素附加同一符號,並省略其詳細的說明。圖4所示要素之形狀或尺寸比未必一定與圖1及圖2所示要素之形狀或尺寸比對應,又,圖4中一部分要素之圖示被省略。
本例中,氣體供給部11之複數個氣體供給噴嘴12安裝於蓋體6之天井部61之內側面(亦即基板保持部52側)。彼等之氣體供給噴嘴12配置於以旋轉軸線Ax作為中心的旋轉對稱位置。圖示之例中,在以旋轉軸線Ax作為中心的線對稱位置配置有2個氣體供給噴嘴12。
各氣體供給口13之開口方向為水平方向,各氣體供給口13以沿著天井部61的方式噴出惰性氣體。圖示之氣體供給口13之開口方向為,以通過旋轉軸線Ax的方式從基板W之外周側朝向基板W之內側的方向,氣體供給口13朝向旋轉軸線Ax。又,只要從氣體供給口13以沿著天井部61的方式可以噴出惰性氣體,則氣體供給噴嘴12,作為天井部61之取代可以僅安裝於側壁部62,或安裝於天井部61及側壁部62之雙方亦可。
依據具有前述構成的本例之氣體供給噴嘴12,從氣體供給口13噴出的惰性氣體,係沿著天井部61從基板W之外周側朝向內側行進,與在旋轉軸線Ax之附近從其他方向行進來的惰性氣體碰撞。之後,惰性氣體沿著鍍敷液L1之液面從基板W之內側朝向外周側行進,通過基板W與蓋體6(特別是側壁部62)之間而排出至蓋體6之外側。
又,從側壁部62朝向內側(亦即基板保持部52側)延伸的鍔部26安裝於側壁部62亦可。圖4所示鍔部26係設置為環狀之凸部,安裝於側壁部62之內側面。蓋體6配置於下方位置之狀態下,鍔部26局部性縮小基板W與蓋體6間之空間之水平方向剖面積,例如配置於比基板W之上表面SW
更下方之位置。圖示之例中,鍔部26配置於水平方向上與基板W至少一部分重疊的位置,但鍔部26配置於水平方向上不與基板W重疊的位置(亦即比基板W之整體更下方之位置)亦可。鍔部26防止外氣(特別是氧)流入蓋體6與基板W之間之空間,有利於穩定基板W上之鍍敷液L1。又,鍔部26容易將蓋體6與基板W之間之空間設為陽壓,有助於來自該空間之氧等之氣體之有效的排出。
[氣體供給部之第3典型例]
圖5係表示第3典型例的氣體供給部11之概略構成之剖面圖。圖5中,和前述圖1~圖4所示要素具有同一或類似之要素者附加同一符號,並省略其詳細說明。圖5所示要素之形狀或尺寸比未必一定和圖1及圖2所示要素之形狀或尺寸比對應,又,圖5中一部分要素之圖示被省略。
本例之氣體供給部11之氣體供給噴嘴12係設置於蓋體6之天井部61。圖示之氣體供給噴嘴12具有沿著旋轉軸線Ax而貫穿天井部61的鉛直流路,及在與該鉛直流路連接的蓋體6之內側朝水平方向延伸的水平流路,藉由水平流路之端部開口構成氣體供給口13。圖示之氣體供給口13在遍及圓周方向由單一之開口構成。又,將1個或複數個間隔部設置於水平流路,藉由該1個或複數個間隔部彼此間隔的複數個開口來構成複數個氣體供給口13亦可。
氣體供給口13之開口方向為從基板W之內側朝向基板W之外周側的水平方向。從氣體供給口13噴出的惰性氣體,係從基板W之內側朝向基板W之外周側以放射狀行進,通過基板W與蓋體6(特別是側壁部62)之間而排出至蓋體6之外側。藉此,可以將包含氧的氣體以及從基板W之內側朝向外側的惰性氣體同時排出至蓋體6之外側。
又,雖省略圖示,本例中亦可以設置前述氣流導引部24(參照圖3)及/或鍔部26(參照圖4)。
[氣體供給部之第4典型例]
圖6係表示第4典型例的氣體供給部11之概略構成之平面圖。圖6中,和前述圖1~圖5所示要素為同一或類似之要素被附加同一符號,並省略其詳細說明。圖6所示要素之形狀或尺寸比未必一定和圖1及圖2所示要素之形狀或尺寸比對應,又,圖6中一部分要素之圖示被省略。
在蓋體6配置於下方位置(亦即處理位置)之狀態下,本例之基板保持部52係使基板W以旋轉軸線Ax作為中心而沿著順圓周方向(circumferential direction)Df旋轉。藉由使上表面SW
承載有鍍敷液L1的基板W以低速旋轉,而保持上表面SW
上之鍍敷液L1之狀態並且防止該鍍敷液L1之局部性的品質之偏差,藉此,在遍及上表面SW
之整體可以實現均質的液處理。
另一方面,氣體供給部11具有複數個氣體供給噴嘴12(圖6所示例中為2個氣體供給噴嘴12),設置有複數個氣體供給口13。虛擬地設定通過各氣體供給噴嘴12之氣體供給口13之中心的延長線Lv,且為以直線狀朝對應之氣體供給口13之開口方向延伸的延長線Lv。各氣體供給口13之開口方向,係以對應之延長線Lv不通過旋轉軸線Ax的方式而且追隨順圓周方向Df的方向進行設定。亦即,以藉由從各氣體供給口13噴出的惰性氣體作出在基板W之上方沿著順圓周方向Df旋動的氣流的方式來設定各氣體供給口13之開口方向。
圖6所示例中,各氣體供給噴嘴12設置於比基板W之外周更靠外側,在上下方向上各氣體供給噴嘴12(特別是各氣體供給口13)不與基板W重疊。又,氣體供給噴嘴12(特別是氣體供給口13)位於比基板W之外周更內側亦可,在上下方向上與基板W重疊亦可。例如在具有鉛直流路及水平流路的氣體供給噴嘴12中,將由水平流路之端部開口構成的複數個氣體供給口13配置於比基板W之外周更內側亦可(省略圖示)。鉛直流路係與旋轉軸線Ax平行(例如沿著旋轉軸線Ax)而貫穿天井部61的方式設置,水平流路連接於鉛直流路,且配置於蓋體6之內側空間。該情況下,亦將各氣體供給口13之開口方向設定為,對應之延長線Lv不通過旋轉軸線Ax,而且,追隨順圓周方向Df的方向,藉此,在基板W之上方可以作出流向順圓周方向Df的旋動氣流。
如此般藉由使基板W之上方中的氣流之旋動方向與基板W之旋轉方向對應,可以減低基板W上之鍍敷液L1與基板W之上方之氣流之間之相對速度。藉此,可以抑制基板W上之鍍敷液L1受到供給至蓋體6與基板W之間之空間的惰性氣體之影響,可以穩定基板W上之鍍敷液L1之狀態。
又,各氣體供給口13之開口方向亦可以設定為,對應之延長線Lv不通過旋轉軸線Ax,而且追隨與順圓周方向Df相反之圓周方向(亦即逆圓周方向(reverse circumferential direction)Dr的方向。該情況下,以藉由從各氣體供給口13噴出的惰性氣體作出在基板W之上方沿著逆圓周方向Dr旋動的氣流的方式,對各氣體供給口13之開口方向進行設定。該情況下,在基板W上之鍍敷液L1與基板W之上方之旋動氣流之間之相對速度成為較大的狀態下,藉由旋動氣流從基板W與蓋體6間之空間可以有效地排出含氧氣體。又,藉由基板保持部52停止基板W之狀態下,以在基板W之上方作出旋動氣流的方式來設定各氣體供給口13之開口方向亦可。
為了在基板W之上方作出期待之旋動氣流,將全部氣體供給噴嘴12之氣體供給口13之開口方向設定為追隨共通之圓周方向(亦即順圓周方向Df或逆圓周方向Dr)的方向為較佳。但是,僅將一部分之氣體供給噴嘴12之氣體供給口13之開口方向設定為追隨共通之圓周方向的方向亦可。亦即將複數個氣體供給口13之中之2個以上之氣體供給口13之各自之開口方向設定為追隨順圓周方向Df與逆圓周方向Dr之中之一者的方向亦可。
[氣體供給部之第5典型例]
圖7係表示鍍敷處理方法之一例之流程圖。本典型例關於鍍敷處理方法(亦即基板液處理方法),特別是關於來自氣體供給口13之惰性氣體之噴出時序。因此本典型例的鍍敷處理方法,例如可以藉由前述第1典型例~第4典型例的裝置實施,或藉由具有其他構成的裝置實施亦可。
以下,首先對鍍敷處理方法之整體之流程進行說明,之後,對惰性氣體之供給時序進行說明。
藉由鍍敷處理裝置1實施的鍍敷處理方法,係包含對基板W的鍍敷處理。鍍敷處理係由鍍敷處理部5實施。以下所示鍍敷處理部5之動作係由控制部3控制。又,在以下之處理進行之間,從風扇過濾單元59將清淨的空氣供給至腔室51內,流入排氣管81。
首先,將基板W搬入鍍敷處理部5,基板W藉由基板保持部52保持於水平(圖7所示S1)。
接著,進行保持於基板保持部52的基板W之洗淨處理(S2)。該洗淨處理中,首先旋轉馬達523被驅動使基板W以規定之旋轉數旋轉,接著,位置位於退避位置的噴嘴手臂56移動至吐出位置,從洗淨液噴嘴541將洗淨液L2供給至旋轉的基板W之上表面SW
。藉此,進行基板W之表面之洗淨,將附著於基板W之附著物等從基板W除去。供給至基板W的洗淨液L2從排水管581被排出。
接著,進行基板W之沖洗處理(S3)。該沖洗處理中,從沖洗液噴嘴551將沖洗液L3供給至旋轉的基板W,對基板W之表面進行沖洗處理。藉此,沖掉殘存於基板W上的洗淨液L2。供給至基板W的沖洗液L3係從排水管581排出。
接著,進行對基板保持部52所保持的基板W之上表面SW
供給鍍敷液L1,於基板W之上表面SW
上形成鍍敷液L1之槳料的鍍敷液承載工程(S4)。該工程中,首先,使基板W之旋轉數比沖洗處理時的旋轉數更減低,例如將基板W之旋轉數設為50~150rpm亦可。藉此,可以使形成於基板W上的鍍敷膜均勻化。又,停止基板W之旋轉,增大鍍敷液L1之承載量亦可。接著,從鍍敷液噴嘴531朝基板W之上表面SW
吐出鍍敷液L1。該鍍敷液L1藉由表面張力滯留於上表面SW
,形成鍍敷液L1之層(所謂槳料)。鍍敷液L1之一部分從上表面SW
流出經由排水管581排出。規定量之鍍敷液L1從鍍敷液噴嘴531吐出之後,停止鍍敷液L1之吐出。之後,使噴嘴手臂56之位置位於退避位置。
接著,作為鍍敷液加熱處理工程而對承載於基板W上的鍍敷液L1進行加熱。該鍍敷液加熱處理工程具有:蓋體6覆蓋基板W的覆蓋工程(S5);供給惰性氣體的工程(S6);使蓋體6配置於下方位置而對鍍敷液L1進行加熱的加熱工程(S7);及使蓋體6從基板W上退避的工程(S8)。又,鍍敷液加熱處理工程中,使基板W之旋轉數維持於和鍍敷液承載工程同樣之速度(或者停止旋轉)為適合。
在蓋體6對基板W進行覆蓋的工程(S5)中,首先,驅動蓋體移動機構7之旋動馬達72,使位置位於退避位置的蓋體6沿著水平方向旋動移動,使位置位於上方位置。接著,驅動蓋體移動機構7之氣缸73,使位置位於上方位置之蓋體6下降使其位置位於下方位置,基板W被蓋體6覆蓋,基板W之周圍之空間被閉鎖。如此般基板保持部52所保持的基板W之上表面SW
藉由配置於下方位置(亦即處理位置)的蓋體6進行覆蓋。
基板W被蓋體6覆蓋之後,在基板W之上表面SW
承載有鍍敷液L1的狀態下,從氣體供給噴嘴12之氣體供給口13噴出惰性氣體。藉此而對基板保持部52所保持的基板W與配置於下方位置的蓋體6間之空間供給惰性氣體(S6),可以將基板W之周圍保持於低氧氛圍並且進行基板W之上表面SW
之鍍敷處理。
接著, 承載於基板W上的鍍敷液L1被進行加熱(S7)。在鍍敷液L1之溫度上升至鍍敷液L1中之成分析出的溫度時,於基板W之上表面析出鍍敷液L1之成分而成長形成鍍敷膜。該加熱工程中,在為了獲得期待厚度之鍍敷膜所必要的時間,鍍敷液L1被加熱而維持於析出溫度。
加熱工程結束後,驅動蓋體移動機構7,使蓋體6之位置位於退避位置(S8)。如此而結束基板W之鍍敷液加熱處理工程(S5~S8)。
接著,進行基板W之沖洗處理(S9)。該沖洗處理中,首先,使基板W之旋轉數比鍍敷處理時的旋轉數增大,例如以和鍍敷處理前之基板沖洗處理工程(S3)同樣之旋轉數使基板W旋轉。接著,位置位於退避位置的沖洗液噴嘴551移動至吐出位置。接著,從沖洗液噴嘴551將沖洗液L3供給至旋轉的基板W,進行基板W之表面之洗淨,將殘存於基板W上的鍍敷液L1沖掉。
接著,進行基板W之乾燥處理(S10)。該乾燥處理中,使基板W高速旋轉,例如使基板W之旋轉數比基板沖洗處理工程(S9)之旋轉數增大。藉此,殘存於基板W上的沖洗液L3被甩掉除去,獲得形成有鍍敷膜的基板W。該情況下,將氮(N2
)氣體等之惰性氣體噴吹到基板W,促進基板W之乾燥亦可。
之後,從基板保持部52取出基板W,從鍍敷處理部5搬出(S11)。
如前述般,依據本典型例的鍍敷處理方法,藉由蓋體6覆蓋承載有鍍敷液L1的基板W之上表面SW
,且從氣體供給噴嘴12之氣體供給口13噴出惰性氣體(S6)。該惰性氣體供給工程(S6)中,氣體供給口13之開口方向係朝向基板保持部52所保持的基板W之上表面SW
以外。藉此,可以防止鍍敷液L1之溫度之降低或鍍敷液L1之狀態之紊亂,且可以對基板W與蓋體6間之空間供給惰性氣體,可以穩定地進行基板W之液處理。
又,就防止鍍敷液L1之氧化觀點而言,鍍敷液L1承載於基板W上之後,盡快將基板W之上表面SW
之周圍設為低氧氛圍為較佳。又,就提高基板W之鍍敷處理之品質觀點而言,盡可能減低基板W上之鍍敷液L1受到從氣體供給口13噴出的惰性氣體之影響為較佳。因此如圖7所示,可以按照各種時序從氣體供給口13噴出惰性氣體。
例如在蓋體6配置於下方位置之前,從氣體供給噴嘴12之氣體供給口13噴出惰性氣體亦可(例如參照圖7之S12-1)。該情況下,在蓋體6配置於下方位置之前,先於惰性氣體供給工程(S6)之前,可以使惰性氣體貯存於由天井部61與側壁部62所劃分的空間(亦即蓋體6之內側空間)。
又,於基板W之上表面SW
承載有洗淨液L2的狀態下,從氣體供給噴嘴12之氣體供給口13噴出惰性氣體亦可(例如參照圖7之S12-2)。藉此,在比惰性氣體供給工程(S6)先前的基板洗淨處理工程(S2)之期間,可以使惰性氣體貯存於蓋體6之內側空間。
又,在對基板W之上表面SW
供給洗淨液L2之前,從氣體供給噴嘴12之氣體供給口13噴出惰性氣體,使惰性氣體貯存於藉由天井部61與側壁部62所劃分的空間亦可(例如參照圖7之S12-3)。藉此,在先於惰性氣體供給工程(S6)的基板洗淨處理工程(S2)之前,可以使惰性氣體貯存於蓋體6之內側空間。
又,在對基板W供給沖洗液L3之前(亦即在基板洗淨處理工程(S2)與基板沖洗處理工程(S3)之間),從氣體供給噴嘴12之氣體供給口13噴出惰性氣體亦可。又,在對基板W供給鍍敷液L1之前(亦即在基板沖洗處理工程S3與鍍敷液承載工程S4之間),從氣體供給噴嘴12之氣體供給口13噴出惰性氣體亦可。
如前述般藉由在惰性氣體供給工程(S6)之前使惰性氣體貯存於蓋體6之內側空間,則在惰性氣體供給工程(S6)中,可以迅速將基板W之周圍設為低氧氛圍。又,為了使惰性氣體維持長時間貯存於蓋體6之內側空間,惰性氣體以較輕者為較佳,例如氦適合使用作為惰性氣體。
又,從氣體供給噴嘴12之氣體供給口13之惰性氣體之噴出,在惰性氣體供給工程之前(S1~S5)及惰性氣體供給工程(S6)之期間中斷續地進行亦可,連續地進行亦可。
在蓋體6配置於下方位置之前及配置於下方位置的蓋體6覆蓋基板W之上表面SW
之期間,從氣體供給噴嘴12之氣體供給口13噴出惰性氣體亦可。該情況下,在蓋體6配置於下方位置之前,可以使比蓋體6配置於下方位置之期間從氣體供給口13噴出的惰性氣體之流量更大的流量之惰性氣體,從氣體供給口13噴出。蓋體6配置於下方位置之前為,設置於蓋體6的氣體供給噴嘴12處於遠離基板W之上表面SW
的位置,因此即使從氣體供給口13噴出大流量之惰性氣體,基板W上之鍍敷液L1受到惰性氣體之影響亦較小。另一方面,蓋體6配置於下方位置之期間,氣體供給噴嘴12位於接近基板W之位置,因此藉由減少從氣體供給口13噴出的惰性氣體之流量,可以減少惰性氣體對基板W上之鍍敷液L1帶來的影響。如此般藉由在蓋體6配置於下方位置之前後中變化惰性氣體之噴出流量,可以抑制對基板W上之鍍敷液L1帶來的影響之大小,且可以迅速對基板W與蓋體6間之空間供給必要量之惰性氣體。
又,在基板W之上表面SW
承載有洗淨液L2之期間及在基板W之上表面SW
承載有鍍敷液L1之期間,從氣體供給噴嘴12之氣體供給口13噴出惰性氣體亦可。該情況下,在基板W之上表面SW
承載有洗淨液L2之期間,可以使比在基板W之上表面SW
承載有鍍敷液L1之期間從氣體供給口13噴出的惰性氣體之流量更大的流量之惰性氣體,從氣體供給口13噴出。於基板W之鍍敷處理中,即使基板W上之洗淨液L2之狀態紊亂時實質上影響亦小,但基板W上之鍍敷液L1之狀態之紊亂對鍍敷處理之品質會有比較大的影響。因此基板洗淨處理工程(S2)中,藉由從氣體供給口13噴出能夠搖動基板W上之洗淨液L2的大流量之惰性氣體,可以迅速將惰性氣體供給至蓋體6之內側空間。另一方面,於惰性氣體供給工程(S6)中,藉由從氣體供給口13噴出小流量之惰性氣體,在不紊亂基板W上之鍍敷液L1之狀態下,可以將惰性氣體供給至基板W與蓋體6間之空間。如此般藉由在基板洗淨處理工程及惰性氣體供給工程中變化惰性氣體之噴出流量,可以抑制對基板W上之鍍敷液L1帶來的影響之大小,且可以迅速將必要量之惰性氣體供給至基板W與蓋體6間之空間。
充滿乾燥之惰性氣體時,槳狀化的鍍敷液會蒸發,如此引起的鍍敷液量之減少及蒸發引起的液溫之降低有可能發生。因此為了防止該狀態,可以考慮惰性氣體與水蒸氣之混合氣體。
又,在蓋體6配置於下方位置而蓋體6覆蓋基板W之上表面SW
之鍍敷液L1之期間,從氣體供給噴嘴12之氣體供給口13噴出混合有惰性氣體與水蒸氣的混合氣體亦可。藉此,可以抑制基板W之上表面SW
之鍍敷液L1之蒸發,可以抑制鍍敷液L1之液量之減少及蒸發引起的的液溫之降低。又,惰性氣體與水蒸氣之混合氣體之生成,可以在貯存有純水的純水槽內使惰性氣體起泡而生成,又,對純水槽進行加熱生成水蒸氣,之後,將水蒸氣與惰性氣體混合亦可。
本揭示不限定於前述實施形態及變形例,實施階段中在不脫離其要旨之範圍內可以變形構成要素予以具體化。又,藉由適當地組合前述實施形態及變形例所揭示的複數個構成要素,可以形成各種裝置及方法。從實施形態及變形例所示全部構成要素刪除幾個構成要素亦可。另外,不同的實施形態及變形例的構成要素適當地組合亦可。
例如本揭示的基板液處理裝置及基板液處理方法針對鍍敷液L1以外之處理液及鍍敷處理以外之液處理亦有效。又,藉由用以控制基板液處理裝置之動作之電腦執行時,作為記錄有電腦控制基板液處理裝置而執行前述基板液處理方法的程式之記錄媒體(例如記錄媒體31),而將本揭示具體化亦可。
6:蓋體
11:氣體供給部
13:氣體供給口
52:基板保持部
53:鍍敷液供給部
L1:鍍敷液
SW:上表面
W:基板
12:氣體供給噴嘴
24:氣流導引部
24a:導引面
61:天井部
62:側壁部
63:加熱器
63a:中央加熱器
63b:中間加熱器
63c:最外側加熱器
521:吸盤構件
Ax:旋轉軸線
[圖1]圖1係表示作為基板液處理裝置之一例的鍍敷處理裝置之構成之概略圖。
[圖2]圖2係表示鍍敷處理部之構成之概略剖面圖。
[圖3]圖3係表示第1典型例的氣體供給部之概略構成之剖面圖。
[圖4]圖4係表示第2典型例的氣體供給部之概略構成之剖面圖。
[圖5]圖5係表示第3典型例的氣體供給部之概略構成之剖面圖。
[圖6]圖6係表示第4典型例的氣體供給部之概略構成之平面圖。
[圖7]圖7係表示鍍敷處理方法之一例之流程圖。
6:蓋體
11:氣體供給部
12:氣體供給噴嘴
13:氣體供給口
24:氣流導引部
24a:導引面
52:基板保持部
61:天井部
62:側壁部
63:加熱器
63a:中央加熱器
63b:中間加熱器
63c:最外側加熱器
521:吸盤構件
L1:鍍敷液
SW:上表面
W:基板
Ax:旋轉軸線
Claims (19)
- 一種基板液處理裝置,係具備:基板保持部,用於保持基板;處理液供給部,對前述基板保持部所保持的前述基板之上表面供給處理液;蓋體,覆蓋前述基板保持部所保持的前述基板之前述上表面;及氣體供給部,係對前述基板保持部所保持的前述基板與前述蓋體之間之空間並且是面對前述基板之前述上表面的空間供給惰性氣體的氣體供給部,且該氣體供給部具有噴出前述惰性氣體的氣體供給口;前述氣體供給口之開口方向係朝向前述基板保持部所保持的前述基板之前述上表面以外,並且,前述氣體供給口噴出前述惰性氣體以使前述惰性氣體在前述空間內沿著水平方向流動。
- 如請求項1之基板液處理裝置,其中前述蓋體具有:朝水平方向延伸的天井部;從前述天井部朝下方延伸的側壁部;及設置於前述天井部且用於發熱的加熱部。
- 如請求項2之基板液處理裝置,其中前述氣體供給部設置於前述側壁部。
- 如請求項2或3之基板液處理裝置,其中前述氣體供給部設置於前述天井部。
- 如請求項2或3之基板液處理裝置,其中 前述開口方向係朝向前述天井部。
- 如請求項2或3之基板液處理裝置,其中具備:氣流導引部,其設置於前述天井部與前述側壁部之間之角部,且具有從前述空間露出的導引面,前述開口方向係朝向前述導引面。
- 如請求項2或3之基板液處理裝置,其中具備:從前述側壁部朝向前述基板保持部側延伸的鍔部。
- 如請求項1至3中任一之基板液處理裝置,其中前述開口方向為水平方向。
- 如請求項1至3中任一之基板液處理裝置,其中前述開口方向為,從前述基板之外周側朝向前述基板之內側的方向。
- 如請求項1至3中任一之基板液處理裝置,其中前述開口方向為,從前述基板之內側朝向前述基板之外周側的方向。
- 一種基板液處理裝置,係具備:基板保持部,用於保持基板;處理液供給部,對前述基板保持部所保持的前述基板之上表面供給處理液;蓋體,覆蓋前述基板保持部所保持的前述基板之前述 上表面;及氣體供給部,係對前述基板保持部所保持的前述基板與前述蓋體之間之空間供給惰性氣體的氣體供給部,且該氣體供給部具有噴出前述惰性氣體的氣體供給口;前述氣體供給口之開口方向係朝向前述基板保持部所保持的前述基板之前述上表面以外,前述氣體供給口設置有複數個,前述基板保持部以旋轉軸線作為中心使前述基板沿著順圓周方向旋轉,通過前述複數個氣體供給口之中之2個以上之氣體供給口之各自之中心的2個以上之延長線,且為以直線狀朝向前述2個以上之氣體供給口各自之前述開口方向延伸的2個以上之延長線,係不通過前述旋轉軸線,前述2個以上之氣體供給口各自之前述開口方向為追隨與前述順圓周方向為逆向的逆圓周方向與前述順圓周方向之中之一者的方向。
- 如請求項11之基板液處理裝置,其中前述2個以上之氣體供給口各自之前述開口方向為,追隨前述順圓周方向的方向。
- 如請求項1至3、或11至12中任一之基板液處理裝置,其中前述惰性氣體為氦。
- 一種基板液處理方法,包含:對基板保持部所保持的基板之上表面供給處理液的工 程;藉由配置於處理位置的蓋體對前述基板保持部所保持之前述基板之前述上表面進行覆蓋的工程;及在前述上表面承載有前述處理液的狀態下從氣體供給口噴出惰性氣體,對前述基板保持部所保持之前述基板與配置於前述處理位置的前述蓋體之間之空間並且是面對前述基板之前述上表面的空間供給前述惰性氣體的工程;前述氣體供給口之開口方向,係朝向前述基板保持部所保持之前述基板之前述上表面以外,並且,前述氣體供給口噴出前述惰性氣體以使前述惰性氣體在前述空間內沿著水平方向流動。
- 如請求項14之基板液處理方法,其中前述蓋體具有:朝水平方向延伸的天井部;及從前述天井部朝下方延伸的側壁部;在前述蓋體配置於前述處理位置之前,在藉由前述天井部與前述側壁部所劃分的空間貯存有前述惰性氣體。
- 一種基板液處理方法,包含:對基板保持部所保持的基板之上表面供給處理液的工程;藉由配置於處理位置的蓋體對前述基板保持部所保持之前述基板之前述上表面進行覆蓋的工程;及在前述上表面承載有前述處理液的狀態下從氣體供給口噴出惰性氣體,對前述基板保持部所保持之前述基板與配置於前述處理位置的前述蓋體之間之空間供給前述惰性 氣體的工程;前述氣體供給口之開口方向,係朝向前述基板保持部所保持之前述基板之前述上表面以外,在前述蓋體配置於前述處理位置之前及在配置於前述處理位置的前述蓋體覆蓋前述上表面之期間,從前述氣體供給口噴出前述惰性氣體,在前述蓋體配置於前述處理位置之前,使比前述蓋體配置於前述處理位置之期間從前述氣體供給口噴出之前述惰性氣體之流量更大的流量之前述惰性氣體,從前述氣體供給口噴出。
- 一種基板液處理方法,包含:對基板保持部所保持的基板之上表面供給處理液的工程;藉由配置於處理位置的蓋體對前述基板保持部所保持之前述基板之前述上表面進行覆蓋的工程;及在前述上表面承載有前述處理液的狀態下從氣體供給口噴出惰性氣體,對前述基板保持部所保持之前述基板與配置於前述處理位置的前述蓋體之間之空間供給前述惰性氣體的工程;前述氣體供給口之開口方向,係朝向前述基板保持部所保持之前述基板之前述上表面以外,該基板液處理方法還包含:將與前述處理液不同的洗淨液供給至前述上表面的工程,在前述上表面承載有前述洗淨液的狀態下,從前述氣 體供給口噴出前述惰性氣體。
- 如請求項17之基板液處理方法,其中前述蓋體具有:朝水平方向延伸的天井部;及從前述天井部朝下方延伸的側壁部;在對前述上表面供給前述洗淨液之前,在藉由前述天井部與前述側壁部所劃分的空間貯存有前述惰性氣體。
- 如請求項17或18之基板液處理方法,其中在前述上表面承載有前述洗淨液之期間及在前述上表面承載有前述處理液之期間,從前述氣體供給口噴出前述惰性氣體,在前述上表面承載有前述洗淨液之期間,使比前述上表面承載有前述處理液之期間從前述氣體供給口噴出之前述惰性氣體之流量更大的流量之前述惰性氣體,從前述氣體供給口噴出。
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