TWI811736B - 附防汙層之光學膜 - Google Patents
附防汙層之光學膜 Download PDFInfo
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- TWI811736B TWI811736B TW110125739A TW110125739A TWI811736B TW I811736 B TWI811736 B TW I811736B TW 110125739 A TW110125739 A TW 110125739A TW 110125739 A TW110125739 A TW 110125739A TW I811736 B TWI811736 B TW I811736B
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- antifouling
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1687—Use of special additives
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/418—Refractive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/538—Roughness
Landscapes
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- Chemical Kinetics & Catalysis (AREA)
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- Metallurgy (AREA)
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- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
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| TW202208883A TW202208883A (zh) | 2022-03-01 |
| TWI811736B true TWI811736B (zh) | 2023-08-11 |
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| JP2023163654A (ja) * | 2022-04-28 | 2023-11-10 | 日東電工株式会社 | 反射防止フィルムおよび画像表示装置 |
| JP2024079170A (ja) * | 2022-11-30 | 2024-06-11 | デクセリアルズ株式会社 | 防汚コーティング組成物、防汚コーティング膜、防汚コーティング積層体及びこれらの製造方法 |
| JP2024079169A (ja) * | 2022-11-30 | 2024-06-11 | デクセリアルズ株式会社 | 防汚コーティング組成物、防汚コーティング膜、防汚コーティング積層体及びこれらの製造方法 |
| JP7675233B1 (ja) | 2024-01-30 | 2025-05-12 | 日東電工株式会社 | 表面保護フィルム付き光学積層体 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004088370A1 (ja) * | 2003-03-31 | 2004-10-14 | Zeon Corporation | 偏光板保護フィルム、その製造方法、反射防止機能付偏光板及び光学製品 |
| TW200831941A (en) * | 2006-09-29 | 2008-08-01 | Dainippon Printing Co Ltd | Optical functional film |
| US20120229423A1 (en) * | 2009-11-30 | 2012-09-13 | Dai Nippon Printing Co., Ltd. | Optical film and touch panel |
| US20150321231A1 (en) * | 2005-12-15 | 2015-11-12 | Essilor International (Compagnie Generale D'optique) | Article coated with an ultra high hydrophobic film and process for obtaining same |
| WO2019208786A1 (ja) * | 2018-04-27 | 2019-10-31 | 大日本印刷株式会社 | 光学フィルム、偏光板、および画像表示装置 |
| CN110954975A (zh) * | 2018-09-26 | 2020-04-03 | 日东电工株式会社 | 带保护薄膜的光学薄膜 |
| TW202019685A (zh) * | 2018-09-03 | 2020-06-01 | 日商住友化學股份有限公司 | 積層體及其製造方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5157162B2 (ja) * | 2006-12-27 | 2013-03-06 | 日本ゼオン株式会社 | 反射防止積層体及びその製造方法 |
| JP2010092003A (ja) * | 2008-09-11 | 2010-04-22 | Toppan Printing Co Ltd | 反射防止フィルム |
| JP2011069995A (ja) * | 2009-09-25 | 2011-04-07 | Toppan Printing Co Ltd | 反射防止フィルム |
| JP6774383B2 (ja) | 2016-06-17 | 2020-10-21 | 日東電工株式会社 | 反射防止フィルムおよびその製造方法、ならびに反射防止層付き偏光板 |
| JP6702022B2 (ja) * | 2016-06-24 | 2020-05-27 | 大日本印刷株式会社 | タッチパネル、多層フィルム、及び多層フィルムの製造方法 |
| JP7128571B2 (ja) * | 2017-02-07 | 2022-08-31 | 大日本印刷株式会社 | 低屈折率層用組成物 |
| JP6897238B2 (ja) * | 2017-03-31 | 2021-06-30 | 大日本印刷株式会社 | 光学フィルムおよび画像表示装置 |
| CN110612208A (zh) * | 2017-05-12 | 2019-12-24 | Ａｇｃ株式会社 | 防污性物品及防污性物品的制造方法 |
| WO2019177120A1 (ja) * | 2018-03-16 | 2019-09-19 | Ａｇｃ株式会社 | 膜付き基材 |
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2021
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- 2021-07-13 JP JP2022536372A patent/JP7130893B2/ja active Active
- 2021-07-13 CN CN202180048969.4A patent/CN115803192B/zh active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004088370A1 (ja) * | 2003-03-31 | 2004-10-14 | Zeon Corporation | 偏光板保護フィルム、その製造方法、反射防止機能付偏光板及び光学製品 |
| US20150321231A1 (en) * | 2005-12-15 | 2015-11-12 | Essilor International (Compagnie Generale D'optique) | Article coated with an ultra high hydrophobic film and process for obtaining same |
| TW200831941A (en) * | 2006-09-29 | 2008-08-01 | Dainippon Printing Co Ltd | Optical functional film |
| US20120229423A1 (en) * | 2009-11-30 | 2012-09-13 | Dai Nippon Printing Co., Ltd. | Optical film and touch panel |
| WO2019208786A1 (ja) * | 2018-04-27 | 2019-10-31 | 大日本印刷株式会社 | 光学フィルム、偏光板、および画像表示装置 |
| TW202019685A (zh) * | 2018-09-03 | 2020-06-01 | 日商住友化學股份有限公司 | 積層體及其製造方法 |
| CN110954975A (zh) * | 2018-09-26 | 2020-04-03 | 日东电工株式会社 | 带保护薄膜的光学薄膜 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202208883A (zh) | 2022-03-01 |
| WO2022014568A1 (ja) | 2022-01-20 |
| KR102518011B1 (ko) | 2023-04-04 |
| JP7130893B2 (ja) | 2022-09-05 |
| CN115803192A (zh) | 2023-03-14 |
| JPWO2022014568A1 (https=) | 2022-01-20 |
| CN115803192B (zh) | 2024-03-19 |
| KR20230005423A (ko) | 2023-01-09 |
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