TWI800658B - 晶片製造方法 - Google Patents

晶片製造方法 Download PDF

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Publication number
TWI800658B
TWI800658B TW108120944A TW108120944A TWI800658B TW I800658 B TWI800658 B TW I800658B TW 108120944 A TW108120944 A TW 108120944A TW 108120944 A TW108120944 A TW 108120944A TW I800658 B TWI800658 B TW I800658B
Authority
TW
Taiwan
Prior art keywords
workpiece
wafer
holding
laser processing
modified layer
Prior art date
Application number
TW108120944A
Other languages
English (en)
Chinese (zh)
Other versions
TW202002057A (zh
Inventor
淀良彰
趙金艶
Original Assignee
日商迪思科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商迪思科股份有限公司 filed Critical 日商迪思科股份有限公司
Publication of TW202002057A publication Critical patent/TW202002057A/zh
Application granted granted Critical
Publication of TWI800658B publication Critical patent/TWI800658B/zh

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P54/00Cutting or separating of wafers, substrates or parts of devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/01Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Dicing (AREA)
  • Laser Beam Processing (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW108120944A 2018-06-20 2019-06-17 晶片製造方法 TWI800658B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-117127 2018-06-20
JP2018117127A JP7102065B2 (ja) 2018-06-20 2018-06-20 チップの製造方法

Publications (2)

Publication Number Publication Date
TW202002057A TW202002057A (zh) 2020-01-01
TWI800658B true TWI800658B (zh) 2023-05-01

Family

ID=69096967

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108120944A TWI800658B (zh) 2018-06-20 2019-06-17 晶片製造方法

Country Status (4)

Country Link
JP (1) JP7102065B2 (https=)
KR (1) KR102746633B1 (https=)
CN (1) CN110690172B (https=)
TW (1) TWI800658B (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7648375B2 (ja) * 2020-12-17 2025-03-18 株式会社ディスコ ウエーハの生成装置
JP7645086B2 (ja) * 2021-01-29 2025-03-13 株式会社ディスコ 剥離装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005135964A (ja) * 2003-10-28 2005-05-26 Disco Abrasive Syst Ltd ウエーハの分割方法
JP2014236034A (ja) * 2013-05-31 2014-12-15 株式会社ディスコ ウェーハの加工方法
TW201600208A (zh) * 2014-05-09 2016-01-01 Disco Corp 雷射加工裝置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS523775B2 (https=) * 1972-07-08 1977-01-29
JP3408805B2 (ja) 2000-09-13 2003-05-19 浜松ホトニクス株式会社 切断起点領域形成方法及び加工対象物切断方法
JP2005342760A (ja) * 2004-06-03 2005-12-15 Disco Abrasive Syst Ltd レーザー加工装置
JP2007141998A (ja) * 2005-11-16 2007-06-07 Denso Corp 半導体チップの製造装置及び半導体チップの製造方法
TWI283023B (en) * 2005-12-23 2007-06-21 Advanced Semiconductor Eng Wafer level packaging process
JP2008153420A (ja) * 2006-12-18 2008-07-03 Seiko Epson Corp 基材の分割方法、液滴吐出ヘッドの製造方法、半導体装置の製造方法、基板の製造方法、及び電気光学装置の製造方法
JP5791866B2 (ja) 2009-03-06 2015-10-07 株式会社ディスコ ワーク分割装置
JP6154121B2 (ja) * 2012-12-06 2017-06-28 リンテック株式会社 割断装置及び割断方法
JP2014199834A (ja) * 2013-03-29 2014-10-23 株式会社ディスコ 保持手段及び加工方法
JP2017123400A (ja) 2016-01-07 2017-07-13 株式会社ディスコ チャックテーブル
JP6710463B2 (ja) * 2016-10-11 2020-06-17 株式会社ディスコ ウェーハの加工方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005135964A (ja) * 2003-10-28 2005-05-26 Disco Abrasive Syst Ltd ウエーハの分割方法
JP2014236034A (ja) * 2013-05-31 2014-12-15 株式会社ディスコ ウェーハの加工方法
TW201600208A (zh) * 2014-05-09 2016-01-01 Disco Corp 雷射加工裝置

Also Published As

Publication number Publication date
KR102746633B1 (ko) 2024-12-24
JP7102065B2 (ja) 2022-07-19
KR20190143364A (ko) 2019-12-30
JP2019220581A (ja) 2019-12-26
CN110690172A (zh) 2020-01-14
TW202002057A (zh) 2020-01-01
CN110690172B (zh) 2024-05-14

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