TWI800658B - Wafer Manufacturing Method - Google Patents
Wafer Manufacturing Method Download PDFInfo
- Publication number
- TWI800658B TWI800658B TW108120944A TW108120944A TWI800658B TW I800658 B TWI800658 B TW I800658B TW 108120944 A TW108120944 A TW 108120944A TW 108120944 A TW108120944 A TW 108120944A TW I800658 B TWI800658 B TW I800658B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer manufacturing
- wafer
- manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018117127A JP7102065B2 (en) | 2018-06-20 | 2018-06-20 | Chip manufacturing method |
JP2018-117127 | 2018-06-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202002057A TW202002057A (en) | 2020-01-01 |
TWI800658B true TWI800658B (en) | 2023-05-01 |
Family
ID=69096967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108120944A TWI800658B (en) | 2018-06-20 | 2019-06-17 | Wafer Manufacturing Method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7102065B2 (en) |
KR (1) | KR20190143364A (en) |
CN (1) | CN110690172B (en) |
TW (1) | TWI800658B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022096455A (en) * | 2020-12-17 | 2022-06-29 | 株式会社ディスコ | Wafer generation device |
JP2022117116A (en) * | 2021-01-29 | 2022-08-10 | 株式会社ディスコ | Peeling device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005135964A (en) * | 2003-10-28 | 2005-05-26 | Disco Abrasive Syst Ltd | Dividing method of wafer |
JP2014236034A (en) * | 2013-05-31 | 2014-12-15 | 株式会社ディスコ | Method for processing wafer |
TW201600208A (en) * | 2014-05-09 | 2016-01-01 | Disco Corp | Laser processing apparatus |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS523775B2 (en) * | 1972-07-08 | 1977-01-29 | ||
JP2005342760A (en) * | 2004-06-03 | 2005-12-15 | Disco Abrasive Syst Ltd | Laser beam machine |
JP2007141998A (en) * | 2005-11-16 | 2007-06-07 | Denso Corp | Apparatus and method of manufacturing semiconductor chip |
TWI283023B (en) * | 2005-12-23 | 2007-06-21 | Advanced Semiconductor Eng | Wafer level packaging process |
JP2008153420A (en) * | 2006-12-18 | 2008-07-03 | Seiko Epson Corp | Dividing method of base, manufacturing method of drop discharge head, manufacturing method of semiconductor device, manufacturing method of substrate and manufacturing method of electro-optical device |
JP6154121B2 (en) * | 2012-12-06 | 2017-06-28 | リンテック株式会社 | Cleaving device and cleaving method |
JP2014199834A (en) * | 2013-03-29 | 2014-10-23 | 株式会社ディスコ | Holding means and processing method |
JP6710463B2 (en) * | 2016-10-11 | 2020-06-17 | 株式会社ディスコ | Wafer processing method |
-
2018
- 2018-06-20 JP JP2018117127A patent/JP7102065B2/en active Active
-
2019
- 2019-05-29 KR KR1020190063226A patent/KR20190143364A/en not_active Application Discontinuation
- 2019-06-14 CN CN201910513486.1A patent/CN110690172B/en active Active
- 2019-06-17 TW TW108120944A patent/TWI800658B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005135964A (en) * | 2003-10-28 | 2005-05-26 | Disco Abrasive Syst Ltd | Dividing method of wafer |
JP2014236034A (en) * | 2013-05-31 | 2014-12-15 | 株式会社ディスコ | Method for processing wafer |
TW201600208A (en) * | 2014-05-09 | 2016-01-01 | Disco Corp | Laser processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
TW202002057A (en) | 2020-01-01 |
CN110690172B (en) | 2024-05-14 |
JP7102065B2 (en) | 2022-07-19 |
CN110690172A (en) | 2020-01-14 |
KR20190143364A (en) | 2019-12-30 |
JP2019220581A (en) | 2019-12-26 |
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