TWI800658B - Wafer Manufacturing Method - Google Patents

Wafer Manufacturing Method Download PDF

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Publication number
TWI800658B
TWI800658B TW108120944A TW108120944A TWI800658B TW I800658 B TWI800658 B TW I800658B TW 108120944 A TW108120944 A TW 108120944A TW 108120944 A TW108120944 A TW 108120944A TW I800658 B TWI800658 B TW I800658B
Authority
TW
Taiwan
Prior art keywords
wafer manufacturing
wafer
manufacturing
Prior art date
Application number
TW108120944A
Other languages
Chinese (zh)
Other versions
TW202002057A (en
Inventor
淀良彰
趙金艶
Original Assignee
日商迪思科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商迪思科股份有限公司 filed Critical 日商迪思科股份有限公司
Publication of TW202002057A publication Critical patent/TW202002057A/en
Application granted granted Critical
Publication of TWI800658B publication Critical patent/TWI800658B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Dicing (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW108120944A 2018-06-20 2019-06-17 Wafer Manufacturing Method TWI800658B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-117127 2018-06-20
JP2018117127A JP7102065B2 (en) 2018-06-20 2018-06-20 Chip manufacturing method

Publications (2)

Publication Number Publication Date
TW202002057A TW202002057A (en) 2020-01-01
TWI800658B true TWI800658B (en) 2023-05-01

Family

ID=69096967

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108120944A TWI800658B (en) 2018-06-20 2019-06-17 Wafer Manufacturing Method

Country Status (4)

Country Link
JP (1) JP7102065B2 (en)
KR (1) KR20190143364A (en)
CN (1) CN110690172B (en)
TW (1) TWI800658B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022096455A (en) * 2020-12-17 2022-06-29 株式会社ディスコ Wafer generation device
JP2022117116A (en) * 2021-01-29 2022-08-10 株式会社ディスコ Peeling device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005135964A (en) * 2003-10-28 2005-05-26 Disco Abrasive Syst Ltd Dividing method of wafer
JP2014236034A (en) * 2013-05-31 2014-12-15 株式会社ディスコ Method for processing wafer
TW201600208A (en) * 2014-05-09 2016-01-01 Disco Corp Laser processing apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS523775B2 (en) * 1972-07-08 1977-01-29
JP2005342760A (en) 2004-06-03 2005-12-15 Disco Abrasive Syst Ltd Laser beam machine
JP2007141998A (en) * 2005-11-16 2007-06-07 Denso Corp Apparatus and method of manufacturing semiconductor chip
TWI283023B (en) * 2005-12-23 2007-06-21 Advanced Semiconductor Eng Wafer level packaging process
JP2008153420A (en) 2006-12-18 2008-07-03 Seiko Epson Corp Dividing method of base, manufacturing method of drop discharge head, manufacturing method of semiconductor device, manufacturing method of substrate and manufacturing method of electro-optical device
JP6154121B2 (en) 2012-12-06 2017-06-28 リンテック株式会社 Cleaving device and cleaving method
JP2014199834A (en) 2013-03-29 2014-10-23 株式会社ディスコ Holding means and processing method
JP6710463B2 (en) * 2016-10-11 2020-06-17 株式会社ディスコ Wafer processing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005135964A (en) * 2003-10-28 2005-05-26 Disco Abrasive Syst Ltd Dividing method of wafer
JP2014236034A (en) * 2013-05-31 2014-12-15 株式会社ディスコ Method for processing wafer
TW201600208A (en) * 2014-05-09 2016-01-01 Disco Corp Laser processing apparatus

Also Published As

Publication number Publication date
CN110690172A (en) 2020-01-14
JP2019220581A (en) 2019-12-26
TW202002057A (en) 2020-01-01
JP7102065B2 (en) 2022-07-19
KR20190143364A (en) 2019-12-30
CN110690172B (en) 2024-05-14

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