TWI799661B - 著色組成物、著色硬化性樹脂組成物、彩色濾光片及顯示裝置 - Google Patents
著色組成物、著色硬化性樹脂組成物、彩色濾光片及顯示裝置 Download PDFInfo
- Publication number
- TWI799661B TWI799661B TW108139549A TW108139549A TWI799661B TW I799661 B TWI799661 B TW I799661B TW 108139549 A TW108139549 A TW 108139549A TW 108139549 A TW108139549 A TW 108139549A TW I799661 B TWI799661 B TW I799661B
- Authority
- TW
- Taiwan
- Prior art keywords
- coloring
- composition
- display device
- color filter
- curable resin
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B3/00—Dyes with an anthracene nucleus condensed with one or more carbocyclic rings
- C09B3/14—Perylene derivatives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
- C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
- C08K5/098—Metal salts of carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018218169A JP7241514B2 (ja) | 2018-11-21 | 2018-11-21 | 着色組成物、着色硬化性樹脂組成物、カラーフィルタ及び表示装置 |
JP2018-218169 | 2018-11-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202030264A TW202030264A (zh) | 2020-08-16 |
TWI799661B true TWI799661B (zh) | 2023-04-21 |
Family
ID=70773965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108139549A TWI799661B (zh) | 2018-11-21 | 2019-10-31 | 著色組成物、著色硬化性樹脂組成物、彩色濾光片及顯示裝置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7241514B2 (zh) |
KR (1) | KR20210093248A (zh) |
CN (1) | CN113056525B (zh) |
TW (1) | TWI799661B (zh) |
WO (1) | WO2020105346A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022131191A1 (ja) | 2020-12-16 | 2022-06-23 | 富士フイルム株式会社 | 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ |
JPWO2022130773A1 (zh) | 2020-12-17 | 2022-06-23 | ||
IL313684A (en) * | 2021-12-23 | 2024-08-01 | Fujifilm Corp | A radiation-sensitive or radiation-sensitive radioactive resin composition, a radiation-sensitive or radiation-sensitive radioactive layer, a method for making a pattern, a method for making an electronic device and compounds |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58101161A (ja) * | 1981-12-14 | 1983-06-16 | Toyo Ink Mfg Co Ltd | 顔料組成物 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3956448B2 (ja) * | 1997-10-16 | 2007-08-08 | Jsr株式会社 | カラーフィルタ用感放射線性組成物 |
JP4715201B2 (ja) | 2004-12-28 | 2011-07-06 | 東洋インキScホールディングス株式会社 | カラーフィルタ用着色組成物およびカラーフィルタ |
JP5284748B2 (ja) | 2008-10-14 | 2013-09-11 | 菊水化学工業株式会社 | 蛍光標示材、及び蛍光標示材を用いた路面標示構造 |
KR101350478B1 (ko) * | 2011-11-16 | 2014-01-17 | 재단법인대구경북과학기술원 | 전자이동을 용이하게 하는 화합물을 포함하는 유-무기 하이브리드 태양전지 및 이의 제조방법 |
TW201510103A (zh) | 2013-08-01 | 2015-03-16 | Dainippon Ink & Chemicals | 彩色濾光片用顏料組成物及彩色濾光片 |
KR20170101678A (ko) * | 2016-02-29 | 2017-09-06 | 도레이케미칼 주식회사 | 하이브리드 색보상 압출광학필름 및 이의 제조방법 |
-
2018
- 2018-11-21 JP JP2018218169A patent/JP7241514B2/ja active Active
-
2019
- 2019-10-23 KR KR1020217014051A patent/KR20210093248A/ko unknown
- 2019-10-23 CN CN201980075733.2A patent/CN113056525B/zh active Active
- 2019-10-23 WO PCT/JP2019/041451 patent/WO2020105346A1/ja active Application Filing
- 2019-10-31 TW TW108139549A patent/TWI799661B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58101161A (ja) * | 1981-12-14 | 1983-06-16 | Toyo Ink Mfg Co Ltd | 顔料組成物 |
Also Published As
Publication number | Publication date |
---|---|
CN113056525A (zh) | 2021-06-29 |
WO2020105346A1 (ja) | 2020-05-28 |
KR20210093248A (ko) | 2021-07-27 |
JP7241514B2 (ja) | 2023-03-17 |
TW202030264A (zh) | 2020-08-16 |
JP2020083981A (ja) | 2020-06-04 |
CN113056525B (zh) | 2023-07-11 |
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