TWI791549B - 蒸鍍罩 - Google Patents

蒸鍍罩 Download PDF

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Publication number
TWI791549B
TWI791549B TW107123244A TW107123244A TWI791549B TW I791549 B TWI791549 B TW I791549B TW 107123244 A TW107123244 A TW 107123244A TW 107123244 A TW107123244 A TW 107123244A TW I791549 B TWI791549 B TW I791549B
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TW
Taiwan
Prior art keywords
frame
vapor deposition
layer
cover
frame body
Prior art date
Application number
TW107123244A
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English (en)
Chinese (zh)
Other versions
TW201911622A (zh
Inventor
石川樹一郎
田丸裕仁
小林良弘
Original Assignee
日商麥克賽爾股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 日商麥克賽爾股份有限公司 filed Critical 日商麥克賽爾股份有限公司
Publication of TW201911622A publication Critical patent/TW201911622A/zh
Application granted granted Critical
Publication of TWI791549B publication Critical patent/TWI791549B/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Outer Garments And Coats (AREA)
TW107123244A 2017-07-31 2018-07-05 蒸鍍罩 TWI791549B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP2017-148250 2017-07-31
JP2017148250 2017-07-31
JPJP2017-191494 2017-09-29
JP2017191494A JP7067889B2 (ja) 2017-07-31 2017-09-29 蒸着マスク

Publications (2)

Publication Number Publication Date
TW201911622A TW201911622A (zh) 2019-03-16
TWI791549B true TWI791549B (zh) 2023-02-11

Family

ID=65264087

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107123244A TWI791549B (zh) 2017-07-31 2018-07-05 蒸鍍罩

Country Status (4)

Country Link
JP (5) JP7067889B2 (https=)
KR (1) KR102702151B1 (https=)
CN (1) CN109321879B (https=)
TW (1) TWI791549B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7233954B2 (ja) * 2019-02-19 2023-03-07 株式会社ジャパンディスプレイ 蒸着マスク
JP7122278B2 (ja) * 2019-03-15 2022-08-19 マクセル株式会社 蒸着マスクおよびその製造方法
JP7449485B2 (ja) * 2019-03-28 2024-03-14 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法
JP7473298B2 (ja) * 2019-03-29 2024-04-23 マクセル株式会社 蒸着マスク
JP7249863B2 (ja) * 2019-04-26 2023-03-31 キヤノントッキ株式会社 マスク、マスクの製造方法および電子デバイスの製造方法
KR102187007B1 (ko) * 2020-02-26 2020-12-04 주식회사 핌스 평탄도가 개선된 박막 증착용 마스크 조립체 및 그 제조 방법
WO2025225401A1 (ja) * 2024-04-23 2025-10-30 大日本印刷株式会社 メタルマスク及びその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201706428A (zh) * 2015-02-10 2017-02-16 大日本印刷股份有限公司 蒸鍍遮罩之製造方法、欲製作蒸鍍遮罩所使用之金屬板及其製造方法

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JP4046269B2 (ja) * 2001-05-24 2008-02-13 九州日立マクセル株式会社 有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法
JP4401040B2 (ja) 2001-06-19 2010-01-20 株式会社オプトニクス精密 蒸着用マスク
JP2003231964A (ja) * 2001-12-05 2003-08-19 Toray Ind Inc 蒸着マスクおよびその製造方法並びに有機電界発光装置およびその製造方法
KR100534580B1 (ko) * 2003-03-27 2005-12-07 삼성에스디아이 주식회사 표시장치용 증착 마스크 및 그의 제조방법
JP4463492B2 (ja) * 2003-04-10 2010-05-19 株式会社半導体エネルギー研究所 製造装置
JP4475496B2 (ja) * 2003-05-21 2010-06-09 九州日立マクセル株式会社 有機ｅｌ素子用の蒸着マスクとその製造方法
JP4369199B2 (ja) 2003-06-05 2009-11-18 九州日立マクセル株式会社 蒸着マスクとその製造方法
JP2005105406A (ja) * 2003-09-10 2005-04-21 Nippon Seiki Co Ltd 蒸着用マスク
JP2005232474A (ja) * 2004-02-17 2005-09-02 Dainippon Screen Mfg Co Ltd 蒸着用マスク
JP4616667B2 (ja) 2005-03-01 2011-01-19 京セラ株式会社 マスク構造体およびそれを用いた蒸着方法、並びに有機発光素子の製造方法
JP2007270289A (ja) * 2006-03-31 2007-10-18 Canon Inc 成膜用マスク
JP4677363B2 (ja) * 2006-04-07 2011-04-27 九州日立マクセル株式会社 蒸着マスクおよびその製造方法
JP2008196002A (ja) * 2007-02-13 2008-08-28 Seiko Epson Corp 蒸着マスクおよび蒸着マスクの製造方法
JP2010222687A (ja) * 2009-03-25 2010-10-07 Seiko Epson Corp 成膜用マスク
JP5296263B2 (ja) * 2010-09-29 2013-09-25 シャープ株式会社 蒸着装置
JP5751810B2 (ja) * 2010-11-26 2015-07-22 日立マクセル株式会社 メタルマスクの製造方法、枠部材及びその製造方法
TWI623637B (zh) * 2012-01-12 2018-05-11 Dai Nippon Printing Co., Ltd. 拼版蒸鍍遮罩之製造方法及有機半導體元件之製造方法
JP5382259B1 (ja) * 2013-01-10 2014-01-08 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
KR20170059526A (ko) * 2015-11-20 2017-05-31 삼성디스플레이 주식회사 마스크 프레임 조립체, 마스크 프레임 조립체 제조 방법 및 표시 장치 제조 방법
JP6624504B2 (ja) * 2015-12-03 2019-12-25 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201706428A (zh) * 2015-02-10 2017-02-16 大日本印刷股份有限公司 蒸鍍遮罩之製造方法、欲製作蒸鍍遮罩所使用之金屬板及其製造方法

Also Published As

Publication number Publication date
CN109321879B (zh) 2022-06-10
JP7067889B2 (ja) 2022-05-16
TW201911622A (zh) 2019-03-16
JP2023126306A (ja) 2023-09-07
JP7470734B2 (ja) 2024-04-18
CN109321879A (zh) 2019-02-12
KR20190013534A (ko) 2019-02-11
JP2024097027A (ja) 2024-07-17
JP7846721B2 (ja) 2026-04-15
KR102702151B1 (ko) 2024-09-04
JP2019026926A (ja) 2019-02-21
JP2022103212A (ja) 2022-07-07
JP2025023270A (ja) 2025-02-14

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