JP7067889B2 - 蒸着マスク - Google Patents

蒸着マスク Download PDF

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Publication number
JP7067889B2
JP7067889B2 JP2017191494A JP2017191494A JP7067889B2 JP 7067889 B2 JP7067889 B2 JP 7067889B2 JP 2017191494 A JP2017191494 A JP 2017191494A JP 2017191494 A JP2017191494 A JP 2017191494A JP 7067889 B2 JP7067889 B2 JP 7067889B2
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JP
Japan
Prior art keywords
frame
mask
vapor deposition
layer
frame body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017191494A
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English (en)
Japanese (ja)
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JP2019026926A5 (https=
JP2019026926A (ja
Inventor
樹一郎 石川
裕仁 田丸
良弘 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Ltd
Original Assignee
Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2017191494A priority Critical patent/JP7067889B2/ja
Application filed by Maxell Ltd filed Critical Maxell Ltd
Priority to TW107123244A priority patent/TWI791549B/zh
Priority to KR1020180085784A priority patent/KR102702151B1/ko
Priority to CN201810834458.5A priority patent/CN109321879B/zh
Publication of JP2019026926A publication Critical patent/JP2019026926A/ja
Publication of JP2019026926A5 publication Critical patent/JP2019026926A5/ja
Priority to JP2022073416A priority patent/JP7470734B2/ja
Application granted granted Critical
Publication of JP7067889B2 publication Critical patent/JP7067889B2/ja
Priority to JP2023110688A priority patent/JP2023126306A/ja
Priority to JP2024069672A priority patent/JP7846721B2/ja
Priority to JP2024211704A priority patent/JP2025023270A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Outer Garments And Coats (AREA)
JP2017191494A 2017-07-31 2017-09-29 蒸着マスク Active JP7067889B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2017191494A JP7067889B2 (ja) 2017-07-31 2017-09-29 蒸着マスク
TW107123244A TWI791549B (zh) 2017-07-31 2018-07-05 蒸鍍罩
KR1020180085784A KR102702151B1 (ko) 2017-07-31 2018-07-24 증착 마스크
CN201810834458.5A CN109321879B (zh) 2017-07-31 2018-07-26 蒸镀掩模
JP2022073416A JP7470734B2 (ja) 2017-07-31 2022-04-27 枠体および蒸着マスク
JP2023110688A JP2023126306A (ja) 2017-07-31 2023-07-05 枠体および蒸着マスク
JP2024069672A JP7846721B2 (ja) 2017-07-31 2024-04-23 蒸着マスク
JP2024211704A JP2025023270A (ja) 2017-07-31 2024-12-04 枠体及び蒸着マスク

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017148250 2017-07-31
JP2017148250 2017-07-31
JP2017191494A JP7067889B2 (ja) 2017-07-31 2017-09-29 蒸着マスク

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022073416A Division JP7470734B2 (ja) 2017-07-31 2022-04-27 枠体および蒸着マスク

Publications (3)

Publication Number Publication Date
JP2019026926A JP2019026926A (ja) 2019-02-21
JP2019026926A5 JP2019026926A5 (https=) 2020-08-13
JP7067889B2 true JP7067889B2 (ja) 2022-05-16

Family

ID=65264087

Family Applications (5)

Application Number Title Priority Date Filing Date
JP2017191494A Active JP7067889B2 (ja) 2017-07-31 2017-09-29 蒸着マスク
JP2022073416A Active JP7470734B2 (ja) 2017-07-31 2022-04-27 枠体および蒸着マスク
JP2023110688A Pending JP2023126306A (ja) 2017-07-31 2023-07-05 枠体および蒸着マスク
JP2024069672A Active JP7846721B2 (ja) 2017-07-31 2024-04-23 蒸着マスク
JP2024211704A Pending JP2025023270A (ja) 2017-07-31 2024-12-04 枠体及び蒸着マスク

Family Applications After (4)

Application Number Title Priority Date Filing Date
JP2022073416A Active JP7470734B2 (ja) 2017-07-31 2022-04-27 枠体および蒸着マスク
JP2023110688A Pending JP2023126306A (ja) 2017-07-31 2023-07-05 枠体および蒸着マスク
JP2024069672A Active JP7846721B2 (ja) 2017-07-31 2024-04-23 蒸着マスク
JP2024211704A Pending JP2025023270A (ja) 2017-07-31 2024-12-04 枠体及び蒸着マスク

Country Status (4)

Country Link
JP (5) JP7067889B2 (https=)
KR (1) KR102702151B1 (https=)
CN (1) CN109321879B (https=)
TW (1) TWI791549B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7233954B2 (ja) * 2019-02-19 2023-03-07 株式会社ジャパンディスプレイ 蒸着マスク
JP7122278B2 (ja) * 2019-03-15 2022-08-19 マクセル株式会社 蒸着マスクおよびその製造方法
JP7449485B2 (ja) * 2019-03-28 2024-03-14 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法
JP7473298B2 (ja) * 2019-03-29 2024-04-23 マクセル株式会社 蒸着マスク
JP7249863B2 (ja) * 2019-04-26 2023-03-31 キヤノントッキ株式会社 マスク、マスクの製造方法および電子デバイスの製造方法
KR102187007B1 (ko) * 2020-02-26 2020-12-04 주식회사 핌스 평탄도가 개선된 박막 증착용 마스크 조립체 및 그 제조 방법
WO2025225401A1 (ja) * 2024-04-23 2025-10-30 大日本印刷株式会社 メタルマスク及びその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002371349A (ja) 2001-06-19 2002-12-26 Optonix Seimitsu:Kk 蒸着用マスク
JP2006244746A (ja) 2005-03-01 2006-09-14 Kyocera Corp マスク構造体およびそれを用いた蒸着方法、並びに有機発光素子の製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4046269B2 (ja) * 2001-05-24 2008-02-13 九州日立マクセル株式会社 有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法
JP2003231964A (ja) * 2001-12-05 2003-08-19 Toray Ind Inc 蒸着マスクおよびその製造方法並びに有機電界発光装置およびその製造方法
KR100534580B1 (ko) * 2003-03-27 2005-12-07 삼성에스디아이 주식회사 표시장치용 증착 마스크 및 그의 제조방법
JP4463492B2 (ja) * 2003-04-10 2010-05-19 株式会社半導体エネルギー研究所 製造装置
JP4475496B2 (ja) * 2003-05-21 2010-06-09 九州日立マクセル株式会社 有機ｅｌ素子用の蒸着マスクとその製造方法
JP4369199B2 (ja) 2003-06-05 2009-11-18 九州日立マクセル株式会社 蒸着マスクとその製造方法
JP2005105406A (ja) * 2003-09-10 2005-04-21 Nippon Seiki Co Ltd 蒸着用マスク
JP2005232474A (ja) * 2004-02-17 2005-09-02 Dainippon Screen Mfg Co Ltd 蒸着用マスク
JP2007270289A (ja) * 2006-03-31 2007-10-18 Canon Inc 成膜用マスク
JP4677363B2 (ja) * 2006-04-07 2011-04-27 九州日立マクセル株式会社 蒸着マスクおよびその製造方法
JP2008196002A (ja) * 2007-02-13 2008-08-28 Seiko Epson Corp 蒸着マスクおよび蒸着マスクの製造方法
JP2010222687A (ja) * 2009-03-25 2010-10-07 Seiko Epson Corp 成膜用マスク
JP5296263B2 (ja) * 2010-09-29 2013-09-25 シャープ株式会社 蒸着装置
JP5751810B2 (ja) * 2010-11-26 2015-07-22 日立マクセル株式会社 メタルマスクの製造方法、枠部材及びその製造方法
TWI623637B (zh) * 2012-01-12 2018-05-11 Dai Nippon Printing Co., Ltd. 拼版蒸鍍遮罩之製造方法及有機半導體元件之製造方法
JP5382259B1 (ja) * 2013-01-10 2014-01-08 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
CN114774854B (zh) * 2015-02-10 2024-09-06 大日本印刷株式会社 金属板以及蒸镀掩模的制造方法
KR20170059526A (ko) * 2015-11-20 2017-05-31 삼성디스플레이 주식회사 마스크 프레임 조립체, 마스크 프레임 조립체 제조 방법 및 표시 장치 제조 방법
JP6624504B2 (ja) * 2015-12-03 2019-12-25 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002371349A (ja) 2001-06-19 2002-12-26 Optonix Seimitsu:Kk 蒸着用マスク
JP2006244746A (ja) 2005-03-01 2006-09-14 Kyocera Corp マスク構造体およびそれを用いた蒸着方法、並びに有機発光素子の製造方法

Also Published As

Publication number Publication date
CN109321879B (zh) 2022-06-10
TW201911622A (zh) 2019-03-16
JP2023126306A (ja) 2023-09-07
JP7470734B2 (ja) 2024-04-18
CN109321879A (zh) 2019-02-12
KR20190013534A (ko) 2019-02-11
JP2024097027A (ja) 2024-07-17
JP7846721B2 (ja) 2026-04-15
KR102702151B1 (ko) 2024-09-04
JP2019026926A (ja) 2019-02-21
JP2022103212A (ja) 2022-07-07
TWI791549B (zh) 2023-02-11
JP2025023270A (ja) 2025-02-14

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