TWI786267B - 配向性磷灰石型氧化物離子傳導體及其製造方法 - Google Patents

配向性磷灰石型氧化物離子傳導體及其製造方法 Download PDF

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TWI786267B
TWI786267B TW108104982A TW108104982A TWI786267B TW I786267 B TWI786267 B TW I786267B TW 108104982 A TW108104982 A TW 108104982A TW 108104982 A TW108104982 A TW 108104982A TW I786267 B TWI786267 B TW I786267B
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apatite
formula
ion conductor
oxide ion
aligned
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TW201934487A (zh
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井手慎吾
城勇介
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日商三井金屬鑛業股份有限公司
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Abstract

本發明之配向性磷灰石型氧化物離子傳導體包含複合氧化物,該複合氧化物以A9.33+x [T6.00-y My ]O26.0+z (式中之A係選自由La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba所組成之群中之一種或兩種以上之元素;式中之T係Si或Ge或者包含該兩者之元素;式中之M係選自由B、Ge、Zn、Sn、W及Mo所組成之群中之一種或兩種以上之元素)表示,式中之x為-1.00~1.00,式中之y為0.40~未達1.00,式中之z為-3.00~2.00。

Description

配向性磷灰石型氧化物離子傳導體及其製造方法
本發明係關於一種能夠用作固體電解質型燃料電池(SOFC)、離子電池及空氣電池等各種電池之固體電解質、感測器、觸媒以及分離膜等之配向性磷灰石型氧化物離子傳導體及其製造方法。
本申請人首先提出一種以A9.33+x [T6-y My ]O26.00+z 表示之配向性磷灰石型氧化物離子傳導體(參照專利文獻1)。式中之A表示La等元素。T表示Si等。M表示B等。該氧化物離子傳導體可藉由將以A2+x TO5+z 表示之前驅物於含有M元素之氣相中進行加熱,使M元素與前驅物反應而獲得。該方法中為獲得具有磷灰石型結晶結構之上述氧化物離子傳導體所需之M元素之量係取決於上述前驅物之組成,且需為y=1.00以上。 [先前技術文獻] [專利文獻]
專利文獻1:美國專利申請公開第2018/0183068號說明書
以上述式表示之氧化物離子傳導體係氧化物離子傳導性優異者。氧化物離子傳導體廣泛地用於固體電解質型燃料電池、離子電池及空氣電池等各種電池之固體電解質、氧感測器、觸媒、以及分離膜等,要求進一步提高氧化物離子傳導性。因此,本發明之課題在於進一步提高先前所知之配向性磷灰石型氧化物離子傳導體之傳導性。
為解決上述課題,本發明人進行了銳意研究,結果得出如下見解:藉由控制構成配向性磷灰石型氧化物離子傳導體之元素之組成,可進一步提高氧化物離子之傳導性。
本發明係基於上述見解而完成者,且藉由提供一種配向性磷灰石型氧化物離子傳導體而解決上述課題,該配向性磷灰石型氧化物離子傳導體包含複合氧化物,該複合氧化物以A9.33+x [T6.00-y My ]O26.0+z (式中之A係選自由La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba所組成之群中之一種或兩種以上之元素;式中之T係Si或Ge或者包含該兩者之元素;式中之M係選自由B、Ge、Zn、Sn、W及Mo所組成之群中之一種或兩種以上之元素)表示,式中之x為-1.00~1.00,式中之y為0.40~未達1.00,式中之z為-3.00~2.00。
又,本發明提供一種配向性磷灰石型氧化物離子傳導體之製造方法,其具備:藉由將以A2.00+x TO5.00+z (式中之A係選自由La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba所組成之群中之一種或兩種以上之元素;式中之T係Si或Ge或者包含該兩者之元素;式中之x為-1.00~1.00,z為-2.00~2.00)表示之前驅物於含有M元素(M係選自由B、Ge、Zn、Sn、W及Mo所組成之群中之一種或兩種以上之元素)之氣相中進行加熱,而利用該M元素與上述前驅物之反應將該前驅物製成配向磷灰石型結晶結構之步驟;及退火步驟。
以下,對於本發明,基於其較佳實施形態來進行說明。針對上述專利文獻1中所記載之氧化物離子傳導體,本發明人推進了研究,結果判明,若於該氧化物離子傳導體中過度地導入M元素,則發現傳導率降低。因此,就抑制傳導率降低之觀點而言,較有利的是阻止M元素之過度導入。上述氧化物離子傳導體其組成之控制此前並不容易,但本發明人進行了銳意研究,結果發現可製造M元素之導入量較少之配向性磷灰石型氧化物離子傳導體之方法。以下,對於該氧化物離子傳導體詳細地進行說明。
<配向性磷灰石型氧化物離子傳導體> 本實施形態之一例之配向性磷灰石型氧化物離子傳導體(以下亦稱為「本氧化物離子傳導體」)包含具有磷灰石型結晶結構之複合氧化物(以下亦稱為「本磷灰石型複合氧化物」),該複合氧化物以式(1):A9.33+x [T6.00-y My ]O26.0+z (式中之A係選自由La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba所組成之群中之一種或兩種以上之元素;式中之T係Si或Ge或者包含該兩者之元素;式中之M係選自由B、Ge、Zn、Sn、W及Mo所組成之群中之一種或兩種以上之元素)表示,式中之x為-1.00~1.00,式中之y為0.40~未達1.00,式中之z為-3.00~2.00。
於本說明書中,所謂配向性磷灰石型氧化物離子傳導體之“配向性”,意指作為多晶體之磷灰石型氧化物離子傳導體具有晶軸一致之配向軸,包含一軸配向及雙軸配向。較佳為本磷灰石型複合氧化物具有c軸配向性。
於式(1)中,作為A所列舉之La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba係具有如下共通點之元素,即會成為具有正電荷之離子,且為可構成磷灰石型六方結晶結構之鑭系元素或鹼土金屬。該等之中,就可更為提高氧化物離子傳導性之觀點而言,較佳為與由La、Nd、Ba、Sr、Ca及Ce所組成之群中之一種或兩種以上之元素之組合,其中,較佳為La或Nd中之一種或者La與由Nd、Ba、Sr、Ca及Ce所組成之群中之一種或兩種以上之元素的組合。又,式(1)中之T只要為Si或Ge或者包含該兩者之元素即可。
式(1)中之M元素係於氣相中藉由與亞穩定之前驅物(後述之A2.00+x TO5.00+z )之反應而導入,其結果為,可使該前驅物之各結晶變成磷灰石型結晶結構,並且於單方向上進行配向。就該觀點而言,作為M元素,只要為於上述前驅物成為磷灰石型結晶結構之1000℃以上之溫度下成為氣相,可獲得所需之蒸汽壓之元素即可。再者,所謂「所需之蒸汽壓」,表示可於氣氛中以氣相狀態移動,可自上述前驅物表面向內部進行晶界或粒內擴散而推動反應的蒸汽壓。 因此,就此種觀點而言,作為M元素,例如可列舉選自由B、Ge、Zn、W、Sn及Mo所組成之群中之一種或兩種以上之元素。其中,就高配向度或高生產性(配向速度)之方面而言,特佳為B、Ge及Zn等。
於式(1):A9.33+x [T6.00-y My ]O26.0+z 中,x就可提高配向度及氧化物離子傳導性之觀點而言,較佳為-1.00~1.00,其中較佳為0.00以上或0.70以下,其中較佳為0.45以上或0.65以下。關於式(1)中之y,就填上磷灰石型晶格中之T元素位置之觀點、及提高作為目的之本氧化物離子傳導體之傳導性之觀點而言,較佳為0.40以上且未達1.00,其中較佳為0.40以上且0.90以下,其中較佳為0.40以上或0.80以下,特佳為0.40以上或0.70以下,尤其較佳為0.50以上且0.70以下。式(1)中之z就保持於磷灰石型晶格內之電中性之觀點而言,較佳為-3.00~2.00,其中較佳為-2.00以上或1.50以下,其中較佳為-1.00以上或1.00以下。
又,於式(1)中,關於A之莫耳數相對於M之莫耳數之比率(A/M)、換言之式(1)中之(9.33+x)/y,就保持磷灰石型晶格中之空間佔有率之觀點而言,較佳為10.0~26.0,其中較佳為超過10.0或26.0以下,其中較佳為11.0以上或26.0以下,特佳為12.0以上或26.0以下。
作為式(1):A9.33+x [T6.00-y My ]O26.0+z 之具體例,可列舉La9.33+x Si5.2 Zn0.80 O26.0+z 、La9.33+x Ge5.09 B0.91 O26.0+z 、Nd9.33+x Si5.15 B0.85 O26.0+z 等。然而,並不限定於該等。
本磷灰石型複合氧化物可將利用Lotgering法所測得之配向度、即Lotgering配向度設為0.60以上,其中可設為0.80以上,進而可設為0.90以上,其中特別可設為0.97以上。 為了將本磷灰石型複合氧化物之Lotgering配向度設為0.60以上,較佳為將A2.00+x TO5.00+z 所表示之前驅物製備成單一相且高密度(相對密度80%以上)。然而,並不限定於該方法。
本磷灰石型複合氧化物可將500℃下之氧化物離子傳導率設為10-4 S/cm以上,其中可設為10-3 S/cm以上,其中特別可設為10-2 S/cm以上。為了將本磷灰石型複合氧化物之500℃下之氧化物離子傳導率設為10-4 S/cm以上,較佳為將Lotgering配向度設為0.60以上。然而,並不限定於該方法。
本磷灰石型複合氧化物可將遷移數設為0.8以上,其中可設為0.9以上,其中特別可設為0.95以上。為了將本磷灰石型複合氧化物之遷移數設為0.8以上,較佳為將A9.33+x [T6.00-y My ]O26.0+z 之純度設為90質量%以上。但是,並不限定於該方法。
<氧化物離子傳導體之製造方法> 本實施形態之一例之氧化物離子傳導體之製造方法(以下亦稱為「本製造方法」)係具備如下步驟之製造方法:藉由將以式(2):A2.00+x TO5.00+z (式中之A係選自由La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba所組成之群中之一種或兩種以上之元素;式中之T係Si或Ge或者包含該兩者之元素;式中之x為-1.00~1.00,z為-2.00~2.00)表示之前驅物於含有M元素(M係選自由B、Ge、Zn、Sn、W及Mo所組成之群中之一種或兩種以上之元素)之氣相中進行加熱,而利用該M元素與上述前驅物之反應將該前驅物製成配向磷灰石型結晶結構之步驟(以下亦稱為「氣相-固相擴散步驟」);及進行退火之步驟(以下亦稱為「退火步驟」)。本製造方法只要具備氣相-固相擴散步驟及退火步驟即可,追加其他步驟則屬任意。
根據本製造方法,可抑制結晶內之龜裂等之產生,因此不僅可製造更大面積之配向性磷灰石型氧化物離子傳導體,亦可獲得具有結晶牢固地於單方向上配向之磷灰石型結晶結構之氧化物離子傳導體。其結果為,可獲得具有更高之氧化物離子傳導率之配向性磷灰石型複合氧化物。
氣相中之M元素(陽離子)自上述前驅物之表面與前驅物反應而開始形成配向性磷灰石型複合氧化物,而於前驅物與所生成之磷灰石相之界面中之反應進行,藉此可將前驅物整體製成配向性磷灰石型複合氧化物。尤其是若將藉由氣相-固相擴散步驟所得之配向性磷灰石型複合氧化物於該步驟後所進行之退火步驟中,於不含M元素之氣相中進行加熱,則M元素再汽化,因此可減少作為目的之配向性磷灰石型複合氧化物中之M元素之含量,並且可藉由結晶之再排列達成高配向度化。因此,藉由本製造方法可製造上述本氧化物離子傳導體。然而,可藉由本製造方法製造之氧化物離子傳導體並不限定於上述本氧化物離子傳導體。
(前驅物) 本製造方法中之前驅物只要為上述式(2)所示之化合物即可,亦可為非配向體。 該前驅物例如可為燒結體,可為成形體,亦可為膜體。
該前驅物例如可為利用將包含作為目的之A及T元素之化合物作為原料之溶膠凝膠法或水熱合成法等濕式合成法所獲得之化合物,亦可為對包含A及T元素之化合物進行燒結所獲得之化合物,又,亦可為藉由濺鍍等進行制膜所得者。
其中,作為該前驅物之燒結體,例如可為利用固相法將兩種以上之氧化物進行混合、加熱所獲得之複合氧化物燒結體,亦可為對將該燒結體粉碎所得之粉體進行加壓成形而成之粉末壓製成形體,亦可為進而以將該粉末壓製成形體進行加熱燒結所獲得之燒結體(稱為「複合氧化物粉末壓製成形燒結體」)之形式製備所得者。其中,就最終配向性磷灰石型氧化物離子傳導體之密度之方面而言,較佳為上述複合氧化物粉末壓製成形燒結體,其中,特佳為將藉由冷均壓加壓(CIP)進行加壓成形而成之粉末壓製成形體進行加熱燒結所得之粉末壓製成形燒結體,進而較佳為對該粉末壓製成形燒結體之表面進行研磨所得者。再者,作為前驅物之製備方法,較佳為於大氣中以1100℃~1700℃進行加熱並燒結,其中,進而較佳為於大氣中將包含成為原料之A及T之化合物之混合物以1200℃~1700℃進行加熱後,再次製成粉末壓製成形體,於大氣中以1300℃~1700℃進行加熱並燒結。作為以此方式2次煅燒時之各煅燒之作用,第一次煅燒主要有合成複合氧化物之作用,第二次煅燒主要有燒結之作用。
根據前驅物之組成比來決定自氣相摻雜之M元素量。因此,利用氣相法制作之磷灰石型矽酸鹽、鍺酸鹽或矽鍺酸鹽、即上述本磷灰石型複合氧化物之M元素量係取決於前驅物之組成比。 就該觀點而言,式(2)中之x較佳為-1.00~1.00,其中較佳為-0.40以上或0.70以下,其中較佳為0.00以上或0.60以下。 式(2)中之z就保持前驅物晶格中之電中性且可化學性地保持結晶結構之觀點而言,較佳為-2.00~2.00,其中較佳為-0.60以上或1.00以下,其中較佳為0.00以上或0.70以下。
作為前驅物之具體組成例,例如可列舉La2 SiO5 、Nd2 SiO5 、LaNdSiO5 、La2 GeO5 等。但是,並不限定於該等。
(氣相-固相擴散步驟) 本製造方法中之氣相-固相擴散步驟於配向結晶自氣相-固相界面生長之方面上具有特徵。自氣相導入M元素,可獲得目標組成之配向燒結體。此時,氣相中之M元素於經由前驅物之表面進入結晶內之過程中,結晶開始配向。因此,藉由遮蔽上述前驅物粉末壓製成形體燒結體之表面之一部分,可控制配向方向。
M元素只要為於前驅物變為磷灰石型結晶結構之1000℃以上之溫度下變為氣相,可獲得所需之蒸汽壓之元素即可。此處,該所謂「所需之蒸汽壓」,表示可於氣氛中以氣相狀態移動,可自上述前驅物表面向內部進行晶界或粒內擴散而推進反應之蒸汽壓。就該觀點而言,作為M元素,可列舉選自由B、Ge、Zn、W、Sn及Mo所組成之群中之一種或兩種以上之元素。該等可獲得藉由氣相中之M元素與前驅物表面之反應將M元素導入至T部位之配向磷灰石型結晶結構燒結體。例如若於M元素為B之情形時,則作為含有M元素之化合物,可列舉B2 O3 、H3 BO3 、LaBO3 、LaB6 等。亦可使用硼矽酸玻璃等非晶質體。另一方面,若於M元素為Zn之情形時,可列舉ZnO、Zn金屬、Zn2 SiO4 等,若為Ge之情形時,則可列舉GeO2 、Ge金屬等,若為W之情形時,則可列舉WO3 、WO2 、W金屬等,若為Sn之情形,則可列舉SnO2 、SnO、Sn金屬等,若為Mo之情形,則可列舉MoO2 、MoO3 、MoSi2 、Mo金屬等。
作為含有M元素之氣相,只要含有包含M元素之離子、包含M元素之蒸汽、包含M元素之氣體等之任一者即可。例如,可為含有包含M元素之蒸汽與氧之氣相。因此,此時之加熱氣氛、即含有M元素之容器內氣氛可為大氣氣氛、氧化氣氛、還原氣氛、惰性氣氛之任一者,進而亦可為該等之加壓狀態、或真空狀態。
於氣相-固相擴散步驟中,作為於含有M元素之氣相中對上述前驅物進行加熱之具體方法,例如以如下方式進行即可:將上述以A2.00+x TO5.00+z 表示之前驅物、與上述含有M元素之化合物加入至容器、例如密閉容器或帶蓋容器內進行加熱,藉此使上述含有M元素之化合物汽化,將該容器內之氣氛作為上述含有M元素之氣相氣氛,使該M元素與上述前驅物之表面進行反應。但是,並不限定於此種方法。再者,所謂氣相-固相擴散步驟中之「容器」,意指對為獲得上述「所需之蒸汽壓」所需之空間進行限定者,例如可列舉反應管、腔室、帶蓋匣缽等。但是並不限定於該等。
更具體而言,將La2 SiO5 組成之燒結體、與B2 O3 粉末於同一帶蓋氧化鋁容器內以1200~1600℃進行加熱,藉此使B2 O3 粉末汽化,將該容器內之氣氛作為含有B元素之氣相氣氛,可合成於Si部位取代了B之c軸配向磷灰石La9.33+x (Si4.7 B1.3 )O26.0+z
氣相-固相擴散步驟中之加熱溫度(爐之設定溫度)係設為1000℃以上,其中較佳為設為1100℃以上,其中特佳為設為1200℃以上。加熱溫度之上限並無特別限定,但理解為於大氣壓下可維持磷灰石型複合氧化物之結晶結構之1700℃附近成為上限溫度。
(退火步驟) 本步驟係對藉由氣相-固相擴散步驟所得之配向性磷灰石型複合氧化物進一步進行加熱之步驟。較佳為於不含有M元素之氣相氣氛下,對配向性磷灰石型複合氧化物進行加熱。藉此,可去除藉由氣相-固相擴散步驟所得之配向性磷灰石型複合氧化物之結晶結構中所包含之M元素,而減少其含量。於退火步驟中,可提取氣相-固相擴散步驟中所得之配向性磷灰石型複合氧化物,並於不含有包含M元素之氣體或包含M元素之化合物之容器內對該配向性磷灰石型複合氧化物進行加熱。於氣相-固相擴散步驟中,於藉由氣流來供給M元素之情形時,亦可藉由使氣流停止而接著氣相-固相擴散步驟後進行退火步驟。退火之氣氛可為大氣氣氛、氧化氣氛、還原氣氛、惰性氣氛之任一者,亦可為該等之加壓狀態、或真空狀態。
具體而言,將配向性磷灰石型複合氧化物於大氣中以1000℃至1600℃進行加熱,藉此可製造B之取代量y較佳為未達1.00、進而較佳為0.90以下之c軸配向磷灰石A9.33+x [T6.00-y My ]O26.0+z
退火步驟中之配向性磷灰石型複合氧化物之加熱溫度係設為1000℃以上,其中較佳為設為1100℃以上,其中特佳為設為1200℃以上。加熱溫度之上限並無特別限定,但可維持磷灰石型複合氧化物之結晶結構之1700℃附近成為大氣壓中之上限溫度。退火之時間係以退火之溫度為該範圍內作為條件,較佳為設定為0.5小時以上或3.0小時以下,進而較佳為設定為1.0小時以上或2.0小時以下。
於退火步驟中,藉由如上述般以較佳為1000℃以上之溫度對配向性磷灰石型複合氧化物進行加熱,而使結晶結構中所包含之M元素汽化,將之自該配向性磷灰石型複合氧化物去除。因此,於退火步驟中所使用之容器較佳為開放型之非密閉容器。於使用密閉容器之情形時,較佳為於容器內一面使含有氧之氣體流動一面進行加熱,而去除氣相中之M元素。
<用途> 作為本氧化物離子傳導體之使用形態之一例,可列舉作為具備於本氧化物離子傳導體之兩面積層電極而成之構成之電極接合體之固體電解質的使用形態。本氧化物離子傳導體之形狀並無限定。例如除平膜形狀以外,亦可有如圓筒形狀般之形態等。例如於本氧化物離子傳導體之形狀為圓筒形狀之情形時,通常於其內周面與外周面積層電極。
於將使用本氧化物離子傳導體之如上述般之電極接合體用作燃料電池(SOFC)之單元的情形時,例如若對該電極接合體之陽極電極供給燃料氣體,對陰極電極供給氧化劑(空氣、氧等)並使之於350~1000℃下動作,則該陰極電極中接收電子之氧分子變為O2- 離子,經由固體電解質到達陽極電極,於此處與氫結合而釋出電子,藉此可進行發電。
另一方面,於將使用本氧化物離子傳導體之如上述般之電極接合體用作氧感測器之情形時,例如若將該電極接合體之單側暴露於標準氣體中,將其相反側暴露於測定氣氛中,則視測定氣氛之氧濃度而產生電動勢。因此,例如藉由將標準氣體設為大氣且將測定氣氛設為來自內燃機之廢氣,可用於廢氣之空氣燃油比控制。
又,於將使用本氧化物離子傳導體之如上述般之電極接合體用作氧分離膜之情形時,與用作燃料電池(SOFC)之單元之情形同樣地,若對陰極電極供給空氣並使之於350~1000℃下動作,則於陰極中接收電子之氧分子變為O2- 離子,經由固體電解質到達陽極電極,於此處釋出電子而O2- 離子彼此結合,藉此僅使氧分子透過。
又,於將使用本氧化物離子傳導體之如上述般之電極接合體用作極限電流式氧感測器之情形時,可藉由測定視該電極接合體之陰極電極側之氧濃度所得之兩電極間之電流值而用作氧感測器。
於該等用途中,本氧化物離子傳導體之厚度就抑制電阻及製造穩定性之觀點而言,較佳為0.01 μm~1000 μm,其中更佳為0.1 μm以上或500 μm以下。再者,用於上述用途之電極較佳為多孔質形態。電極之材質可適當利用該用途中之公知者,其厚度較佳為0.01~70 μm左右。
<詞句之說明> 於本說明書中表現為「X~Y」(X及Y為任意數字)之情形時,除非特別說明,則包括「X以上且Y以下」之含義與「較佳為大於X」或「較佳為小於Y」之含義。又,於表現為「X以上」(X為任意數字)或「Y以下」(Y為任意數字)之情形時,亦包括「較佳為大於X」或「較佳為未達Y」意旨之意圖。 [實施例]
以下,基於下述實施例及比較例對本發明進一步詳述。
<實施例1> (1)氣相-固相擴散步驟 將La2 O3 與SiO2 以莫耳比成為1:1之方式進行調配,添加乙醇並利用球磨機混合之後,使該混合物乾燥,利用乳缽進行粉碎,使用Pt坩堝於大氣氣氛下以1650℃煅燒3小時。繼而,於該煅燒物中添加乙醇並利用行星球磨機進行粉碎,獲得預煅燒體粉末。 其次,將上述預煅燒體粉末放入至20 mmf之成形器中並自單方向加壓而單軸成形之後,進而以600 MPa進行冷均壓加壓(CIP)1分鐘而形成顆粒。繼而,將該顆粒狀成形體於大氣中以1600℃加熱3小時而獲得顆粒狀燒結體,利用金剛石磨輪對所得之顆粒狀燒結體之表面進行研磨,獲得前驅物。 根據以此方式獲得之前驅物之粉末X射線繞射及化學分析之結果,確認到為La2 SiO5 之結構。
將所得之前驅物(顆粒)800 mg、及B2 O3 粉末140 mg放入至帶蓋匣缽內,使用電爐於大氣中以1550℃(爐內氣氛溫度)加熱50小時,於匣缽內產生B2 O3 蒸汽,並且使B2 O3 蒸汽與前驅物反應。利用1200號水砂紙對以此方式獲得之顆粒之表面進行研磨,獲得配向性磷灰石型複合氧化物之燒結體。
(2)退火步驟 其次,使用電爐,將經研磨之配向性磷灰石型複合氧化物於大氣中以1600℃加熱1小時,而獲得樣品。大氣中不包含B2 O3
<實施例2> 於實施例1之退火步驟中,使用電爐將配向性磷灰石型複合氧化物於大氣中以1500℃加熱2小時,除此以外,以與實施例1相同之方式獲得樣品。
<實施例3> 於實施例1之退火步驟中,使用電爐將配向性磷灰石型複合氧化物於大氣中以1500℃加熱1小時,除此以外,以與實施例1相同之方式獲得樣品。
<實施例4> 於實施例1之退火步驟中,使用電爐將配向性磷灰石型複合氧化物於大氣中以1400℃加熱1小時,除此以外,以與實施例1相同之方式獲得樣品。
對實施例1~4中所得之磷灰石型燒結體(樣品)進行粉末X射線繞射及化學分析,結果確認到,所有實施例之磷灰石型燒結體(樣品)均其主構成相成為空間群屬於P63 /m之磷灰石型結晶結構,且為以下之表1所示之組成。又,對於所有實施例之磷灰石型燒結體(樣品),均利用偏光顯微鏡及掃描式電子顯微鏡進行了觀察,結果未發現龜裂。
再者,即便使用Ce、Pr、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba等元素代替實施例1~4中之La,於高溫區域中磷灰石型結晶結構亦穩定,因此可製作與使用La之情形相同之磷灰石型燒結體,可期待獲得與上述實施例相同之效果者。
<比較例1> 不進行實施例1之退火步驟,除此以外,以與實施例1相同之方式獲得配向性磷灰石型複合氧化物(樣品)。
<配向度之測定方法> 使用下述式,利用Lotgering法算出配向度。使用於磷灰石型燒結體整體X射線繞射中所得之全部峰強度之總和與歸屬於(002)及(004)之兩峰強度之和的比ρ,自下述數式(A)算出配向度f。
f=(ρ-ρ0 )/(1-ρ0 ) (A) 此處,ρ0 :磷灰石型結晶結構之理論值 ρ0 =ΣI0 (00l)/ΣI0 (hkl) ρ:配向磷灰石燒結體之測定值 ρ=ΣI(00l)/ΣI(hkl)
<氧化物離子傳導率之測定> 於磷灰石型燒結體(樣品)之兩面使用濺鍍法制膜150 nm厚之鉑膜而形成電極之後,於加熱爐中使溫度變化,利用阻抗測定裝置以頻率0.1 Hz~32 MHz進行複阻抗解析。關於各磷灰石型燒結體(樣品),自全部電阻成分(粒內電阻+晶界電阻)求出氧化物離子傳導率(S/cm)。將500℃下之氧化物離子傳導率示於下述表1。
[表1]
Figure 108104982-A0304-0001
自表1所示之結果明確可知,各實施例中所得之配向性磷灰石型氧化物離子傳導體與比較例中所得之配向性磷灰石型氧化物離子傳導體相比,配向度較高,又,氧化物離子傳導率較高。 [產業上之可利用性]
根據本發明,提供一種與先前相比氧化物離子之傳導性較高之配向性磷灰石型氧化物離子傳導體。

Claims (4)

  1. 一種配向性磷灰石型氧化物離子傳導體,其包含複合氧化物,該複合氧化物以A9.33+x[T6.00-yMy]O26.0+z(式中之A係選自由La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba所組成之群中之一種或兩種以上之元素;式中之T係Si或Ge或者包含該兩者之元素;式中之M係選自由B、Zn、Sn、W及Mo所組成之群中之一種或兩種以上之元素)表示,式中之x為-1.00~1.00,式中之y為0.40~未達1.00,式中之z為-3.00~2.00。
  2. 如請求項1之配向性磷灰石型氧化物離子傳導體,其中利用Lotgering法所測得之配向度為0.60以上。
  3. 一種電極接合體,其具備於如請求項1或2之配向性磷灰石型氧化物離子傳導體之兩面積層電極而成之構成。
  4. 一種配向性磷灰石型氧化物離子傳導體之製造方法,其具備:藉由將以A2.00+xTO5.00+z(式中之A係選自由La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Be、Mg、Ca、Sr及Ba所組成之群中之一種或兩種以上之元素;式中之T係Si或Ge或者包含該兩者之元素;式中之x為-1.00~1.00,z為-2.00~2.00)表示之前驅物於含有M元素(M係選自由B、Zn、Sn、W及Mo所組成之群中之一種或兩種以上之元素)之氣相中進行加熱,而利用該M元素與上述前驅物之反應將該前驅物製成配向磷灰石型結晶結構之步驟;及退火步驟。
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