TWI783054B - Grinding device - Google Patents
Grinding device Download PDFInfo
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- TWI783054B TWI783054B TW107135088A TW107135088A TWI783054B TW I783054 B TWI783054 B TW I783054B TW 107135088 A TW107135088 A TW 107135088A TW 107135088 A TW107135088 A TW 107135088A TW I783054 B TWI783054 B TW I783054B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
Abstract
[課題]提供一種磨削裝置,其可在測定表面粗糙度時,將讓被加工物破損或在被磨削面上造成損傷之可能性抑制得較低。 [解決手段]一種磨削裝置,具備保持被加工物的工作夾台、磨削保持在該工作夾台上之該被加工物的磨削單元、及以非接觸方式測定以該磨削單元所磨削之該被加工物的被磨削面的表面粗糙度的非接觸式表面粗糙度測定單元,該非接觸式表面粗糙度測定單元包含對該被磨削面照射光的發光部、接收在該被磨削面反射之光的受光部、記憶有該受光部的受光量與該被磨削面的該表面粗糙度之間的關係的記憶部、及從記憶在該記憶部之該關係與該受光部的該受光量來計算該被磨削面的表面粗糙度的計算部。[Problem] To provide a grinding device capable of reducing the possibility of breaking the workpiece or causing damage to the surface to be ground when measuring the surface roughness. [Solution] A grinding device comprising a work chuck for holding a workpiece, a grinding unit for grinding the workpiece held on the work chuck, and non-contact measurement of the workpiece obtained by the grinding unit. A non-contact surface roughness measuring unit for measuring the surface roughness of the ground surface of the workpiece after grinding, the non-contact surface roughness measuring unit includes a light emitting unit that irradiates light to the ground surface, and receives light from the ground surface. A light receiving unit for the light reflected by the ground surface, a memory unit storing the relationship between the amount of light received by the light receiving unit and the surface roughness of the ground surface, and the relationship between the relationship stored in the memory unit and the A calculation unit that calculates the surface roughness of the surface to be ground based on the amount of light received by the light receiving unit.
Description
發明領域 本發明是有關於一種於磨削晶圓等被加工物之時所使用的磨削裝置。field of invention The present invention relates to a grinding device used when grinding workpieces such as wafers.
發明背景 為了讓組裝在各種電子設備等的器件晶片小型化、輕量化,將分割成器件晶片前的晶圓薄化加工處理的機會已逐漸增加。例如,可以藉由以工作夾台保持晶圓之設置有器件的正面側,並以旋轉的磨石工具壓抵於晶圓的背面側,以將該晶圓磨削並薄化(參照例如專利文獻1)。Background of the invention In order to reduce the size and weight of device wafers incorporated in various electronic devices, etc., opportunities for wafer thinning processing prior to dicing into device wafers are increasing. For example, the wafer can be ground and thinned by holding the device-equipped front side of the wafer with a work chuck and pressing against the back side of the wafer with a rotating grindstone tool (see, for example, patent Literature 1).
然而,分割因磨削而變薄之晶圓所得到之器件晶片的抗折強度,是與晶圓的被磨削面(背面)的表面粗糙度密切地相關。於是,於磨削晶圓之後,通常會測定該晶圓的被磨削面的表面粗糙度。在表面粗糙度的測定中,是使用例如具備有接觸於作為測定對象之被磨削面之觸針的表面粗糙度測定裝置。 先前技術文獻 專利文獻However, the flexural strength of device wafers obtained by dividing a wafer thinned by grinding is closely related to the surface roughness of the ground surface (back surface) of the wafer. Therefore, after the wafer is ground, the surface roughness of the ground surface of the wafer is usually measured. In the measurement of the surface roughness, for example, a surface roughness measuring device provided with a stylus that comes into contact with the ground surface to be measured is used. prior art literature patent documents
專利文獻1:日本專利特開2000-288881號公報Patent Document 1: Japanese Patent Laid-Open No. 2000-288881
發明概要 發明欲解決之課題 然而,若利用如上所述的表面粗糙度測定裝置,會有例如從磨削裝置將晶圓往表面粗糙度測定裝置搬送時不小心使晶圓掉落,而使該晶圓破損之可能性。又,會有因表面粗糙度測定裝置的觸針而在晶圓的被磨削面上造成損傷,因而降低器件晶片的抗折強度之疑慮。Summary of the invention The problem to be solved by the invention However, if the above-mentioned surface roughness measuring device is used, for example, the wafer may be accidentally dropped when transporting the wafer from the grinding device to the surface roughness measuring device, and the wafer may be damaged. In addition, there is a possibility that the surface to be ground of the wafer will be damaged by the stylus of the surface roughness measuring device, thereby lowering the flexural strength of the device wafer.
本發明是有鑒於所述問題點而作成之發明,其目的在於提供一種磨削裝置,其可在測定表面粗糙度時,將讓被加工物破損或在被磨削面上造成損傷之可能性抑制得較低。 用以解決課題之手段The present invention was made in view of the above-mentioned problems, and its object is to provide a grinding device that can reduce the possibility of damaging the workpiece or causing damage to the surface to be ground when measuring the surface roughness. suppressed lower. means to solve problems
根據本發明的一個態樣,可提供一種磨削裝置,該磨削裝置具備保持該被加工物的工作夾台、磨削保持在該工作夾台上之該被加工物的磨削單元、及以非接觸方式測定由該磨削單元所磨削之該被加工物的被磨削面的表面粗糙度的非接觸式表面粗糙度測定單元,該非接觸式表面粗糙度測定單元包含對該被磨削面照射光的發光部、接收在該被磨削面上反射之光的受光部、記憶有該受光部的受光量與該被磨削面的該表面粗糙度之間的關係的記憶部、及從記憶在該記憶部之該關係與該受光部的該受光量來計算該被磨削面的表面粗糙度的計算部。 發明效果According to one aspect of the present invention, there is provided a grinding device including a work chuck holding the workpiece, a grinding unit for grinding the workpiece held on the work chuck, and A non-contact surface roughness measuring unit for measuring the surface roughness of the ground surface of the workpiece ground by the grinding unit in a non-contact manner, the non-contact surface roughness measuring unit including the a light emitting unit that emits light on the beveled surface, a light receiving unit that receives light reflected on the ground surface, a memory unit that memorizes the relationship between the amount of light received by the light receiving unit and the surface roughness of the ground surface, and a calculating unit that calculates the surface roughness of the surface to be ground from the relationship stored in the memory unit and the amount of light received by the light receiving unit. Invention effect
本發明的一個態樣之磨削裝置由於具備非接觸式表面粗糙度測定單元,且該非接觸式表面粗糙度測定單元包含對被加工物的被磨削面照射光的發光部、接收在被磨削面上反射之光的受光部、記憶有受光部的受光量與被磨削面的表面粗糙度之間的關係的記憶部、及從記憶於記憶部之關係與受光部的受光量來計算被磨削面的表面粗糙度的計算部,且可以依據受光部之受光量而以非接觸方式來測定表面粗糙度,因此不會有因觸針的接觸而在被磨削面上造成損傷之情形。A grinding device according to one aspect of the present invention is equipped with a non-contact surface roughness measuring unit, and the non-contact surface roughness measuring unit includes a light emitting unit that irradiates light to the ground surface of the workpiece, The light-receiving part of the light reflected on the beveled surface, the memory part that stores the relationship between the light-receiving part and the surface roughness of the ground surface, and the calculation from the relationship memorized in the memory part and the light-receiving part The calculation unit of the surface roughness of the ground surface, and can measure the surface roughness in a non-contact manner according to the amount of light received by the light receiving part, so there is no possibility of damage to the ground surface due to the contact of the stylus situation.
又,由於在磨削裝置內設有非接觸式表面粗糙度測定單元,因此毋須為了測定被磨削面的表面粗糙度,而將被加工物搬送至與磨削裝置分開之表面粗糙度測定裝置。亦即,由於使被加工物的搬送的路徑變得較短或消除,因此可將在該搬送時不小心使被加工物破損之可能性抑制得較低。Also, since the non-contact surface roughness measuring unit is installed in the grinding device, it is not necessary to transport the workpiece to a surface roughness measuring device separate from the grinding device in order to measure the surface roughness of the ground surface . That is, since the conveyance route of the workpiece is shortened or eliminated, the possibility of accidentally damaging the workpiece during this conveyance can be suppressed to a low level.
用以實施發明之形態
參照附圖,說明本發明的一個態樣之實施形態。圖1為示意地顯示本實施形態之磨削裝置2的構成例之立體圖。如圖1所示,磨削裝置2具備有支撐各構成要素之基台4。在基台4的後端,設有壁狀的支撐構造6。在基台4的上表面前側形成有開口4a,在該開口4a內配置有搬送板狀的被加工物11之搬送單元8。form for carrying out the invention
An embodiment of one aspect of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view schematically showing a configuration example of a
被加工物11是例如以矽(Si)等的材料所形成之圓盤狀的晶圓。但是,對被加工物11的材質、形狀、構造、大小等並無限制。也可以將例如,以其他的半導體、陶瓷、樹脂、金屬等的材料所形成之基板作為被加工物11。又,也可在與被加工物11的被磨削面11a(參照圖2)相反的相反側之面上貼附保護構件17等。The
在開口4a的側邊的區域上,載置有收容複數個被加工物11之片匣10a、10b。在載置有片匣10a之區域的後方,設有定心(centering)機構12。定心機構12是調整例如以搬送單元8從片匣10a所搬送來之被加工物11的中心的位置。
在定心機構12的後方設有將被加工物11保持並旋動之搬入單元14。在搬入單元14的後方形成有開口4b。在該開口4b內配置有X軸移動工作台(圖未示)、使X軸移動工作台在X軸方向(前後方向)上移動之X軸移動單元(圖未示)、覆蓋X軸移動工作台之工作台罩蓋16、及覆蓋X軸移動單元之防塵防滴罩蓋18。At the rear of the
X軸移動單元具備有與X軸方向平行的一對X軸導軌(圖未示),且在X軸導軌上可滑動地安裝有X軸移動工作台。在X軸移動工作台的下表面側設有螺帽部(圖未示),在此螺帽部中螺合有與X軸導軌平行的X軸滾珠螺桿(圖未示)。The X-axis moving unit is equipped with a pair of X-axis guide rails (not shown) parallel to the X-axis direction, and an X-axis moving table is slidably installed on the X-axis guide rails. A nut portion (not shown) is provided on the lower surface side of the X-axis movable table, and an X-axis ball screw (not shown) parallel to the X-axis guide rail is screwed into the nut portion.
在X軸滾珠螺桿的一端部上連結有X軸脈衝馬達(圖未示)。藉由以X軸脈衝馬達使X軸滾珠螺桿旋轉,X軸移動工作台即可沿著X軸導軌在X軸方向上移動。在X軸移動工作台的上表面側設有用以吸引、保持被加工物11的工作夾台20。An X-axis pulse motor (not shown) is connected to one end of the X-axis ball screw. By using the X-axis pulse motor to rotate the X-axis ball screw, the X-axis moving table can move in the X-axis direction along the X-axis guide rail. A
工作夾台20是連結於馬達等的旋轉驅動源(圖未示),並以繞著與Z軸方向(鉛直方向)大致平行的旋轉軸的方式旋轉。又,工作夾台20是藉由上述的X軸移動單元,而在將被加工物11搬入、搬出之前方的搬入搬出區域、及磨削被加工物11之後方的磨削區域之間移動。The
工作夾台20的上表面是露出於工作台罩蓋16的外部,且該上表面的一部分成為吸引、保持被加工物11之保持面。保持面是透過形成在工作夾台20的內部之吸引路(圖未示)等而連接到吸引源(圖未示)。藉由搬入單元14而搬入工作夾台20之被加工物11,是藉由作用於保持面之吸引源的負壓,而被吸引、保持在工作夾台20上。The upper surface of the
支撐構造6的前表面設有Z軸移動單元22。Z軸移動單元22具備有平行於Z軸方向之一對Z軸導軌24,且在該Z軸導軌24上可滑動地安裝有Z軸移動板26。在Z軸移動板26的後表面側(背面側),設有螺帽部(圖未示),且在此螺帽部螺合有與Z軸導軌24平行的Z軸滾珠螺桿28。The front surface of the supporting structure 6 is provided with a Z-
在Z軸滾珠螺桿28的一端部連結有Z軸脈衝馬達30。藉由Z軸脈衝馬達30使Z軸滾珠螺桿28旋轉,Z軸移動板26即可沿著Z軸導軌24在Z軸方向上移動。A Z-
於Z軸移動板26的前表面(正面)上,設有磨削被加工物11之磨削單元32。磨削單元32具備有固定於Z軸移動板26之筒狀的主軸殼體34。在主軸殼體34的內部收容有大致平行於Z軸方向(鉛直方向)之成為旋轉軸的主軸36。On the front surface (front surface) of the Z-
在從主軸殼體34露出之主軸36的前端部(下端部)固定有圓盤狀的安裝座38。在安裝座38的下表面,裝設有與安裝座38大致相同直徑的磨削輪40。磨削輪40包含例如以不鏽鋼或鋁等的金屬材料所形成之輪基台。在輪基台的下表面配置排列有複數個磨削磨石,該等複數個磨削磨石是使金剛石等的磨粒分散在樹脂或金屬等的結合材中而構成。A disc-
在主軸36的基端側(上端側)連結有馬達等的旋轉驅動源(圖未示)。磨削輪40是透過主軸36並藉由從旋轉驅動源所傳達之力而進行旋轉。在磨削單元32的內部或是附近,設有將純水等的磨削液供給至被加工物11等之噴嘴(圖未示)。A rotational drive source (not shown) such as a motor is connected to the base end side (upper end side) of the
在相鄰於搬入單元14之位置上,設有將被加工物11保持並旋動之搬出單元42。在搬出單元42的前方且在載置片匣10b之區域的後方,配置有洗淨磨削後之被加工物11的洗淨單元44。藉由洗淨單元44所洗淨之被加工物11是以搬送單元8進行搬送,而例如收容到片匣10b。在開口4a的前方,設有用於輸入磨削的條件等的操作面板46。At a position adjacent to the carrying-in
在磨削被加工物11時,是例如將被加工物11以被磨削面11a露出於上方之態樣來搬入已定位於搬入搬出區域之工作夾台20。然後,使該被加工物11吸引、保持在工作夾台20上,並使工作夾台20移動至磨削區域。之後,使工作夾台20與磨削輪40各自旋轉,且一邊對被加工物11的被磨削面11a等供給磨削液一邊使磨削單元32下降。When the
藉此,可以使磨削輪40的磨削磨石接觸於被加工物11的被磨削面11a而磨削被加工物11。再者,將磨削單元32的下降速度(下降量)調整成可使磨削磨石的下表面以適當之力壓抵於被加工物11的被磨削面11a側。Thereby, the
在搬入搬出區域的上方,設有以非接觸方式測定被加工物11的被磨削面11a的表面粗糙度之非接觸式表面粗糙度測定單元48。圖2是示意地顯示非接觸式表面粗糙度測定單元48的構成例之圖。該非接觸式表面粗糙度測定單元48是利用存在於被磨削面11a的表面粗糙度與在被磨削面11a上反射之光的反射量(強度)之間的相關性,來測定表面粗糙度之單元,並且包含發光部50與受光部52。Above the loading and unloading area, a non-contact surface
發光部50可為例如LED等的光源,並對已定位於下方之被加工物11的被磨削面11a照射光。另一方面,受光部52可為例如受光元件等的光檢測器,且接收從發光部50所照射而在被磨削面11a上反射之光,以生成相當於受光量(受光強度)之電壓等的訊號。因此,可將從發光部50朝被磨削面11a照射之光的波長設定在可在被磨削面11a上反射之範圍內。The
但是,發光部50或受光部52的構造等並沒有特別的限制。發光部50是例如構成為將光源之光以光纖等引導而往下方放射。同樣地,受光部52是例如構成為將接收到之光以光纖等引導至光檢測器。從發光部50對被磨削面11a照射之光的強度可任意地設定。However, the structure of the
又,在本實施形態中,是將發光部50與被加工物11之間的位置關係等調整成將來自發光部50之光照射於0.1mm左右的直徑的圓形的區域(被照射區域)。同樣地,在本實施形態中,是將受光部52與被加工物11之間的位置關係等調整成可以藉受光部52適當地接收在被磨削面11a上反射之光。In addition, in this embodiment, the positional relationship between the
藉此,變得可以在0.1mm左右的直徑的圓形的被照射區域測定被磨削面11a的表面粗糙度。但是,被照射區域的形狀或大小等,可因應於要求之測定精度或測定範圍等而適當地變更。再者,在該非接觸式表面粗糙度測定單元48中,變得可測定被照射區域的平均的表面粗糙度。Thereby, it becomes possible to measure the surface roughness of the surface to be ground 11 a in a circular irradiated region having a diameter of about 0.1 mm. However, the shape, size, and the like of the irradiated area can be appropriately changed in accordance with the required measurement accuracy, measurement range, and the like. Furthermore, in this non-contact surface
於受光部52連接有處理部54,該處理部54是處理在受光部52所生成之電壓等的訊號。該處理部54包含記憶部54a,該記憶部54a會預先記憶有在受光部52所生成之訊號的強度I(亦即,受光部52的受光量)與被磨削面11a的表面粗糙度R(例如算術平均粗糙度)之間的關係。A
圖3是顯示記憶在記憶部54a之關係的例子之圖形。這種關係是藉由例如下述作法而得到:在受光部52接收在被加工物11的被磨削面11a上反射之光來測定強度I,並且以習知之方法等來測定該被磨削面11a的表面粗糙度。再者,在圖3中,雖然是將表面粗糙度R與強度I之關係以曲線狀的圖形來表現,但該等的關係也有以直線狀的圖形來表現之情形。FIG. 3 is a graph showing an example of the relationship stored in the
又,處理部54包含計算部54b,該計算部54b是從記憶在記憶部54a之關係、及在受光部52所產生之訊號的強度I(亦即,受光部52的受光量)來計算被磨削面11a的表面粗糙度R。例如,如圖3所示,在受光部52生成有強度I1
之訊號的情況下,計算部54b會參考記憶在記憶部54a之關係,來計算相當於強度I1
之表面粗糙度R1。In addition, the
以如此構成之非接觸式表面粗糙度測定單元48來測定被加工物11的被磨削面11a的表面粗糙度R之時,是例如使工作夾台20移動至搬入搬出區域,並從上方的發光部50對下方的被磨削面11a照射光。然後,以受光部52接收在該被磨削面11a上反射之光。藉此,可在受光部52生成對應於受光量之強度I的訊號。When measuring the surface roughness R of the
之後,計算部54b會參考記憶在記憶部54a之關係,來計算相當於強度I之表面粗糙度R。所計算出之表面粗糙度R是使用在被加工物11的品質管理等。再者,表面粗糙度R的測定可在使被加工物11相對於非接觸式表面粗糙度測定單元48而停止之狀態下進行,亦可使被加工物11相對於非接觸式表面粗糙度測定單元48邊移動邊進行。After that, the
如以上,本實施形態之磨削裝置2由於具備非接觸式表面粗糙度測定單元48,且該非接觸式表面粗糙度測定單元48包含對被加工物11的被磨削面11a照射光的發光部50、接收在被磨削面11a上反射之光的受光部52、記憶有在受光部52所生成之訊號的強度I(亦即,受光部52的受光量)與被磨削面11a的表面粗糙度R之間的關係的記憶部54a、及從記憶於記憶部54a之關係與在受光部52所生成之訊號的強度I來計算被磨削面11a的表面粗糙度R的計算部54b,且可以依據受光部52之受光量而以非接觸方式來測定表面粗糙度R,因此不會有因觸針的接觸而在被磨削面11a上造成損傷之情形。As described above, since the grinding
又,由於在磨削裝置2內設有非接觸式表面粗糙度測定單元48,因此毋須為了測定被磨削面11a的表面粗糙度R,而將被加工物11搬送至與磨削裝置2分開之表面粗糙度測定裝置。亦即,由於被加工物11的搬送的路徑變得較短或消除,因此可將在該搬送時不小心使被加工物11破損之可能性抑制得較低。In addition, since the non-contact surface
再者,本發明並不因上述實施形態之記載而受到限制,並可作各種變更而實施。例如,以遮光構件等包圍搬入搬出區域及包含非接觸式表面粗糙度測定單元48之區域,以防止外部之光對受光部52的入射。藉此,變得可以更加精度良好地測定表面粗糙度R。In addition, this invention is not limited by description of the said embodiment, It can change variously and can implement. For example, the loading/unloading area and the area including the non-contact surface
另外,上述實施形態之構造、方法等,只要在不脫離本發明的目的之範圍內,均可適當變更而實施。In addition, the structures, methods, etc. of the above-mentioned embodiments can be appropriately changed and implemented within the scope not departing from the purpose of the present invention.
10a、10b‧‧‧片匣
11‧‧‧被加工物
11a‧‧‧被磨削面
12‧‧‧定心機構
14‧‧‧搬入單元
16‧‧‧工作台罩蓋
17‧‧‧保護構件
18‧‧‧防塵防滴罩蓋
2‧‧‧磨削裝置
20‧‧‧工作夾台
22‧‧‧Z軸移動單元
24‧‧‧Z軸導軌
26‧‧‧Z軸移動板
28‧‧‧Z軸滾珠螺桿
30‧‧‧Z軸脈衝馬達
32‧‧‧磨削單元
34‧‧‧主軸殼體
36‧‧‧主軸
38‧‧‧安裝座
4‧‧‧基台
4a、4b‧‧‧開口
40‧‧‧磨削輪
42‧‧‧搬出單元
44‧‧‧洗淨單元
46‧‧‧操作面板
48‧‧‧非接觸式表面粗糙度測定單元
50‧‧‧發光部
52‧‧‧受光部
54‧‧‧處理部
54a‧‧‧記憶部
54b‧‧‧計算部
6‧‧‧支撐構造
8‧‧‧搬送單元
X、Y、Z‧‧‧方向10a, 10b‧‧‧
圖1為示意地顯示磨削裝置的構成例之立體圖。 圖2是示意地顯示非接觸式表面粗糙度測定單元的構成例之圖。 圖3是顯示記憶於記憶部之關係的例子之圖形。FIG. 1 is a perspective view schematically showing a configuration example of a grinding device. FIG. 2 is a diagram schematically showing a configuration example of a non-contact surface roughness measurement unit. Fig. 3 is a graph showing an example of the relationship stored in the memory unit.
11‧‧‧被加工物 11‧‧‧processed object
11a‧‧‧被磨削面 11a‧‧‧ground surface
20‧‧‧工作夾台 20‧‧‧Work clamping table
48‧‧‧非接觸式表面粗糙度測定單元 48‧‧‧Non-contact surface roughness measurement unit
50‧‧‧發光部 50‧‧‧luminous part
52‧‧‧受光部 52‧‧‧light receiving part
54‧‧‧處理部 54‧‧‧Processing Department
54a‧‧‧記憶部 54a‧‧‧memory
54b‧‧‧計算部 54b‧‧‧Computing Department
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KR (1) | KR20190052624A (en) |
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CN112595283B (en) * | 2021-01-07 | 2022-04-29 | 山东韵丰环保科技有限公司 | Electronic heat radiator mesa roughness measurement equipment |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02222533A (en) * | 1989-02-23 | 1990-09-05 | Sumitomo Electric Ind Ltd | Polishing device for semiconductor wafer |
TW201404539A (en) * | 2012-07-25 | 2014-02-01 | Xiu-Ru Lin | Grinding and polishing method of aluminum nitride substrate |
US9149901B2 (en) * | 2010-02-03 | 2015-10-06 | Toyo Seikan Group Holdings, Ltd. | Method of polishing the diamond-surface |
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DE69522617T2 (en) * | 1994-06-28 | 2002-07-04 | Ebara Corp | Method and device for cleaning workpieces |
JP4154067B2 (en) | 1999-04-06 | 2008-09-24 | 株式会社ディスコ | Grinding equipment |
JP2009061511A (en) * | 2007-09-04 | 2009-03-26 | Disco Abrasive Syst Ltd | Method and apparatus for grinding wafer |
JP5276823B2 (en) * | 2007-10-04 | 2013-08-28 | 株式会社ディスコ | Wafer grinding equipment |
JP2009113149A (en) * | 2007-11-06 | 2009-05-28 | Disco Abrasive Syst Ltd | Grinder |
CN202533051U (en) * | 2012-03-29 | 2012-11-14 | 长沙理工大学 | Handheld rapid surface roughness measurement instrument |
JP2017189844A (en) * | 2016-04-14 | 2017-10-19 | 株式会社ディスコ | Grinding device |
JP6938853B2 (en) * | 2016-04-28 | 2021-09-22 | 株式会社ジェイテクト | Grinder |
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- 2017-11-08 JP JP2017215844A patent/JP2019087674A/en active Pending
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- 2018-10-04 TW TW107135088A patent/TWI783054B/en active
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02222533A (en) * | 1989-02-23 | 1990-09-05 | Sumitomo Electric Ind Ltd | Polishing device for semiconductor wafer |
US9149901B2 (en) * | 2010-02-03 | 2015-10-06 | Toyo Seikan Group Holdings, Ltd. | Method of polishing the diamond-surface |
TW201404539A (en) * | 2012-07-25 | 2014-02-01 | Xiu-Ru Lin | Grinding and polishing method of aluminum nitride substrate |
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TW201923873A (en) | 2019-06-16 |
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