TWI771788B - 光源裝置 - Google Patents

光源裝置 Download PDF

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Publication number
TWI771788B
TWI771788B TW109138107A TW109138107A TWI771788B TW I771788 B TWI771788 B TW I771788B TW 109138107 A TW109138107 A TW 109138107A TW 109138107 A TW109138107 A TW 109138107A TW I771788 B TWI771788 B TW I771788B
Authority
TW
Taiwan
Prior art keywords
discharge lamp
lamp
base
light source
source device
Prior art date
Application number
TW109138107A
Other languages
English (en)
Chinese (zh)
Other versions
TW202109211A (zh
Inventor
青木保夫
菊池孝幸
白數廣
Original Assignee
日商尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW202109211A publication Critical patent/TW202109211A/zh
Application granted granted Critical
Publication of TWI771788B publication Critical patent/TWI771788B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/50—Means forming part of the tube or lamps for the purpose of providing electrical connection to it
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/84—Lamps with discharge constricted by high pressure
    • H01J61/86—Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW109138107A 2014-03-28 2015-03-30 光源裝置 TWI771788B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014070609 2014-03-28
JPJP2014-070609 2014-03-28

Publications (2)

Publication Number Publication Date
TW202109211A TW202109211A (zh) 2021-03-01
TWI771788B true TWI771788B (zh) 2022-07-21

Family

ID=54195829

Family Applications (3)

Application Number Title Priority Date Filing Date
TW109138107A TWI771788B (zh) 2014-03-28 2015-03-30 光源裝置
TW108114340A TWI711892B (zh) 2014-03-28 2015-03-30 放電燈之更換方法及點亮方法、放電燈以及其製造方法
TW104110220A TWI661274B (zh) 2014-03-28 2015-03-30 Light source device, discharge lamp and manufacturing method thereof, and exposure device

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW108114340A TWI711892B (zh) 2014-03-28 2015-03-30 放電燈之更換方法及點亮方法、放電燈以及其製造方法
TW104110220A TWI661274B (zh) 2014-03-28 2015-03-30 Light source device, discharge lamp and manufacturing method thereof, and exposure device

Country Status (5)

Country Link
JP (1) JP6332438B2 (ko)
KR (1) KR102447925B1 (ko)
CN (2) CN106415396B (ko)
TW (3) TWI771788B (ko)
WO (1) WO2015147327A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108780280B (zh) * 2015-12-09 2020-10-30 株式会社尼康 放电灯及其更换方法、以及曝光方法及装置
CN110554536A (zh) * 2018-05-31 2019-12-10 上海微电子装备（集团）股份有限公司 一种光配向设备以及光配向设备中灯管的更换方法
CN108897198A (zh) * 2018-08-31 2018-11-27 武汉华星光电技术有限公司 曝光机的光源更换系统以及曝光机

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200905719A (en) * 2007-04-12 2009-02-01 Nikon Corp Discharge lamp, cable for connection, light source device, and exposure device
CN102842482A (zh) * 2011-06-22 2012-12-26 株式会社杰士汤浅国际 对放电灯的供电构造、放电灯单元以及紫外线照射装置
JP2013219045A (ja) * 2013-06-06 2013-10-24 Nikon Corp 光源装置、露光装置、及びデバイス製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0729081B2 (ja) * 1987-09-14 1995-04-05 ウシオ電機株式会社 光照射装置
JP4136126B2 (ja) * 1998-10-29 2008-08-20 株式会社ワコム電創 擬似太陽光照射ランプ自動交換装置
JP2004079254A (ja) * 2002-08-13 2004-03-11 Canon Inc 光源装置及び露光装置
WO2007066947A2 (en) 2005-12-08 2007-06-14 Electronics And Telecommunications Research Institute Mobile wireless access router for separately controlling traffic signal and control signal
CN2903695Y (zh) * 2006-04-29 2007-05-23 杨刚 一种装卸灯器
KR101858552B1 (ko) * 2006-09-01 2018-05-17 가부시키가이샤 니콘 방전램프, 광원장치, 노광장치 및 노광장치의 제조방법
EP2143995B1 (en) * 2007-04-12 2015-07-01 Nikon Corporation Discharge lamp, cable for connection, light source device, and exposure device
JP4913001B2 (ja) * 2007-09-28 2012-04-11 株式会社オーク製作所 光源装置
JP2011177625A (ja) * 2010-02-26 2011-09-15 Harison Toshiba Lighting Corp 紫外線照射装置
JP2011206731A (ja) * 2010-03-30 2011-10-20 Harison Toshiba Lighting Corp 紫外線照射装置
CN202067759U (zh) * 2011-05-20 2011-12-07 浙江创源照明科技有限公司 无极灯老化输送线
JP2014038766A (ja) * 2012-08-16 2014-02-27 Ushio Inc 放電ランプ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200905719A (en) * 2007-04-12 2009-02-01 Nikon Corp Discharge lamp, cable for connection, light source device, and exposure device
CN102842482A (zh) * 2011-06-22 2012-12-26 株式会社杰士汤浅国际 对放电灯的供电构造、放电灯单元以及紫外线照射装置
JP2013219045A (ja) * 2013-06-06 2013-10-24 Nikon Corp 光源装置、露光装置、及びデバイス製造方法

Also Published As

Publication number Publication date
CN110058493B (zh) 2021-09-14
KR20160140760A (ko) 2016-12-07
JP6332438B2 (ja) 2018-05-30
TWI711892B (zh) 2020-12-01
CN106415396B (zh) 2019-02-22
CN106415396A (zh) 2017-02-15
KR102447925B1 (ko) 2022-09-27
JPWO2015147327A1 (ja) 2017-04-13
TWI661274B (zh) 2019-06-01
TW202109211A (zh) 2021-03-01
TW201928532A (zh) 2019-07-16
TW201537310A (zh) 2015-10-01
WO2015147327A1 (ja) 2015-10-01
CN110058493A (zh) 2019-07-26

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