TWI766337B - 半導體裝置 - Google Patents
半導體裝置 Download PDFInfo
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- TWI766337B TWI766337B TW109127060A TW109127060A TWI766337B TW I766337 B TWI766337 B TW I766337B TW 109127060 A TW109127060 A TW 109127060A TW 109127060 A TW109127060 A TW 109127060A TW I766337 B TWI766337 B TW I766337B
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- 239000004065 semiconductor Substances 0.000 title claims description 118
- 239000000758 substrate Substances 0.000 claims abstract description 52
- 239000003990 capacitor Substances 0.000 claims description 68
- 239000010410 layer Substances 0.000 description 320
- 230000003071 parasitic effect Effects 0.000 description 40
- 238000010586 diagram Methods 0.000 description 30
- 239000000470 constituent Substances 0.000 description 28
- 230000000694 effects Effects 0.000 description 16
- 230000002093 peripheral effect Effects 0.000 description 12
- 239000004020 conductor Substances 0.000 description 9
- 230000004048 modification Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 5
- 238000002955 isolation Methods 0.000 description 4
- 230000003321 amplification Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 230000005669 field effect Effects 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
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Abstract
本發明提供能夠抑制集極電流或汲極電流的路徑的寄生電感或寄生電阻的增加的半導體裝置。在基板配置有兩行的電晶體行。兩行的電晶體行的各個由在第一方向上排列的複數個電晶體構成,兩行的電晶體行在與第一方向正交的第二方向上隔開間隔配置。在俯視時,在兩行的電晶體行之間的區域配置有第一佈線。第一佈線與兩行的電晶體行的複數個電晶體的集極或者汲極連接。在俯視時第一凸塊與第一佈線重疊,且配置在兩行的電晶體行之間,並與第一佈線連接。
Description
本發明係關於半導體裝置。
作為移動終端等的功率放大電路元件,使用設置有異質接面雙極電晶體的半導體晶片。該半導體晶片經由設置在其表面的複數個凸塊被倒裝構裝於構裝基板。這樣的構裝方式被稱為倒置構裝。例如在下述的專利文獻1等中記載了被倒裝構裝的功率放大電路用的半導體晶片。
對於專利文獻1所記載的半導體晶片而言,電晶體具備複數個叉指(finger)(也有時被稱為「單元(cell)」。)。若將一個叉指認為是一個電晶體,則可以說能夠將複數個電晶體至少排成兩行來配置。該電晶體行是相互平行地配置。以分別與兩行的電晶體行重疊的方式配置有兩個射極凸塊。在兩行的電晶體行之間的區域配置有集極佈線。集極佈線從兩行的電晶體行之間的區域在電晶體的排列方向上延伸到其外側。在該外側的區域配置有集極凸塊,在該外側的區域中集極凸塊與集極佈線連接。
專利文獻1:美國專利公開第2019/0148172號。
在專利文獻1所記載的半導體晶片中,連接集極凸塊和電晶體的集極的集極佈線配置在兩行的電晶體行之間,集極凸塊配置在該區域的外側。集極電流從集極凸塊通過兩行的電晶體行之間的區域的集極佈線流到各電晶體的集極。由於集極電流在複數個電晶體的排列方向上流過集極佈線,因此集極電流的路徑的寄生電感或寄生電阻容易變大。在使用場效電晶體作為電晶體並採用同樣的結構的情況下,汲極電流的路徑的寄生電感或寄生電阻容易變大。寄生電感或寄生電阻成為放大電路的最大輸出降低的重要因素。
本發明的目的在於提供能夠抑制集極電流或汲極電流的路徑的寄生電感或寄生電阻的增加的半導體裝置。
根據本發明的一個觀點,提供一種半導體裝置,上述半導體裝置具備:基板;以及設置在上述基板的兩行的電晶體行,上述兩行的電晶體行的各個由在第一方向上排列的複數個電晶體構成,上述兩行的電晶體行在與上述第一方向正交的第二方向上隔開間隔配置,上述半導體裝置還具有:第一佈線,在俯視時被配置在上述兩行的電晶體行之間的區域,並與上述兩行的電晶體行的上述複數個電晶體的集極或者汲極連接;以及至少一個第一凸塊,在俯視時與上述第一佈線重疊,並且被配置在上述兩行的電晶體行之間,並與上述第一佈線連接。
集極電流或者汲極電流經由第一凸塊以及第一佈線流向電晶體。
在使第一佈線延伸到兩行的電晶體行之間的區域的外側,並在延伸部分配置了第一凸塊的情況下,從第一凸塊到電晶體,集極電流或者汲極電流在第一方向上流過第一佈線。與此相對,如果採用根據本案發明的上述觀點的結構,則集極電流或者汲極電流在第一方向上流過第一凸塊和第一佈線這兩層。因此,在第一方向上流動的集極電流或者汲極電流的路徑的流路剖面變大。其結果為,能夠減少集極電流或者汲極電流的路徑的寄生電阻以及寄生電感。
20:基板
21:子集極層
22:元件分離區域
30:雙極電晶體
31:集極層
32:基極層
33:射極層
34:射極檯面層
35:電晶體行
40B:基極電極
40C:集極電極
40E:射極電極
41B:基極電極
41C:集極電極
41E:射極電極
42B:基極電極
42C:集極電極
42E:射極電極
50B:第一層的基極佈線
50C:第一層的集極引出佈線
50E:第一層的射極佈線
51B:第一層的基極佈線
51C:第一層的集極佈線(第一佈線)
51E:第一層的射極佈線
51H:第一層的高次諧波終端佈線(第三佈線)
51T:第一層的輸出佈線(第二佈線)
52B:第一層的基極佈線
52C:第一層的集極佈線
52H:第一層的高次諧波終端佈線(第三佈線)
52T:第一層的輸出佈線(第二佈線)
60C:第二層的集極佈線
60E:第二層的射極佈線
60H:第二層的高次諧波終端佈線
60T:第二層的輸出佈線
70C:集極凸塊(第一凸塊)
70E:射極凸塊
70H:高次諧波終端凸塊(第三凸塊)
70T:輸出凸塊(第二凸塊)
71C:集極凸塊
71T:輸出凸塊(第四凸塊)
75:焊料層
80:輸入電容器
81:電容器下部電極
82:電阻元件
83:偏置輸入佈線
88:高頻訊號輸入佈線
90、91、92:絕緣膜
94:開口
95、96、97:電容器介電膜
100:半導體晶片
110:驅動級放大電路
111:級間阻抗匹配電路
112:功率級放大電路
113:驅動級偏置電路
114:功率級放大電路
115:保護電路
120:高次諧波終端電路
121:高次諧波終端電容器(第二電容器)
123:高次諧波終端電感器
125:輸出電容器(第一電容器)
129:電感器
130:電晶體
131:集極層
132:基極層
133:射極層
134:射極檯面層
135:集極層
136:基極層
137:射極層
138:射極檯面層
150:功率放大模組
151:輸入側阻抗匹配電路
152:輸出側阻抗匹配電路
153、154:電感器
200:構裝基板
201C:集極用焊盤
201E:射極用焊盤
202:通孔導體
203:內層的接地平面
205:下表面的接地平面
210:構裝基板
211:輸出用焊盤
212:集極用焊盤
215:通孔導體
216:內裝佈線
219:接地平面
[圖1]是表示根據第一實施例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。
[圖2]是圖1的一點鏈線2-2處的剖視圖。
[圖3]是包括圖1以及圖2所示的半導體裝置的功率放大模組的剖視圖。
[圖4]是包括基於第一實施例的半導體裝置的功率放大模組的方塊圖。
[圖5]是包括基於第一實施例的半導體裝置的放大電路模組的等效電路圖。
[圖6]是表示基於比較例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。
[圖7]是圖6的一點鏈線7-7處的剖視圖。
[圖8]是表示基於第二實施例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。
[圖9]是表示基於第三實施例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。
[圖10]是表示基於第四實施例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。
[圖11]是包括基於第五實施例的半導體裝置的放大電路模組的等效電路圖。
[圖12]是表示基於第五實施例的半導體裝置的功率級放大電路以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。
[圖13]是圖12的一點鏈線13-13處的剖視圖。
[圖14]是表示基於第五實施例的變形例的半導體裝置的功率級放大電路以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。
[圖15]是表示基於第六實施例的半導體裝置的功率級放大電路以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。
[圖16]是圖15的一點鏈線16-16處的剖視圖。
[圖17]是表示基於第七實施例的半導體裝置的功率級放大電路以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。
[圖18]是圖17的一點鏈線18-18處的剖視圖。
[圖19]是圖17的一點鏈線19-19處的剖視圖。
[圖20]是表示基於第八實施例的半導體裝置的功率級放大電路以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。
[圖21]是表示基於第九實施例的半導體裝置的功率級放大電路以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。
[圖22]是圖21的一點鏈線22-22處的剖視圖。
參照圖1至圖5的圖式,對根據第一實施例的半導體裝置進行說明。
圖1是表示根據第一實施例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。在由半導體構成的基板配置有兩行的電晶體行35。兩行的電晶體行35的每行電晶體包括在第一方向D1上排列的複數個雙極電晶體30。又,兩行的
電晶體行35在與第一方向D1正交的第二方向D2上隔開間隔配置。
雙極電晶體30的各個包括集極層31、基極層32以及射極層33。在俯視時,集極層31、基極層32以及射極層33的外周線大致一致。在一個雙極電晶體30中,兩個集極電極40C配置於在第一方向D1上夾著集極層31的位置。集極電極40C經由設置在基板的表層部的子集極層與集極層31電連接。後面參照圖2,對子集極層進行說明。
在基極層32電連接有基極電極40B,在射極層33電連接有射極電極40E。在俯視時,射極電極40E的各個具有在第二方向D2上較長的形狀,並包含在射極層33中。在俯視時,基極電極40B具有從三個方向包圍射極電極40E且朝向兩行的電晶體行35之間的區域開放的U字狀的形狀,並包含在基極層32中。在圖1中,對集極電極40C、基極電極40B以及射極電極40E附加相對高密度的向右上方傾斜的陰影線。
在基板上的第一層的佈線層配置有複數個集極引出佈線50C、集極佈線51C(第一佈線)、複數個射極佈線50E、複數個基極佈線50B、複數個電容器下部電極81以及偏置輸入佈線83。在圖1中,對第一層的佈線層的各佈線附加相對低密度的向右下方傾斜的陰影線。
複數個集極引出佈線50C分別從集極電極40C朝向兩行的電晶體行35之間的區域被引出。此外,從配置於在第一方向D1上相鄰的兩個雙極電晶體30的集極層31之間的兩個集極電極40C引出的集極引出佈線50C彙集為一根。集極佈線51C配置在兩行的電晶體行35之間的區域,與從兩行的電晶體行35所包含的複數個雙極電晶體30的集極電極40C分別引出的複數個集極引出佈線50C連接。
複數個射極佈線50E分別與射極電極40E對應地配置在俯視時與射極電極40E重疊的位置。射極佈線50E與對應的射極電極40E連接。在本說明書
中,除非另有說明,在俯視時兩個構成要素重疊意味著在俯視時,一個構成要素的至少一部分與另一個構成要素的至少一部分重疊。
複數個基極佈線50B分別從基極電極40B向遠離兩行的電晶體行35之間的區域的方向被引出。複數個電容器下部電極81在兩行的電晶體行35的外側沿第一方向D1並排配置。複數個電容器下部電極81分別經由基極佈線50B與雙極電晶體30的基極電極40B連接。並且,複數個基極佈線50B分別經由電阻元件82與偏置輸入佈線83連接。從偏置輸入佈線83經由電阻元件82以及基極佈線50B向雙極電晶體30的基極電極40B供給基極電流。
在基板上的第二層的佈線層配置有兩個射極佈線60E、一個集極佈線60C以及高頻訊號輸入佈線88。兩個射極佈線60E分別配置在與兩行的電晶體行35重疊的位置,具有俯視時在第一方向D1上較長的形狀。集極佈線60C配置在兩行的電晶體行35之間,具有俯視時在第一方向D1上較長的形狀。
高頻訊號輸入佈線88與複數個電容器下部電極81重疊。兩者的重疊部分構成輸入電容器80。將高頻輸入訊號經由高頻訊號輸入佈線88、輸入電容器80、基極佈線50B供給至基極電極40B。
以與兩個射極佈線60E的各個重疊的方式配置有射極凸塊70E。以與集極佈線60C重疊的方式配置有集極凸塊70C(第一凸塊)。射極凸塊70E的各個以及集極凸塊70C具有俯視時在第一方向D1上較長的形狀(例如長圓形、橢圓形、跑道形)等。
複數個雙極電晶體30的射極電極40E經由射極佈線50E、60E以及射極凸塊70E接地。複數個雙極電晶體30的集極電極40C經由集極引出佈線50C、集極佈線51C、集極佈線60C與集極凸塊70C連接。
圖2是圖1的一點鏈線2-2處的剖視圖。在基板20的上表面的一部分的區域上配置有子集極層21。作為基板20,例如使用半絕緣性的GaAs基板。
子集極層21例如是基板20上外延生長的n型GaAs層。n型GaAs層中的子集極層21以外的部分被設為通過離子注入而被絕緣化的元件分離區域22。
在子集極層21上依次積層有集極層31、基極層32以及射極層33。例如,集極層31由n型GaAs形成,基極層32由p型GaAs形成,射極層33由n型InGaP形成。在射極層33的上表面的一部分的區域上配置有射極檯面層34。射極檯面層34具有依次積層了蓋層和接觸層的雙層構造。例如,蓋層由n型GaAs形成,接觸層由n型InGaAs形成。射極層33中的在俯視時與射極檯面層34重疊的區域作為雙極電晶體30的射極區域發揮作用,其它區域耗盡化。有時將射極層33中的作為射極區域發揮作用的部分稱為本質射極層,將耗盡化的部分稱為凸緣層。
在射極層33的上表面中的未配置有射極檯面層34的區域配置有基極電極40B。基極電極40B經由貫通射極層33到達到基極層32的合金化區域與基極層32電連接。在射極檯面層34上配置有射極電極40E。射極電極40E經由射極檯面層34與射極層33電連接。
在兩行的電晶體行35(圖1)之間的元件分離區域22上留下以與集極層31基極層32以及射極層33同一步驟成膜的半導體層。
以覆蓋在基極電極40B、射極電極40E以及元件分離區域22上留下的半導體層的方式,在基板20的整個區域配置有絕緣膜90。在絕緣膜90上配置有第一層的射極佈線50E以及集極佈線51C。射極佈線50E經過設置於絕緣膜90的開口與射極電極40E連接。集極佈線51C在圖2的剖面中沒有出現的區域經由集極引出佈線50C與集極電極40C(圖1)電連接。
以覆蓋第一層的射極佈線50E以及集極佈線51C的方式,在基板20的整個區域配置有絕緣膜91。絕緣膜91例如包括下側的SiN膜和其上的聚醯亞胺膜這兩層。
在絕緣膜91上配置有第二層的射極佈線60E以及集極佈線60C。
第二層的射極佈線60E經過設置於絕緣膜91的開口與第一層的射極佈線50E連接。第二層的集極佈線60C經過設置於絕緣膜91的開口與第一層的集極佈線51C連接。
以覆蓋第二層的射極佈線60E以及集極佈線60C的方式,在基板20的整個區域配置有絕緣膜92。絕緣膜92例如包括下側的SiN膜和其上的聚醯亞胺膜這兩層。
在絕緣膜92上配置有射極凸塊70E以及集極凸塊70C。射極凸塊70E經過設置於絕緣膜92的開口與第二層的射極佈線60E連接。集極凸塊70C經過設置於絕緣膜92的開口與第二層的集極佈線60C連接。在射極凸塊70E以及集極凸塊70C各自上配置有焊料層75。
圖3是表示包括圖1以及圖2所示的半導體裝置的功率放大模組的剖視圖。提供圖1以及圖2所示的半導體裝置作為一個半導體晶片100。將該半導體晶片100倒裝構裝於構裝基板200。
作為構裝基板200,例如使用印刷電路基板。構裝基板200也有時被稱為模組基板、封裝基板。在構裝基板200的一個面(以下,稱為上表面。)設置有複數個射極用焊盤201E以及集極用焊盤201C。半導體晶片100的射極凸塊70E以及集極凸塊70C分別經由焊料層75與射極用焊盤201E以及集極用焊盤201C連接。
在構裝基板200的內層配置有複數個接地平面203。並且,在構裝基板200的與上表面相反側的下表面也配置有接地平面205。射極用焊盤201E經由複數個通孔導體202與內層的複數個接地平面203以及下表面的接地平面205連接。
圖4是包括基於第一實施例的半導體裝置的功率放大模組150的方塊圖。在本說明書中,「半導體裝置」意味著配置有放大電路的半導體晶片,
或者包括該半導體晶片、電路零件以及構裝該半導體晶片和電路零件的構裝基板的放大電路模組。功率放大模組150包括半導體晶片100、輸入側阻抗匹配電路151、輸出側阻抗匹配電路152、電感器153、154。該等電路零件被構裝於構裝基板200(圖3)。
半導體晶片100包括驅動級放大電路110、級間阻抗匹配電路111、功率級放大電路112。經由電感器153對驅動級放大電路110施加電源電壓Vcc。經由電感器154對功率級放大電路112施加電源電壓Vcc。
將高頻訊號經由輸入側阻抗匹配電路151輸入至驅動級放大電路110。將被驅動級放大電路110放大後的高頻訊號經由級間阻抗匹配電路111輸入至功率級放大電路112。將被功率級放大電路112放大後的高頻訊號經由輸出側阻抗匹配電路152輸入至外部設備,例如天線元件。
功率級放大電路112包括圖1以及圖2所示的複數個雙極電晶體30。射極凸塊70E(圖1、圖2)被接地。經由級間阻抗匹配電路111向高頻訊號輸入佈線88(圖1)輸入高頻訊號。集極凸塊70C(圖1、圖2)與輸出側阻抗匹配電路152連接,並且經由電感器154與電源電壓Vcc連接。電感器154作為阻止高頻訊號的扼流圈發揮作用。
圖5是包括基於第一實施例的半導體裝置的放大電路模組的等效電路圖。根據第一實施例的放大電路模組包括驅動級放大電路110、功率級放大電路112、驅動級偏置電路113、功率級偏置電路114、電感器153、154、輸入側阻抗匹配電路151以及輸出側阻抗匹配電路152。在圖5中,由圓柱圖形圍起的電感器表示凸塊具有的寄生電感器。
功率級放大電路112包括複數個由雙極電晶體30、輸入電容器80以及電阻元件82構成的單位單元。使複數個單位單元彼此並聯連接。此外,在圖5中,代表性地示出複數個單位單元中的一個。在雙極電晶體30的集極連接有集
極凸塊70C。經由作為扼流圈發揮作用的電感器154以及集極凸塊70C對雙極電晶體30的集極施加電源電壓Vcc。
從功率級偏置電路114經由電阻元件82向雙極電晶體30的基極供給偏置電流。功率級偏置電路114包括串聯連接在偏置控制端子VBp與接地線之間的電阻元件R1、電晶體Q1、Q2、電阻元件R2。電晶體Q1、Q2分別被二極體連接,並作為二極體進行動作。功率級偏置電路114還包括射極輸出器電晶體Q3。電晶體Q1和射極輸出器電晶體Q3構成電流反射鏡。對射極輸出器電晶體Q3的集極施加偏置電壓Vbat。射極輸出器電晶體Q3的射極經由電阻元件82與雙極電晶體30的基極連接。功率級偏置電路114將與給予偏置控制端子VBp的控制電壓對應的偏置電流供給至雙極電晶體30。
驅動級放大電路110、驅動級偏置電路113、電感器153的基本的電路構成與功率級放大電路112、功率級偏置電路114、電感器154的電路構成相同。但是,單位單元的個數以及各元件的尺寸在驅動級放大電路110和功率級放大電路112中不同。又,驅動級偏置電路113供給與賦予偏置控制端子VBd的控制電壓對應的偏置電流。在圖5中,省略在驅動級放大電路110的雙極電晶體的集極與電感器153之間配置的集極凸塊的記載。
將高頻輸入訊號經由輸入側阻抗匹配電路151輸入至驅動級放大電路110。將被驅動級放大電路110放大後的高頻訊號經由功率級放大電路112的輸入電容器80輸入至雙極電晶體30的基極。雙極電晶體30的射極經由射極凸塊70E的寄生電感接地。
其次,與圖6以及圖7所示的比較例比較,對根據第一實施例的半導體裝置的優異的效果進行說明。
圖6是表示根據比較例的半導體裝置的複數個構成要素的俯視時的位置關係的圖,圖7是圖6的一點鏈線7-7處的剖視圖。以下,對與基於第一實
施例的半導體裝置(圖1、圖2)的不同點進行說明。在比較例中,第一層的集極佈線包括配置在兩行的電晶體行35之間的集極佈線51C、和從集極佈線51C朝向第一方向D1的一側伸出的集極佈線52C。
第二層的集極佈線也包括在俯視時與集極佈線51C重疊的集極佈線60C、以及與伸出部分的集極佈線52C重疊的集極佈線61C。集極凸塊71C配置在與伸出部分的集極佈線61C重疊的位置,在兩行的電晶體行35之間未配置集極凸塊。
在比較例的結構中,從集極凸塊71C到達集極電極40C,集極電流在第一方向D1上流過第一層的集極佈線51C以及第二層的集極佈線60C。如圖7所示,在第一方向D1上流動的集極電流的流路僅由第一層的集極佈線51C和第二層的集極佈線60C這兩層構成。
與此相對,在第一實施例中,集極電流在第一方向D1上流過集極用焊盤201C(圖3)、集極凸塊70C(圖3)、第二層的集極佈線60C(圖2)以及第一層的集極佈線51C(圖2),之後在第二方向D2上流過集極引出佈線50C,到達集極電極40C。在第一方向D1上流動的集極電流的流路包括集極用焊盤201C、集極凸塊70C、第二層的集極佈線60C以及第一層的集極佈線51C這四層。該流路的厚度方向以及第二方向D2的尺寸大於基於比較例的半導體裝置的流路的該等的尺寸。
在第一實施例中,與比較例(圖6、圖7)相比,在第一方向D1上流動的集極電流的路徑的流路剖面較大,因此獲得集極電流的路徑的寄生電阻、寄生電感較小這樣的優異效果。特別是通過將集極凸塊70C設為在第一方向D1上較長的形狀,能夠在複數個雙極電晶體30之間,抑制寄生電阻或寄生電感的偏差,並進一步減少寄生電阻或寄生電感。由此,能夠抑制由於集極電流的路徑的寄生電阻或寄生電感的增大引起的最大輸出的降低。
為了獲得上述的充分的效果,較佳為使兩行的電晶體行35的第二方向的間隔(一個電晶體行35的集極電極40C與另一個電晶體行35的集極電極40C的間隔)比兩行的電晶體行35的各個35的第一方向D1的長度(從位於最外側的一個集極電極40C的外側的邊緣到另一個集極電極40C的外側的邊緣的長度)短。又,較佳為將集極凸塊70C的第一方向D1的尺寸設為電晶體行35的第一方向D1的長度的3/4以上。
其次,對第一實施例的變形例進行說明。
例如參照圖11於後面說明所述,存在在構成功率級放大電路112(圖4)的複數個雙極電晶體30的集極連接高次諧波終端電路的情況。高次諧波終端電路例如由高次諧波終端電容器與高次諧波終端電感器的串聯電路構成。也可以將具有該高次諧波終端電容器以及高次諧波終端電感器的至少一者,即電感以及電容的至少一者的無源元件(passive element)配置在構裝基板200(圖3)的內層。該無源元件只要配置在俯視時與集極用焊盤201C(圖3)重疊的位置即可。由此,無需確保在俯視時用於配置高次諧波終端電路的專用區域,能夠抑制功率放大模組150(圖4)的尺寸增大。
其次,對第一實施例的其它變形例進行說明。在第一實施例中,作為放大電路的有源元件,使用雙極電晶體30,但也可以使用場效電晶體。該情況下,將根據第一實施例的半導體裝置的「射極」、「基極」以及「集極」分別替換為「源極」、「閘極」以及「汲極」即可。
其次,參照圖8,對根據第二實施例的半導體裝置進行說明。以下,對於與基於第一實施例的半導體裝置(圖1至圖4)相同的結構,省略說明。
圖8是表示基於第二實施例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。在第一實施例中,第一層的集極佈線51C以及第二層的集
極佈線60C收斂至夾在兩行的電晶體行35的區域內。與此相對,在第二實施例中,在夾在兩行的電晶體行35的區域的外側也配置有第一層的集極佈線52C以及第二層的集極佈線61C。在俯視時,第一層的集極佈線52C以及第二層的集極佈線61C具有在第二方向D2上較長的形狀。
集極佈線52C與夾在兩行的電晶體行35的區域內的集極佈線51C連續。同樣地,第二層的集極佈線61C與夾在兩行的電晶體行35的區域內的集極佈線60C連續。若使兩行的電晶體行35延伸到第一方向D1的一側,則在俯視時與第一層的集極佈線51C以及第二層的集極佈線61C的一部分重疊。
以在俯視時包含在第二層的集極佈線61C中的方式配置集極凸塊71C。集極凸塊71C具有俯視時在第二方向D2上較長的形狀。
其次,對基於第二實施例的半導體裝置的優異效果進行說明。
在第二實施例中,作為集極電流的路徑,形成包括配置在兩行的電晶體行35之間的區域中的集極凸塊70C(第一凸塊)的路徑、以及包括另一個集極凸塊71C(其它第一凸塊)的路徑。通過使該兩個路徑並聯連接,能夠進一步減少集極電流的路徑的寄生電阻以及寄生電感。其結果為,獲得抑制最大輸出的降低這樣的優異效果。
其次,參照圖9,對根據第三實施例的半導體裝置進行說明。以下,對於與基於第二實施例的半導體裝置(圖8)相同的結構,省略說明。
圖9是表示基於第三實施例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。在第三實施例中,將具有與基於第二實施例的半導體裝置(圖8)中的複數個構成要素的平面配置基本相同的平面配置的電路構成在第二方向D2上並排配置兩個。一方的第一層的集極佈線52C與另一方的第一層的集極佈線52C相互連續。同樣地,一方的第二層的集極佈線61C與另一方的第二層的
集極佈線61C相互連續。單獨配置集極凸塊71C。
又,一方的偏置輸入佈線83與另一方的偏置輸入佈線83相互連續,一方的高頻訊號輸入佈線88與另一方的高頻訊號輸入佈線88相互連續。
其次,對第三實施例的優異效果進行說明。
在第三實施例中,與第二實施例同樣地也能夠減少集極電流的路徑的寄生電阻以及寄生電感。其結果為,獲得能夠抑制最大輸出的降低這樣的優異效果。
其次,參照圖10,對根據第四實施例的半導體裝置進行說明。以下,對於與基於第二實施例的半導體裝置(圖8)相同的結構,省略說明。
圖10是表示基於第四實施例的半導體裝置的複數個構成要素的俯視時的位置關係的圖。在第二實施例中,在兩行的電晶體行35之間配置有一個集極凸塊70C(圖8)。與此相對,在第四實施例中,在兩行的電晶體行35之間的區域配置有兩個集極凸塊70C。兩個集極凸塊70C的每一個具有俯視時在第一方向D1上較長的形狀,並在第二方向D2上隔開間隔配置。為了在兩行的電晶體行35之間的區域配置兩個集極凸塊70C,而使兩個電晶體行35之間的第二方向D2的間隔與第一實施例的情況相比較寬。
兩個集極凸塊70C經由配置在兩行的電晶體行35之間的區域的第一層的集極佈線51C以及第二層的集極佈線60C相互連接。在俯視時與配置在兩行的電晶體行35之間的區域的外側的集極佈線61C重疊的集極凸塊71C同第二實施例的情況同樣為一個。
其次,對第四實施例的優異效果進行說明。
在第四實施例中,在兩個電晶體行35之間的區域配置有兩個集極凸塊70C。因此,與第二實施例(圖8)的情況相比,減少集極電流的路徑的寄生電阻以及寄生電感的效果提高。
其次,對第四實施例的變形例進行說明。在第四實施例中,在兩行的電晶體行35之間的區域配置有兩個集極凸塊70C,但也可以配置三個以上的複數個集極凸塊70C。
其次,參照圖11至圖13的圖式,對根據第五實施例的半導體裝置進行說明。以下,對於與基於第一實施例的半導體裝置(圖1至圖4)相同的結構,省略說明。
圖11是包括基於第五實施例的半導體裝置的放大電路模組的等效電路圖。基於第五實施例的放大電路模組包括驅動級放大電路110、功率級放大電路112、驅動級偏置電路113、功率級偏置電路114、電感器153、154、保護電路115、高次諧波終端電路120、輸出電容器125、電感器129、輸入側阻抗匹配電路151以及輸出側阻抗匹配電路152。在圖11中,由圓柱圖形圍起的電感器表示凸塊具有的寄生電感器。
功率級放大電路112包括複數個由雙極電晶體30、輸入電容器80以及電阻元件82構成的單位單元。使複數個單位單元相互並聯連接。此外,在圖11中,代表性地示出複數個單位單元中的一個。經由作為扼流圈發揮作用的電感器154對雙極電晶體30的集極施加電源電壓Vcc。
從功率級偏置電路114經由電阻元件82向雙極電晶體30的基極供給偏置電流。功率級偏置電路114包括串聯連接在偏置控制端子VBp與接地線之間的電阻元件R1、電晶體Q1、Q2、電阻元件R2。電晶體Q1、Q2分別被二極體連接,並作為二極體進行動作。功率級偏置電路114還包括射極輸出器電晶體Q3。電晶體Q1和射極輸出器電晶體Q3構成電流反射鏡。對射極輸出器電晶體Q3的集極施加偏置電壓Vbat。射極輸出器電晶體Q3的射極經由電阻元件82與雙極電晶體30的基極連接。功率級偏置電路114將與賦予偏置控制端子VBp的控制電壓對應的偏置電流供給至雙極電晶體30。
驅動級放大電路110、驅動級偏置電路113、電感器153的基本的電路構成與功率級放大電路112、功率級偏置電路114、電感器154的電路構成相同。但是,單位單元的個數以及各元件的尺寸在驅動級放大電路110和功率級放大電路112中不同。又,驅動級偏置電路113供給與賦予偏置控制端子VBd的控制電壓對應的偏置電流。
將高頻輸入訊號經由輸入側阻抗匹配電路151輸入至驅動級放大電路110。將被驅動級放大電路110放大後的高頻訊號經由功率級放大電路112的輸入電容器80輸入至雙極電晶體30的基極。雙極電晶體30的射極經由射極凸塊70E的寄生電感接地。
保護電路115被插入到功率級放大電路112的雙極電晶體30的集極與接地線之間。保護電路115由串聯連接的複數個二極體構成,並且在從集極朝向接地線的方向為正向的方向上連接二極體。若雙極電晶體30的集極電壓超過允許最大值,則保護電路115導通來保護雙極電晶體30。
在功率級放大電路112的雙極電晶體30的集極與接地線之間還連接有高次諧波終端電路120。高次諧波終端電路120由高次諧波終端電容器121、高次諧波終端凸塊70H的寄生電感以及高次諧波終端電感器123的串聯電路構成。
功率級放大電路112的雙極電晶體30的集極經由輸出電容器125以及輸出凸塊70T(第二凸塊)的寄生電感與輸出側阻抗匹配電路152連接。輸出凸塊70T與輸出側阻抗匹配電路152的相互連接點經由電感器129接地。
圖12是表示基於第五實施例的半導體裝置的功率級放大電路112(圖11)以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。以下,對於與基於第二實施例的半導體裝置(圖8)的複數個構成要素的俯視時的位置關係相同的位置關係,省略說明。
在第二實施例中,第一層的集極佈線51C配置在兩行的電晶體行35之間的區域的大致整個區域。與此相對,在第五實施例中,與兩行的電晶體行35對應地配置兩個第一層的集極佈線51C。兩個集極佈線51C分別與對應的電晶體行35的集極電極40C所連接的複數個集極引出佈線50C連接。兩個集極佈線51C在其端部與集極佈線52C連接。
在兩個集極佈線51C之間的區域配置有構成保護電路115(圖11)的複數個電晶體130。電晶體130的各個被進行二極體連接。電晶體130的各個包括集極層131、基極層132、射極層133、射極檯面層134、集極電極41C、基極電極41B以及射極電極41E。以與射極電極41E的各個重疊的方式配置第一層的射極佈線51E。
第二層的集極佈線60C、61C的俯視時的形狀與第二實施例的第二層的集極佈線60C、61C(圖8)的俯視時的形狀相同。因此,在俯視時,第二層的集極佈線60C與複數個電晶體130重疊。配置在兩行的電晶體行35之間的第二層的集極佈線60C的與第一方向D1平行的邊緣的附近與第一層的集極佈線51C重疊。在該重疊部分,第二層的集極佈線60C與第一層的集極佈線51C連接。此外,與第二實施例(圖8)的情況同樣地,第二層的集極佈線61C與第一層的集極佈線52C連接。
圖13是圖12的一點鏈線13-13處的剖視圖。以下,對於與基於第一實施例的半導體裝置的剖面構造(圖2)相同的構造,省略說明。
在第一實施例中,在兩個雙極電晶體行35的之間的大致整個區域配置有第一層的集極佈線51C(圖2)。與此相對,在第五實施例中,第一層的集極佈線51C被分為左右而配置兩個。在兩個集極佈線51C之間配置有電晶體130。在俯視時,電晶體130包含在子集極層21中。
在子集極層21上依次積層有集極層131、基極層132、射極層133。
在俯視時,集極層131、基極層132以及射極層133的外周線大致一致。在射極層133的上表面的一部分的區域上配置有射極檯面層134。在射極檯面層134上配置有射極電極41E。在覆蓋雙極電晶體30的射極電極40E、電晶體130的射極電極41E的絕緣膜90上配置有第一層的射極佈線51E。第一層的射極佈線51E經過設置於絕緣膜90的開口與射極電極41E連接。
在覆蓋第一層的射極佈線51E、50E的絕緣膜91上配置有第二層的集極佈線60C。第二層的集極佈線60C經過設置於絕緣膜91的開口與兩個第一層的集極佈線51C連接。在俯視時,第二層的集極佈線60C與電晶體130重疊,並經由絕緣膜91配置在電晶體130的上方。
第二層的集極佈線60C以及第二層的射極佈線60E上方的剖面構造與根據第一實施例的半導體裝置(圖2)的剖面構造相同。
其次,對第五實施例的優異效果進行說明。
在第五實施例中,也與第一實施例的情況同樣地,厚度方向的尺寸大於集極佈線60C、51C的集極凸塊70C配置在兩行的電晶體行35之間,並且其俯視時的形狀在第一方向上較長。該集極凸塊70C與第二方向D2的尺寸較大的集極用焊盤201C(圖3)連接。因此,在第一方向D1上流動的集極電流的流路的厚度方向以及第二方向D2的尺寸變大。其結果為,減少集極電流的路徑的寄生電阻以及寄生電感。由此,能夠抑制雙極電晶體30的最大輸出的降低。
並且,在第五實施例中,由於在第二層的集極佈線60C下配置有保護電路115,因此能夠減小在基板20中放大電路整體所占的面積。
其次,參照圖14,對基於第五實施例的變形例的半導體裝置進行說明。
圖14是表示基於第五實施例的變形例的半導體裝置的功率級放大電路以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。在本變形例中,將具有
與基於第五實施例的半導體裝置(圖12)的複數個構成要素的平面配置基本相同的平面配置的電路構成在第二方向D2上並排配置兩個。使一方的高頻訊號輸入佈線88與另一方的高頻訊號輸入佈線88相互連接。並且,使一方的偏置輸入佈線83與另一方的偏置輸入佈線83相互連接。如此,通過並排配置複數個圖12所示的第五實施例的半導體裝置,能夠實現高輸出化。
其次,參照圖15以及圖16,對基於第六實施例的半導體裝置進行說明。以下,對於與基於第五實施例的半導體裝置(圖12、圖13)相同的結構,省略說明。
圖15是表示基於第六實施例的半導體裝置的功率級放大電路112(圖11)以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。在第五實施例中,在兩個第一層的集極佈線51C之間的區域配置有保護電路115(圖11、圖12)。與此相對,在第六實施例中,在兩個第一層的集極佈線51C之間的區域配置有複數個電阻元件82以及功率級偏置電路114的射極輸出器電晶體Q3(圖11)。
在第五實施例中,在俯視時雙極電晶體30的基極電極40B(圖12)具有U字狀的形狀。與此相對,在第六實施例中,在俯視時基極電極40B以環狀包圍射極電極40E的四周。從基極電極40B朝向兩行的電晶體行35之間的區域引出第一層的基極佈線51B。第一層的集極佈線51C在與第一層的基極佈線51B交叉的位置被分割,集極佈線51C與基極佈線51B電絕緣。此外,被分割的第一層的集極佈線51C經由第二層的集極佈線60C相互連接。
射極輸出器電晶體Q3包括集極層135、基極層136、射極層137、射極檯面層138、集極電極42C、基極電極42B以及射極電極42E。複數個第一層的基極佈線51B分別與對應的電阻元件82的一端連接。複數個電阻元件82的另一端經由偏置輸入佈線83與射極輸出器電晶體Q3的射極電極42E連接。
第一層的集極佈線52C與集極電極42C連接,第一層的基極佈線
52B與基極電極42B連接。經由集極佈線52C對集極電極42C施加偏置電壓Vbat(圖11)。基極佈線52B與功率級偏置電路114的電晶體Q1(圖11)的基極連接。
圖16是圖15的一點鏈線16-16處的剖視圖。以下,對於與基於第五實施例的半導體裝置的剖面構造(圖13)相同的構造,省略說明。在第五實施例中,在兩個雙極電晶體行35之間配置有電晶體130(圖13),但在第六實施例中,在兩個雙極電晶體行35之間配置有射極輸出器電晶體Q3。
在俯視時,射極輸出器電晶體Q3包含在子集極層21中。在子集極層21上配置有集極層135、基極層136以及射極層137。並且,在子集極層21的上表面中的未配置集極層135的區域配置有集極電極42C。集極電極42C經由子集極層21與集極層135電連接。在射極層137上配置有射極檯面層138以及基極電極42B。基極電極42B經由在厚度方向上貫通射極層137的合金化區域與基極層136電連接。在射極檯面層138上配置有射極電極42E。射極電極42E經由射極檯面層138與射極層137電連接。
絕緣膜90覆蓋雙極電晶體30的射極電極40E、射極輸出器電晶體Q3的射極電極42E、基極電極42B以及集極電極42C。在絕緣膜90上配置有第一層的基極佈線51B、偏置輸入佈線83以及第一層的射極佈線50E。基極佈線51B經過設置於絕緣膜90的開口與基極電極40B連接。並且,基極佈線51B從與基極電極40B的連接位置朝向兩行的電晶體行35之間的區域延伸。偏置輸入佈線83經過設置於絕緣膜90的開口與射極輸出器電晶體Q3的射極電極42E連接。
絕緣膜91覆蓋第一層的射極佈線50E以及偏置輸入佈線83。絕緣膜91上方的構造與基於第五實施例的半導體裝置(圖13)的構造相同。此外,第二層的集極佈線60C在圖16所示的剖面以外的部分中以與圖13所示的連接構造相同的構造與第一層的集極佈線51C連接。
其次,對第六實施例的優異效果進行說明。
在第六實施例中,也與第一實施例的情況同樣地,厚度方向的尺寸大於集極佈線60C、51C的集極凸塊70C配置在兩行的電晶體行35之間,其俯視時的形狀在第一方向上較長。該集極凸塊70C與第二方向D2的尺寸較大的集極用焊盤201C(圖3)連接。因此,在第一方向D1上流動的集極電流的流路的厚度方向以及第二方向D2的尺寸變大。其結果為,減少集極電流的路徑的寄生電阻以及寄生電感。由此,能夠抑制雙極電晶體30的最大輸出的降低。
並且,在第六實施例中,由於在第二層的集極佈線60C下配置有功率級偏置電路114(圖11)的射極輸出器電晶體Q3以及電阻元件82,因此能夠減小在基板20中放大電路整體所占的面積。
其次,參照圖17、圖18以及圖19對根據第七實施例的半導體裝置進行說明。以下,對於與根據第一實施例的半導體裝置(圖1至圖4)相同的結構,省略說明。此外,使用基於第七實施例的半導體裝置的放大電路模組與基於第五實施例的放大電路模組同樣地也由圖11所示的等效電路圖表示。
圖17是表示基於第七實施例的半導體裝置的功率級放大電路112(圖11)以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。在第一實施例中,在兩行的電晶體行35之間的區域的大致整個區域配置有第一層的集極佈線51C(圖1)。與此相對,在第七實施例中,在兩行的電晶體行35之間的區域的一部分,除掉集極佈線51C,取而代之地配置有輸出佈線51T(第二佈線)。在比兩行的電晶體行35之間的區域靠近外側也配置有輸出佈線52T(第二佈線),輸出佈線51T與輸出佈線52T連續。在俯視時,在比兩行的電晶體行35之間的區域靠近外側配置的輸出佈線52T具有在第二方向D2上較長的形狀。
在俯視時,配置在兩行的電晶體行35之間的區域中的第二層的集極佈線60C與第一層的集極佈線51C和第一層的輸出佈線51T這兩方重疊。第二
層的集極佈線60C與第一層的集極佈線51C連接。此處,「連接」意味著「直流連接」。此外,在本說明書中,除非另有說明,「連接」意味著直流連接。在第二層的集極佈線60C與第一層的輸出佈線51T之間配置有電容器介電膜95。通過在電容器介電膜95的上下配置的第二層的集極佈線60C和第一層的輸出佈線51T構成輸出電容器125(圖11)。
以在俯視時第一層的輸出佈線52T重疊的方式配置第二層的輸出佈線60T。並且,以在俯視時與第二層的輸出佈線60T重疊的方式配置輸出凸塊70T。輸出凸塊70T(圖11)經由第二層的輸出佈線60T以及第一層的輸出佈線52T與作為輸出電容器125的下部電極發揮作用的輸出佈線51T連接。
圖18是圖17的一點鏈線18-18處的剖視圖。以下,對於與基於第一實施例的半導體裝置的剖面構造(圖2)相同的構造,省略說明。在第一實施例中,在兩個雙極電晶體行35之間的區域的大致整個區域配置有第一層的集極佈線51C。與此相對,在第七實施例中,在圖18所示的剖面中,第一層的集極佈線51C被分為兩個部分。在集極佈線51C的兩個部分之間配置有第一層的輸出佈線51T。此外,在俯視時與輸出佈線51T重疊的區域中留下以與雙極電晶體30的集極層31、基極層32以及射極層33同一步驟成膜的半導體層。
絕緣膜91覆蓋第一層的集極佈線51C、輸出佈線51T、射極佈線50E。在俯視時與輸出佈線51T重疊的區域設置有從絕緣膜91的上表面到達底面的開口94。在俯視時位於開口94的內部的輸出佈線51T的表面配置有電容器介電膜95。
在絕緣膜91以及電容器介電膜95上配置有第二層的集極佈線60C。通過夾著電容器介電膜95在上下方向上對向的集極佈線60C和輸出佈線51T構成輸出電容器125。集極佈線60C在輸出佈線51T的兩側經過設置於絕緣膜91的開口與第一層的集極佈線51C連接。並且,在絕緣膜91上配置有第二層的射
極佈線60E。第二層的射極佈線60E經過設置於絕緣膜91的開口與第一層的射極佈線50E連接。
第二層的集極佈線60C以及射極佈線60E上方的構造與基於第一實施例的半導體裝置(圖2)的構造相同。
圖19是圖17的一點鏈線19-19處的剖視圖。在元件分離區域22上留下以與雙極電晶體30的集極層31、基極層32以及射極層33(圖18)同一步驟成膜的半導體層。在該半導體層以及元件分離區域22上配置有絕緣膜90。在絕緣膜90上配置有第一層的集極佈線51C以及輸出佈線51T、52T。絕緣膜91覆蓋集極佈線51C以及輸出佈線51T、52T。
在絕緣膜91上配置有第二層的集極佈線60C以及輸出佈線60T。第二層的集極佈線60C經過設置於絕緣膜91的開口與第一層的集極佈線51C連接。並且,第二層的集極佈線60C經由配置在絕緣膜91的開口內的電容器介電膜95與第一層的輸出佈線51T對向。通過夾著電容器介電膜95在上下方向上對向的第二層的集極佈線60C以及第一層的輸出佈線51T構成輸出電容器125。
第二層的輸出佈線60T經過設置於絕緣膜91的開口與第一層的輸出佈線52T連接。以覆蓋第二層的集極佈線60C以及輸出佈線60T的方式配置絕緣膜92。在絕緣膜91上配置有集極凸塊70C以及輸出凸塊70T。集極凸塊70C經過設置於絕緣膜92的開口與第二層的集極佈線60C連接。輸出凸塊70T經過設置於絕緣膜92的開口與第二層的輸出佈線60T連接。在集極凸塊70C以及輸出凸塊70T上分別配置有焊料層75。
雙極電晶體30(圖17、圖18)的集極電極40C(圖17)經由集極引出佈線50C(圖17)、第一層的集極佈線51C、第二層的集極佈線60C、輸出電容器125、第一層的輸出佈線51T、52T、第二層的輸出佈線60T與輸出凸塊70T高頻連接。
其次,對第七實施例的優異的效果進行說明。
在第七實施例中,將集極凸塊70C配置在兩行的電晶體行35之間的區域。在圖18以及圖19中,由於從集極用焊盤201C(圖3)、集極凸塊70C的上表面供給電源電壓Vcc(圖11),因此集極電流的直流成分與第一實施例的情況同樣地大致不具有在第一方向上流動的成分。因此,能夠實現相對於集極電流的直流成分的寄生電阻以及寄生電感的減少。
在圖19中,集極電流的交流成分經過輸出凸塊70T、第二層的輸出佈線60T、第一層的輸出佈線51T、輸出電容器125、第二層的集極佈線60C、第一層的集極佈線51C。厚度方向和第二方向D2的尺寸較大的集極用焊盤201C(圖3)、以及厚度方向的尺寸較大的集極凸塊70C與在第一方向D1上流過第二層的集極佈線60C的路徑並聯連接。因此,集極電流的交流成分的路徑剖面變大。其結果為,對於集極電流的交流成分,也能夠抑制寄生電阻以及寄生電感的增大。由此,能夠抑制雙極電晶體30的最大輸出的降低。
並且,在第七實施例中,由於在半導體晶片組裝輸出電容器125,因此無需將作為輸出電容器125進行動作的單獨的電路零件構裝於構裝基板。並且,由於在俯視時,輸出電容器125與集極凸塊70C重疊,因此能夠抑制半導體晶片的尺寸的增大。
其次,參照圖20,對根據第八實施例的半導體裝置進行說明。以下,對於與基於第七實施例的半導體裝置(圖17至圖19)相同的結構,省略說明。
圖20是表示基於第八實施例的半導體裝置的功率級放大電路112(圖11)以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。在第八實施例中,代替基於第七實施例的半導體裝置的第一層的輸出佈線51T、52T(圖17),而配置在俯視時具有相同的形狀的第一層的高次諧波終端佈線51H、52H
(第三佈線)。高次諧波終端佈線51H配置在兩行的電晶體行35之間的區域,並且與其連續的高次諧波終端佈線52H配置在比兩行的電晶體行35之間的區域靠近外側。
以在俯視時與高次諧波終端佈線52H重疊的方式配置第二層的集極佈線61C。集極佈線61C與配置在兩行的電晶體行35之間的區域的第二層的集極佈線60C連續。並且,以與高次諧波終端佈線52H重疊的方式配置第二層的高次諧波終端佈線60H。
第二層的集極佈線60C與第一層的集極佈線51C直流連接。又,第二層的集極佈線60C經由包括電容器介電膜96的高次諧波終端電容器121(第二電容器)與第一層的高次諧波終端佈線51H、52H高頻連接。第二層的高次諧波終端佈線60H與第一層的高次諧波終端佈線52H直流連接。
以在俯視時與第二層的集極佈線60C、61C重疊的方式分別配置集極凸塊70C、71C。集極凸塊70C具有俯視時在第一方向D1上較長的形狀。集極凸塊70C、71C與第二層的集極佈線60C、61C連接。以與第二層的高次諧波終端佈線60H重疊的方式配置高次諧波終端凸塊70H(第三凸塊)。高次諧波終端凸塊70H與第二層的高次諧波終端佈線60H連接。
雙極電晶體30的集極電極40C經由第一層的集極引出佈線50C、集極佈線51C、第二層的集極佈線60C、61C與集極凸塊70C、71C連接。並且,集極電極40C經由第一層的集極引出佈線50C、集極佈線51C、第二層的集極佈線60C、61C、高次諧波終端電容器121、第一層的高次諧波終端佈線51H、52H以及第二層的高次諧波終端佈線60H與高次諧波終端凸塊70H高頻連接。
高次諧波終端電容器121以及高次諧波終端凸塊70H分別相當於圖11所示的高次諧波終端電容器121以及高次諧波終端凸塊70H。將電源電壓Vcc經由電感器154(圖11)施加至集極凸塊70C、71C。並且,將從集極凸塊70C、
71C輸出的高頻訊號經由構裝於構裝基板的輸出電容器125以及輸出側阻抗匹配電路152(圖11)輸出至外部設備。
其次,對第八實施例的優異效果進行說明。在第八實施例中,也在將厚度方向的尺寸較大的集極凸塊70C配置在兩行的電晶體行35之間的區域,並與厚度方向以及第二方向D2的尺寸較大的集極用焊盤201C(圖3)連接。因此,在第一方向D1上流動的集極電流的流路的厚度方向以及第二方向D2的尺寸變大。由此,與第一實施例的情況同樣地能夠減少集極電流的路徑的寄生電阻以及寄生電感。其結果為,獲得抑制雙極電晶體30的最大輸出的降低這樣的優異效果。
並且,在第八實施例中,由於在半導體晶片內組裝高次諧波終端電容器121,因此不需要將高次諧波終端電容器121作為單獨的電路零件而構裝於構裝基板。並且,由於以與在俯視時集極佈線60C、61C重疊的方式配置高次諧波終端電容器121,因此抑制半導體晶片的尺寸的增大。
其次,參照圖21、圖22,對搭載基於第九實施例的半導體裝置的放大電路模組進行說明。以下,對於與基於第二實施例(圖8)的半導體裝置相同的結構,省略說明。
圖21是表示基於第九實施例的半導體裝置的功率級放大電路112(圖11)以及其周邊電路的複數個構成要素的俯視時的位置關係的圖。在第二實施例中,配置在兩行的電晶體行35之間的區域中的第二層的集極佈線60C(圖8)與配置在該區域的外側的第二層的集極佈線61C(圖8)連續。與此相對,在第九實施例中,在兩行的電晶體行35之間的區域中,代替集極佈線60C而配置有第二層的輸出佈線60T。該輸出佈線60T收斂至兩行的電晶體行35之間的區域內。將第二層的集極佈線61C配置在俯視時與第一層的集極佈線52C重疊的位置。
在第一層的集極佈線51C與第二層的輸出佈線60T之間配置有電容器介電膜97。通過夾著電容器介電膜97而對向的第一層的集極佈線51C和第二層的輸出佈線60T構成輸出電容器125(第一電容器)。第二層的集極佈線61C與第一層的集極佈線52C直流連接。
以在俯視時與第二層的集極佈線61C重疊的方式配置集極凸塊71C。集極凸塊71C經由第二層的集極佈線61C、第一層的集極佈線52C、51C以及集極引出佈線50C與雙極電晶體30的集極電極40C直流連接。
以在俯視時與第二層的輸出佈線60T重疊的方式配置輸出凸塊71T(第四凸塊)。輸出凸塊71T經由第二層的輸出佈線60T、輸出電容器125、第一層的集極佈線51C以及集極引出佈線50C與雙極電晶體30的集極電極40C高頻連接。
圖22是圖21的一點鏈線22-22處的剖視圖。將包括圖21所示的功率級放大電路112的半導體晶片100倒裝構裝於構裝基板210。在構裝基板210的構裝面設置有輸出用焊盤211以及集極用焊盤212。半導體晶片100的輸出凸塊71T以及集極凸塊71C分別經由焊料層75與輸出用焊盤211以及集極用焊盤212連接。
構裝基板210包括配置在內層的複數個佈線216、電感器129以及配置在與構裝面相反側的面(下表面)的接地平面219。複數個通孔導體215在厚度方向上連接複數個導體層。輸出用焊盤211經由複數個通孔導體215以及佈線216與電感器129連接。連接輸出用焊盤211和電感器129的通孔導體215具有俯視時在一個方向上較長的形狀。這樣的通孔導體有時被稱為長徑通孔。
電感器129經由通孔導體215與接地平面219連接。即,輸出用焊盤211經由電感器129接地。電感器129被配置為在俯視時與輸出用焊盤211重疊。又,在將半導體晶片構裝在構裝基板210上的狀態下,電感器129在俯視時與輸出
凸塊71T以及輸出電容器125重疊。
輸出電容器125、輸出凸塊71T以及電感器129分別相當於圖11所示的等效電路圖的輸出電容器125、輸出凸塊71T以及電感器129。
其次,對第九實施例的優異效果進行說明。在第九實施例中,在半導體晶片100內組裝輸出電容器125,並且將電感器129配置在構裝基板210的內層。因此,無需將作為輸出電容器125以及電感器129發揮作用的單獨的電路零件構裝於構裝基板210。並且,在第九實施例中,以在俯視時與輸出用焊盤211或輸出凸塊71T重疊的方式配置輸出電容器125以及電感器129,因此能夠減小放大電路模組的俯視時的專有面積。
其次,對第九實施例的變形例進行說明。
在第九實施例中,在構裝基板210的內層配置有電感器129,但也可以除了電感器以外還配置電容器,也可以配置電感器以及電容器兩方。換言之,也可以將具有電感以及電容的至少一者的無源元件配置在內層。該情況下,在俯視時與半導體晶片的凸塊連接的構裝基板側的焊盤和無源元件被配置為在俯視時重疊。
上述的各實施例是例示的,當然可進行不同的實施例所示的結構的局部置換或組合。對於基於複數個實施例的同樣的結構的同樣的作用效果,在每個實施例中沒有依次提及。並且,本發明並不限於上述的實施例。例如能夠進行各種變更、改進、組合等,這對於本發明所屬技術領域中具有通常知識者來說是顯而易見的。
30:雙極電晶體
31:集極層
32:基極層
33:射極層
35:電晶體行
40B:基極電極
40C:集極電極
40E:射極電極
50B:第一層的基極佈線
50C:第一層的集極引出佈線
50E:第一層的射極佈線
51C:第一層的集極佈線(第一佈線)
60C:第二層的集極佈線
60E:第二層的射極佈線
70C:集極凸塊(第一凸塊)
70E:射極凸塊
80:輸入電容器
81:電容器下部電極
82:電阻元件
83:偏置輸入佈線
88:高頻訊號輸入佈線
D1:第一方向
D2:第二方向
Claims (9)
- 一種半導體裝置,具備:基板;以及設置在上述基板的兩行的電晶體行;上述兩行的電晶體行的各個由在第一方向上排列的複數個電晶體構成,上述兩行的電晶體行在與上述第一方向正交的第二方向上隔開間隔配置,上述半導體裝置還具有:第一佈線,在俯視時被配置在上述兩行的電晶體行之間所夾的區域,並與上述兩行的電晶體行的上述複數個電晶體的集極或者汲極連接;以及至少一個第一凸塊,在俯視時與上述第一佈線重疊,並且被配置在上述兩行的電晶體行之間所夾的區域,並與上述第一佈線連接。
- 如請求項1所述的半導體裝置,其中,上述第一凸塊具有俯視時在上述第一方向上較長的形狀。
- 如請求項1或2所述的半導體裝置,其中,在俯視時,上述第一佈線在上述第一方向的至少一側擴展到夾在上述兩行的電晶體行的區域的外側,擴展的部分在上述第二方向上延伸,上述半導體裝置還具有其它的第一凸塊,在俯視時上述其它的第一凸塊與上述擴展的部分重疊,並與上述擴展的部分連接。
- 如請求項1或2所述的半導體裝置,其中,配置有複數個上述至少一個第一凸塊,上述複數個第一凸塊的各個具有俯視時在上述第一方向上較長的形狀,並在上述第二方向上隔開間隔配置。
- 如請求項1或2所述的半導體裝置,其還包括從由電晶體、二極體、電阻元件、電容器、電感器構成的組中選擇出的至少一個元件,在俯視時,上述至少一個元件配置在上述兩行的電晶體行之間所夾的區域且比上述第一凸 塊靠近上述基板側。
- 如請求項1或2所述的半導體裝置,其還具有:第二佈線,被配置在與上述第一佈線相同的佈線層,在俯視時,一部分配置在上述兩行的電晶體行之間所夾的區域,與上述第一凸塊部分地重疊,剩餘的部分擴展到上述兩行的電晶體行之間所夾的區域的外側;第一電容器,被配置在上述第二佈線與上述第一凸塊俯視時重疊的區域;以及第二凸塊,與上述第二佈線直流連接。
- 如請求項1所述的半導體裝置,其還具有:第三佈線,被配置在與上述第一佈線相同的佈線層,在俯視時,一部分配置在上述兩行的電晶體行之間所夾的區域,並與上述第一凸塊部分地重疊,剩餘的部分擴展到上述兩行的電晶體行之間所夾的區域的外側;第二電容器,被配置在與上述第三佈線俯視時重疊的位置,並連接上述第一凸塊與上述第三佈線;以及第三凸塊,被配置在與上述第三佈線俯視時重疊的位置,並與上述第三佈線連接。
- 如請求項1或2所述的半導體裝置,其還具有:構裝基板,構裝有包括上述基板的半導體晶片;焊盤,被設置在上述構裝基板的與上述半導體晶片對向的面,並與上述第一凸塊連接;以及無源元件,被設置在上述構裝基板的內層,並具有配置於俯視時與上述焊盤部分地重疊的位置之電容以及電感的至少一者。
- 一種半導體裝置,具備:基板;以及 設置在上述基板的兩行的電晶體行;上述兩行的電晶體行的各個由在第一方向上排列的複數個電晶體構成,並在與上述第一方向正交的第二方向上隔開間隔配置,上述半導體裝置還具有:第一佈線,在俯視時,被配置在上述兩行的電晶體行之間所夾的區域,並與上述兩行的電晶體行的上述複數個電晶體的集極或者汲極連接;至少一個第四凸塊,在俯視時,與上述第一佈線重疊,且被配置在上述兩行的電晶體行之間所夾的區域,與上述第一佈線連接;第一電容器,包括配置在上述第四凸塊與上述第一佈線之間的電容器介電膜,並連接上述第四凸塊與上述第一佈線;構裝基板,構裝有包括上述基板的半導體晶片;焊盤,被設置在上述構裝基板的與上述半導體晶片對向的面,並與上述第四凸塊連接;接地平面,被設置在上述構裝基板;以及電感器,被設置在上述構裝基板,且連接上述焊盤與上述接地平面,並被配置在與上述焊盤俯視時部分地重疊的位置。
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