TWI764885B - 保護膜形成用複合片 - Google Patents

保護膜形成用複合片 Download PDF

Info

Publication number
TWI764885B
TWI764885B TW106104893A TW106104893A TWI764885B TW I764885 B TWI764885 B TW I764885B TW 106104893 A TW106104893 A TW 106104893A TW 106104893 A TW106104893 A TW 106104893A TW I764885 B TWI764885 B TW I764885B
Authority
TW
Taiwan
Prior art keywords
protective film
forming
film
meth
acrylate
Prior art date
Application number
TW106104893A
Other languages
English (en)
Chinese (zh)
Other versions
TW201801916A (zh
Inventor
佐伯尚哉
佐佐木遼
米山裕之
山本大輔
Original Assignee
日商琳得科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商琳得科股份有限公司 filed Critical 日商琳得科股份有限公司
Publication of TW201801916A publication Critical patent/TW201801916A/zh
Application granted granted Critical
Publication of TWI764885B publication Critical patent/TWI764885B/zh

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B33/00Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/10Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/26Polymeric coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/406Bright, glossy, shiny surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/748Releasability
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Dicing (AREA)
  • Adhesive Tapes (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
TW106104893A 2016-03-04 2017-02-15 保護膜形成用複合片 TWI764885B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-042690 2016-03-04
JP2016042690 2016-03-04

Publications (2)

Publication Number Publication Date
TW201801916A TW201801916A (zh) 2018-01-16
TWI764885B true TWI764885B (zh) 2022-05-21

Family

ID=59742786

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106104893A TWI764885B (zh) 2016-03-04 2017-02-15 保護膜形成用複合片

Country Status (6)

Country Link
JP (1) JP6818009B2 (fr)
KR (1) KR20180120173A (fr)
CN (2) CN117656639A (fr)
SG (1) SG11201807452UA (fr)
TW (1) TWI764885B (fr)
WO (1) WO2017150145A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020116284A1 (fr) * 2018-12-05 2020-06-11 リンテック株式会社 Feuille composite de formation de film de protection et procédé de fabrication d'une puce semi-conductrice
WO2022210690A1 (fr) * 2021-03-31 2022-10-06 積水ポリマテック株式会社 Composition filmogène, film, feuille de circuit et feuille de capteur

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201213486A (en) * 2010-07-30 2012-04-01 Nitto Denko Corp Dicing tape-integrated film for semiconductor back surface and method for producing the film, and method for producing semiconductor device
CN105009277A (zh) * 2013-03-19 2015-10-28 琳得科株式会社 保护膜形成用膜

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002068192A1 (fr) * 2001-02-26 2002-09-06 Trespaphan Gmbh Stratifie pouvant etre marque au laser
JP4762671B2 (ja) * 2005-10-26 2011-08-31 古河電気工業株式会社 ダイシングテープ、および半導体ウェハダイシング方法
KR101035297B1 (ko) * 2006-09-27 2011-05-19 후지쯔 세미컨덕터 가부시키가이샤 반도체 장치의 제조 방법
JP5391158B2 (ja) * 2010-06-30 2014-01-15 古河電気工業株式会社 ウエハ貼着用粘着シートおよびそれを用いたウエハの加工方法
JP5583724B2 (ja) * 2012-09-20 2014-09-03 リンテック株式会社 レーザーダイシングシート−剥離シート積層体、レーザーダイシングシートおよびチップ体の製造方法
JP6059499B2 (ja) * 2012-10-05 2017-01-11 リンテック株式会社 表面保護シート
JP6104925B2 (ja) * 2012-10-05 2017-03-29 リンテック株式会社 保護膜形成層付ダイシングシートおよびチップの製造方法
JPWO2014155756A1 (ja) * 2013-03-26 2017-02-16 リンテック株式会社 粘着シートおよび保護膜形成用複合シートならびに保護膜付きチップの製造方法
JP6405556B2 (ja) * 2013-07-31 2018-10-17 リンテック株式会社 保護膜形成フィルム、保護膜形成用シートおよび検査方法
WO2015146936A1 (fr) * 2014-03-24 2015-10-01 リンテック株式会社 Pellicule formant une membrane de protection, feuille d'utilisation formant une membrane de protection, procédé de production et procédé d'inspection pour pièce à usiner ou produit transformé, pièce à usiner déterminée comme étant un produit adéquat et produit transformé déterminé comme étant un produit adéquat
JP6334223B2 (ja) * 2014-03-26 2018-05-30 リンテック株式会社 粘着シート
JP5823591B1 (ja) * 2014-10-01 2015-11-25 古河電気工業株式会社 半導体ウエハ表面保護用粘着テープおよび半導体ウエハの加工方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201213486A (en) * 2010-07-30 2012-04-01 Nitto Denko Corp Dicing tape-integrated film for semiconductor back surface and method for producing the film, and method for producing semiconductor device
CN105009277A (zh) * 2013-03-19 2015-10-28 琳得科株式会社 保护膜形成用膜

Also Published As

Publication number Publication date
CN108778722A (zh) 2018-11-09
TW201801916A (zh) 2018-01-16
KR20180120173A (ko) 2018-11-05
JPWO2017150145A1 (ja) 2018-12-27
JP6818009B2 (ja) 2021-01-20
SG11201807452UA (en) 2018-09-27
CN117656639A (zh) 2024-03-08
WO2017150145A1 (fr) 2017-09-08

Similar Documents

Publication Publication Date Title
TWI761335B (zh) 支撐片及保護膜形成用複合片
WO2018179475A1 (fr) Feuille composite de formation de film de protection
JP6298226B1 (ja) 保護膜形成用複合シート
TW201702072A (zh) 樹脂膜形成用複合薄片、及附樹脂膜之晶片之製造方法
TWI758276B (zh) 保護膜形成用片、保護膜形成用片的製造方法及半導體裝置的製造方法
TWI764885B (zh) 保護膜形成用複合片
TW202106502A (zh) 保護膜形成用複合片
TWI731874B (zh) 保護膜形成用複合片
KR102519799B1 (ko) 지지 시트 및 보호막 형성용 복합 시트
TWI790400B (zh) 保護膜形成用膜、保護膜形成用複合片、檢查方法以及辨識方法
JP7478524B2 (ja) 保護膜形成用フィルム、保護膜形成用複合シート、及び保護膜付きワーク加工物の製造方法
TWI783920B (zh) 保護膜形成用複合片
JP7497297B2 (ja) 保護膜形成用複合シート、及び半導体チップの製造方法
JPWO2019186994A1 (ja) 保護膜形成用複合シート及びその製造方法
CN111373509A (zh) 支撑片及保护膜形成用复合片
KR102534931B1 (ko) 지지 시트 및 보호막 형성용 복합 시트