TWI754077B - 電漿處理裝置 - Google Patents
電漿處理裝置 Download PDFInfo
- Publication number
- TWI754077B TWI754077B TW107121413A TW107121413A TWI754077B TW I754077 B TWI754077 B TW I754077B TW 107121413 A TW107121413 A TW 107121413A TW 107121413 A TW107121413 A TW 107121413A TW I754077 B TWI754077 B TW I754077B
- Authority
- TW
- Taiwan
- Prior art keywords
- electrode
- substrate
- plasma processing
- processing apparatus
- electrode portion
- Prior art date
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017-133016 | 2017-07-06 | ||
JP2017133016A JP6969182B2 (ja) | 2017-07-06 | 2017-07-06 | プラズマ処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201921483A TW201921483A (zh) | 2019-06-01 |
TWI754077B true TWI754077B (zh) | 2022-02-01 |
Family
ID=64989932
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107121413A TWI754077B (zh) | 2017-07-06 | 2018-06-22 | 電漿處理裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6969182B2 (ja) |
KR (1) | KR102121655B1 (ja) |
CN (1) | CN109216148B (ja) |
TW (1) | TWI754077B (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020093058A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093042A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093057A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093036A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093054A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093059A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093060A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093055A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093047A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093056A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093041A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093043A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093046A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
JP2020093037A (ja) * | 2018-12-12 | 2020-06-18 | 株式会社三洋物産 | 遊技機 |
KR20210115025A (ko) * | 2019-03-01 | 2021-09-24 | 닛폰 하츠죠 가부시키가이샤 | 스테이지 및 스테이지 제작 방법 |
CN112017936B (zh) * | 2019-05-28 | 2024-05-31 | 东京毅力科创株式会社 | 等离子体处理装置 |
KR102524433B1 (ko) * | 2019-11-27 | 2023-04-24 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | 활성 가스 생성 장치 |
WO2022054481A1 (ja) * | 2020-09-08 | 2022-03-17 | 日本発條株式会社 | ステージおよびその作製方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101609779A (zh) * | 2008-06-19 | 2009-12-23 | 东京毅力科创株式会社 | 聚焦环以及等离子体处理装置 |
CN105097405A (zh) * | 2014-05-12 | 2015-11-25 | 东京毅力科创株式会社 | 等离子体处理装置和应用于等离子体处理装置的排气构造 |
KR20160091210A (ko) * | 2015-01-22 | 2016-08-02 | 주식회사 원익아이피에스 | 기판지지대 및 그가 설치된 기판처리장치 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0730468A (ja) | 1993-07-15 | 1995-01-31 | Hitachi Ltd | フィールドバスの受信方式 |
US6039836A (en) * | 1997-12-19 | 2000-03-21 | Lam Research Corporation | Focus rings |
JP2001196309A (ja) * | 2000-01-06 | 2001-07-19 | Hitachi Ltd | プラズマ処理装置 |
JP4421874B2 (ja) * | 2003-10-31 | 2010-02-24 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP4361045B2 (ja) | 2005-10-12 | 2009-11-11 | パナソニック株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP5094307B2 (ja) * | 2007-09-25 | 2012-12-12 | 株式会社アルバック | プラズマ処理装置 |
KR101171422B1 (ko) * | 2008-06-19 | 2012-08-06 | 도쿄엘렉트론가부시키가이샤 | 포커스 링 및 플라즈마 처리 장치 |
JP5539436B2 (ja) * | 2012-04-26 | 2014-07-02 | パナソニック株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP6377975B2 (ja) * | 2014-06-23 | 2018-08-22 | 新光電気工業株式会社 | 基板固定装置 |
JP6540022B2 (ja) * | 2014-12-26 | 2019-07-10 | 東京エレクトロン株式会社 | 載置台及びプラズマ処理装置 |
JP6578215B2 (ja) * | 2015-04-03 | 2019-09-18 | 株式会社ジャパンディスプレイ | プラズマ処理装置、シールドリング、及び、シールドリング用部材 |
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2017
- 2017-07-06 JP JP2017133016A patent/JP6969182B2/ja active Active
-
2018
- 2018-06-22 TW TW107121413A patent/TWI754077B/zh active
- 2018-07-03 KR KR1020180076974A patent/KR102121655B1/ko active IP Right Grant
- 2018-07-06 CN CN201810735553.XA patent/CN109216148B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101609779A (zh) * | 2008-06-19 | 2009-12-23 | 东京毅力科创株式会社 | 聚焦环以及等离子体处理装置 |
CN105097405A (zh) * | 2014-05-12 | 2015-11-25 | 东京毅力科创株式会社 | 等离子体处理装置和应用于等离子体处理装置的排气构造 |
KR20160091210A (ko) * | 2015-01-22 | 2016-08-02 | 주식회사 원익아이피에스 | 기판지지대 및 그가 설치된 기판처리장치 |
Also Published As
Publication number | Publication date |
---|---|
KR102121655B1 (ko) | 2020-06-10 |
JP6969182B2 (ja) | 2021-11-24 |
CN109216148A (zh) | 2019-01-15 |
KR20190005750A (ko) | 2019-01-16 |
CN109216148B (zh) | 2021-01-19 |
TW201921483A (zh) | 2019-06-01 |
JP2019016697A (ja) | 2019-01-31 |
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