TWI750418B - Display device and manufacturing method thereof - Google Patents

Abstract

A display device and a manufacturing method thereof are provided. The manufacturing method of display device includes following steps. A plurality of spacers are formed on a first substrate. A photosensitive material layer covering the spacers is formed on the first substrate. An exposure process is performed on the photosensitive material layer by patterned mask, wherein a light for the exposure process is irradiated to the top surface or the bottom surface of each spacers, and the light is irradiated to the photosensitive material layer on the sidewalls of each spacers from the inner portion of each spacers. The photosensitive material layer not irradiated by the light is removed by a development, so as to form a surface modification layer on the top surface and the sidewalls of each spacers. A second substrate is formed on the surface modification layer, wherein one of the first and second substrates includes a pixel array.

Description

Display and method of manufacturing the same

The present invention relates to a display and a method of manufacturing the same, and more particularly, to a display including a photospacer and a method of manufacturing the same.

With the advancement of technology, light, thin, short and small flat panel displays (Flat Panel Display, FPD) gradually replace the traditional thick cathode picture tube display (Cathode Ray Tube, CRT). For example, flat panel displays that have been developed may include liquid crystal displays (LCDs), organic light emitting displays (OLEDs), electrophoretic displays (EPDs), and the like.

Generally, the above-mentioned displays usually include a black matrix to prevent light leakage between pixels and to increase color contrast. However, since the black matrix is usually formed by photolithography using a photosensitive material, when its height needs to reach a certain level, such as a black photoresist spacer (BPS) or a black column spacer (black column spacer, BCS), it is easy to cause the problem of poor alignment or easy peeling of the mask, which in turn results in poor stability of the display.

The present invention provides a display and a manufacturing method thereof, one of the objects of which can have good stability.

A method for manufacturing a display according to an embodiment of the present invention includes the following steps. A plurality of spacers are formed on the first substrate. A photosensitive material layer covering the spacers is formed on the first substrate. The photosensitive material layer is subjected to an exposure process through a patterned mask, wherein the light used in the exposure process is irradiated to the top surface or the bottom surface of each spacer, and the light can be irradiated from the inside of each spacer to each spacer through each spacer. A layer of photosensitive material on the sidewalls of the spacers. After the exposure process is performed on the photosensitive material layer, the photosensitive material layer not exposed to light is removed by a development process, so as to form a surface modification layer on the top surface and sidewalls of each spacer. A second substrate is covered on the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

A method for manufacturing a display according to another embodiment of the present invention includes the following steps. A plurality of spacers are formed on the first substrate. A light-shielding material layer covering the spacers is formed on the first substrate. A photosensitive material layer covering the light-shielding material layer and the spacer is formed on the first substrate. performing an exposure process and a development process on the photosensitive material layer through the patterned mask to form a surface modification layer on each of the spacers, wherein the surface modification layer is formed on the light-shielding material layer covering the top surface and sidewalls of each spacer, And the surface modification layer exposes part of the light-shielding material layer. removing part of the light-shielding material layer exposed by the surface modification layer to form a light-shielding layer, wherein the light-shielding layer is formed between each spacer and the surface modification layer, and the light-shielding layer covers the top surface and sidewall of each spacer and extends to the first between the substrate and the surface modification layer.

A method for manufacturing a display according to another embodiment of the present invention includes the following steps. An inorganic material layer is formed on the first substrate. A plurality of organic spacers are formed on the inorganic material layer. A material layer covering the organic spacers is formed on the inorganic material layer. A modified process is performed so that a thermal crosslinking reaction or a redox reaction occurs between a part of the material layer and the organic spacer. After the modification process, the part of the material layer that has not undergone thermal crosslinking reaction or redox reaction with the organic spacers is removed by a developing process, so as to form a surface modification layer on the top surface and sidewall of each organic spacer . A second substrate is covered on the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

A display according to an embodiment of the present invention includes a first substrate, a plurality of spacers, a plurality of surface modification layers, and a second substrate. The spacer is disposed on the first substrate, wherein the spacer can allow at least part of blue light and at least part of ultraviolet light to pass through. The surface modification layer covers the top surface and the side wall of each spacer respectively, wherein the visible light transmittance of the surface modification layer is less than or equal to 20%. The second substrate covers the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

A display of another embodiment of the present invention includes a first substrate, a plurality of spacers, a plurality of surface modification layers, a plurality of light shielding layers, and a second substrate. The spacer is disposed on the first substrate, wherein the spacer can allow at least part of blue light and at least part of ultraviolet light to pass through. The surface modification layer covers the top surface and the sidewall of each spacer, respectively. The light shielding layers are respectively disposed between the spacers and the surface modification layers, wherein the light shielding layers cover the top surfaces and sidewalls of each spacer and extend between the first substrate and the surface modification layers. The second substrate covers the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

A display of yet another embodiment of the present invention includes a first substrate, a plurality of spacers, a plurality of surface modification layers, and a second substrate. The spacer is disposed on the first substrate, wherein the spacer can allow at least part of blue light and at least part of ultraviolet light to pass through. The surface modification layer covers the top surface and the sidewall of each spacer respectively, wherein the spacer and the surface modification layer have a visible light transmittance of less than or equal to 5% at the overlapping portion. The second substrate covers the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

Based on the above, in the method for manufacturing a display provided by at least one embodiment of the present invention, since the light used in the exposure process can pass through each spacer and irradiate from the inside of each spacer to the photosensitive material on the sidewall of each spacer In this way, the light can be well irradiated to the part to be exposed in the photosensitive material layer, so that the cross-linking reaction is complete, so as to avoid the problem of peeling off of the surface modification layer formed later, so that the display has good stability.

In the method for manufacturing a display provided by at least one embodiment of the present invention, the material layer is formed on the inorganic material layer and covers the organic spacer. Redox reaction, so that the surface modification layer formed by the subsequent development process is not easy to peel off, so that the display has good stability.

In the display and the manufacturing method thereof provided by at least one embodiment of the present invention, since the light shielding layer is formed between each spacer and the surface modification layer, and the light shielding layer covers the top surface and sidewall of each spacer and extends to the first Between the substrate and some surface modification layers, the phenomenon of light leakage between pixels can be avoided, so that the display has good stability.

In the display provided by at least one embodiment of the present invention, the surface modification layer covers the top surface and the sidewall of each spacer respectively, wherein the visible light transmittance of the surface modification layer is less than or equal to 20%, so as to avoid generation between pixels The phenomenon of light leakage makes the display have good stability.

In the display provided by at least one embodiment of the present invention, since the surface modification layer covers the top surface and sidewall of each spacer respectively, the spacer and the surface modification layer in the overlapping portion have a visible light transmission rate of less than or equal to 5% Transmittance, so that the phenomenon of light leakage between pixels can be avoided, so that the display has good stability.

In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.

100: Monitor

S1, S11: the first substrate

S2: Second substrate

SB1, SB2: Substrate

PS: Spacer

OPS: Organic Spacer

CE: Color Conversion Layer

AM: registration mark

PL: flat layer

IOPL: inorganic material layer

PM: photosensitive material layer

ML: Material Layer

MS: Patterned Mask

SML1, SML2, SML3: Surface modification layers

PX: pixel array

BM: black matrix

LSM: light-shielding material layer

LS: shading layer

T: height

L: light

MP: Modified Process

P: Particles

1A to 1D are schematic cross-sectional views of a method for manufacturing a display according to an embodiment of the present invention.

2A and 2B are schematic cross-sectional views of a method for manufacturing a display according to another embodiment of the present invention.

3A to 3C are schematic cross-sectional views of a method for manufacturing a display according to still another embodiment of the present invention.

4A and 4B are schematic cross-sectional views of a method for manufacturing a display according to still another embodiment of the present invention.

5 is a schematic cross-sectional view of a display according to an embodiment of the present invention.

The present invention will be more fully described below with reference to the drawings of this embodiment. However, the present invention may be embodied in various forms and should not be limited to the embodiments described herein. In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. The same reference numerals refer to the same elements throughout the specification. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may refer to the existence of other elements between the two elements.

As used herein, "about", "approximately", or "substantially" includes the stated value and the average value within an acceptable deviation of the particular value as determined by one of ordinary skill in the art, considering the measurement in question and the A specified amount of measurement-related error (ie, a limitation of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Furthermore, as used herein, "about", "approximately" or "substantially" may be used to select a more acceptable range of deviation or standard deviation depending on optical properties, etching properties or other properties, and not one standard deviation may apply to all properties. .

Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries They should be construed as having meanings that are consistent with their meanings in the context of the related art and the present invention, and are not to be construed in an idealized or overly formal sense unless explicitly defined as such herein.

1A to 1D are schematic cross-sectional views of a method for manufacturing a display according to an embodiment of the present invention. 5 is a schematic cross-sectional view of a display according to an embodiment of the present invention.

Referring to FIG. 1A , a plurality of spacers PS are formed on the first substrate S1 . The first substrate S1 may be an active array substrate, a color conversion substrate, or a combination thereof. For example, the first substrate S1 may include a pixel array, a color conversion layer, or a combination thereof. In this embodiment, the first substrate S1 is described by taking a color conversion substrate as an example, that is, the first substrate S1 may include at least one color conversion layer CE. As shown in FIG. 1A , the first substrate S1 may include a substrate SB1 and a plurality of color conversion layers CE formed on the substrate SB1 . The substrate SB1 may include a glass substrate, a quartz substrate, an organic polymer substrate, or a combination thereof. The color conversion layer CE may be a color filter layer, a wavelength conversion layer, or a combination thereof. The color filter layer is, for example, a red color resist, a green color resist, a blue color resist, or a combination thereof. The wavelength conversion layer is, for example, a red fluorescent material, a red phosphorescent material, a red quantum dot material, a green fluorescent material, a green phosphorescent material, a green quantum dot material, a blue fluorescent material, a blue phosphorescent material, a blue quantum dot material or its combination. However, it is not limited to this, and can be adjusted according to actual needs. In some embodiments, the color conversion layer CE may be disposed between two adjacent spacers PS.

In some embodiments, the first substrate S1 may further include an alignment mark AM to ensure the alignment accuracy of the patterned mask MS used in the subsequent exposure process. For example, one of the spacers PS can be formed On top of the alignment mark AM and overlapping with the alignment mark AM, the spacer PS overlapping the alignment mark AM can be regarded as an extension of the alignment mark AM to improve the film on which the alignment mark AM is located. The problem of reduced alignment accuracy due to layer coverage.

In some embodiments, the first substrate S1 may further include a flat layer PL covering the color conversion layer CE and the substrate SB1. The material of the flat layer PL may be an organic insulating material, an inorganic insulating material or a combination thereof. For example, the organic insulating material can be polyimide (PI), polyamic acid (PAA), polyamide (PA), polyvinyl alcohol (PVA), polyamide Vinyl cinnamate (polyvinyl cinnamate, PVCi), poly(methyl methacrylate) or other suitable photoresist materials or combinations thereof. The inorganic insulating material may be silicon oxide, silicon nitride, silicon oxynitride, siloxane, or a combination thereof.

The spacers PS can be formed through the following steps: first, for example, a spacer material layer (not shown) is formed on the first substrate S1 by spin coating; then, the above-mentioned spacers are patterned by lithography material layer to form the spacer PS, but the present invention is not limited to this. The material of the spacer PS may be an organic photoresist material. The height T of the spacer PS may be greater than or equal to 15 μm. In some embodiments, the spacer PS is capable of allowing at least a portion of the blue light and at least a portion of the ultraviolet light to pass therethrough.

Referring to FIG. 1B , a photosensitive material layer PM covering the spacers PS is formed on the first substrate S1 . The material of the photosensitive material layer PM may be an organic material, an inorganic material or a combination thereof. The method of forming the photosensitive material layer PM is, for example, a spin coating method. In some embodiments, the visible light transmittance of the photosensitive material layer PM may be less than or equal to 20%.

Next, an exposure process is performed on the photosensitive material PM layer through the patterned mask MS, wherein the light L used in the exposure process is irradiated to the top surface TS or the bottom surface BS of each spacer PS, and the light L can pass through the spacer PS , irradiate from the inside of each spacer PS to the photosensitive material layer PM located on the sidewall SW of the spacer PS (that is, from the top view point of view, the patterned mask MS only exposes the photosensitive material layer PM located on the sidewall SW of each spacer PS The photosensitive material layer PM on the top surface TS does not expose the photosensitive material layer PM on the sidewalls of each spacer PS, as shown in FIG. 1B ). In this way, even if the photosensitive material layer PM has a certain thickness (for example, greater than the height T of the spacer PS), the light L can still be well irradiated to the photosensitive material layer PM (that is, the photosensitive material layer PM) covering the surface of the spacer PS. The part to be exposed in the middle), so that the cross-linking reaction is complete, so as to avoid the problem of peeling or undercut of the surface modification layer formed later, so that the display has good stability.

In some embodiments, before performing the exposure process, a pre-treatment process may be selectively performed on the photosensitive material layer PM, wherein the pre-treatment process may include a baking process, a vacuum drying process or a combination thereof. For example, pre-bake and/or vacuum drying can be performed on the unexposed photosensitive material layer PM, so that the outline of the photosensitive material layer PM after the pretreatment process is consistent with the spacer PS and the first substrate S1 The contours formed by the surface are more similar, so that the effect of the subsequent exposure process is better.

In some embodiments, a plurality of particles P can be selectively formed in each spacer PS (only an example is shown in FIG. 1D ), so that the light L used in the exposure process can be more uniformly emitted from each spacer PS. The interior is irradiated to the photosensitive material layer PM located on the sidewall SW of the spacer PS.

Please refer to FIG. 1B and FIG. 1C at the same time, after the exposure process is performed on the photosensitive material layer PM, the photosensitive material layer PM that is not exposed to the light L is removed by the development process, so that the top surface of each spacer PS is removed. The TS and the sidewalls SW form a surface modification layer SML1. The visible light transmittance of the surface modification layer SML1 is less than or equal to 20%, which can prevent light leakage between pixels. In addition, since the aforementioned exposure process can improve the difficulty in transmitting the light L to the portion of the photosensitive material layer PM adjacent to the first substrate S1 (ie, the exposure depth is deep), the surface modification layer SML1 formed after the development process and The first substrate S1 and the spacer PS have good adhesion, so that the surface modification layer SML1 is less likely to be peeled off or undercut, so that the display has good stability. That is, since the light L used in the exposure process can pass through the spacer PS and irradiate from the inside of the spacer PS to the photosensitive material layer PM located on the sidewall of the spacer PS. In this way, even if the photosensitive material layer PM has a certain thickness, the light L can still be well irradiated to the photosensitive material layer PM covering the surface of the spacer PS, so that the cross-linking reaction is complete, so as to avoid the surface formed by the development process. The modification layer SML1 is prone to peel off or undercut, so that the display 100 has good stability.

In some embodiments, after the developing process, a post-bake process can be selectively performed on the surface modification layer SML1 to further remove the remaining moisture and solvent, so as to improve the adhesion of the surface modification layer SML1 better.

In some embodiments, the spacer PS can allow at least part of the blue light and part of the ultraviolet light to pass, and the overlapping part of the spacer PS and the surface modification layer SML1 has a visible light transmittance of less than or equal to 5%. For example, the spacer PS and the surface One of the modification layers SML1 can be a blue color resist, and the other of the spacer PS and the surface modification layer SML1 can be a red color resist or a yellow color resist. In this way, visible light is blocked when passing through the spacer PS (eg, blue color resist) and the surface modification layer SML1 (eg, red or yellow color resist), that is, blue color resist and red color resist (or blue color resist) The combination of photoresist and yellow color resist) can have a similar effect as black photoresist spacer (BPS). In other embodiments, one of the spacer PS and the surface modification layer SML1 may be a magenta color resist, and the other of the spacer PS and the surface modification layer SML1 may be a green color resist. In this way, visible light is blocked when passing through the spacer PS (such as the magenta color resist) and the surface modification layer SML1 (such as the green color resist), that is, the combination of the magenta color resist and the green color resist can have black color. The efficacy of photoresist spacers (BPS). Based on the above, the effect of the black photoresist spacer (BPS) is achieved by the combination of the spacer PS and the surface modification layer SML1 with different color resist materials, so that the material selection of the photosensitive material layer PM does not need to be limited to low visible light penetration The ratio of the material (for example, less than or equal to 20%), so that in the exposure process, the light L can be well irradiated to the photosensitive material layer PM covering the surface of the spacer PS, so that the cross-linking reaction is complete, so as to avoid the subsequent development process. The formed surface modification layer SML1 is prone to peel off or undercut, so that the display 100 has good stability. In this embodiment, the spacer PS can be a blue color resist, and the surface modification layer SML1 can be a red color resist.

Referring to FIG. 1D , the second substrate S2 is covered on the surface modification layer SML1 . The second substrate S2 may be an active array substrate, a color conversion substrate, or a combination thereof. For example, the second substrate S2 may include a pixel array, a color conversion layer, or a combination thereof. In this embodiment, the second substrate S2 is described by taking an active array substrate as an example, that is to say, The second substrate S1 may include a pixel array PX. As shown in FIG. 1D, the second substrate S2 may include a substrate SB2 and a pixel array PX formed on the substrate SB2. The substrate SB2 may comprise a glass substrate, a quartz substrate, an organic polymer substrate, or a combination thereof. In other embodiments, the first substrate S1 may also be an active array substrate (as shown in FIG. 5 ). In other words, one of the first substrate S1 or the second substrate S2 may include a pixel array.

2A and 2B are schematic cross-sectional views of a manufacturing method of a display according to another embodiment of the present invention, wherein the manufacturing method of the display shown in FIGS. 2A and 2B is substantially similar to the manufacturing method of the display shown in FIGS. 1B and 1C , The difference is that the exposure process uses the color conversion layer CE as a patterned mask, and the connection relationship, materials and manufacturing processes of other components have been described in detail above, so they will not be repeated below.

2A and FIG. 2B, the first substrate S11 includes a plurality of color conversion layers CE, each color conversion layer CE is disposed between two adjacent spacers PS, and the color conversion layer CE is used in the exposure process. The patterned mask used. In other words, in this embodiment, the color conversion layer CE exposes the bottom surface BS of the spacer PS (also referred to as back exposure). In this way, the light L used in the exposure process can pass through the spacer PS and irradiate from the inside of the spacer PS to the photosensitive material layer PM located on the sidewall SW of the spacer PS. In this way, even if the photosensitive material layer PM has a certain thickness, the light L can still be well irradiated to the photosensitive material layer PM covering the surface of the spacer PS, so that the crosslinking reaction is complete, so as to avoid the formation of the photosensitive material layer after the development process. The surface modification layer SML1 is prone to peeling or undercutting, so that the display has a good stability.

In addition, since the color conversion layer CE is used as a pattern mask in the exposure process, a mask (eg, the pattern mask MS shown in FIG. 1B ) can be omitted to reduce the manufacturing cost of the display.

In some embodiments, the first substrate S11 can selectively include a black matrix BM, wherein the black matrix BM is formed on the sidewalls of each color conversion layer CE and exposes the bottom surface BS of each spacer PS, so that the exposure process can use The light L can be well irradiated from the inside of the spacer PS to the photosensitive material layer PM located on the sidewall SW of the spacer PS.

3A to 3C are schematic cross-sectional views of a method for manufacturing a display according to another embodiment of the present invention, wherein the method for manufacturing the display shown in FIGS. 3A to 3C is substantially similar to the method for manufacturing the display shown in FIGS. 1B and 1C , The difference is that after the light-shielding material layer LSM is formed on the surfaces of the first substrate S1 and the spacer PS, the photosensitive material layer PM covering the light-shielding material layer LSM and the spacer PS is formed on the first substrate S1, and the rest of the components are formed. The connection relationship, materials, and manufacturing process thereof have been described in detail above, so they will not be repeated hereinafter.

Referring to FIG. 3A , first, a plurality of spacers PS are formed on the first substrate S1 . Next, a light shielding material layer LSM covering the spacers PS is formed on the first substrate S1. The material of the light shielding material layer LSM may be metal. In some embodiments, the light-shielding material layer LSM may be formed by physical vapor deposition (PVD). After that, a photosensitive material layer PM covering the light shielding material layer LSM and the spacer PS is formed on the first substrate S1.

Then, referring to FIG. 3A and FIG. 3B at the same time, by patterning the mask MS The photosensitive material layer PM is exposed and developed to form a surface modification layer SML2 on each spacer PS, wherein the surface modification layer SML2 is formed on the light shielding material layer LSM covering the top surface TS and sidewall SW of each spacer. In this embodiment, the surface modification layer SML2 exposes a part of the light shielding material layer LSM, for example, the surface modification layer SML2 exposes a part of the light shielding material layer LSM between two adjacent spacers PS.

In some embodiments, the light-shielding material layer LSM can optionally include a reflective layer, so that the light L used in the exposure process can be well irradiated to the photosensitive material layer PM on the surface of the light-shielding material layer LSM, so that the cross-linking reaction is completed, so as to The problem that the surface modification layer SML2 formed after the developing process is easily peeled off or undercut is avoided, so that the display has good stability. For example, even if the intensity of the light L irradiated to the portion of the photosensitive material layer PM adjacent to the light-shielding material layer LSM (deeper exposure depth) is smaller than the intensity of the light L irradiated to the surface of the photosensitive material layer PM (closer to the exposure source), due to Since the light-shielding material layer LSM includes a reflective layer, a portion of the photosensitive material layer PM far from the exposure source can still perform a good photocrosslinking reaction.

Then, referring to FIG. 3C , part of the light shielding material layer LSM exposed by the surface modification layer SML2 is removed to form a light shielding layer LS. In this embodiment, the light shielding layer LS is formed between each spacer PS and the surface modification layer SML2, and the light shielding layer LS covers the top surface TS and sidewall SW of each spacer PS and extends to the first substrate S1 and the surface modification layer Between SML2s, the phenomenon of light leakage between pixels can be further avoided, so that the display has good stability.

4A and 4B are schematic cross-sectional views of a method for manufacturing a display according to another embodiment of the present invention, wherein the method for manufacturing a display shown in FIGS. 4A and 4B is an overview The concept is roughly similar to the manufacturing method of the display shown in FIG. 1A to FIG. 1C, the difference lies in that the surface modification layer SML3 is formed by means of thermal crosslinking or redox reaction, and the connection relationship, materials and process of other components are It has been described in detail above, so it will not be repeated hereafter.

Referring to FIG. 4A, an inorganic material layer IOPL is formed on the substrate SB1. In some embodiments, the inorganic material layer IOPL may also be formed on the first substrate S1. Next, a plurality of organic spacers OPS are formed on the inorganic material layer IOPL. After that, a material layer ML covering the organic spacer OPS is formed on the inorganic material layer IOPL. Then, the modification process MP is carried out, so that part of the material layer ML and the organic spacer OPS undergo thermal cross-linking reaction or redox reaction, so as to avoid the problem that the intensity of the exposure light gradually decreases as the exposure depth increases, so that the subsequent The surface modification layer formed by the developing process is not easy to peel off, so that the display has good stability.

In this embodiment, the material layer ML is an organic material layer, and the above-mentioned modification process MP causes a part of the organic material layer and the organic spacer OPS to undergo thermal cross-linking reaction. It should be noted that the above-mentioned thermal crosslinking reaction only occurs at the interface between organic materials, but not at the interface between organic materials and inorganic materials. Therefore, after the modification process MP, The material layer ML is not cross-linked with the inorganic material layer IOPL. In other embodiments, the material layer ML is a liquid layer, and the above-mentioned modification process MP causes a redox reaction between a part of the liquid layer and the organic spacer OPS (eg, electroless plating). It should be noted that the above-mentioned redox reaction only occurs at the interface between the liquid layer and the organic material, but not at the interface between the liquid layer and the inorganic material. Therefore, after the modification process MP, the material Layer ML will not work with inorganic The material layer IOPL produces a redox reaction.

Referring to FIGS. 4A and 4B at the same time, after the modification process MP is performed, the portion of the material layer ML that has not undergone thermal crosslinking reaction or redox reaction with the organic spacer OPS is removed by a developing process, so that each organic spacer A surface modification layer SML3 is formed on the top surface and sidewall of the spacer. The visible light transmittance of the surface modification layer SML3 is, for example, less than or equal to 20%, which can prevent light leakage between pixels. In addition, since the aforementioned modification process MP can avoid the problem that the intensity of the exposure light gradually decreases with the increase of the exposure depth, the surface modification layer SML3 formed after the development process is separated from the first substrate S1 and the organic space It has good adhesion between the materials and OPS, so that the surface modification layer SML3 is not easy to be peeled off or undercut, so that the display has good stability.

Hereinafter, the display of this embodiment will be described with reference to FIG. 1D. In addition, although the manufacturing method of the display of the present embodiment is described by taking the above-mentioned manufacturing method as an example, it is not limited thereto.

Referring to FIG. 1D , the display 100 includes a first substrate S1 , a plurality of spacers PS, a plurality of surface modification layers SML1 and a second substrate S2 . The spacer PS is disposed on the first substrate S1, wherein the spacer PS can allow at least part of blue light and part of ultraviolet light to pass through. The surface modification layer SML1 covers the top surface and sidewall of each spacer PS respectively, wherein the visible light transmittance of the surface modification layer SML1 is less than or equal to 20%. The second substrate S2 covers the surface modification layer SML1, wherein the first substrate S1 or the second substrate S2 includes a pixel array PX.

In the manufacturing method of the display of the above-mentioned embodiment, since the exposure The light in the process can pass through each spacer and irradiate from the inside of each spacer to the photosensitive material layer on the sidewall of each spacer, so that the light can be well irradiated to the part to be exposed in the photosensitive material layer, resulting in a cross-linking reaction. Completely, in order to avoid the problem of easy peeling off of the surface modification layer formed later, so that the display has good stability.

In the manufacturing method of the display according to the above-mentioned another embodiment, the material layer is formed on the inorganic material layer and covers the organic spacer. In this way, the surface modification layer formed by the subsequent development process is less likely to be peeled off, so that the display has good stability.

In the manufacturing method of the display of the above-mentioned still another embodiment, since the light shielding layer is formed between each spacer and the surface modification layer, and the light shielding layer covers the top surface and sidewall of each spacer and extends to the first substrate and some surface modification layers In this way, the phenomenon of light leakage between pixels can be avoided, so that the display has good stability.

In the display of the above-mentioned embodiment, the surface modification layer covers the top surface and sidewall of each spacer respectively, wherein the visible light transmittance of the surface modification layer is less than or equal to 20%, so that the phenomenon of light leakage between pixels can be avoided, so that the The display has good stability.

In the above-mentioned display of another embodiment, since the light shielding layer is formed between each spacer and the surface modification layer, and the light shielding layer covers the top surface and sidewall of each spacer and extends between the first substrate and some surface modification layers , so that the phenomenon of light leakage between pixels can be avoided, so that the display has good stability.

In the display of the above-mentioned still another embodiment, since the surface modification layer covers the Cover the top surface and sidewall of each spacer, wherein the spacer and the surface modification layer have a visible light transmittance of less than or equal to 5% in the overlapping part, so that the phenomenon of light leakage between pixels can be avoided, so that the display has a good performance. stability.

Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.

100: Monitor

S1: the first substrate

S2: Second substrate

SB1, SB2: Substrate

PS: Spacer

CE: Color Conversion Layer

PL: flat layer

SML1: Surface modification layer

PX: pixel array

P: Particles

Claims (15)

A method for manufacturing a display, comprising: forming a plurality of spacers on a first substrate, wherein the height of the spacers is greater than or equal to 15 μm; forming a photosensitive material layer covering the spacers on the first substrate; An exposure process is performed on the photosensitive material layer through a patterned mask, wherein a light used in the exposure process is irradiated to a top surface or a bottom surface of each of the spacers, and through each of the spacers, the Light can be irradiated from the interior of each spacer to the photosensitive material layer on one side wall of each spacer. From a top-view point of view, the patterned mask is only exposed on the top surface of each spacer The photosensitive material layer on the sidewall of each spacer is not exposed; after the exposure process is performed on the photosensitive material layer, a developing process is used to remove the photosensitive material layer that is not exposed to the light. The photosensitive material layer is illuminated to form a surface modification layer on the top surface and the sidewall of each of the spacers; and a second substrate is covered on the surface modification layers, wherein the first substrate or the second substrate The substrate includes a pixel array. The method for manufacturing a display according to claim 1, further comprising: forming a plurality of particles in each of the spacers. The method for manufacturing a display according to claim 1, wherein the first substrate includes a pair of alignment marks, and one of the spacers is formed on and overlapped with the alignment mark . The method for manufacturing a display as claimed in claim 1, wherein the first substrate comprises a plurality of color conversion layers, each of the color conversion layers is disposed between adjacent two of the spacers, and the The color conversion layer serves as the patterned mask used in the exposure process. The method for manufacturing a display as claimed in claim 4, wherein the first substrate comprises a black matrix, and the black matrix is formed on a sidewall of each of the color conversion layers and exposes the bottom surface of each of the spacers. The method for manufacturing a display according to item 1 of the claimed scope further comprises: before performing the exposure process, performing a pre-treatment process on the photosensitive material layer, the pre-treatment process including a baking process, a vacuum drying process or the like. combination. A method for manufacturing a display, comprising: forming a plurality of spacers on a first substrate, wherein the height of the spacers is greater than or equal to 15 μm; forming a light-shielding material layer covering the spacers on the first substrate, Wherein the light-shielding material layer includes a reflective layer; a photosensitive material layer is formed on the first substrate covering the light-shielding material layer and the spacers; an exposure process and a developing process to form a surface modification layer on each of the spacers, wherein the surface modification layer is formed on the light-shielding material layer covering a top surface and a side wall of each of the spacers, and the surface modification layer exposes a portion the light-shielding material layer; removing part of the light-shielding material layer exposed by the surface modification layer to form a light-shielding layer, wherein the light-shielding layer is formed between each of the spacers and the surface-modified layer, and the light-shielding layer covers the The top surface and the sidewalls extend between the first substrate and the surface modification layers. A method for manufacturing a display, comprising: forming an inorganic material layer on a first substrate; forming a plurality of organic spacers on the inorganic material layer, wherein the height of the organic spacers is greater than or equal to 15 μm; A material layer covering the organic spacers is formed on the layer; a modification process is performed, so that a part of the material layer and the organic spacers generate thermal crosslinking reaction or redox reaction, the thermal crosslinking reaction or the redox reaction The reaction only occurs at the interface between the material layer and the organic spacers; after the modification process, a developing process is used to remove the thermal cross-linking of the material layer with the organic spacers part of the reaction or redox reaction to form a surface modification layer on a top surface and a side wall of each of the organic spacers; and cover a second substrate on the surface modification layers, wherein the first substrate or the The second substrate includes a pixel array. The method for manufacturing a display as claimed in claim 8, wherein the material layer is an organic material layer, and the modification process causes a thermal crosslinking reaction between a part of the organic material layer and the organic spacers. The method for manufacturing a display according to claim 8, wherein the material layer is a liquid layer, so that a part of the liquid layer and the organic spacers undergo a redox reaction. A display, comprising: a first substrate; a plurality of spacers disposed on the first substrate, wherein the spacers are spaced apart from each other and can allow at least part of blue light and at least part of ultraviolet light to pass, wherein the spacers The height of the spacer is greater than or equal to 15 μm, and each of the spacers includes a plurality of particles formed therein; a plurality of surface modification layers respectively cover a top surface and a side wall of each of the spacers, wherein the visible light of the surface modification layers passes through The transmittance is less than or equal to 20%; and a second substrate covers the surface modification layers, wherein the first substrate or the second substrate includes a pixel array. The display according to claim 11, further comprising: a plurality of light-shielding layers respectively disposed between the spacers and the surface modification layers, wherein the light-shielding layers cover the top surfaces of the spacers and the sidewall and extending between the first substrate and the surface modification layers. A display, comprising: a first substrate; a plurality of spacers disposed on the first substrate, wherein the spacers can allow at least part of blue light and at least part of ultraviolet light to pass through, and the height of the spacers is greater than or equal to 15μm; a plurality of surface modification layers, respectively covering a top surface and a side wall of each of the spacers; a plurality of light shielding layers, respectively disposed between the spacers and the surface modification layers, wherein the light shielding layers cover each of the The top surface and the sidewall of the spacer extend between the first substrate and the surface modification layers, wherein each of the light shielding layers includes a reflective layer; and a second substrate covers the surface modification layers, Wherein the first substrate or the second substrate includes a pixel array. A display, comprising: a first substrate; a plurality of spacers disposed on the first substrate, wherein the spacers are spaced apart from each other and can allow at least part of blue light and at least part of ultraviolet light to pass, and the spacers The height of the spacer is greater than or equal to 15 μm; a plurality of surface modification layers respectively cover a top surface and a side wall of each spacer, wherein the spacers and the surface modification layers in the overlapping part have a ratio of less than or equal to 5% Visible light transmittance; and a second substrate covering the surface modification layers, wherein the first substrate or the second substrate includes a pixel array, wherein the spacers and one of the surface modification layers One is a blue color resist, and the other of the spacers and the surface modification layers is a red color resist or a yellow color resist. A display, comprising: a first substrate; A plurality of spacers, disposed on the first substrate, wherein the spacers are spaced apart from each other and can allow at least part of blue light and at least part of ultraviolet light to pass through, and the height of the spacers is greater than or equal to 15 μm; a plurality of surfaces a modification layer covering a top surface and a side wall of each of the spacers respectively, wherein the spacers and the surface modification layers have a visible light transmittance of less than or equal to 5% at the overlapping part; and a second substrate , covering the surface modification layers, wherein the first substrate or the second substrate includes a pixel array, wherein one of the spacers and the surface modification layers is a magenta color resist, and the spacers and the other one of the surface modification layers is a green color resist.

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